CN211814633U

CN211814633U - Anti-sputtering structure of multi-arc ion plating equipment

Info

Publication number: CN211814633U
Application number: CN202020548943.9U
Authority: CN
Inventors: 冷长志
Original assignee: Hangzhou Yoodo New Material Technology Co ltd
Current assignee: Hangzhou Yoodo New Material Technology Co ltd
Priority date: 2020-04-15
Filing date: 2020-04-15
Publication date: 2020-10-30
Anticipated expiration: 2030-04-15

Abstract

The utility model discloses an anti-sputtering structure of multi-arc ion plating equipment, which comprises a base and a frame arranged on the base; a bottom plate is arranged on the base; the bottom plate is provided with a rack; the rack comprises a concave-convex block and a positioning block; it is characterized in that a baffle plate is arranged outside the bottom plate. The utility model discloses simple structure, convenient to use can effectually prevent that the residue piece that produces in the equipment from dropping the core position of equipment, makes equipment normal operating, improve equipment's operation effect and efficiency.

Description

Anti-sputtering structure of multi-arc ion plating equipment

[ technical field ] A method for producing a semiconductor device

The utility model relates to an ion plating technical field specifically indicates a sputtering prevention structure of multi-arc ion plating equipment.

[ background of the invention ]

The multi-arc ion plating is a branch of a physical vapor deposition technology, and is a novel coating preparation technology developed on the basis of vacuum evaporation and vacuum sputtering, wherein the target in an arc source is used as a target pole in the multi-arc ion plating, the target generates plasma under the action of electric arc, and the plasma is accelerated to deposit on the surface of a base body to form a thin film under the action of negative bias of the base body. Therefore, the anti-sputtering structure of the multi-arc ion plating equipment is provided.

[ summary of the invention ]

The utility model aims at solving the prior art, there is not safeguard measure in the periphery of ion plating equipment, and the residue piece that produces when causing the ion coating film drops at the core position of equipment to lead to the equipment short circuit situation, thereby influenced the effect and the efficiency scheduling problem of coating film equipment coating film and provided a many arcs ion plating equipment's splashproof structure.

In order to achieve the above purpose, the utility model provides a following technical scheme: an anti-sputtering structure of multi-arc ion plating equipment comprises a base and a rack arranged on the base; a bottom plate is arranged on the base; the bottom plate is provided with a rack; the rack comprises a concave-convex block and a positioning block; it is characterized in that a baffle plate is arranged outside the bottom plate.

Preferably, the bottom plate is provided with a fixing plate and a positioning block; a positioning groove is formed in the positioning block; a plurality of cushion blocks are arranged on the fixing plate; the cushion block is provided with a concave-convex block; and a gasket is arranged on the concave position of the concave-convex block.

Preferably, the concave-convex block, the cushion block and the gasket are fixedly installed through screws; the concave-convex block is also provided with a plurality of screw holes.

Preferably, an outer cover is arranged outside the frame; the outer cover is provided with a hook.

The utility model has the advantages that: this anti-sputtering structure simple structure, convenient to use can effectually prevent that the residue piece that produces in the equipment from dropping the core position of equipment, makes equipment normal operating, improves the operation effect and the efficiency of equipment.

[ description of the drawings ]

Fig. 1 is a schematic structural diagram of the present invention.

Fig. 2 is a schematic structural diagram of the present invention.

Fig. 3 is a plan view of the present invention.

Illustration of the drawings: 1, a base; 2, a frame; 3, a bottom plate; 4, concave-convex blocks; 5, positioning a block; 6, a baffle plate; 7 fixing the plate; 8, positioning a groove; 9, cushion blocks; 10 a gasket; 11 screw holes; 12 an outer cover; and 13, hanging hooks.

Detailed Description

The following description will further describe the sputtering prevention structure of the multi-arc ion plating apparatus according to the present invention with reference to the accompanying drawings.

Referring to fig. 1-3, an anti-sputtering structure of a multi-arc ion plating apparatus in this embodiment includes a base 1 and a frame 2 mounted on the base 1; a bottom plate 3 is arranged on the base 2; the bottom plate 3 is provided with a frame 2; the rack 2 comprises a concave-convex block 4 and a positioning block 5; the device is characterized in that a baffle 6 is arranged outside the bottom plate 3; a fixing plate 7 and a positioning block 5 are arranged on the bottom plate 6; a positioning groove 8 is arranged on the positioning block 5; a plurality of cushion blocks 9 are arranged on the fixing plate 7; the cushion block 9 is provided with a concave-convex block 4; a gasket 10 is arranged on the concave part of the concave-convex block 4; the concave-convex block 4, the cushion block 9 and the gasket 10 are fixedly installed through screws; the concave-convex block 4 is also provided with a plurality of screw holes 11; an outer cover 12 is also arranged outside the frame 2; the outer cover 12 is provided with a hook 13.

In the utility model, the baffle 6 is arranged around the bottom plate 3, the frame is blocked in the baffle 6, and residue fragments generated during the operation of the multi-arc ion plating equipment are prevented from falling to the core part of the equipment, so that the equipment can normally operate, and the operation effect and efficacy of the equipment are improved; by providing a housing 12 outside the frame 2; when the equipment is not in operation, the housing 12 may be used to house the housing 2 to prevent dust and other matter from falling onto the housing 2 and interfering with the use of subsequent equipment.

The above-mentioned embodiment is right the utility model discloses an explanation, it is not right the utility model discloses a limited, any right the scheme after the simple transform of the utility model all belongs to the protection scope of the utility model.

Claims

1. An anti-sputtering structure of multi-arc ion plating equipment comprises a base (1) and a rack (2) arranged on the base (1); a bottom plate (3) is arranged on the base (1); the bottom plate (3) is provided with a rack (2); the rack (2) comprises a concave-convex block (4) and a positioning block (5); the novel solar water heater is characterized in that a baffle (6) is arranged outside the bottom plate (3).

2. The sputtering prevention structure of the multi-arc ion plating apparatus according to claim 1, characterized in that: a fixing plate (7) and a positioning block (5) are arranged on the bottom plate (3); a positioning groove (8) is arranged on the positioning block (5); a plurality of cushion blocks (9) are arranged on the fixing plate (7); the cushion block (9) is provided with a concave-convex block (4); and a gasket (10) is arranged on the concave part of the concave-convex block (4).

3. The sputtering prevention structure of the multi-arc ion plating apparatus according to claim 2, characterized in that: the concave-convex block (4), the cushion block (9) and the gasket (10) are fixedly installed through screws; the concave-convex block (4) is also provided with a plurality of screw holes (11).

4. The sputtering prevention structure of the multi-arc ion plating apparatus according to claim 1, characterized in that: an outer cover (12) is also arranged outside the frame (2); the outer cover (12) is provided with a hook (13).