CN211652591U

CN211652591U - Semiconductor device surface particle measuring platform

Info

Publication number: CN211652591U
Application number: CN201922431968.0U
Authority: CN
Inventors: 许文泽; 袁鹏华; 刘东升
Original assignee: Shanghai Huali Integrated Circuit Manufacturing Co Ltd
Current assignee: Shanghai Huali Integrated Circuit Manufacturing Co Ltd
Priority date: 2019-12-30
Filing date: 2019-12-30
Publication date: 2020-10-09
Anticipated expiration: 2029-12-30

Abstract

The utility model discloses a semiconductor device surface particle measuring platform, include: a table assembly for placing the semiconductor device; the height slide rule fixing component is fixedly connected to the workbench; the first end of the height sliding ruler is fixedly connected to the height sliding ruler fixing component; the first end of the horizontal sliding ruler is fixedly connected with the second end of the height sliding ruler; and the particle detector is used for detecting particles on the surface of the semiconductor device and is fixedly arranged at the second end of the horizontal sliding ruler. The utility model discloses surveyed gimmick and standard of survey crew have been standardized to make the data that the measurement acquireed more accurate.

Description

Semiconductor device surface particle measuring platform

Technical Field

The utility model relates to a semiconductor integrated circuit makes the field, especially a semiconductor device surface particle measuring platform.

Background

In the prior art, advanced integrated circuit manufacturing processes generally include hundreds of steps, and with the development of integrated circuit processes and the continuous reduction of critical feature sizes, surface defects of semiconductor device components are increasingly emphasized, and minor errors in any link will cause the failure of the whole product, so the requirements for process control become more and more strict.

In order to detect defects of products in time, the integrated circuit is generally configured with a corresponding defect detection device to detect defects of the products. Therefore, defect detection equipment is arranged for timely finding and solving problems in the production process to detect the products.

In the defect detection system of the semiconductor equipment component in the prior art, after the surface of the semiconductor equipment component is scanned, the visual inspection of the surface defects of the semiconductor equipment component can only be manually operated by related personnel.

In order to reduce product defects, higher requirements are required for particle control on the surfaces of equipment parts. In particular, there are extremely high requirements on the particle size and number of the surfaces of many equipment parts, and the basic principle is to calculate the particle size and number according to the different light absorption or scattering rates of the particles on the surfaces of semiconductor devices. The test method can be as follows: and (3) placing the product under a metallographic microscope, and calculating the number distribution of the particles with different sizes on the whole device by using analysis counting software according to the brightness difference of different metal particles and non-metal particles under the microscope.

Currently, probe type particle instruments are used in the industry to inspect particles on the surface of a component, and a hand-held probe is used to pick points on the component to measure required data.

Such methods are simple and easy to operate, but due to different selected point positions of measuring personnel and different measuring modes, the obtained data lack the contrast, repeatability, reliability and the like.

Disclosure of Invention

The to-be-solved technical problem of the utility model is to provide a semiconductor device surface particle measuring platform standardizes the measuring gimmick of survey crew to standardize the measuring standard of survey crew.

In order to solve the technical problem, the utility model provides a semiconductor device surface particle measuring platform, include: a table assembly for placing the semiconductor device; the height slide rule fixing component is fixedly connected to the workbench; the first end of the height sliding ruler is fixedly connected to the height sliding ruler fixing component; the first end of the horizontal sliding ruler is fixedly connected with the second end of the height sliding ruler; and the particle detector is used for detecting particles on the surface of the semiconductor device and is fixedly arranged at the second end of the horizontal sliding ruler.

Preferably, the table assembly comprises: a rotary stage assembly including a rotary stage face for placing a semiconductor device and a rotary stage for rotation, the rotary stage face being disposed on the rotary stage; a table for supporting the rotating platform assembly.

Preferably, the rotary platform is provided with an angle and a size scale on the surface thereof, so that the semiconductor device is placed in the center of the rotary platform.

Preferably, a platform mark point used for confirming the rotation position of the rotary platform surface is arranged on the rotary platform surface.

Preferably, the rotary platform surface is provided with an angle mark for confirming the rotation angle of the rotary platform surface.

Preferably, the rotary platform face is provided with a rotation center, the rotation center is used as a circle center to form at least three circles, and the rotary platform face is further marked with radius scales of the three circles.

Preferably, the height sliding ruler is provided with a through groove, and the first end of the height sliding ruler penetrates through the through groove of the height sliding ruler through a fixing part to be fixedly connected with the height sliding ruler fixing component.

Preferably, the horizontal sliding ruler is provided with a through groove, and the first end of the horizontal sliding ruler penetrates through the through groove of the horizontal sliding ruler through a fixing part to be fixedly connected with the second end of the height sliding ruler.

Preferably, the second end of the horizontal sliding ruler is provided with a through hole, and the particle detector is fixedly connected with the second end of the horizontal sliding ruler through the through hole by a fixing part.

Drawings

Fig. 1 is the overall structure schematic diagram of the surface particle measuring platform of the semiconductor device of the present invention.

Fig. 2 is a schematic diagram of a worktable assembly in the semiconductor device surface particle measuring platform of the present invention.

Fig. 3 is a schematic view of a surface of a rotary platform in the semiconductor device surface particle measuring platform of the present invention.

Fig. 4 is a schematic view of the height slide rule fixing assembly in the semiconductor device surface particle measuring platform of the present invention.

Fig. 5 is a schematic view of a height slide rule in the platform for measuring surface particles of a semiconductor device according to the present invention.

Fig. 6 is a schematic view of a horizontal slide rule in the platform for measuring surface particles of a semiconductor device according to the present invention.

Description of the reference numerals

10 table assembly 11 rotating platform assembly

12 workbench 111 rotary platform surface

112 rotating platform 1111 rotation center

1112 platform mark point 1113 radius scale

1114 Angle marking 20 height slide rule fixing component

30 height slide 31 first end of height slide

Second end of 32-height slide rule 33 through groove of height slide rule

35 compress tightly bolt 40 horizontal slide rule of height slide rule

41 first end of horizontal slide 42 second end of horizontal slide

43 through groove of horizontal sliding ruler 44 through hole of horizontal sliding ruler

45 compress tightly bolt 50 particulate matter detector of horizontal slide rule

Detailed Description

The following detailed description of the embodiments of the present invention will be made with reference to the accompanying drawings. It is to be understood that the invention is not limited to the particular embodiments described above, and that devices and structures not described in detail are understood to be implemented in a manner common in the art; without departing from the scope of the invention, it is intended that the present invention shall not be limited to the above-described embodiments, but that the present invention shall include all modifications, equivalents and alternatives.

Referring to fig. 1, the present invention provides a surface particle measuring platform for a semiconductor device, comprising: a table assembly 10, a height slide mount assembly 20, a height slide 30, a horizontal slide 40, and a particle detector 50.

The table assembly 10 is used for placing the semiconductor device. The height slide rule fixing component 20 is fixedly connected to the workbench; the height slide 30 has a first end 31 and a second end 32, and the first end 31 of the height slide is fixedly connected to the height slide fixing component 20; the horizontal slide 40 has a first end 41 and a second end 42, the first end 41 of the horizontal slide is fixedly connected with the second end 32 of the height slide; the particle detector 50 is used for detecting particles on the surface of the semiconductor device, and the particle detector is fixedly arranged at the second end 42 of the horizontal sliding ruler.

Referring to fig. 2, the table assembly 10 includes a rotary table assembly 11 including a rotary table top 111 for placing a semiconductor device and a rotary table 112 for rotation, and a table 12 on which the rotary table top 111 is disposed; the table 12 is used to support the rotating platform assembly 11.

In this embodiment, the rotary platform surface 111 is circular, and has a diameter of 90cm and a height of 3 cm. The rotary table 112 is cylindrical, and has a diameter of 40cm and a height of 3 cm.

Referring to fig. 3, the turntable surface 111 is provided with angle and size scales for placing the semiconductor device at the center of the turntable, and a table mark 1112 for confirming the rotation position of the turntable surface.

As shown in fig. 3, the rotary table surface 111 is provided with a rotation center 1111, at least three circles are formed around the rotation center 1111 as a center of a circle, and radius scales 1113 of the three circles are marked on the rotary table surface 111. In this embodiment, the three radius scales are 25cm, 30cm and 45cm, respectively.

The rotary table face is provided with an angle mark 1114 for confirming the rotation angle of the rotary table face. In this embodiment, an angle mark is provided every 90 degrees.

Referring to fig. 4 and 5, the height slide fixing assembly 20 is fixed to the table, the height slide is provided with a through groove 31, the through groove 31 of the height slide 30 is inserted through a bolt 35 for pressing the height slide, the height slide 30 is moved to a desired height, and the bolt 31 for pressing the height slide is rotated to fix the height slide to the height slide fixing assembly 20. In this embodiment, the bolt 31 is fixed 1.5cm from the upper edge of the height slide fixing assembly.

In the present embodiment, height slide rule mounting assembly 20 is L-shaped, as shown in fig. 4, with equal sides, each 6 cm.

Referring to fig. 5, the through groove 33 of the height slide 30 passes through the bolt or screw of the height slide fixing member 20, the height slide surface has a scale, the height slide 30 is moved to a desired scale, and the height slide 30 is fixed by rotating the bolt or screw.

In this embodiment, the height sliding ruler is L-shaped, the length of one side of the height sliding ruler with the through groove is 35cm, and the length of one side of the height sliding ruler used for fixing and pressing the bolt of the horizontal sliding ruler is 6 cm.

Meanwhile, two bolts 45 for compressing the horizontal sliding ruler are arranged on the height sliding ruler 30, the horizontal sliding ruler is provided with a through groove 43, a graduated scale is arranged on the surface of the horizontal sliding ruler, the through groove 43 of the horizontal sliding ruler penetrates through the bolts or screws, the horizontal sliding ruler is moved to a desired position, and the bolts are rotated to fix the horizontal sliding ruler on the height sliding ruler 30.

Referring to fig. 6, the second end 42 of the horizontal sliding rule is further provided with a through hole 44, and the particle detector 50 is fixedly connected with the second end 42 of the horizontal sliding rule through the through hole 44 by a fixing component.

In this embodiment, the length of the horizontal sliding ruler is 40cm, and the length of the through groove thereof is 35 cm.

The above-mentioned embodiments and the accompanying drawings are only illustrative for explaining the technical solution and the technical effects of the present invention, and are not intended to limit the present invention. It is to be understood that modifications and variations may be made in the above-described embodiments by those skilled in the art without departing from the spirit and scope of the present invention as defined by the appended claims.

Claims

1. A semiconductor device surface particle measurement platform, comprising:

a table assembly for placing the semiconductor device;

the height slide rule fixing component is fixedly connected to the workbench;

the first end of the height sliding ruler is fixedly connected to the height sliding ruler fixing component;

the first end of the horizontal sliding ruler is fixedly connected with the second end of the height sliding ruler;

and the particle detector is used for detecting particles on the surface of the semiconductor device and is fixedly arranged at the second end of the horizontal sliding ruler.

2. The semiconductor device surface particle measurement platform of claim 1, wherein the stage assembly comprises:

a rotary stage assembly including a rotary stage face for placing a semiconductor device and a rotary stage for rotation, the rotary stage face being disposed on the rotary stage;

a table for supporting the rotating platform assembly.

3. The semiconductor device surface particle measurement platform of claim 2, wherein the surface of the rotary platform is provided with an angle and a size scale for placing the semiconductor device at the center of the rotary platform.

4. The semiconductor device surface particle measurement platform of claim 3, wherein the rotating platform surface is provided with platform mark points for confirming a rotating position of the rotating platform surface.

5. The semiconductor device surface particle measurement platform of claim 3, wherein the rotary platform face is provided with an angle mark for confirming a rotation angle of the rotary platform face.

6. The semiconductor device surface particle measurement platform of claim 3, wherein the rotary platform surface is provided with a rotation center, at least three circles are formed by taking the rotation center as a circle center, and the rotary platform surface is further marked with radius scales of the three circles.

7. The semiconductor device surface particle measurement platform of claim 1, wherein the height slide rule is provided with a through slot, and the first end of the height slide rule is fixedly connected with the height slide rule fixing component through a fixing component passing through the through slot of the height slide rule.

8. The semiconductor device surface particle measurement platform of claim 1, wherein the horizontal sliding ruler is provided with a through groove, and a first end of the horizontal sliding ruler is fixedly connected with a second end of the height sliding ruler through the through groove of the horizontal sliding ruler by a fixing part.

9. The semiconductor device surface particle measurement platform of claim 1, wherein the second end of the horizontal sliding ruler is provided with a through hole, and the particle detector is fixedly connected with the second end of the horizontal sliding ruler through the through hole by a fixing part.