CN211079328U - Double-sided film coating structure of plate type PECVD machine - Google Patents
Double-sided film coating structure of plate type PECVD machine Download PDFInfo
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- CN211079328U CN211079328U CN201921972557.6U CN201921972557U CN211079328U CN 211079328 U CN211079328 U CN 211079328U CN 201921972557 U CN201921972557 U CN 201921972557U CN 211079328 U CN211079328 U CN 211079328U
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Abstract
The utility model discloses a two-sided coating film structure of board-like PECVD board, the camera comprises a frame, quartz capsule is all installed at both ends about the inside of frame, the internally mounted of frame has coating film mechanism, the lower plate is all installed at both ends about the frame outer wall, the outside of lower plate is rotated and is connected with the punch holder, the inside of lower plate and punch holder is pegged graft and is had magnet, adjusting member is installed in the left side of frame, the carousel is installed in adjusting member's left side. This two-sided coating structure of board-like PECVD board, through the cooperation of first shell, the second shell, picture peg and frid, can provide the space for coating film work, through branch, the buckle, the cooperation of graphite frame and silicon chip, reached and to have carried out coating film work, through the support, decide the piece, the screw rod, the carousel, the cooperation of screwed pipe and vaulting pole, reached and to have adjusted work to the inside space of outer frame, can make the quantity of plasma control, reached and to have adjusted work to the effect of coating film.
Description
Technical Field
The utility model relates to the technical field, specifically be a two-sided coating film structure of board-like PECVD board.
Background
PECVD is a method of forming plasma locally by using gas containing film constituent atoms by means of microwave or radio frequency and the like, wherein the plasma has strong chemical activity and is easy to react, the expected film is deposited on the substrate, in the PECVD process, because electrons moving at high speed in plasma collide neutral reaction gas molecules, the neutral reaction gas molecules are broken or are easy to react in an activated state, and the substrate temperature is usually kept at about 350 ℃ to obtain a good SiOx or SiNx film, can be used as the final passivation protective layer of the integrated circuit to improve the reliability of the integrated circuit, the double-sided coating structure of the existing plate type PECVD machine can not adjust the space of the outer frame when in use, therefore, the number of the plasma can not be controlled, and the adjustment of different coating effects can not be realized.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a two-sided coating structure of board-like PECVD board to solve the two-sided coating structure who provides current board-like PECVD board in the above-mentioned background art when using, can't accomplish to adjust the work in the space of frame, thereby can't accomplish to control the work to the quantity of plasma, can't accomplish to adjust the problem of work to different coating film effects.
In order to achieve the above object, the utility model provides a following technical scheme: a double-sided coating structure of a plate type PECVD machine platform comprises an outer frame, wherein quartz tubes are arranged at the upper end and the lower end of the inner part of the outer frame, a coating mechanism is arranged in the outer frame, lower clamping plates are arranged at the upper end and the lower end of the outer wall of the outer frame, an upper clamping plate is rotatably connected to the outer side of the lower clamping plate, magnets are inserted into the lower clamping plate and the upper clamping plate, an adjusting member is arranged on the left side of the outer frame, a turntable is arranged on the left side of the adjusting member, and plasma is arranged in the outer frame;
the adjusting component comprises a support, a fixed block, a screw rod, a threaded pipe and a support rod, wherein the fixed block is fixedly connected between the supports, the screw rod is connected to the fixed block in a rotating mode, the threaded pipe is connected to the outer wall of the screw rod in a threaded mode, the support rod is connected to the upper end and the lower end of the outer wall of the threaded pipe in a rotating mode, and the screw rod is fixedly connected with the rotary table.
Preferably, the support rods are symmetrically arranged.
Preferably, the frame includes first shell, second shell, picture peg and frid, the bottom lock of first shell has the second shell, the left side rigid coupling of first shell has the frid, the left side rigid coupling of second shell has the picture peg, the picture peg links to each other with the frid is pegged graft.
Preferably, the first shell and the second shell are in a U-shaped plate shape.
Preferably, an ammonia gas inlet hole is formed in the outer wall of the first shell.
Preferably, the coating mechanism comprises a support rod, a buckle plate, a graphite frame and a silicon wafer, the buckle plate is fixedly connected to the top end of the support rod, the graphite frame is inserted into the inner wall of the buckle plate, and the silicon wafer is fixedly connected to the outer wall of the graphite frame.
Preferably, the buckle plates are connected through bolts in a threaded mode.
Compared with the prior art, the beneficial effects of the utility model are that: this two-sided coating structure of board-like PECVD board, through the cooperation of first shell, the second shell, picture peg and frid, can provide the space for coating film work, through branch, the buckle, the cooperation of graphite frame and silicon chip, reached and to have carried out coating film work, through the support, decide the piece, the screw rod, the carousel, the cooperation of screwed pipe and vaulting pole, reached and to have adjusted work to the inside space of outer frame, can make the quantity of plasma control, reached and to have adjusted work to the effect of coating film.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view showing a connection structure of the screw, the threaded pipe and the stay bar of FIG. 1;
fig. 3 is a schematic view showing a coupling structure of the lower and upper clamping plates of fig. 1.
In the figure: 1. the device comprises an outer frame, 101, a first shell, 102, a second shell, 103, an inserting plate, 104, a groove plate, 2, a quartz tube, 3, a coating mechanism, 301, a support rod, 302, a buckle plate, 303, a graphite frame, 304, a silicon wafer, 4, a lower clamping plate, 5, an upper clamping plate, 6, a magnet, 7, an adjusting component, 701, a support, 702, a fixed block, 703, a screw rod, 704, a threaded tube, 705, a support rod, 8, a rotating disc, 9 and plasma.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-3, the present invention provides a technical solution: a double-sided coating structure of a plate type PECVD machine platform comprises an outer frame 1, quartz tubes 2 are respectively arranged at the upper end and the lower end of the inside of the outer frame 1, a coating mechanism 3 is arranged in the outer frame 1, the coating mechanism 3 can perform double-sided coating work, lower clamping plates 4 are respectively arranged at the upper end and the lower end of the outer wall of the outer frame 1, the lower clamping plates 4 are respectively fixedly connected with a first shell 101 and a second shell 102, the outer sides of the lower clamping plates 4 are rotatably connected with upper clamping plates 5, the upper clamping plates 5 are rotatably connected with the lower clamping plates 4 through pin shafts, magnets 6 are inserted in the lower clamping plates 4 and the upper clamping plates 5, an adjusting member 7 is arranged at the left side of the outer frame 1, the adjusting member 7 can adjust the height of the outer frame 1, a turntable 8 is arranged at the left side of the adjusting member 7, the turntable 8 can perform progress adjustment work, and a plasma 9 is arranged;
the adjusting component 7 comprises a support 701, a fixed block 702, a screw 703, a threaded pipe 704 and a support rod 705, the fixed block 702 is fixedly connected between the supports 701, the support 701 is fixedly connected with a machine table, the screw 703 is rotatably connected inside the fixed block 702 through a bearing, the threaded pipe 704 is in threaded connection with the outer wall of the screw 703, the screw 703 can drive the threaded pipe 704 to move left and right, the support rod 705 is rotatably connected to the upper end and the lower end of the outer wall of the threaded pipe 704, the support rod 705 is rotatably connected with the threaded pipe 704 through a pin shaft, the other end of the support rod 705 is rotatably connected with the inserting plate 103 and the groove plate 104 through a pin shaft, the screw 703 is fixedly connected with the turntable 8, the screw 703 can be rotated by rotating the turntable.
The frame 1 includes first shell 101, second shell 102, picture peg 103 and frid 104, the bottom lock of first shell 101 has second shell 102, the lock is opened to second shell 102 and first shell 101, the left side rigid coupling of first shell 101 has frid 104, the left side rigid coupling of second shell 102 has picture peg 103, picture peg 103 can be followed the inside of frid 104 and inserted and extract, picture peg 103 links to each other with frid 104 grafting, the shape of first shell 101 and second shell 102 is the U template, the ammonia inlet port has been seted up to the outer wall inside of first shell 101, the ammonia enters into the inside of first shell 101 and second shell 102 through the ammonia inlet port.
When the double-sided coating structure of the plate-type PECVD machine platform is adjusted and used, a user firstly rotates the turntable 8, the turntable 8 rotates to drive the screw rod 703 to rotate in the fixed block 702, the screw rod 703 rotates through a bearing to work, the screw rod 703 can drive the threaded pipe 704 to move towards the right side when rotating, the threaded pipe 704 can drive the support rod 705 to open through a pin shaft when moving towards the right side, the support rod 705 drives the inserting plate 103 and the groove plate 104 to open through the pin shaft when opening, the inserting plate 103 can slide in the groove plate 104 when opening, and the first shell 101 and the second shell 102 can be driven to move towards the upper side and the lower side when opening, so that the inner space of the first shell 101 and the second shell 102 is larger, the plasma quantity in the first shell 101 and the second shell 102 can be adjusted, and the effect required by coating can be adjusted.
In the description of the present invention, it is to be understood that the terms "coaxial", "bottom", "one end", "top", "middle", "other end", "upper", "one side", "top", "inner", "front", "center", "both ends", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "disposed," "connected," "fixed," "screwed" and the like are to be construed broadly, e.g., as meaning fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through an intermediate medium, and may be connected through the inside of two elements or in an interaction relationship between two elements, unless otherwise specifically defined, and the specific meaning of the above terms in the present invention will be understood by those skilled in the art according to specific situations.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. The utility model provides a two-sided coating structure of board-like PECVD board, includes frame (1), its characterized in that: quartz tubes (2) are mounted at the upper end and the lower end of the interior of the outer frame (1), a coating mechanism (3) is mounted in the outer frame (1), lower clamping plates (4) are mounted at the upper end and the lower end of the outer wall of the outer frame (1), an upper clamping plate (5) is rotatably connected to the outer side of the lower clamping plate (4), magnets (6) are inserted into the lower clamping plate (4) and the upper clamping plate (5), an adjusting member (7) is mounted on the left side of the outer frame (1), a turntable (8) is mounted on the left side of the adjusting member (7), and plasmas (9) are arranged in the outer frame (1);
the adjusting component (7) comprises a support (701), a fixed block (702), a screw rod (703), a threaded pipe (704) and a support rod (705), the fixed block (702) is fixedly connected between the supports (701), the screw rod (703) is connected to the fixed block (702) in a rotating mode, the threaded pipe (704) is connected to the outer wall of the screw rod (703) in a threaded mode, the support rod (705) is connected to the upper end and the lower end of the outer wall of the threaded pipe (704) in a rotating mode, and the screw rod (703) is fixedly connected with the rotary disc (8).
2. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 1, wherein: the struts (705) are symmetrically arranged.
3. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 1, wherein: frame (1) includes first shell (101), second shell (102), picture peg (103) and frid (104), the bottom lock of first shell (101) has second shell (102), the left side rigid coupling of first shell (101) has frid (104), the left side rigid coupling of second shell (102) has picture peg (103), picture peg (103) are pegged graft with frid (104) and are linked to each other.
4. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 3, wherein: the first shell (101) and the second shell (102) are U-shaped plates.
5. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 3, wherein: an ammonia gas inlet hole is formed in the outer wall of the first shell (101).
6. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 1, wherein: coating mechanism (3) include branch (301), buckle (302), graphite frame (303) and silicon chip (304), the top rigid coupling of branch (301) has buckle (302), the inner wall grafting of buckle (302) has graphite frame (303), the outer wall rigid coupling of graphite frame (303) has silicon chip (304).
7. The double-sided coating structure of the plate-type PECVD machine platform as recited in claim 6, wherein: the pinch plates (302) are connected through bolts in a threaded mode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201921972557.6U CN211079328U (en) | 2019-11-15 | 2019-11-15 | Double-sided film coating structure of plate type PECVD machine |
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CN201921972557.6U CN211079328U (en) | 2019-11-15 | 2019-11-15 | Double-sided film coating structure of plate type PECVD machine |
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CN211079328U true CN211079328U (en) | 2020-07-24 |
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CN201921972557.6U Active CN211079328U (en) | 2019-11-15 | 2019-11-15 | Double-sided film coating structure of plate type PECVD machine |
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2019
- 2019-11-15 CN CN201921972557.6U patent/CN211079328U/en active Active
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