CN211045374U

CN211045374U - Plasma processing apparatus

Info

Publication number: CN211045374U
Application number: CN202020159460.XU
Authority: CN
Inventors: 董海清; 申鹏
Original assignee: Shenzhen Chuangzhijie Technology Co ltd
Current assignee: Shenzhen Chuangzhijie Technology Co ltd
Priority date: 2020-02-10
Filing date: 2020-02-10
Publication date: 2020-07-17
Anticipated expiration: 2030-02-10

Abstract

The utility model provides a plasma processing device, which comprises a box body, a plasma equipment main body and a vacuum pump, wherein the box body is divided into an upper layer and a lower layer by a partition plate, the plasma equipment main body is arranged in an upper layer cavity, the vacuum pump is arranged in a lower layer cavity, and a heat dissipation mechanism is arranged on at least one surface in the lower layer cavity, the heat dissipation mechanism comprises a heat transfer sheet, a heat conduction column and a heat dissipation plate, the heat transfer sheet is positioned in the lower layer cavity, one end of the heat conduction column penetrates through the cavity wall to be fixed with the heat transfer sheet, the other end of the heat dissipation plate is fixed with the heat dissipation plate, the heat dissipation plate comprises an arc body and heat dissipation fins distributed on the arc body, the structure of the plasma processing device is improved, the heat dissipation mechanism is arranged in the lower layer cavity to dissipate heat, a fan or a water cooling device is omitted, the heat in, the heat dissipation area is enlarged, and the heat dissipation efficiency is improved.

Description

Plasma processing apparatus

Technical Field

The utility model relates to a plasma processing technology field especially relates to plasma processing apparatus.

Background

The working principle of the plasma processing device is as follows: sufficient energy is exerted to gas and is made its ionization become plasma state, and then handle the work piece sample, realize purpose such as cleanness, plasma processing apparatus generally utilizes the vacuum pump to extract and washs intracavity gas in the market, maintain certain vacuum degree, in the part model, vacuum pump and plasma equipment main part formula installation as an organic whole, the heat that the vacuum pump during operation produced easily accumulates in the installation cavity, generally dispel the heat through installation fan or water-cooled tube, the fan uses simplely, but the energy consumption has been improved, the installation of water-cooled tube is also simpler, but need external water source to insert, it is not convenient enough to use, consequently, need to seek the improvement of way in addition.

SUMMERY OF THE UTILITY MODEL

In view of the above, the present invention is directed to a plasma processing apparatus to solve the above problems.

The technical scheme of the utility model is that:

the plasma processing device comprises a box body, a plasma equipment main body and a vacuum pump, wherein the box body is divided into an upper layer and a lower layer by a partition plate, the plasma equipment main body is arranged in an upper layer cavity, the vacuum pump is arranged in a lower layer cavity, and at least one surface in the lower layer cavity is provided with a heat dissipation mechanism which comprises a heat transfer sheet, a heat conduction column and a heat dissipation plate, the heat transfer sheet is positioned in the lower layer cavity, one end of the heat conduction column penetrates through the wall of the cavity and is fixed with the heat transfer sheet, the other end of the heat conduction column is fixed with the heat dissipation.

The improved structure of the plasma processing device is characterized in that the heat dissipation mechanism is arranged in the lower-layer cavity and used for dissipating heat, a fan or a water cooling device is omitted, heat in the lower-layer cavity is conducted out through the heat transfer fins matched with the heat conduction columns, and then the heat dissipation plate is used for dissipating heat, the structure of the heat dissipation plate is improved, the arc-shaped body is matched with the structure of the heat dissipation fins, the heat dissipation area is enlarged, and the heat dissipation efficiency is improved.

The convection cylinder is fixed on the wall of the box body, the other end of the heat dissipation plate is positioned in the convection cylinder, the heat dissipation plate heats air in the convection cylinder, the rising of hot air causes the air pressure in the cylinder to be low, and external air enters from the opening at the bottom of the cylinder to form convection heat dissipation, so that the heat dissipation efficiency is further improved.

Furthermore, the number of the heat dissipation plates at the lower part in the convection barrel is more than that of the heat dissipation plates at the upper part in the upper convection barrel, the air at the lower part is heated quickly, the heated air rises, and the outside air at the bottom of the convection barrel flows in to strengthen the convection effect.

Furthermore, the convection cylinder is a half cylinder body, two sides of the convection cylinder extend to form side plates, and the side plates are fixed with the wall of the box body through bolts, so that the convection cylinder is convenient to mount.

Further, establish the noise damping layer on the cavity inner wall of lower floor, including the perforated plate of top surface and bottom surface and fill the fire-retardant amortization cotton between the two, the noise damping layer is add to lower floor's cavity, reduces the noise that the vacuum pump produced, improves operational environment's comfort level.

Furthermore, a plurality of embedding holes are formed in the heat transfer sheet, the end portions of the heat conduction columns are fixed in the embedding holes, installation is facilitated, meanwhile, the vacuum pump and the heat dissipation mechanism are facilitated, and the lower-layer cavity is opened in the front face.

Further, trompil on the tank wall, the insulating layer is established to downthehole wall, and it is fixed with the heat transfer piece that the heat conduction post passes the hole, avoids tank wall and heat conduction post direct contact, and then leads to the phenomenon emergence of local high temperature damage tank wall.

Drawings

FIG. 1: embodiment 1 the overall structure of the present invention;

FIG. 2: part A enlarges the structure chart;

in the figure: 1. a box body; 2. a processing chamber; 3. a sealing door; 4. a control screen; 5. a vacuum pump; 6. a heat dissipation mechanism; 7. a sound-deadening layer; 61. a heat transfer sheet; 62. a heat-conducting column; 63. a heat dissipation plate; 631. a body; 632. and a heat sink.

Detailed Description

The following detailed description of the embodiments of the present invention is made with reference to the accompanying drawings, so that the technical solution of the present invention can be more easily understood and grasped.

Example 1

Referring to fig. 1 and 2, a plasma processing apparatus includes a chamber body 1 divided into an upper chamber and a lower chamber by a partition plate, a processing chamber 2 is formed at one side of the upper chamber, a plasma apparatus main body is installed in the upper chamber to apply sufficient energy to the gas in the processing chamber, a vacuum pump 5 is installed in the lower chamber to draw the gas in the processing chamber and maintain a certain vacuum degree, the processing chamber has a structure with a sealing door 3 installed at the front side, a glass window is formed on the sealing door, a control panel 4 is installed on the wall of the front chamber to start the vacuum pump, the plasma apparatus, etc., and heat dissipation mechanisms 6 are installed at two opposite side surfaces of the lower chamber, specifically, including a heat transfer sheet 61, a heat transfer column 62 and a heat dissipation plate 63, which are made of copper, a plurality of holes are formed on the sidewall of the chamber body, a heat insulation layer is formed on the inner peripheral wall of the hole, the heat transfer column is inserted, the other end of the heat conducting column protrudes out of the box body and is fixed with the heat dissipation plate, and the heat dissipation plate comprises an arc-shaped body 631 and heat dissipation fins 632 distributed on the arc-shaped body and is integrally formed.

The embodiment also comprises a convection cylinder, a semi-cylinder body is selected, the two ends of the convection cylinder are open, the two sides of the convection cylinder extend to form side plates, the side plates are fixed with the wall of the box body through bolts, the other ends of the heat dissipation plates are positioned in the convection cylinder, the number of the heat dissipation plates at the lower part of the convection cylinder is more than that of the heat dissipation plates at the upper part of the convection cylinder, 3 heat dissipation plates are arranged at the lower part, and 2 heat dissipation plates are: the air at the lower part is heated quickly, heated gas rises, and the outside air at the bottom of the convection barrel rushes in to strengthen the convection effect.

In addition, establish the noise damping layer on the cavity inner wall of lower floor, including the perforated plate of top surface and bottom surface and fill the fire-retardant amortization cotton between the two, the noise damping layer is add to lower floor's cavity, reduces the noise that the vacuum pump produced, improves operational environment's comfort level.

When the plasma processing device is used, a workpiece to be processed is placed into the processing chamber, and the plasma equipment and the vacuum pump are started through the control screen for processing.

Of course, the above is only a specific application example of the present invention, and the protection scope of the present invention is not limited at all. All the technical solutions formed by equivalent transformation or equivalent replacement fall within the protection scope of the present invention.

Claims

1. The plasma processing device comprises a box body, a plasma equipment main body and a vacuum pump, and is characterized in that the box body is divided into an upper layer and a lower layer by a partition plate, the plasma equipment main body is arranged in an upper layer cavity, the vacuum pump is arranged in a lower layer cavity, and a heat dissipation mechanism is arranged on at least one surface in the lower layer cavity and comprises a heat transfer sheet, a heat transfer column and a heat dissipation plate, wherein the heat transfer sheet is positioned in the lower layer cavity, one end of the heat transfer column penetrates through the cavity wall to be fixed with the heat transfer sheet, the other end of the heat transfer column is fixed with the heat dissipation plate.

2. The plasma processing apparatus according to claim 1, further comprising a convection cylinder fixed to the wall of the cabinet, the other end of the heat radiating plate being located in the convection cylinder.

3. The plasma processing apparatus according to claim 2, wherein the number of the heat radiating plates at the lower position in the convection drum is larger than that of the heat radiating plates at the upper position in the upper convection drum.

4. The plasma processing apparatus of claim 2, wherein the convection cylinder is a half cylinder, and both sides of the convection cylinder extend to form side plates, and the side plates are bolted to the wall of the tank.

5. The plasma processing apparatus according to claim 1, wherein the lower chamber has a sound-deadening layer on an inner wall thereof, the sound-deadening layer comprising perforated plates having a top surface and a bottom surface and flame-retardant sound-deadening cotton filled therebetween.

6. The plasma processing apparatus as claimed in claim 1, wherein the heat transfer plate has a plurality of insertion holes, and ends of the heat transfer posts are fixed in the insertion holes.

7. The plasma processing apparatus of claim 1, wherein the wall of the chamber is provided with an opening, the wall of the opening is provided with a thermal insulation layer, and the heat-conducting column is fixed to the heat-conducting plate through the opening.