CN210856406U - A single crystal furnace and its bottom heater - Google Patents

A single crystal furnace and its bottom heater Download PDF

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CN210856406U
CN210856406U CN201922090887.9U CN201922090887U CN210856406U CN 210856406 U CN210856406 U CN 210856406U CN 201922090887 U CN201922090887 U CN 201922090887U CN 210856406 U CN210856406 U CN 210856406U
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heating unit
single crystal
heating
crystal furnace
heating body
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刘礼猛
白枭龙
何丽珠
汪沛渊
杨俊�
邓清香
张涛
金浩
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Jinko Solar Co Ltd
JinkoSolar Holding Co Ltd
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Abstract

本申请公开了一种单晶炉底部加热器,包括呈筒状的侧部加热体和底部加热体;所述侧部加热体的底部设置有沿径向向内延伸的电极脚,且在垂直所述电极脚方向上设置有凹槽;所述底部加热体包括环状中心加热单元和辅助加热单元,所述辅助加热单元的第一端与所述中心加热单元相连,所述辅助加热单元的第二端与所述电极脚相连。可见,本申请中的底部加热器包括侧部加热体和底部加热体,可以同时对炉底和侧面进行加热,加热面积增加,加快坩埚内硅料的熔化速度,同时改善现有底部加热器在底部集中加热的缺陷,提高对硅料加热的均匀性,避免处于上层的硅料快速下落对坩埚造成损伤。此外,本申请还提供一种具有上述优点的单晶炉。

Figure 201922090887

The application discloses a bottom heater of a single crystal furnace, comprising a cylindrical side heating body and a bottom heating body; the bottom of the side heating body is provided with electrode feet extending radially inward, and is vertically A groove is provided in the direction of the electrode feet; the bottom heating body includes an annular central heating unit and an auxiliary heating unit, the first end of the auxiliary heating unit is connected to the central heating unit, and the auxiliary heating unit has a The second end is connected to the electrode pin. It can be seen that the bottom heater in this application includes a side heating body and a bottom heating body, which can heat the furnace bottom and the side at the same time, the heating area is increased, the melting speed of the silicon material in the crucible is accelerated, and the existing bottom heater is improved at the same time. The defect of concentrated heating at the bottom improves the uniformity of heating the silicon material and avoids the damage to the crucible caused by the rapid falling of the silicon material in the upper layer. In addition, the present application also provides a single crystal furnace with the above advantages.

Figure 201922090887

Description

一种单晶炉及其底部加热器A single crystal furnace and its bottom heater

技术领域technical field

本申请涉及加热器装置技术领域,特别是涉及一种单晶炉及其底部加热器。The present application relates to the technical field of heater devices, in particular to a single crystal furnace and a bottom heater thereof.

背景技术Background technique

直拉单晶制造法(Czochralski,CZ法)是制单晶硅的常用方法,将多晶硅块置于单晶炉的石英坩埚中,在单晶炉主加热器、底部加热器的作用下熔化,再将籽晶浸入熔液中,在合适的温度下拉制单晶。The Czochralski method (CZ method) is a common method for producing single crystal silicon. The polycrystalline silicon block is placed in the quartz crucible of the single crystal furnace and melted under the action of the main heater and the bottom heater of the single crystal furnace. The seed crystal is then dipped into the melt, and the single crystal is drawn down at a suitable temperature.

目前,单晶炉的底部加热器为单一配件,普遍造型为圆盘状,由中心对称的环形条状石墨围绕中心的圆进行旋转,最后到达电极的位置。底部加热器在炉底供热时,热量由底部中心传递到外周边部,使硅料块完全融化。由于底部集中加热,会出现底部过热的现象,并且靠近底部的硅料会先熔化,然后靠近边缘位置的硅料块下落继续熔化,这种逐层化料的方式,延长了化料的时间,并且由于底层成液态,边缘位置硅料块下落速度过快,会轻微撞击坩埚底部,造成坩埚磨损。At present, the bottom heater of the single crystal furnace is a single accessory, which is generally shaped as a disc, and is rotated around the center circle by a center-symmetric annular strip of graphite, and finally reaches the electrode position. When the bottom heater supplies heat at the bottom of the furnace, the heat is transferred from the center of the bottom to the outer periphery to completely melt the silicon block. Due to the concentrated heating of the bottom, the phenomenon of overheating at the bottom will occur, and the silicon material near the bottom will melt first, and then the silicon block near the edge will fall and continue to melt. And because the bottom layer is in liquid state, the falling speed of the silicon block at the edge is too fast, which will slightly hit the bottom of the crucible, causing the crucible to wear.

因此,如何解决上述技术问题应是本领域技术人员重点关注的。Therefore, how to solve the above technical problems should be the focus of those skilled in the art.

实用新型内容Utility model content

本申请的目的是提供一种单晶炉及其底部加热器,以提高加热均匀性,加快熔化硅料的速度,且降低对坩埚的损伤。The purpose of the present application is to provide a single crystal furnace and a bottom heater thereof, so as to improve the heating uniformity, speed up the melting of silicon material, and reduce the damage to the crucible.

为解决上述技术问题,本申请提供一种单晶炉底部加热器,包括呈筒状的侧部加热体和底部加热体;In order to solve the above technical problems, the present application provides a bottom heater of a single crystal furnace, which includes a cylindrical side heating body and a bottom heating body;

所述侧部加热体的底部设置有沿径向向内延伸的电极脚,且在垂直所述电极脚方向上设置有凹槽;The bottom of the side heating body is provided with electrode feet extending radially inward, and grooves are arranged in the direction perpendicular to the electrode feet;

所述底部加热体包括环状中心加热单元和辅助加热单元,所述辅助加热单元的第一端与所述中心加热单元相连,所述辅助加热单元的第二端与所述电极脚相连。The bottom heating body includes an annular central heating unit and an auxiliary heating unit, the first end of the auxiliary heating unit is connected to the central heating unit, and the second end of the auxiliary heating unit is connected to the electrode feet.

可选的,所述辅助加热单元为蛇形加热单元。Optionally, the auxiliary heating unit is a serpentine heating unit.

可选的,所述蛇形加热单元的数量为两个。Optionally, the number of the serpentine heating units is two.

可选的,所述电极脚和所述辅助加热单元的所述第二端均设置有螺孔。Optionally, both the electrode feet and the second end of the auxiliary heating unit are provided with screw holes.

可选的,所述电极脚与所述辅助加热单元相连的区域的厚度是未与所述辅助加热单元相连的区域的厚度的二分之一,所述辅助加热单元与所述电极脚相连的区域的厚度等于所述电极脚与所述辅助加热单元相连的区域的厚度。Optionally, the thickness of the area where the electrode feet are connected to the auxiliary heating unit is half the thickness of the area not connected to the auxiliary heating unit, and the auxiliary heating unit is connected to the electrode feet. The thickness of the area is equal to the thickness of the area where the electrode feet are connected to the auxiliary heating unit.

可选的,所述侧部加热体和所述底部加热体均为石墨加热体或均为碳-碳复合材料加热体。Optionally, both the side heating body and the bottom heating body are graphite heating bodies or both are carbon-carbon composite heating bodies.

本申请还提供一种单晶炉,所述单晶炉包括上述任一种所述的底部加热器。The present application also provides a single crystal furnace, wherein the single crystal furnace includes any one of the bottom heaters described above.

本申请所提供的单晶炉底部加热器,包括呈筒状的侧部加热体和底部加热体;所述侧部加热体的底部设置有沿径向向内延伸的电极脚,且在垂直所述电极脚方向上设置有凹槽;所述底部加热体包括环状中心加热单元和辅助加热单元,所述辅助加热单元的第一端与所述中心加热单元相连,所述辅助加热单元的第二端与所述电极脚相连。可见,本申请中的底部加热器可以同时对炉底和侧面进行加热,加热面积增加,加快坩埚内硅料的熔化速度,同时改善现有底部加热器在底部集中加热的缺陷,提高对硅料加热的均匀性,避免处于上层的硅料快速下落对坩埚造成损伤。此外,本申请还提供一种具有上述优点的单晶炉。The bottom heater of the single crystal furnace provided by the present application includes a cylindrical side heating body and a bottom heating body; the bottom of the side heating body is provided with electrode feet extending radially inward, and is vertically The electrode feet are provided with grooves in the direction; the bottom heating body includes a ring-shaped central heating unit and an auxiliary heating unit, the first end of the auxiliary heating unit is connected to the central heating unit, and the second end of the auxiliary heating unit is connected to the central heating unit. The two ends are connected to the electrode pins. It can be seen that the bottom heater in the present application can heat the furnace bottom and the side at the same time, the heating area is increased, the melting speed of the silicon material in the crucible is accelerated, and the defect that the existing bottom heater is centrally heated at the bottom is improved. The uniformity of heating can avoid the damage to the crucible caused by the rapid falling of the silicon material in the upper layer. In addition, the present application also provides a single crystal furnace with the above advantages.

附图说明Description of drawings

为了更清楚的说明本申请实施例或现有技术的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions of the embodiments of the present application or the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only For some embodiments of the present application, for those of ordinary skill in the art, other drawings can also be obtained according to these drawings without any creative effort.

图1为本申请实施例所提供的一种单晶炉底部加热器结构示意图;1 is a schematic structural diagram of a heater at the bottom of a single crystal furnace provided by an embodiment of the application;

图2为本申请实施例所提供的侧部加热体俯视图;2 is a top view of a side heating body provided by an embodiment of the present application;

图3为本申请实施例所提供的侧部加热体剖视图;3 is a cross-sectional view of a side heating body provided by an embodiment of the present application;

图4为本申请实施例所提供的底部加热体俯视图。FIG. 4 is a top view of the bottom heating body provided by the embodiment of the present application.

具体实施方式Detailed ways

为了使本技术领域的人员更好地理解本申请方案,下面结合附图和具体实施方式对本申请作进一步的详细说明。显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。In order to make those skilled in the art better understand the solution of the present application, the present application will be further described in detail below with reference to the accompanying drawings and specific embodiments. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

在下面的描述中阐述了很多具体细节以便于充分理解本实用新型,但是本实用新型还可以采用其他不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本实用新型内涵的情况下做类似推广,因此本实用新型不受下面公开的具体实施例的限制。In the following description, many specific details are set forth in order to fully understand the present utility model, but the present utility model can also be implemented in other ways different from those described herein, and those skilled in the art can do so without departing from the connotation of the present utility model. Therefore, the present invention is not limited by the specific embodiments disclosed below.

正如背景技术部分所述,现有的底部加热器对坩埚底部集中加热,会出现底部过热的现象,并且靠近底部的硅料会先熔化,然后靠近边缘位置的硅料块下落继续熔化,这种逐层化料的方式,延长了化料的时间,并且由于底层成液态,边缘位置硅料块下落速度过快,会轻微撞击坩埚底部,造成坩埚磨损。As mentioned in the background art section, the existing bottom heater concentrates heating on the bottom of the crucible, and the bottom of the crucible will be overheated, and the silicon material near the bottom will melt first, and then the silicon material near the edge will fall and continue to melt. The method of layer-by-layer materialization prolongs the materialization time, and because the bottom layer is liquid, the falling speed of the silicon block at the edge position is too fast, which will slightly hit the bottom of the crucible, causing wear of the crucible.

有鉴于此,本申请提供了一种单晶炉底部加热器,请参考图1至图3,图1为本申请实施例所提供的一种单晶炉底部加热器结构示意图,图2为本申请实施例所提供的侧部加热体俯视图,图3为本申请实施例所提供的侧部加热体剖视图,该底部加热器包括呈筒状的侧部加热体1和底部加热体2;In view of this, the present application provides a single crystal furnace bottom heater, please refer to FIGS. 1 to 3 , FIG. 1 is a schematic structural diagram of a single crystal furnace bottom heater provided by an embodiment of the application, and FIG. 2 is a The top view of the side heater provided by the embodiment of the application, FIG. 3 is a cross-sectional view of the side heater provided by the embodiment of the application, and the bottom heater includes a cylindrical side heater 1 and a bottom heater 2;

所述侧部加热体1的底部设置有沿径向向内延伸的电极脚11,且在垂直所述电极脚方向上设置有凹槽12;The bottom of the side heating body 1 is provided with electrode feet 11 extending radially inward, and a groove 12 is provided in the direction perpendicular to the electrode feet;

所述底部加热体2包括环状中心加热单元21和辅助加热单元22,所述辅助加热单元22的第一端与所述中心加热单元21相连,所述辅助加热单元22的第二端与所述电极脚11相连。The bottom heating body 2 includes an annular central heating unit 21 and an auxiliary heating unit 22, the first end of the auxiliary heating unit 22 is connected to the central heating unit 21, and the second end of the auxiliary heating unit 22 is connected to the central heating unit 21. The electrode pins 11 are connected.

需要说明的是,辅助加热单元22的第一端、第二端分别为辅助加热单元22的首部和尾部。It should be noted that the first end and the second end of the auxiliary heating unit 22 are the head and the tail of the auxiliary heating unit 22 respectively.

需要说明的是,侧部加热体1在与主加热器电极位置相对区域的凹槽12宽度大于其他区域的凹槽12,以为主加热器电极空出位置,并且相邻凹槽12的开口方向相反。It should be noted that the width of the groove 12 of the side heater 1 in the area opposite to the main heater electrode is larger than that of the groove 12 in other areas, so that the main heater electrode is vacated, and the opening direction of the adjacent groove 12 on the contrary.

可选的,在本申请的一个实施例中,所述辅助加热单元22为蛇形加热单元,请参考图4,但是本申请对此并不做具体限定,在本申请的其他实施例中,辅助加热单元22还可以为辐条状加热单元。Optionally, in an embodiment of the present application, the auxiliary heating unit 22 is a serpentine heating unit, please refer to FIG. 4 , but this application does not specifically limit this. In other embodiments of the present application, The auxiliary heating unit 22 may also be a spoke-shaped heating unit.

进一步地,当辅助加热单元22为蛇形加热单元时,所述蛇形加热单元的数量为两个,当辅助加热单元22为辐条状加热单元时,辐条状加热单元的数量,可自行设置。Further, when the auxiliary heating unit 22 is a serpentine heating unit, the number of the serpentine heating units is two, and when the auxiliary heating unit 22 is a spoke heating unit, the number of the spoke heating units can be set by yourself.

需要说明的是,本实施例中对侧部加热体1和底部加热体2的材料不做具体限定,视情况而定。例如,所述侧部加热体1和所述底部加热体2均为石墨加热体或均为碳-碳复合材料加热体。It should be noted that in this embodiment, the materials of the side heating body 1 and the bottom heating body 2 are not specifically limited, depending on the situation. For example, the side heating body 1 and the bottom heating body 2 are both graphite heating bodies or carbon-carbon composite heating bodies.

本申请中的底部加热器包括侧部加热体1和底部加热体2,其中,侧部加热器具有沿径向向内延伸的电极脚11,并且在垂直电极脚方向上设置有凹槽12,底部加热体2包括环状的中心加热单元21和辅助加热单元22,辅助加热单元22分别与电极脚11、中心加热单元21 相连,底部加热器可以同时对炉底和侧面进行加热,加热面积增加,加快坩埚内硅料的熔化速度,同时改善现有底部加热器在底部集中加热的缺陷,提高对硅料加热的均匀性,避免处于上层的硅料快速下落对坩埚造成损伤。The bottom heater in this application includes a side heating body 1 and a bottom heating body 2, wherein the side heater has electrode feet 11 extending radially inward, and grooves 12 are provided in the direction perpendicular to the electrode feet, The bottom heating body 2 includes a ring-shaped central heating unit 21 and an auxiliary heating unit 22. The auxiliary heating unit 22 is respectively connected with the electrode feet 11 and the central heating unit 21. The bottom heater can simultaneously heat the furnace bottom and sides, increasing the heating area. , to speed up the melting speed of the silicon material in the crucible, and at the same time to improve the defect of the existing bottom heater in the bottom of the centralized heating, improve the uniformity of the heating of the silicon material, and avoid the damage to the crucible caused by the rapid falling of the silicon material in the upper layer.

优选地,所述电极脚11和所述辅助加热单元22的所述第二端均设置有螺孔,通过螺丝将电极脚11和辅助加热单元22连接,当侧部加热体1和底部加热体2中任一个损坏时,可以只更换损坏的部分,降低底部加热器成本,延长使用寿命。Preferably, the second ends of the electrode feet 11 and the auxiliary heating unit 22 are provided with screw holes, and the electrode feet 11 and the auxiliary heating unit 22 are connected by screws. When the side heating body 1 and the bottom heating body are connected When any one of 2 is damaged, only the damaged part can be replaced, which reduces the cost of the bottom heater and prolongs the service life.

在上述实施例的基础上,在本申请的一个实施例中,所述电极脚11与所述辅助加热单元22相连的区域的厚度是未与所述辅助加热单元22相连的区域的厚度的二分之一,所述辅助加热单元22与所述电极脚11相连的区域的厚度等于所述电极脚11与所述辅助加热单元22 相连的区域的厚度,即电极脚11与辅助单元连接后层叠的厚度与电极脚11未与辅助加热单元22相连的区域的厚度相等,为一个平整的表面,提高电极脚11与辅助单元连接稳定性。On the basis of the above embodiment, in an embodiment of the present application, the thickness of the area where the electrode pins 11 are connected to the auxiliary heating unit 22 is two times the thickness of the area not connected to the auxiliary heating unit 22 . The thickness of the area where the auxiliary heating unit 22 is connected to the electrode pin 11 is equal to the thickness of the area where the electrode pin 11 is connected to the auxiliary heating unit 22, that is, the electrode pin 11 is connected to the auxiliary unit and then stacked The thickness of the electrode pin 11 is equal to the thickness of the area where the electrode pin 11 is not connected with the auxiliary heating unit 22, which is a flat surface, which improves the connection stability of the electrode pin 11 and the auxiliary unit.

本申请还提供一种单晶炉,所述单晶炉包括上述任一种所述的底部加热器。The present application also provides a single crystal furnace, wherein the single crystal furnace includes any one of the bottom heaters described above.

本实施例的单晶炉中的底部加热器包括侧部加热体1和底部加热体2,其中,侧部加热器具有沿径向向内延伸的电极脚,并且在垂直电极脚方向上设置有凹槽12,底部加热体2包括环状的中心加热单元 21和辅助加热单元22,辅助加热单元22分别与电极脚、中心加热单元21相连,底部加热器可以同时对炉底和侧面进行加热,加热面积增加,加快坩埚内硅料的熔化速度,同时改善现有底部加热器在底部集中加热的缺陷,提高对硅料加热的均匀性,避免处于上层的硅料快速下落对坩埚造成损伤。The bottom heater in the single crystal furnace of this embodiment includes a side heating body 1 and a bottom heating body 2, wherein the side heater has electrode feet extending radially inward, and is provided with a vertical direction of the electrode feet. The groove 12, the bottom heating body 2 includes a ring-shaped central heating unit 21 and an auxiliary heating unit 22, the auxiliary heating unit 22 is respectively connected with the electrode feet and the central heating unit 21, and the bottom heater can simultaneously heat the furnace bottom and sides, The heating area is increased, the melting speed of the silicon material in the crucible is accelerated, and the defect that the existing bottom heater is concentrated at the bottom is improved, the uniformity of heating the silicon material is improved, and the rapid falling of the silicon material in the upper layer causes damage to the crucible.

本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是与其它实施例的不同之处,各个实施例之间相同或相似部分互相参见即可。对于实施例公开的装置而言,由于其与实施例公开的方法相对应,所以描述的比较简单,相关之处参见方法部分说明即可。The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments may be referred to each other. As for the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant part can be referred to the description of the method.

以上对本申请所提供的单晶炉及其底部加热器进行了详细介绍。本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的方法及其核心思想。应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以对本申请进行若干改进和修饰,这些改进和修饰也落入本申请权利要求的保护范围内。The single crystal furnace and the bottom heater thereof provided by the present application have been introduced in detail above. Specific examples are used herein to illustrate the principles and implementations of the present application, and the descriptions of the above embodiments are only used to help understand the methods and core ideas of the present application. It should be pointed out that for those of ordinary skill in the art, without departing from the principles of the present application, several improvements and modifications can also be made to the present application, and these improvements and modifications also fall within the protection scope of the claims of the present application.

Claims (7)

1. A bottom heater of a single crystal furnace is characterized by comprising a cylindrical side heating body and a cylindrical bottom heating body;
the bottom of the side heating body is provided with electrode pins which extend inwards along the radial direction, and grooves are formed in the direction vertical to the electrode pins;
the bottom heating body comprises an annular central heating unit and an auxiliary heating unit, the first end of the auxiliary heating unit is connected with the central heating unit, and the second end of the auxiliary heating unit is connected with the electrode pin.
2. The single crystal furnace bottom heater of claim 1, wherein the auxiliary heating unit is a serpentine heating unit.
3. The single crystal furnace bottom heater according to claim 2, wherein the number of the serpentine heating units is two.
4. The single crystal furnace bottom heater according to claim 1, wherein said electrode pin and said second end of said auxiliary heating unit are provided with screw holes.
5. The single crystal furnace bottom heater according to claim 4, wherein the thickness of the region where the electrode pin is connected to the auxiliary heating unit is one half of the thickness of the region where the electrode pin is not connected to the auxiliary heating unit, and the thickness of the region where the auxiliary heating unit is connected to the electrode pin is equal to the thickness of the region where the electrode pin is connected to the auxiliary heating unit.
6. A bottom heater of a single crystal furnace according to any one of claims 1 to 5, wherein the side heating body and the bottom heating body are both graphite heating bodies or both carbon-carbon composite heating bodies.
7. A single crystal furnace, characterized in that it comprises a bottom heater according to any one of claims 1 to 6.
CN201922090887.9U 2019-11-28 2019-11-28 A single crystal furnace and its bottom heater Active CN210856406U (en)

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