CN210765478U - Wound body of metal plate, package body provided with wound body, and metal plate - Google Patents

Wound body of metal plate, package body provided with wound body, and metal plate Download PDF

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Publication number
CN210765478U
CN210765478U CN201920865050.4U CN201920865050U CN210765478U CN 210765478 U CN210765478 U CN 210765478U CN 201920865050 U CN201920865050 U CN 201920865050U CN 210765478 U CN210765478 U CN 210765478U
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China
Prior art keywords
metal plate
shaft member
vapor deposition
deposition mask
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CN201920865050.4U
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Chinese (zh)
Inventor
池永知加雄
舟津宇紘
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/40Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling foils which present special problems, e.g. because of thinness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B3/00Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
    • B21B3/02Rolling special iron alloys, e.g. stainless steel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21CMANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C37/00Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape
    • B21C37/02Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape of sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21CMANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C47/00Winding-up, coiling or winding-off metal wire, metal band or other flexible metal material characterised by features relevant to metal processing only
    • B21C47/28Drums or other coil-holders
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26Methods of annealing
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00Heat treatment of ferrous alloys
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00Heat treatment of ferrous alloys
    • C21D6/001Heat treatment of ferrous alloys containing Ni
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00Heat treatment of ferrous alloys
    • C21D6/007Heat treatment of ferrous alloys containing Co
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/02Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties by deformation combined with, or followed by, heat treatment
    • C21D8/02Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/0221Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the working steps
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0081Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for slabs; for billets
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/03Alloys based on nickel or cobalt based on nickel
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/08Ferrous alloys, e.g. steel alloys containing nickel
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/10Ferrous alloys, e.g. steel alloys containing cobalt
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/10Ferrous alloys, e.g. steel alloys containing cobalt
    • C22C38/105Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/28Acidic compositions for etching iron group metals
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
  • Winding, Rewinding, Material Storage Devices (AREA)

Abstract

The utility model relates to a coiling body of metal sheet, possess the packing body and the metal sheet of coiling body. Provided is a roll body capable of appropriately performing an inspection process of a vapor deposition mask. A wound body of a metal plate for manufacturing a vapor deposition mask is provided with: a shaft member having an outer diameter of 150mm or more and 550mm or less; and a metal plate wound around the shaft member and having a thickness of 50 μm or less.

Description

Wound body of metal plate, package body provided with wound body, and metal plate
Technical Field
Embodiments of the present application relate to a wound body of a metal plate, a package body including the wound body, and a metal plate.
Background
In recent years, display devices used in portable devices such as smartphones and tablet computers are required to have high definition, and for example, the pixel density is required to be 500ppi or more. In addition, demand for Ultra High Definition (UHD) has been increasing for portable devices, and in such cases, the pixel density of a display device is required to be, for example, 800ppi or more.
Organic EL display devices have attracted attention because of their good responsiveness and low power consumption. As a method for forming pixels of an organic EL display device, a method is known in which pixels are formed in a desired pattern using a vapor deposition mask including through holes arranged in a desired pattern. Specifically, first, a vapor deposition mask is brought into close contact with a substrate for an organic EL display device, and then the vapor deposition mask and the substrate brought into close contact are put into a vapor deposition device together to perform vapor deposition of an organic material or the like.
The vapor deposition mask includes, for example, a metal plate and two or more through holes penetrating the metal plate. Such a vapor deposition mask is manufactured by forming a through hole in a metal plate by etching, for example, as disclosed in patent document 1.
Documents of the prior art
Patent document
Patent document 1: japanese patent No. 5382259
SUMMERY OF THE UTILITY MODEL
Problem to be solved by utility model
As one of the methods of supplying the metal plate, a wound body in which a metal plate is wound around a shaft member is known. When a vapor deposition mask is produced using a metal plate of a roll, a metal plate unwound from the roll is subjected to a process such as etching.
During the winding of the metal plate on the shaft member, the metal plate is deformed in accordance with the shape of the shaft member. If such distortion remains in the vapor deposition mask made of the metal plate, it is considered that the accuracy in measuring the size or the like of the vapor deposition mask in the inspection step of the vapor deposition mask is lowered or cannot be measured.
An object of an embodiment of the present application is to provide a wound body that can effectively solve such a problem.
Means for solving the problems
The present invention according to claim 1 is a roll of a metal plate for manufacturing a vapor deposition mask, comprising: a shaft member having an outer diameter of 150mm or more and 550mm or less; and the metal plate wound around the shaft member and having a thickness of 50 μm or less.
In the wound body according to claim 1, the metal sheet may have an iron alloy containing 30 mass% or more and 54 mass% or less of nickel.
In the wound body according to claim 3 of the present application, in the wound body according to claim 1 or 2, the outer diameter of the shaft member may be 300mm or less, and the thickness of the metal plate may be 30 μm or less.
The 4 th aspect of the present application is the wound body according to the 3 rd aspect, wherein the weight of the wound body may be 70kg or less.
The 5 th aspect of the present application is the wound body according to the 3 rd or 4 th aspect, wherein the shaft member may include a phenolic resin.
In the present invention according to claim 6, in the wound body according to each of the above-described 3 to 5, the shaft member may be a hollow member having an inner diameter of 100mm or more.
In the wound body according to claim 7 of the present application, a difference between an outer diameter and an inner diameter of the shaft member may be 5mm or more.
The 8 th aspect of the present application is the wound body according to the 1 st or 2 nd aspect, wherein the outer diameter of the shaft member may be 300mm or more and 550mm or less, and the thickness of the metal plate may be 50 μm or less.
The 9 th aspect of the present application is the wound body according to the 8 th aspect, wherein the wound body may have a weight of 100kg or less.
A package according to claim 10 of the present application includes: a roll of metal plate for manufacturing a vapor deposition mask; and a container that houses the roll body, the roll body including: a shaft member having an outer diameter of 150mm or more and 550mm or less; and the metal plate wound around the shaft member and having a thickness of 50 μm or less.
In the package according to claim 11 of the present application, in the package according to claim 10, the container includes a side portion that supports the shaft member, and the side portion may support the shaft member such that the metal plate of the wound body is positioned above a lower end of the side portion.
In a 12 th aspect of the present application, in the package according to the 11 th aspect, the container may include: a lower portion located below the winding body; and the side portion that supports the shaft member so that the metal plate of the winding body does not contact the lower portion.
In the package according to claim 13 of the present application, in the package according to claim 12, the container may include an upper portion covering the wound body from above.
The 14 th aspect of the present application may further include a deoxidizer or a desiccant positioned inside the container in each of the 10 th aspect to the 13 th aspect.
A 15 th aspect of the present application is a metal plate used for manufacturing a vapor deposition mask, the metal plate being wound around a shaft member having an outer diameter of 150mm or more and 550mm or less, wherein the metal plate has a thickness of 50 μm or less.
Effect of the utility model
According to the embodiments of the present application, the metal plate can be stored appropriately.
Drawings
Fig. 1 is a diagram illustrating a vapor deposition device including a vapor deposition mask device according to an embodiment.
Fig. 2 is a sectional view showing an organic EL display device manufactured using the vapor deposition mask device shown in fig. 1.
Fig. 3 is a plan view showing a vapor deposition mask device according to one embodiment.
Fig. 4 is a partial plan view showing an effective region of the vapor deposition mask shown in fig. 3.
Fig. 5 is a sectional view taken along line V-V of fig. 4.
Fig. 6 is a view showing a step of rolling a base material to obtain a metal plate having a desired thickness.
Fig. 7 is a view showing a process of annealing a metal plate obtained by rolling.
Fig. 8 is a perspective view showing a wound body including a metal plate wound around a shaft member.
Fig. 9 is a sectional view of the jelly roll.
Fig. 10A is a perspective view showing the roll body housed in the container.
Fig. 10B is a cross-sectional view along line XB-XB of fig. 10A.
Fig. 11 is a diagram illustrating a method of measuring warpage generated in a metal plate.
Fig. 12 is a view showing the metal plate of fig. 11 when viewed from the direction of arrow XII.
Fig. 13 is a schematic view for explaining an example of a method for manufacturing a vapor deposition mask as a whole.
Fig. 14 is a view showing a process of providing a resist film on a metal plate.
Fig. 15 is a diagram showing a process of patterning a resist film.
Fig. 16 is a diagram illustrating a first surface etching process.
Fig. 17 is a diagram showing a second surface etching process.
Fig. 18 is a diagram illustrating an example of an inspection process of a vapor deposition mask.
Fig. 19 is a view showing the vapor deposition mask of fig. 18 when viewed from the direction of arrow XIX.
Fig. 20 is a sectional view showing a modification of the wound body.
Fig. 21 is a cross-sectional view showing an example of the wound body when cut by a plane parallel to the axial direction of the shaft member and passing through the axis of the shaft member.
Fig. 22 is a cross-sectional view showing an example of the wound body when cut by a plane parallel to the axial direction of the shaft member and passing through the axis of the shaft member.
Fig. 23 is a sectional view showing an example of the wound body cut by a plane parallel to the axial direction of the shaft member and passing through the axis of the shaft member.
Fig. 24 is a cross-sectional view showing an example of the roll body cut along the line a-a in fig. 23.
Fig. 25 is a cross-sectional view showing an example of the roll body cut along the line a-a in fig. 23.
Fig. 26 is a sectional view showing a modification of the package body.
Fig. 27 is a sectional view showing a modification of the package body.
Fig. 28 is a sectional view showing a modification of the package body.
Fig. 29 is a sectional view showing a modification of the package body.
Detailed Description
In the present specification and the present drawings, unless otherwise specified, terms such as "plate", "sheet", "film", and the like are not distinguished from each other only on the basis of differences in terms of names. For example, "plate" is a concept also including members that may be referred to as sheets or films. The "surface (sheet surface, film surface)" refers to a surface of a plate-shaped member (sheet-shaped member, film-shaped member) as a target aligned with a planar direction when the plate-shaped member (sheet-shaped member, film-shaped member) as a target is viewed as a whole and substantially viewed. The normal direction used for a plate-shaped (sheet-shaped or film-shaped) member means a normal direction to a surface (sheet surface or film surface) of the member. Terms used in the present specification to specify conditions of shape and geometry and their degrees, such as "parallel" and "orthogonal", and values of length and angle, are not limited to strict meanings, and are interpreted to include ranges of degrees to which the same functions can be expected.
In the present specification and the drawings, unless otherwise specified, "up (or down)", or "up (or down)" of a certain component such as a certain component or a certain region constituting another component such as another component or another region includes not only a case where the certain component is in direct contact with another component but also a case where another component is included between the certain component and another component. Unless otherwise specified, the description may be made using terms such as up (or upper side, upper side) or down (or lower side, lower side), but the up-down direction may be reversed.
In the present specification and the drawings, the same or similar reference numerals are used for the same or similar components unless otherwise specified, and redundant description thereof will be omitted. For convenience of explanation, the dimensional ratios in the drawings may be different from the actual ratios, or some components may be omitted from the drawings.
In the present specification and the drawings, unless otherwise specified, other embodiments and modifications may be combined within a range not inconsistent with each other. In addition, other embodiments, and modifications may be combined within a range not inconsistent with each other. Further, the modifications may be combined with each other within a range not contradictory to each other.
In the present specification and the present drawings, unless otherwise specified, when two or more steps are disclosed with respect to a method such as a manufacturing method, other steps not disclosed may be performed between the disclosed steps. The order of the steps disclosed is arbitrary within a range not inconsistent with each other.
In the present specification and the drawings, unless otherwise specified, the numerical ranges expressed by the symbols "to" include numerical values before and after the symbols "to". For example, the numerical range defined by the expression "34 to 38 mass%" is the same as the numerical range defined by the expression "34 mass% or more and 38 mass% or less".
In one embodiment of the present description, an example of a vapor deposition mask for patterning an organic material in a desired pattern on a substrate in the production of an organic EL display device and a method for producing the same will be described. However, the present embodiment is not limited to such an application, and can be applied to any vapor deposition mask used for various applications.
Hereinafter, one embodiment of the present application will be described in detail with reference to the drawings. The embodiments described below are examples of the embodiments of the present application, and the present application is not limited to these embodiments.
First, a vapor deposition device 90 that performs a vapor deposition process for depositing a vapor deposition material on an object will be described with reference to fig. 1. As shown in fig. 1, the vapor deposition device 90 may have a vapor deposition source (e.g., a crucible 94), a heater 96, and a vapor deposition mask device 10 inside thereof. The vapor deposition device 90 may further include an exhaust unit for making the inside of the vapor deposition device 90 a vacuum atmosphere. The crucible 94 contains a deposition material 98 such as an organic light emitting material. The heater 96 heats the crucible 94 to evaporate the evaporation material 98 in a vacuum atmosphere. The vapor deposition mask device 10 is disposed to face the crucible 94.
The vapor deposition mask device 10 will be described below. As shown in fig. 1, the vapor deposition mask device 10 may include at least one vapor deposition mask 20 and a frame 15 that supports the vapor deposition mask 20. The frame 15 supports the vapor deposition mask 20 in a state where the vapor deposition mask 20 is stretched in the surface direction thereof so that the vapor deposition mask 20 is not bent. As shown in fig. 1, the vapor deposition mask device 10 is disposed in a vapor deposition device 90 such that a vapor deposition mask 20 faces a substrate (for example, an organic EL substrate) 92 as an object to which a vapor deposition material 98 is to be attached. In the following description, the surface of the vapor deposition mask 20 on the organic EL substrate 92 side is referred to as a first surface 20a, and the surface opposite to the first surface 20a is referred to as a second surface 20 b.
As shown in fig. 1, the vapor deposition mask device 10 may include a magnet 93, and the magnet 93 may be disposed on a surface of the organic EL substrate 92 opposite to the vapor deposition mask 20. By providing the magnet 93, the vapor deposition mask 20 is attracted toward the magnet 93 by a magnetic force, and the vapor deposition mask 20 can be brought into close contact with the organic EL substrate 92. Alternatively, the vapor deposition mask 20 may be brought into close contact with the organic EL substrate 92 by using an electrostatic chuck utilizing electrostatic force (coulomb force).
Fig. 3 is a plan view of the vapor deposition mask device 10 viewed from the first surface 20a side of the vapor deposition mask 20. As shown in fig. 3, the vapor deposition mask device 10 may include two or more vapor deposition masks 20. In the present embodiment, each vapor deposition mask 20 has a rectangular shape extending in the first direction D1. In the vapor deposition mask device 10, two or more vapor deposition masks 20 are arranged in the second direction D2 that intersects the first direction D1 of the vapor deposition masks 20. Each vapor deposition mask 20 is fixed to the frame 15 by, for example, welding at both end portions of the vapor deposition mask 20 in the first direction D1.
The vapor deposition mask 20 includes a rectangular metal plate extending in the first direction D1, and two or more through holes 25 penetrating the metal plate. The vapor deposition material 98 evaporated from the crucible 94 and reaching the vapor deposition mask device 10 passes through the through-hole 25 of the vapor deposition mask 20 and adheres to the organic EL substrate 92. This allows the vapor deposition material 98 to be formed on the surface of the organic EL substrate 92 in a desired pattern corresponding to the positions of the through holes 25 of the vapor deposition mask 20.
Fig. 2 is a cross-sectional view showing an organic EL display device 100 manufactured using the vapor deposition device 90 of fig. 1. The organic EL display device 100 may include an organic EL substrate 92 and pixels including a vapor deposition material 98 provided in a pattern. In the organic EL display device 100 of fig. 2, electrodes for applying a voltage to pixels including the vapor deposition material 98 are omitted. After the vapor deposition step of providing the vapor deposition material 98 in a pattern on the organic EL substrate 92, the organic EL display device 100 of fig. 2 can be further provided with other components of the organic EL display device. Therefore, the organic EL display device 100 of fig. 2 may also be referred to as an intermediate of the organic EL display device.
When color display by a plurality of colors is desired, vapor deposition devices 90 on which vapor deposition masks 20 corresponding to the respective colors are mounted are prepared, and organic EL substrates 92 are sequentially loaded into the vapor deposition devices 90. This allows, for example, the organic light-emitting material for red, the organic light-emitting material for green, and the organic light-emitting material for blue to be sequentially deposited on the organic EL substrate 92.
The vapor deposition treatment may be performed inside the vapor deposition device 90 in a high-temperature atmosphere. In this case, the vapor deposition mask 20, the frame 15, and the organic EL substrate 92 held in the vapor deposition device 90 are also heated during the vapor deposition process. At this time, the vapor deposition mask 20, the frame 15, and the organic EL substrate 92 exhibit a behavior of dimensional change based on the respective thermal expansion coefficients. In this case, if there is a large difference in the thermal expansion coefficient between the vapor deposition mask 20, the frame 15, and the organic EL substrate 92, a positional deviation occurs due to the difference in the dimensional change, and as a result, the dimensional accuracy and positional accuracy of the vapor deposition material adhering to the organic EL substrate 92 are degraded.
In order to solve such a problem, the thermal expansion coefficients of the vapor deposition mask 20 and the frame 15 are preferably equal to the thermal expansion coefficient of the organic EL substrate 92. For example, when a glass substrate is used as the organic EL substrate 92, an iron alloy containing nickel may be used as a main material of the vapor deposition mask 20 and the frame 15. The iron alloy may contain cobalt in addition to nickel. For example, as a material of the metal plate constituting the vapor deposition mask 20, an iron alloy in which the total content of nickel and cobalt is 30 mass% or more and 54 mass% or less and the content of cobalt is 0 mass% or more and 6 mass% or less can be used. Specific examples of the iron alloy containing nickel or nickel and cobalt include: an invar alloy material containing 34 to 38 mass% of nickel; a super invar alloy material containing cobalt in addition to 30 to 34 mass% of nickel; a low thermal expansion Fe-Ni-based plating alloy containing 38 to 54 mass% of nickel; and so on.
Note that, when the temperatures of the vapor deposition mask 20, the frame 15, and the organic EL substrate 92 do not reach high temperatures during the vapor deposition process, the thermal expansion coefficients of the vapor deposition mask 20 and the frame 15 may not be set to the same value as the thermal expansion coefficient of the organic EL substrate 92. In this case, as a material constituting the vapor deposition mask 20, a material other than the above-described iron alloy can be used. For example, an iron alloy other than the nickel-containing iron alloy described above, such as a chromium-containing iron alloy, may be used. As the chromium-containing iron alloy, for example, an iron alloy called so-called stainless steel can be used. Further, an alloy other than an iron alloy such as nickel or a nickel-cobalt alloy may be used.
Next, the vapor deposition mask 20 will be described in detail. As shown in fig. 3, the vapor deposition mask 20 includes: a first edge portion 17a and a second edge portion 17b that face each other in the first direction D1 of the vapor deposition mask 20; and an intermediate portion 18 located between the pair of edge portions 17a, 17 b.
First, the edge portions 17a and 17b will be described in detail. The edge portions 17a and 17b are portions of the vapor deposition mask 20 fixed to the frame 15. The first edge portion 17a includes a first end portion 20e that is one end of the vapor deposition mask 20 in the first direction D1. The second edge portion 17b includes a second end portion 20f that is the other end of the vapor deposition mask 20 in the first direction D1.
In the present embodiment, the edge portions 17a and 17b are integrally formed with the intermediate portion 18. The edge portions 17a and 17b may be formed of a member different from the intermediate portion 18. In this case, the edge portions 17a, 17b are joined to the intermediate portion 18 by, for example, welding.
Next, the intermediate portion 18 will be described. The intermediate portion 18 includes: at least one effective region 22 in which a through hole 25 is formed from the first surface 20a to the second surface 20 b; and a peripheral region 23 surrounding the effective region 22. The effective region 22 is a region of the vapor deposition mask 20 facing the display region of the organic EL substrate 92.
In the example shown in fig. 3, the intermediate portion 18 includes a plurality of effective regions 22 arranged at predetermined intervals along the first direction D1 of the vapor deposition mask 20. One effective area 22 corresponds to a display area of one organic EL display device 100. Therefore, the vapor deposition mask device 10 shown in fig. 1 can perform vapor deposition (multi-surface vapor deposition) of an organic EL display device 100. One effective area 22 may correspond to two or more display areas. Although not shown, a plurality of effective regions 22 may be arranged at predetermined intervals in the second direction D2 of the vapor deposition mask 20.
As shown in fig. 3, the effective region 22 has, for example, an approximately quadrangular shape in plan view, more precisely, an approximately rectangular outline in plan view. Although not shown, each effective region 22 may have a contour of various shapes depending on the shape of the display region of the organic EL substrate 92. For example, each active area 22 may also have a circular contour.
Next, the effective region 22 will be described in detail. Fig. 4 is a plan view showing the effective region 22 in an enlarged manner from the second surface 20b side of the vapor deposition mask 20. As shown in fig. 4, in the illustrated example, two or more through holes 25 formed in each effective region 22 may be arranged at a predetermined pitch in two directions perpendicular to each other in the effective region 22.
Fig. 5 is a cross-sectional view of the active area 22 of fig. 4 along the V-V direction. As shown in fig. 5, two or more through holes 25 penetrate from a first surface 20a, which is one side along the normal direction N of the vapor deposition mask 20, to a second surface 20b, which is the other side along the normal direction N of the vapor deposition mask 20. In the illustrated example, as described in detail below, the first concave portion 30 is formed by etching on the first surface 51a of the metal plate 51, which is one side in the normal direction N of the vapor deposition mask 20; the second concave portion 35 is formed on the second surface 51b of the metal plate 51, which is the other side in the normal direction N of the vapor deposition mask 20. The first recess 30 is connected to the second recess 35, whereby the second recess 35 and the first recess 30 are formed in communication with each other. The through-hole 25 is constituted by the second recess 35 and the first recess 30 connected to the second recess 35. As shown in fig. 4 and 5, the wall surface 31 of the first recess 30 and the wall surface 36 of the second recess 35 are connected by a circumferential connecting portion 41. The connecting portion 41 defines a through portion 42 having the smallest opening area of the through hole 25 in a plan view of the vapor deposition mask 20.
As shown in fig. 5, two adjacent through holes 25 are spaced apart from each other along the first surface 51a of the metal plate 51 on the first surface 20a side of the vapor deposition mask 20, and two adjacent second concave portions 35 may be spaced apart from each other along the second surface 51b of the metal plate 51 on the second surface 20b side of the vapor deposition mask 20, that is, the second surface 51b of the metal plate 51 may remain between the two adjacent second concave portions 35. in the following description, a portion remaining without being etched in the effective region 22 of the second surface 51b of the metal plate 51 is also referred to as a top portion 43. by producing the vapor deposition mask 20 so that such a top portion 43 remains, the vapor deposition mask 20 can be made to have sufficient strength, and thus, for example, the vapor deposition mask 20 can be suppressed from being damaged during conveyance, it is necessary to describe that when the width β of the top portion 43 is too large, a shadow is generated in the vapor deposition step, and thus the utilization efficiency of the vapor deposition material 98 may be lowered.
When the vapor deposition mask device 10 is housed in the vapor deposition device 90 as shown in fig. 1, the first surface 20a of the vapor deposition mask 20 faces the organic EL substrate 92, and the second surface 20b of the vapor deposition mask 20 is positioned on the crucible 94 side holding the vapor deposition material 98, as shown by the two-dot chain line in fig. 5. Therefore, the vapor deposition material 98 adheres to the organic EL substrate 92 through the second concave portion 35 whose opening area gradually decreases. As shown by an arrow from the second surface 20b side toward the first surface 20a in fig. 5, the vapor deposition material 98 moves not only from the crucible 94 toward the organic EL substrate 92 along the normal direction N of the organic EL substrate 92, but also in a direction greatly inclined with respect to the normal direction N of the organic EL substrate 92. At this time, if the thickness of the vapor deposition mask 20 is large, the vapor deposition material 98 moving obliquely tends to catch on the ceiling portion 43, the wall surface 36 of the second concave portion 35, or the wall surface 31 of the first concave portion 30, and as a result, the proportion of the vapor deposition material 98 that cannot pass through the through-holes 25 increases. Therefore, in order to improve the utilization efficiency of the vapor deposition material 98, it is considered preferable to reduce the height of the wall surface 36 of the second concave portion 35 or the wall surface 31 of the first concave portion 30 by reducing the thickness T of the vapor deposition mask 20. That is, as the metal plate 51 constituting the vapor deposition mask 20, it can be said that the metal plate 51 having the smallest thickness T as possible is preferably used within a range in which the strength of the vapor deposition mask 20 can be secured. In view of this, in the present embodiment, the thickness T of the vapor deposition mask 20 is preferably 100 μm or less. The thickness T of the vapor deposition mask 20 may be 50 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, 25 μm or less, or 20 μm or less. On the other hand, when the thickness of the vapor deposition mask 20 is too small, the strength of the vapor deposition mask 20 is reduced, and the vapor deposition mask 20 is likely to be damaged or deformed. In view of this, the thickness T of the vapor deposition mask 20 is preferably 5 μm or more. The thickness T of the vapor deposition mask 20 may be 8 μm or more, 10 μm or more, 12 μm or more, 13 μm or more, or 15 μm or more. The range of the thickness T of the vapor deposition mask 20 may be determined by a combination of any one of the above upper limit candidate values and any one of the above lower limit candidate values. For example, the thickness T of the vapor deposition mask 20 may be in a range of 5 μm to 100 μm, 8 μm to 50 μm, 10 μm to 40 μm, 12 μm to 35 μm, 13 μm to 30 μm, 15 μm to 25 μm, or 15 μm to 20 μm. The range of the thickness T of the vapor deposition mask 20 may be determined by a combination of any two of the above-described upper limit candidate values. For example, the thickness T of the vapor deposition mask 20 may be in a range of 20 μm to 25 μm. The range of the thickness T of the vapor deposition mask 20 may be determined by a combination of any two of the above-described plurality of lower limit candidate values. For example, the thickness T of the vapor deposition mask 20 may be in a range of 13 μm to 15 μm.
The thickness T is the thickness of the peripheral region 23, that is, the thickness of the portion of the deposition mask 20 where the first recess 30 and the second recess 35 are not formed. Therefore, the thickness T can be said to be the thickness of the metal plate 51.
As a method for measuring the thickness of the metal plate 51 and the vapor deposition mask 20, a contact measurement method is used. As a contact measurement method, a length gauge HEIDENHAIM-METRO "MT 1271" manufactured by HEIDENHAIN and equipped with a ball guide type plunger was used.
In fig. 5, the minimum angle formed by the straight line M1 with respect to the normal direction N of the vapor deposition mask 20 is represented by the symbol θ 1, and the straight line M1 passes through the connecting portion 41 of the through-hole 25, which is a portion having the minimum opening area, and any other position of the wall surface 36 of the second recess 35, it is advantageous to increase the angle θ 1 in order to make the vapor deposition material 98 moving obliquely reach the organic EL substrate 92 as far as possible without reaching the wall surface 36, and it is also effective to decrease the width β of the top portion 43 described above in addition to decreasing the thickness T of the vapor deposition mask 20 in increasing the angle θ 1.
In fig. 5, reference numeral α denotes the width of the portion (hereinafter also referred to as rib) remaining without being etched in the effective region 22 of the first surface 51a of the metal plate 51, the width α of the rib and the dimension r of the through-hole 42 are appropriately determined in accordance with the size of the organic EL display device and the number of display pixels, for example, the width α of the rib is 5 μm or more and 40 μm or less, and the dimension r of the through-hole 42 is 10 μm or more and 60 μm or less.
In fig. 4 and 5, an example in which the second surface 51b of the metal plate 51 remains between two adjacent second concave portions 35 is shown, but the present invention is not limited to this. Although not shown, etching may be performed so that two adjacent second recesses 35 are connected. That is, there may be a portion where the second surface 51b of the metal plate 51 does not remain between two adjacent second recesses 35.
Next, a method for manufacturing the vapor deposition mask 20 will be described.
First, a method for manufacturing a metal plate used for manufacturing a vapor deposition mask will be described. In the present embodiment, an example in which the metal plate 51 is made of a rolled material of a nickel-containing iron alloy will be described. The rolled material has a thickness of 100 μm or less, preferably 50 μm or less, 40 μm or less, or 30 μm or less. The total content of nickel and cobalt in the rolled material is, for example, 30 mass% to 38 mass%. The metal plate 51 made of a rolled material is produced and circulated as a roll body to be described later.
First, a base material 510 for a metal plate is prepared. The base material 510 is produced by melting a raw material for a metal plate in a furnace. The raw material for the metal plate contains, for example, iron and nickel and other additive materials such as cobalt. After the base material 510 is taken out of the furnace, a grinding process of grinding the surface of the base material 510 may be performed.
Next, as shown in fig. 6, a rolling step of rolling a base material 510 made of a nickel-containing iron alloy is performed. For example, the steel sheet is fed to a rolling device 61 including a pair of rolling rolls (work rolls) 61a and 61b in a direction F1 while applying a tensile force. The base material 510 that has reached between the pair of rolling rolls 61a, 61b is rolled by the pair of rolling rolls 61a, 61 b. As a result, the base material 510 is stretched in the direction F1 while its thickness is reduced. Thereby, the metal plate 51 extending in the direction F1 and having the specific thickness T can be obtained. In the following description, the direction F1 in which the metal plate 51 extends is also referred to as the longitudinal direction F1.
Fig. 6 is merely an outline of the rolling process, and the specific configuration and steps for carrying out the rolling process are not particularly limited. For example, the rolling process may include: a hot rolling step of working the base material 510 at a temperature equal to or higher than a temperature at which the arrangement of the crystals of the iron alloy is changed; and a cold rolling step of working the base material at a temperature not higher than a temperature at which the crystal arrangement of the iron alloy changes. The direction in which the base material 510 or the metal plate 51 is passed between the pair of rolling rolls 61a and 61b is not limited to one direction. For example, in fig. 6 and 7, the base material 510 or the metal plate 51 can be rolled slowly by repeatedly passing the base material 510 or the metal plate 51 between the pair of rolling rolls 61a and 61b in the direction from the left side to the right side of the drawing and in the direction from the right side to the left side of the drawing.
In the rolling step, the pressure of the rolling actuator may be adjusted to adjust the shape of the metal plate 51. In addition to the rolling rolls (work rolls) 61a and 61b, the shape of the backup rolls can be appropriately adjusted.
In the cold rolling step, a coolant such as lamp oil may be supplied between the base material 510 and the rolling rolls 61a and 61 b. This enables control of the temperature of the base material.
Before and after the rolling step or during the rolling step, an analysis step of analyzing the quality or characteristics of the base material 510 or the metal plate 51 may be performed. For example, the composition may be analyzed by irradiating the base material 510 or the metal plate 51 with fluorescent X-rays. The amount of thermal expansion and contraction of the base material 510 or the metal plate 51 can be measured by Thermomechanical Analysis (TMA).
Then, in order to remove the residual stress accumulated in the metal plate 51 by rolling, as shown in fig. 7, the metal plate 51 may be annealed by using an annealing apparatus 63. As shown in fig. 6 and 7, the metal sheet 51 may be temporarily wound around the core 62 during the rolling step and the annealing step.
As shown in fig. 7, the annealing step may be performed while the metal plate 51 is stretched in the longitudinal direction F1. That is, the annealing step may be performed as a continuous annealing performed while being transferred, not as a so-called batch annealing. In this case, it is preferable to set the temperature and the transport speed in order to suppress deformation such as buckling and breaking of the metal plate 51. By performing the annealing step, the metal plate 51 from which the residual strain is removed to some extent can be obtained. Fig. 7 shows an example in which the metal plate 51 is conveyed in the horizontal direction in the annealing step, but the present invention is not limited to this, and the metal plate 51 may be conveyed in other directions such as the vertical direction in the annealing step.
The annealing step is preferably performed in a non-reducing atmosphere or an inert gas atmosphere. Here, the non-reducing atmosphere refers to an atmosphere containing no reducing gas such as hydrogen. The phrase "not containing a reducing gas" means that the concentration of a reducing gas such as hydrogen is 10% or less. The inert gas atmosphere refers to an atmosphere in which the concentration of an inert gas such as argon, helium, or nitrogen is 90% or more. By performing the annealing step in a non-reducing atmosphere or an inert gas atmosphere, it is possible to suppress the formation of nickel compounds such as nickel hydroxide on the surface layer of the metal plate 51. The annealing device 63 may have a mechanism for monitoring the concentration of the inert gas, a mechanism for adjusting the concentration of the inert gas.
Before the annealing step, a cleaning step of cleaning the metal plate 51 may be performed. This can prevent foreign matter from adhering to the surface of the metal plate 51 during the annealing step. As the cleaning liquid used for cleaning, for example, a hydrocarbon-based liquid can be used.
In fig. 7, an example is shown in which the annealing step is performed while the metal plate 51 is stretched in the longitudinal direction F1, but the annealing step is not limited to this, and may be performed in a state in which the metal plate 51 is wound around a member such as the core 62. That is, batch annealing can be performed. When the annealing step is performed in a state where the metal plate 51 is wound around a member such as the core 62, the metal plate 51 may be warped according to the outer diameter of the core 62. Therefore, from the viewpoint of suppressing the problem of warpage, it is advantageous to perform the annealing step while drawing the metal plate 51 in the longitudinal direction F1.
Thereafter, a cutting process of cutting out predetermined ranges at both ends in the width direction of the metal plate 51 obtained in the rolling process may be performed so that the width of the metal plate 51 is within the predetermined ranges. The width direction is a direction perpendicular to the longitudinal direction F1 in the plane of the metal plate 51. By performing the cutting step, for example, cracks that can be generated at both ends of the metal plate 51 in the width direction by rolling can be removed. By removing the cracks, it is possible to prevent the metal plate 51 from being broken, that is, a so-called piece (plate cut れ) from being generated starting from the cracks.
The width of the portion cut out in the cutting step may be adjusted so that the shape of the metal plate 51 after the cutting step is symmetrical in the width direction. In addition, the dicing step may be performed before the annealing step.
The long metal plate 51 having a predetermined thickness may be produced by repeating at least two of the rolling step, the annealing step, and the cutting step two or more times.
After the completion of the treatment such as the annealing step for the metal plate 51, a winding step of winding the metal plate 51 around the shaft member 52 is performed. Fig. 7 shows an example in which the winding step is performed after the annealing step. Although not shown, the winding step may be performed after the cutting step. Further, although not shown, after the completion of the treatment such as the annealing process for the metal plate 51, the metal plate 51 may be temporarily wound around the core, and then the metal plate 51 may be unwound from the core and wound around the shaft member 52. In this manner, the wound body 50 of the metal plate 51 can be produced.
The roll 50 will be described below. Fig. 8 is a perspective view showing the roll body 50. The winding body 50 includes a shaft member 52 and a metal plate 51 wound around the shaft member 52. The metal plate 51 may be wound around the shaft member 52 such that the second surface 51b is closer to the shaft member 52 side than the first surface 51a, or may be wound around the shaft member 52 such that the first surface 51a is closer to the shaft member 52 side than the second surface 51 b.
In fig. 8, reference symbol W1 denotes the dimension of the metal plate 51 in the width direction F2 perpendicular to the longitudinal direction F1 of the metal plate 51. Further, a symbol W2 indicates the dimension of the shaft member 52 in the width direction F2. The width direction F2 coincides with the axial direction of the shaft member 52. The dimension W1 of the metal plate 51 may be, for example, 150mm or more, or 300mm or more. The dimension W1 of the metal plate 51 may be, for example, 1300mm or less, or 1000mm or less. The dimension W2 of the shaft member 52 is larger than the dimension W1 of the metal plate 51. The value obtained by subtracting the dimension W1 from the dimension W2 is, for example, 20mm or more, or may be 50mm or more. The value obtained by subtracting the dimension W1 from the dimension W2 may be, for example, 500mm or less, or 200mm or less.
Fig. 9 is a sectional view of the wound body 50 when the wound body 50 is cut along a plane perpendicular to the axial direction of the shaft member 52. In the example shown in fig. 9, the shaft member 52 is a hollow member having an inner diameter R1. Symbol R2 represents the outer diameter of the shaft member 52. The outer diameter R2 of the shaft member 52 coincides with the inner diameter of the metal plate 51 that is in contact with the shaft member 52, of the metal plate 51 wound around the shaft member 52. Symbol R3 denotes the outer diameter of the metal plate 51 wound around the shaft member 52. The "outer diameter" refers to the diameter of the outer peripheral surface of the columnar body. The "inner diameter" means a diameter of the inner circumferential surface of the column-shaped body when the inner circumferential surface of the hollow portion is caused.
As a tool for measuring the inner diameter and the outer diameter of the shaft member 52 or the inner diameter and the outer diameter of the metal plate 51 wound around the shaft member 52, a measuring ruler is used.
However, if the outer diameter R2 of the shaft member 52 is small, warpage due to plastic deformation of the metal plate 51 may remain at least partially in the metal plate 51 after being unwound from the shaft member 52 while the metal plate 51 is wound around the shaft member 52. As described later, the vapor deposition mask 20 is produced by processing the metal plate 51 unwound from the roll 50. Therefore, if the outer diameter R2 of the shaft member 52 is small, the vapor deposition mask 20 made of the metal plate 51 is warped. When the iron alloy constituting the metal plate 51 contains 34 mass% or more and 38 mass% or less of nickel, that is, when the iron alloy is a so-called invar alloy material, such warpage may occur significantly. The reasons include: when the metal plate 51 is made of invar alloy material, the difference between the thermal expansion coefficient of the metal plate 51 and the thermal expansion coefficient of the shaft member 52 is large because the thermal expansion coefficient of the metal plate 51 is low, and a force due to thermal expansion is likely to be generated between the metal plate 51 and the shaft member 52, but the reason is not particularly limited.
If the vapor deposition mask 20 is warped, the accuracy in measuring the dimensions of the vapor deposition mask 20 in the inspection step of the vapor deposition mask 20 may be reduced or may not be measured. It is also considered that if the vapor deposition mask 20 is warped, the dimensional accuracy of the vapor deposition mask 20 in a plan view is lowered. In view of such a problem, the outer diameter R2 of the shaft member 52 may be 125mm or more, 150mm or more, 180mm or more, or 200mm or more, for example.
As described above, the outer diameter R2 of the shaft member 52 is preferably large in order to suppress warping of the metal plate 51 unwound from the wound body 50. On the other hand, when the outer diameter R2 of the shaft member 52 is increased, the weight of the shaft member 52 increases, and the weight of the wound body 50 including the shaft member 52 and the metal plate 51 also increases. The increased weight of the roll 50 may increase the difficulty of handling the roll 50. For example, if the weight of the roll 50 is large, the transportability of the roll 50 is lowered. It is also considered that the metal plate 51 of the roll 50 is damaged or deteriorated by its own weight. When the roll 50 is installed in the vapor deposition mask 20 manufacturing apparatus, a conveying apparatus such as a forklift needs to be used. When a transport device such as a forklift is used, the manufacturing apparatus for the vapor deposition mask 20 is large in size because a space for the forklift to enter is provided in the manufacturing apparatus. In view of such a problem, the outer diameter R2 of the shaft member 52 may be, for example, 550mm or less, 400mm or less, 300mm or less, or 280mm or less.
The range of the outer diameter R2 of the shaft member 52 may be determined by a combination of any one of the plurality of lower limit candidate values and any one of the plurality of upper limit candidate values. For example, the thickness may be 125mm to 550mm, 150mm to 400mm, 180mm to 300mm, or 200mm to 280 mm. The range of the outer diameter R2 of the shaft member 52 may be determined by a combination of any two of the above-described plurality of lower limit candidate values, and may be, for example, 125mm to 200mm, 125mm to 180mm, 150mm to 200mm, or 150mm to 180 mm. The range of the outer diameter R2 of the shaft member 52 may be determined by a combination of any two of the above-described upper limit candidate values, and may be, for example, 280mm to 550mm, 280mm to 400mm, 300mm to 550mm, or 300mm to 400 mm.
In the case where the shaft member 52 is a hollow member formed with a hollow portion as shown in fig. 9, the weight of the shaft member 52 is reduced as compared with the case where the shaft member 52 is not formed with a hollow portion. Therefore, the shaft member 52 is advantageously a hollow member in order to facilitate handling of the wound body 50.
When the shaft member 52 is a hollow member, the inner diameter R1 of the shaft member 52 is determined so as to be able to suppress deformation or breakage of the shaft member 52 due to the self weight of the shaft member 52 or the weight of the metal plate 51. The inner diameter R1 of the shaft member 52 is, for example, 100mm or more, may be 150mm or less, or may be 200mm or more. The difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 is, for example, 5mm or more, 10mm or more, 20mm or more, or 30mm or more. The difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 may be 100mm or less, 80mm or less, 60mm or less, or 40mm or less.
The range of the difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 may be determined by a combination of any one of the plurality of lower limit candidate values and any one of the plurality of upper limit candidate values, and may be, for example, 5mm to 100mm, 10mm to 80mm, 20mm to 60mm, or 30mm to 40 mm. The range of the difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 may be determined by a combination of any two of the above-described plurality of lower limit candidate values, and may be, for example, 5mm to 30mm, 5mm to 20mm, 10mm to 30mm, or 10mm to 20 mm. The range of the difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 may be determined by a combination of any two of the above-described upper limit candidate values, and may be, for example, 40mm to 100mm, 40mm to 80mm, 60mm to 100mm, or 60mm to 80 mm.
When the shaft member 52 is a hollow member, a resin, a mixture of a resin and a fiber, a metal, or the like can be used as a material constituting the shaft member 52. Examples of the resin include a phenol resin, an ABS resin, a polystyrene resin, and a polyethylene resin. Examples of the mixture of the resin and the fiber include paper phenol, fiber reinforced plastic (PRP), and the like. Examples of the metal include iron and iron alloys. The ABS resin is a generic term for a copolymer synthetic resin obtained by polymerizing acrylonitrile, butadiene, and styrene. Paper phenol refers to a mixture of paper and phenolic resin. Paper phenol is a mixture of paper and phenolic resin, including, for example, paper impregnated with phenolic resin. The fiber-reinforced plastic includes, for example, fibers such as glass fibers and carbon fibers impregnated with a resin.
The mixing ratio of the resin such as phenol resin and the fiber such as paper in the shaft member 52 may be, for example, 0.2 or more, 0.4 or more, 0.6 or more, or 0.8 or more. The mixing ratio of the resin and the fiber may be, for example, 5.0 or less, 3.0 or less, 2.0 or less, or 1.5 or less. The range of the mixing ratio of the resin and the fiber may be determined by a combination of any one of the plurality of lower limit candidate values and any one of the plurality of upper limit candidate values, and may be, for example, 0.2 to 5.0, 0.4 to 3.0, 0.6 to 2.0, or 0.8 to 1.5. The range of the mixing ratio of the resin and the fiber may be determined by a combination of any two of the above-described plurality of lower limit candidate values, and may be, for example, 0.2 to 0.8, 0.2 to 0.6, 0.4 to 0.8, or 0.4 to 0.6. The range of the mixing ratio of the resin and the fiber may be determined by a combination of any two of the above-described upper limit candidate values, and may be, for example, 1.5 to 5.0, 1.5 to 3.0, 2.0 to 5.0, or 2.0 to 3.0. The mixing ratio of the resin and the fibers is a value obtained by dividing the weight ratio of the resin in the shaft member 52 by the weight ratio of the fibers in the shaft member 52.
When the shaft member 52 is a hollow member, the outer diameter R2 of the shaft member 52 may be 125mm or more, 150mm or more, 180mm or more, or 200mm or more, for example. This can suppress plastic deformation of the metal plate 51 while the metal plate 51 is wound around the shaft member 52. When the shaft member 52 is a hollow member, the outer diameter R2 of the shaft member 52 may be, for example, 300mm or less, 280mm or less, 250mm or less, or 200mm or less.
The range of the outer diameter R2 of the shaft member 52 when the shaft member 52 is a hollow member may be determined by a combination of any one of the plurality of lower limit candidate values and any one of the plurality of upper limit candidate values, and may be, for example, 125mm to 300mm, 150mm to 280mm, or 180mm to 250 mm. The range of the outer diameter R2 of the shaft member 52 may be determined by a combination of any two of the above-described plurality of lower limit candidate values, and may be, for example, 125mm to 200mm, 125mm to 180mm, 150mm to 200mm, or 150mm to 180 mm. The range of the outer diameter R2 of the shaft member 52 may be determined by a combination of any two of the above-described upper limit candidates, and may be, for example, 200mm to 300mm, 200mm to 280mm, 250mm to 300mm, or 250mm to 280 mm.
After the roll body 50 is produced, a storing step of storing the roll body 50 in a container may be performed. The roll 50 is circulated in a state of being stored in a container. In the following description, an article including a container and a roll 50 housed in the container is referred to as a package. The circulation of the roll 50 refers to the activities of transportation, storage, and transaction of the roll 50 from the manufacturer of the roll 50 to the hand of the user of the roll 50. The user of the roll 50 is, for example, a company that manufactures the vapor deposition mask 20 using the roll 50.
Fig. 10A is a perspective view showing an example of the package 55 including the container 56 and the roll 50 stored in the container 56. In addition, FIG. 10B is a cross-sectional view of the package 55 along the XB-XB line of FIG. 10A. Fig. 10B shows a case where the container 56 containing the roll body 50 is cut by a plane parallel to the vertical direction and the axial direction of the shaft member 52.
As shown in fig. 10A and 10B, the container 56 includes: a lower portion 57 located below the roll body 50; a pair of side portions 58 located on the sides of the roll body 50; and an upper portion 59 covering the roll body 50 from above. The side portion 58 preferably supports the shaft member 52 in such a manner that the metal plate 51 of the roll body 50 does not contact the lower portion 57. This can suppress deformation or breakage of the metal plate 51 due to the force received from the lower portion 57.
The method by which the side portion 58 supports the shaft member 52 is arbitrary. For example, a through hole 58a having a size larger than the outer diameter R2 of the shaft member 52 may be provided in the side portion 58, and the shaft member 52 may be inserted into the through hole 58 a. Further, a notch or the like corresponding to the shape of the shaft member 52 may be provided at the upper end of the side portion 58, and the shaft member 52 may be placed on the notch.
As a material of the members constituting the container 56 such as the lower portion 57, the side portions 58, and the upper portion 59, wood, reinforced corrugated paper, or the like can be used.
The roll 50 can be stored in an appropriate storage place until the roll 50 is handed over from a manufacturer of the roll 50 to a user of the roll 50. Here, according to the present embodiment, the metal plate 51 of the roll 50 is stored in a state of being wound around the shaft member 52 having the outer diameter R2 equal to or larger than the predetermined threshold value. As mentioned above, the threshold is 125mm, 150mm, etc. This can suppress the metal plate 51 unwound from the shaft member 52 from remaining warped.
The environment of the storage place is set to suppress the change in the characteristics of the metal plate 51 of the roll 50. For example, the temperature at the storage site is 30 ℃ or lower, more preferably 25 ℃ or lower. Further, the temperature at the storage site is, for example, 0 ℃ or higher, more preferably 10 ℃ or higher. The humidity of the storage place is 60% or less, more preferably 50% or less.
The roll 50 may be stored in a state of being accommodated in the container 56 of the package 55. In this case, since the roll 50 can be stored in a state where the metal plate 51 of the roll 50 does not contact the lower portion 57 of the container 56, deformation or breakage of the metal plate 51 can be suppressed.
Alternatively, the roll 50 may be stored without being stored in the container 56. In this case, it is also preferable that the shaft member 52 be supported so that the metal plate 51 does not contact a surrounding structure. This can suppress deformation or breakage of the metal plate 51.
After the wound body 50 is manufactured by winding the metal plate 51 around the shaft member 52, the metal plate 51 can be unwound, and an inspection method for inspecting the warpage generated in the metal plate 51 can be performed. The inspection method is performed by a manufacturer of the metal plate 51 or the wound body 50 before the metal plate 51 or the wound body 50 is distributed. The inspection method may be performed by a company or the like that stores the roll 50 during distribution. Further, the inspection method may be performed by a user who uses the roll 50 after obtaining the roll 50.
The inspection method comprises the following steps: a test piece preparation step of unwinding the metal plate 51 of the roll 50 and taking out the metal plate 51 of a predetermined length to prepare a test piece 66; and a measuring step of measuring the warpage of the test piece 66. In the test piece preparation step, for example, a metal plate 51 of a predetermined length is cut from the roll 50. For example, the metal plate 51 of the wound body 50 is cut by a large blade such as a shear (shear). As the test piece 66, the outermost metal plate 51 among the metal plates 51 wound around the shaft member 52 was used.
The degree of warpage generated in the metal plate 51 wound around the shaft member 52 is maximized in the innermost portion of the metal plate 51, that is, the metal plate 51 located closest to the shaft member 52. On the other hand, in the present embodiment, the difference between the outer diameter R3 of the metal plate 51 wound around the shaft member 52 and the outer diameter R2 of the shaft member 52 is smaller than the outer diameter R2 of the shaft member 52. For example, the ratio of the difference between the outer diameter R3 of the metal plate 51 and the outer diameter R2 of the shaft member 52 to the outer diameter R2 of the shaft member 52, that is, (R3-R2)/R2, is 1/5 or less, and may be 1/10 or less. Therefore, it is considered that the warpage measurement using the outermost metal plate 51 of the metal plates 51 wound around the shaft member 52 as the test piece 66 can be a useful index of the warpage generated in the innermost metal plate 51 of the metal plates 51 wound around the shaft member 52.
Fig. 11 is a view showing a method of measuring the warpage of the test piece 66 made of the metal plate 51. Fig. 12 is a view showing the test piece 66 of fig. 11 when viewed from the direction of arrow XII. In fig. 12, reference symbol L1 denotes the size of the test piece 66 in the longitudinal direction F1, and reference symbol L2 denotes the size of the test piece 66 in the width direction F2. The test piece 66 has a dimension L1 of 400mm to 600mm, for example, 500 mm. The dimension L2 of the test piece 66 is equal to the dimension W1 of the metal plate 51 in the width direction F2, and is, for example, 150mm to 1300 mm. As shown in fig. 12, the dimension L2 of the test piece 66, i.e., the dimension W1 of the metal plate 51 is preferably large enough to allow two or more vapor deposition masks 20 to be distributed on the metal plate 51 along the width direction F2 of the metal plate 51.
In the measurement step, first, as shown in fig. 11, a part of the test piece 66 is fixed to a vertical surface 67a of an adherend 67 such as a wall. For example, the first end 51e in the longitudinal direction F1 of the metal plate 51 constituting the test piece 66 is fixed to the straight surface 67a so that the first end 51e is positioned upward. At this time, of the surfaces of the test piece 66, the surface located on the outer side in the direction of the curvature radius of the warp generated in the test piece 66 is opposed to the vertical surface 67a of the adherend 67. For example, as shown in fig. 11, when the test piece 66 is warped in a convex shape in a direction from the second surface 51b to the first surface 51a of the metal plate 51, the first surface 51a of the metal plate 51 is opposed to the vertical surface 67a of the adherend 67. The fixing method of the first end portion 51e is arbitrary. For example, the first end portion 51e may be fixed to the lead straight surface 67a using an adhesive, a single-sided tape, a double-sided tape, a magnet, or the like.
Next, as shown in fig. 11, a gap S1 generated between the second end portion 51F opposed to the first end portion 51e in the longitudinal direction F1 and the vertical surface 67a of the adherend 67 is measured. As a measuring instrument for measuring the gap S1, for example, a ruler, a vernier caliper, or the like can be used.
When the gap S1 is equal to or less than the threshold value, a determination step of determining that the wound body 50 from which the test piece 66 has been taken out is acceptable may be performed. The threshold value is preferably 20mm or less, more preferably 15mm or less. The determination step may be performed by a manufacturer of the roll 50 or may be performed by a user of the roll 50. When the user of the roll 50 performs the determination step, the vapor deposition mask 20 can be produced using the metal plate 51 of the roll 50 determined as acceptable after the determination step. In this case, the inspection step including the determination step may be a part of the method for manufacturing the vapor deposition mask 20. The method for manufacturing the vapor deposition mask 20 may not always include the inspection step.
Next, a method of manufacturing the vapor deposition mask 20 using the metal plate 51 wound around the shaft member 52 of the roll 50 will be described with reference mainly to fig. 13 to 17. Fig. 13 is a diagram showing a manufacturing apparatus 70 for manufacturing the vapor deposition mask 20 by using the metal plate 51. First, a wound body 50 including a metal plate 51 wound around a shaft member 52 is prepared. Next, the metal plate 51 of the roll 50 is unwound from the shaft member 52, and the metal plate 51 is sequentially conveyed to a resist film forming apparatus 71, an exposure and development apparatus 72, an etching apparatus 73, a film peeling apparatus 74, and a separation apparatus 75 shown in fig. 13. Fig. 13 shows an example in which the metal plate 51 is transferred in the longitudinal direction F1 to move between apparatuses, but the present invention is not limited to this. For example, the metal plate 51 provided with the resist film in the resist film forming device 71 may be wound up again on the shaft member 52, and then the wound metal plate 51 may be supplied to the exposure and development device 72. Further, the metal plate 51 in the state where the resist film is provided after the exposure and development processing in the exposure and development device 72 may be wound up again on the shaft member 52, and then the wound metal plate 51 may be supplied to the etching device 73. Further, the metal plate 51 etched by the etching device 73 may be wound around the shaft member 52 again, and then the wound metal plate 51 may be supplied to the peeling device 74. The metal plate 51 from which the resin 54 and the like described later have been removed by the peeling device 74 may be wound around the shaft member 52 again, and then the wound metal plate 51 may be supplied to the separating device 75.
The resist film forming apparatus 71 sets a resist film on the surface of the metal plate 51. The exposure and development device 72 performs exposure processing and development processing on the resist film, thereby patterning the resist film to form a resist pattern.
The etching device 73 etches the metal plate 51 using the resist pattern as a mask, and forms the through-hole 25 in the metal plate 51. In the present embodiment, a plurality of through holes 25 corresponding to the plurality of vapor deposition masks 20 are formed in the metal plate 51. In other words, a plurality of vapor deposition masks 20 are distributed to the metal plate 51. For example, a plurality of through holes 25 are formed in the metal plate 51 so that a plurality of effective regions 22 are arranged in the width direction F2 of the metal plate 51 and a plurality of effective regions 22 for the vapor deposition mask 20 are arranged in the longitudinal direction F1 of the metal plate 51. The stripping device 74 strips off components such as a resist pattern and a resin 54 described later, which are provided to protect a portion of the metal plate 51 that is not to be etched from the etching solution.
The separation device 75 performs the following separation steps: a portion of the metal plate 51 where the plurality of through holes 25 are formed corresponding to one vapor deposition mask 20 is separated from the metal plate 51. In this way, the single-piece vapor deposition mask 20 can be obtained.
Hereinafter, each step of the method for manufacturing the vapor deposition mask 20 will be described in detail.
First, the roll 50 is set in the manufacturing apparatus 70. For example, the roll body 50 is provided in an unwinding device, not shown, for unwinding the metal plate 51 toward the resist film forming device 71.
Here, in the present embodiment, the outer diameter R2 of the shaft member 52 is 550mm or less, more preferably 300mm or less. In addition, the shaft member 52 is formed with a hollow portion. The thickness T of the metal plate 51 wound around the shaft member 52 is small, for example, 50 μm or less. Therefore, the weight of the roll 50 including the metal plate 51 and the shaft member 52 is smaller than that of a roll used in a conventional manufacturing process of the vapor deposition mask 20. The weight of the roll 50 of the present embodiment is, for example, 70kg or less, preferably 50kg or less. Therefore, the step of providing the roll body 50 to the manufacturing apparatus 70 can be performed without using a conveying apparatus such as a forklift. For example, one of the two operators can transport the roll 50 while supporting one end of the shaft member 52 and the other end, and can set the roll 50 in the manufacturing apparatus 70. Therefore, the roll 50 can be installed in the manufacturing apparatus 70 without providing a space for the transportation apparatus to enter in the manufacturing apparatus of the vapor deposition mask 20. This can reduce the area of the manufacturing apparatus 70 as compared with a conventional manufacturing apparatus in which the roll 50 is installed using a conveying apparatus.
Note that, in the roll body 50 of the present embodiment, the roll body 50 may be set in the manufacturing apparatus 70 using a conveying apparatus such as a forklift, with importance placed on safety of handling and the like.
Next, using the resist film forming apparatus 71, resist films 53a and 53b are formed on the first surface 51a and the second surface 51b of the metal plate 51 unwound from the unwinding apparatus as shown in fig. 14. For example, dry films made of a photosensitive resist material such as an acrylic photocurable resin are attached to the 1 st surface 51a and the 2 nd surface 51b of the metal plate 51, thereby forming resist films 53a and 53 b. Alternatively, the resist films 53a and 53b may be formed by applying a coating liquid containing a negative photosensitive resist material on the 1 st surface 51a and the 2 nd surface 51b of the metal plate 51 and drying the coating liquid.
Next, the resist films 53a and 53b are exposed and developed by an exposure and development device 72. Thereby, as shown in fig. 15, the first resist pattern 53c may be formed on the first surface 51a of the metal plate 51, and the second resist pattern 53d may be formed on the second surface 51b of the metal plate 51.
Next, the metal plate 51 is etched using the etching device 73 with the resist patterns 53c and 53d as a mask. Specifically, as shown in fig. 16, first, a region of the first surface 51a of the metal plate 51 not covered with the first resist pattern 53c is etched with a first etching solution. For example, a first etching solution is sprayed onto the first surface 51a of the metal plate 51 through the first resist pattern 53c from a nozzle disposed on the side facing the first surface 51a of the metal plate 51 being conveyed. As a result, as shown in fig. 16, erosion by the first etching solution progresses in the region of the metal plate 51 not covered with the first resist pattern 53 c. Thereby, a large number of first recesses 30 are formed in the first surface 51a of the metal plate 51. As the first etching solution, for example, an etching solution containing an iron chloride solution and hydrochloric acid is used.
Next, as shown in fig. 17, the second surface 51b of the metal plate 51 is etched in the region not covered with the second resist pattern 53d, thereby forming the second recess 35 in the second surface 51 b. The etching of the second surface 51b is performed until the first concave portion 30 and the second concave portion 35 communicate with each other, thereby forming the through hole 25. As the second etching solution, for example, an etching solution containing an iron chloride solution and hydrochloric acid is used as in the first etching solution. In the etching of the second surface 51b, as shown in fig. 17, the first concave portion 30 may be covered with a resin 54 having resistance to the second etching solution.
After that, the resin 54 is removed from the metal plate 51 using the peeling device 74. The resin 54 can be removed by using an alkali-based stripping liquid, for example. When an alkali-based stripping liquid is used, the resist patterns 53c and 53d are also removed simultaneously with the resin 54. After the resin 54 is removed, the resist patterns 53c and 53d may be removed separately from the resin 54 by using a stripping liquid different from the stripping liquid used for stripping the resin 54.
Thereafter, the plurality of vapor deposition masks 20 assigned to the metal plate 51 are taken out one by one. For example, a portion of the metal plate 51 where the plurality of through holes 25 are formed corresponding to one vapor deposition mask 20 is separated from other portions of the metal plate 51. This can obtain the vapor deposition mask 20. Before the separation step is performed, the portion of the metal plate 51 to which the appropriate number of vapor deposition masks 20 are assigned may be cut. In this case, in the separation step, the vapor deposition masks 20 are taken out one by one from the sheet-like metal plate 51 to which an appropriate number of vapor deposition masks 20 are assigned. As a method of taking out the vapor deposition mask 20 from the metal plate 51, there can be adopted: a method of separating the vapor deposition mask 20 from the metal plate 51 by laser processing, a method of separating the vapor deposition mask 20 from the metal plate 51 by hand of an operator, and the like.
The method of forming the through hole 25 in the metal plate 51 is not limited to etching. For example, the through-hole 25 may be formed in the metal plate 51 by laser processing in which the metal plate 51 is irradiated with a laser beam.
Next, an inspection step of inspecting the vapor deposition mask 20 is performed. The inspection step includes at least one of the following steps: a step of inspecting the positions of the components of the vapor deposition mask 20; a step of inspecting the dimensions of the constituent elements of the vapor deposition mask 20; or a step of inspecting a distance between two components of the vapor deposition mask 20. The component of the inspection object is, for example, the through hole 25.
In the inspection step, first, as shown in fig. 18, the vapor deposition mask 20 is placed on the horizontal surface 68a of the inspection stage 68. Fig. 19 is a view showing the vapor deposition mask 20 and the inspection stage 68 in fig. 18 when viewed from the direction of arrow XIX. The inspection station 68 is, for example, a glass plate. As shown in fig. 19, the vapor deposition mask 20 is placed on the inspection stage 68 such that the first surface 20a of the vapor deposition mask 20 faces the horizontal surface 68a of the inspection stage 68. The first direction D1 in which the vapor deposition mask 20 extends may coincide with the longitudinal direction F1 of the metal plate 51. The size of the vapor deposition mask 20 in the first direction D1 is 500mm to 1300mm, for example, 1200 mm. The size of the vapor deposition mask 20 in the second direction D2 is 30mm to 400mm, for example, 70 mm.
In the inspection step, the vapor deposition mask 20 is irradiated with light from the side of the first surface 20a or the second surface 20b of the vapor deposition mask 20, for example, along the normal direction of the horizontal surface 68 a. Light that has passed through the through-hole 25 of the vapor deposition mask 20 and is emitted from the other side of the first surface 20a or the second surface 20b of the vapor deposition mask 20 is detected by a detector. Next, based on the detected light pattern, information on the position, area, shape, and the like of the through hole 25 of the vapor deposition mask 20 is obtained. Based on this information, whether the vapor deposition mask 20 is acceptable or not can be determined. Information on the position, area, shape, and the like of the through-hole 25 of the vapor deposition mask 20 may be obtained based on the pattern of the light reflected by the vapor deposition mask 20.
When the vapor deposition mask 20 has a residual warp caused by the metal plate 51 being wound around the shaft member 52, a gap S2 may be formed between the vapor deposition mask 20 and the horizontal surface 68a of the inspection stage 68, as shown in fig. 19. When the vapor deposition mask 20 is placed on the horizontal surface 68a as shown in fig. 19, the distance between the metal plate 51 of the vapor deposition mask 20 and the horizontal surface 68a is likely to be smaller due to the weight of the vapor deposition mask 20, as compared with the case where the metal plate 51 is fixed to the vertical surface 67a as shown in fig. 11. Therefore, the gap S2 is easily smaller than the gap S1. However, since the position, area, shape, and the like of the through hole 25 of the vapor deposition mask 20 are required to have high accuracy, the gap S2 has a problem as described below.
The larger the degree of warpage of the vapor deposition mask 20 and the larger the gap S2, the more the information on the position, area, shape, and the like of the through-hole 25 obtained based on the light pattern deviates from the position, area, shape, and the like of the through-hole 25 in real time in the plane direction of the vapor deposition mask 20. Therefore, the greater the warpage of the vapor deposition mask 20, the lower the accuracy of the inspection process of the vapor deposition mask 20. It is also considered that when the warp of the vapor deposition mask 20 becomes larger, light passing through the through holes 25 of the vapor deposition mask 20 or light reflected by the vapor deposition mask 20 hardly reaches the detector.
Here, in the present embodiment, as described above, the outer diameter R2 of the shaft member 52 of the winding body 50 is at least 125mm or more or 150mm or more. In other words, the inner diameter of the portion of the metal plate 51 wound around the shaft member 52 on the side closest to the shaft member 52 is 125mm or more or 150mm or more. Therefore, the metal plate 51 wound around the shaft member 52 can be suppressed from remaining warped. For example, the gap S1 generated when the test piece 66 taken out from the metal plate 51 is fixed to the lead straight surface 67a can be suppressed to 20mm or less, and more preferably 15mm or less. Therefore, the gap S2 generated when the vapor deposition mask 20 made of the metal plate 51 is placed on the horizontal surface 68a can be suppressed to 0.5mm or less, and more preferably 0.25mm or less. Thus, in the inspection step of the vapor deposition mask 20, information on the position, area, shape, and the like of the through hole 25 can be obtained with high accuracy.
In order to suppress warpage of the vapor deposition mask 20, the outer diameter R2 of the shaft member 52 is preferably large. However, if the outer diameter R2 of the shaft member 52 is increased, the weight of the wound body 50 increases, and the difficulty in transportation, installation, and the like of the wound body 50 increases. In view of this, in the present embodiment, the outer diameter R2 of the shaft member 52 is, for example, 550mm or less, more preferably 300mm or less.
In addition, as a method of increasing the outer diameter R2 of the shaft member 52 and suppressing the weight of the wound body 50, it is also conceivable to shorten the length of the metal plate 51 wound around the shaft member 52. However, the steps performed by the respective apparatuses tend to become unstable at the beginning of the process of feeding the leading end of the metal plate 51 of the roll 50 into the respective apparatuses of the manufacturing apparatus 70, such as the exposure and development apparatus 72 and the etching apparatus 73. Therefore, the vapor deposition mask 20 manufactured from the vicinity of the tip of the metal plate 51 of the roll 50 tends to have a large variation in quality. Therefore, in order to produce a plurality of vapor deposition masks 20 with small quality variations from one roll 50, the length of the metal plate 51 of the roll 50 is required to some extent. The length of the metal plate 51 of the roll 50 in the longitudinal direction F1 is preferably 200m or more, more preferably 300m or more, further preferably 400m or more, or 500m or more, and may be 600m or more.
In this context, in a particularly preferred embodiment of the present embodiment, the weight of the metal plate 51 can be reduced by setting the length of the metal plate 51 of the wound body 50 to at least 200m and the thickness T of the metal plate 51 to 30 μm or less. Further, by setting the outer diameter R2 of the shaft member 52 to 300mm or less, the weight of the entire jelly roll 50 can be reduced. Further, since the thickness T of the metal plate 51 is 30 μm or less, even when the outer diameter R2 of the shaft member 52 is as small as 125mm or 150mm, the metal plate 51 can be suppressed from remaining warped. Further, since the weight of the metal plate 51 is reduced, the strength and rigidity required for the shaft member 52 are reduced. Therefore, a hollow-shaped member may be used as the shaft member 52. As a material constituting the shaft member 52, a resin lighter than metal, such as a phenol resin, can be used. This can further reduce the weight of the entire roll 50, and can be 70kg or less or 50kg or less, for example. This can reduce difficulties in conveyance, installation, and the like of the roll 50. For example, the step of setting the roll 50 in the manufacturing apparatus 70 may be performed by two operators by human power without using a carrying device such as a forklift. This can reduce the area of the manufacturing apparatus 70 as compared with a conventional manufacturing apparatus in which the roll 50 is installed using a conveying apparatus. As described above, according to a particularly preferred embodiment of the present embodiment, it is possible to reduce the difficulty in conveying, installing, and the like of the roll body 50 while suppressing the warp of the metal plate 51.
As a device for measuring the weight of the roll 50, a large scale on which a jig provided with the roll 50 is placed in advance is used.
In a particularly preferred embodiment of the present embodiment, the length of the metal plate 51 wound around the shaft member 52 of the wound body 50 may be set according to the thickness T of the metal plate 51. For example, when the thickness T of the metal plate 51 is 20 μm or less, the length of the metal plate 51 wound around the shaft member 52 may be 550 to 650m, and when the thickness T of the metal plate 51 is greater than 20 μm and 30 μm or less, the length of the metal plate 51 wound around the shaft member 52 may be 350 to 450 m. Thereby, the weight of the metal plate 51 wound around the shaft member 52 can be set to about 50 kg.
Next, a welding step of welding the vapor deposition mask 20 obtained as described above to the frame 15 is performed. This makes it possible to obtain the vapor deposition mask device 10 including the vapor deposition mask 20 and the frame 15.
Next, a method for manufacturing the organic EL display device 100 using the vapor deposition mask 20 of the present embodiment will be described. The method of manufacturing the organic EL display device 100 includes a vapor deposition step of depositing a vapor deposition material 98 on a substrate such as the organic EL substrate 92 using a vapor deposition mask 20. In the vapor deposition step, first, the vapor deposition mask device 10 is disposed so that the vapor deposition mask 20 faces the organic EL substrate 92. Further, the vapor deposition mask 20 is brought into close contact with the organic EL substrate 92 by a magnet 93. The inside of the vapor deposition device 90 is set to a vacuum atmosphere. In this state, the vapor deposition material 98 is evaporated and flies toward the organic EL substrate 92 through the vapor deposition mask 20, whereby the vapor deposition material 98 can be attached to the organic EL substrate 92 in a pattern corresponding to the through holes 25 of the vapor deposition mask 20.
Various modifications may be made to the above-described embodiments. Hereinafter, modifications will be described with reference to the drawings as necessary. In the following description and the drawings used in the following description, the same reference numerals as those used for corresponding portions in the above-described embodiments are used for portions that can be configured in the same manner as in the above-described embodiments, and redundant description is omitted. In addition, when the operational effects obtained in the above-described embodiment are obviously obtained in the modified examples, the description thereof may be omitted.
In the above embodiment, the example in which the shaft member 52 is formed with the hollow portion is shown. However, the present invention is not limited to this, and as shown in fig. 20, a hollow portion may not be formed in the shaft member 52 of the wound body 50. Such a shaft member 52 is preferably used when high rigidity is required for the shaft member 52 because the metal plate 51 has a large thickness and the total weight of the metal plate 51 wound around the shaft member 52 is large. For example, the thickness T of the metal plate 51 can be larger than 30 μm and 50 μm or less. In addition, the shaft member 52 shown in fig. 20 may be used when the thickness T of the metal plate 51 is 30 μm or less, for example, 10 μm to 30 μm.
When the shaft member 52 is not formed with a hollow portion, a resin, a mixture of a resin and fibers, a metal, or the like can be used as a material constituting the shaft member 52. Examples of the resin include a phenol resin, an ABS resin, a polystyrene resin, and a polyethylene resin. Examples of the mixture of the resin and the fiber include paper phenol, fiber reinforced plastic (PRP), and the like. Examples of the metal include iron and iron alloys.
When the shaft member 52 is not formed with the hollow portion, the outer diameter R2 of the shaft member 52 may be, for example, 300mm or more, or 350mm or more. When the shaft member 52 is not formed with a hollow portion, the outer diameter R2 of the shaft member 52 may be, for example, 550mm or less, or 500mm or less.
Even when the shaft member 52 is not hollow, the weight of the wound body 50 is preferably so small that the step of providing the wound body 50 to the manufacturing apparatus 70 can be performed without using a carrying device such as a forklift. For example, the weight of the roll 50 is 100kg or less. In this case, for example, the wound body 50 can be set in the manufacturing apparatus 70 by conveying the wound body 50 while supporting one end side of two support shaft members 52 and the other end side of the remaining two support shaft members among four operators.
In the above embodiment, an example in which the metal plate 51 is obtained by rolling a base material is shown. However, the metal plate 51 may be manufactured to have a desired thickness by a foil forming process using plating treatment. In the foil forming step, for example, a plating film is formed on the surface of a drum made of stainless steel or the like, which is partially immersed in a plating solution, while the drum is rotated, and the plating film is peeled off, whereby a long metal plate can be produced in a roll-to-roll manner. In the production of a metal plate made of an iron alloy containing nickel, a mixed solution of a solution containing a nickel compound and a solution containing an iron compound may be used as the plating solution. For example, a mixed solution of a solution containing nickel sulfamate and a solution containing iron sulfamate may be used. The plating solution may contain additives. Examples of the additives include boric acid which functions as a buffer, saccharin or malonic acid which functions as a smoothing agent, and sodium lauryl sulfate which functions as a surfactant.
Next, the metal plate 51 thus obtained can be subjected to the annealing step described above. Before or after the annealing step, the cutting step may be performed to cut both ends of the metal plate 51 in order to adjust the width of the metal plate 51 to a desired width.
When the metal plate 51 is produced by the plating treatment, the wound body 50 may be produced by winding the metal plate 51 around a shaft member 52 having an outer diameter R2 of 150mm to 550mm, as in the case of the present embodiment. This can prevent the metal plate 51 or the vapor deposition mask 20 unwound from the shaft member 52 from being warped due to the metal plate 51 being wound around the shaft member 52.
In the above-described present embodiment, an example is shown in which the shaft member 52 is a hollow member having the inner diameter R1. In this case, the inner diameter R1 of the shaft member 52 may be fixed in the axial direction of the shaft member 52 as shown in fig. 21. In other words, the size of the hollow portion 52c of the shaft member 52 may be fixed in a direction perpendicular to the axial direction of the shaft member 52. Alternatively, as shown in fig. 22, the inner diameter R1 of the shaft member 52 may vary depending on the axial position of the shaft member 52. For example, as shown in fig. 22, the shaft member 52 may include a portion in which the inner diameter R1 gradually increases from the end portion to the center of the shaft member 52 in the axial direction.
In addition, as shown in fig. 23, the shaft member 52 may include an outer peripheral portion 52a and a partition wall 52 b. The outer peripheral portion 52a is a portion of the shaft member 52 that expands in the axial direction and contacts the metal plate 51. The outer peripheral portion 52a determines an inner diameter R1 and an outer diameter R2 of the shaft member 52. The partition wall 52b is a portion of the shaft member 52 that is located inside the outer peripheral portion 52a in the radial direction of the shaft member 52 and that intersects the hollow portion 52c in a direction perpendicular to the axial direction. In the example shown in fig. 23, the shaft member 52 has the hollow portion 52c, so that the weight of the shaft member 52 can be reduced. This can facilitate handling of the roll 50. Further, since the shaft member 52 has the partition wall 52b, the rigidity of the shaft member 52 can be improved. This can suppress deformation or breakage of the shaft member 52 due to the weight of the shaft member 52 or the weight of the metal plate 51.
Fig. 24 is a cross-sectional view showing an example of the roll body 50 when cut along the line a-a in fig. 23. As shown in fig. 24, the partition wall 52b may be configured such that a hollow portion 52c located on one side of the partition wall 52b in the axial direction of the shaft member 52 communicates with a hollow portion 52c located on the other side of the partition wall 52 b.
Fig. 25 is a cross-sectional view showing an example of the roll body 50 when cut along the line a-a in fig. 23. As shown in fig. 25, the partition wall 52b may be configured such that a hollow portion 52c located on one side of the partition wall 52b and a hollow portion 52c located on the other side of the partition wall 52b in the axial direction of the shaft member 52 are separated by the partition wall 52 b.
In the above-described embodiment, the package body 55 is provided with the lower portion 57, the side portion 58, and the upper portion 59, but the package body 55 may have any configuration. For example, as shown in fig. 26, the package body 55 may include a pair of side portions 58 that are positioned on the sides of the wound body 50 and support the shaft member 52, but does not include the lower portion 57 and the upper portion 59. As shown in fig. 27, the package body 55 may include a pair of side portions 58 that are positioned on the sides of the wound body 50 and support the shaft member 52, and an upper portion 59 that covers the wound body 50 from above, but does not include the lower portion 57. In both the example shown in fig. 26 and the example shown in fig. 27, the side portion 58 preferably supports the shaft member 52 such that the metal plate 51 of the wound body 50 is positioned above the lower end 58b of the side portion 58. This can suppress deformation or breakage of the metal plate 51.
As shown in fig. 27, the upper portion 59 may be deformed such as bent by the weight of the upper portion 59 or the flexibility of the upper portion 59. The upper portion 59 may include a film made of a plastic material such as vinyl, for example. Such an upper portion 59 may be employed in the package body 55 shown in fig. 10A and 10B, which includes the lower portion 57, the side portion 58, and the upper portion 59.
In the above-described embodiment, the lower portion 57, the side portion 58, and the upper portion 59 of the package body 55 are each formed of a separate member. However, the present invention is not limited to this, and the lower portion 57 and the side portion 58 may be integrally formed as shown in fig. 28. For example, at least a part of the lower portion 57 and at least a part of the side portion 58 may be formed by bending a series of members such as a piece of reinforced corrugated paper and deforming the members. The upper portion 59 and the side portion 58 may be integrally formed.
Fig. 29 is a sectional view showing a modification of the package body 55. The package 55 may also be provided with an environmental conditioning agent 60 located inside the container 56. Examples of the environment conditioning agent 60 include a deoxidizer that traps oxygen in the container 56, and a desiccant that traps moisture in the container 56.
The desiccant is, for example, silica gel. The desiccant adsorbs moisture in the container 56, whereby the atmosphere in the container 56 can be maintained in a dry state. This can prevent the metal plate 51 and the shaft member 52 from being deteriorated by moisture.
The environment conditioner 60 may include either a deoxidizer or a desiccant, or both.
The interior of the vessel 56 may be depressurized to a pressure below atmospheric pressure. The container 56 may be filled with an inert gas or a non-reducing gas such as nitrogen. The concentration of the inert gas or non-reducing gas such as nitrogen gas in the container 56 may be 85% or more, 90% or more, or 95% or more.
Examples
Next, the above embodiments will be described more specifically by way of examples, but the embodiments are not limited to the contents described in the following examples as long as they do not exceed the gist thereof.
First, shaft members 52 having outer diameters R2 of 50mm, 75mm, 100mm, 125mm, 150mm, 200mm, 250mm, 300mm, 400mm, 500mm, and 600mm are prepared, respectively. As the shaft member 52, a hollow member containing a mixture of paper and a phenol resin is used. The difference between the outer diameter R2 and the inner diameter R1 of the shaft member 52 was 10 mm. As a tool for measuring the outer diameter R2 of the shaft member 52, a measuring scale is used.
In addition, metal plates 51 having thicknesses T of 8 μm, 10 μm, 13 μm, 15 μm, 18 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 50 μm and 100 μm were prepared, respectively. As a material of the metal plate 51, an iron alloy containing 34 mass% of nickel was used. As a device for measuring the thickness T of the metal plate 51, a length gauge HEIDENHAIM-METRO "MT 1271" manufactured by HEIDENHAIN and equipped with a ball guide type plunger was used. The length of each metal plate 51 in the longitudinal direction F1 was 200m, and the dimension W1 of each metal plate 51 in the width direction F2 was 500 mm. The number of prepared metal plates 51 of each thickness corresponds to the number of kinds of the outer diameters R2 of the shaft member 52.
Next, the metal plates 51 having the various thicknesses T are wound around the shaft members 52 having the various outer diameters R2, respectively, to produce wound bodies 50. Next, the weight of the roll 50 is measured. As a device for measuring the weight of the roll 50, a large scale on which a jig provided with the roll 50 is placed in advance is used. Subsequently, each of the wound bodies 50 was stored at 25 ℃ and 55 ℃ for 30 days. Thereafter, the metal plate 51 is unwound from each of the wound bodies 50, and the test piece 66 is produced. The dimension L1 of the test piece 66 in the longitudinal direction F1 was 500mm, and the dimension L2 of the test piece 66 in the width direction F2 was 500 mm.
Next, the measurement method shown in fig. 11 and 12 is performed to measure the gap S1 between the test piece 66 taken out from each roll 50 and the vertical surface 67a of the adherend 67. The results are shown in Table 1. Table 1 is a table showing the evaluation results of the warpage of the metal plate in the examples. In table 1, among the cells corresponding to the combination of the specific thickness T and the outer diameter R2, the cells corresponding to the combination of the gap S1 of 15mm or less are represented as "a 1" or "a 2". In addition, a cell corresponding to a combination in which the gap S1 exceeds 15mm and is 20mm or less is denoted by "B". In addition, a cell in which the gap S1 exceeds 20mm is denoted by "C". When the threshold value is set to 20mm and the determination step of determining whether or not the test piece 66 is acceptable is performed based on the value of the gap S1, "a 1", "a 2", and "B" indicate "acceptable", and "C" indicates "unacceptable". "a 1" and "a 2" are classifications based on the measurement result of the weight of the roll 50. "a 1" indicates that the weight of the roll 50 is 70kg or less, and "a 2" indicates that the weight of the roll 50 exceeds 70 kg. In view of the ease of handling the roll 50, the weight of the roll 50 is preferably 70kg or less. Thus, "a 1" is the most preferred result, "a 2" is the next most preferred result, and "B" is the next most preferred result to "a 2".
TABLE 1
Figure DEST_PATH_GDA0002399592510000291
As shown in table 1, when the thickness T of the metal plate 51 is 50 μm or less and the outer diameter R2 of the shaft member 52 is 150mm or more, the gap S1 is 15mm or less. When the thickness T of the metal plate 51 is 30 μm or less and the outer diameter R2 of the shaft member 52 is 125mm or more, the gap S1 is also 15mm or less.
As shown in fig. 21, when the thickness T of the metal plate 51 is 10 μm and the outer diameter R2 of the shaft member 52 is 100mm to 300mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.
When the thickness T of the metal plate 51 is 15 μm or less and the outer diameter R2 of the shaft member 52 is 125mm to 300mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.
When the thickness T of the metal plate 51 is 25 μm or less and the outer diameter R2 of the shaft member 52 is 125mm to 280mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.
When the thickness T of the metal plate 51 is 30 μm or less and the outer diameter R2 of the shaft member 52 is 125mm to 250mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.
When the thickness T of the metal plate 51 is 35 μm or less and the outer diameter R2 of the shaft member 52 is 150mm to 250mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.
When the thickness T of the metal plate 51 is 50 μm or less and the outer diameter R2 of the shaft member 52 is 150mm to 200mm, the gap S1 is 15mm or less and the weight of the roll 50 is 70kg or less.

Claims (18)

1. A roll for manufacturing a metal plate for a vapor deposition mask, comprising:
a shaft member having an outer diameter of 150mm or more and 550mm or less; and
the metal plate is wound around the shaft member and has a thickness of 50 μm or less.
2. The wound body according to claim 1, wherein the metal plate has an iron alloy containing 30 mass% or more and 54 mass% or less of nickel.
3. The jelly roll according to claim 1 or 2, wherein the shaft member has an outer diameter of 300mm or less,
the thickness of the metal plate is 30 μm or less.
4. The wound body according to claim 3, wherein the weight of the wound body is 70kg or less.
5. The jelly roll according to claim 3, wherein the shaft member comprises a phenolic resin.
6. The jelly roll according to claim 4, wherein the shaft member comprises a phenolic resin.
7. The jelly roll according to claim 3, wherein the shaft member is a hollow member having an inner diameter of 100mm or more.
8. The jelly roll according to any one of claims 4 to 6, wherein the shaft member is a hollow member having an inner diameter of 100mm or more.
9. The jelly roll according to claim 7, wherein the difference between the outer diameter and the inner diameter of the shaft member is 5mm or more.
10. The jelly roll according to claim 8, wherein the difference between the outer diameter and the inner diameter of the shaft member is 5mm or more.
11. The jelly roll according to claim 1 or 2, wherein the outer diameter of the shaft member is 300mm or more and 550mm or less,
the thickness of the metal plate is 50 μm or less.
12. The wound body according to claim 11, wherein the weight of the wound body is 100kg or less.
13. A package body, characterized in that the package body comprises:
a roll of metal plate for manufacturing a vapor deposition mask; and
a container for storing the wound body,
the wound body is provided with:
a shaft member having an outer diameter of 150mm or more and 550mm or less; and
the metal plate is wound around the shaft member and has a thickness of 50 μm or less.
14. The package of claim 13, wherein the container is provided with a side portion supporting the shaft member,
the side portion supports the shaft member such that the metal plate of the roll is positioned above a lower end of the side portion.
15. The package of claim 14, wherein the container comprises:
a lower portion located below the winding body; and
the side portion supports the shaft member so that the metal plate of the winding body does not contact the lower portion.
16. The package of claim 15, wherein the container has an upper portion covering the roll from above.
17. The package according to any one of claims 13 to 16, wherein the package comprises a deoxidizer or a desiccant in the container.
18. A metal plate for use in manufacturing a vapor deposition mask, wherein the metal plate is wound around a shaft member having an outer diameter of 150mm or more and 550mm or less,
the metal plate has a thickness of 50 μm or less.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110578119A (en) * 2018-06-08 2019-12-17 大日本印刷株式会社 Metal plate, wound body, method for packing and storing the same, package, and method for manufacturing vapor deposition mask
TWI785762B (en) * 2021-08-26 2022-12-01 達運精密工業股份有限公司 Method of fabricating metal mask and metal mask

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114850246B (en) * 2022-04-24 2022-11-29 广东嘉元科技股份有限公司 End-type electrothermal electrolytic copper foil anti-warping device and working method thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005255225A (en) 2004-03-12 2005-09-22 Dainippon Printing Co Ltd Tape roll pack and production method thereof
JP2008305492A (en) * 2007-06-07 2008-12-18 Dainippon Printing Co Ltd Method for manufacturing suspension substrate
JP2009137658A (en) * 2007-12-03 2009-06-25 Sumitomo Bakelite Co Ltd Method for continuously manufacturing laminated sheet
JP2015172252A (en) * 2009-11-24 2015-10-01 住友電気工業株式会社 magnesium alloy coil material
JP2012106747A (en) * 2010-11-15 2012-06-07 Asahi Glass Co Ltd Packaging container of roll-shaped article
JP5382257B1 (en) * 2013-01-10 2014-01-08 大日本印刷株式会社 Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate
JP5455099B1 (en) 2013-09-13 2014-03-26 大日本印刷株式会社 Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate
JP5516816B1 (en) * 2013-10-15 2014-06-11 大日本印刷株式会社 Metal plate, method for producing metal plate, and method for producing vapor deposition mask using metal plate
JP2016030648A (en) * 2014-07-30 2016-03-07 シーアイ化成株式会社 Packing carton for roll state material
KR20170048326A (en) 2014-08-29 2017-05-08 도레이 카부시키가이샤 Winding core and winding core manufacturing method
JP6237972B1 (en) * 2016-04-14 2017-11-29 凸版印刷株式会社 Vapor deposition mask substrate, vapor deposition mask substrate production method, and vapor deposition mask production method
TWI782212B (en) * 2018-06-08 2022-11-01 日商大日本印刷股份有限公司 Winding body of metal plate, packing body provided with winding body, packaging method of winding body, storage method of winding body, manufacturing method of vapor deposition cover using metal plate of winding body, and metal plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110578119A (en) * 2018-06-08 2019-12-17 大日本印刷株式会社 Metal plate, wound body, method for packing and storing the same, package, and method for manufacturing vapor deposition mask
TWI785762B (en) * 2021-08-26 2022-12-01 達運精密工業股份有限公司 Method of fabricating metal mask and metal mask

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