CN210676159U

CN210676159U - Cleaning tank and dresser cleaning system

Info

Publication number: CN210676159U
Application number: CN201921572089.3U
Authority: CN
Inventors: 倪震威; 马成斌; 季文明
Original assignee: Zing Semiconductor Corp
Current assignee: Zing Semiconductor Corp
Priority date: 2019-09-20
Filing date: 2019-09-20
Publication date: 2020-06-05
Anticipated expiration: 2029-09-20

Abstract

The utility model provides a washing tank and trimmer cleaning system. The cleaning tank comprises: a support body and a housing; the support body comprises a support column and a support panel sleeved on the support column; the shell is provided with an annular side wall and is hollow; in the working process of the cleaning tank, the supporting panel is clamped in the shell to form a cleaning space at the upper part of the shell for cleaning the trimmer, and the height of the cleaning space is greater than the length of a brush of the trimmer to be cleaned; the supporting panel is also provided with a liquid inlet hole and a plurality of liquid outlet holes, and the sum of the liquid outlet rates of the liquid outlet holes is smaller than the liquid inlet rate of the liquid inlet hole. The utility model provides a washing tank and trimmer cleaning system can effectively reduce remaining of particulate matter impurity through the structural design who optimizes, improves the cleanliness factor of washing tank, can improve the cleanliness of trimmer and then improve the cleanliness of grinding pad in the cleaning process who is used for the trimmer from this, finally realizes reducing the wafer pollution, improves the purpose of chemical mechanical polishing effect.

Description

Cleaning tank and dresser cleaning system

Technical Field

The utility model relates to a semiconductor manufacturing equipment field especially relates to a washing tank and trimmer cleaning system.

Background

The chemical mechanical polishing is a very important part of a wafer manufacturing process, and the main process is to place a wafer on a polishing pad of a chemical mechanical polishing apparatus, and remove a non-flat part of the wafer surface through mechanical and chemical actions to achieve overall planarization of the wafer surface. In order to ensure that the polishing equipment is kept in a good working state, a wafer factory regularly uses a dresser (dresser) to dress (dress) the polishing pad. In the process of dressing the polishing pad by the dresser, particle impurities on the polishing pad inevitably enter a hairbrush of the dresser, and if the particle impurities are not removed in time, the particle impurities are likely to be brought into the polishing pad to be dressed in the next dressing operation to cause pollution of the polishing pad and finally cause pollution of a wafer, so that the cleaning of the dresser is also very important. In the prior art, a wafer factory cleans a dresser by putting the dresser into a cleaning tank 1 ' as shown in fig. 1, the cleaning tank 1 ' is provided with a manual valve 11 ' and an overflow port 12 ', a part of particulate impurities remained in the cleaning tank 1 ' after the dresser is cleaned can overflow along with overflowing cleaning liquid, but the particulate impurities deposited at the bottom of the tank still need to be manually removed after the dresser is cleaned, and the use is very inconvenient; in addition, the cleaning space of the conventional cleaning tank 1' is very shallow, and is usually not greater than the length of the brush of the dresser, so that the brush of the dresser often contacts with the bottom of the cleaning tank during the cleaning process to draw the particulate impurities deposited on the bottom into the brush again, thereby causing secondary pollution.

SUMMERY OF THE UTILITY MODEL

In view of the above prior art's shortcoming, the utility model aims to provide a washing tank and trimmer cleaning system for it remains to solve current trimmer washing tank and produce the particulate matter easily, then leads to the pollution of trimmer and finally leads to the wafer to pollute easily, and current trimmer washing tank needs the manual cleaning to lead to the human cost to rise the scheduling problem.

To achieve the above and other related objects, the present invention provides a cleaning tank, comprising: a support body and a housing; the supporting body comprises a supporting column and a supporting panel sleeved on the supporting column; the shell is provided with an annular side wall and is hollow; in the working process of the cleaning tank, the supporting panel is clamped in the shell to form a cleaning space for accommodating cleaning liquid at the upper part of the shell at intervals for cleaning the trimmer, and the height of the cleaning space is greater than the length of a brush of the trimmer to be cleaned; the supporting panel is also provided with a liquid inlet hole and a plurality of liquid outlet holes, and the sum of the liquid outlet rates of the liquid outlet holes is smaller than the liquid inlet rate of the liquid inlet hole.

Optionally, the cleaning tank further includes a first driving device connected to the supporting column for driving the supporting column to move up and down.

Optionally, the cleaning tank further includes a second driving device connected to the housing for driving the housing to move up and down.

Optionally, the cleaning tank further includes a plurality of liquid discharge ports disposed on the annular side wall of the casing, and the liquid discharge ports are connected to a liquid discharge pipeline.

Optionally, the support body further includes a supporting seat, the supporting seat is connected to the supporting column and located at the bottom of the supporting column, and the supporting panel is located at the top of the supporting column.

Optionally, the supporting panel includes a metal layer and a rubber layer covering a surface of the metal layer.

Optionally, the housing comprises a layer of polypropylene material.

Optionally, the height of the cleaning space is greater than or equal to 10cm, and the aperture of the liquid discharge hole is 0.5-1 cm.

Optionally, the plurality of drain holes are evenly distributed on the support panel.

The utility model also provides a trimmer cleaning system, include: the cleaning tank, the cleaning solution supply pipeline and the outer tank in any one of the above schemes; one end of the cleaning tank is connected with a cleaning liquid source, and the other end of the cleaning tank is connected with the liquid inlet hole so as to supply cleaning liquid into the cleaning tank; the outer tank is positioned at the periphery of the shell of the cleaning tank; and a liquid outlet is arranged on the outer groove.

As described above, the utility model discloses a washing tank and trimmer cleaning system has following beneficial effect: the utility model provides a washing tank and trimmer cleaning system can avoid the brush of trimmer and the bottom of washing tank to contact through the structural design who optimizes at the in-process that washs the trimmer, simultaneously through setting up in a plurality of outage of washing tank bottom in time discharge particulate matter impurity at the flowing back in-process, can effectively reduce remaining of particulate matter impurity, improve the cleanliness factor of washing tank, can improve the cleanliness of trimmer and then improve the cleanliness of grinding pad in the cleaning process that is used for the trimmer from this, finally realize reducing the wafer pollution, improve the purpose of chemical mechanical polishing effect. Furthermore, adopt the utility model discloses a washing tank can greatly reduce the manual work volume, helps reducing the human cost. The utility model discloses simple structure, convenient to use not only can be arranged in the trimmer of chemical mechanical polishing equipment to wash, also is applicable to other and produces the remaining cleaning operation of particulate matter easily simultaneously, has higher industrial utilization value.

Drawings

Fig. 1 is a schematic structural diagram of a cleaning tank in the prior art.

Fig. 2 and fig. 3 are schematic structural views of the cleaning tank of the present invention, wherein fig. 2 is a state diagram of the cleaning tank in the process of dresser cleaning operation, and fig. 3 is a state diagram in the process of non-cleaning operation.

Fig. 4 is a schematic structural diagram of the dresser cleaning system of the present invention.

Description of the element reference numerals

1' cleaning tank

11' hand valve

12' overflow port

1 cleaning tank

11 support body

111 support column

112 support panel

113 liquid inlet hole

114 drain hole

115 supporting seat

12 casing

121 annular side wall

13 first driving device

14, 21 drain outlet

15 liquid discharge pipeline

16 overflow hole

2 outer groove

21 liquid discharge port

3 controller

Detailed Description

The following description is provided for illustrative purposes, and other advantages and features of the present invention will become apparent to those skilled in the art from the following detailed description.

Please refer to fig. 2 to 4. It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any structure modification, ratio relationship change or size adjustment should still fall within the scope covered by the technical content disclosed in the present invention without affecting the function and the achievable purpose of the present invention. Meanwhile, the terms such as "upper", "lower", "left", "right", "middle" and "one" used in the present specification are for convenience of description, and are not intended to limit the scope of the present invention, and changes or adjustments of the relative relationship thereof may be made without substantial technical changes, and the present invention is also regarded as the scope of the present invention.

As shown in fig. 2 to 3, the present invention provides a cleaning tank 1, wherein the cleaning tank 1 comprises: a support body 11 and a housing 12; the supporting body 11 comprises a supporting column 111 and a supporting panel 112 sleeved on the supporting column 111; the housing 12 has an annular side wall 121 and is hollow; during the operation of the cleaning tank 1, such as during the cleaning operation of the dresser, the support panel 112 is clamped in the housing 12 (i.e. the circumferential surface of the support panel 112 is in contact with the annular sidewall 121) to partition a cleaning space containing the cleaning liquid at the upper part of the housing 12 for cleaning the dresser, and the height of the cleaning space is greater than the brush length of the dresser to be cleaned; the support panel 112 is further provided with a liquid inlet hole 113 and a plurality of liquid outlet holes 114, and the sum of the liquid outlet rates of the liquid outlet holes 114 is smaller than the liquid inlet rate of the liquid inlet hole 113, so as to ensure that the liquid inlet rate is greater than the liquid outlet rate during the dresser cleaning operation, and the cleaning space can contain enough cleaning liquid. Fig. 2 is a view showing the cleaning tank 1 in a state during a cleaning operation of a dresser, and fig. 3 is a view showing the cleaning tank 1 in a state during a non-cleaning operation.

The utility model provides a washing tank can avoid the brush of trimmer and the bottom of washing tank to contact through the structural design who optimizes at the in-process that washs the trimmer, avoid deposiing in the particulate matter impurity of washing tank bottom to be drawn into again and cause secondary pollution in the brush of trimmer, in time discharge particulate matter impurity at the flowing back in-process through setting up a plurality of outage on support panel simultaneously, can effectively reduce remaining of particulate matter impurity, improve the cleanliness factor of washing tank, can improve the cleanliness of trimmer and then improve the cleanliness of grinding pad in the cleaning process that is used for the trimmer from this, finally realize reducing the wafer pollution, improve the purpose of chemical mechanical polishing effect. Furthermore, adopt the utility model discloses a washing tank can greatly reduce the manual work volume, helps reducing the human cost.

As an example, the cleaning tank 1 includes a first driving device 13 connected to the supporting column 111 for driving the supporting column 111 to move up and down, thereby moving the supporting panel 112 up and down and forming semi-enclosed spaces with different heights in the housing 12. For example, during a cleaning operation of a dresser, the supporting column 111 may drive the supporting panel 112 to descend to the bottom end so that the separated cleaning space has a sufficient depth to accommodate the dresser, and during a non-cleaning operation, the supporting column 111 may drive the supporting panel 112 to ascend under the driving of the first driving device 13 so that the horizontal surface of the supporting panel 112 is flush with the upper surface of the annular sidewall 121 to discharge particulate matter impurities remaining on the supporting panel 112 outwards along with the overflowing cleaning liquid from the circumferential direction of the supporting panel 112. The first driving device 13 may be an air cylinder or a servo motor.

The support panel 112 may have a groove (not shown) therein, and the plurality of drainage holes 114 may be located in the groove to facilitate the particulate impurities to settle into the drainage holes 114 and to be drained through the drainage holes 114; or the liquid discharge hole 114 may be funnel-shaped, and the opening surface is a smooth opening surface with a certain inclination, so as to facilitate the particulate impurities to slide into the liquid discharge hole 114 and be discharged; alternatively, the supporting panel 112 may have a shape that protrudes downward from the middle (i.e., the supporting panel 112 is funnel-shaped as a whole) and the plurality of drain holes 114 are located in the middle of the supporting panel 112, which is not limited in this embodiment. It should be noted that the drain hole 114 is usually connected to a drain pipe (not shown) instead of directly draining the liquid, so as to avoid corrosion of the electrical components at the bottom of the cleaning tank 1.

As an example, the cleaning tank 1 further includes a second driving device (not shown) connected to the housing 12 for driving the housing 12 to move up and down, and a cleaning space for containing a cleaning liquid can be partitioned in the housing 12 by the up and down movement of the housing 12. The number of the second driving devices is one or more, for example, 2, and 2 second driving devices may be symmetrically distributed on two sides of the housing 12 to improve the balance degree during the lifting process of the housing 12. The first driving device 13 and the second driving device may be provided by either one or both of them, but the present embodiment is not limited thereto.

The maximum height of the cleaning space may be determined according to the length of the brush of the dresser to be cleaned in combination with the height of the housing 12. In the embodiment, as an example, the height of the cleaning space is greater than or equal to 10cm, preferably 15-20 cm, and the height is determined by the inventor according to the specification of the conventional common dresser of a 12-inch wafer factory.

The diameter of the drain holes 114 may be determined by the number of the drain holes 114 and/or the diameter of the liquid inlet holes 113. In one example, the diameter of the drain hole 114 is 0.5 to 1cm, and more preferably 0.7 cm. The number of the drain holes 114 may be specifically 2 or more, such as 3, 4 or more, the hole diameters of the plurality of drain holes 114 are preferably the same, and the plurality of drain holes 114 are preferably uniformly distributed on the support panel 112, such as along the circumferential direction of the support panel 112, so as to ensure the liquid level and the hydraulic pressure balance at all positions of the cleaning space during the cleaning operation.

In one example, the support panel 112 further has an overflow hole 16, and the overflow hole 16 can overflow the cleaning solution and discharge part of the particulate impurities through the overflow cleaning solution. When the overflow hole 16 is provided, the sum of the liquid discharge rate of the overflow hole 16 and the liquid discharge rates of the liquid discharge holes 114 is required to be smaller than the liquid inlet rate of the liquid inlet hole 113. This can be achieved by controlling the diameters of the plurality of drain holes 114 and the liquid inlet hole 113, or by controlling the flow rate of the liquid, but the former is preferable in this embodiment.

For example, the cleaning liquid may be supplied into the cleaning space from a bottom to top manner from an end of a liquid supply pipe (not shown) connected to the liquid inlet hole 113 under the support panel 112, which is advantageous for preventing the cleaning liquid from splashing outward during the liquid supply process. Of course, in other examples, the cleaning liquid may be supplied to the cleaning space from the top to the bottom, or both of them may be provided, and the present embodiment is not limited thereto.

Illustratively, the cleaning tank 1 further includes a plurality of, for example, 2, liquid discharge ports 14 provided on the annular side wall 121 of the casing 12, and the liquid discharge ports 14 are connected to a liquid discharge pipe 15. The plurality of discharge ports 14 may be uniformly distributed along the circumferential direction of the annular sidewall 121, and a valve (not shown) is disposed on the discharge pipe 15, so that the cleaning liquid in the cleaning space can be discharged when the valve is opened when necessary, which is especially necessary when the cleaning liquid needs to be rapidly replaced.

As an example, the supporting body 11 further includes a supporting seat 115, the supporting seat 115 is connected to the supporting column 111 and is located at the bottom of the supporting column 111, and the supporting panel 112 is located at the top of the supporting column 111. The support base 115 may be cylindrical, trapezoidal or other structures for fixing and supporting, preferably cylindrical, so as to facilitate the matching of the housing 12 and the support body 11. The supporting column 111 and the supporting base 115 can be detachably connected, and the supporting column 111 and the supporting panel 112 can also be detachably connected, so as to quickly disassemble the cleaning tank 1 when needed, such as when performing maintenance work or equipment transportation.

The material of the support panel 112 and the housing 12 may be set as required. In one example, the supporting panel 112 includes a metal layer and a rubber layer covering the metal layer to ensure that the supporting panel 112 does not deform during the up-and-down movement and to ensure that the supporting panel 112 can closely adhere to the annular sidewall 121 to prevent the cleaning space from leaking liquid and corroding the electrical components at the bottom of the supporting panel 112. The casing 12 may be made of a polypropylene material layer (commonly referred to as a PP material) to facilitate improvement of a sealing effect, or the casing 12 may also be made of a composite material structure in which a metal layer is coated with a rubber layer, the metal layer facilitates improvement of stability of the casing 12, the rubber layer may improve a waterproof effect, and damage to the casing 12 during up-down lifting is reduced.

In order to further reduce manual work, the cleaning tank 1 may be connected to a controller 3, such as a computer or a single chip, and the controller 3 performs unified control according to a process flow, such as controlling the first driving device 13 and the second driving device to ascend and descend according to preset process parameters to implement operations at different stages.

As shown in fig. 4, the present invention further provides a dresser cleaning system, which includes the cleaning tank 1 according to any one of the above embodiments, so that reference is made to the foregoing for describing the cleaning tank 1, and details are not repeated for brevity; the dresser cleaning system also comprises a cleaning liquid supply pipeline and an outer tank 2; one end of the cleaning tank 1 is connected with a cleaning liquid source, and the other end of the cleaning tank 1 is connected with the liquid inlet hole 113 so as to supply cleaning liquid into the cleaning tank 1; the outer tank 2 is positioned at the periphery of the housing 12 of the cleaning tank 1; the outer tank 2 is provided with a liquid discharge port 14.

The reason why the cleaning liquid supply line is not illustrated in fig. 4 is that: as mentioned above, the specific location of the cleaning liquid supply line may vary according to different needs. For example, the liquid supply end of the cleaning liquid supply pipeline can directly extend to the upper part of the cleaning tank 1 to supply liquid to the cleaning space; the cleaning liquid supply pipeline may extend from the bottom of the supporting panel 112 to be connected to one end of the liquid inlet hole 113, or may include the cleaning liquid supply methods in the two solutions, but in this embodiment, the cleaning liquid supply pipeline is not limited strictly, but preferably extends from the bottom of the supporting panel 112 to be connected to the liquid inlet hole 113 for performing a bottom-up liquid supply method.

The type of the cleaning liquid can be set according to different requirements, and therefore the material of the cleaning liquid supply pipeline, even including the material of the housing 12 and the supporting panel 112, needs to be selected according to different cleaning liquids. In this embodiment, the kind of the cleaning solution is preferably, but not limited to, one or more of deionized water (DIW) and diluted hydrofluoric acid.

As an example, the dresser cleaning system further includes a recovery device (not shown) connected to the drain port 21 of the outer tank 2 for recovering the cleaning liquid discharged from the outer tank 2; of course, in other examples, the dresser cleaning system may further include a recovery device, such as a filter, directly disposed in the outer tank 2, and the filtered cleaning solution may be directly used as a raw material for the next cleaning operation.

As an example, the dresser cleaning system may further include a controller 3, such as a computer, and the controller 3 may control the first driving device 13 and the second driving device, and control the supply and discharge of the cleaning liquid, so as to improve the automation level of the entire dresser cleaning system.

As described above, the utility model provides a washing tank and trimmer cleaning system, the washing tank includes: a support body and a housing; the supporting body comprises a supporting column and a supporting panel sleeved on the supporting column; the shell is provided with an annular side wall and is hollow; in the working process of the cleaning tank, the supporting panel is clamped in the shell to form a cleaning space for accommodating cleaning liquid at the upper part of the shell at intervals for cleaning the trimmer, and the height of the cleaning space is greater than the length of a brush of the trimmer to be cleaned; the supporting panel is also provided with a liquid inlet hole and a plurality of liquid outlet holes, and the sum of the liquid outlet rates of the liquid outlet holes is smaller than the liquid inlet rate of the liquid inlet hole. The utility model provides a washing tank and trimmer cleaning system can avoid the brush of trimmer and the bottom of washing tank to contact through the structural design who optimizes at the in-process that washs the trimmer, simultaneously through setting up in a plurality of outage of washing tank bottom in time discharge particulate matter impurity at the flowing back in-process, can effectively reduce remaining of particulate matter impurity, improve the cleanliness factor of washing tank, can improve the cleanliness of trimmer and then improve the cleanliness of grinding pad in the cleaning process that is used for the trimmer from this, finally realize reducing the wafer pollution, improve the purpose of chemical mechanical polishing effect. Furthermore, adopt the utility model discloses a washing tank can greatly reduce the manual work volume, helps reducing the human cost. The utility model discloses simple structure, convenient to use not only can be arranged in the trimmer of chemical mechanical polishing equipment to wash, also is applicable to other and produces in the remaining washing operation of particulate matter easily simultaneously. Therefore, the utility model effectively overcomes various defects in the prior art and has high industrial utilization value.

The above embodiments are merely illustrative of the principles and effects of the present invention, and are not to be construed as limiting the invention. Modifications and variations can be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which may be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.

Claims

1. A cleaning tank, comprising:

the supporting body comprises a supporting column and a supporting panel sleeved on the supporting column;

a housing having an annular sidewall and being hollow; in the working process of the cleaning tank, the supporting panel is clamped in the shell to form a cleaning space for accommodating cleaning liquid at the upper part of the shell at intervals for cleaning the trimmer, and the height of the cleaning space is greater than the length of a brush of the trimmer to be cleaned;

the supporting panel is also provided with a liquid inlet hole and a plurality of liquid outlet holes, and the sum of the liquid outlet rates of the liquid outlet holes is smaller than the liquid inlet rate of the liquid inlet hole.

2. The cleaning tank as set forth in claim 1, wherein: the cleaning tank further comprises a first driving device which is connected with the supporting column and used for driving the supporting column to move up and down.

3. The cleaning tank as set forth in claim 1, wherein: the cleaning tank also comprises a second driving device which is connected with the shell and used for driving the shell to move up and down.

4. The cleaning tank as set forth in claim 1, wherein: the cleaning tank further comprises a plurality of liquid discharge ports arranged on the annular side wall of the shell, and the liquid discharge ports are connected with a liquid discharge pipeline.

5. The cleaning tank as set forth in claim 1, wherein: the supporting body further comprises a supporting seat, the supporting seat is connected with the supporting column and located at the bottom of the supporting column, and the supporting panel is located at the top of the supporting column.

6. The cleaning tank as set forth in claim 1, wherein: the supporting panel comprises a metal layer and a rubber layer covering the surface of the metal layer.

7. The cleaning tank as set forth in claim 1, wherein: the housing comprises a layer of polypropylene material.

8. The cleaning tank as set forth in claim 1, wherein: the height of the cleaning space is more than or equal to 10cm, and the aperture of the liquid discharge hole is 0.5-1 cm.

9. The cleaning tank as set forth in claim 1, wherein: the plurality of liquid discharge holes are uniformly distributed on the supporting panel.

10. A conditioner cleaning system, comprising:

a cleaning tank as claimed in any one of claims 1 to 9;

a cleaning liquid supply pipeline, one end of which is connected with a cleaning liquid source and the other end of which is connected with the liquid inlet hole, so as to supply cleaning liquid into the cleaning tank;

an outer tub positioned at a periphery of the housing of the cleaning tub; and a liquid outlet is arranged on the outer groove.