CN210444550U - Hollow probe for plasma diagnosis - Google Patents
Hollow probe for plasma diagnosis Download PDFInfo
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- CN210444550U CN210444550U CN201921106442.9U CN201921106442U CN210444550U CN 210444550 U CN210444550 U CN 210444550U CN 201921106442 U CN201921106442 U CN 201921106442U CN 210444550 U CN210444550 U CN 210444550U
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Abstract
The utility model provides a cavity probe for plasma diagnosis, belongs to plasma scientific parameter measurement technical field, including cavity casing, insulation support and wire, cavity casing one end be the blind end, the other end is open end, insulation support get into cavity casing inside and with cavity casing fixed connection through open end, the cavity casing be located insulation support's the outside, there is the clearance between insulation support and the cavity casing, wire install in insulation support, wire's one end switches on with the cavity casing mutually, the other end extends to the insulation support outside. The method can be used for conducting film deposition environment plasma diagnosis, avoids the probe and the conducting coating film on the insulating support from being scrapped due to short circuit, and can measure and obtain the density of the plasma more accurately.
Description
Technical Field
The utility model belongs to the technical field of plasma science parameter measurement, concretely relates to a cavity probe for plasma diagnosis.
Background
The probe is a commonly used device for diagnosing plasma parameters and can be divided into diagnostic methods such as a single probe, a double probe, a triple probe and the like. The single probe method is that a small metal electrode is placed in plasma, scanning bias voltage is added between a probe and the plasma ground, then the change of probe current along with the scanning bias voltage is measured to obtain a volt-ampere characteristic curve, and then the parameters of the plasma can be obtained by analyzing the volt-ampere characteristic curve. The double-probe method uses two small metal electrodes close to each other, and scanning bias voltage is applied between the two electrodes, and plasma parameters are obtained by analyzing a volt-ampere characteristic curve. The three-probe method uses three small metal electrodes close to each other, a fixed voltage is applied between two electrodes, the voltage and current between the two electrodes and a third electrode are measured, and the plasma density and the electron temperature can be calculated by using a formula.
The probe used in the prior art is generally cylindrical, spherical or planar in shape. The cylindrical probe is easy to manufacture and is most widely used due to small disturbance to plasma, but the cylindrical probe is poor in space symmetry, strong in tip electric field and uneven in collected current density on the probe, so that surface potential difference and current are generated, and measurement accuracy is affected. In addition, the part of the cylindrical probe close to the insulating support can be shielded by the sheath layer of the insulating support, so that the charge can not be effectively collected, the effective charge collection area can not be accurately determined, and the electron density calculation is inaccurate. Compared with a cylindrical probe, the spherical probe has smaller disturbance to the plasma and good space symmetry, but the spherical probe cannot avoid the problem that the part of the spherical probe close to the insulating support is shielded by the sheath of the insulating support so that the charge cannot be effectively collected, so that the effective charge collection area cannot be accurately determined and the electron density calculation is inaccurate. The planar probe is least used due to large disturbance to plasma and imperfect theory, and the planar probe also has the problems of non-uniform electric field and shielding of the probe by a sheath layer of an insulating bracket.
Most importantly, these shaped probes cannot be used for plasma diagnostics in conductive film deposition environments, because in such environments, the shaped probes and their insulating support surfaces would be quickly short-circuited by a conductive film coating, rendering the probes unusable for further use. Because a large amount of plasmas in the deposition environment of the conductive film exist in practical production application and need to be diagnosed, such as plasmas in the deposition environment of films of TiN, CrN, ITO and the like, the problem is very necessary to be solved.
Disclosure of Invention
The utility model aims at providing a cavity probe for plasma diagnosis to solve prior art probe and can not be used for conductive film deposition environment plasma diagnosis, and be used for other plasma diagnosis inaccurate problems of measurement.
The utility model discloses a cavity probe for plasma diagnosis through following mode realization, including cavity casing, insulation support and wire. One end of the hollow shell is a closed end, the other end of the hollow shell is an open end, and a cavity is formed inside the hollow shell. After the insulating sleeve enters the hollow shell through the open end, the insulating sleeve can be fixedly connected with the inner wall of the closed end of the hollow shell in a gluing mode and also can be fixedly connected with the inner wall of the closed end of the hollow shell in a screwing mode, so that the outer wall of the insulating sleeve is sleeved with the hollow shell, and the hollow shell is positioned on the outer side of the insulating sleeve. The insulation support is characterized in that a gap is reserved between the insulation support and the hollow shell, the metal wire is installed in the insulation support, namely the insulation support wraps the metal wire, one end of the metal wire is communicated with the hollow shell, the conduction modes are divided into two modes, one mode is that the metal wire is directly contacted with the hollow shell to be conducted, the other mode is that the metal wire is indirectly contacted with the hollow shell through a conductive medium to be conducted, and the other end of the metal wire extends to the outside of the insulation support and is connected with external equipment.
The hollow shell is made of metal materials.
The preferred hollow shell is a hemispherical shell or a dome cylindrical shell.
And at least two grooves are formed in one end, fixed with the hollow shell, of the insulating sleeve.
The outer diameter of the hollow shell is 1mm-100mm, and the wall thickness of the hollow shell is 0.1mm-1 mm.
The width of clearance be less than one fifth of hollow shell external diameter, the degree of depth in clearance is greater than 3 times of the biggest width in clearance.
The preferred metal material is tungsten or molybdenum or tantalum or nickel or platinum or brass or stainless steel.
The utility model has the advantages that: when the conductive film is used in a conductive film deposition environment, the probe and a conductive coating on the insulating support can be prevented from being scrapped due to short circuit, so that the conductive film deposition environment plasma diagnosis device can be used for plasma diagnosis in the conductive film deposition environment; on the other hand, the shielding of the sheath layer of the insulating support to the probe is avoided, and the density of the obtained plasma can be measured more accurately.
Drawings
FIG. 1 is a schematic view of a hollow probe having a hemispherical shell;
FIG. 2 is a view showing a structure of a hollow probe in which a hollow case is screwed to an insulating sleeve;
FIG. 3 is a schematic diagram of a hollow probe in which the hollow housing is a dome cylinder housing;
FIG. 4 is a schematic diagram of a hollow probe employing an insulating sleeve with a groove;
as shown in fig. 1 to 4, the hollow shell (1), the insulating sleeve (2), the metal wire (3), the closed end (4), the open end (5), the gap (6), the screw (7) and the groove (8).
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1 to 4, a hollow probe for plasma diagnosis includes a hollow housing 1, an insulating sleeve 2 and a metal wire 3. One end of the hollow shell 1 is a closed end 4, the other end is an open end 5, the inside of the hollow shell is a cavity, the hollow shell 1 is made of metal materials such as tungsten, molybdenum, tantalum, nickel, platinum, brass or stainless steel, the size of the hollow shell 1 is selected to be related to the density of the plasma to be measured, and the general range of the outer diameter is as follows: 1mm to 100mm, in order to ensure the strength of the hollow shell 1, the wall thickness ranges from: 0.1mm-1 mm; after the insulating sleeve 2 enters the hollow shell 1 through the open end 5, the insulating sleeve 2 can be fixedly connected with the inner wall of the closed end 4 of the hollow shell 1 in an adhesive mode and can also be fixedly connected with the inner wall of the closed end 4 of the hollow shell 1 in a screwing mode through a screw 7, so that the hollow shell 1 is sleeved on the outer wall of the insulating sleeve 2, the hollow shell 1 is positioned on the outer side of the insulating sleeve 2, a gap 6 is reserved between the insulating sleeve 2 and the hollow shell 1, the width of the gap 6 is smaller than one fifth of the outer diameter of the hollow shell 1, and the depth of the gap 6 is larger than 3 times of the maximum width of the gap 6; the metal wire 3 is arranged in the insulating sleeve 2, one end of the metal wire 3 is communicated with the hollow shell 1, namely the metal wire 3 is directly communicated with the joint of the hollow shell 1, or the metal wire 3 is indirectly contacted and communicated with the hollow shell 1 through a conductive medium, and the other end of the metal wire extends to the outside of the insulating sleeve 2 and is connected with external equipment.
The preferred hollow shell 1 is a hemispherical shell or a dome cylinder shell.
And at least two grooves are formed in one end, fixed with the hollow shell, of the insulating sleeve.
Example 1 hollow probe for use in plasma diagnostics for measuring the environment for conductive film deposition as shown in FIG. 1, plasma density was in the range of 108-1010/cm3The hollow shell 1 is a hemispherical shell made of 304 stainless steel, the outer diameter is 1.2mm, the wall thickness is 0.1mm, the outer diameter of the insulating sleeve 2 is 0.6mm, the gap 6 between the insulating sleeve 2 and the hollow shell 1 is smaller than 0.24mm, the depth of the gap 6 is larger than 3 times of the maximum width of the gap, the insulating sleeve 2 is fixedly bonded with the hollow shell 1 through silver colloid, and the metal wire 3 is directly conducted with the hollow shell 1 through silver colloid bonding and is led out through the insulating sleeve 2.
Example 2 measurement of hollow probes used in Low Density spatial plasma diagnostics, plasma Density range 10, as shown in FIG. 25-106/cm3The utility model discloses a hollow shell, hollow shell 1 adopts the hemisphere casing that the brass was made, the external diameter is 50mm, wall thickness 1mm, insulation support 2's external diameter is 30mm, clearance 6 between insulation support 2 and the hollow shell 1 is less than 10mm, the 6 degree of depth in clearance is greater than 3 times of its maximum width, screw 7 is fixed on the 4 inner walls of blind end of hollow shell 1, and insulation support 2 installs on screw 7 through threaded connection, metal wire 3 forms indirectly with hollow shell 1 on screw 7 through welded fastening, and pass insulation support 2 and draw forth.
Example 2 compared with example 1, the insulating sleeve 2 and the hollow shell 1 are not in direct contact, a bent gap 6 is formed, and short circuit between the hollow shell 1 and the conductive coating on the insulating sleeve 2 can be avoided more effectively.
Example 3 hollow probe for use in plasma diagnostics for measuring conductive film deposition environments as shown in FIG. 3, plasma density was in the range of 108-1010/cm3The hollow shell 1 is a dome cylinder shell made of 304 stainless steel, the outer diameters of a dome and a cylinder are 1.2mm, the wall thickness is 0.1mm, the outer diameter of the insulating sleeve 2 is 0.6mm, a gap 6 between the insulating sleeve 2 and the hollow shell 1 is smaller than 0.24mm, the depth of the gap 6 is larger than 3 times of the maximum width of the gap, the insulating sleeve 2 is fixedly bonded with the hollow shell 1 through silver colloid, and the metal wire 3 is directly conducted with the hollow shell 1 through silver colloid bonding and is led out through the insulating sleeve 2.
Embodiment 3 is compared with embodiment 1, the gap between the insulating sleeve 2 and the hollow shell 1 is deeper, the conductive coating component is less likely to deposit into the gap, and the short circuit between the hollow shell 1 and the conductive coating on the insulating sleeve 2 can be more effectively avoided. However, compared with the hollow shell 1 of the hemispherical shell, the surface area of the hollow shell 1 of the spherical top cylindrical shell with the same diameter is larger, the collection current is larger, the plasma disturbance is larger, and the probe power consumption is also larger. Therefore, in use, the proper hollow shell 1 is selected according to the practical situation of the plasma, so that the short circuit problem of the conductive coating can be solved, the collected current and the disturbance of the plasma can be reduced, and an accurate measurement result can be obtained.
Example 4, as shown in fig. 4, in the hollow probe used in plasma diagnosis for measuring the conductive thin film deposition environment, the hollow shell 1 is a dome cylindrical shell made of 304 stainless steel, at least two annular grooves 8 are formed at one end of the insulating sleeve 2, the insulating sleeve 2 is fixed to the hollow shell 1 by silver adhesive, and the metal wire 3 is directly conducted to the hollow shell 1 by silver adhesive and led out through the insulating sleeve 2.
Compared with the embodiment 3, in the embodiment 4, the annular groove 8 is formed on the insulating sleeve 2, and the conductive coating component is not easy to form a continuous conductive film layer, so that the short circuit between the hollow shell 1 and the conductive coating on the insulating sleeve 2 can be more effectively avoided. On the other hand, the enhanced anti-short circuit effect relaxes the depth requirement of the gap 6, and the surface area of the hollow housing 1 can be reduced, thereby reducing the collection current and the disturbance to the plasma and the probe power consumption.
In embodiments 1 to 4, the hollow shells 1 are all located outside the insulating sleeve 2, so that the hollow shells 1 are prevented from being shielded by the sheath layer of the insulating sleeve 2, and the charge collection area is exactly the outer surface area of the hollow shells 1, so that the plasma density can be accurately measured; compared with the prior art, the metal probes are all positioned on the inner side of the insulating sleeve and are inevitably shielded by the sheath layer part of the insulating sleeve, so that the effective charge collecting area of the probes cannot be accurately determined, and the plasma density cannot be accurately measured. In addition, in examples 1 to 4, the gap between the insulating sleeve and the hollow shell does not directly face the coating source and the plasma, so that the deposition of the coating material in the gap 6 can be more effectively avoided; on the other hand, the plasma is not easy to enter the gap 6 to be additionally collected, and the measurement is more accurate.
Claims (8)
1. The utility model provides a cavity probe for plasma diagnosis, characterized in that, includes cavity casing (1), insulation support (2) and wire (3), cavity casing (1) one end be blind end (4), the other end is open end (5), cavity casing (1) be located the outside of insulation support (2), insulation support (2) get into cavity casing (1) inside and through gluing or screw (7) fixed connection with the inner wall of cavity casing (1) through open end (5), there is gapped (6) between insulation support (2) and cavity casing (1), wire (3) install in insulation support (2), the one end of wire (3) switches on with cavity casing (1), the other end extends to the insulation support (2) outside.
2. A hollow probe for plasma diagnosis according to claim 1, characterized in that the hollow housing (1) is made of metal.
3. A hollow probe for plasma diagnostics according to claim 1 or 2, characterized in that the hollow housing (1) is a hemispherical housing or a dome cylinder housing.
4. A hollow probe for plasma diagnostics according to claim 3 characterized in that the outer diameter of the hollow housing (1) is 1mm-100mm and the wall thickness of the hollow housing (1) is 0.1mm-1 mm.
5. A hollow probe for plasma diagnostics as claimed in claim 1, characterized in that the width of the gap (6) is less than one fifth of the outer diameter of the hollow housing (1), the depth of the gap (6) being more than 3 times the maximum width of the gap (6).
6. A hollow probe for plasma diagnosis according to claim 2, wherein the metal material is tungsten or molybdenum or tantalum or nickel or platinum or brass or stainless steel.
7. A hollow probe for plasma diagnostics as claimed in claim 1, characterized in that the screw (7) is fixed to the inner wall of the closed end (4).
8. A hollow probe for plasma diagnosis according to claim 1, characterized in that the end of the insulating sleeve fixed to the hollow housing is provided with at least two grooves (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921106442.9U CN210444550U (en) | 2019-07-16 | 2019-07-16 | Hollow probe for plasma diagnosis |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921106442.9U CN210444550U (en) | 2019-07-16 | 2019-07-16 | Hollow probe for plasma diagnosis |
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| CN210444550U true CN210444550U (en) | 2020-05-01 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110402005A (en) * | 2019-07-16 | 2019-11-01 | 上海红璨科技有限公司 | A kind of hollow probe for plasma diagnostics |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110402005A (en) * | 2019-07-16 | 2019-11-01 | 上海红璨科技有限公司 | A kind of hollow probe for plasma diagnostics |
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