CN110402005A - A kind of hollow probe for plasma diagnostics - Google Patents
A kind of hollow probe for plasma diagnostics Download PDFInfo
- Publication number
- CN110402005A CN110402005A CN201910638413.5A CN201910638413A CN110402005A CN 110402005 A CN110402005 A CN 110402005A CN 201910638413 A CN201910638413 A CN 201910638413A CN 110402005 A CN110402005 A CN 110402005A
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- CN
- China
- Prior art keywords
- hollow housing
- hollow
- insulating sleeve
- probe
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 title claims abstract description 50
- 239000004020 conductor Substances 0.000 claims abstract description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 5
- 229910001369 Brass Inorganic materials 0.000 claims description 4
- 239000010951 brass Substances 0.000 claims description 4
- 238000009413 insulation Methods 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 238000004026 adhesive bonding Methods 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- 210000002381 plasma Anatomy 0.000 description 38
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000003745 diagnosis Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 210000000234 capsid Anatomy 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
A kind of hollow probe for plasma diagnostics, belong to plasma science parameter measuring technical field, including hollow housing, insulating sleeve and plain conductor, described hollow housing one end is closed end, the other end is open end, the insulating sleeve is entered inside hollow housing by open end and is fixedly connected with hollow housing, the hollow housing is located at the outside of insulating sleeve, there is gap between the insulating sleeve and hollow housing, the plain conductor is mounted in insulating sleeve, one end of plain conductor is conducted with hollow housing, the other end extends to outside insulating sleeve.It can be used in conductive film depositional environment plasma diagnostics, avoid probe short-circuit with the conductive plated film on insulating support and scrap, and can more accurately measure the density for obtaining plasma.
Description
Technical field
The invention belongs to plasma science parameter measuring technical fields, and in particular to be used for plasma diagnostics to a kind of
Hollow probe.
Background technique
Probe is the diagnosis common device of plasma parameter, can be divided into the diagnosis sides such as Single probe, double probes, three probes
Method.Single-probe method is the small metal electrode being placed in plasma, plus scanning between probe and plasma ground
Then bias voltage measures probe current and obtains VA characteristic curve with the variation of scanning bias voltage, then passes through analysis volt-ampere
Characteristic curve can be obtained by the parameter of plasma.Two-probe me- thod uses two small metal electrodes close to each other, scanning
Bias voltage adds between electrodes, and the parameter of plasma is obtained by analysis VA characteristic curve.Triple-probe method
Using three small metal electrodes close to each other, a fixed voltage is added between wherein two electrodes, measures the two electrodes
With the voltage and current between third electrode, plasma density and electron temperature can be calculated using formula.
The probe shape that the prior art uses is usually cylindrical, spherical or plane.Cylindrical needle is easily made due to it
To make and plasma disturbance is smaller and most widely used, but cylindrical needle spatial symmetry is bad, tip electric field is stronger,
Collected current Density inhomogeneity on probe, to generate the accuracy for influencing measurement along face potential difference and electric current.In addition, circle
Cylindricality probe will receive blocking for insulating support sheaths close to the part of its insulating support and cannot effectively collect charge, therefore not
Effective charge collecting area can be accurately determined, so that electronic densitometer be made not calculate accurately really.Compared with cylindrical needle, spherical shape is visited
For plasma disturbance, smaller and spatial symmetry is good, but spherical probes can not avoid its close to the part of insulating support by
The problem of blocking and cannot effectively collect charge of insulating support sheaths, prevent effective charge collecting area from accurately determine with
And electronic densitometer is thus caused not calculated accurately really.Plane probe at least makes because the disturbance of its plasma is big and theoretical not perfect
With, and plane probe equally exists the problem of electric field is uneven and probe is blocked by insulating support sheaths.
More important is, the probe of these shapes all cannot be used on the plasma diagnostics of conductive film depositional environment,
Because in this environment, the probe of these shapes and its insulating support surface can be coated with layer of conductive film quickly and
Short circuit cannot be used continuously probe.Since there are the plasmas of a large amount of conductive film depositional environments in production application
It is diagnosed, such as the plasma of the films depositional environment such as TiN, CrN, ITO, solves the problems, such as that this is very necessary.
Summary of the invention
The object of the present invention is to provide a kind of hollow probes for plasma diagnostics, to solve prior art probe not
It can be used for conductive film depositional environment plasma diagnostics, and the problem for other plasma diagnostics measurement inaccuracy.
The present invention is achieved in the following ways a kind of hollow probe for plasma diagnostics, including hollow shell
Body, insulating sleeve and plain conductor.Described hollow housing one end be closed end, the other end is open end, inside be
Chamber.After the insulating sleeve enters hollow housing inside by open end, insulating sleeve can be by way of gluing in
The closed end inner wall of empty capsid is fixedly connected, and can also be fixed by way of screw tightening with the closed end inner wall of hollow housing
Connection, such hollow housing are set in the outer wall of insulating sleeve, hollow housing are made to be located at the outside of insulating sleeve.The insulation sleeve
There are gap between pipe and hollow housing, the plain conductor is mounted in insulating sleeve, i.e., insulating sleeve is plain conductor
It wraps up, one end and the hollow housing of plain conductor are conducted, and the mode of conducting is divided into two kinds, and one kind is that plain conductor is direct
Be in contact and be connected with hollow housing, another way be plain conductor by conducting medium and hollow housing mediate contact into
Row conducting, the other end extend to outside insulating sleeve, are connected with external equipment.
The hollow housing is made of metal material.
Preferred hollow housing is hemispherical shell or top dome circular cylindrical shell.
One end that the insulating sleeve and hollow housing are fixed is provided at least two grooves.
The outer diameter of the hollow housing is 1mm-100mm, and the wall thickness of hollow housing is 0.1mm-1mm.
The width in the gap is less than 1/5th of hollow housing overall diameter, and the depth in the gap is greater than gap most
3 times of big width.
Preferred metal material is tungsten or molybdenum or tantalum or nickel or platinum or brass or stainless steel.
The beneficial effects of the present invention are: being used in conductive film depositional environment, can be avoided on probe and insulating support
Conductive plated film short circuit and scrap, it is thus possible to be used for conductive film depositional environment plasma diagnostics；On the other hand, it avoids
The sheaths of insulating support block probe, can more accurately measure the density for obtaining plasma.
Detailed description of the invention
Fig. 1 is the hollow probe structure chart that hollow housing is hemispherical shell；
Fig. 2 is the hollow probe structure chart of hollow housing and insulating sleeve screw connection；
Fig. 3 is the hollow probe structure chart that hollow housing is top dome circular cylindrical shell；
Fig. 4 is using the hollow probe structure chart with reeded insulating sleeve；
It is described as shown in Figure 1 to Figure 4, hollow housing (1), insulating sleeve (2), plain conductor (3), closed end (4), open end (5),
Gap (6), screw (7), groove (8).
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Please refer to Fig. 1-Fig. 4, a kind of hollow probe for plasma diagnostics, including hollow housing 1, insulating sleeve 2
With plain conductor 3.Described 1 one end of hollow housing is closed end 4, and the other end is open end 5, and internal is a cavity, hollow
Shell 1 is made of tungsten or molybdenum or tantalum or nickel or platinum or the metal materials such as brass or stainless steel, the size selection of hollow housing 1 with
The density for being measured plasma is related, the general range of outer diameter are as follows: 1mm-100mm, in order to guarantee the intensity of hollow housing 1,
So the range of wall thickness are as follows: 0.1mm-1mm；After the insulating sleeve 2 enters 1 inside of hollow housing by open end 5, insulation
Casing 2 can be fixedly connected by way of gluing with 4 inner wall of closed end of hollow housing 1, can also be tightened by screw 7
Mode is fixedly connected with 4 inner wall of closed end of hollow housing 1, such hollow housing 1 is set in the outer wall of insulating sleeve 2, is made
Empty capsid 1 is located at the outside of insulating sleeve 2, and there are gap 6, the width in gap 6 between the insulating sleeve 2 and hollow housing 1
Less than 1/5th of 1 overall diameter of hollow housing, the depth in gap 6 is greater than 3 times of its maximum width；The plain conductor 3
Be mounted in insulating sleeve 2, one end and the hollow housing 1 of plain conductor 3 are conducted, i.e., plain conductor 3 directly with hollow housing 1
Joint conducting or plain conductor 3 are connected by conducting medium with 1 mediate contact of hollow housing, and the other end extends to insulation
Outside casing 2, it is connected with external equipment.
Preferred hollow housing 1 is hemispherical shell or top dome circular cylindrical shell.
One end that the insulating sleeve and hollow housing are fixed is provided at least two grooves.
Embodiment 1 measures hollow probe used in the plasma diagnostics of conductive film depositional environment as shown in Figure 1,
Plasma density range is 108-1010/cm3, hollow housing 1 is using hemispherical shell made of 304 stainless steels, outer diameter
The outer diameter of 1.2mm, wall thickness 0.1mm, insulating sleeve 2 are 0.6mm, and the gap 6 between insulating sleeve 2 and hollow housing 1 is less than
0.24mm, 6 depth of gap are greater than 3 times of its maximum width, and insulating sleeve 2 is adhesively fixed with elargol and hollow housing 1, and metal is led
Line 3 is bonded with elargol and is directly connected with hollow housing 1, and is passed through insulating sleeve 2 and drawn.
Embodiment 2 measures hollow probe used in the diagnosis of low-density space plasma, plasma as shown in Figure 2
Density range is 105-106/cm3, hollow housing 1 is using hemispherical shell made of brass, outer diameter 50mm, wall thickness 1mm, absolutely
The outer diameter of edge casing 2 is 30mm, and the gap 6 between insulating sleeve 2 and hollow housing 1 is less than 10mm, and 6 depth of gap is greater than it most
3 times of big width, screw 7 is fixed on 4 inner wall of closed end of hollow housing 1, and insulating sleeve 2 is connected through a screw thread and is mounted on
On screw 7, plain conductor 3, which is fixed by welding on screw 7, forms indirect conducting with hollow housing 1, and passes through insulating sleeve 2
It draws.
Compared with Example 1, insulating sleeve 2 is not directly contacted with embodiment 2 with hollow housing 1, forms one curved
Gap 6 can more effectively avoid the conductive plated film short circuit on hollow housing 1 and insulating sleeve 2.
Embodiment 3 measures hollow probe used in the plasma diagnostics of conductive film depositional environment as shown in Figure 3,
Plasma density range is 108-1010/cm3, hollow housing 1 using top dome circular cylindrical shell made of 304 stainless steels, top dome and
The outer diameter of cylinder is 1.2mm, and wall thickness is 0.1mm, and the outer diameter of insulating sleeve 2 is 0.6mm, insulating sleeve 2 and hollow housing 1
Between gap 6 be less than 0.24mm, 6 depth of gap is greater than 3 times of its maximum width, the elargol of insulating sleeve 2 and hollow housing 1
It is adhesively fixed, plain conductor 3 is bonded with elargol and is directly connected with hollow housing 1, and is passed through insulating sleeve 2 and drawn.
Compared with Example 1, the gap between insulating sleeve 2 and hollow housing 1 is deeper for embodiment 3, conductive film coating composition
It is more difficult to be deposited into inside gap, it can more effectively avoid hollow housing 1 and the conductive plated film on insulating sleeve 2 short
Road.But compared with the hollow housing of hemispherical shell 1, the surface area of the hollow housing 1 of the top dome circular cylindrical shell of same diameter
Larger, collected current is larger, and plasma disturbance is larger, and probe power consumption is also larger.So needing in use according to plasma
Body actual conditions select suitable hollow housing 1, so that can overcome conductive plated film short circuit problem and reduce collected current
And plasma disturbance, obtain accurate measurement result.
Embodiment 4, the hollow probe as used in the plasma diagnostics of Fig. 4 measurement conductive film depositional environment are hollow
Shell 1 uses top dome circular cylindrical shell made of 304 stainless steels, is provided at least two annular grooves on one end of insulating sleeve 2
8, insulating sleeve 2 is adhesively fixed with elargol and hollow housing 1, and plain conductor 3 is bonded with elargol and is directly connected with hollow housing 1,
And it passes through insulating sleeve 2 and draws.
Embodiment 4 compared with Example 3, is provided with the groove 8 of annular on insulating sleeve 2, conductive film coating composition is not easy shape
At continuous conductive film layer, the conductive plated film short circuit on hollow housing 1 and insulating sleeve 2 can be more effectively avoided.Another party
Face, the anti-short-circuit effect of enhancing relax the depth requirements in gap 6, can reduce the surface area of hollow housing 1, to reduce receipts
The disturbance and probe power consumption of colleeting comb and plasma.
In embodiment 1-4, hollow housing 1 is respectively positioned on the outside of insulating sleeve 2, avoids hollow housing 1 by insulating sleeve 2
Sheaths masking, charge collecting area is accurately the external surface area of hollow housing 1, makes it possible to accurately measure plasma
Density；In contrast, metal probe is all located at the inside of insulating sleeve in the prior art, inevitably by the sheath of insulating sleeve
Layer part is covered, so that cannot accurately determine that the effective charge of probe collects area, thus cannot accurately measure plasma
Density.In addition, in embodiment 1-4, gap between insulating sleeve and hollow housing not directly facing coating source and plasma,
On the one hand deposition plating substance in gap 6 can more effectively be avoided；It is additional that another aspect plasma is not easily accessible gap 6
It collects, measures more acurrate.
Claims (8)
1. a kind of hollow probe for plasma diagnostics, which is characterized in that including hollow housing (1), insulating sleeve (2) and
Plain conductor (3), the hollow housing (1) one end are closed end (4), and the other end is open end (5), the hollow housing
(1) it is located at the outside of insulating sleeve (2), the insulating sleeve (2) enters hollow housing (1) inside simultaneously by open end (5)
And be fixedly connected with the inner wall of hollow housing (1) by gluing or screw (7), the insulating sleeve (2) and hollow housing (1) it
Between have gap (6), the plain conductor (3) is mounted in insulating sleeve (2), one end of plain conductor (3) and hollow housing
(1) it is conducted, it is external that the other end extends to insulating sleeve (2).
2. a kind of hollow probe for plasma diagnostics according to claim 1, which is characterized in that described is hollow
Shell (1) is made of metal material.
3. a kind of hollow probe for plasma diagnostics according to claim 1 or 2, which is characterized in that described
Hollow housing (1) is hemispherical shell or top dome circular cylindrical shell.
4. a kind of hollow probe for plasma diagnostics according to claim 3, which is characterized in that the hollow shell
The outer diameter of body (1) is 1mm-100mm, and the wall thickness of hollow housing (1) is 0.1mm-1mm.
5. a kind of hollow probe for plasma diagnostics according to claim 1, which is characterized in that the gap
(6) width is less than 1/5th of hollow housing (1) overall diameter, and the depth of gap (6) is greater than the 3 of gap (6) maximum width
Times.
6. a kind of hollow probe for plasma diagnostics according to claim 2, which is characterized in that the metal
Material is tungsten or molybdenum or tantalum or nickel or platinum or brass or stainless steel.
7. a kind of hollow probe for plasma diagnostics according to claim 1, which is characterized in that the screw
(7) it is fixed on the inner wall of closed end (4).
8. a kind of hollow probe for plasma diagnostics according to claim 1, which is characterized in that the insulation sleeve
Pipe one end fixed with hollow housing is provided at least two grooves (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910638413.5A CN110402005A (en) | 2019-07-16 | 2019-07-16 | A kind of hollow probe for plasma diagnostics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910638413.5A CN110402005A (en) | 2019-07-16 | 2019-07-16 | A kind of hollow probe for plasma diagnostics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110402005A true CN110402005A (en) | 2019-11-01 |
Family
ID=68325597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910638413.5A Pending CN110402005A (en) | 2019-07-16 | 2019-07-16 | A kind of hollow probe for plasma diagnostics |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110402005A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113225887A (en) * | 2021-05-11 | 2021-08-06 | 山东大学 | Telescopic cold and hot probe assembly, plasma diagnosis system and diagnosis method |
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