CN210386715U - Polycrystalline silicon cleaning device - Google Patents
Polycrystalline silicon cleaning device Download PDFInfo
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- CN210386715U CN210386715U CN201920539262.3U CN201920539262U CN210386715U CN 210386715 U CN210386715 U CN 210386715U CN 201920539262 U CN201920539262 U CN 201920539262U CN 210386715 U CN210386715 U CN 210386715U
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Abstract
The utility model discloses a polycrystalline silicon belt cleaning device relates to polycrystalline silicon aftertreatment field. A polysilicon cleaning apparatus, comprising: the cleaning cage comprises a first cleaning cage side baffle (1), a cleaning cage body (2), a nozzle (3), a high-purity water inlet pipe (4), a first supporting device (5), a first polysilicon feeding hole baffle locking device (6), a second polysilicon feeding hole baffle locking device (7), a pipeline (8), a valve (9), a water tank (10), a second cleaning cage side baffle (11), a second supporting device (12), a transmission device (13) and a polysilicon feeding hole baffle (14).
Description
Technical Field
The utility model relates to a polycrystalline silicon preparation technical field, very much relate to polycrystalline silicon aftertreatment field.
Background
At present, the solar photovoltaic material is mainly polycrystalline silicon which becomes a basic raw material of the solar photovoltaic, and the main production process of the polycrystalline silicon is an improved Siemens method and a fluidized bed method, wherein the improved Siemens method accounts for about 85 percent of the yield. The polycrystalline silicon produced by the improved siemens process is rod-shaped polycrystalline silicon and needs to be crushed into blocks for packaging, storage and transportation. When the crystalline silicon ingot for cutting silicon wafers is produced, particularly when the crystalline silicon ingot is produced by using a czochralski furnace or an ingot furnace, the used raw material silicon needs to be crushed into blocks or particles in a thousand-level or ten-thousand-level clean room through manual, temperature difference crushing, pulse crushing or mechanical crushing, and metal, nonmetal, indoor dust and the like can be contacted with the silicon material in the crushing process, so that the silicon blocks are polluted if the control is not good, the minority carrier lifetime of crystals after drawing or ingot casting is directly influenced, the conversion efficiency of subsequent battery pieces is further influenced, the attenuation of components is serious in the power generation process, the generated energy is influenced and the like; particularly, the polysilicon is crushed by temperature difference and machinery, so that the surface of the silicon rod is more easily contaminated with metal impurities and needs to be further cleaned and removed.
Patent CN101531366A discloses a method for cleaning a polysilicon silicon material, which comprises the steps of placing the polysilicon silicon material in a mixed acid solution for dark soaking for 1-10 minutes, wherein the temperature of the mixed acid solution is 30-35 ℃, fishing the polysilicon silicon material, washing the polysilicon silicon material with pure water and ultrasonic waves, bubbling the polysilicon silicon material with compressed air, and drying the polysilicon silicon material; the adopted mixed acid liquid is corrosive liquid, and the volume ratio of nitric acid, hydrofluoric acid and glacial acetic acid is 57: 18: 25; wherein the concentration of the nitric acid is 68-72 percent, the concentration of the hydrofluoric acid is 38-41 percent, and the concentration of the glacial acetic acid is 99.8-99.9 percent; the purity grade is MOS grade or UP grade; the polysilicon silicon material cleaned by the method has smooth surface, no acid stain and water stain, good cleaning effect, low cleaning cost, low operation difficulty, easy control of cleaning quality and improved cleaning yield.
Patent CN101748492B discloses a method for cleaning a polycrystalline silicon ingot by sequentially immersing polycrystalline silicon in a plurality of pickling baths 2 to 6 each being filled with acid, wherein each of the pickling baths 2 to 6 is provided with a temperature control means for keeping the liquid temperature constant, and the liquid temperature of each of the pickling baths is set in a polycrystalline silicon cleaning apparatus for cleaning so that the liquid temperature of the adjacent pickling bath at the subsequent stage is equal to or lower than the liquid temperature of the pickling bath at the previous stage, and the pickling bath at the final stage is lower than the pickling bath at the most previous stage, whereby in the pickling bath at the initial stage, polycrystalline silicon is actively reacted with acid to remove impurities, and in the pickling bath at the lower temperature at the subsequent stage, the impurities on the surface of polycrystalline silicon are effectively removed by removing the spots generated at the initial stage, thereby obtaining polycrystalline silicon having good quality with reduced spots.
Patent CN102264957B discloses a method for cleaning polycrystalline silicon, which is a method for cleaning polycrystalline silicon in a water cleaning step of cleaning polycrystalline silicon with pure water after an acid cleaning step, and is characterized in that in the water cleaning step, acid-cleaned polycrystalline silicon is immersed in a water cleaning tank storing pure water, the pure water in the water cleaning tank is replaced at least 1 time or more to remove acid liquid remaining on the surface of the acid-cleaned polycrystalline silicon, and whether the water cleaning step can be finished or not is judged by measuring the conductivity of the pure water in the water cleaning tank.
Patent CN101775662A discloses a method for cleaning high-purity polysilicon blocks by corrosion, wherein a hydrofluoric acid solution corrosion process is arranged after a mixed acid corrosion process and a pure water rinsing process, and a surface oxidation layer generated after the polysilicon blocks subjected to mixed acid corrosion are contacted with air again is removed by adding the hydrofluoric acid solution corrosion process, so that a no-clean high-purity polysilicon material with good surface metal glossiness and better surface quality is obtained.
Patent CN101974785A discloses a method for cleaning a silicon polycrystalline raw material, which comprises the steps of putting the silicon polycrystalline raw material into an ethanol solution for presoaking, rinsing the silicon polycrystalline raw material with deionized water after presoaking, and putting the rinsed silicon polycrystalline raw material in HNO3Etching in HF mixed acid solution, soaking the etched polycrystalline silicon material in HF acid solution, and soaking in HF acid solutionRinsing in an ion water tank, putting the rinsed polycrystalline silicon raw material into deionized water for soaking, and cleaning the silicon polycrystalline raw material by the method, wherein the surface of the silicon polycrystalline raw material has no spots, no oxidation layer and low impurity content, so that the problems of uneven corrosion, easy occurrence of oxidation film and spots and the like in the cleaning process of the polycrystalline silicon raw material are solved.
Patent CN203173827U relates to a device for cleaning granular polysilicon in solar energy industry, the main material barrel is a closed barrel, a plurality of overflow ports are arranged on the barrel wall at the upper end of the main material barrel at intervals, and a water inlet, a discharge port and a feed port are respectively arranged on the main material barrel; the annular overflow ring is fixed on the barrel wall at the upper end of the main charging barrel, a plurality of overflow ports are respectively arranged in the cavity of the annular overflow ring, and the ring wall of the annular overflow ring is provided with a water outlet; the motor base provided with the shaft sleeve is fixed on the barrel surface of the main charging barrel, the motor is fixed on the motor base, one end of a motor shaft is fixed with the stirring turbine and is arranged in the barrel of the main charging barrel, and the other end of the motor shaft sequentially penetrates through the barrel surface of the main charging barrel and the shaft sleeve to be in transmission connection with an output shaft of the motor; the device for cleaning granular polycrystalline silicon is simple to operate, simple in equipment manufacturing and low in cost, and does not have secondary pollution to granules.
Patent CN106583387A discloses a flower basket for cleaning polycrystalline silicon wafers, which comprises a flower basket body, supporting stop rods, a supporting plate and an insert groove, wherein the left side and the right side of the flower basket body are respectively provided with two supporting stop rods, and the joints of the supporting stop rods, the insert groove and the silicon wafers are provided with chamfers matched with the silicon wafers; the supporting plate is made of soft rubber material; through the design of the distance and the structure of the supporting stop lever, the strength of the bottom of the flower basket is ensured, and meanwhile, the occurrence of undesirable phenomena such as clamping, fragmentation and the like of silicon wafers is effectively avoided; through the design of the supporting plate at the bottom of the flower basket, the problems of scratches on the edges and defects of the edges of the silicon wafers can be reduced.
Patent CN204934122U discloses a primary polycrystalline silicon belt cleaning device, including horizontal fixing frame, the vertical support frame, pull the subassembly, the up-and-down motion linkage subassembly, rotatory linkage subassembly and basket subassembly, the horizontal fixing frame is fixed on the vertical support frame top, the last guide rail that is provided with of horizontal fixing frame, the guide rail both ends are provided with the leading wheel that is used for controlling the horizontal motion of pulling the subassembly, be provided with ball on the vertical support frame, the ball both ends are provided with and are used for cooperating the linkage wheel that is used for controlling ball length with pulling the subassembly, pull the slidable setting of subassembly on the guide rail, the up-and-down motion linkage subassembly is fixed on ball, rotatory linkage subassembly slidable sets up on ball, up-and-down motion linkage subassembly output is connected with rotatory linkage subassembly, rotatory linkage subassembly output is connected with the basket subassembly.
Patent CN206721395U discloses a special basket for cleaning polysilicon material, which comprises a basket body, wherein the basket body is of an open hollow structure, the side wall of the basket body is provided with a side wall through hole, the bottom surface of the basket body is provided with a bottom surface through hole, and the bottom surface inside the basket body is further provided with a filler strip.
The polycrystalline silicon cleaning method uses acid for corrosion, and clean water is used for cleaning for multiple times after the acid corrosion, so that the continuous replacement of water is difficult to realize by a cleaning device.
The existing method for cleaning the polycrystalline silicon needs hydrofluoric acid or nitric acid, the treatment cost of the hydrofluoric acid or nitric acid containing impurities after cleaning the polycrystalline silicon is high, and a polycrystalline silicon cleaning device needs to be further improved so as to reduce the using amount of high-purity water while continuously cleaning the polycrystalline silicon with the high-purity water; the utility model discloses a device can effectual washing polycrystalline silicon after the breakage, and broken back polycrystalline silicon piece purity after the washing can satisfy the ingot casting and draw the demand of single crystal to reduce the quantity of high purity water.
Disclosure of Invention
The utility model aims to solve the technical problem of providing a polysilicon cleaning device, which aims to solve the defect that the existing polysilicon cleaning needs acid cleaning after being broken.
Based on the utility model discloses, a novel polycrystalline silicon washs device is provided, include: the cleaning cage comprises a cleaning cage side baffle I (1), a cleaning cage body (2), a nozzle (3), a high-purity water inlet pipe (4), a supporting device I (5), a polycrystalline silicon feed inlet baffle locking device I (6), a polycrystalline silicon feed inlet baffle locking device II (7), a cleaning cage side baffle II (11), a supporting device II (12), a transmission device (13) and a polycrystalline silicon feed inlet baffle (14).
Wash cage side shield (1), wash the cage body (2), spout (3), high pure water inlet tube (4), strutting arrangement (5), polycrystalline silicon feed inlet baffle locking device (6), polycrystalline silicon feed inlet baffle locking device two (7), wash cage side shield two (11), strutting arrangement two (12), transmission driven device (13), polycrystalline silicon feed inlet baffle (14) are made by one or several kinds among polyurethane material, polypropylene (PP) material, polyvinylidene fluoride (PVDF) material, and is preferred, adopt polyurethane material panel.
The high-purity water inlet pipe (4) is positioned inside the cleaning cage, preferably penetrates through the centers of the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11), so that the position of the cleaning pipe is kept unchanged in the cleaning process and does not rotate along with the rotation of the cleaning cage body.
A rotating device is arranged between the high-purity water inlet pipe (4) and the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11), so that the cage body does not influence the high-purity water inlet pipe (4) when rotating, and the rotating device can be a bearing and other common devices.
The outer sides of the first cleaning cage side baffle (1) or the second cleaning cage side baffle (11) are provided with transmission devices (13), and through the transmission devices, a cleaning cavity formed by the cleaning cage body (2), the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11) can be rotated, so that the polysilicon in the cleaning cavity is uniformly cleaned.
The high-purity water inlet pipe (4) is provided with a spout (3), the spout can be in any shape, when the spout is a slit, the size length of the slit is 1-500mm, preferably 100-300mm, and the width is 0.1-5mm, preferably 0.5-1 mm; the number of the thin seams can be one or more, and when the number of the thin seams is multiple, the thin seams can be discontinuously distributed on one straight line or distributed on different straight lines; the nozzle is round or square or oval, preferably round, and when the nozzle (3) is not a slit, a nozzle can be installed, so that the water in the high-purity water inlet pipe (4) is sprayed out at high speed and high pressure.
The cleaning cage body (2) is composed of 1-5 layers, preferably 2-3 layers.
The cleaning cage body (2) is provided with pores which can be uniformly or non-uniformly distributed, but are preferably distributed in a micro-uniform manner; the pore diameter of the fine pores on the cleaning cage body (2) is 0.5-20mm, preferably 5-10 mm.
When the cleaning cage body (2) is 2-5 layers, a fine net can be arranged between every two layers, the arranged fine net can retain the polycrystalline silicon blocks in the cavity for cleaning the polycrystalline silicon, the waste water containing impurities after cleaning can pass through the fine net, and when the fine net is arranged, the equivalent diameter of the net holes is 0.1-5mm, preferably 0.5-3 mm.
The cleaning cage body (2) is formed by 3-50 plates or cylindrical barrels, preferably 6-12 plates; when the cleaning cage blocking body (2) is composed of a cylindrical barrel, 1-5 feed ports are formed in the surface of the barrel, and a polysilicon feed port baffle (14) is installed.
By applying the polycrystalline silicon cleaning device, the polycrystalline silicon blocks can be cleaned by high-speed high-pressure high-purity water, metal impurities on the surfaces of the polycrystalline silicon blocks are washed by the high-purity water and discharged, a small amount of impurity pollution brought by crushing can be removed by a cleaning process under the condition of not adopting acid corrosion, the consumption of the high-purity water is reduced, and the polycrystalline silicon cleaning device has the advantages of saving resources, safety and environmental protection.
Drawings
FIG. 1 shows a polysilicon cleaning apparatus according to the present invention.
The cleaning device comprises a cleaning cage side baffle I, a cleaning cage body, a nozzle 3, a high-purity water inlet pipe 4, a supporting device I5, a polysilicon feeding port baffle locking device I6, a polysilicon feeding port baffle locking device II 7, a pipeline 8, a valve 9, a water tank 10, a cleaning cage side baffle II 11, a supporting device II 12, a transmission device 13 and a polysilicon feeding port baffle 14.
Detailed Description
In the following, the technical solutions in the embodiments of the present invention are clearly and completely described with reference to the accompanying drawings of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, those skilled in the art can implement all other embodiments without creative changes, and all other embodiments belong to the protection scope of the present invention.
Fig. 1 is a concrete example of the utility model, in this example, the polycrystalline silicon belt cleaning device includes cleaning cage side shield one (1), the cleaning cage body (2), spout (3), high pure water inlet tube (4), strutting arrangement one (5), polycrystalline silicon feed inlet baffle locking device one (6), polycrystalline silicon feed inlet baffle locking device two (7), pipeline (8), valve (9), basin (10), cleaning cage side shield two (11), strutting arrangement two (12), transmission driven device (13), polycrystalline silicon feed inlet baffle (14) is constituteed.
Cleaning cage body (2), cleaning cage side shield I (1), cleaning cage side shield II (11) constitute a cavity, install on basin (10) through strutting arrangement I (5) and strutting arrangement II (12), twist and move polycrystalline silicon feed inlet side shield locking device I (6) and polycrystalline silicon feed inlet side shield locking device II (7), open polycrystalline silicon feed inlet baffle (14), will treat abluent polycrystalline silicon and pack into the cavity through polycrystalline silicon feed inlet baffle (14) position, install polycrystalline silicon feed inlet baffle (14) after the equipment, twist and move polycrystalline silicon feed inlet side shield locking device I (6) and polycrystalline silicon feed inlet side shield locking device II
(7) Fixing a polysilicon feed inlet baffle (14); the nozzle is installed on the nozzle (3), 20MPa of high-purity water is introduced from the high-purity water inlet pipe (4), the high-purity water is sprayed on the polycrystalline silicon through the nozzle installed on the nozzle (3), a device (13) for transmission is arranged on the outer side of the second cleaning cage side baffle (11), in the embodiment, the high-purity water cleaning device is a gear device, the device (13) for transmission is connected with a motor through a gear, the cage cleaning cage body (2), the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11) rotate together in the cleaning process through the motor, the rotating speed is controlled to be 2 minutes/rotation, the polycrystalline silicon can be uniformly cleaned, the water after the polycrystalline silicon is cleaned is collected in the water tank (10), and the water is discharged out of the water tank through the pipeline (8) and the valve (9).
Although the embodiments of the present invention have been described and illustrated in detail with reference to the accompanying drawings, it is to be understood that various equivalent changes and modifications can be made therein by those skilled in the art according to the concept of the present invention, and that the functional effects thereof are within the scope of the present invention without departing from the spirit of the present invention.
Claims (9)
1. A polysilicon cleaning apparatus, comprising: cleaning cage side shield (1), cleaning cage body (2), spout (3), high pure water inlet tube (4), strutting arrangement (5), polycrystalline silicon feed inlet baffle locking device (6), polycrystalline silicon feed inlet baffle locking device two (7), pipeline (8), valve (9), basin (10), cleaning cage side shield two (11), strutting arrangement two (12), transmission driven device (13), polycrystalline silicon feed inlet baffle (14), its characterized in that: the high-purity water inlet pipe (4) is located at the center of the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11), a transmission device (13) is arranged on the outer side of the first cleaning cage side baffle (1) or the second cleaning cage side baffle (11), and a nozzle (3) is arranged on the high-purity water inlet pipe (4) inside the cleaning cage body (2).
2. The polysilicon cleaning apparatus as set forth in claim 1, wherein: the high-purity water inlet pipe (4) is positioned in the centers of the first cleaning cage side baffle (1) and the second cleaning cage side baffle (11).
3. The polysilicon cleaning apparatus as set forth in claim 2, wherein: a nozzle (3) is arranged on a high-purity water inlet pipe (4) in the cleaning cage body (2).
4. The polysilicon cleaning apparatus as set forth in claim 1, wherein: the cleaning cage body (2) is formed by 3-50 plates or cylindrical barrel bodies.
5. The polysilicon cleaning apparatus as set forth in claim 4, wherein: the number of the cleaning cage body (2) layers is 1-5.
6. The polysilicon cleaning apparatus as set forth in claim 5, wherein: when the cleaning cage body (2) has 2-5 layers, a fine net is arranged between each layer.
7. The polysilicon cleaning apparatus as set forth in claim 6, wherein: the equivalent diameter of the mesh of the fine mesh is set to be 0.1-5 mm.
8. The polysilicon cleaning apparatus as set forth in claim 1, wherein: and a transmission device (13) is arranged outside the first cleaning cage side baffle (1) or the second cleaning cage side baffle (11).
9. The polysilicon cleaning apparatus as set forth in claim 1, wherein: the cleaning cage body (2) can rotate through a transmission device (13).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920539262.3U CN210386715U (en) | 2019-04-19 | 2019-04-19 | Polycrystalline silicon cleaning device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920539262.3U CN210386715U (en) | 2019-04-19 | 2019-04-19 | Polycrystalline silicon cleaning device |
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| CN210386715U true CN210386715U (en) | 2020-04-24 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111822415A (en) * | 2019-04-19 | 2020-10-27 | 江苏中能硅业科技发展有限公司 | Polycrystalline silicon cleaning device and method |
| CN112607745A (en) * | 2020-12-03 | 2021-04-06 | 陆植才 | Rinsing process and device for slurry subjected to acid treatment |
-
2019
- 2019-04-19 CN CN201920539262.3U patent/CN210386715U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111822415A (en) * | 2019-04-19 | 2020-10-27 | 江苏中能硅业科技发展有限公司 | Polycrystalline silicon cleaning device and method |
| CN112607745A (en) * | 2020-12-03 | 2021-04-06 | 陆植才 | Rinsing process and device for slurry subjected to acid treatment |
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