CN214160712U - Quartz silicon wafer cleaning tank mechanism - Google Patents
Quartz silicon wafer cleaning tank mechanism Download PDFInfo
- Publication number
- CN214160712U CN214160712U CN202023311797.7U CN202023311797U CN214160712U CN 214160712 U CN214160712 U CN 214160712U CN 202023311797 U CN202023311797 U CN 202023311797U CN 214160712 U CN214160712 U CN 214160712U
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- grooves
- cleaning tank
- silicon wafer
- liquid inlet
- groove
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Abstract
The utility model relates to a quartz silicon wafer cleaning tank mechanism, which comprises a cleaning tank, a screw nut, a silicon wafer placing frame and a motor; be equipped with the feed liquor groove on the washing tank inner wall, be equipped with the feed liquor hole on the feed liquor groove, four right angles departments of washing tank are located to screw-nut, the silicon chip is placed the frame both sides and is connected with the lifter plate on the screw-nut through the spliced pole, the motor is fixed in the lifter plate and is connected with the spliced pole towards one side in feed liquor groove, and the pivot of motor runs through the lifter plate, and the spliced pole is connected, the inner wall that the frame was placed to the silicon chip is equipped with the standing groove, and the silicon chip. The utility model discloses can reduce the washing cost, but realize the cleaner at any time circulating flow in the washing tank, be favorable to keeping the concentration of cleaner, guarantee the cleaning performance to improve follow-up use quality.
Description
Technical Field
The utility model relates to a quartz silicon chip technical field, concretely relates to quartz silicon chip cleaning tank mechanism.
Background
In the semiconductor industry, the requirements of semiconductor technology for impurities on the surface of a silicon wafer become more and more demanding. The key factor influencing the surface cleanliness of the silicon wafer is the cleaning capability of the cleaning device adopted for the final silicon wafer.
In prior art, the cleaning mode to the silicon chip is directly to place the silicon chip in depositing the frame, will deposit the whole washing tank of putting into of frame again and place the certain time and take out can, if will change the cleaner then need pour into new cleaner again with all cleaner discharges, can make the cleaning cost uprise like this, if do not change for a long time, the cleaner in the washing tank is difficult to realize the circulation flow, the impurity on silicon chip surface can deposit in the washing tank, influence the concentration of cleaner, thereby influence the cleaning performance, influence follow-up use quality.
SUMMERY OF THE UTILITY MODEL
The utility model aims at: the quartz silicon wafer cleaning tank mechanism is provided, the cleaning cost is reduced, the cleaning agent in the cleaning tank can flow circularly at any time, the concentration of the cleaning agent is kept, the cleaning effect is ensured, and the subsequent use quality is improved.
In order to achieve the above object, the present invention provides the following technical solutions:
a quartz silicon wafer cleaning tank mechanism comprises a cleaning tank, a screw rod nut, a silicon wafer placing frame and a motor; be equipped with the feed liquor groove on the washing tank inner wall, be equipped with the feed liquor hole on the feed liquor groove, the washing tank bottom is equipped with the outage, four right angles departments of washing tank are located to screw-nut, the silicon chip is placed the frame both sides and is connected through the spliced pole and the lifter plate on the screw-nut, the motor is fixed in one side of lifter plate towards the feed liquor groove, and the pivot of motor runs through the lifter plate and is connected with the spliced pole, the inner wall that the frame was placed to the silicon chip is equipped with the standing groove, and the silicon chip is placed the frame bottom and is equipped with logical groove.
Preferably, the liquid inlet grooves are arranged on two sides of the cleaning tank in the length direction, the number of the liquid inlet grooves is a plurality, the liquid inlet grooves are specifically arranged in a linear array manner, and the length sidelines of the liquid inlet grooves and the cleaning tank are in a vertical position relation; the number of the liquid inlet holes is a plurality, and the liquid inlet holes are specifically arranged on the liquid inlet groove at intervals.
Preferably, the placing grooves are parallel to the liquid inlet groove in direction, and the number of the placing grooves is several, and the placing grooves are specifically arranged in a linear array.
Preferably, the number of the through grooves is several, the through grooves are specifically arranged in a linear array, and the through grooves and the placing grooves are specifically arranged in a staggered manner.
Preferably, the silicon wafer placing frame and the connecting column are in detachable connection relation.
The utility model has the advantages that: the utility model provides a quartz silicon chip washs groove mechanism, can reduce the washing cost, realizes that the cleaner in the washing tank can circulate at any time and flow, is favorable to keeping the concentration of cleaner, guarantees the cleaning performance to improve follow-up use quality.
Drawings
FIG. 1 is a schematic view of the overall structure of a quartz silicon wafer cleaning tank mechanism of the present invention;
FIG. 2 is a schematic view of a partial structure of the silicon wafer placement frame of FIG. 1;
in the figure: 1. a cleaning tank; 10. a liquid inlet tank; 11. a liquid inlet hole; 2. a feed screw nut; 3. a lifting plate; 4. a silicon wafer placing groove; 40. a placement groove; 41. a through groove; 5. a motor; 6. connecting columns; 7. and a liquid discharge hole.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
Referring to fig. 1 to 2, a quartz silicon wafer cleaning tank mechanism includes a cleaning tank 1, a feed screw nut 2, a silicon wafer placing frame 4 and a motor 5; be equipped with feed liquor groove 10 on the 1 inner wall of washing tank, be equipped with feed liquor hole 11 on the feed liquor groove 10, 1 bottom of washing tank is equipped with outage 7, four right angle departments of washing tank 1 are located to screw-nut 2, the silicon chip is placed frame 4 both sides and is connected through spliced pole 6 and lifter plate 3 on the screw-nut 2, motor 5 is fixed in lifter plate 3 towards one side of feed liquor groove 10, and motor 5's pivot runs through lifter plate 3 and is connected with spliced pole 6, the inner wall that frame 4 was placed to the silicon chip is equipped with standing groove 40, and the silicon chip is placed frame 4 bottom and is equipped with logical groove 41.
The liquid inlet grooves 10 are arranged on two sides of the length direction of the cleaning tank 1, the number of the liquid inlet grooves 10 is a plurality, the liquid inlet grooves 10 are specifically arranged in a linear array, and the length side lines of the liquid inlet grooves 10 and the cleaning tank 1 are in a vertical position relation; the number of the liquid inlet holes 11 is several, and the liquid inlet holes are specifically arranged on the liquid inlet groove 10 at intervals.
The placing grooves 40 are parallel to the liquid inlet groove 10, and the number of the placing grooves 40 is a plurality of, and the placing grooves are specifically arranged in a linear array.
The number of the through grooves 41 is several, and the through grooves 41 are specifically arranged in a linear array, and the positions of the through grooves 41 and the placing grooves 40 are specifically arranged in a staggered manner.
The silicon wafer placing frame 4 and the connecting column 6 are in detachable connection relation.
The utility model discloses a theory of operation does: before the cleaning machine starts to work, the outer cover of the liquid discharge hole 7 is screwed tightly, cleaning liquid is added into the cleaning tank 1, a silicon wafer to be cleaned is correspondingly placed in the placing groove 40 on the silicon wafer placing frame 4, the screw rod nut 2 is started, the silicon wafer placing frame 4 is driven to descend into the cleaning tank 1 along with the lifting plate 3, the motor 5 is started simultaneously, the silicon wafer placing frame 4 is driven to slightly swing left and right, the cleaning effect is better, in the process, the cleaning liquid can upwards flow from the through groove 41 between every two adjacent silicon wafers, the cleaning on the two sides of the silicon wafers is enhanced, the cleaning effect is better, in the cleaning process, the liquid inlet hole 11 can be connected with the water inlet guide pipe at the upper end, the outer cover of the liquid discharge hole 7 is appropriately unscrewed a little, and accordingly, the circulating flow of the cleaning liquid in the cleaning tank 1 can be achieved.
The above examples are provided for further illustration of the present invention, but do not limit the present invention to these specific embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be understood as being within the protection scope of the present invention.
Claims (5)
1. The utility model provides a quartz silicon chip cleaning tank mechanism which characterized in that: comprises a cleaning tank (1), a screw nut (2), a silicon wafer placing frame (4) and a motor (5); be equipped with feed liquor groove (10) on washing tank (1) inner wall, be equipped with feed liquor hole (11) on feed liquor groove (10), washing tank (1) bottom is equipped with outage (7), four right-angle departments of washing tank (1) are located in screw-nut (2), the silicon chip is placed frame (4) both sides and is connected with lifter plate (3) on screw-nut (2) through spliced pole (6), motor (5) are fixed in lifter plate (3) towards one side of feed liquor groove (10), and the pivot of motor (5) runs through lifter plate (3) and is connected with spliced pole (6), the inner wall that the frame (4) was placed to the silicon chip is equipped with standing groove (40), and the silicon chip is placed frame (4) bottom and is equipped with logical groove (41).
2. The quartz silicon wafer cleaning tank mechanism according to claim 1, characterized in that: the liquid inlet grooves (10) are arranged on two sides of the cleaning tank (1) in the length direction, the number of the liquid inlet grooves (10) is a plurality, the liquid inlet grooves are specifically arranged in a linear array shape, and the length side lines of the liquid inlet grooves (10) and the cleaning tank (1) are in a vertical position relation; the number of the liquid inlet holes (11) is a plurality, and the liquid inlet holes are specifically arranged on the liquid inlet groove (10) at intervals.
3. The quartz silicon wafer cleaning tank mechanism according to claim 2, characterized in that: the placing grooves (40) are parallel to the liquid inlet groove (10), and the number of the placing grooves (40) is a plurality of, and the placing grooves are specifically arranged in a linear array.
4. The quartz silicon wafer cleaning tank mechanism according to claim 3, characterized in that: the number of the through grooves (41) is a plurality, the through grooves are specifically arranged in a linear array, and the positions of the through grooves (41) and the positions of the placing grooves (40) are specifically arranged in a staggered mode.
5. The quartz silicon wafer cleaning tank mechanism according to claim 1, characterized in that: the silicon wafer placing frame (4) and the connecting column (6) are in detachable connection relation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023311797.7U CN214160712U (en) | 2020-12-31 | 2020-12-31 | Quartz silicon wafer cleaning tank mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023311797.7U CN214160712U (en) | 2020-12-31 | 2020-12-31 | Quartz silicon wafer cleaning tank mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214160712U true CN214160712U (en) | 2021-09-10 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202023311797.7U Active CN214160712U (en) | 2020-12-31 | 2020-12-31 | Quartz silicon wafer cleaning tank mechanism |
Country Status (1)
| Country | Link |
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| CN (1) | CN214160712U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115922993A (en) * | 2022-11-18 | 2023-04-07 | 扬州扬铭新材料有限公司 | PVC floor membrane production is with stamp system that has cooling cleaning function |
-
2020
- 2020-12-31 CN CN202023311797.7U patent/CN214160712U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115922993A (en) * | 2022-11-18 | 2023-04-07 | 扬州扬铭新材料有限公司 | PVC floor membrane production is with stamp system that has cooling cleaning function |
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