CN203936083U - Semiconductor diffusion quartz ampoule cleaning device - Google Patents
Semiconductor diffusion quartz ampoule cleaning device Download PDFInfo
- Publication number
- CN203936083U CN203936083U CN201420336562.9U CN201420336562U CN203936083U CN 203936083 U CN203936083 U CN 203936083U CN 201420336562 U CN201420336562 U CN 201420336562U CN 203936083 U CN203936083 U CN 203936083U
- Authority
- CN
- China
- Prior art keywords
- cell body
- quartz ampoule
- cleaning device
- drive links
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 229910052904 quartz Inorganic materials 0.000 title claims abstract description 41
- 239000010453 quartz Substances 0.000 title claims abstract description 41
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 239000003708 ampul Substances 0.000 title claims abstract description 40
- 238000004140 cleaning Methods 0.000 title claims abstract description 33
- 238000009792 diffusion process Methods 0.000 title claims abstract description 20
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 210000000214 Mouth Anatomy 0.000 claims abstract description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 13
- 239000007921 spray Substances 0.000 claims abstract description 11
- 230000005540 biological transmission Effects 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- 239000004743 Polypropylene Substances 0.000 claims description 2
- -1 polypropylene Polymers 0.000 claims description 2
- 238000005406 washing Methods 0.000 abstract description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N HF Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KMUONIBRACKNSN-UHFFFAOYSA-N Potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 206010022114 Injury Diseases 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Abstract
The utility model relates to a kind of semiconductor diffusion and uses quartz ampoule cleaning device, comprises a cell body, a motor, a plurality of drive link and two support panels; Described motor is located at a side of described cell body, two support panels are fixed on described cell body relatively, a plurality of described drive links are all fixed on two described support panels, power transmission shaft on described motor connects a driving-belt, described driving-belt is connected with a plurality of described drive links, and drives a plurality of described drive links to rotate; The edge of described cell body is provided with a plurality of mouth sprays, and the bottom of described cell body is provided with a plurality of nitrogen bubble mouths, acid discharge outlet and drain outlet.The diffusion of described semiconductor by said structure, make its washing and cleaning operation that can automatically complete quartz ampoule, and cleaning efficiency is higher with quartz ampoule cleaning device, cleans comparatively thoroughly, and the while has also been reduced labour intensity, has protected personal safety.
Description
Technical field
The utility model relates to a kind of semiconductor diffusion and uses quartz ampoule cleaning device, for chip manufacturing field.
Background technology
In semiconductor dispersion operation, can use the quartz ampoule of an end opening, this is at high temperature because of diffusion technique, high-purity, under hyperbaric environment, carry out, and quartz not only under high temperature physicochemical properties stable, the coefficient of expansion changes minimum with temperature and pressure, and easily sintering is made.Diffusion technique requires high to the cleanliness factor of system, have impurity in quartz ampoule tube wall deposition in process, accumulates over a long period and can affect the performance of device, so need regularly quartz ampoule to be cleaned.
Current cleaning quartz ampoule mainly manually carries out.First, quartz ampoule is disassembled, strong acid solution (being generally potassium bichromate and concentrated sulfuric acid solution or chloroazotic acid) is poured into, corrode 24 hours, then rinse well by deionized water; Then, the hydrofluoric acid solution of dilution (general 1:10) is poured into, corroded 2 hours, more repeatedly rinse well by deionized water; Finally, with absolute ethyl alcohol dehydration, be placed in nitrogen convection environment and dry.And strong acid and hydrofluoric acid solution are larger to human injury, labour intensity is higher, and quartz ampoule is also frangible in flushing process, and therefore whole cleaning quality is difficult to be guaranteed.
Therefore be necessary to design a kind of semiconductor diffusion and use quartz ampoule cleaning device, to overcome the problems referred to above.
Utility model content
The purpose of this utility model is to overcome the defect of prior art, provides a kind of cleaning efficiency high, cleans thoroughly, and can reduce labour intensity, the semiconductor diffusion quartz ampoule cleaning device of protection personal safety.
The utility model is achieved in that
The utility model provides a kind of semiconductor diffusion to use quartz ampoule cleaning device, comprises a cell body, a motor, a plurality of drive link and two support panels; Described motor is located at a side of described cell body, two support panels are fixed on described cell body relatively, a plurality of described drive links are all fixed on two described support panels, power transmission shaft on described motor connects a driving-belt, described driving-belt is connected with a plurality of described drive links, and drives a plurality of described drive links to rotate; The edge of described cell body is provided with a plurality of mouth sprays, and the bottom of described cell body is provided with a plurality of nitrogen bubble mouths, acid discharge outlet and drain outlet.
Further, described cell body, described driving-belt and described drive link are made by polypropylene material.
Further, the relative both sides of described cell body are respectively equipped with 3 described mouth sprays.
Further, a plurality of nitrogen bubble mouths are evenly arranged at the bottom of described cell body.
Further, the quantity of described drive link is 4, and is evenly divided into two groups, and wherein first group two drive links are positioned at two drive link tops of second group, and two drive links of first group are positioned at same level height, two drive links of second group are positioned at same level height.
Further, the spacing between first group two drive links is greater than the spacing between two drive links of second group.
The utlity model has following beneficial effect:
The diffusion of described semiconductor by said structure, make its washing and cleaning operation that can automatically complete quartz ampoule, and cleaning efficiency is higher with quartz ampoule cleaning device, cleans comparatively thoroughly, and the while has also been reduced labour intensity, has protected personal safety.
Accompanying drawing explanation
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only embodiment more of the present utility model, for those of ordinary skills, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The semiconductor diffusion that Fig. 1 provides for the utility model embodiment structural representation of quartz ampoule cleaning device;
The structural representation of the drive link that Fig. 2 provides for the utility model embodiment.
The specific embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is clearly and completely described, obviously, described embodiment is only the utility model part embodiment, rather than whole embodiment.Embodiment based in the utility model, all other embodiment that those of ordinary skills obtain under the prerequisite of not making creative work, belong to the scope that the utility model is protected.
As Fig. 1 and Fig. 2, the utility model embodiment provides a kind of semiconductor diffusion to use quartz ampoule cleaning device, comprises a cell body 9, a motor 1, a plurality of drive link 8 and two support panels 6.
As Fig. 1 and Fig. 2, described motor 1 is located at a side of described cell body 9, two support panels 6 are fixed on described cell body 9 relatively, a plurality of described drive links 8 are all fixed on two described support panels 6, power transmission shaft on described motor 1 connects a driving-belt 2, described driving-belt 2 is connected with a plurality of described drive links 8, and drives a plurality of described drive links 8 to rotate, and described drive link 8 further drives quartz ampoule placed thereon to rotate.In this preferred embodiment, the quantity of described drive link 8 is 4, and be evenly divided into two groups, wherein first group two drive links 8 are positioned at two drive link 8 tops of second group, and two drive links 8 of first group are positioned at same level height, two drive links 8 of second group are positioned at same level height; Spacing between two drive links 8 of first group is greater than the spacing between two drive links 8 of second group.Wherein, described cell body 9, described driving-belt 2 and described drive link 8 are made by polypropylene (PP) material.
As Fig. 1 and Fig. 2, the edge of described cell body 9 is provided with a plurality of mouth sprays 7, and in this preferred embodiment, the relative both sides of described cell body 9 are respectively equipped with 3 described mouth sprays 7, described mouth spray 7 is for spraying deionized water, and described mouth spray 7 is all aimed at the quartz ampoule of putting into described cell body 9.
As Fig. 1 and Fig. 2, the bottom of described cell body 9 is provided with a plurality of nitrogen bubble mouths 3, acid discharge outlet 4 and drain outlet 5.Described nitrogen bubble mouth 3 is all connected to a nitrogen bubble device (not shown), and a plurality of nitrogen bubble mouths 3 are evenly arranged at the bottom of described cell body 9, thereby has guaranteed that nitrogen is comparatively even respectively.
As Fig. 1 and Fig. 2, the operation that described semiconductor diffusion is cleaned quartz ampoule with quartz ampoule cleaning device is as follows:
1, the quartz ampoule disassembling is put into described cell body 9, then add strong acid solution (being generally potassium bichromate and concentrated sulfuric acid solution or chloroazotic acid), open described motor 1, described drive link 8 drives quartz ampoule to rotate in washing lotion, open nitrogen bubble device, maintain two hours, open described acid discharge outlet 4, get rid of strong acid solution;
2, open described mouth spray 7, open described motor 1 simultaneously, by after the abundant submergence of quartz ampoule, open described drain outlet 5, in triplicate, the strong acid solution on quartz ampoule is cleaned up;
3, the hydrofluoric acid solution of dilution (general 1:10) is poured in described cell body 9, opened described motor 1 simultaneously, open nitrogen bubble device, maintain two hours, open described acid discharge outlet 4, get rid of the hydrofluoric acid solution of dilution;
4, open described mouth spray 7, open described motor 1 simultaneously, by after the abundant submergence of quartz ampoule, open described drain outlet 5, in triplicate, the hydrofluoric acid solution on quartz ampoule is cleaned up;
5, absolute ethyl alcohol is poured in described cell body 9, submergence quartz ampoule bottom, opens described motor 1, and quartz ampoule rotated after a few minutes, takes out, and quartz ampoule is placed on below nitrogen convection device and is dried, and can complete its cleaning.
In sum, the diffusion of described semiconductor by said structure, make its washing and cleaning operation that can automatically complete quartz ampoule, and cleaning efficiency is higher with quartz ampoule cleaning device, cleans comparatively thoroughly, and the while has also been reduced labour intensity, has protected personal safety.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (6)
1. a quartz ampoule cleaning device is used in semiconductor diffusion, it is characterized in that, comprises a cell body, a motor, a plurality of drive link and two support panels;
Described motor is located at a side of described cell body, two support panels are fixed on described cell body relatively, a plurality of described drive links are all fixed on two described support panels, power transmission shaft on described motor connects a driving-belt, described driving-belt is connected with a plurality of described drive links, and drives a plurality of described drive links to rotate;
The edge of described cell body is provided with a plurality of mouth sprays, and the bottom of described cell body is provided with a plurality of nitrogen bubble mouths, acid discharge outlet and drain outlet.
2. quartz ampoule cleaning device is used in semiconductor diffusion as claimed in claim 1, it is characterized in that: described cell body, described driving-belt and described drive link are made by polypropylene material.
3. quartz ampoule cleaning device is used in semiconductor diffusion as claimed in claim 1, it is characterized in that: the relative both sides of described cell body are respectively equipped with 3 described mouth sprays.
4. quartz ampoule cleaning device is used in semiconductor diffusion as claimed in claim 1, it is characterized in that: a plurality of nitrogen bubble mouths are evenly arranged at the bottom of described cell body.
5. semiconductor as claimed in claim 1 spreads and uses quartz ampoule cleaning device, it is characterized in that: the quantity of described drive link is 4, and be evenly divided into two groups, wherein first group two drive links are positioned at two drive link tops of second group, and two drive links of first group are positioned at same level height, two drive links of second group are positioned at same level height.
6. quartz ampoule cleaning device is used in semiconductor as claimed in claim 5 diffusion, it is characterized in that: the spacing between two drive links of first group is greater than the spacing between two drive links of second group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420336562.9U CN203936083U (en) | 2014-06-24 | 2014-06-24 | Semiconductor diffusion quartz ampoule cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420336562.9U CN203936083U (en) | 2014-06-24 | 2014-06-24 | Semiconductor diffusion quartz ampoule cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203936083U true CN203936083U (en) | 2014-11-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420336562.9U Active CN203936083U (en) | 2014-06-24 | 2014-06-24 | Semiconductor diffusion quartz ampoule cleaning device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104741335A (en) * | 2015-04-02 | 2015-07-01 | 中建材浚鑫科技股份有限公司 | Method for cleaning quartz boat for diffusion |
| CN110434114A (en) * | 2019-06-20 | 2019-11-12 | 北京北方华创微电子装备有限公司 | Cleaning device |
-
2014
- 2014-06-24 CN CN201420336562.9U patent/CN203936083U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104741335A (en) * | 2015-04-02 | 2015-07-01 | 中建材浚鑫科技股份有限公司 | Method for cleaning quartz boat for diffusion |
| CN110434114A (en) * | 2019-06-20 | 2019-11-12 | 北京北方华创微电子装备有限公司 | Cleaning device |
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|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |