CN210367453U - Silver-based LOW-E membrane surface laminated glass - Google Patents
Silver-based LOW-E membrane surface laminated glass Download PDFInfo
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- CN210367453U CN210367453U CN201920717502.4U CN201920717502U CN210367453U CN 210367453 U CN210367453 U CN 210367453U CN 201920717502 U CN201920717502 U CN 201920717502U CN 210367453 U CN210367453 U CN 210367453U
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Abstract
The utility model provides a silver-based LOW-E membrane face doubling glass, including LOW-E glass monolithic, film and ordinary glass monolithic, LOW-E glass monolithic includes glass substrate layer and coating film layer, and the coating film layer outwards has compounded eleven retes in proper order from glass substrate layer, and wherein the first layer is the SiNx layer, and the second floor is the ZnAl layer, and the third layer is the Ag layer, and the fourth layer is the NiCr layer, and the fifth layer is the AZO layer, and the sixth layer is the SiNx layer, and the seventh layer is the ZnAl layer, and the eighth layer is the Ag layer, and the ninth layer is the NiCr layer, and the tenth layer is the AZO layer, and the eleventh layer is the SiNx layer. The glass of the utility model has the advantages of high transmittance, oxidation resistance, no need of hollow and monolithic use, etc.
Description
Technical Field
The utility model belongs to the technical field of doubling glass processing, concretely relates to silver-based LOW face doubling glass.
Background
Glass is an important building material, and with the increasing requirements on the decoration of buildings, the usage amount of glass in the building industry is also increasing. However, in the selection of glazing for buildings today, in addition to aesthetic and appearance features, concerns exist regarding heat management, refrigeration costs, and the balance of comfort of the internal sun's projection. Therefore, the novel and expensive Low-E glass in the coated glass family is made to stand out and becomes the focus of attention of people.
Low-E glass is also called Low-emissivity glass, and is a film product formed by plating a plurality of layers of metal or other compounds on the surface of the glass. The coating layer has the characteristics of high visible light transmission and high mid-far infrared ray reflection, so that the coating layer has excellent heat insulation effect and good light transmission compared with common glass and traditional coated glass for buildings, and the silver-based Low-E glass is outstanding in Low-E glass due to abundant performance of the variety, but the silver-based LOW-E glass in the current market cannot be used singly and must be made into hollow glass due to the easy oxidation characteristic of silver, so that the coating layer has the advantages of multiple processes, Low production efficiency and high production cost.
SUMMERY OF THE UTILITY MODEL
The utility model aims at the above-mentioned problem that prior art exists, provide a silver-based LOW-E face doubling glass and preparation method, the utility model aims to solve the technical problem how through the optimal design to doubling glass's structure, coating film layer and magnetron sputtering technology, make the LOW-E doubling glass coating film layer of producing wrap up between two glass substrates to avoid coating film layer and air contact, and then make it need not cavity and directly use.
The purpose of the utility model can be realized by the following technical proposal: the silver-based LOW-E film surface laminated glass is characterized by comprising a Low-E glass single sheet, a film and a common glass single sheet, wherein the Low-E glass single sheet comprises a glass substrate layer and a coating layer, eleven film layers are sequentially compounded on the coating layer from the glass substrate layer to the outside, and the first layer is SiNxThe second layer is a ZnAl layer, the third layer is an Ag layer, the fourth layer is a NiCr layer, the fifth layer is an AZO layer, and the sixth layer is SiNxThe layer, the seventh layer is the ZnAl layer, the eighth layer is the Ag layer, the ninth layer is the NiCr layer, the tenth layer is the AZO layer, and the eleventh layer is the SiNx layer.
The silver-based LOW-E film surface laminated glass is characterized in that a first layer and a second layer are a first dielectric medium combined layer, a third layer is a LOW-radiation functional layer, a fourth layer and a fifth layer are crystal bed dielectric layers, a sixth layer and a seventh layer are second dielectric medium combined layers, an eighth layer is a LOW-radiation functional layer, a ninth layer is a crystal bed dielectric layer, and a tenth layer and a eleventh layer are blocking protective layers.
The preparation method of the silver-based LOW-E membrane surface laminated glass is characterized by comprising the following steps:
(1) and preparing a Low-E glass original sheet, namely preparing a magnetron sputtering coating layer:
A. magnetron sputtering of the first layer:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 20-28 nm；
B. Magnetron sputtering the second layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the plated film is 17-19 nm;
C. magnetron sputtering the third layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 1.0-3.3 nm;
D. magnetron sputtering the fourth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 1.0-1.3 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 7-9 nm;
F. magnetron sputtering a sixth layer:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the plated film is 38-42 nm;
G. magnetron sputtering a seventh layer:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the plated film is 16-20 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 11.5-12 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 4-4.5 nm;
J. magnetron sputtering the tenth layer:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas ratio is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 7.5-8.0 nm;
K. magnetron sputtering the eleventh layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc tin (ZnSn); process gas: argon and nitrogen in the ratio of 1 to 1.14 and sputtering pressure of 3-5X 10-3mbar; the thickness of the plated film is 52-60 nm;
the total thickness of the coating layer is controlled between 175 and 212nm, and the transmission running speed of the sputtering chamber is controlled between 4.0 and 6.0 m/min;
(2) cutting glass and edging:
respectively cutting and edging the LOW-E glass sheet and the common glass sheet obtained in the step (1) to obtain a LOW-E glass single sheet and a common glass single sheet;
(3) and glass cleaning and drying:
respectively cleaning the LOW-E glass single sheet obtained in the step (2) and the common glass single sheet by using deionized water, and respectively drying;
the adhesion force of the glass and the film cleaned by the deionized water is higher than that of the glass cleaned by tap water; the water temperature is preferably more than 55 ℃ to ensure the cleaning effect.
(4) And cutting the film:
taking out the film from the packaging box, cutting the sealing bag along the inner side of the original sealing line by using a sharp knife, wearing a non-fluffy glove, lifting the upper layer of the film, slightly shaking the film, and slightly taking out the film; if the packaging bag is not used for one time, the packaging bag needs to be sealed, the air in the packaging bag is exhausted before sealing, redundant sealing bags are folded, and the bonding line part is completely sealed by a waterproof lead foil adhesive tape or a heat sealing machine; b, cutting the film by using a sharp knife according to the size of the glass single sheet obtained in the step A, namely cutting by using a ruler as a template to ensure that the correct size is obtained, and scratching the film along the edge of the template by using the sharp knife; if a bent or irregular shape is required, plate glass with a cut shape can be used as a template; after cutting, the film is folded along the cutting contour line scratch and torn or broken; after cutting, removing the scraps on the surface of the edge by using dust-free cloth or a special adhesive roller;
(5) sheet combination:
laminating the laminated glass in a laminating chamber, wherein the temperature and the humidity of the laminating chamber are adjusted before laminating (the temperature is about 25 ℃ and the humidity is about 20%), then the common glass single sheet obtained in the step (3) is stably placed on an operation table, the film obtained in the step (4) is spread and flattened on the common glass single sheet, finally the LOW-E glass single sheet is placed, the film coating surface of the LOW-E glass single sheet faces downwards and is tightly attached to the film, and the common glass single sheet, the LOW-E glass single sheet and the film are stacked neatly;
(6) pre-pressing and exhausting:
conveying the laminated glass obtained in the step (5) to rolling equipment stably for prepressing and exhausting; in rolling equipment, the laminated glass is preheated, the preheating temperature is controlled to be about 68 ℃, the laminated glass enters a pair of pressing rollers for rolling after being preheated, and the gap between the pair of pressing rollers is about 3mm smaller than the thickness of the laminated glass;
(7) and packaging and burning the kettle:
repeating the steps (1) to (6) for multiple times to obtain a plurality of pieces of laminated glass; then, every two to three pieces of the laminated glass are stacked orderly and respectively put into high-temperature and high-pressure resistant vacuum bags, and the laminated glass is wrapped after being vacuumized; then, all groups of laminated glass are longitudinally and obliquely stacked on the inserting frame, and each group of glass is separated by a cushion block (the interval between two adjacent groups of laminated glass is not less than 20 mmm); and finally, feeding the stacked laminated glass into a high-pressure kettle for kettle burning.
The utility model discloses the advantage:
1. the laminated glass has high color stability and good consistency, and the transmittance T of a 6mm single sheet belongs to [30 percent and 70 percent ].
2. In the laminated glass, the coating layer is sealed between the two pieces of glass, so that the coating layer is isolated from the air, and the laminated glass has strong oxidation resistance and can be directly used in a single piece without hollow processing.
3. The sun-shading effect is superior to that of common single-piece coated glass.
Drawings
FIG. 1 is a schematic view of the laminated structure of the silver-based LOW-E film laminated glass.
In the figure, a single LOW-E glass sheet; G. a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer; b. a film; c. a plain glass monolith.
Detailed Description
The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.
As shown in fig. 1, a silver-based LOW-E film laminated glass comprises a LOW-E glass single sheet a, a film b and a common glass single sheet c, wherein the LOW-E glass single sheet a comprises a glass substrate layer G and a coating layer, the coating layer is sequentially compounded with eleven film layers from the glass substrate layer G to the outside, wherein the first layer 1 is a SiNx layer, the second layer 2 is a ZnAl layer, the third layer 3 is an Ag layer, the fourth layer 4 is a NiCr layer, the fifth layer 5 is an AZO layer, the sixth layer 6 is a SiNx layer, the seventh layer 7 is a ZnAl layer, the eighth layer 8 is an Ag layer, the ninth layer 9 is a NiCr layer, the tenth layer 10 is an AZO layer, and the tenth layer 11 is a SiNx layer; the first layer 1 and the second layer 2 are first dielectric medium combined layers, the third layer 3 is a low-radiation functional layer, the fourth layer 4 and the fifth layer 5 are crystal bed dielectric layers, the sixth layer 6 and the seventh layer 7 are second dielectric medium combined layers, the eighth layer 8 is a low-radiation functional layer, the ninth layer 9 is a crystal bed dielectric layer, and the tenth layer 10 and the eleventh layer 11 are blocking protective layers.
A preparation method of silver-based LOW-E membrane surface laminated glass comprises the following steps:
(1) and preparing a Low-E glass original sheet, namely preparing a magnetron sputtering coating layer:
A. magnetron sputtering of the first layer 1:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 20-28 nm;
B. magnetron sputtering of the second layer 2:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 17-19 nm;
C. magnetron sputtering of the third layer 3:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 1.0-3.3 nm;
D. magnetron sputtering of the fourth layer 4:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 1.0-1.3 nm;
E. magnetron sputtering of the fifth layer 5:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 7-9 nm;
F. magnetron sputtering the sixth layer 6:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 38-42 nm;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 16-20 nm;
H. magnetron sputtering the eighth layer 8:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 11.5-12 nm;
I. magnetron sputtering the ninth layer 9:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 4-4.5 nm;
J. magnetron sputtering the tenth layer 10:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas ratio is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 7.5-8.0 nm;
K. magnetron sputtering the eleventh layer 11:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc tin (ZnSn); process gas: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 52-60 nm;
the total thickness of the coating layer is controlled between 175 and 212nm, and the transmission running speed of the sputtering chamber is controlled between 4.0 and 6.0 m/min;
(2) cutting glass and edging:
respectively cutting and edging the LOW-E glass sheet and the common glass sheet obtained in the step (1) to obtain a LOW-E glass single sheet a and a common glass single sheet c;
(3) and glass cleaning and drying:
respectively cleaning the LOW-E glass single sheet a and the common glass single sheet c obtained in the step (2) by using deionized water, and respectively drying;
the adhesive force between the glass cleaned by the deionized water and the film b is higher than that between the glass cleaned by tap water; the water temperature is preferably more than 55 ℃ to ensure the cleaning effect.
(4) And cutting the film:
taking out the film b from the packaging box, cutting the sealing bag along the inner side of the original sealing line by using a sharp knife, wearing a non-fluffy glove, lifting the upper layer film b, slightly shaking the upper layer film b, and slightly taking out the film b; if the packaging bag is not used for one time, the packaging bag needs to be sealed, the air in the packaging bag is exhausted before sealing, redundant sealing bags are folded, and the bonding line part is completely sealed by a waterproof lead foil adhesive tape or a heat sealing machine; b, cutting the film b by using a sharp knife according to the size of the glass single piece obtained in the step A, namely cutting by using a ruler as a template to ensure that the correct size is obtained, and scratching the film b along the edge of the template by using the sharp knife; if a bent or irregular shape is required, plate glass with a cut shape can be used as a template; after cutting, the film b is folded along the cutting contour line scratch and torn or broken; after cutting, removing the scraps on the surface of the edge by using dust-free cloth or a special adhesive roller;
(5) sheet combination:
laminating the laminated glass in a laminating chamber, wherein the temperature and the humidity of the laminating chamber are adjusted before laminating (the temperature is about 25 ℃ and the humidity is about 20%), then the common glass sheet c obtained in the step (3) is stably placed on an operation table, the film b obtained in the step (4) is laid on the common glass sheet c to be flat, finally the LOW-E glass sheet a is placed, the film coating surface of the LOW-E glass sheet a is made to face downwards to be tightly attached to the film b, and the common glass sheet c, the LOW-E glass sheet a and the film b are stacked neatly;
(6) pre-pressing and exhausting:
conveying the laminated glass obtained in the step (5) to rolling equipment stably for prepressing and exhausting; in rolling equipment, the laminated glass is preheated, the preheating temperature is controlled to be about 68 ℃, the laminated glass enters a pair of pressing rollers for rolling after being preheated, and the gap between the pair of pressing rollers is about 3mm smaller than the thickness of the laminated glass;
(7) and packaging and burning the kettle:
repeating the steps (1) to (6) for multiple times to obtain a plurality of pieces of laminated glass; then, every two to three pieces of the laminated glass are stacked orderly and respectively put into high-temperature and high-pressure resistant vacuum bags, and the laminated glass is wrapped after being vacuumized; then, all groups of laminated glass are longitudinally and obliquely stacked on the inserting frame, and each group of glass is separated by a cushion block (the interval between two adjacent groups of laminated glass is not less than 20 mmm); and finally, feeding the stacked laminated glass into a high-pressure kettle for kettle burning.
The measured values of the optical performance parameters of the product obtained by the scheme are as follows (taking laminated glass with the thickness of 6mm as a sample):
the specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions for the specific embodiments described herein may be made by those skilled in the art without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (1)
1. The laminated glass with the silver-based LOW-E film surface is characterized by comprising a LOW-E glass single sheet (a), a film (b) and a common glass single sheet (c), wherein the LOW-E glass single sheet (a) comprises a glass substrate layer (G) and a coating layer, eleven film layers are sequentially compounded on the coating layer from the glass substrate layer (G) to the outside, the first layer (1) is a SiNx layer, the second layer (2) is a ZnAl layer, the third layer (3) is an Ag layer, the fourth layer (4) is a NiCr layer, the fifth layer (5) is an AZO layer, the sixth layer (6) is a SiNx layer, the seventh layer (7) is a ZnAl layer, the eighth layer (8) is an Ag layer, the ninth layer (9) is a NiCr layer, the tenth layer (10) is an AZO layer, and the eleventh layer (11) is a SiNx layer; the solar cell comprises a first layer (1), a second layer (2), a third layer (3), a fourth layer (4), a fifth layer (5), a sixth layer (6), a seventh layer (7), a tenth layer (10), a tenth layer (11), a fourth layer (4), a fifth layer (5), a sixth layer (6), a sixth layer (7), a sixth layer (8), a sixth layer (9), a sixth layer (11), a sixth layer (6), a sixth layer (11), a sixth layer (8), a sixth layer (9), a tenth layer (10) and a tenth layer (11) which are sequentially arranged from bottom to top.
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