CN210325797U - Array substrate and display panel - Google Patents
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- CN210325797U CN210325797U CN201920881237.3U CN201920881237U CN210325797U CN 210325797 U CN210325797 U CN 210325797U CN 201920881237 U CN201920881237 U CN 201920881237U CN 210325797 U CN210325797 U CN 210325797U
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Abstract
The application discloses array substrate and display panel, array substrate includes: a plurality of data lines; a plurality of scan lines; the active switch is arranged corresponding to the data line and the scanning line; and a pixel electrode connected to the active switch and forming an overlap region with the active switch; the array substrate further comprises an insulating shading layer, a first insulating layer, an active layer, a metal layer and a second insulating layer which are formed at the overlapping region, and the pixel electrode is in contact with the metal layer through a through hole; wherein the insulating light shielding layer is positioned below the active layer. This application is through increasing insulating light shield layer in overlap area and data line region, prevents to form parasitic capacitance with the metal layer of top and produces the influence to the picture display, blocks the light irradiation among the backlight unit to the active layer simultaneously, and then prevents to cause the picture to show unusually because the photocurrent that illumination produced.
Description
Technical Field
The application relates to the technical field of display, in particular to an array substrate and a display panel.
Background
With the development and progress of technology, flat panel displays are becoming mainstream products of displays and are widely used. Among them, Liquid Crystal Display (LCD for short) has features of small volume, low power consumption, no radiation, etc., and occupies a leading position in the current flat panel Display market. In general, a Thin Film Transistor (TFT) is used as a driving device in an LCD, so as to realize high-speed, high-brightness, and high-contrast display screen information. The thin film transistor has an active layer made of amorphous silicon (a-Si) or the like.
The amorphous silicon forming the active layer is a photosensitive semiconductor material and can generate photocurrent under high-intensity illumination of backlight provided by a backlight module of the liquid crystal display, so that electric signals such as pixel voltage received by a pixel electrode connected with the thin film transistor and the like are changed, and finally, the abnormal display picture of the liquid crystal display is caused.
SUMMERY OF THE UTILITY MODEL
The technical problem to be solved by the application is to provide an array substrate and a display panel for preventing abnormal picture display.
The application provides an array substrate, includes: a plurality of data lines; a plurality of scan lines; the active switch is arranged corresponding to the data line and the scanning line; and a pixel electrode connected to the active switch and forming an overlap region with the active switch; the array substrate further comprises an insulating shading layer, a first insulating layer, an active layer, a metal layer and a second insulating layer which are formed at the overlapping region, and the pixel electrode is in contact with the metal layer through a via hole; wherein the insulating light shielding layer is positioned below the active layer.
Optionally, the array substrate further includes an insulating light shielding layer, a first insulating layer, an active layer, a metal layer, and a second insulating layer formed at the data line.
Optionally, the array substrate further includes a gate line, the array substrate includes a first insulating layer, a gate line metal layer and a second insulating layer formed at the gate line, and the gate line metal layer and the insulating light shielding layer have the same thickness.
Optionally, the projection of the insulating light shielding layer perpendicular to the array substrate completely covers the active layer.
Optionally, the insulating light-shielding layer includes a black color resistor.
Optionally, the insulating light-shielding layer includes color resistance layers of at least two different colors, and the plurality of color resistance layers are stacked.
Optionally, the insulating light-shielding layer includes a red color resist layer, a green color resist layer, and a blue color resist layer.
Optionally, the array substrate further includes a glass substrate, and the insulating light shielding layer is located between the glass substrate and the first insulating layer.
The application also discloses an array substrate includes: a plurality of data lines; a plurality of scan lines; the active switch is arranged corresponding to the data line and the scanning line; and a pixel electrode connected to the active switch and forming an overlap region with the active switch; the array substrate further comprises an insulating shading layer, a first insulating layer, an active layer, a metal layer and a second insulating layer which are formed at the overlapping region and the data line, and the pixel electrode is in contact with the metal layer through a through hole; the insulating shading layer is positioned below the active layer, and the projection of the insulating shading layer perpendicular to the array substrate completely covers the active layer; the insulating light shielding layer comprises a black color resistor.
The application also discloses a display panel, which comprises the array substrate, a color film substrate arranged by the array substrate in a box-to-box mode, and a liquid crystal layer positioned between the array substrate and the color film substrate.
According to the backlight module, the insulating shading layer is arranged in the overlapping area formed by the pixel electrode and the active switch and the data line, so that the irradiation of backlight generated by the backlight module on the active layer is blocked, and the abnormal image display caused by the generation of photocurrent on the active layer is prevented. The insulating light shielding layer is designed to be insulating, and parasitic capacitance cannot be formed between the insulating light shielding layer and the metal layer above the active layer to influence image display.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
fig. 1 is a schematic view of an array substrate according to an embodiment of the present application;
FIG. 2 is a schematic cross-sectional view along AA' of FIG. 1 according to an embodiment of the present application;
fig. 3 is a schematic diagram of a display panel according to another embodiment of the present application.
100, a display panel; 200. an array substrate; 210. a data line; 220. scanning a line; 230. an active switch; 240. a pixel electrode; 241. an overlap region; 251. an insulating light-shielding layer; 252. a first insulating layer; 253. an active layer; 254. a metal layer; 255. a second insulating layer; 256. a via hole; 257. a glass substrate; 300. a color film substrate; 400. and a liquid crystal layer.
Detailed Description
Specific structural and functional details disclosed herein are merely representative and are provided for purposes of describing example embodiments of the present application. This application may, however, be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
In the description of the present application, it is to be understood that the terms "center," "lateral," "upper," "lower," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in the orientation or positional relationship indicated in the drawings for convenience in describing the present application and for simplicity in description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and therefore should not be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, the term "multistage" means two or more stages unless otherwise specified. Furthermore, the term "comprises" and any variations thereof is intended to cover non-exclusive inclusions.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; the two-stage element can be directly connected or indirectly connected through an intermediate medium, and can be communicated with the inside of the two-stage element. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used herein, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
The application is further described with reference to the drawings and alternative embodiments.
Referring to fig. 1 to 3, the present application discloses a display panel 100 including a first substrate and a second substrate, and a liquid crystal layer 400 disposed between the first substrate and the second substrate. The first substrate is generally the array substrate 200, and the second substrate is the color filter substrate 300, but it is needless to say that the first substrate may also be the color filter substrate 300, and the second substrate is the array substrate 200 (that is, the array substrate 200 is located above the color filter substrate 300). The array substrate 200 includes: a plurality of data lines 210; a plurality of scan lines 220; an active switch 230 disposed corresponding to the data line 210 and the scan line 220; and a pixel electrode 240 connected to the active switch 230 and forming an overlap region 241 with the active switch 230; the array substrate 200 further includes an insulating light shielding layer 251, a first insulating layer 252, an active layer 253, a metal layer 254, and a second insulating layer 255 formed at the overlapping region 241, and the pixel electrode 240 contacts the metal layer 254 through a via 256. Wherein the insulating light-shielding layer 251 is located below the active layer 253.
The active layer 253 is typically made of an amorphous silicon material, which is a photosensitive semiconductor material. High-intensity light emitted by a backlight module in the lcd device irradiates on the active layer 253 to generate a photocurrent, so that a pixel voltage provided by the pixel electrode 240 to the liquid crystal pixel changes, which finally causes an abnormal display of the image of the display panel 100, especially a severe image sticking phenomenon occurs during a performance test, and visual experience of a user is affected. In the present application, the pixel electrode 240 and the active switch 230 form an overlapping region 241, and an insulating light shielding layer 252 is added below the active layer 253 of the overlapping region 241, so as to block light emitted from the backlight module from directly irradiating on the active layer 253, prevent the active layer 253 from generating photocurrent to affect normal display of the display panel 100, and further improve display quality. If the shading factor is simply considered, the shading layer may be made of a metal material for shading, and the shading layer formed of the metal material may also effectively shade the high-intensity illumination generated by the backlight module, but the shading layer of the metal material may form a parasitic capacitance with the metal layer 254 above, and further may affect the normal display of the display panel 100. The insulating light-shielding layer 251 itself is made of an insulating material, so that parasitic capacitance with the upper metal layer 254 can be avoided due to the insulating property while shielding light. Similarly, the array substrate 200 is provided with the insulating light shielding layer 251 under the active layer 253 at the data line 210, so as to prevent the active layer 253 from affecting normal display due to photocurrent generated by illumination.
The first substrate is generally an Array substrate, and the display panel includes a Color Filter substrate arranged in a box-to-box manner with the Array substrate, or may be a COA (Color Filter on Array) substrate, and the opposite substrate may include only a glass substrate and a corresponding transparent electrode layer. Of course, other types and configurations of display panels are possible.
The active switch includes an insulating light-shielding layer 251, a gate layer, a first insulating layer 252, an active layer 253, a metal layer 254, and a second insulating layer 255 sequentially formed on a substrate.
Of course, the array substrate 200 further includes a gate line (located in the area of the active switch 230 and the scan line 220), and the array substrate 200 further includes a first insulating layer 251, a gate line metal layer and a second insulating layer 255 formed at the gate line, and the gate line metal layer has the same thickness as the insulating light shielding layer 251. The grid line metal layer is arranged at the grid line for shading and blocking the backlight in the liquid crystal display from irradiating. The thickness of the gate line metal layer is the same as that of the insulating light-shielding layer 251, and when the second insulating layer 255, the gate line metal layer and the pixel electrode 240 are formed above the substrate, the step difference can be reduced, and the problems of line breakage and fault caused by too large step difference can be avoided. Of course, the thickness of the insulating light-shielding layer 251 may be smaller than that of the gate line metal layer, so that the total thickness of the thin film transistor is equal to that of each film layer at the gate line, and specifically, the thickness of each film layer may be adjusted by using a semi-permeable film.
Specifically, the insulating light shielding layer 251 completely covers the active layer 253 in a projection perpendicular to the array substrate 200. The area of the insulating light-shielding layer 251 is larger than or equal to the area of the active layer 253, so that the insulating light-shielding layer 251 completely shields the backlight generated from the backlight module, and no light is incident on the active layer 253. The insulating light-shielding layer 251 in the overlapped region may be disposed with a projection that completely covers the metal layer 254, and may be extended to cover the gate layer at the active switch, so as to avoid mura (uneven display brightness, speckles) problem that may be generated at the edge of the metal layer.
More specifically, the insulating light-shielding layer 251 includes a black color resist. The insulating light-shielding layer 251 may be light-shielded using a BM (black matrix) material as the insulating light-shielding layer 251, on which a first insulating layer 252, an active layer 253, a metal layer 254, and a second insulating layer 255 are sequentially formed. In such a design, the black matrix is formed on a TFT (Thin film transistor) array substrate, and thus, compared with a case where the black matrix is formed on a color film substrate, the width of the BM may be reduced, and the aperture ratio of the display panel 100 may be further improved.
Of course, other insulating light-shielding materials may be used for shielding light, and other color resists may be used for shielding light. The insulating light-shielding layer may further include color-resist layers of at least two different colors, the plurality of color-resist layers being stacked. The insulating light-shielding layer 251 is formed by stacking at least two color-resist layers of different colors, so as to shield the backlight generated by the backlight module in the liquid crystal display. The stacking of different color resists can produce various embodiments, particularly, when the first substrate is a structure in which TFTs are disposed above color resist layers, the insulating light shielding layer 251 can have a red color resist layer as the first color resist layer and a blue color resist layer as the second color resist layer, which can be formed in the same layer as the color resist layer of the display panel 100, thereby reducing one process. The color resistance layer formed in the overlapping area and overlapped to form the insulating light shielding layer is smaller than the color resistance layer of the same color at other parts of the substrate, so that the condition that the TFT is too convex is avoided.
Of course, an insulating light-shielding layer 251 formed by stacking a red resist layer and a green resist layer, or a resist layer formed by stacking a green resist layer and a blue resist layer may be used. The stacking order of the different color resists is not limited to the above, and can be adjusted during the manufacturing process of the array substrate 200. More specifically, the insulating light-shielding layer 251 includes a red color resist, a green color resist, and a blue color resist. Insulating light shield layer 251 can use the three-layer look to hinder the layer and pile up the formation, and first layer look hinders the layer for red look hinders, the second look hinders the layer for green look hinders the layer, the third look hinders the layer and be the look and hinders the layer, and the film forming of three-layer look hinders can guarantee to shelter from that the effect is better in a poor light.
The array substrate 200 further includes a glass substrate 257, and the insulating light shielding layer is located between the glass substrate 257 and the first insulating layer 252 (gate electrode insulating layer). In the manufacturing process of the array substrate 200, the insulating light shielding layer 251 is formed on the glass substrate 257 at the data line 210 and the overlapping region 241 by using a photolithography mask, and then the first insulating layer 252 is deposited on the insulating light shielding layer 251, and the first insulating layer 252 is deposited on the insulating light shielding layer 251 and other regions of each region. Then, an active layer 253 (amorphous silicon layer) and a metal layer 254 are sequentially formed on the first insulating layer 252 using a photolithography mask. Here, the metal layer 253 formed at the gate and data lines 210 is a source metal layer, and the metal layer 254 formed at the overlapping region 241 of the pixel electrode 240 and the active switch 230 is a drain metal layer. After the active layer 253 thin film and the metal layer 254 thin film are deposited, the active layer 253 and the metal layer 254 are formed by exposure and development of a photolithographic mask, wet etching, dry etching and stripping.
Next, a second insulating layer 255 (passivation layer) is deposited, and a via 256 is formed in the overlap region 241 formed by the active switch 230 and the pixel electrode 240. The second insulating layer 255 may be exposed to light and developed by using a photolithography mask, and then dry-etched and stripped, so that the via hole 256 is formed in the overlap region 241, and the pixel electrode 240 is in contact with the metal layer 254 through the via hole 256.
The technical scheme of the application can be widely applied to flat panel displays such as Thin film transistor-Liquid Crystal displays (TFT-LCDs) and Organic Light-Emitting diodes (OLED) displays.
The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the present application is not intended to be limited to the specific embodiments shown. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.
Claims (10)
1. An array substrate, comprising:
a plurality of data lines;
a plurality of scan lines;
the active switch is arranged corresponding to the data line and the scanning line; and
the pixel electrode is connected with the active switch and forms an overlapping area with the active switch; the array substrate further comprises an insulating shading layer, a first insulating layer, an active layer, a metal layer and a second insulating layer which are sequentially formed in the overlapping area, and the pixel electrode is in contact with the metal layer through a through hole;
wherein the insulating light shielding layer is positioned below the active layer.
2. The array substrate of claim 1, further comprising an insulating light shielding layer, a first insulating layer, an active layer, a metal layer, and a second insulating layer formed at the data line.
3. The array substrate of claim 1, further comprising a gate line, wherein the array substrate comprises a first insulating layer, a gate line metal layer and a second insulating layer formed at the gate line, and wherein the gate line metal layer has the same thickness as the insulating light-shielding layer.
4. The array substrate of claim 1, wherein the insulating light shielding layer completely covers the active layer in a projection perpendicular to the array substrate.
5. The array substrate of claim 1, wherein the insulating light-shielding layer comprises a black color resistor.
6. The array substrate of claim 1, wherein the insulating light-shielding layer comprises at least two color-resist layers of different colors, and a plurality of the color-resist layers are stacked.
7. The array substrate of claim 6, wherein the insulating light shielding layer comprises a red color resist layer, a green color resist layer and a blue color resist layer.
8. The array substrate of claim 1, wherein the array substrate further comprises a glass substrate, and the insulating light shielding layer is located between the glass substrate and the first insulating layer.
9. An array substrate, comprising:
a plurality of data lines;
a plurality of scan lines;
the active switch is arranged corresponding to the data line and the scanning line; and
the pixel electrode is connected with the active switch and forms an overlapping area with the active switch; the array substrate further comprises an insulating shading layer, a first insulating layer, an active layer, a metal layer and a second insulating layer which are formed at the overlapping region and the data line, and the pixel electrode is in contact with the metal layer through a via hole;
the insulating shading layer is positioned below the active layer, and the projection of the insulating shading layer perpendicular to the array substrate completely covers the active layer; the insulating light shielding layer comprises a black color resistor.
10. A display panel, comprising the array substrate according to any one of claims 1 to 9, a color filter substrate disposed in a box-to-box relationship with the array substrate, and a liquid crystal layer disposed between the array substrate and the color filter substrate.
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| CN201920881237.3U CN210325797U (en) | 2019-06-11 | 2019-06-11 | Array substrate and display panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112750764A (en) * | 2020-12-30 | 2021-05-04 | 滁州惠科光电科技有限公司 | Array substrate manufacturing method, array substrate and display panel |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112750764A (en) * | 2020-12-30 | 2021-05-04 | 滁州惠科光电科技有限公司 | Array substrate manufacturing method, array substrate and display panel |
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