CN209652424U - The MPCVD device that a kind of pair of vacuum environment effectively seals - Google Patents
The MPCVD device that a kind of pair of vacuum environment effectively seals Download PDFInfo
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- CN209652424U CN209652424U CN201920360861.9U CN201920360861U CN209652424U CN 209652424 U CN209652424 U CN 209652424U CN 201920360861 U CN201920360861 U CN 201920360861U CN 209652424 U CN209652424 U CN 209652424U
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- bottom plate
- venthole
- reaction chamber
- vacuum
- mpcvd
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- 238000000259 microwave plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 24
- 239000010453 quartz Substances 0.000 claims description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 24
- 230000000740 bleeding effect Effects 0.000 claims description 7
- 238000005086 pumping Methods 0.000 claims description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract description 6
- 238000009776 industrial production Methods 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 10
- 239000010432 diamond Substances 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 9
- 238000007789 sealing Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
The utility model relates to microwave plasma CVD technical fields, specifically disclose the MPCVD device that a kind of pair of vacuum environment effectively seals, including upper cover plate, bottom plate and the reaction chamber surrounded by the two, it is sealed in the junction of bottom plate and upper cover plate by O-ring seal group, the first venthole is equipped on circumference corresponding with annular bleed passage on bottom plate, the upper end of first venthole is connect with annular bleed passage, and the lower end of the first venthole is connect by the first escape pipe with vacuum evacuation device.The utility model can be effectively isolated outside air, maintain vacuum working environment in reaction chamber, effectively reduce the vacuum leak rate of this type MPCVD equipment, it is final to realize that reaction chamber is effectively isolated with outside air, advantageous guarantee is provided for preparation high-quality product, microwave plasma CVD product quality is improved, scientific research and industrial production demand are met.
Description
Technical field
The utility model relates to microwave plasma CVD technical fields, specifically disclose a kind of pair of vacuum
The MPCVD device that environment effectively seals.
Background technique
Microwave plasma CVD (Microwave plasma chemical vapor deposition)
Abbreviation MPCVD, be it is a kind of by microwave generator generate microwave waveguide enter reaction chamber through isolator, in the excitation of microwave
Under, it ionizes the gas molecule in reaction chamber and generates plasma, deposition obtains diamond film on substrate.
The patent of invention of notification number CN103668121A discloses a kind of microwave plasma CVD device, packet
The reaction chamber being made of reaction cavity upper cover and reaction bench is included, is provided with the rectangular waveguide being connected and coaxial waveguide below reaction chamber
；The central axis of coaxial waveguide protrudes into reaction chamber, and the sample for placing substrate is fixedly and coaxially connected above central axis
Platform；The center of reaction cavity upper cover is provided with gas introduction port, and the neck of reaction cavity upper cover, which is also set up, is uniformly provided with multiple small air inlet holes
Horizontal baffle, gas buffer mixing chamber is formed between horizontal baffle and the top of reaction cavity upper cover, close to substrate on sample stage
Edge on the outside of be circumferentially evenly distributed and be provided with exhaust passage.The gas that the present invention solves in reaction chamber cannot be evenly distributed in
The problem of substrate perimeter.
The patent of invention of notification number CN101864560A discloses a kind of high power microwave plasma diamond film deposition
Equipment, the lower cylindrical body of upper cylindrical body, microwave cavity including microwave cavity, diamond film deposition platform, microwave reflection body,
Quartz window, plasma, regulating mechanism one and regulating mechanism two.Diamond film deposition platform, microwave reflection body in upper cylindrical body and
Inside lower cylindrical body, quartz window is in the lower section of diamond film deposition platform；Microwave reflection body is anti-by the adjusting microwave of regulating mechanism one
The height of beam, regulating mechanism two adjust the height of upper cylindrical body, and microwave reflection body plays reflection and humidification to microwave electric field.
Upper cylindrical body, lower cylindrical body, diamond film deposition platform, microwave reflection body, regulating mechanism one and regulating mechanism two can be realized directly
The water cooling connect.The invention has the advantages that can at high power, with the diamond film of higher rate deposition of high-quality, equipment has can
It leans on, facilitate the features such as adjusting.
Currently, all kinds of MPCVD devices, which generallys use quartz material as microwave window, obtains vacuum environment with this, and stone
English material is easily polluted by plasma etching and to the deposition process of diamond film.In existing public technology, including it is upper
It states shown in two documents, still cannot achieve effective sealing.
Specifically as shown in Figure 1, cricoid microwave quartz window 1 is placed in the lower section of deposition table 2, i.e. microwave quartz window 1 and deposition
Be completely isolated between the plasma of indoor formation, this measure solve for a long time there is MPCVD device stone
English window easily by plasma etching the problem of, existing MPCVD device is as shown in Figure 1, the upper cover plate 3 of cavity and the bottom of cavity
Plate 4 carries out vacuum sealing by O-ring 5, so that reaction chamber 6 be made to be isolated with outside air；Deposition table 2, microwave quartz window 1
Vacuum sealing is carried out by gasket 7 with bottom plate 4, reaction chamber 6 is isolated with outside air.
In the use process of equipment, equipment brings into operation the stage with the air pressure reduction in reaction chamber 6, the pressure of O-ring 5
Contracting amount will change from small to big, and the device end operation phase increases with the air pressure in reaction chamber 6, and the decrement of O-ring 5 will be by becoming greatly
It is small；It is larger (φ 400x5.3) additionally, due to 5 specification of O-ring herein, the easily leakage in use of O-ring 5 is eventually led to,
Outside air will enter in reaction chamber 6 from O-ring 5 (as shown in figure 1 shown in the direction a), reaction gas be polluted, to seriously reduce
Product quality.
The atmospheric pressure of 2 lower section of hypobaric and deposition table in the MPCVD device of microwave quartz window decentralization in reaction chamber 6
Environment exists compared with atm difference, and the presence of draught head causes deposition table 2 to will receive a upward pressure.This pressure causes gasket
7 decrement becomes smaller, and has an adverse effect to the sealing of microwave quartz window 1, and extraneous air is easy from the top of microwave quartz window 1
Portion and bottom enter reaction chamber 6 and pollute reaction gas (as shown in figure 1 the direction b and the direction c shown in), will eventually lead to this type
MPCVD equipment vacuum leak rate is larger, to seriously reduce product quality.
Utility model content
The utility model for overcome the deficiencies in the prior art, provides the MPCVD dress that a kind of pair of vacuum environment effectively seals
It sets.
In order to solve the above technical problems, the utility model adopts the following technical solution: a kind of pair of vacuum environment effectively seals
MPCVD device air inlet, In are provided at the top of upper cover plate including upper cover plate, bottom plate and the reaction chamber surrounded by the two
Bleeding point is provided on bottom plate, the bleeding point accesses vacuum evacuation device, by reaction chamber vacuum pumping environment；It further include deposition table
With microwave quartz window, microwave quartz window be circular ring shape, be set between deposition table and bottom plate, by microwave quartz window by reaction chamber with
Outside air isolation, is sealed in the junction of bottom plate and upper cover plate by O-ring seal group, the O-ring seal group packet
The exterior seal ring and inner seal ring in concentric circles setting are included, the O-ring seal is mounted in the first seal groove on bottom plate, and two
It encloses between the first seal groove and is connected by annular bleed passage, is equipped on circumference corresponding with annular bleed passage on bottom plate
First venthole, the upper end of first venthole are connect with annular bleed passage, the lower end of the first venthole and the first outlet
Pipe connection, the first escape pipe lower part is connect with vacuum evacuation device.
Preferably, multiple first ventholes are equipped on circumference corresponding with annular bleed passage on bottom plate.
Preferably, the number of first venthole is no less than four.
Preferably, the internal diameter of first venthole is 4-6mm.
Preferably, first venthole is arranged along the vertical direction.
The beneficial effects of the utility model are: the utility model discloses the MPCVD that a kind of pair of vacuum environment effectively seals
Device can be effectively isolated outside air, maintain vacuum working environment in reaction chamber, effectively reduce this type MPCVD equipment
Vacuum leak rate, it is final to realize that reaction chamber is effectively isolated with outside air, provide advantageous guarantee to prepare high-quality product, mention
High microwave plasma CVD product quality, meets scientific research and industrial production demand.
Detailed description of the invention
Fig. 1 is the longitudinal section view of MPCVD device in the prior art；
Fig. 2 is the longitudinal section view of the utility model；
Fig. 3 is detail drawing A in Fig. 2；
Fig. 4 is detail drawing B in Fig. 2；
Fig. 5 is the top view of microwave quartz window in Fig. 1；
Fig. 6 is the stereochemical structure cross-sectional view of microwave quartz window.
Specific embodiment
It elaborates below in conjunction with attached drawing to specific embodiment of the present utility model.
As shown in Figures 2 to 4, the MPCVD device that a kind of pair of vacuum environment effectively seals, including upper cover plate 3, bottom plate 4 and
The reaction chamber 6 surrounded by the two is provided with air inlet 31 at the top of upper cover plate 3, the process gas for diamond film preparation
Into in reaction chamber 6, bleeding point 32 is provided on bottom plate 4, the bleeding point 32 accesses vacuum evacuation device, reaction chamber 6 is taken out
For vacuum environment.
It is sealed in bottom plate 4 and the junction of upper cover plate 3 by O-ring seal group 5, the O-ring seal group 5 includes
In exterior seal ring 51 and inner seal ring 52 that concentric circles is arranged, the O-ring seal group 5 is set to the first seal groove on bottom plate 4
It is interior, it is connected between two the first seal grooves of circle by annular bleed passage, the circumference corresponding with annular bleed passage on bottom plate 4
It is equipped with no less than four the first ventholes 41, first venthole 41 to be arranged along the vertical direction, first venthole 41
Internal diameter be 6-8mm, the upper end of first venthole 41 is connect with annular bleed passage, the lower end of the first venthole 41 and the
The connection of one escape pipe 42,42 lower part of the first escape pipe is connect with vacuum evacuation device.
The present apparatus further includes deposition table 2 and microwave quartz window 1, and the microwave quartz window 1 is circular ring shape, is set to deposition table 2
Between bottom plate 4, reaction chamber 6 is isolated with outside air by microwave quartz window 1, why selects quartz window, is because should
Material can the lesser transmitting for hindering microwave, the use of quartz is only optimal one of solution, other can also be used
Material with the same function, in addition to this, quartz window sealed connection can also play isolation atmosphere, maintain low gas in reaction chamber
Press the effect of working environment.
The top and bottom of the microwave quartz window 1 are connected with deposition table 2 and the sealing of bottom plate 4 respectively by gasket seal group 7
It connects, the second seal groove is equipped in deposition table 2 and bottom plate 4, the gasket seal group 7 is set in the second seal groove, the sealing
Gasket group 7 includes outer ring gasket seal 71 and inner ring gasket seal 72, is equipped between outer ring gasket seal 71 and inner ring gasket seal 7
The discouraged gap 73 of circular ring shape, around circumferential uniformly distributed multiple second ventholes on microwave quartz window 1 corresponding with discouraged gap 73
11, second venthole 11 runs through connection along the axial setting of microwave quartz window 1, by the top and bottom of microwave quartz window 1, the
Two ventholes 11 are connect with the discouraged gap 73 of top and bottom respectively；As shown in Figure 5 and Figure 6, on microwave quartz window 1
Two ventholes, 11 place circumference is equipped with annular groove 12, and the annular groove 12 is corresponding with discouraged gap 73 and is connected to, described
The number of second venthole 11 is no less than four, and the internal diameter of second venthole 11 is 4-6mm, guarantees to enter the second venthole
11 air can be quickly extracted.
The first escape pipe 42 and the second escape pipe 44 access vacuum evacuation device in chemical vapor deposition processes, to its into
Row vacuumize process, pressure control is to more slightly lower than reaction chamber 6.
One or more third ventholes 43, the discouraged gap 73 of 43 upper end of third venthole and bottom are equipped on bottom plate
Connection, 43 lower end of third venthole connect with the second escape pipe 44, the first escape pipe 42 and the second escape pipe 44 with vacuumize
Device connection.
Process gas enters reaction chamber 6 by air inlet 31, and vacuum evacuation device take out to reaction chamber 6 true by bleeding point 32
Sky, air pressure in real-time control reaction chamber 6 open microwave power supply, microwave successively passes through square after air pressure reaches setting value in reaction chamber 6
After shape waveguide, 2 lower part of deposition table, microwave quartz window 1, finally enter in reaction chamber 6, microwave is at the chip bench in deposition table 2
It focuses, hypobaric process gas is plasmarized, carry out the growth of chemical vapor deposition.
When outside air enters reaction chamber along the direction a, the first sealing ring 51 is first passed through, is led to when air is lost heart by annular
When road, air prevents outside air from entering by being evacuated device extraction after the first venthole 41 and the first escape pipe 42
Inside reaction chamber 6.
When equipment works normally, the outside of outer ring gasket seal 71 is vacuum environment, the inside of inner ring gasket seal 72
For atmospheric environment, pressure is much larger than the environment in vacuum reaction chamber 6.It is empty after outside air enters from 2 lower cavity of deposition table
Intracavitary air pressure increases, and will drive deposition table 2 has upward power, causes the decrement of gasket seal group 7 to become smaller, to influence to seal
Sealing effect at gasket group 7 enters a little air in reaction chamber 6 along the direction c, and a little air first passes through outer ring gasket seal
71, subsequent air is by being evacuated device after lose heart gap 73, annular groove 12, third venthole 43 and the second escape pipe 44
Extraction；When air enters reaction chamber 6 along the direction b, outer ring gasket seal 71 is first passed through, air is passed sequentially through along the direction d and let out
After gas gap 73, annular groove 12,11 third venthole 43 of the second venthole and the second escape pipe 44 and after third venthole 43
It is evacuated device extraction.
The utility model discloses the MPCVD devices that a kind of pair of vacuum environment effectively seals, and can be effectively isolated outside air,
Maintain vacuum working environment in reaction chamber, effectively reduce the vacuum leak rate of this type MPCVD equipment, it is final realize reaction chamber with
Outside air is effectively isolated, and provides advantageous guarantee for preparation high-quality product, it is heavy to improve microwave plasma chemical gas phase
Product product quality, meets scientific research and industrial production demand.
Basic principles, main features, and advantages of the present invention has been shown and described above.Current row
The technical staff of industry is described in above embodiments and description it should be appreciated that the present utility model is not limited to the above embodiments
Only illustrate the principles of the present invention, the utility model can also on the premise of not departing from the spirit and scope of the utility model
There are various changes and modifications, these changes and improvements are both fallen within the scope of claimed utility model.The requires of the utility model
Protection scope is defined by appended claims and equivalent.
In the description of the present invention, it should be understood that term "front", "rear", "left", "right", "center" etc. refer to
The orientation or positional relationship shown is to be based on the orientation or positional relationship shown in the drawings, and is only the utility model and letter for ease of description
Change description, rather than indicate or imply signified device or element must have a particular orientation, for specific orientation construction and
Operation, thus should not be understood as the limitation that content is protected to the utility model.
Claims (5)
1. the MPCVD device that a kind of pair of vacuum environment effectively seals, including upper cover plate, bottom plate and the reaction chamber surrounded by the two,
It is provided with air inlet at the top of upper cover plate, bleeding point is provided on bottom plate, the bleeding point accesses vacuum evacuation device, will be anti-
Answer chamber vacuum pumping environment；It further include deposition table and microwave quartz window, microwave quartz window is circular ring shape, is set to deposition table and bottom plate
Between, reaction chamber is isolated with outside air by microwave quartz window, which is characterized in that logical in the junction of bottom plate and upper cover plate
It crosses O-ring seal group to be sealed, the O-ring seal group includes in the exterior seal ring and inner seal ring of concentric circles setting, institute
It states in the first seal groove that O-ring seal is mounted on bottom plate, is connected between two the first seal grooves of circle by annular bleed passage,
The first venthole, the upper end of first venthole and annular are equipped on circumference corresponding with annular bleed passage on bottom plate
Bleed passage connection, the lower end of the first venthole are connect with the first escape pipe, and the first escape pipe lower part is connect with vacuum evacuation device.
2. the MPCVD device according to claim 1 effectively sealed to vacuum environment, which is characterized in that on bottom plate with
The corresponding circumference of annular bleed passage is equipped with multiple first ventholes.
3. the MPCVD device according to claim 2 effectively sealed to vacuum environment, which is characterized in that described first is logical
The number of stomata is no less than four.
4. the MPCVD device according to claim 3 effectively sealed to vacuum environment, which is characterized in that described first is logical
The internal diameter of stomata is 6-8mm.
5. the MPCVD device according to any one of claims 1 to 4 effectively sealed to vacuum environment, which is characterized in that institute
The first venthole is stated to be arranged along the vertical direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920360861.9U CN209652424U (en) | 2019-03-21 | 2019-03-21 | The MPCVD device that a kind of pair of vacuum environment effectively seals |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920360861.9U CN209652424U (en) | 2019-03-21 | 2019-03-21 | The MPCVD device that a kind of pair of vacuum environment effectively seals |
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| Publication Number | Publication Date |
|---|---|
| CN209652424U true CN209652424U (en) | 2019-11-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920360861.9U Active CN209652424U (en) | 2019-03-21 | 2019-03-21 | The MPCVD device that a kind of pair of vacuum environment effectively seals |
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| CN (1) | CN209652424U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112760617A (en) * | 2020-12-30 | 2021-05-07 | 上海埃原半导体设备有限公司 | Non-metal reaction chamber for chemical vapor deposition and use method thereof |
| CN113035680A (en) * | 2019-12-24 | 2021-06-25 | 中微半导体设备(上海)股份有限公司 | Leveling mechanism for vacuum equipment and plasma processing device |
-
2019
- 2019-03-21 CN CN201920360861.9U patent/CN209652424U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113035680A (en) * | 2019-12-24 | 2021-06-25 | 中微半导体设备(上海)股份有限公司 | Leveling mechanism for vacuum equipment and plasma processing device |
| CN112760617A (en) * | 2020-12-30 | 2021-05-07 | 上海埃原半导体设备有限公司 | Non-metal reaction chamber for chemical vapor deposition and use method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20231206 Address after: 450000, Building 9, Qidi Zhengdong Science and Technology City (Qichuangyuan), Longhu Zhonghuan North Road, Zhengdong New District, Zhengzhou City, Henan Province, China Patentee after: Jinggong Ruiyi Technology (Henan) Co.,Ltd. Address before: 450001 121 Wutong street, Zhengzhou new and high tech Zone, Henan Patentee before: ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING Co.,Ltd. |
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| TR01 | Transfer of patent right |