CN209606770U - Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus - Google Patents
Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus Download PDFInfo
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- CN209606770U CN209606770U CN201920382891.XU CN201920382891U CN209606770U CN 209606770 U CN209606770 U CN 209606770U CN 201920382891 U CN201920382891 U CN 201920382891U CN 209606770 U CN209606770 U CN 209606770U
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Abstract
The utility model relates to direct-write photoetching exposure sources to position motion platform orthogonality debugging apparatus, belong to direct-write photoetching exposure technique field.The debugging apparatus includes support base, precision positioning motion platform, debugging mechanism, support frame and ccd image acquisition system.Precision positioning motion platform includes Y-axis, X-axis and Z axis；Vacuum chuck is installed at the top of Z axis；Absorption has the high-precision calibrating plate of Mark point above vacuum chuck.Debugging mechanism includes being mounted on liftable Mobile Slide in support base, debugging connecting bottom board, shifting sledge and the shifting sledge shifting sledge kinematic nest being slidably matched and the amesdial being fixed in shifting sledge kinematic nest.The utility model first uses ccd image acquisition system to measure the orthogonality of X-axis and Y-axis, then using the orthogonality of debugging mechanism debugging X-axis and Y-axis.The utility model can be improved the efficiency and accuracy of direct-write photoetching exposure sources precision positioning motion platform orthogonality debugging, reduce debugging cost.
Description
Technical field
The utility model relates to direct-write photoetching exposure technique fields, and in particular to a kind of direct-write photoetching exposure sources positioning fortune
Moving platform orthogonality debugging apparatus.
Background technique
Direct-write photoetching technology is to print the figure with feature on the surface of a substrate using laser.Such substrate is applied to
The fields such as PCB circuit board, semiconductor devices, flat-panel monitor, biochip, encapsulation, microelectronic chip.Direct write light on substrate
Carving lithography process is: substrate being placed on the vacuum chuck of precision positioning motion platform, using vacuum suction, is set by photoetching
Exposure device in standby, projects substrate surface for the pattern image of design, in order to guarantee to expose figure on substrate and reason
It is consistent by figure, it is necessary to keep precision positioning motion platform motion profile accurate, it is desirable that there is preferable orthogonality, can just make
Theoretical exposure position is consistent with the position of actual exposure.
The orthogonality of precision positioning motion platform is an important indicator of measurement precision positioning motion platform identity, and
Influence an important indicator of direct-write photoetching exposure sources exposure performance.It depends primarily on following factor: positioning movement
What the resolution ratio of grating scale and thermal expansion coefficient, multiaxis assembling generated in the accurate grade of platform rail, feedback system comprehensive misses
Difference etc..The superiority and inferiority of precision positioning motion platform orthogonality will affect splicing in exposure process, the deformation of exposure figure, further shadow
Ring the alignment of exposure figure outer layer and internal layer alignment precision.
Traditional direct-write photoetching exposure sources precision positioning motion platform orthogonality adjustment method is mainly dry using laser
The squareness measurement module of interferometer measures the quadrature value of XY axis integrated platform plane different location along the direction that axis is run,
Then need length that can cover the reflecting mirror of XY axis stroke, cost further increases, and the method is expensive, tests environmental requirement pole
Height, and assembly and adjustment process is complicated.In view of the disadvantages mentioned above of the prior art, the technical issues of the utility model is solved, is: mentioning
The debugging side of simple, efficient and lower-cost direct-write photoetching exposure sources precision positioning motion platform orthogonality for a kind of adjustment
Method, can effectively improve the verticality of precision positioning motion platform XY axis, to increase substantially direct-write photoetching exposure sources
Exposure figure correctness.
Utility model content
The purpose of this utility model is to provide a kind of direct-write photoetching exposure sources positioning motion platform orthogonality debugging dresses
It sets, which can effectively calibrate the orthogonality of direct-write photoetching exposure sources precision positioning motion platform, expose direct-write photoetching
Equipment reduces the generation of splicing dislocation, outer layer alignment and the excessive phenomenon of internal layer alignment error in exposure process.
To achieve the above object, the utility model uses following technical scheme:
Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus, including support base, be mounted on support bottom
Precision positioning motion platform on seat, the debugging mechanism being mounted in support base, the support frame being mounted in support base and
The ccd image acquisition system of installation on the support frame.
The precision positioning motion platform includes the Y-axis, X-axis and Z axis set gradually from bottom to top；The top of the Z axis
Vacuum chuck is installed, the high-precision calibrating plate of Mark point is had on vacuum chuck, the high-precision calibrating plate is high-accuracy exposure
Prepared by ray machine, the Mark point on high-precision calibrating plate is regularly arranged arrangement.
The debugging mechanism includes the liftable Mobile Slide being mounted in support base, is mounted at the top of Mobile Slide
Debugging connecting bottom board, the shifting sledge being mounted on debugging connecting bottom board, the shifting sledge that is slidably matched with shifting sledge transport
Dynamic seat and the amesdial being fixed in shifting sledge kinematic nest.
Further, the support base and support frame are all made of granite and marble material.
Further, the ccd image acquisition system includes the CCD1 image capturing system being sequentially arranged on support frame
With CCD2 image capturing system；The CCD1 image capturing system is what direct-write photoetching exposure sources carried.
Further, the Mark point on the high-precision calibrating plate is several evenly arranged filled circles Mark points；It is adjacent
The spacing of filled circles Mark point in the X-axis direction is set as a, and spacing in the Y-axis direction is set as b.
Further, the CCD2 image capturing system is mounted on CCD2 bracket, and the CCD2 bracket passes through fixed branch
Frame is installed on the support frame；The waist-shaped hole for adjusting CCD2 image capturing system Y-axis position is offered on the fixed bracket.
Further, the X-axis is connected in Y-axis by several screws.
From the above technical scheme, the utility model first uses ccd image acquisition system to the orthogonality of X-axis and Y-axis
It measures, then using the orthogonality of debugging mechanism debugging X-axis and Y-axis, until the orthogonality of the two meets the requirements.This is practical new
Type can effectively calibrate the orthogonality of direct-write photoetching exposure sources precision positioning motion platform, expose direct-write photoetching exposure sources
The generation that splicing dislocation, outer layer alignment and the excessive phenomenon of internal layer alignment error are reduced in photoreduction process, is direct-write photoetching exposure sources
An indispensable step in debugging process.The utility model can be improved direct-write photoetching exposure sources precision positioning motion platform just
The efficiency and accuracy of the property handed over debugging, reduce debugging cost.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of debugging apparatus in the utility model；
Fig. 2 is the structural schematic diagram of high-precision calibrating plate in the utility model；
Fig. 3 is CCD2 image capturing system and CCD2 bracket, support bracket fastened structural schematic diagram in the utility model；
Fig. 4 is the main view of debugging mechanism in the utility model；
Fig. 5 is the top view of debugging mechanism in the utility model；
Fig. 6 is the structural relation schematic diagram of X-axis, Y-axis and screw in the utility model operating process；
Fig. 7 is the schematic diagram for the triangle cosine function that formula (1) indicates；
Fig. 8 is the schematic diagram for the triangle tangent function that formula (3) indicate.
Wherein:
1, support base, 2, support frame, 3, Y-axis, 4, X-axis, 5, Z axis, 6, vacuum chuck, 7, high-precision calibrating plate, 8, shifting
Dynamic slide unit, 9, fixed bracket, 10, CCD1 image capturing system, 11, amesdial, 12, shifting sledge, 13, shifting sledge movement
Seat, 14, CCD2 bracket, 15, CCD2 image capturing system, 16, filled circles Mark point, 17, handwheel, 18, screw, 19, debugging company
Connect bottom plate.
Specific embodiment
The utility model is described further with reference to the accompanying drawing:
Direct-write photoetching exposure sources positioning motion platform orthogonality debugging apparatus as shown in Figure 1, including support base 1,
The precision positioning motion platform that is mounted in support base 1, the debugging mechanism being mounted in support base 1 are mounted on support bottom
Support frame 2 on seat 1 and the ccd image acquisition system that is mounted on support frame 2.
The precision positioning motion platform includes the Y-axis 3, X-axis 4 and Z axis 5 set gradually from bottom to top.Precision positioning fortune
The structure construction of moving platform is identical with the structure of precision positioning motion platform that direct-write photoetching exposure sources in the prior art use.
The top of the Z axis 5, which is set, is equipped with vacuum chuck 6；High-precision calibrating plate 7 is placed with above the vacuum chuck 6.Vacuum chuck
It is that direct-write photoetching exposure sources are included.The high-precision calibrating plate 7 is that high-accuracy exposure mechanism is standby, on high-precision calibrating plate 7
Mark point be regularly arranged arrangement；Mark point on the high-precision calibrating plate 7 is several evenly arranged filled circles Mark
Point 16, the spacing of neighboring solid circle Mark point 16 in the X-axis direction are set as a, and spacing in the Y-axis direction is set as b.This is practical new
The point of Mark described in type indicates label.
As shown in Figure 4 and Figure 5, the debugging mechanism includes being mounted on liftable Mobile Slide 8 in support base, installation
The top of Mobile Slide 8 debugging connecting bottom board, be mounted on debugging connecting bottom board shifting sledge 12, with the cunning of shifting sledge 12
The shifting sledge kinematic nest 13 of dynamic cooperation and the amesdial 11 being fixed in shifting sledge kinematic nest 13.Pacify on Mobile Slide 8
Equipped with handwheel 17, handwheel 17 is used to adjust the height of Mobile Slide.The realization of Mobile Slide lifting uses liter in the prior art
Structure drops.The adjustment of length in z-direction may be implemented by liftable Mobile Slide 8 in the debugging mechanism；Pass through
The shifting sledge 12 and shifting sledge kinematic nest 13 being slidably matched, may be implemented the tune of position of the amesdial 11 on 4 direction of X-axis
It is whole.The adjustable precision positioning motion platform different length of the debugging mechanism, different types precision positioning motion platform X-axis and
The quadrature value of Y-axis.The debugging mechanism is located at the periphery of precision positioning motion platform, passes through the lateral and vertical shifting of debugging mechanism
It is dynamic, can debug different range, different types precision positioning motion platform orthogonality.In debugging precision positioning motion platform
Orthogonality when, Y direction is calculated according to triangle cosine function and triangle tangent function and needs the numerical value that deviates, is used
Amesdial debugs the installation site of precision positioning motion platform X-axis, and adjustment method is simple and efficient.
Further, the support base 1 and support frame 2 are all made of granite and marble material, it is preferred that using
High-precision marble granite material.Marble stability is preferable, is influenced by temperature change small.
Further, the ccd image acquisition system includes the CCD1 image capturing system being sequentially arranged on support frame
With CCD2 image capturing system；The CCD1 image capturing system is what direct-write photoetching exposure sources carried.Described image acquisition
System is to be automatically moved to the Mark point in CCD visual field using images match method in the prior art and image processing algorithm
The center of CCD visual field, measurement accuracy is high, and trueness error is less than 0.5 μm.The utility model does not use only direct-write photoetching exposure
The included CCD1 image capturing system of light device, is also additionally provided with a CCD2 image capturing system, can increase tune in this way
Range is tried, Image Acquisition blind area is avoided.Since high-accuracy calibration board size is limited and vacuum chuck size is limited, an image is adopted
Collecting system is difficult to measure the quadrature value of Y direction different location.Two ccd images are arranged in the Y-axis direction and adopt for the utility model
Collecting system can measure the quadrature value of Y-axis total travel and X-axis.The size that X-direction requires in this example, an Image Acquisition
System can cover, and from existing in X-direction, there are two image capturing systems side by side in direct-write photoetching equipment.
Further, as shown in Fig. 2, the high-precision calibrating plate 7 is equipped with several evenly arranged filled circles Mark points
16；The spacing of neighboring solid circle in the X-axis direction is set as a, and spacing in the Y-axis direction is set as b.High-precision calibrating plate is quartz
Substrate or silicon base, filled circles Mark point thereon are the figures after being exposed as high-precision exposure machine obtained by etching, after etching
Deformation and the equal very little of scaling, the trueness error of filled circles Mark point any distance is less than 0.1 μm.It is regular on high-accuracy scaling board
The filled circles Mark point of arrangement is the image for the identification of ccd image acquisition system, due to being that in high precision, can be used as measurement base
It is quasi-.
Further, as shown in figure 3, the CCD2 image capturing system 15 is mounted on CCD2 bracket 14, the CCD2
Bracket 14 passes through fixed bracket 9 and is mounted on support frame 2；It offers on the fixed bracket 9 for adjusting CCD2 Image Acquisition
The waist-shaped hole of system Y-axis position.
Further, as shown in fig. 6, the X-axis 4 is connected in Y-axis 3 by several screws 18.
The debugging process of direct-write photoetching exposure sources positioning motion platform orthogonality debugging apparatus described in the utility model
Are as follows:
(1) mobile high-precision calibrating plate, make the orientation of filled circles Mark point thereon and precision positioning motion platform X and
The moving direction of Y-axis is consistent.
(2) Z axis of mobile precision positioning motion platform, and ccd image acquisition system is debugged, find high-precision calibrating plate
Accurate focal plane.
(3) by the X-axis of precision positioning motion platform and Y-axis return-to-zero, with the quadrature value of surveyed X-axis and Y-axis dead-center position
As debugging benchmark.
(4) X-axis and Y-axis of mobile precision positioning motion platform, chooses one filled circles Mark point of high-precision calibrating plate, if
For Mark1 point, Mark1 point is moved to ccd image acquisition system field of view center, records the coordinate of precision movement platform at this time
Point (x1, y1)。
(5) mobile precision positioning motion platform Y-axis, moving distance are the integral multiple of b or b, are chosen on high-precision calibrating plate
One filled circles Mark point, is set as Mark2 point, and Mark2 point is moved to ccd image acquisition system field of view center, is recorded at this time
Coordinate points (the x of precision movement platform2, y2)。
(6) precisely locating platform coordinate points (x is returned to1, y1), mobile precision positioning motion platform X-axis, moving distance be a or
The integral multiple of a, and ccd image acquisition system is used, a filled circles Mark point on high-precision calibrating plate is chosen, Mark3 is set as
Mark3 point is moved to ccd image acquisition system field of view center, records the coordinate points (x of precision movement platform at this time by point3, y3)。
(7) coordinate points (x obtained according to measurement1, y1)、(x2, y2)、(x3, y3), using formula (1) and formula (2), calculate
The quadrature value α of precision positioning motion platform X-axis and Y-axis；
(8) spacing of the screw of connection precision positioning motion platform X-axis and Y-axis is set as L, and acquiring using formula (3) need to be orthogonal
It is worth the deviation m of debugging:
M=Ltan α (3)
(9) the deviation m acquired according to step (8), using debugging mechanism, first liftable shifting in adjusting support base
Dynamic slide unit 8, is moved to required position, then moves the amesdial 11 being fixed in shifting sledge kinematic nest 13, by thousand points
Along one end that the spacing that shifting sledge 12 is moved to screw is L, amesdial 11 refers in precisely locating platform X-axis 4 table 11, unclamps
Precision positioning motion platform X and several fastening screws of Y-axis, finally by the m distance that formula (3) calculate, debugging precision positioning fortune
Moving platform X axis Y direction deviates m distance, after process to be debugged is completed, then will connection precision positioning motion platform X-axis and Y
The screw of axis is locked.
(10) step (3) to step (7) are repeated, calculates the quadrature value α of precision positioning motion platform X-axis and Y-axis again；
If the quadrature value α of precision positioning motion platform X-axis measured by step (10) and Y-axis not within the scope of the orthogonality threshold of setting,
Step (8)-(9) are then repeated, until orthogonal threshold of the quadrature value α of measured precision positioning motion platform X-axis and Y-axis in setting
It is worth in range.
The working principle of the utility model are as follows:
Vacuum chuck is installed on surveyed direct-write photoetching exposure sources precision positioning motion platform, is adsorbed on vacuum chuck
High-precision calibrating plate with regularly arranged filled circles Mark point is schemed by the CCD1 of direct-write photoetching exposure sources itself institute band
As acquisition system and additionally mounted CCD2 image capturing system, the coordinate of precision positioning motion platform X-axis and Y-axis is measured
Point calculates the angle of precision positioning motion platform X-axis and Y-axis, then by debugging mechanism, can be transferred to direct-write photoetching exposure sources
The high-precision quadrature value of precision positioning motion platform.The utility model can be surveyed by ccd image acquisition system and debugging mechanism
The quadrature value of precision positioning motion platform total travel is measured, is compensated into direct-write photoetching exposure sources measuring system, is reduced accurate
Influence of the motion platform orthogonality to direct-write photoetching exposure sources exposure performance is positioned, exposure accuracy is improved.It is generated after measurement
File has fixed format, can be read by direct-write photoetching exposure sources exposure system, carries out interpolation algorithm benefit by exposure system
It repays, for improving the orthogonality of precision positioning motion platform X-axis and Y-axis different location.The utility model is suitable for direct-write photoetching
Technology or the other technologies field for using precisely locating platform, it is more at low cost and easy than traditional laser interferometer debugging orthogonality
Operation, high-precision calibrating plate described in the utility model and ccd image acquisition system, measurement accuracy is high, and error is less than 0.5um,
Direct-write photoetching exposure sources precision positioning motion platform orthogonality can effectively be assessed.The utility model can measure direct-write photoetching
The platform of exposure sources X&Y axial cross crossover-platform, X&Y&Z three-axis platform or gantry structure, with X&Y&Z tri- in the present embodiment
For shaft platform.
Embodiment described above is only that preferred embodiments of the present invention are described, not practical new to this
The range of type is defined, and under the premise of not departing from the spirit of the design of the utility model, those of ordinary skill in the art are to this reality
The various changes and improvements made with novel technical solution should all fall into the protection model that the utility model claims book determines
In enclosing.
Claims (6)
1. direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus, it is characterised in that: including support base, installation
Precision positioning motion platform in support base, is mounted in support base the debugging mechanism being mounted in support base
The ccd image acquisition system of support frame and installation on the support frame；
The precision positioning motion platform includes the Y-axis, X-axis and Z axis set gradually from bottom to top；It installs at the top of the Z axis
There is vacuum chuck, absorption has the high-precision calibrating plate of Mark point on vacuum chuck；
The debugging mechanism includes being mounted on liftable Mobile Slide in support base, the debugging being mounted at the top of Mobile Slide
Connecting bottom board, the shifting sledge being mounted on debugging connecting bottom board, the shifting sledge kinematic nest being slidably matched with shifting sledge with
And it is fixed on the amesdial in shifting sledge kinematic nest.
2. direct-write photoetching exposure sources according to claim 1 position motion platform orthogonality debugging apparatus, feature exists
In: the support base and support frame are all made of granite and marble material.
3. direct-write photoetching exposure sources according to claim 1 position motion platform orthogonality debugging apparatus, feature exists
In: the ccd image acquisition system includes the CCD1 image capturing system being sequentially arranged on support frame and CCD2 Image Acquisition
System；The CCD1 image capturing system is what direct-write photoetching exposure sources carried.
4. direct-write photoetching exposure sources according to claim 1 position motion platform orthogonality debugging apparatus, feature exists
In: the high-precision calibrating plate is that high-accuracy exposure mechanism is standby, and the Mark point on high-precision calibrating plate is regularly arranged arrangement；Institute
Stating the Mark point on high-precision calibrating plate is several evenly arranged filled circles Mark points, and neighboring solid circle Mark point is in X-axis side
Upward spacing is set as a, and spacing in the Y-axis direction is set as b.
5. direct-write photoetching exposure sources according to claim 3 position motion platform orthogonality debugging apparatus, feature exists
In: the CCD2 image capturing system is mounted on CCD2 bracket, and the CCD2 bracket is mounted on support frame by fixed bracket
On；The waist-shaped hole for adjusting CCD2 image capturing system Y-axis position is offered on the fixed bracket.
6. direct-write photoetching exposure sources according to claim 1 position motion platform orthogonality debugging apparatus, feature exists
In: the X-axis is connected in Y-axis by several screws.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920382891.XU CN209606770U (en) | 2019-03-25 | 2019-03-25 | Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus |
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| CN201920382891.XU CN209606770U (en) | 2019-03-25 | 2019-03-25 | Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109856926A (en) * | 2019-03-25 | 2019-06-07 | 合肥芯碁微电子装备有限公司 | Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus and method |
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2019
- 2019-03-25 CN CN201920382891.XU patent/CN209606770U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109856926A (en) * | 2019-03-25 | 2019-06-07 | 合肥芯碁微电子装备有限公司 | Direct-write photoetching exposure sources position motion platform orthogonality debugging apparatus and method |
| CN109856926B (en) * | 2019-03-25 | 2024-04-09 | 合肥芯碁微电子装备股份有限公司 | Orthogonalization debugging device and method for positioning motion platform of direct-writing lithography exposure equipment |
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Address after: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee after: Hefei Xinqi microelectronics equipment Co., Ltd Address before: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee before: HEFEI XINQI MICROELECTRONIC EQUIPMENT CO., LTD. |