CN209412302U - A kind of vacuum coating system of the compound PVD of vertical PECVD - Google Patents
A kind of vacuum coating system of the compound PVD of vertical PECVD Download PDFInfo
- Publication number
- CN209412302U CN209412302U CN201821683385.6U CN201821683385U CN209412302U CN 209412302 U CN209412302 U CN 209412302U CN 201821683385 U CN201821683385 U CN 201821683385U CN 209412302 U CN209412302 U CN 209412302U
- Authority
- CN
- China
- Prior art keywords
- pvd
- cavity
- pecvd
- chamber
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses the vacuum coating systems of vertical compound PVD of PECVD a kind of, including successively close-connected feed cavity, preheating cavity, plate membrane cavity, cushion chamber and discharging chamber, feed cavity and discharging chamber are in atmospheric environment, preheating cavity, plating membrane cavity be gentle to rush chamber and is respectively connected with vacuum-pumping system, track is welded at the top of plating membrane cavity, substrate frame is socketed in track, by hanging with substrate on substrate frame, the bottom of substrate is located on conveyer belt, and conveyer belt is connected to the bottom of plating membrane cavity by live roller.It solves the problems, such as under the uniformity difference and ionization level of the plated film of coating apparatus existing in the prior art.
Description
Technical field
The utility model belongs to coating apparatus technical field, is related to the Vacuum Deposition membrane system of vertical compound PVD of PECVD a kind of
System.
Background technique
Application No. is the patent documents of CN107541713A to disclose one kind " class diamond film continuous type coating apparatus ", should
Device includes into frame room, the first vacuum transition chamber, magnetron sputtering technique room, gas isolating room, DLC coating chamber, the second vacuum
Transition chamber and out frame room.When the device prepares film, one layer of transition zone is plated first in process chamber, is sent to plated film later
Continue plated film in room.The plated film mode of coating chamber is reaction class magnetron sputtering.But there are some for the design of the device coating chamber
Problem, such as working gas are passed through from the bottom side of cavity, will cause the uniformity that gas is distributed in cavity in this way
Poor, the uniformity so as to cause film plated on substrate is poor.In addition, the vacuum hole of the extraction vacuum of this device, is position
One side position of level of coating film area in cavity, the cross direction profiles that this will cause ion are uneven, and will lead to ion
Cross-flow velocity is too fast, slow so as to cause the deposition velocity of film, and the ionization level of process gas is also relatively low.
Summary of the invention
The utility model aim is: providing the vacuum coating system of vertical compound PVD of PECVD a kind of, solves existing
Problem under the uniformity difference and ionization level of the plated film of coating apparatus present in technology.
The technical solution of the utility model is: a kind of vacuum coating system of the vertical compound PVD of PECVD, including successively
Close-connected feed cavity, preheating cavity, plating membrane cavity, cushion chamber and discharging chamber, feed cavity and discharging chamber are in atmospheric environment, in advance
Hot chamber, plating membrane cavity be gentle to rush chamber and is respectively connected with vacuum-pumping system, plates and is welded with track at the top of membrane cavity, is socketed with base in track
Material frame, by hanging with substrate on substrate frame, the bottom of substrate is located on conveyer belt, and conveyer belt is connected to by live roller
Plate the bottom of membrane cavity.
The utility model is also characterized by
Plated film is intracavitary to be provided with PVD magnetic control sputtering device, gas release device and PECVD device, PVD magnetic control sputtering device
Including PVD target material, PVD target material is parallel to each other with substrate, and PVD target material is fixed on the inner wall of the chamber door of plating membrane cavity by insulator
On, the tail end of insulator passes through chamber door and extends to outside plating membrane cavity, it is provided with anode cap outside PVD target material and insulator, anode cap
Bottom is fixed on the inner wall of chamber door, and target hole is offered at the top of anode cap, is inlayed in insulator positioned at the side of PVD target material
There is magnet, magnet is connected with cathode, cathode connection electrode far from the side of PVD target material；Gas release device includes that two rows can lead to
Enter the tracheae of working gas, wherein an exhaust pipe, close to substrate, another exhaust pipe is uniformly provided on PVD target material, tracheae
Venthole, the venthole on two exhaust pipes is opposite and sets；The PECVD device includes radio-frequency coil, and radio-frequency coil is centered around gas
Radio-frequency power supply is stretched out at the top of the cavity of plating membrane cavity and is connected at the outside of pipe, the both ends of radio-frequency coil, the radio-frequency coil it is interior
Outer chamber is connected by molecular pump.
Knob is fixedly connected on the outside of chamber door.
Insulator is C class B insulation body.
Tracheae is provided with two rows, every row 4 ~ 8.
Track and conveyer belt are through all cavitys.
Hook is provided with two or more.
The utility model has the advantages that:
1. a kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model, may be implemented high power, quickly
Deposition film.There can be multiple plating membrane cavities to realize an inline process, plate multilayer variety classes film: be passed through by changing
The type of gas changes the type of target, Lai Shixian.And whole process carries out under vacuum conditions, guarantees film quality, realizes industry
Change.The high production efficiency of the PECVD device of the single-chamber of ratio, production cost is low, and volume production ability is high.
2. a kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model, the reaction class magnetron sputtering of ratio
Equipment, can increase the ionization level of working gas, to improve the deposition rate of film, optimize the quality of film.Meanwhile than it
The equipment of PECVD, and when improving PECVD plated film, the case where needing to be additionally carried out metal bottoming, which can first pass through
PVD carries out bottoming to substrate, then opens radio frequency source, carries out PECVD plated film.It can also be mixed with mono- striking film of PECVD combination PVD, preparation
The film of certain miscellaneous atom.
3. a kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model, plates the inner-cavity structure in membrane cavity,
High vacuum environment can be pumped by molecular pump, so that the ionization of gas occurs for the space where effectively reducing radio-frequency coil.Inner cavity
Structure can also prevent film to be deposited on radio-frequency coil, and radio-frequency coil is prevented to be contaminated, and protect the same of radio-frequency coil
When radio frequency energy can be transmitted to the process gas in cavity again.
Detailed description of the invention
The utility model is further described with reference to the accompanying drawings and embodiments:
Fig. 1 is a kind of structure chart of the vacuum coating system of the vertical compound PVD of PECVD of the utility model；
Fig. 2 is the structure chart that a kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model plates membrane cavity.
Fig. 3 is that a kind of intracavitary PVD magnetic control of vacuum coating system plated film of the vertical compound PVD of PECVD of the utility model splashes
The structure chart of injection device.
In figure, 1. feed cavities, 2. preheating cavities, 3. plating membrane cavities, 4. cushion chambers, 5. discharging chambers, 6. tracks, 7. substrate framves, 8.
Hook, 9. substrates, 10. conveyer belts, 11. pumped vacuum systems；
301. chamber doors, 302.PVD target, 303. tracheaes, 304. ventholes, 305. radio-frequency coils, 306. radio-frequency power supplies,
307. molecular pumps, 308. knobs, 309. target holes, 310. anode caps, 311. magnet, 312. insulators, 313. cathodes.
Specific embodiment
A kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model, structure as shown in Fig. 1 ~ Fig. 3, including
Successively close-connected feed cavity 1, preheating cavity 2, plating membrane cavity 3, cushion chamber 4 and discharging chamber 5, feed cavity 1 and discharging chamber 5 are in big
In compression ring border, preheating cavity 2, plating membrane cavity 3 and cushion chamber 4 are respectively connected with vacuum-pumping system 11, and rail is welded at the top of plating membrane cavity 3
Road 6, is socketed with substrate frame 7 in track 6, hangs with substrate 9 by hook 8 on substrate frame 7, the bottom of substrate 9 is located at conveyer belt 10
On, conveyer belt 10 is connected to the bottom of plating membrane cavity 3 by live roller.
PVD magnetic control sputtering device, gas release device and PECVD device, PVD magnetron sputtering dress are provided in plating membrane cavity 3
It sets including PVD target material 302, PVD target material 302 is parallel to each other with substrate 9, and PVD target material 302 is fixed on plated film by insulator 312
On the inner wall of the chamber door 301 of chamber 3, the tail end of insulator 312 passes through chamber door 301 and extends to outside plating membrane cavity 3, PVD target material 302 and absolutely
It is provided with anode cap 310 outside edge body 312, the bottom of anode cap 310 is fixed on the inner wall of chamber door 301, the top of anode cap 310
Target hole 309 is offered, the side that PVD target material 302 is located in insulator 312 is inlaid with magnet 311, and magnet 311 is far from PVD target
The side of material 302 is connected with cathode 313,312 connection electrode of cathode；Gas release device includes that two rows can be passed through working gas
Tracheae 303 a, wherein exhaust pipe 303, close to substrate 9, another exhaust pipe 303 is uniformly opened on PVD target material 302, tracheae 303
Equipped with venthole 304, the venthole 304 on two exhaust pipes 303 is opposite and sets；PECVD device includes radio-frequency coil 305, radio frequency
Coil 305 is centered around the outside of tracheae 303, and the both ends of radio-frequency coil 305 are stretched out at the top of the cavity of plating membrane cavity 3 and connect radio frequency
The interior outer chamber of power supply 306, radio-frequency coil 305 is connected by molecular pump 307.
Knob 308 is fixedly connected on the outside of chamber door 301.
Insulator 312 is C class B insulation body.
Tracheae 303 is provided with two rows, every row 4 ~ 8.
Track 6 and conveyer belt 10 are through all cavitys.
Hook 8 is provided with two or more.
A kind of vacuum coating system of the vertical compound PVD of PECVD of the utility model, when use, first by all chambers
Body is evacuated environment, carries out vacuum breaker to feed cavity 1 later, and after feed cavity 1 restores atmospheric environment, substrate 9 is passed through biography
It send band 10 to be transmitted in feed cavity 1, is then pumped into preheating cavity 2, plating membrane cavity 3 and cushion chamber 4 very by vacuum-pumping system 11
Altitude meets and continues through conveyer belt 10 after vacuum level requirements substrate 9 is transmitted in preheating cavity 2, adds to substrate 9
Heat after being heated to required temperature, is transmitted in plating membrane cavity 3, technique vacuum 10 to be extracted into-3After mbar, work is passed through by tracheae 303
Skill gas opens the power supply of PVD after stable gas pressure, makes gas ion bombardment target, while carrying out magnetron sputtering, opens
Required radio-frequency power is arranged in the radio frequency source 306 of PECVD, carries out the technique plated film of the compound PVD type of PECVD, in the process,
High vacuum environment is pumped into the inner cavity for plating membrane cavity 3 by molecular pump 307, thus the space hair where effectively reducing radio-frequency coil 305
The ionization of angry body, inner-cavity structure can also prevent film to be deposited on radio-frequency coil 305, prevent radio-frequency coil 305 by from
Son pollution, the energy of radio frequency can be transmitted to the process gas in cavity again while protecting radio-frequency coil 305, will after the completion of plated film
Substrate 9 is transmitted in cushion chamber 4, and substrate 9 is reached discharging chamber 5 and sent out by 4 vacuum breaker of cushion chamber after restoring atmospheric environment,
Sample is taken out from substrate 9 finally, completes entire process flow.In the whole process flow, preheating cavity 2 and plating membrane cavity 3 begin
It is maintained at vacuum environment eventually, only substrate 9 is being passed to cavity from external environment respectively by feed cavity 1 and cushion chamber 4, and by substrate
9 when passing to external environment from cavity, carries out vacuum breaker, vacuumizes after the completion of transmission, and keep vacuum environment.
Certainly the above embodiments are only for explaining the technical ideas and features of the present invention, and its object is to allow be familiar with this
The people of technology can understand the content of the utility model and implement accordingly, and the protection model of the utility model can not be limited with this
It encloses.Any modifications made in accordance with the spirit of the main technical solutions of the utility model should all cover the guarantor in the utility model
Within the scope of shield.
Claims (7)
1. a kind of vacuum coating system of the vertical compound PVD of PECVD, including successively close-connected feed cavity (1), preheating cavity
(2), membrane cavity (3), cushion chamber (4) and discharging chamber (5) are plated, which is characterized in that the feed cavity (1) and discharging chamber (5) are in big
In compression ring border, the preheating cavity (2), plating membrane cavity (3) and cushion chamber (4) are respectively connected with vacuum-pumping system (11), the plated film
It is welded at the top of chamber (3) track (6), is socketed with substrate frame (7) in the track (6), passes through hook on the substrate frame (7)
(8) it hangs with substrate (9), the bottom of the substrate (9) is located on conveyer belt (10), and the conveyer belt (10) is connected by live roller
It is connected to the bottom of plating membrane cavity (3).
2. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 1, which is characterized in that described
PVD magnetic control sputtering device, gas release device and PECVD device, the PVD magnetic control sputtering device are provided in plating membrane cavity (3)
Including PVD target material (302), the PVD target material (302) is parallel to each other with substrate (9), and PVD target material (302) passes through insulator
(312) it is fixed on the inner wall of the chamber door (301) of plating membrane cavity (3), the tail end of the insulator (312) passes through chamber door (301) and prolongs
It reaches plating membrane cavity (3) outside, anode cap (310), the anode cap is provided with outside the PVD target material (302) and insulator (312)
(310) bottom is fixed on the inner wall of chamber door (301), offers target hole (309), institute at the top of the anode cap (310)
It states the side in insulator (312) positioned at PVD target material (302) to be inlaid with magnet (311), the magnet (311) is far from PVD target material
(302) side is connected with cathode (313), cathode (313) connection electrode；The gas release device includes that two rows can lead to
Enter the tracheae (303) of working gas, wherein an exhaust pipe (303) is close to substrate (9), another exhaust pipe (303) is close to PVD target material
(302), it is uniformly provided with venthole (304) on the tracheae (303), the venthole (304) phase on two exhaust pipes (303)
Pair and set；The PECVD device includes radio-frequency coil (305), and the radio-frequency coil (305) is centered around the outside of tracheae (303),
The both ends of the radio-frequency coil (305) are stretched out at the top of the cavity of plating membrane cavity (3) and connect radio-frequency power supply (306), the radio frequency
The interior outer chamber of coil (305) is connected by molecular pump (307).
3. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 2, which is characterized in that described
Knob (308) are fixedly connected on the outside of chamber door (301).
4. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 2, which is characterized in that described
Insulator (312) is C class B insulation body.
5. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 2, which is characterized in that described
Tracheae (303) is provided with two rows, every row 4~8.
6. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 1, which is characterized in that described
Track (6) and conveyer belt (10) are through all cavitys.
7. the vacuum coating system of the vertical compound PVD of PECVD of one kind according to claim 1, which is characterized in that described
Hook (8) is provided with two or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821683385.6U CN209412302U (en) | 2018-10-17 | 2018-10-17 | A kind of vacuum coating system of the compound PVD of vertical PECVD |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821683385.6U CN209412302U (en) | 2018-10-17 | 2018-10-17 | A kind of vacuum coating system of the compound PVD of vertical PECVD |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209412302U true CN209412302U (en) | 2019-09-20 |
Family
ID=67931610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821683385.6U Active CN209412302U (en) | 2018-10-17 | 2018-10-17 | A kind of vacuum coating system of the compound PVD of vertical PECVD |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209412302U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110983334A (en) * | 2019-12-18 | 2020-04-10 | 宁波韵升股份有限公司 | Neodymium-iron-boron magnet composite nickel plating method |
-
2018
- 2018-10-17 CN CN201821683385.6U patent/CN209412302U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110983334A (en) * | 2019-12-18 | 2020-04-10 | 宁波韵升股份有限公司 | Neodymium-iron-boron magnet composite nickel plating method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106637112B (en) | Horizontal magnetic control sputtering system and coating process for fuel battery metal double polar plate | |
| CN109055911A (en) | A kind of vacuum coating system of the compound PVD of vertical PECVD | |
| TW200721273A (en) | Plasma processing equipment, plasma processing method, dielectric window for use therein and method for producing the same | |
| CN107058970B (en) | A kind of fuel battery metal polar plate vacuum plated film pipelining equipment and its film plating process | |
| CN105200381B (en) | The auxiliary magnetic control sputtering film plating device of anodic field | |
| CN103820762A (en) | Magnetron sputtering coating system | |
| CN108950515B (en) | Fuel cell metal polar plate carbon base coating preparation facilities based on PECVD | |
| CN209412302U (en) | A kind of vacuum coating system of the compound PVD of vertical PECVD | |
| CN205635764U (en) | Physics chemical vapor deposition system | |
| CN210945750U (en) | Even ionic nitriding furnace of sclerosis | |
| CN103805954A (en) | Magneto-controlled sputter coating system | |
| CN106119795A (en) | Utilize the method that vacuum magnetron sputtering coating film technology prepares lithium battery C Si negative pole coating | |
| US20240084438A1 (en) | Method for forming an licoo2 film and device for carrying out same | |
| CN205152320U (en) | Magnetron sputtering coating film device is assisted to anodic field | |
| CN207958490U (en) | The vacuum magnetic control coating equipment of Nd-Fe-B permanent magnetic is made for heavy rare earth diffusion method | |
| CN112323034B (en) | Vacuum processing apparatus | |
| CN109072418B (en) | Apparatus and method for creating gradient layer defining properties in a sputtering apparatus multilayer coating system | |
| CN208917283U (en) | A kind of vacuum evaporation source | |
| CN112899635A (en) | Horizontal optical continuous magnetron sputtering coating equipment | |
| CN208717429U (en) | Configure the low temperature depositing equipment of impressed current anode | |
| CN205710902U (en) | Enhancement mode magnetron sputtering coil film coating equipment | |
| CN207738649U (en) | A kind of magnetron sputtering experimental provision | |
| CN115110048B (en) | PECVD (plasma enhanced chemical vapor deposition) coating device and method based on magnetron sputtering | |
| CN111074219A (en) | Magnetron sputtering device | |
| CN105274499A (en) | Single-room multi-electrode type PECVD (plasma enhanced chemical vapor deposition) reaction chamber |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |