CN209352974U - Coating machine target position regulating device and coating machine - Google Patents
Coating machine target position regulating device and coating machine Download PDFInfo
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- CN209352974U CN209352974U CN201821953289.9U CN201821953289U CN209352974U CN 209352974 U CN209352974 U CN 209352974U CN 201821953289 U CN201821953289 U CN 201821953289U CN 209352974 U CN209352974 U CN 209352974U
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Abstract
The utility model belongs to magnetic-controlled sputtering coating equipment technical field, more particularly to a kind of coating machine target position regulating device and coating machine, wherein coating machine target position regulating device includes sliding slotware, baffle, shaft and rotary drive, it slides slotware and is equipped with the sliding groove mobile to target for guide baffle plate, baffle is slidably matched with sliding groove, the side towards shaft of baffle is equipped with the gear grooved extended along the length direction of baffle, the one side wall of gear grooved is equipped with rack gear, shaft is vertically arranged with baffle, the first end of shaft protrudes into gear grooved, and the first end of shaft is equipped with the gear being engaged with rack, the second end of shaft is connect with rotary drive.Shaft rotation is driven by rotary drive, turns shaft driven gear rotation, gear pushes baffle mobile, to which controllable register protrudes into the position between substrate and target, the quantity of sputtering particle is controlled, to change the sputtering particle quantity deposited on substrate, changes the local coating film thickness of substrate.
Description
Technical field
The utility model belongs to magnetic-controlled sputtering coating equipment technical field more particularly to a kind of coating machine target position regulating device
And coating machine.
Background technique
Magnetron sputtering membrane process can accurately control coating film thickness, ultra-thin film layers can be plated to substrate, for plated film
The regulative mode of thickness is broadly divided into two major classes: the first kind is to regulate and control parameter before technique, can be in certain model before process operation
Enclose it is interior controlled, two important preset parameter is target material and magnetic field respectively.Second class is can be in process operation
Period regulates and controls parameter, is integrally varied and controlled film thickness during technique carries out by adjusting the partial parameters in technique, the
Two class adjustable parameters mainly include target power supply power, substrate transmission speed and process gas pressure etc..But aforementioned adjusting
Mode cannot achieve the adjusting of substrate part plated film film thickness mainly to the integrally-regulated of coating film thickness.
Utility model content
The purpose of this utility model is to provide a kind of coating machine target position regulating device and coating machines, it is intended to solve existing skill
It cannot achieve the technical issues of substrate part coating film thickness is adjusted in magnetron sputtering membrane process in art.
To achieve the above object, the technical solution adopted in the utility model is a kind of coating machine target position regulating device, is used for
Sputtering particle is blocked, including sliding slotware, baffle, shaft and rotary drive, the sliding slotware are equipped with for guiding
Baffle is stated to the sliding groove moved between target and substrate, the baffle is slidably matched with the sliding groove, the baffle direction
The side of the shaft is equipped with the gear grooved extended along the length direction of the baffle, and the one side wall of the gear grooved is equipped with tooth
Item, the shaft are vertically arranged with the baffle, and the first end of the shaft protrudes into the gear grooved, and the first of the shaft
End, which is equipped with, to be connect with the rack gear meshed gears, the second end of the shaft with the rotary drive.
Optionally, the sliding slotware includes upper groove body and lower groove, and the baffle plate setting is in the upper groove body and lower slot
Between body.
Optionally, the upper groove body is equipped with upper sliding slot, and the upper sliding slot and the top edge sliding of the baffle are matched
It closes, the lower groove is equipped with lower slider slot, and the lower slider slot is simultaneously slidably matched with the lower edge of baffle movement.
Optionally, the coating machine target position regulating device further includes for the sealing with the sealed connection of the vacuum chamber of coating machine
Component, the seal assembly include for being arranged on the side wall of the vacuum chamber and being tightly connected with the side wall of the vacuum chamber
Seal sleeve, the shaft is arranged in the seal sleeve and is tightly connected with the seal sleeve.
Optionally, the inner wall of the seal sleeve is equipped at least one annular groove, and each annular groove is equipped with for close
Seal the ring type seal in the gap between the shaft and the sleeve.
Optionally, rotary drive is the handle for driving the shaft rotation.
Optionally, the rotary drive is the motor for driving the shaft rotation.
Optionally, the baffle is equipped with the convex of the length direction extension along the baffle towards the side of the shaft
Platform, the gear grooved are set on the boss.
The utility model has the beneficial effects that passing through rotary drive in the coating machine target position regulating device of the utility model
Shaft rotation is driven, shaft driven gear rotation, wheel and rack engagement are turned, to push baffle mobile, so that baffle is stretched
Entering between substrate and target, baffle protrudes into that position is not identical, and it is not identical to the coverage extent of sputtering particle, control sputtering particle
Quantity, deposit to sputtering particle quantity on substrate to change, change the local coating film thickness of substrate.
To achieve the above object, the utility model use another solution is that a kind of coating machine, including vacuum chamber,
The side wall of the vacuum chamber is equipped with above-mentioned coating machine target position regulating device, and the sliding slotware is set to the interior of the vacuum chamber
It wall and is disposed adjacent with target, the first end of the shaft protrudes into the vacuum chamber.
Optionally, the coating machine includes coating machine target position regulating device described in multiple groups, coating machine target position tune described in multiple groups
Regulating device is arranged along the length direction of target.
The utility model has the beneficial effects that being controlled in the coating machine of the utility model by coating machine target position regulating device
Baffle processed protrudes into the position between target and substrate, to control the quantity that particle is splashed on substrate, and then control and baffle
The coating film thickness of corresponding local location.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only that this is practical new
Some embodiments of type for those of ordinary skill in the art without any creative labor, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the structural schematic diagram of coating machine target position regulating device provided by the embodiment of the utility model and coating machine；
Fig. 2 is the side wall of coating machine target position regulating device and vacuum chamber in coating machine provided by the embodiment of the utility model
Assembling schematic diagram；
Fig. 3 is the structural schematic diagram of baffle in coating machine provided by the embodiment of the utility model；
Fig. 4 is the schematic side view of coating machine provided by the embodiment of the utility model.
Wherein, each appended drawing reference in figure:
1-substrate, 2-sputtering particles, 3-sliding slotwares, 3a-upper groove body, 3b-lower groove, 31-sliding grooves,
311-upper sliding slots, 312-lower slider slots, 4-baffles, 41-gear grooveds, 42-rack gears, 43-boss, 5-shafts, 51-
Gear, 6-rotary drives, 7-seal sleeves, 71-annular grooves, 72-ring type seals, 8-targets, 9-vacuum chambers.
Specific embodiment
The embodiments of the present invention are described below in detail, the examples of the embodiments are shown in attached drawing 1 into attached drawing,
In from beginning to end same or similar label indicate same or similar element or element with the same or similar functions.Below
It is exemplary by reference to the embodiment that attached drawing describes, it is intended to for explaining the utility model, and should not be understood as to this reality
With novel limitation.
In the description of the present invention, it should be understood that term " length ", " width ", "upper", "lower", " preceding ",
The orientation or positional relationship of the instructions such as " rear ", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", "outside" is based on attached
Orientation or positional relationship shown in figure, is merely for convenience of describing the present invention and simplifying the description, rather than indication or suggestion
Signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to this
The limitation of utility model.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include one or more of the features.The meaning of " plurality " is two or two in the description of the present invention,
More than, unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " Gu
It is fixed " etc. terms shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be
Mechanical connection, is also possible to be electrically connected；It can be directly connected, two can also be can be indirectly connected through an intermediary
The interaction relationship of connection or two elements inside element.It for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of above-mentioned term in the present invention.
As shown in Figures 1 to 3, the utility model provides a kind of coating machine target position regulating device applied on coating machine,
And it can be applied in the technique for carrying out magnetron sputtering to substrate 1, for blocking sputtering particle 2, by metering needle to sputtering grain
4 position of baffle of son 2 changes the area for blocking sputtering particle, and specifically, coating machine target position regulating device mainly includes sliding
Slotware 3, baffle 4, shaft 5 and rotary drive 6, sliding slotware 3 are equipped with for guide baffle plate 4 between target 8 and substrate 1
Mobile sliding groove 31, baffle 4 are slideably positioned in sliding groove 31, are moved under the guidance of sliding groove 31 along sliding groove 31, from
And change the area that baffle 4 blocks target 8, and then change the sputtering particle 2 that baffle 4 is blocked.Baffle 4 is towards the side of shaft 5
Face is equipped with the gear grooved 41 extended along the length direction of baffle 4, and the one side wall of gear grooved 41 is equipped with rack gear 42.Shaft 5 and gear
Plate 4 is vertically arranged, and the first end of shaft 5 protrudes into gear grooved 41, and the first end of shaft 5 is equipped with and 42 meshed gears of rack gear
51, the second end of shaft 5 is connect with rotary drive 6.In the present embodiment, 5 first end of shaft is protruded into gear grooved 41, passes through rotation
After turning the drive rotation of shaft 5 of actuator 6, gear 51 is rotated with shaft 5, while gear 51 is engaged with rack gear 42, therefore, in gear
Under 51 drive, baffle 4 is moved along sliding groove 31, i.e., baffle 4 is moved along the length direction of itself.
The present embodiment coating machine target position regulating device is driven when being applied in magnetron sputtering coater technique by rotation
Moving part 6 drives shaft 5 to rotate, and shaft 5 is rotated with moving gear 51, and gear 51 is engaged with rack gear 42, thus push baffle 4 mobile,
So that baffle 4 protrudes between substrate 1 and target 8, baffle 4 protrudes into that position is not identical, the sputtering particle of localized region
2 coverage extent is not identical, controls the quantity of the sputtering particle 2 of regional area, thus change deposit to it is corresponding on substrate 1
2 quantity of sputtering particle of regional area changes the coating film thickness of the regional area of substrate 1.
After being interfered due to sputtering particle 2 by baffle 4, the characteristics of motion of sputtering particle 2 is unpredictable, 4 pairs of sputtering grains of baffle
Blocking for son 2 is difficult to carry out accurate theoretical calculation, and the present embodiment additionally provides a kind of debugging step, specifically includes following step
It is rapid: Step 1: adjusting 4 position of baffle on target position, baffle 4 to be made to be moved to predeterminated position；Step 2: starting particle sputtering, and
Exchange trial base plated film；Step 3: the film thickness data of the regional area blocked on measurement debugging substrate through baffle 4, calculate practical
Film thickness error of the film thickness data of the regional area of measurement relative to default film thickness data, by the film thickness error of regional area and public affairs
Difference compares；Step 4: if the film thickness error of regional area be greater than tolerance, adjust on target position with aforementioned regional area pair
4 position of baffle answered；Step 5: repeating step 2 to step to step 4, until the film thickness error of regional area is less than tolerance.
In the present embodiment, specific installation is as shown in Figure 1, so specific 4 position regulative mode of baffle is that film thickness error is positive
When being worth, and being greater than tolerance, controllable register 4 is moved to the left, and the coating film thickness of debugging substrate can so be thinned；Film thickness error is negative
When being worth, and being greater than tolerance, controllable register 4 moves right, then increases the plated film film thickness of debugging substrate.
Optionally, baffle 4 and target 8 keep spacing setting, and baffle 4 will not influence interference 8 magnetic field of target in other words, just
It is mobile that normal route can be installed in sputtering particle 2.
Optionally, sliding slotware 3 includes upper groove body 3a and lower groove 3b, and baffle 4 is set to upper groove body 3a and lower groove 3b
Between.In the present embodiment, top edge and the lower edge of baffle 4, and upper slot are limited respectively by upper groove body 3a and lower groove 3b
The top edge of body 3a and lower groove 3b difference guide baffle plate 4 and lower edge are mobile, so that baffle 4 can be accurately according to pre-
If path is mobile, the control precision of coating film thickness is improved.
Optionally, sliding groove 31 includes upper sliding slot 311 and lower slider slot 312, and specifically, upper groove body 3a is equipped with
Upper sliding slot 311, upper sliding slot 311 and the top edge of baffle 4 are slidably matched, the limit of the top edge of baffle 4 in upper sliding slot 311
System and the lower movement of guidance, lower groove 3b are equipped with lower slider slot 312, and the lower edge sliding mobile with baffle 4 of lower slider slot 312 is matched
Close, the lower edge of baffle 4 moves under the limitation and guidance of lower slider slot 312, final back plate 4 sliding groove 31 limitation and
Guide lower accurate movement.
Optionally, since coating machine itself is the plated film in vacuum chamber 9, by shaft 5 come 4 position of controllable register
When, sealing insufficient problem when passing through the side wall of vacuum chamber 9 in order to avoid shaft 5, coating machine target position regulating device further includes using
In the seal assembly with the sealed connection of the vacuum chamber 9 of coating machine, seal assembly includes seal sleeve 7, and seal sleeve 7 is arranged in very
On the side wall of empty room 9, the seal sleeve 7 being tightly connected by the side wall of seal sleeve 7 and vacuum chamber 9, specifically sealing shroud
The side wall of cylinder 7 and vacuum chamber 9 can be realizes sealed connection by welding, is also possible to by seal sleeve 7
Outer surface is equipped with sealing ring to realize that the side wall of seal sleeve 7 and vacuum chamber 9 is tightly connected.Meanwhile shaft 5 is arranged in sealing shroud
In cylinder 7, shaft 5 and seal sleeve 7 are tightly connected.In this way, the side wall of the outer surface of seal sleeve 7 and vacuum chamber 9 is tightly connected,
The inside of seal sleeve 7 is connect with rotating shaft sealing, to realize that the side wall of shaft 5 and vacuum chamber 9 is tightly connected.
Optionally, shaft 5 and the sealed connection mode of seal sleeve 7 specifically can be, and the inner wall of seal sleeve 7 is equipped with
At least one annular groove 71, each annular groove 71 are equipped with ring type seal 72, and ring type seal 72 being capable of sealing pivot 5 and sleeve
Gap between inner wall, to form the sealed connection between shaft 5 and seal sleeve 7.
In the present embodiment, rotary drive 6 can be manual actuation part, such as handle, the second end company of handle and shaft 5
It connects, by rotational handle to drive shaft 5 to rotate, to control the shift position of baffle 4.In the present embodiment, rotation driving
Part 6 can also be that power driver, such as motor, motor are fixedly connected with the output shaft by motor with the outer wall of vacuum chamber 9 and turn
The output shaft of the connection of axis 5 or motor is connect by shaft coupling with shaft 5, and motor drives shaft 5 to rotate, to control baffle 4
Shift position.
Optionally, in order to ensure the intensity of baffle 4, baffle 4 is equipped with towards the side of shaft 5 along baffle in the present embodiment
The boss 43 that 4 length direction extends, boss 43 itself can increase the intensity of baffle 4, so that baffle 4 will not be in magnetic control
It deforms during sputter coating, enhances the performance that baffle resists film coating environment；In addition, length of the setting along baffle 4
The boss 43 that direction extends, is also convenient for gear grooved 41 and is set on boss 43, avoid that gear grooved 41 is directly set to baffle 4
The problem of above leading to the strength reduction of baffle 4 itself.
Optionally, in the present embodiment baffle 4 be rectangular plate-like structure, more specifically, baffle 4 by aluminum alloy material manufacture and
At, aluminum alloy material high temperature resistant itself can adapt to high temperature film coating environment, have enough intensity, and have it is lower at
This.
As shown in figure 4, the utility model embodiment additionally provides a kind of coating machine, including vacuum chamber 9, the side of vacuum chamber 9
Wall is equipped with coating machine target position regulating device above-mentioned, and sliding slotware 3 is set to the inner wall of vacuum chamber 9 and adjacent with target 8 sets
It sets, the first end of shaft 5 protrudes into vacuum chamber 9, in coating machine wall portion.In the present embodiment, pass through coating machine target position regulating device
The position that baffle 4 protrudes between target 8 and substrate 1 is controlled, to control the quantity that particle is splashed on substrate 1, and then is controlled
Make the coating film thickness of local location corresponding with baffle 4.
Coating machine includes multiple groups coating machine target position regulating device, length of the multiple groups coating machine target position regulating device along target 8
Direction arrangement.
After being interfered due to sputtering particle 2 by baffle 4, the characteristics of motion of sputtering particle 2 is unpredictable, 4 pairs of each baffle sputterings
Blocking for particle 2 is difficult to carry out accurate theoretical calculation, and the present embodiment additionally provides a kind of debugging step, for testing each reality
The corresponding relationship of plated film film thickness and 4 position of baffle specifically comprises the following steps: to adjust each coating machine target respectively Step 1: adjusting
Position regulating device makes each baffle 4 be moved to predeterminated position to adjust 4 position of each baffle on target position；Step 2: starting grain
Son sputtering, and exchange trial base plated film；Step 3: the film thickness number of the regional area blocked on measurement debugging substrate through each baffle 4
According to film thickness error of the film thickness data of each regional area of actual measurement relative to default film thickness data being calculated, by each partial zones
The film thickness error in domain is compared with tolerance；Step 4: the film thickness error if there is any regional area is greater than tolerance, then adjust
Save 4 position of baffle corresponding with aforementioned regional area on target position；Step 5: repeating step 2 to step to step 4, until each office
The film thickness error in portion region is less than tolerance.
Above description is only the preferred embodiment of the utility model, is not intended to limit the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (10)
1. a kind of coating machine target position regulating device, for blocking sputtering particle, it is characterised in that: including sliding slotware, baffle, turn
Axis and rotary drive, the sliding slotware are equipped with for guiding the baffle to the sliding moved between target and substrate
Slot, the baffle are slidably matched with the sliding groove, and the baffle is equipped with towards the side of the shaft along the baffle
The one side wall of the gear grooved that length direction extends, the gear grooved is equipped with rack gear, and the shaft is vertically arranged with the baffle, institute
The first end for stating shaft protrudes into the gear grooved, and the first end of the shaft be equipped with the rack gear meshed gears, it is described
The second end of shaft is connect with the rotary drive.
2. coating machine target position regulating device according to claim 1, it is characterised in that: the sliding slotware includes upper groove body
And lower groove, the baffle plate setting is between the upper groove body and lower groove.
3. coating machine target position regulating device according to claim 2, it is characterised in that: the upper groove body is equipped with upper sliding
Slot, the upper sliding slot and the top edge of the baffle are slidably matched, and the lower groove is equipped with lower slider slot, the lower slider
Slot is simultaneously slidably matched with the lower edge of baffle movement.
4. coating machine target position regulating device according to any one of claims 1 to 3, it is characterised in that: the coating machine target
Position regulating device further includes for the seal assembly with the sealed connection of the vacuum chamber of coating machine, and the seal assembly includes for wearing
The seal sleeve being tightly connected on the side wall of the vacuum chamber and with the side wall of the vacuum chamber, the shaft are arranged in institute
It states in seal sleeve and is tightly connected with the seal sleeve.
5. coating machine target position regulating device according to claim 4, it is characterised in that: set on the inner wall of the seal sleeve
There is at least one annular groove, the annular that each annular groove is equipped with for sealing the gap between the shaft and the sleeve is close
Seal.
6. coating machine target position regulating device according to any one of claims 1 to 3, it is characterised in that: rotary drive is
For driving the handle of the shaft rotation.
7. coating machine target position regulating device according to any one of claims 1 to 3, it is characterised in that: the rotation driving
Part is the motor for driving the shaft rotation.
8. coating machine target position regulating device according to any one of claims 1 to 3, it is characterised in that: the baffle direction
The side of the shaft is equipped with the boss extended along the length direction of the baffle, and the gear grooved is set to the boss
On.
9. a kind of coating machine, including vacuum chamber, it is characterised in that: it is any that the side wall of the vacuum chamber is equipped with claim 1 to 8
The item coating machine target position regulating device, the sliding slotware are set to the inner wall of the vacuum chamber and are disposed adjacent with target,
The first end of the shaft protrudes into the vacuum chamber.
10. coating machine according to claim 9, it is characterised in that: the coating machine includes coating machine target position described in multiple groups
Regulating device, coating machine target position regulating device described in multiple groups are arranged along the length direction of target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821953289.9U CN209352974U (en) | 2018-11-21 | 2018-11-21 | Coating machine target position regulating device and coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821953289.9U CN209352974U (en) | 2018-11-21 | 2018-11-21 | Coating machine target position regulating device and coating machine |
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| Publication Number | Publication Date |
|---|---|
| CN209352974U true CN209352974U (en) | 2019-09-06 |
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ID=67784277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821953289.9U Active CN209352974U (en) | 2018-11-21 | 2018-11-21 | Coating machine target position regulating device and coating machine |
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| CN (1) | CN209352974U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111647867A (en) * | 2020-07-02 | 2020-09-11 | 杭州企势科技有限公司 | Magnetron sputtering control mechanism of vacuum coating machine |
| CN112251728A (en) * | 2020-10-22 | 2021-01-22 | 凯盛信息显示材料(黄山)有限公司 | Continuous vacuum magnetron sputtering coating device and coating production line |
| CN114107934A (en) * | 2021-11-19 | 2022-03-01 | 湖北华鑫光电有限公司 | Film thickness control device and rapid film coating method thereof |
| CN116240505A (en) * | 2023-05-06 | 2023-06-09 | 汕头超声显示器技术有限公司 | Sputter coating device |
-
2018
- 2018-11-21 CN CN201821953289.9U patent/CN209352974U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111647867A (en) * | 2020-07-02 | 2020-09-11 | 杭州企势科技有限公司 | Magnetron sputtering control mechanism of vacuum coating machine |
| CN112251728A (en) * | 2020-10-22 | 2021-01-22 | 凯盛信息显示材料(黄山)有限公司 | Continuous vacuum magnetron sputtering coating device and coating production line |
| CN114107934A (en) * | 2021-11-19 | 2022-03-01 | 湖北华鑫光电有限公司 | Film thickness control device and rapid film coating method thereof |
| CN116240505A (en) * | 2023-05-06 | 2023-06-09 | 汕头超声显示器技术有限公司 | Sputter coating device |
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