CN208701206U - 一种原子层沉积在线监控系统 - Google Patents
一种原子层沉积在线监控系统 Download PDFInfo
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- CN208701206U CN208701206U CN201820782003.9U CN201820782003U CN208701206U CN 208701206 U CN208701206 U CN 208701206U CN 201820782003 U CN201820782003 U CN 201820782003U CN 208701206 U CN208701206 U CN 208701206U
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- 238000000231 atomic layer deposition Methods 0.000 title claims abstract description 42
- 238000012544 monitoring process Methods 0.000 title claims abstract description 40
- 238000012545 processing Methods 0.000 claims abstract description 60
- 238000000034 method Methods 0.000 claims abstract description 28
- 238000002407 reforming Methods 0.000 claims abstract description 21
- 238000006243 chemical reaction Methods 0.000 claims abstract description 18
- 238000004886 process control Methods 0.000 claims abstract description 15
- 238000012360 testing method Methods 0.000 claims abstract description 5
- 230000002159 abnormal effect Effects 0.000 claims description 7
- 238000004458 analytical method Methods 0.000 claims description 5
- 238000012423 maintenance Methods 0.000 claims description 4
- 238000004876 x-ray fluorescence Methods 0.000 claims description 3
- 239000000700 radioactive tracer Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000010923 batch production Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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CN201820782003.9U CN208701206U (zh) | 2018-05-24 | 2018-05-24 | 一种原子层沉积在线监控系统 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108425105A (zh) * | 2018-05-24 | 2018-08-21 | 江苏微导纳米装备科技有限公司 | 一种原子层沉积在线监控系统 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108425105A (zh) * | 2018-05-24 | 2018-08-21 | 江苏微导纳米装备科技有限公司 | 一种原子层沉积在线监控系统 |
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Address after: 214028 No.11 Lijiang Road, Xinwu District, Wuxi City, Jiangsu Province Patentee after: Jiangsu micro nano technology Co.,Ltd. Address before: 214028, No. four, No. 7 Road, Wuxi New District, Jiangsu Patentee before: JIANGSU LEADMICRO NANO-EQUIPMENT TECHNOLOGY Ltd. |
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Address after: No. 27 Changjiang South Road, Xinwu District, Wuxi City, Jiangsu Province, China Patentee after: Jiangsu micro nano technology Co.,Ltd. Country or region after: China Address before: No.11 Lijiang Road, Xinwu District, Wuxi City, Jiangsu Province Patentee before: Jiangsu micro nano technology Co.,Ltd. Country or region before: China |
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