CN2086749U

CN2086749U - Multifunctional coating equipment using multiarc-magnetic control sputtering

Info

Publication number: CN2086749U
Application number: CN 90226142
Authority: CN
Inventors: 张宝复; 王福柱; 张琦; 张云汉
Original assignee: 511 Research Institute Fifth Research Institute Ministry Of Aerospace Industry
Current assignee: 511 Research Institute Fifth Research Institute Ministry Of Aerospace Industry
Priority date: 1990-12-25
Filing date: 1990-12-25
Publication date: 1991-10-16

Abstract

The utility model relates to multifunctional film plating equipment having using multiple arcs and magnetic control sputtering, which belongs to plating equipment. A shaft line which is sealed at the top part or the bottom of a vacuum chamber via a flange in multi-arc ion plating equipment of the multifunctional film coating equipment having using multiple arcs and magnetic control sputtering is provided with a magnetic control sputtering target or a heater, and every arc source is provided with a baffle plate (or the baffle plate is taken off). Therefore, the utility model not only can be used for plating films at high temperature, but also can be used for plating the films of metal having low melting point, non-metal and plastic at high speed and low temperature under the condition of glow discharge. In addition, the utility model can be used for starting the arc source and the magnetic control sputtering target in order to plate multilayer films or alloy films having different materials and different structures. The using range of the multi-arc ion plating equipment is enlarged, use function is added, and expense is saved.

Description

Multifunctional coating equipment using multiarc-magnetic control sputtering

The utility model relates to the plating equipment of metallic substance plating equipment, particularly vacuum-evaporation, sputter.

The multi-arc ion plating equipment that is widely used in aspects such as machinery, space flight, aviation, weaving, petrochemical industry, instrument, light industry, electronics, building materials in recent years, though have plated film speed height, processing parameter is easy to advantages such as control, but can not plate multilayer film and alloy film, and because during plated film, the multi sphere ionic current is strong, workpiece to be plated is heated to more than 300 ℃, therefore for plastics and other low melting point metals and nonmetal, generally can not use this equipment and carry out plated film, make the application surface of equipment have significant limitation.

The utility model is to the improvement of multi-arc ion plating equipment and development, and purpose is to provide a kind of can carry out high temperature multi sphere plated film, can carry out the low temperature plated film on low-melting metals such as plastics or non-metal workpiece again, but also can plate multilayer film and alloy film.

The purpose of this utility model can reach by following measure: general multi-arc ion plating equipment mainly by the flange that connects the vacuum unit, install workpiece to be plated rotational workpieces frame, vacuum chamber, be contained in the multi sphere evaporation source on the vacuum-chamber wall, the rotation power wheel of driven rotary work rest, the aeration aperture that plated film is used etc. and form.This equipment increases coaxial magnetron sputtering parts on this basis, just can be at plastics and low-melting metal and nonmetal plating film, and the arc source on this moment vacuum chamber wall should add baffle plate, pollutes the arc source when avoiding sputter.When need carry out the high temperature plated film or plate multilayer film, alloy film, remove baffle plate, carry out arc light and glow discharge simultaneously, just can obtain the multilayer film or the alloy film of unlike material and different structure.

When carrying out the high temperature plated film, in order to improve coating quality and film-Ji bonding force, need workpiece to be plated is preheated, this moment, the well heater of changing the tongued and grooved flanges with same size and structure got final product as long as magnetron sputtering target is pulled down from tongued and grooved flanges.

This utility model is owing to only need to have increased on-axis sputtering parts on former multi-arc ion plating equipment, just can not only carry out high temperature multi sphere plated film, can on low-melting metals such as plastics and non-metal workpiece, carry out the low temperature plated film again, but also can plate the multilayer film or the alloy film of heterogeneity and structure, therefore can realize a multiple function of equipment very easily, widen the use range of multi-arc ion plating equipment widely, increased functions of use, saved spending.

Below in conjunction with drawings and Examples concrete structure of the present utility model and working condition are described in further detail.

Fig. 1 is a structural principle synoptic diagram of the present utility model

Fig. 2 is the structural principle synoptic diagram that the multi-arc ion plating equipment of well heater is housed

With reference to the accompanying drawings 1, this equipment is mainly by the ring flange that connects vacuum unit (not drawing among the figure) (1), be used to install the rotational workpieces frame (3) of workpiece to be plated (2), vacuum chamber (8), be contained in the multi sphere evaporation source (10) on the vacuum-chamber wall, the rotation power wheel (11) of driven rotary work rest (3), the aeration aperture that plated film is used compositions such as (12).Be characterized in magnetron sputtering target (7) being housed at the axis of vacuum chamber (8), this target is fixed on the top or the bottom of vacuum chamber by ring flange (5), seal with sealing-ring (4), drive magnetic controlling target (7) by 0～1200V direct supply (6), form glow discharge, just can plate plastics part and low-melting metal and nonmetal, pollute surface, arc source during at this moment for fear of sputter, baffle plate (9) is located to add in each arc source (10).When carrying out the high temperature plated film or when making workpiece to be plated surface form multilayer film, the alloy film of unlike material and different structure, can removing baffle plate (9), start arc source and magnetron sputtering target simultaneously.

With reference to the accompanying drawings 2, when carrying out the high temperature plated film, for improving coating quality and film-Ji bonding force, must preheat workpiece to be plated, change the well heater (14) of the flange seal of same size and structure as long as magnetron sputtering target (7) is pulled down from the combination seal flange this moment, and the driving power (6) of magnetron sputtering target (7) is added on the workpiece to be plated frame, well heater (14) power supply this moment (13) is 5～25Kw, baffle plate (9) should be taken away certainly.Principle based on this equipment, to the existing multi-arc ion plating equipment that well heater is housed, as long as change well heater into magnetic controlling target, just have and to carry out the high temperature plated film, again can be on low melting point metal and nonmetal and plastics plated film, the multiple function that also can plate the multilayer film or the alloy film of unlike material and different structure.

Claims

1, a kind of multi sphere-magnetron sputtering multifunctional film-coating equipment, main by the ring flange that connects the vacuum unit (1), be used to install rotational workpieces frame (3), the vacuum chamber (8) of workpiece to be plated (2), be contained in the multi sphere evaporation source (10) on the vacuum-chamber wall, the rotation power wheel (11) of driven rotary work rest (3), the aeration aperture that plated film is used compositions such as (12) is characterized in that:

A., the empty sputtering target (7) of magnetic is housed on the axis of vacuum chamber (8), and this target is fixed on the top or the bottom of vacuum chamber (8) by ring flange (5), with sealing-ring (4) sealing, by D～1200V direct supply (6) driving magnetic air target (7);

B. locate to be equipped with baffle plate (9) in each arc source (10).

2, a kind of multi sphere-magnetron sputtering multifunctional film-coating equipment, main by the ring flange that connects the vacuum unit (1), be used to install the rotational workpieces frame (3) of workpiece to be plated (2), vacuum chamber (8), be contained in the multi sphere evaporation source (10) on the vacuum-chamber wall, the rotation power wheel (11) of driven rotary work rest (3), the aeration aperture that plated film is used compositions such as (12), it is characterized in that: well heater (14) is housed on the axis of vacuum chamber (8), be fixed on the top or the bottom of vacuum chamber (8) by ring flange (5), with sealing-ring (4) sealing, drive well heater (14) by 5～25Kw power supply (13).