CN208378980U - A kind of plasma coating device - Google Patents

A kind of plasma coating device Download PDF

Info

Publication number
CN208378980U
CN208378980U CN201821118751.3U CN201821118751U CN208378980U CN 208378980 U CN208378980 U CN 208378980U CN 201821118751 U CN201821118751 U CN 201821118751U CN 208378980 U CN208378980 U CN 208378980U
Authority
CN
China
Prior art keywords
plasma
fixedly installed
evaporation
communicated
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201821118751.3U
Other languages
Chinese (zh)
Inventor
赵春
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yuncheng University
Original Assignee
Yuncheng University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yuncheng University filed Critical Yuncheng University
Priority to CN201821118751.3U priority Critical patent/CN208378980U/en
Application granted granted Critical
Publication of CN208378980U publication Critical patent/CN208378980U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The utility model relates to technical field of physical vapor deposition, and disclose a kind of plasma coating device, including pedestal, plasma evaporation coating machine is fixedly installed at the top of the pedestal, the discharge tank positioned at base top is fixedly installed on the left of the plasma evaporation coating machine, the evaporation tank being fixedly installed on the left of discharge tank at the top of the pedestal, the top of the evaporation tank is fixed to be communicated with conveying pipeline, and the other end fixation of the conveying pipeline is communicated with the box that feeds intake.The plasma coating device, discharge ion is provided by plasma evaporation coating machine for the inside of discharge tank, evaporation tank is cooperated to carry out high temperature evaporation to metalliferous material, so that gas ion and being evaporated that substance ion passes through mixing tube respectively and intermediate tube is mixed into connecting tube, be conducive to the device effectively to deposit evaporated material or its reactant, to be conducive to improve bombardment of the compounding substances to plating piece, the quality of plating piece plated film is improved.

Description

A kind of plasma coating device
Technical field
The utility model relates to technical field of physical vapor deposition, specially a kind of plasma coating device.
Background technique
Ion plating be it is a kind of make gas under vacuum conditions using gas discharge or be evaporated material part ionization, and Gas ion is evaporated under the bombardment of substance ion, and evaporated material or its reactant are deposited on the method on substrate, wherein Including magnetic controlled sputtering ion plating, reactive ion plating, HCD ion plating and multi-arc ion coating etc..
Ion plating is called plasma plating, and metal or nonmetallic materials are heated under conditions of high vacuum, makes its evaporation simultaneously It is condensed in plating piece surface and forms film, common are plasma and aluminize with plasma chromium plating etc., mostly use greatly at present corresponding Equipment carries out plated film to plating piece, but since gas ion and the mixing being evaporated between substance ion are not uniform enough, causes to steam It sends out substance or its reactant deposition is not thorough enough, seriously affect the quality of plated film, along with the specification for not adapting to a variety of plating pieces, Using extremely inconvenience, for this purpose, it is proposed that a kind of plasma coating device.
Utility model content
(1) the technical issues of solving
In view of the deficiencies of the prior art, the utility model provides a kind of plasma coating device, has plating film quality Height, adaptive a variety of plating piece specifications the advantages that being easy to use, solve the gas ion of conventional equipment and are evaporated substance ion Between mixing it is not uniform enough, cause evaporated material or its reactant to deposit not thorough enough, seriously affect the quality of plated film, cannot Adapt to the specification of a variety of plating pieces, the extremely inconvenient problem of operation.
(2) technical solution
To realize that above-mentioned plating film quality is high, adaptive a variety of plating piece specifications, purpose easy to use, the utility model offer Following technical solution: a kind of plasma coating device, including pedestal are fixedly installed with plasma evaporation at the top of the pedestal Coating machine is fixedly installed with the discharge tank positioned at base top, the top of the pedestal on the left of the plasma evaporation coating machine Portion is fixedly installed with the evaporation tank on the left of discharge tank, and the top fixation of the evaporation tank is communicated with conveying pipeline, the conveying The other end of pipe is fixed to be communicated with the box that feeds intake, and the side fixation of the evaporation tank is communicated with mixing tube, the top of the discharge tank Fixed to be communicated with intermediate tube, the other end of the intermediate tube is connected to the fixation of the side of mixing tube, the plasma evaporation plated film Coated stove is fixedly installed at the top of machine, the screw top of the coated stove is socketed with nut cap, and the other end of the mixing tube is solid Surely it is communicated with connecting tube, the other end of the connecting tube is connected to the fixation of the side of coated stove, the fixed peace in the bottom of the nut cap Equipped with spiral shell block, the bottom movable sleeve of the spiral shell block is connected to the coating umbrella inside coated stove, the bottom of the plated film furnace chamber It is fixedly installed with pallet, the two sides of the tray top are fixedly installed with positioner.
Preferably, the positioner includes fixinig plate, and the fixinig plate is fixedly mounted on the top of pallet, the fixation The lateral surface of piece is movably installed with motion bar, and one end of the motion bar is fixedly installed with handle, the other end of the motion bar Run through and extend to the outside of fixinig plate side and be fixedly installed with push plate, the medial surface of the push plate is by extension spring and admittedly The medial surface of stator is sequentially connected.
Preferably, the extension spring movable set is in the outer surface of motion bar, and the both ends of extension spring are respectively and solid Stator is fixedly connected with the medial surface of push plate.
Preferably, the bottom of the push plate is fixedly installed with backing plate, and the top movable of the bottom of backing plate and pallet connects.
Preferably, the bottom of the spiral shell block offers threaded hole, the outer surface on the coating umbrella top be equipped with external screw thread and It is socketed with the inner thread of threaded hole.
Preferably, the model MEB-600 of the plasma evaporation coating machine.
(3) beneficial effect
Compared with prior art, the utility model provides a kind of plasma coating device, have it is following the utility model has the advantages that
1, the plasma coating device provides discharge ion by plasma evaporation coating machine for the inside of discharge tank, Cooperate evaporation tank to metalliferous material carry out high temperature evaporation so that gas ion and be evaporated substance ion pass through respectively mixing tube and Intermediate tube is mixed into connecting tube, is conducive to the device and is effectively deposited to evaporated material or its reactant, to be conducive to Bombardment of the compounding substances to plating piece is improved, the quality of plating piece plated film is improved.
2, the plasma coating device, by push plate outwardly against motion bar, so that elastic deformation occurs for extension spring, The elastic folding and unfolding for realizing push plate is conducive to effectively consolidate to the plating piece of different size, is conducive to the use for improving the device Convenience is conducive to the stability for improving plating piece using the tight fit of two positioners.
Detailed description of the invention
FIG. 1 is a schematic structural view of the utility model;
Fig. 2 is the schematic diagram of the section structure of the utility model coated stove;
Fig. 3 is the structural schematic diagram of the utility model positioner.
In figure: 1, pedestal;2, plasma evaporation coating machine;3, discharge tank;4, evaporation tank;5, conveying pipeline;6, feed intake box;7, Mixing tube;8, intermediate tube;9, coated stove;10, nut cap;11, connecting tube;12, spiral shell block;13, coating umbrella;14, pallet;15, detent Device;151, fixinig plate;152, motion bar;153, handle;154, push plate;155, extension spring.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work Every other embodiment obtained, fall within the protection scope of the utility model.
Please refer to Fig. 1-3, a kind of plasma coating device, including pedestal 1, the top of pedestal 1 is fixedly installed with etc. from Sub- evaporation coating machine 2, the model MEB-600 of plasma evaporation coating machine 2, the fixed peace in the left side of plasma evaporation coating machine 2 Equipped with the discharge tank 3 for being located at 1 top of pedestal, the top of pedestal 1 is fixedly installed with the evaporation tank 4 positioned at 3 left side of discharge tank, evaporation The top of case 4 is fixed to be communicated with conveying pipeline 5, and the other end fixation of conveying pipeline 5 is communicated with the box 6 that feeds intake, and the side of evaporation tank 4 is fixed It is communicated with mixing tube 7, the top of discharge tank 3 is fixed to be communicated with intermediate tube 8, and the other end of intermediate tube 8 and the side of mixing tube 7 are solid Fixed connection provides discharge ion by plasma evaporation coating machine 2 for the inside of discharge tank 3, cooperates evaporation tank 4 to metalliferous material High temperature evaporation is carried out, so that gas ion and being evaporated that substance ion passes through mixing tube 7 respectively and intermediate tube 8 is mixed into connection Pipe 11 is conducive to the device and is effectively deposited to evaporated material or its reactant, to be conducive to improve compounding substances to plating The bombardment of part improves the quality of plating piece plated film, and the top of plasma evaporation coating machine 2 is fixedly installed with coated stove 9, coated stove 9 Screw top be socketed with nut cap 10, the other end fixation of mixing tube 7 is communicated with connecting tube 11, the other end of connecting tube 11 and plating The fixed connection in the side of film furnace 9, the bottom of nut cap 10 are fixedly installed with spiral shell block 12, and the bottom movable sleeve of spiral shell block 12, which is connected to, is located at plating Coating umbrella 13 inside film furnace 9, the bottom of spiral shell block 12 offer threaded hole, the outer surface on 13 top of coating umbrella be equipped with external screw thread and It is socketed with the inner thread of threaded hole, convenient for the replacement of coating umbrella 13, to be conducive to improve the property easy to use of the device, plates The bottom of 9 inner cavity of film furnace is fixedly installed with pallet 14, and the two sides at 14 top of pallet are fixedly installed with positioner 15, detent dress Setting 15 includes fixinig plate 151, and fixinig plate 151 is fixedly mounted on the top of pallet 14, and the lateral surface of fixinig plate 151 is movably installed with Motion bar 152, one end of motion bar 152 are fixedly installed with handle 153, and the other end of motion bar 152 runs through and extends to fixation The outside of 151 side of piece and be fixedly installed with push plate 154, the bottom of push plate 154 is fixedly installed with backing plate, and the bottom of backing plate with The top movable of pallet 14 connects, and improves the frictional force between push plate 154 and pallet 14, is conducive to the stability for improving plating piece, The medial surface of push plate 154 is sequentially connected by the medial surface of extension spring 155 and fixinig plate 151,155 movable set of extension spring In the outer surface of motion bar 152, and the both ends of extension spring 155 are fixed with fixinig plate 151 and the medial surface of push plate 154 connect respectively It connects, by push plate 154 outwardly against motion bar 152, so that elastic deformation occurs for extension spring 155, realizes the elasticity of push plate 154 Folding and unfolding is conducive to effectively consolidate to the plating piece of different size, is conducive to the property easy to use for improving the device, utilizes two The tight fit of positioner 15 is conducive to the stability for improving plating piece.
In conclusion the plasma coating device, the inside by plasma evaporation coating machine 2 for discharge tank 3 is provided Discharge ion, cooperation evaporation tank 4 carry out high temperature evaporation to metalliferous material, so that gas ion and being evaporated substance ion and leading to respectively It crosses mixing tube 7 and intermediate tube 8 is mixed into connecting tube 11, be conducive to the device and evaporated material or its reactant effectively sink Product improves the quality of plating piece plated film to be conducive to improve bombardment of the compounding substances to plating piece;By push plate 154 outwardly against Motion bar 152 is realized the elastic folding and unfolding of push plate 154, is conducive to different size so that elastic deformation occurs for extension spring 155 Plating piece carry out effectively firm, be conducive to the property easy to use for improving the device, using the tight fit of two positioners 15, Be conducive to improve the stability of plating piece;The mixing for solving the gas ion of conventional equipment and being evaporated between substance ion is inadequate Uniformly, cause evaporated material or its reactant to deposit not thorough enough, seriously affect the quality of plated film, do not adapt to a variety of plating pieces Specification, the extremely inconvenient problem of operation.
It should be noted that, in this document, relational terms such as first and second and the like are used merely to a reality Body or operation are distinguished with another entity or operation, are deposited without necessarily requiring or implying between these entities or operation In any actual relationship or order or sequence.Moreover, the terms "include", "comprise" or its any other variant are intended to Non-exclusive inclusion, so that the process, method, article or equipment including a series of elements is not only wanted including those Element, but also including other elements that are not explicitly listed, or further include for this process, method, article or equipment Intrinsic element.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art, It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.

Claims (6)

1. a kind of plasma coating device, including pedestal (1), it is characterised in that: be fixedly installed at the top of the pedestal (1) Plasma evaporation coating machine (2) is fixedly installed at the top of pedestal (1) on the left of the plasma evaporation coating machine (2) Discharge tank (3), the evaporation tank (4) being fixedly installed at the top of the pedestal (1) on the left of discharge tank (3), the evaporation tank (4) top fixation is communicated with conveying pipeline (5), and the other end fixation of the conveying pipeline (5) is communicated with the box that feeds intake (6), the steaming The side fixation of hair case (4) is communicated with mixing tube (7), and the top fixation of the discharge tank (3) is communicated with intermediate tube (8), described The other end of intermediate tube (8) is connected to the fixation of the side of mixing tube (7), and the top of the plasma evaporation coating machine (2) is fixed It is equipped with coated stove (9), the screw top of the coated stove (9) is socketed with nut cap (10), and the other end of the mixing tube (7) is solid Surely it is communicated with connecting tube (11), the other end of the connecting tube (11) is connected to the fixation of the side of coated stove (9), the nut cap (10) bottom is fixedly installed with spiral shell block (12), and the bottom movable sleeve of the spiral shell block (12) is connected to internal positioned at coated stove (9) The bottom of coating umbrella (13), coated stove (9) inner cavity is fixedly installed with pallet (14), and the two sides at the top of the pallet (14) are equal It is fixedly installed with positioner (15).
2. a kind of plasma coating device according to claim 1, it is characterised in that: the positioner (15) includes Fixinig plate (151), the fixinig plate (151) are fixedly mounted on the top of pallet (14), and the lateral surface of the fixinig plate (151) is living Dynamic to be set with motion bar (152), one end of the motion bar (152) is fixedly installed with handle (153), the motion bar (152) The other end run through and extend to the outside of fixinig plate (151) side and be fixedly installed with push plate (154), the push plate (154) Medial surface be sequentially connected by the medial surface of extension spring (155) and fixinig plate (151).
3. a kind of plasma coating device according to claim 2, it is characterised in that: the extension spring (155) is living The dynamic outer surface for being sleeved on motion bar (152), and the both ends of extension spring (155) respectively with fixinig plate (151) and push plate (154) Medial surface be fixedly connected.
4. a kind of plasma coating device according to claim 2, it is characterised in that: the bottom of the push plate (154) It is fixedly installed with backing plate, and the bottom of backing plate is connect with the top movable of pallet (14).
5. a kind of plasma coating device according to claim 1, it is characterised in that: open the bottom of the spiral shell block (12) Equipped with threaded hole, the outer surface on coating umbrella (13) top is equipped with external screw thread and is socketed with the inner thread of threaded hole.
6. a kind of plasma coating device according to claim 1, it is characterised in that: the plasma evaporation coating machine (2) model MEB-600.
CN201821118751.3U 2018-07-16 2018-07-16 A kind of plasma coating device Expired - Fee Related CN208378980U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821118751.3U CN208378980U (en) 2018-07-16 2018-07-16 A kind of plasma coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821118751.3U CN208378980U (en) 2018-07-16 2018-07-16 A kind of plasma coating device

Publications (1)

Publication Number Publication Date
CN208378980U true CN208378980U (en) 2019-01-15

Family

ID=64962515

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201821118751.3U Expired - Fee Related CN208378980U (en) 2018-07-16 2018-07-16 A kind of plasma coating device

Country Status (1)

Country Link
CN (1) CN208378980U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112195445A (en) * 2020-10-23 2021-01-08 刘慧� Plasma evaporation coating machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112195445A (en) * 2020-10-23 2021-01-08 刘慧� Plasma evaporation coating machine

Similar Documents

Publication Publication Date Title
CN208378980U (en) A kind of plasma coating device
CN201751427U (en) Linear evaporation source
CN208362448U (en) A kind of stiffened deep space grey PVD film
CN101469408A (en) Method for depositing diamond-like carbon film on stainless steel substrate
CN104099571A (en) Evaporation source component, film deposition device and film deposition method
CN107937877B (en) DLC coating apparatus based on anode technology
EP1775352A3 (en) Arc ion plating apparatus
CN106637207B (en) A kind of high temperature resistant diamond-like coating method in graphite substrate
TW202113148A (en) Electronic device, tempered reinforcing film thereof, and preparation method and application of tempered reinforcing film
CN105925940A (en) Multi-stage magnetic field arc ion plating method for lining positive bias straight pipe
CN107475668A (en) A kind of preparation method of high resistivity CN films
CN101634012A (en) Ion beam assisting magnetic control sputtering deposition device and method for surface protection
CN109913825A (en) A kind of PVD composite membrane layer preparation process of high vibration wear-resisting property
CN107794499B (en) A kind of fixed device of evaporation boat adjusting of high deposition rate vapor deposition
CN106319453A (en) Wire feeding mechanism of vacuum film plating machine
CN104372304A (en) Diamond-like carbon film preparation process
CN102330057A (en) Method for preparing metal ruthenium film for hard semiconductor component
CN204898053U (en) Vacuum atomizer
CN201890924U (en) Plasma vacuum ceramic coating device
CN209222486U (en) A kind of spray booth on insulating tube production line
CN209702845U (en) Film depositing homogeneous inlet duct
CN208667840U (en) Deposition ring and Pvd equipment for physical vapour deposition (PVD)
CN207526853U (en) A kind of miniature nut of Ti alloy with high performance
CN208378979U (en) A kind of adjustable structure evaporating source position
CN206935634U (en) A kind of sphere 3D product fixtures for painting

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20190115

Termination date: 20190716

CF01 Termination of patent right due to non-payment of annual fee