CN208328102U - Thermally decompose film preparation reaction unit - Google Patents

Abstract

The utility model discloses a kind of thermal decomposition film preparation reaction unit, the inside of quartz ampoule input end is coaxially provided with the compressed pipe passed through for precursor gas colloidal sol, sealing shroud is equipped at quartz ampoule outlet end, the sealing shroud is connected with exhaust collection cooling component, and outer cooling tube is cased with outside quartz ampoule outlet end；Gear air parcel is made of bar shaped interconnecting piece and occlusion part, and wherein occlusion part is n shape structure, is fixed at the top of the connection side of occlusion part with bar shaped interconnecting piece bottom end, is equipped with locking nut in the strip-shaped hole on the bar shaped interconnecting piece.The deposition boat for being horizontally arranged substrate is arranged in the utility model, the deposition boat has pyrolytic reaction chamber, and cooperate the necking of the first and second thermal resistance piece and compressed pipe that the flow field of pyrolytic reaction chamber, temperature field can be allowed constant, to make substrate near surface airflow field, temperature field constant, " activity " of presoma precursor gas colloidal sol is improved further through the mode of load short wavelength light and added electric field simultaneously, it is final to guarantee going on smoothly for pyrolytic reaction, improve the quality of forming film of film.

Description

Thermally decompose film preparation reaction unit

Technical field

The utility model belongs to field of film preparation more particularly to a kind of thermal decomposition film preparation reaction unit.

Background technique

In the industrial production, it is often necessary in substrate surface plated film.Existing thin film preparation process is mainly using thermal decomposition Mode, a kind of thermal decomposition manner is using tube furnace to the silicon in quartz ampoule, axis parallel of the substrate along quartz ampoule It is arranged or is obliquely installed, so that in substrate near surface pyrolytic reaction occurs for precursor gas colloidal sol species, thus in substrate surface Adhere to film.Also, pyrolysis carries out under normal pressure or low pressure and vacuum environment.

The defect of the prior art is as follows: 1, we have found that existing thermal decomposition manner can not make the thin of high quality always Film, however it is very complicated using the reaction mechanism that pyrolysis prepares film, and all not yet research is clear so far by those skilled in the art Chu.Present preliminary analysis film quality is related with the gentle even flow field degree in the temperature field of substrate near surface, and existing substrate Arrangement be it is open, not can guarantee the gentle even flow field in temperature field, constant of substrate near surface.Also, the quality of film Also related with precursor gas colloidal sol species " activity ", we also want to " activity " of precursor gas colloidal sol species when preparing film It is high as much as possible.In addition, existing pyrolysis carries out under low pressure, vacuum environment, the high requirements on the equipment is resulted in this way, Equipment price is expensive.Also, pyrolytic reaction is carried out in very pressure, must be requested that the environment of a relative closure is thus led Carry out continuous production has been caused to need to pay more costs, and equipment complexity also results in the raising of failure rate.

Utility model content

The technical problem to be solved by the utility model is to provide a kind of thermal decomposition film preparation reaction units, are intended to improve The quality of forming film of film.

The technical solution of the utility model is as follows: a kind of thermal decomposition film preparation reaction unit, including quartz ampoule (1), should The thermal decomposition part of quartz ampoule is located in the furnace chamber of tube furnace (2), it is characterised in that: the inside of quartz ampoule (1) input end It is coaxially provided with the compressed pipe passed through for precursor gas colloidal sol (3), the input end of the compressed pipe and the input end of quartz ampoule (1) Between sealed by sealing structure, the outlet end necking of compressed pipe (3), and be cased with interior cooling tube on compressed pipe (3) outer wall (4)；Be installed with the first thermal resistance piece (5) outside compressed pipe (3) outlet end, first thermal resistance piece simultaneously with the quartz ampoule (1) inner wall is fixed and is sealed；Sealing shroud (6) are equipped at quartz ampoule (1) outlet end, which is connected with exhaust collection Cooling component, and outer cooling tube (7) are cased with outside quartz ampoule (1) outlet end；The inside of quartz ampoule (1) outlet end is coaxial Equipped with the second thermal resistance piece (8), second thermal resistance piece is fixed with quartz ampoule (1) and seals, and the second thermal resistance piece (8) and described first It is equipped with deposition boat (C) in quartz ampoule (1) between thermal resistance piece (5), the deposition boat is for installing substrate, and the position of deposition boat (C) Set the furnace chamber of the corresponding tube furnace (2)；

The deposition boat (C) includes baffle (9) and gear air parcel (16), and wherein baffle (9) number is two panels, this two panels baffle (9) along the axial direction setting of the quartz ampoule (1), and it is connected by intermediate axial connecting rod (10)；Baffle described in two panels (9) phase Back to surface be coaxially fixed with a fixed ring (11), same axis clamping between the fixed ring and corresponding baffle (9) respectively There are multiple opening gaskets (12), these opening gaskets circumferentially mutual dislocation, and be open gasket (12) and the quartz ampoule (1) Inner wall is in close contact, and there are gaps between baffle (9) and fixed ring (11) and quartz ampoule (1) inner wall；Baffle described in two panels (9) correspondence is provided with a notch at center, and upper cover plate (13) and lower cover plate (14) are fitted between the two notches；On described, The two sides of lower cover plate (13,14) are respectively equipped with a height adjustment pad item (15), axis of the height adjustment pad item along quartz ampoule (1) To setting, and the pyrolytic reaction of a rectangular-shape is formed between upper and lower lids (13,14) and two height adjustment pad items (15) Chamber, and substrate is placed on the lower cover plate (14) upper surface；The gear air parcel (16) is made of bar shaped interconnecting piece and occlusion part, Middle occlusion part is n shape structure, is fixed at the top of the connection side of occlusion part with bar shaped interconnecting piece bottom end, on the bar shaped interconnecting piece It is equipped in strip-shaped hole locking nut (17), which is installed therein on a baffle (9), so as to adjust gear gas The height of block (16)；Gear air parcel (16) is located at the inlet end of deposition boat (C), and can be connected by keeping off the occlusion part of air parcel (16) Edge fit blocks the gap between upper cover plate (13) and corresponding baffle (9) notch, to prevent precursor gas colloidal sol from the gap Leakage.

In the above-mentioned technical solutions, compressed pipe (3) input end is connected with atomizer, thus the presoma for generating atomizer Precursor gas colloidal sol enters in compressed pipe, interior cooling tube (4) can first to high temperature presoma precursor gas colloidal sol cooling, prevent Only because temperature is excessively high pyrolytic reaction occurs in advance for presoma precursor gas colloidal sol, to guarantee presoma precursor gas colloidal sol Pyrolytic reaction just occurs at pyrolytic reaction chamber.The outlet end necking of compressed pipe (3), thus can be to the presoma forerunner of output Aerosol is compressed, and output pressure is improved, and guarantees that presoma precursor gas colloidal sol is moved along the axial line of quartz ampoule as far as possible It is dynamic, to guarantee the axial line presoma precursor gas colloidal sol even flow field along quartz ampoule as far as possible.Meanwhile tube furnace (2) is to stone English pipe (1) heating, so that the presoma precursor gas colloidal sol in quartz ampoule is allowed to heat up, and the first thermal resistance piece (5) and the second thermal resistance The organic cooperation of piece can effectively carry out thermal resistance, prevent heat from running helter-skelter, and by heat " lock " in the first thermal resistance piece (5) and the second thermal resistance Region between piece, and make the temperature field at deposition boat (C) constant, to guarantee going on smoothly for pyrolytic reaction, and then improve The quality of forming film of film.Also, substrate level is arranged, and intracavitary positioned at narrow pyrolytic reaction, high temperature presoma precursor gas Colloidal sol aggregation, be oppressed by the way that pyrolytic reaction occurs when narrow pyrolytic reaction chamber, the narrow intracavitary flow field of pyrolytic reaction, Temperature field is relatively stable, and then guarantees that substrate near surface flow field, temperature field are relatively stable, can thus effectively improve film at Film quality.In addition, being directed to different presoma precursor gas colloidal sol, height adjustment pad item (15) can also be adjusted to adjust upper cover The height of plate, so as to adjust the height of pyrolytic reaction chamber, to adapt to allow different presoma precursor gas colloidal sol can be most Pyrolytic reaction occurs for suitable space.

As the preferred of the utility model, a light loading hole (2a), and institute are provided on the bell of the tube furnace (2) The material for stating upper cover plate (13) is suprasil material, so that it is light loading hole (2a) and upper to pass through the short wavelength light of load Cover board (13) is irradiated to the substrate on lower cover plate (14).

In the above-mentioned technical solutions, the wavelength of short wavelength light is in 356nm hereinafter, such as ultraviolet light.Short wavelength light Effect be improve precursor gas sol particle " activity ", thus guarantee pyrolytic reaction go on smoothly and the extent of reaction, into And improve the quality of forming film of film.

As important optimization design, the upper and lower lids (13,14) are insulation board, and respectively with an electrode phase Even, the polarity of the two electrodes is opposite.

Using the above structure, an electric field can be formed between upper and lower lids (13,14), thus allow by forerunner Aerosol electrification, and then achieve the purpose that excite precursor gas colloidal sol " activity ", guarantee pyrolytic reaction go on smoothly with instead Degree is answered, the quality of forming film of film is finally further increased, this measure and load short wavelength light organically combine, thin for improving Film quality of forming film can play the effect of 1+1 > 2.It in the specific implementation process, upper and lower lids determines according to actual conditions The polarity of (13,14).

In the present case, the exhaust collection cooling component includes exhaust gas collecting pipe (18) and cover board (21), and wherein tail gas is received Collector (18) inlet end is connected with the centre bore of the sealing shroud (6), the outlet side of the exhaust gas collecting pipe and U-tube (19) into Gas end is connected, and the outlet side of the U-tube is connected with exhaust collection device；The U-tube (19) is located in water-cooled cylinder (20), the water cooling It is open by the cover board (21) closing at the top of cylinder (20).

Using the above structure, tail gas can be cooled down well, adverse current interferes substrate after preventing exhaust temperature excessively high The pyrolytic reaction at place is gone on smoothly, so as to improve the service performance of the utility model.

In order to further improve thermal resistance effect, the number of first thermal resistance piece (5) and the second thermal resistance piece (8) is respectively two Piece.

The utility model has the advantages that the deposition boat for being horizontally arranged substrate is arranged in the utility model, which has pyrolytic reaction Chamber, and cooperate the necking of the first and second thermal resistance piece and compressed pipe that the flow field of pyrolytic reaction chamber, temperature field can be allowed constant, to allow lining Bottom near surface airflow field, temperature field are constant, at the same further through load short wavelength light and added electric field mode improve presoma before It drives " activity " of aerosol, it is final to guarantee going on smoothly for pyrolytic reaction, improve the quality of forming film of film；Also, this case heat Solution reaction carries out under normal temperature and normal pressure, can thus reduce the requirement to equipment, reduces equipment cost.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of the utility model.

Fig. 2 is the schematic diagram of internal structure of Fig. 1 quartz ampoule.

Fig. 3 is the schematic diagram of deposition boat in Fig. 2.

Specific embodiment

The utility model is described in further detail with reference to the accompanying drawings and examples:

Such as Fig. 1 -- shown in 3, a kind of thermal decomposition film preparation reaction unit mainly includes quartz ampoule 1, tube furnace 2, compression Pipe 3, interior cooling tube 4 and first thermal resistance piece 5 etc. are constituted.Wherein, the thermal decomposition part of quartz ampoule 1 is located in the furnace chamber of tube furnace 2, The tube furnace 2 is outsourcing piece, for heating to quartz ampoule.In the present case, a light loading hole is provided on the bell of tube furnace 2 2a, the light loading hole 2a run through the top and bottom of bell, and light loading hole 2a can allow short wavelength light to pass through.

1 input end of quartz ampoule is connected when using with atomizer, thus the presoma precursor gas colloidal sol for allowing atomizer to occur Into in quartz ampoule 1.The inside of 1 input end of quartz ampoule is coaxially provided with the compressed pipe 3 passed through for precursor gas colloidal sol, the pressure It is sealed between the input end of the draw 3 and the input end of quartz ampoule 1 by sealing structure.In the present case, sealing structure is by input end Sealing shroud 22 and input end seal cover board 23 form, and wherein input end sealing shroud 22 is solidly set on 1 input end of quartz ampoule, the input end The annular portion of sealing shroud 22 and input end seal cover board 23 are coaxially connected, and the compressed pipe 3 and input end seal cover board 23 1 Body structure, and the input end of compressed pipe 3 is coaxially fixed with 23 inner plate surface of input end seal cover board.In being cased on 3 outer wall of compressed pipe Cooling tube 4, the interior cooling tube 4 are cooled down using water-cooling pattern, and the effect of interior cooling tube 4 is come to atomizer conveying High temperature precursor gas colloidal sol is cooled down, and prevents high temperature precursor gas colloidal sol from not reaching substrate also and pyrolysis just occurs, from And guarantees pyrolysis and occur at substrate.The outlet end necking of compressed pipe 3 can thus increase the output of precursor gas colloidal sol Air pressure when compressed pipe 3, to utmostly guarantee that precursor gas colloidal sol is moved along the axial line of quartz ampoule 1, before final guarantee Aerosol is driven in 1 axis line location even flow field of quartz ampoule.

Such as Fig. 1 -- shown in 3, it is installed with the first thermal resistance piece 5 outside 3 outlet end of compressed pipe, first thermal resistance piece is same When fix and seal with the inner wall of the quartz ampoule 1.In the present case, 5 number of the first thermal resistance piece is two panels, this first thermal resistance of two panels It is spaced 3-10mm between piece 5, thus can utmostly prevent hot gas toward the input end reverse flow of quartz ampoule 1, thermal resistance effect It is good.Sealing shroud 6 is equipped at 1 outlet end of quartz ampoule, which is connected with exhaust collection cooling component, and exports in quartz ampoule 1 End outside is cased with outer cooling tube 7, which uses water-cooling pattern, and effect is to prevent exhaust temperature excessively high, to avoid The tail gas of high temperature guarantees going on smoothly for pyrolytic reaction toward the reverse flow of pyrolytic reaction region.Exhaust collection cooling component Including exhaust gas collecting pipe 18 and cover board 21, wherein 18 inlet end of exhaust gas collecting pipe is connected with the centre bore of the sealing shroud 6, the tail The outlet side of gas collecting pipe 18 is connected with the inlet end of U-tube 19, and the outlet side of the U-tube is connected with exhaust collection device；The U Shape pipe 19 is located in water-cooled cylinder 20, and the opening at 20 top of water-cooled cylinder is closed by the cover board 21.

The inside of 1 outlet end of quartz ampoule is coaxially provided with the second thermal resistance piece 8, and second thermal resistance piece is fixed and close with quartz ampoule 1 Envelope, in the present case, the number of the second thermal resistance piece 8 are two panels, and the spacing between this second thermal resistance piece of two panels 8 is 5-20mm, and two The centre bore of the second thermal resistance piece of piece 8 is concentric, and with the axial line of quartz ampoule 1 on same straight line.Second thermal resistance piece 8 and first Deposition boat C is equipped in quartz ampoule 1 between thermal resistance piece 5, deposition boat C is for installing substrate, and the position respective tube of deposition boat C The furnace chamber of formula furnace 2.

Such as Fig. 1 -- shown in 3, deposition boat C includes baffle 9 and gear air parcel 16, and wherein 9 number of baffle is two panels, this two panels gear Piece 9 is arranged along the axial direction of quartz ampoule 1, and is connected by intermediate 3 axial connecting rods 10, this 3 axial direction connecting rods 10 are distributed On the same circumference.The opposite facing surface of two panels baffle 9 is coaxially fixed with a fixed ring 11 respectively, the fixed ring 11 with it is right There are multiple opening gaskets 12 with axis clamping between the baffle 9 answered, these circumferentially mutual dislocations of gaskets 12 that are open.In this case In, there are 2 opening gaskets 12, the gap position of this 2 opening gaskets 12 with axis clamping between fixed ring 11 and corresponding baffle 9 Relatively.Be open gasket 12 and 1 inner wall of quartz ampoule is in close contact, between baffle 9 and fixed ring 11 and 1 inner wall of quartz ampoule there are Gap prevents presoma leakage of aerosol to realize sealing by opening gasket 12.This case has bullet using opening gasket 12 The characteristics of property, is sealed, to solve the defect that can not effectively seal between rigid baffle 9, fixed ring 11 and quartz ampoule 1.

Correspondence is provided with a notch (unmarked in figure) at 9 center of two panels baffle, is fitted with one piece between the two notches Upper cover plate 13 and one piece of lower cover plate 14, this two cover plates are horizontal positioned.The two sides of upper cover plate 13 and lower cover plate 14 are respectively equipped with one Root height adjustment pad item 15, axial direction setting of the height adjustment pad item 15 along quartz ampoule 1.Upper cover plate 13, lower cover plate 14 and two The pyrolytic reaction chamber of a rectangular-shape is formed between height adjustment pad item 15, which is slit, and pyrolytic reaction The height of chamber can be realized by replacing different height adjustment pad items 15, to make different presomas in most suitable space Pyrolytic reaction occurs in the pyrolytic reaction chamber of size.Before pyrolytic reaction, substrate level is placed on to the upper surface of lower cover plate 14. Gear air parcel 16 is made of bar shaped interconnecting piece and occlusion part, and wherein occlusion part is n shape structure, the connection side top of occlusion part and bar shaped Interconnecting piece bottom end is fixed, and is equipped with locking nut 17 in the strip-shaped hole on the bar shaped interconnecting piece, which is installed therein On one baffle 9, so as to adjust the height of gear air parcel 16.Gear air parcel 16 is located at the inlet end of deposition boat C, and can pass through gear The occlusion part connection side bumper of air parcel 16 lives in the gap between cover board 13 and corresponding 9 notch of baffle, to prevent precursor gas molten Glue is revealed from the gap.In addition, the outlet side of deposition boat C is equipped with a pull block 30, the pull block 30 and two above-mentioned axis It is fixed to 10 end of connecting rod, and pull block 30 is used to that deposition boat C to be pulled out or is pumped into out of quartz ampoule 1, so as to demolition, installation Deposition boat C.

Such as Fig. 1 -- shown in 3, the material of upper cover plate 13 is suprasil material, so that the short wavelength light of load be made to pass through Light loading hole 2a and upper cover plate 13 are irradiated to the substrate on lower cover plate 14.Meanwhile upper cover plate 13, lower cover plate 14 are insulation Plate, and be connected respectively with an electrode, the polarity of the two electrodes is opposite.In addition, deposition boat C, compressed pipe 3, the second thermal resistance piece 8 With 5 axial line of the first thermal resistance piece on same straight line, and it is conllinear with the axial line of quartz ampoule 1.

The above is only the preferred embodiment of the utility model only, is not limitation with the utility model, all at this Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model Protection scope within.

Claims (5)

1. a kind of thermal decomposition film preparation reaction unit, including quartz ampoule (1), the thermal decomposition part of the quartz ampoule are located at tube furnace (2) in furnace chamber, it is characterised in that: the inside of quartz ampoule (1) input end is coaxially provided with one and leads to for precursor gas colloidal sol The compressed pipe (3) crossed passes through sealing structure between the input end of the input end and quartz ampoule (1) of the compressed pipe and seals, compressed pipe (3) outlet end necking, and interior cooling tube (4) are cased on compressed pipe (3) outer wall；The outside of compressed pipe (3) outlet end The first thermal resistance piece (5) are installed with, which fixes and seal with the inner wall of the quartz ampoule (1) simultaneously；The quartz It manages and is equipped with sealing shroud (6) at (1) outlet end, which is connected with exhaust collection cooling component, and in quartz ampoule (1) outlet end Outside is cased with outer cooling tube (7)；The inside of quartz ampoule (1) outlet end is coaxially provided with the second thermal resistance piece (8), second thermal resistance Piece is fixed with quartz ampoule (1) and seals, and sets in the quartz ampoule (1) between the second thermal resistance piece (8) and first thermal resistance piece (5) Have deposition boat (C), the deposition boat is for installing substrate, and the position of deposition boat (C) corresponds to the furnace chamber of the tube furnace (2)；

The deposition boat (C) includes baffle (9) and gear air parcel (16), and wherein baffle (9) number is two panels, this two panels baffle (9) Along the axial direction setting of the quartz ampoule (1), and it is connected by intermediate axial connecting rod (10)；Baffle described in two panels (9) is opposite Pair surface be coaxially fixed with a fixed ring (11) respectively, have between the fixed ring and corresponding baffle (9) with axis clamping Multiple opening gaskets (12), these gaskets circumferentially mutual dislocations that are open, and be open in gasket (12) and the quartz ampoule (1) Wall is in close contact, and there are gaps between baffle (9) and fixed ring (11) and quartz ampoule (1) inner wall；Baffle described in two panels (9) Correspondence is provided with a notch at center, and upper cover plate (13) and lower cover plate (14) are fitted between the two notches；The upper and lower cover The two sides of plate (13,14) are respectively equipped with a height adjustment pad item (15), which sets along the axial direction of quartz ampoule (1) It sets, and forms the pyrolytic reaction chamber of a rectangular-shape between upper and lower lids (13,14) and two height adjustment pad items (15), And substrate is placed on the lower cover plate (14) upper surface；The gear air parcel (16) is made of bar shaped interconnecting piece and occlusion part, wherein Occlusion part is n shape structure, is fixed at the top of the connection side of occlusion part with bar shaped interconnecting piece bottom end, the item on the bar shaped interconnecting piece It is equipped in shape hole locking nut (17), which is installed therein on a baffle (9), so as to adjust gear air parcel (16) height；Gear air parcel (16) is located at the inlet end of deposition boat (C), and can be connected by keeping off the occlusion part of air parcel (16) Side bumper lives in the gap between cover board (13) and corresponding baffle (9) notch, to prevent precursor gas colloidal sol from letting out from the gap Dew.

2. thermal decomposition film preparation reaction unit according to claim 1, it is characterised in that: the furnace of the tube furnace (2) It covers and is provided with a light loading hole (2a), and the material of the upper cover plate (13) is suprasil material, to make load Short wavelength light is irradiated to the substrate on lower cover plate (14) by light loading hole (2a) and upper cover plate (13).

3. thermal decomposition film preparation reaction unit according to claim 1, it is characterised in that: the upper and lower lids (13, 14) it is insulation board, and is connected respectively with an electrode, the polarity of the two electrodes is opposite.

4. thermal decomposition film preparation reaction unit according to claim 1, it is characterised in that: the cooling group of the exhaust collection Part includes exhaust gas collecting pipe (18) and cover board (21), wherein the center of exhaust gas collecting pipe (18) inlet end and the sealing shroud (6) Hole is connected, and the outlet side of the exhaust gas collecting pipe is connected with the inlet end of U-tube (19), the outlet side of the U-tube and exhaust collection Device is connected；The U-tube (19) is located in water-cooled cylinder (20), open by the cover board (21) envelope at the top of the water-cooled cylinder (20) It closes.

5. thermal decomposition film preparation reaction unit according to claim 1, it is characterised in that: first thermal resistance piece (5) Number with the second thermal resistance piece (8) is respectively two panels.