CN208065893U - A kind of circular regeneration processing system of FPD etching solution - Google Patents
A kind of circular regeneration processing system of FPD etching solution Download PDFInfo
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- CN208065893U CN208065893U CN201820371248.2U CN201820371248U CN208065893U CN 208065893 U CN208065893 U CN 208065893U CN 201820371248 U CN201820371248 U CN 201820371248U CN 208065893 U CN208065893 U CN 208065893U
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Abstract
The utility model provides a kind of circular regeneration processing system of FPD etching solution, can effectively filter the impurity in the liquid of discharge etching groove so that etching solution can be with cycling and reutilization.It includes holding the spent acid slot for excluding waste liquid, the bottom of the spent acid slot is provided with an export pipeline, the export pipeline is circumscribed with acid-proof pump, the output end of the export pipeline is external to corresponding first bag filter respectively by threeway and corresponding first branch pipe, the entrance of second bag filter, first bag filter, the outlet of second bag filter accesses the input port of two level manifold by corresponding second branch pipe respectively, the entrance of the delivery outlet connection third bag filter of the two level manifold, the outlet of the third bag filter accesses the entrance of nitration mixture slot by delivery trunk, it is provided with etching solution supply port at the top of the nitration mixture slot, the outlet of the nitration mixture slot is external to etching groove by efferent duct.
Description
Technical field
The utility model is related to the technical field of etching solution recycled, specially a kind of FPD etching solution
Circular regeneration processing system.
Background technology
As electronics industry shows the high speed development of equipment, in order to meet the needs of user is to light, thin product, plate glass
Thickness be down to 0.5 millimeter from 1.1 millimeters, the thickness of glass applied in the portable devices such as mobile phone more drop to 0.3 milli
Rice is hereinafter, but due to being limited by manufacturing process, thickness of glass substrate can not accomplish thinner, generally use object at present
Glass substrate is thinned for reason method and chemical method for etching.Since method for chemially etching is thinned, the time is short, and equipment investment is small, production
Product yield is high, and the ingredient of reducer is simple, at low cost, has been increasingly becoming the dominant technical approach of thinning glass substrate.
Chemical method for etching is mainly carried out using etching solution, is reacted with glass by HF acid, is made glass surface tegillum
Layer stripping.But the fluosilicate generated is adsorbed on glass surface, and surface is made to become coarse, while precipitation is attached in equipment pipeline
Wall, blocking pipeline, glass thinning etching liquid must be replaced often.
The fluorine-containing spent acid after etching mainly has following three kinds of processing modes at present：1) it directly disposes waste liquid, processing cost >
2000 yuan/ton, and spent acid fails to be recycled, and causes to waste；2) stand fining process, using classification staticly settle mode by
Step carries out.This method takes up a large area, and clarification acid solution efficiency is low, and about 30%；3) spent acid filter press technique, the precipitation in spent acid pass through
Filter press press filtration removes.This method is efficient, but floor space is larger, need to re-lay acid solution pipeline, filtering equipment and space
Preservative treatment, 250,000 yuan of required expense > need to all be carried out.Consider from clean manufacturing, resource recycling etc., above three
Kind spent acid processing method cannot all meet the production requirement of manufacturer very well.
Invention content
In view of the above-mentioned problems, the utility model provides a kind of circular regeneration processing system of FPD etching solution,
It can effectively filter the impurity in the liquid of discharge etching groove so that etching solution can be with cycling and reutilization.
A kind of circular regeneration processing system of FPD etching solution, it is characterised in that：It includes holding exclusion waste liquid
Spent acid slot, the bottom of the spent acid slot is provided with an export pipeline, and the export pipeline is circumscribed with acid-proof pump, the outlet
The output end on road is external to corresponding first bag filter, the second bag type filtering respectively by threeway and corresponding first branch pipe
The outlet of the entrance of device, first bag filter, the second bag filter accesses two by corresponding second branch pipe respectively
The input port of grade manifold, the entrance of the delivery outlet connection third bag filter of the two level manifold, the third bag type filtering
The outlet of device accesses the entrance of nitration mixture slot by delivery trunk, and etching solution supply port is provided at the top of the nitration mixture slot, described
The outlet of nitration mixture slot is external to etching groove by efferent duct.
It is further characterized by：It further includes having water inlet manifold, and the water inlet manifold is connected by the first water inlet pipe
The first branch pipe before the entrance of first bag filter, the water inlet manifold connect described second by the second water inlet pipe
The first branch pipe before the entrance of bag filter, the water inlet manifold connect the third bag type filtering by third water inlet pipe
Two level manifold before device entrance is disposed with the first outlet pipeline on the second branch pipe behind the outlet of first bag filter,
The second outlet pipeline is disposed on the second branch pipe behind the outlet of second bag filter, the third bag filter
Third outlet pipeline is disposed on delivery trunk behind outlet；It makes before bag filter is replaced, and can fully rinse filter
Bag eliminates security risk of the Liquid Residue to operator；
Two first branch pipes corresponding first water inlet pipe, the front of the second water inlet pipe it is right respectively
Should be arranged there are one valve, in two second branch pipes after corresponding first outlet pipeline, the second outlet pipeline
Side is respectively set there are one valve, the rear setting of the corresponding third outlet pipeline of the delivery trunk there are one valve,
It so that single channel can be opened according to actual conditions when operation or two-way works, and ensures working efficiency.
After the utility model, after the fluosilicate precipitation filtering in spent acid, by etching solution supply port to acid solution
Ingredient is added, and realizes that waste acidity recovery recycles, and since there are two-stage bag filters, can effectively filter discharge etching
Impurity in the liquid of slot so that etching solution can be with cycling and reutilization.
Description of the drawings
Fig. 1 is the structure schematic diagram of the utility model；
Title in figure corresponding to serial number is as follows：
Spent acid slot 1, export pipeline 2, acid-proof pump 3, the first branch pipe 4, the first bag filter 5, the second bag filter 6,
Second branch pipe 7, two level manifold 8, third bag filter 9, delivery trunk 10, nitration mixture slot 11, etching solution supply port 12, efferent duct
13, water inlet manifold 14, the first water inlet pipe 15, the second water inlet pipe 16, third water inlet pipe 17, the first outlet pipeline 18,
Two outlet pipelines 19, third outlet pipeline 20, valve 21, aqueduct valve 22.
Specific implementation mode
A kind of circular regeneration processing system of FPD etching solution, is shown in Fig. 1：It includes holding the spent acid for excluding waste liquid
The bottom of slot 1, spent acid slot 1 is provided with an export pipeline 2, and export pipeline 2 is circumscribed with acid-proof pump 3, and the output end of export pipeline 1 is logical
It crosses threeway and corresponding first branch pipe 4 is external to the entrance of corresponding first bag filter 5, the second bag filter 6 respectively,
The outlet of first bag filter 5, the second bag filter 6 accesses the defeated of two level manifold 8 by corresponding second branch pipe 7 respectively
Entrance, the entrance of the delivery outlet connection third bag filter 9 of two level manifold 8, the outlet of third bag filter 9 passes through output
Manifold 10 accesses the entrance of nitration mixture slot 11, and the top of nitration mixture slot 11 is provided with etching solution supply port 12, and the outlet of nitration mixture slot 11 is logical
It crosses efferent duct 13 and is external to etching groove.
It further includes having water inlet manifold 14, and water inlet manifold 14 connects the first bag filter 5 by the first water inlet pipe 15
Entrance before the first branch pipe 4, water inlet manifold 14 by the second water inlet pipe 16 connect the second bag filter 6 entrance before
First branch pipe 4, water inlet manifold 14 connect the two level manifold 8 before 9 entrance of third bag filter by third water inlet pipe 17, the
The first outlet pipeline 18, the outlet of the second bag filter 10 are disposed on the second branch pipe 7 behind the outlet of one bag filter 5
It is disposed with the second outlet pipeline 19 on the second branch pipe 7 afterwards, is arranged on the delivery trunk 10 behind the outlet of third bag filter 9
There is third outlet pipeline 20；It makes before bag filter is replaced, and can fully rinse filter bag, eliminates Liquid Residue to operator
Security risk；
Two first branch pipes 4 corresponding first water inlet pipe 15, the second water inlet pipe 16 front distinguish
It is correspondingly arranged there are one valve 21, in corresponding first outlet pipeline 18 of two second branch pipe, 4 institutes, the second outlet pipeline 19
Rear be respectively set there are one valve 21, there are one valves for the rear setting of 10 corresponding third outlet pipeline 20 of delivery trunk
21, so that single channel can be opened according to actual conditions when operation or two-way works, ensures working efficiency；
First water inlet pipe 15, the second water inlet pipe 16, third water inlet pipe 17, the water outlet of the first outlet pipeline 18, second
It is respectively arranged with aqueduct valve 22 on pipeline 19, third outlet pipeline 20.
Its operation principle is as follows：By in spent acid fluosilicate precipitation filtering after, by etching solution supply port to acid solution at
Divide and added, realizes that waste acidity recovery recycles, since there are two-stage bag filters, can effectively filter discharge etching groove
Liquid in impurity so that etching solution can be with cycling and reutilization.
Specific embodiment of the utility model is described in detail above, but content is only what the utility model was created
Preferred embodiment should not be construed as limiting the practical range of the utility model creation.All created according to the utility model is applied
All the changes and improvements made by range etc. should all still belong within this patent covering scope.
Claims (3)
1. a kind of circular regeneration processing system of FPD etching solution, it is characterised in that：It includes holding to exclude waste liquid
The bottom of spent acid slot, the spent acid slot is provided with an export pipeline, and the export pipeline is circumscribed with acid-proof pump, the export pipeline
Output end corresponding first bag filter, the second bag filter are external to by threeway and corresponding first branch pipe respectively
Entrance, first bag filter, the second bag filter outlet respectively pass through corresponding second branch pipe access two level
The input port of manifold, the entrance of the delivery outlet connection third bag filter of the two level manifold, the third bag filter
Outlet the entrance of nitration mixture slot is accessed by delivery trunk, etching solution supply port is provided at the top of the nitration mixture slot, it is described to mix
The outlet of acid tank is external to etching groove by efferent duct.
2. a kind of circular regeneration processing system of FPD etching solution as described in claim 1, it is characterised in that：It is also
Include water inlet manifold, the water inlet manifold connects before the entrance of first bag filter by the first water inlet pipe
One branch pipe, the water inlet manifold connect the first branch pipe before the entrance of second bag filter by the second water inlet pipe,
The water inlet manifold connects the two level manifold before the third bag filter entrance by third water inlet pipe, described first bag
The first outlet pipeline is disposed on the second branch pipe behind the outlet of formula filter, behind the outlet of second bag filter
The second outlet pipeline is disposed on two branch pipes, being disposed with third on the delivery trunk behind the outlet of the third bag filter goes out
Water lines.
3. a kind of circular regeneration processing system of FPD etching solution as claimed in claim 2, it is characterised in that：Two
The first branch pipe of root corresponding first water inlet pipe, the second water inlet pipe front be correspondingly arranged respectively there are one
Valve, two second branch pipes corresponding first outlet pipeline, the second outlet pipeline rear be respectively arranged with
One valve, there are one valves for the rear setting of the corresponding third outlet pipeline of the delivery trunk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820371248.2U CN208065893U (en) | 2018-03-19 | 2018-03-19 | A kind of circular regeneration processing system of FPD etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820371248.2U CN208065893U (en) | 2018-03-19 | 2018-03-19 | A kind of circular regeneration processing system of FPD etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208065893U true CN208065893U (en) | 2018-11-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820371248.2U Active CN208065893U (en) | 2018-03-19 | 2018-03-19 | A kind of circular regeneration processing system of FPD etching solution |
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| CN (1) | CN208065893U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111318070A (en) * | 2018-12-13 | 2020-06-23 | 夏泰鑫半导体(青岛)有限公司 | Filtering device and filtering system |
| CN113893594A (en) * | 2021-09-01 | 2022-01-07 | 甘肃光轩高端装备产业有限公司 | Etching liquid filtering system, glass production line and glass etching method |
-
2018
- 2018-03-19 CN CN201820371248.2U patent/CN208065893U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111318070A (en) * | 2018-12-13 | 2020-06-23 | 夏泰鑫半导体(青岛)有限公司 | Filtering device and filtering system |
| CN113893594A (en) * | 2021-09-01 | 2022-01-07 | 甘肃光轩高端装备产业有限公司 | Etching liquid filtering system, glass production line and glass etching method |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 215000 No. 168, Shanfeng Road, Wuzhong Economic Development Zone, Suzhou, Jiangsu Patentee after: Jingrui Electronic Materials Co.,Ltd. Address before: 215000 No. 168, Shanfeng Road, Wuzhong Economic Development Zone, Suzhou, Jiangsu Patentee before: SUZHOU CRYSTAL CLEAR CHEMICAL Co.,Ltd. |
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| CP01 | Change in the name or title of a patent holder |