CN206428324U - Purging system and its chemical vapor depsotition equipment - Google Patents
Purging system and its chemical vapor depsotition equipment Download PDFInfo
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- CN206428324U CN206428324U CN201720083107.6U CN201720083107U CN206428324U CN 206428324 U CN206428324 U CN 206428324U CN 201720083107 U CN201720083107 U CN 201720083107U CN 206428324 U CN206428324 U CN 206428324U
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Abstract
The utility model is related to a kind of purging system, for vacuum pipe cleaning, including detection means, ionization device, aspirator and switching device, content of the detection means on vacuum pipe and for detecting deposit in vacuum pipe, the ionization device connection vacuum pipe simultaneously is used to that vacuum pipe will can be injected with the cleaning substance of sediment reaction, the aspirator connects and is used for aspiration vacuum pipeline, and the switching device when the content of deposit exceedes preset upper limit value on vacuum pipe and for cutting off vacuum pipe.Consequently, it is possible to which when cleaning vacuum pipe, the trouble of dismounting vacuum pipe can be removed from, and outer cleaning need not be sent, save scavenging period and cost, especially, on-line cleaning can shorten the downtime of production equipment, improve production efficiency.
Description
Technical field
The utility model is related to technical field of manufacturing semiconductors, more particularly to a kind of to exempt to shut down the cleaning for unpicking and washing vacuum pipe
System and chemical vapor depsotition equipment.
Background technology
Apparatus for plasma chemical vapor deposition (the Plasma Enhanced Chemical that FPD industry is used
Vapor Deposition, PECVD), it is commonly used for preparing the film layer of material, such as amorphous silicon a-Si, and various silicon
Compound (SiO2, SixNy etc.).As shown in figure 1, PECVD device includes process cavity 1 ' and vavuum pump 2 ', process cavity 1 ' and true
Empty pump 2 ' is connected by vacuum pipe 3 '.However, in actual use, vavuum pump 2 ' is often stuck, so that PECVD device
Shut down to frequency, seriously reduce production efficiency.
It has been investigated that, PECVD device in use for some time, can have some white powders in vacuum pipe 3 '
Deposit so that when vavuum pump 2 ' is vacuumized to process cavity 1 ', the deposit in vacuum pipe 3 ' enters vavuum pump 2 ', so as to make
Blocked into the gap between the rotor and pump chamber of vavuum pump 2 ', stuck vavuum pump 2 '.
In order to solve the above problems, usual way is regularly dismounting vacuum pipe and to send outer cleaning.But, this way
It is not only cumbersome, and equipment downtime is long, and maintenance cost is high.
Utility model content
The purpose of this utility model is to provide a kind of purging system and chemical vapor depsotition equipment, need not dismantled
Vacuum pipe, it is especially non-stop-machine in the case of, the cleaning to vacuum pipe just can be completed, to solve PECVD device in dimension
The problems such as cost is high, cumbersome during shield, downtime is long.
In one embodiment, to achieve the above object, the utility model is used for what vacuum pipe was cleaned there is provided a kind of
Purging system, the purging system includes detection means, ionization device, aspirator and switching device；
The detection means is arranged on the vacuum pipe and is used for the content for detecting deposit in the vacuum pipe；
The ionization device connects the vacuum pipe and for that will can inject the vacuum with the cleaning substance of the sediment reaction
Pipeline；The aspirator connects and is used to aspirate the vacuum pipe；The switching device is arranged on the vacuum pipe
And for cutting off the vacuum pipe when the content of deposit exceedes preset upper limit value.
Preferably, the purging system also includes and the detection means, ionization device, aspirator and switching device
The control device of connection is communicated, the control device is used to control the switching device to cut off the vacuum pipe, and is used for
The ionization device and the aspirator is controlled to open.
Preferably, the vacuum pipe includes the multiple vacuum pipe units being arranged in parallel, and the detection means is arranged at
On at least one vacuum pipe unit, at least one described vacuum pipe list of ionization device connection corresponding with aspirator
Member；Wherein, the switching device is used to cut off at least one described vacuum pipe unit and realized in residual vacuum piping unit
The connection of at most one vacuum pipe unit.
Preferably, the purging system also includes the cleaning pipeline being connected with least one described vacuum pipe unit, leads to
Cross the cleaning pipeline and inject cleaning gas at least one described vacuum pipe unit.
Preferably, the ionization device being connected with least one described vacuum pipe unit is multiple, the suction dress
Put and be connected by multiple aspirations with least one described vacuum pipe unit.
Preferably, multiple detection means are provided with least one described vacuum pipe unit.
Preferably, the cleaning substance is fluoro free radical, the fluoro free radical and the sediment reaction containing element silicon
Generate volatile materials.
Further, the utility model additionally provides a kind of chemical vapor depsotition equipment, including deposit cavity, vacuum pipe and
Vavuum pump, one end of the vacuum pipe connects the deposit cavity, and the other end connects the vavuum pump, and the chemical vapor deposition
Product equipment also includes the purging system described in any of the above-described.
Preferably, the vacuum pipe of the chemical vapor depsotition equipment includes two vacuum pipe units being arranged in parallel.
Compared with prior art, purging system and chemical vapor depsotition equipment of the present utility model, pass through detection means
The content of deposit in vacuum pipe is monitored in real time, once the content of deposit exceedes preset upper limit value in vacuum pipe, is passed through
Opening ionization device just can be possible to introduce vacuum pipe with the cleaning substance that deposit reacts, separately by opening suction dress
Putting just can extract the reactant in vacuum pipe out.Consequently, it is possible to when cleaning vacuum pipe, eliminate the fiber crops of dismounting vacuum pipe
It is tired, and outer cleaning need not be sent, scavenging period and cleaning cost are saved, especially, due to purging system of the present utility model
For on-line cleaning, so the downtime of chemical vapor depsotition equipment can be shortened, production efficiency is improved.
More particularly, vacuum pipe of the present utility model includes multiple vacuum pipe units in parallel, the detection means
Be arranged at least one vacuum pipe unit, can also be arranged on different vacuum pipe units, the ionization device and
Aspirator may be selectively coupled to a few vacuum pipe unit.So, when deposition at least one vacuum pipe unit
When the content of thing exceedes preset upper limit value, corresponding vacuum pipe unit just disconnects with chemical vapor depsotition equipment, and protects simultaneously
Most vacuum pipe units are connected with chemical vapor depsotition equipment in card residual vacuum piping unit, so, it is possible to achieve
Multiple vacuum pipe units in parallel are carried out with the function of alternately cleaning, so as on the one hand avoid because of a vacuum pipe unit
Chemical vapor depsotition equipment halting problem caused by cleaning, it is ensured that cleaning and production can be while operation, on the other hand more
Individual vacuum pipe unit can be used alternatingly, and improve production efficiency, reduce maintenance cost.
Brief description of the drawings
Fig. 1 is the structured flowchart of PECVD device in the prior art；
Fig. 2 is the structured flowchart that the purging system of the utility model embodiment one and PECVD device are connected；
Fig. 3 is the structured flowchart that the purging system of the utility model embodiment two and PECVD device are connected；
Fig. 4 is the structured flowchart that the purging system of the utility model embodiment three and PECVD device are connected.
Fig. 2-4 description of reference numerals is as follows：
1- deposit cavities；
2- vacuum pipes；
21- main vacuum manifold units；22- aids in vacuum pipe unit；
3- vavuum pumps；
4- wash mills；
110- detection means；
120- ionization devices；
130- aspirators；
140- control devices；
150- cleans pipeline；
160- aspirations；
S- deposit sensors；
V1, V2, V3, V4, V5, V6, V7, V8, V9, V10, V11, V12- valve.
Embodiment
Below in conjunction with accompanying drawing 2 to Fig. 4 and specific embodiment to the utility model proposes a kind of purging system and chemistry
Vapor deposition apparatus is described in further detail.According to following explanation and claims, advantages and features of the present utility model
It will become apparent from.It should be noted that, accompanying drawing is using very simplified form and uses non-accurately ratio, only to it is convenient,
Lucidly aid in illustrating the purpose of the utility model embodiment.
<Embodiment one>
With reference to Fig. 2, it is the structured flowchart that is connected with PECVD device of purging system of the utility model embodiment one,
The vacuum pipe that the purging system of the present embodiment is used suitable for production equipment carries out on-line cleaning, and the production equipment is special
It is apparatus for plasma chemical vapor deposition (abbreviation PECVD device).For brevity, with PECVD device in describing below
As signal, structure and principle to purging system on-line cleaning vacuum pipe are described in detail, but should not be in this, as right
It is of the present utility model to limit.
As shown in Fig. 2 the PECVD device includes deposit cavity 1, vacuum pipe 2 and vavuum pump 3, the vacuum pipe 2
One end connects deposit cavity 1, the other end connection vavuum pump 3 of the vacuum pipe 2.The vavuum pump 3 is used to take out very deposit cavity 1
Sky, and the deposit cavity 1 is the reative cell for implementing plasma chemical vapor deposition technique.The purging system of the present embodiment includes
Detection means 110, ionization device 120, aspirator 130 and switching device (not shown).
The detection means 110 is arranged on vacuum pipe 2, the content for detecting deposit in vacuum pipe 2.
The ionization device 120 connection vacuum pipe 2 (optional link position is close to deposit cavity 1), for being possible to and institute
The cleaning substance injection vacuum pipe 2 of sediment reaction is stated, to remove the deposit in vacuum pipe 2.
(optional link position is compared to ionization device 120 away from deposit cavity for the connection of aspirator 130 vacuum pipe 2
1), for aspiration vacuum pipeline 2, such as vacuum suction etc., so as to pump the material (thing of the residual of residual in vacuum pipe 2
Matter includes reaction product and the cleaning substance being passed through etc.).
The switching device part is arranged on vacuum pipe 2, the break-make for realizing vacuum pipe 2.The switch dress
Put is valve, such as magnetic valve, check valve, stop valve in the present embodiment.For example in Fig. 2, the switching device includes setting
Another valve that a valve V1 in the input of neighbouring vavuum pump 3 and the output end in neighbouring deposit cavity 1 are set
V2, is respectively used to realize the break-make between vacuum pipe 2 and vavuum pump 3 and deposit cavity 1.The switching device also includes control ionization
The valve of device 120 and aspirator 130.
During PECVD device use, the principle of the on-line cleaning vacuum pipe 2 of purging system 10 is as follows：
First, plasma enhanced chemical vapor (is corresponded to by deposit in detection means 110 in real time detection vacuum pipe 2
Depositing operation, the deposit be the compound containing element silicon) content；Once the content of deposit surpasses in the vacuum pipe 2
Preset upper limit value is crossed, the connection between vacuum pipe 2 and vavuum pump 3 and deposit cavity 1 is cut off by the switching device, then,
It is separately turned on ionization device 120 and aspirator 130；After unlatching, the cleaning substance exported by ionization device 120 come with vacuum
Deposit carries out the volatile material (such as SiF4) of reaction generation in pipeline 2, so it is synchronous by aspirator 130 by vacuum tube
The material that reaction is produced in road 2 is extracted out outside pipeline；Finally, after cleaning is finished, close ionization device 120 and aspirator 130 is
Can.
In preferred scheme, the purging system also include control device 140, the detection means 110, ionization device 120,
Aspirator 130 and switching device are connected with the communication of control device 140, for realizing control device 140 to each device
Automatic regulation, can so realize the on-line automaticization cleaning of vacuum pipe, improve cleaning efficiency.Specifically, the control
Device 140 controls the switching device cut-out vacuum pipe 2 when the content of deposit exceedes the preset upper limit value, and
Control ionization device 120 and aspirator 130 are opened.
Preferably, in cleaning process, when the content for the deposit that the detection means 110 is detected reaches preset lower limit value
When, the control of control device 140 ionization device 120 is closed, it is highly preferred that after delay certain time, the control device 140
Control and suck device 130 is closed.Here, the preset upper limit value and lower limit are the data manually set, it can be with data shape
Formula is stored in control device 140.The control device 140 can use existing PLC equal controllers, and people in the art exists
On the basis of present disclosure, it should know how to realize control device and other equipment such as detection means 110, ionization
The communication connection of device 120, aspirator 130 and switching device.For example, the deposit detected when the detection means 110
Content when reaching preset upper limit value, the control device 140 sends a high level signal to switching device, works as switching device
When receiving the high level signal, just open to cut off the vacuum pipe 2 in production, afterwards, the control device 140 is received
After the open signal of switching device, another high level signal is just sent to ionization device 120 and aspirator 130, works as ionization
When device 120 and aspirator 130 receive another described high level signal, just open with to cut-off vacuum pipe 2
Cleaned.Conversely, when the content for the deposit that the detection means 110 is detected reaches preset lower limit value, the control
Device 140 sends a low level signal to ionization device 120 and aspirator 130, when ionization device 120 and aspirator
130 when receiving the low level signal, just closes to terminate the cleaning action of vacuum pipe 2.
It is highly preferred that the purging system also includes the cleaning pipeline 150 being connected with vacuum pipe 2, to be managed by cleaning
Road 150 injects cleaning gas into vacuum pipe 2, and the vacuum breaker of vacuum pipe so on the one hand can be achieved, is on the other hand easy to pipe
The residue of road inwall attachment drops because losing vacuum adsorption force, and then the residue dropped can pass through the row of aspirator 130
Go out.Specifically, in cleaning process, after the closing of ionization device 120, delay certain time closes aspirator 130, afterwards,
Vacuum pipe 2 is injected cleaning gas into by cleaning pipeline 150, cut-out cleans pipeline 150 preferably after certain time, then, then
Secondary unlatching aspirator 130 is purged, and so cleaning can more thoroughly wash vacuum pipe, lift the cleaning of vacuum pipe
Effect, and such operation can be also repeated several times.The optional clean gas is nitrogen or compressed air.
As shown in Fig. 2 being provided with a valve on the break-make in order to realize cleaning pipeline 150, the cleaning pipeline 150
V3, when needing to be passed through clean gas, the control valve V3 of control device 140 is opened, and is managed with connecting vacuum pipe 2 and cleaning
Road 150.Quantity of the quantity for cleaning pipeline 150 preferably with ionization device 120 matches, more preferably with ionization device 120
It is arranged in parallel.
Further, the detection means 110 is preferably deposit sensor S, and it may be in response to accumulate in vacuum pipe 2
The amount of tired deposit.The quantity of the deposit sensor S is preferably several and arranged for interval is on vacuum pipe 2.More enter
One step, when the content of any one deposit sensor S deposits detected exceedes the preset upper limit value, the switch
Device just cuts off the connection between vacuum pipe 2 and vavuum pump 3 and deposit cavity 1, and correspondingly, the ionization device 120 and takes out
Device 130 is inhaled to open therewith.The quantity of the deposit sensor S is chosen as 2~3, such as 3 shown in Fig. 2.
If the vacuum pipe 2 has one or more bends, because corner easily accumulates more deposits, because
This, is preferable over corner and arranges a deposit sensor S.
In the present embodiment, the ionization device 120 is plasma generator, and it can produce the stronger fluorine of chemism
Free radical (F*), to make the material that fluoro free radical is easily waved with deposit (such as SixNy, SiO2) the reaction production containing element silicon
(such as SiF4).In one embodiment, by fluorochemical (such as NF3) load ionization device 120, in ionization device 120 by
Fluorochemical formation fluoro free radical, fluoro free radical can be with unwanted sediment reaction and being consequently formed volatile materials.Example
Such as, by Nitrogen trifluoride (NF3) and can be formed fluoro free radical radical initiator (such as argon Ar) load ionization device 120,
And then fluoro free radical is generated, and fluoro free radical is delivered to vacuum pipe 2, the volatile materials of dereaction is removed from vacuum pipe 2.
Alternatively, the ionization device 120 has two input ports and an output port, and an input port is used for
Load fluoro free radical initiator, another input port is used to load fluorochemical, and the fluoro free radical of final reaction generation leads to
Cross output port output.
In a preferred scheme, the quantity of the ionization device 120 simultaneously connects a vacuum pipe 2 simultaneously for two,
One of them is preferably set adjacent to one end of vacuum pipe 2, and another is preferably set adjacent to the other end of vacuum pipe 2, in this way,
Vacuum pipe 2 is cleaned by forward and reverse, not only cleaning efficiency is high, and cleaning effect is good.
In the present embodiment, the aspirator 130 is vavuum pump, and its is quick detachable, and stability in the presence of a harsh environment and
Reliability is high.Certainly, the aspirator 130 can also be vacuum generator, but compared to vavuum pump, it is true produced by it
Reciprocal of duty cycle compare it is relatively low, therefore, in the occasion high to vacuum level requirements, preferably vavuum pump.
In a preferred embodiment, the aspirator 130 is connected by multiple aspirations 160 with vacuum pipe 2,
One end connection vacuum pipe 2 of each aspiration 160, other end connection aspirator 130.Specifically, each aspiration
160 other end is connected after linking together with the entrance of aspirator 130.Vacuum tube is purged by multiple aspirations 160
Road 2, can improve purging efficiency.As shown in Fig. 2 being respectively arranged with valve V4, a V5 in two aspirations 160, it is used for
The break-make of control correspondence aspiration.
In the above-described embodiments, the aspirator 130 connects the position of vacuum pipe 2, can also be and intersects at ionization
The connection vacuum pipe 2 of device 120 is located away from vavuum pump 3.
In the present embodiment, a valve V6 is provided with the output port of neighbouring ionization device 120, to control ionization to fill
Put the break-make of 120 and vacuum pipe 2.
It is preferred that the PECVD device also includes the wash mill 4 being connected with the output end of vavuum pump 3, the washing dress
Putting 4 is used to carry out nuisanceless disposal to the tail gas that vavuum pump 3 is discharged, such as burning, chemistry, physical treatment, to avoid industrial tail
Gas pollutes environment.Preferably, the outlet connection wash mill 4 of the aspirator 130.Alternatively, aspirator 130 and washing
One valve V7 of setting between device 4 is washed, moreover, separately setting a valve V8 between vavuum pump 3 and wash mill 4.
In addition, heating tape (not shown) is additionally provided with along the bearing of trend of vacuum pipe 2, with what is produced by heating tape
Heat avoids impurity from being attached on inner-walls of duct, to ensure that the normal of vacuum pipe is used.In addition, the control device 140 is excellent
Choosing includes alarm module, when the content of deposit in vacuum pipe 2 exceedes preset upper limit value or preset lower limit value, through described
Whether alarm module sends early warning, to point out to implement to clean or terminate cleaning.The alarm module is, for example, buzzer.
<Embodiment two>
The purging system provided in the present embodiment and embodiment one are essentially identical, are described below only for difference.
With reference to Fig. 3, it is the structured flowchart that is connected with PECVD device of purging system of the utility model embodiment two.
The vacuum pipe 2 of the present embodiment includes the multiple vacuum pipe units being arranged in parallel, in order to describe conveniently, now with two vacuum tubes
Road unit describes the present embodiment as an example, but should not be limited in this, as to of the present utility model.The cleaning of the present embodiment
System is used to carry out at least one vacuum pipe unit on-line cleaning, and during cleaning, it is ensured that unwashed vacuum pipe unit
In, unwashed vacuum pipe unit is connected with vavuum pump 3 and deposit cavity 1, to realize normal production operation, such setting
The equipment downtime problem because of caused by a piece vacuum pipe of cleaning can be avoided, it is ensured that cleaning and production can operations simultaneously.
Purging system for example shown in Fig. 3 is used to carry out on-line cleaning, the vacuum to one of vacuum pipe unit
Pipeline 2 includes the main vacuum manifold unit 21 being arranged in parallel and auxiliary vacuum pipe unit 22, the auxiliary vacuum pipe unit
22 one end is connected after being linked together with one end of main vacuum manifold unit 21 with deposit cavity 1, the auxiliary vacuum pipe list
The other end of member 22 is connected after being linked together with the other end of main vacuum manifold unit 21 with vavuum pump 3.
In one embodiment, one or more deposit sensor S are only arranged on main vacuum manifold unit 21, are used for
The content of deposit in main vacuum manifold unit 21 is detected, accordingly, the ionization device 120 and aspirator 130 connect
Main vacuum manifold unit 21 is connect to carry out washing and cleaning operation to it.Certainly, the utility model is merely illustrative of herein, practical application
In, the deposit sensor S can be also only arranged on auxiliary vacuum pipe unit 22, for detecting auxiliary vacuum pipe unit
The content of deposit in 22, while ionization device 120 and aspirator 130 are all connected with auxiliary vacuum pipe unit 22, with to auxiliary
Vacuum pipe unit 22 is helped to be cleaned.In a word, as long as the deposit sensor S is disposed therein a vacuum pipe unit
It is upper, and the ionization device 120 and aspirator 130, with detection means 110 accordingly, connect same vacuum tube
Road unit.
Then, only to clean for main vacuum manifold unit 21, in production process, when in the main vacuum manifold unit 21
When the content of deposit exceedes preset upper limit value, the switching device cuts off main vacuum manifold unit 21 by valve V9 and V10
With the connection between vavuum pump 3 and deposit cavity 1, and pass through valve V11 and V12 and ensure auxiliary vacuum pipe unit 22 and vavuum pump
After connection between 3 and deposit cavity 1, and then the ionization device 120 and the unlatching of aspirator 130, just to main vacuum manifold list
Member 21 is cleaned.The mode of cleaning specifically see embodiment one, such as positive and negative to clean simultaneously, pass through multiple aspirations 160
Suction, and clean gas is injected to main vacuum manifold unit 21 etc. by cleaning pipeline 150, here, no longer narration in detail.
And then, after the cleaning of main vacuum manifold 2 is finished, it just can control valve V11, V12 and open and cut off auxiliary vacuum tube
Road unit 22, so control valve V9, V10 closure and connect main vacuum manifold unit 21 and vavuum pump 3 and deposit cavity 1, after
Continuous production is just produced using main vacuum manifold unit 21.
<Embodiment three>
The purging system provided in the present embodiment and embodiment two are essentially identical, are described below only for difference.
As shown in figure 4, the structural frames that the purging system that it is the utility model embodiment three is connected with PECVD device
Indicate that the communication between each device and control device is connected in figure, figure with dotted line, it is upper same.
The vacuum pipe 2 of the present embodiment includes the multiple vacuum pipe units being arranged in parallel, in order to describe conveniently, now with two
Individual vacuum pipe unit describes the present embodiment as an example, but should not be limited in this, as to of the present utility model.This implementation
The purging system of example is used to carry out one of vacuum pipe unit on-line cleaning, and during cleaning, it is ensured that unwashed vacuum
In piping unit, unwashed vacuum pipe unit is connected with vavuum pump 3 and deposit cavity 1, to realize normal production operation, this
The setting of sample can avoid the equipment downtime problem because of caused by a piece vacuum pipe of cleaning, it is ensured that cleaning and production can be same
Shi Zuoye.
Purging system in the present embodiment is used to carry out on-line cleaning, each vacuum tube to any one vacuum pipe unit
One or more deposit sensor S are provided with road unit, for the content to deposit in corresponding vacuum pipe unit
Detected, and each vacuum pipe unit is at least connected with an ionization device 120 and an aspiration 160, then, when
When the content of deposit exceedes preset upper limit value in any one vacuum pipe unit, the switching device just cuts off the vacuum tube
Connection between road unit and vavuum pump 3 and deposit cavity 1, at the same time, the ionization device 120 and aspirator 130 are opened
To be cleaned to the vacuum pipe, such way can realize the cleaning to any one vacuum pipe unit, using more
For convenience, production efficiency is higher.
Specifically, the purging system for describing using two vacuum pipe units as signal and illustrating the present embodiment, i.e. institute
State deposit sensor S to be both arranged on main vacuum manifold unit 21, be arranged at again on auxiliary vacuum pipe unit 22.In addition,
Quantity of the quantity of the ionization device 120 in the present embodiment with vacuum pipe unit matches, such as two, one of them
Ionization device 120 is connected with main vacuum manifold unit 21, and another ionization device 120 is connected with auxiliary vacuum pipe unit 22.
In addition, the aspiration 160 at least two of the aspirator 130, one of aspiration 160 connects main vacuum manifold
Unit 21, another aspiration 160 connection auxiliary vacuum pipe unit 22.
According to disclosed in Fig. 4, in production process, when in the main vacuum manifold unit 21 that deposit sensor S is detected
When the content of deposit exceedes preset upper limit value, described valve V9, V10 open to cut off main vacuum manifold unit 21 and vavuum pump
Connection between 3 and deposit cavity 1, and valve V4 closures are to connect aspirator 130 and main vacuum manifold unit 21, another institute
Valve V5 is stated to open to cut off the connection of auxiliary vacuum pipe 22 and aspirator 130, at the same time, described valve V11, V12
Close to realize that auxiliary vacuum pipe unit 22 and connection between vavuum pump 3 and deposit cavity 1 are (certainly, now, auxiliary for cleaning
The ionization device 120 of vacuum pipe unit 22 is helped to close), in this way, closure valve V6, and open for cleaning main vacuum manifold list
The ionization device 120 of member 21, and aspirator 130, just can realize the cleaning to main vacuum manifold unit 21.It is such to set
Put, on the one hand by means of aiding in vacuum pipe unit 22 to realize normal production operation, on the other hand pass through ionization device 120
With aspirator 130, main vacuum manifold unit 21 can be implemented to clean.
Conversely, being preset when the content of deposit in the auxiliary vacuum pipe unit 22 that deposit sensor S is detected exceedes
During higher limit, described valve V11, V12 open to cut off between auxiliary vacuum pipe unit 22 and vavuum pump 3 and deposit cavity 1
Connection, and described valve V9, V10 close to realize the company between main vacuum manifold unit 21 and vavuum pump 3 and deposit cavity 1 simultaneously
Connect, another valve V4 opens to cut off the connection of aspirator 130 and main vacuum manifold unit 21, and corresponding valve V5 close with
Aspirator 130 and auxiliary vacuum pipe unit 22 are connected, and then, closure valve V6, and open for cleaning auxiliary vacuum tube
The ionization device 120 of road unit 22, and aspirator 130, the same cleaning that can be achieved to aiding in vacuum pipe unit 22.Such as
This one, normal production operation is on the one hand realized by main vacuum manifold unit 21, on the other hand passes through the He of ionization device 120
130 pairs of auxiliary vacuum pipe units 22 of aspirator implement cleaning.The purging system of the present embodiment, was used in PECVD device
Cheng Zhong, when wherein any one vacuum pipe implements cleaning, separately has a vacuum pipe normally to use, and then when the vacuum
It just can be put back into when pipeline cleaning is finished, at the same time just the vacuum pipe that used before can be implemented to clean, so
Alternately, can be with larger raising vacuum pipe in line use ratio, and can be with larger raising production efficiency.
The mode of cleaning specifically see embodiment one, such as positive and negative to clean simultaneously, be aspirated by multiple aspirations 160,
And by cleaning the injection clean gas of pipeline 150 to main vacuum manifold unit 21 or aiding in vacuum pipe unit 22 etc.,
This, no longer narration in detail.
In other embodiments, the quantity of the ionization device 120 be less than vacuum pipe unit quantity, such as one from
Makeup puts 120, and an ionization device 120 can selectively connect any one vacuum pipe unit by reversal valve, such as this implementation
The main vacuum manifold unit 21 or auxiliary vacuum pipe unit 22 of example.Specifically, it is described when cleaning main vacuum manifold unit 21
Reversal valve control ionization device 120 is connected with main vacuum manifold unit 21, and controls ionization device 120 and auxiliary vacuum pipe list
Member 22 disconnects, and when cleaning auxiliary vacuum pipe unit 22, the reversal valve control ionization device 120 and auxiliary vacuum pipe list
Member 22 is connected, and controls ionization device 120 to be disconnected with main vacuum manifold unit 21.
Similarly, the selectivity connection main vacuum manifold of aspirator 130 unit 21 can be also controlled by another reversal valve
Or auxiliary vacuum pipe unit 22, i.e. when cleaning main vacuum manifold unit 21, another reversal valve control and suck device
130 are connected with main vacuum manifold unit 21, and control and suck device 130 disconnects with auxiliary vacuum pipe unit 22, and clean auxiliary
When helping vacuum pipe unit 22, another reversal valve control and suck device 130 is connected with auxiliary vacuum pipe unit 22, and is controlled
Aspirator 130 processed disconnects with main vacuum manifold unit 21.Preferably, the communication of control device 140 connection reversal valve,
Realization is automatically controlled to reversal valve.
To sum up, the utility model preferred embodiment as described above, but be not limited to the scope disclosed in above-described embodiment,
The quantity of the quantity of such as valve and position, ionization device and aspiration is not limited to two, for another example be arranged in parallel
The quantity of vacuum pipe unit is preferably two, and cost and space are saved on the premise of primary demand is met.But, actually make
During, the quantity of vacuum pipe unit is not limited to two, if two or more, once detection means is detected in use
The content of deposit exceedes preset upper limit value in vacuum pipe unit, and the switching device of the application just cuts off the vacuum pipe unit
Cleaned, at the same time, in remaining stand-by vacuum pipe unit, select one of vacuum pipe unit to come into operation
And continue production and just may be used.
Compared with prior art, purging system and chemical vapor depsotition equipment of the present utility model, pass through detection means
The content of deposit in vacuum pipe is monitored in real time, once the content of deposit exceedes preset upper limit value in vacuum pipe, is passed through
Opening ionization device just can be possible to introduce vacuum pipe with the cleaning substance that deposit reacts, separately by opening suction dress
Putting just can extract the reactant in vacuum pipe out.Consequently, it is possible to when cleaning vacuum pipe, eliminate the fiber crops of dismounting vacuum pipe
It is tired, and outer cleaning need not be sent, scavenging period and cleaning cost are saved, especially, due to purging system of the present utility model
For on-line cleaning, so the downtime of chemical vapor depsotition equipment can be shortened, production efficiency is improved.
More particularly, vacuum pipe of the present utility model includes multiple vacuum pipe units in parallel, the detection means
Be arranged at least one vacuum pipe unit, can also be arranged on different vacuum pipe units, the ionization device and
Aspirator may be selectively coupled to a few vacuum pipe unit.So, when deposition at least one vacuum pipe unit
When the content of thing exceedes preset upper limit value, corresponding vacuum pipe unit just disconnects with chemical vapor depsotition equipment, and protects simultaneously
Most vacuum pipe units are connected with chemical vapor depsotition equipment in card residual vacuum piping unit, so, it is possible to achieve
Multiple vacuum pipe units in parallel are carried out with the function of alternately cleaning, so as on the one hand avoid because of a vacuum pipe unit
Chemical vapor depsotition equipment halting problem caused by cleaning, it is ensured that cleaning and production can be while operation, on the other hand more
Individual vacuum pipe unit can be used alternatingly, and improve production efficiency, reduce maintenance cost.
Foregoing description is only the description to the utility model preferred embodiment, not to any limit of the utility model scope
Calmly, the those of ordinary skill in the utility model field does according to the disclosure above content any change, modification, belonging to right will
Seek the protection domain of book.
Claims (9)
1. a kind of purging system, for vacuum pipe cleaning, it is characterised in that the purging system includes：
Detection means for detecting deposit content in the vacuum pipe, is arranged on the vacuum pipe；
For the ionization device of the vacuum pipe will can be injected with the cleaning substance of the sediment reaction, the vacuum is connected
Pipeline；
Aspirator for aspirating the vacuum pipe, connects the vacuum pipe；And
Switching device for cutting off the vacuum pipe when the content of deposit exceedes preset upper limit value, is arranged at described true
On vacant duct.
2. purging system as claimed in claim 1, it is characterised in that also including with the detection means, ionization device, suction
Device and the control device of switching device communication connection, the control device are used to control the switching device cut-out described true
Vacant duct, and for controlling the ionization device and the aspirator to open.
3. purging system as claimed in claim 1, it is characterised in that the vacuum pipe includes the multiple vacuum being arranged in parallel
Piping unit, the detection means is arranged at least one vacuum pipe unit, and the ionization device is corresponding with aspirator
At least one described vacuum pipe unit of connection；Wherein, the switching device is used to cut off at least one described vacuum pipe list
Member and the connection for realizing at most one vacuum pipe unit in residual vacuum piping unit.
4. purging system as claimed in claim 3, it is characterised in that the purging system also includes and described at least one is true
The cleaning pipeline of vacant duct unit connection, at least one described vacuum pipe list is injected cleaning gas into by the cleaning pipeline
Member.
5. purging system as claimed in claim 3, it is characterised in that the institute being connected with least one described vacuum pipe unit
It is multiple to state ionization device, and the aspirator is connected by multiple aspirations with least one described vacuum pipe unit.
6. purging system as claimed in claim 3, it is characterised in that be provided with least one described vacuum pipe unit many
Individual detection means.
7. purging system as claimed in claim 1, it is characterised in that the cleaning substance is fluoro free radical, the fluorine is free
Base and the sediment reaction generation volatile materials containing element silicon.
8. a kind of chemical vapor depsotition equipment, it is characterised in that including deposit cavity, vacuum pipe and vavuum pump；The vacuum
One end of pipeline connects the deposit cavity, and the other end connects the vavuum pump, and also includes such as any one of claim 1 to 7
Described purging system.
9. chemical vapor depsotition equipment as claimed in claim 8, it is characterised in that the vacuum pipe includes what is be arranged in parallel
Two vacuum pipe units.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720083107.6U CN206428324U (en) | 2017-01-20 | 2017-01-20 | Purging system and its chemical vapor depsotition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720083107.6U CN206428324U (en) | 2017-01-20 | 2017-01-20 | Purging system and its chemical vapor depsotition equipment |
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| Publication Number | Publication Date |
|---|---|
| CN206428324U true CN206428324U (en) | 2017-08-22 |
Family
ID=59590454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720083107.6U Active CN206428324U (en) | 2017-01-20 | 2017-01-20 | Purging system and its chemical vapor depsotition equipment |
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| Country | Link |
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| CN (1) | CN206428324U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108176154A (en) * | 2017-12-25 | 2018-06-19 | 武汉华星光电半导体显示技术有限公司 | Dust-collecting equipment |
| CN114733857A (en) * | 2021-01-07 | 2022-07-12 | 中国科学院微电子研究所 | Vacuum pipeline cleaning system and method |
-
2017
- 2017-01-20 CN CN201720083107.6U patent/CN206428324U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108176154A (en) * | 2017-12-25 | 2018-06-19 | 武汉华星光电半导体显示技术有限公司 | Dust-collecting equipment |
| CN114733857A (en) * | 2021-01-07 | 2022-07-12 | 中国科学院微电子研究所 | Vacuum pipeline cleaning system and method |
| CN114733857B (en) * | 2021-01-07 | 2023-09-15 | 中国科学院微电子研究所 | Vacuum pipeline cleaning system and method |
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