CN207602574U - Display panel and display device - Google Patents
Display panel and display device Download PDFInfo
- Publication number
- CN207602574U CN207602574U CN201721708510.XU CN201721708510U CN207602574U CN 207602574 U CN207602574 U CN 207602574U CN 201721708510 U CN201721708510 U CN 201721708510U CN 207602574 U CN207602574 U CN 207602574U
- Authority
- CN
- China
- Prior art keywords
- layer
- display panel
- far
- tft
- light emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000010410 layer Substances 0.000 claims abstract description 338
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000002346 layers by function Substances 0.000 claims abstract description 34
- 238000010521 absorption reaction Methods 0.000 claims abstract description 4
- 230000006698 induction Effects 0.000 claims description 31
- 239000000126 substance Substances 0.000 claims description 13
- 238000002161 passivation Methods 0.000 claims description 11
- 230000001681 protective effect Effects 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 2
- 239000010409 thin film Substances 0.000 abstract description 11
- 230000000694 effects Effects 0.000 abstract description 6
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 229920001621 AMOLED Polymers 0.000 description 10
- 238000007641 inkjet printing Methods 0.000 description 8
- 238000007639 printing Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
The utility model provides a kind of display panel and display device.The display panel includes：Substrate, the substrate include active area and luminous zone；Tft layer is set in substrate and in the active area；Light emitting functional layer is set on the tft layer far from the substrate side and is electrically connected with the tft layer, and the light emitting functional layer includes luminescent layer, and luminescent layer is set in the luminous zone；Set on encapsulated layer of the light emitting functional layer far from the tft layer side, and the encapsulated layer covers the active area and luminous zone；Set on light shield layer of the encapsulated layer far from the light emitting functional layer side, the light shield layer is set in the active area, and the light shield layer includes dark shade matter, and the dark shade matter is for absorption or reflection light.The display panel of the utility model can be absorbed or be reflected external environmental light by light shield layer, and avoid thin film transistor (TFT) is electrically illuminated by the light influence, ensures display effect.
Description
Technical field
The utility model is related to display fields, and in particular to a kind of display panel and display device.
Background technology
Organic electroluminescent LED (Organic light-emitting diodes, OLED) display panel has certainly
It shines, the advantages that contrast is high, thickness is thin, visual angle is wide and reaction speed is fast, is the representative of flat panel display technology of new generation, it is more next
More praised highly by industry.And active matrix organic light-emitting diode (Active Matrix Organic Light
Emitting Diode, AMOLED) display panel has attracted the sight of everybody, and AMOLED panel is in small-medium size, pixel
Leading position is occupied in the panel market of 200ppi.However, the thin film transistor (TFT) in AMOLED display panels is receiving ambient light
It can cause electrically to drift about or stablize sexual abnormality during line, cause display abnormal.
Utility model content
In view of this, the utility model for solve in the prior art thin film transistor (TFT) receive light stimulation cause electrically to float
It moves, show the phenomenon that abnormal, provide a kind of display panel, specific technical solution is as follows.
A kind of display panel, the display panel include：
Substrate, the substrate include active area and luminous zone；
Tft layer in the substrate, and the tft layer is set in the active area；
Set on light emitting functional layer of the tft layer far from the substrate side, the light emitting functional layer with it is described
Tft layer is electrically connected, and the light emitting functional layer includes luminescent layer, and the luminescent layer is set in the luminous zone；
Set on encapsulated layer of the light emitting functional layer far from the tft layer side, and the encapsulated layer covers institute
State active area and luminous zone；
Set on light shield layer of the encapsulated layer far from the light emitting functional layer side, the light shield layer is set on the active area
It is interior, and the light shield layer includes dark shade matter, the dark shade matter is for absorption or reflection light.
Preferably, the light shield layer further includes organic Protective substances, and the dark shade matter is distributed in organic guarantor
It protects in substance, organic Protective substances are used to protect the display panel.
Preferably, surface of the encapsulated layer far from the light emitting functional layer is equipped with the first induction electrode, the shading
Layer is set on the surface of the encapsulated layer and first induction electrode, and the light shield layer is set on the surface far from the encapsulated layer
There is the second induction electrode, the light shield layer is used to that the first induction electrode and the second induction electrode to be electrically insulated and be separated.
Preferably, the display panel further includes flatness layer, and the flatness layer is set on the tft layer far from institute
State the side of substrate；The light emitting functional layer is set on surface of the flatness layer far from the substrate.
Preferably, the display panel further includes pixel defining layer, and the pixel defining layer is set on the light emitting functional layer
On surface far from the flatness layer, and the pixel defining layer covers the active area.
Preferably, the display panel further includes insulated column, and the insulated column is set on the pixel defining layer far from described
On the surface of flatness layer, the insulated column is set in active area.
Preferably, the light emitting functional layer further includes anode layer and cathode layer, and it is remote that the anode layer is set on the flatness layer
Side from the tft layer, and the anode layer is electrically connected with tft layer；The luminescent layer is set on institute
It states on surface of the anode layer far from the substrate, the cathode layer is set on surface of the luminescent layer far from the anode layer,
And the cathode layer covers the pixel defining layer and the insulated column.
Preferably, the tft layer include source electrode and drain electrode, the anode layer by it is described drain electrode with it is described thin
Film transistor layer is electrically connected.
Preferably, the display panel further includes passivation layer, and the passivation layer is set on the tft layer far from institute
It states on the surface of substrate.
Preferably, the tft layer includes back of the body channel-etch type configuration thin film transistor layer, conventional etch blocking
Configuration thin film transistor layer or coplanar etching structure tft layer.
The utility model additionally provides a kind of display device, and the display device includes any one embodiment institute of front
The display panel stated.
The beneficial effects of the utility model：The display panel of the utility model can be absorbed or be reflected by light shield layer outer
Boundary's ambient light, avoid thin film transistor (TFT) is electrically illuminated by the light influence, ensures display effect.
Description of the drawings
In order to illustrate more clearly of the technical scheme in the embodiment of the utility model, will make below to required in embodiment
Attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is only some embodiments of the utility model,
For those of ordinary skill in the art, without having to pay creative labor, it can also be obtained according to these attached drawings
Obtain other attached drawings.
Fig. 1 is the cross-sectional view of display panel that the utility model first embodiment provides.
Fig. 2 is the cross-sectional view of the utility model conventional etch barrier structure tft layer.
Fig. 3 is the cross-sectional view of the coplanar etching structure tft layer of the utility model.
Fig. 4 is the cross-sectional view of display panel that the utility model second embodiment provides.
Fig. 5 is the structure diagram of display device provided by the utility model.
Specific embodiment
As described below is the preferred embodiment of the utility model, it is noted that for the ordinary skill of the art
For personnel, under the premise of the utility model principle is not departed from, several improvements and modifications can also be made, these are improved and profit
Decorations are also considered as the scope of protection of the utility model.
The display panel 10 of the utility model first embodiment offer is please referred to, the display panel 10 includes：
Substrate 100, the substrate 100 include active area 11 and luminous zone 12.The active area 11 refers to include film crystalline substance
The region of body tube layer 200, the luminous zone 12 refer to the region for including luminescent layer 320.It is understood that the active area 11
It is misaligned with the luminous zone 12.
Tft layer 200 in the substrate 100, and the tft layer 200 is set on described active
In area 11.
Set on light emitting functional layer 300 of the tft layer 200 far from 100 side of substrate, the luminous work(
Ergosphere 300 is electrically connected with the tft layer 200.The light emitting functional layer 300 includes luminescent layer 320, described to shine
Layer 320 is set in the luminous zone 12.The light emitting functional layer 300 is for shining, wherein the luminescent layer 320 refers to forgive energy
Enough one layer or multilayers of luminous material.
Set on encapsulated layer 400 of the light emitting functional layer 300 far from 200 side of tft layer, and the envelope
Dress layer 400 covers the active area 11 and luminous zone 12.The encapsulated layer 400 is covered including tft layer 200 and hair
The region of light functional layer 300, for protecting the tft layer 200 and light emitting functional layer 300.
Set on light shield layer 500 of the encapsulated layer 400 far from 300 side of light emitting functional layer, the light shield layer 500 is set
In in the active area 11, and the light shield layer 500 includes dark shade matter, the dark shade matter for absorbing or
Reflection light.The light shield layer 500 is set in the active area 11, it is to be understood that the light shield layer 500 has covered described
Tft layer 200.Dark shade matter in the light shield layer 500 is protected for absorbing or emitting external environmental light
The tft layer 200 is not illuminated by the light influence electrically, ensures display effect.And the light shield layer 500 is without being set on hair
It is to shine in order to avoid light shield layer 500 blocks luminescent layer 320 and influence the illumination effect of display panel 10 in light area 12.
The display panel 10 can be organic electroluminescent LED (Organic light-emitting diodes,
OLED) display panel, active matrix organic light-emitting diode (Active Matrix Organic Light Emitting
Diode, AMOLED) display panel.
In further embodiment, the light shield layer 500 further includes organic Protective substances, the dark shade matter distribution
In organic Protective substances, organic Protective substances are used to protect the display panel 10.The light shield layer 500
Display bread 10 can be protected not pressed by the external world again from extraneous ambient light protective film encapsulated layer 200 to block or absorb
Power or extraneous corrosion.The Protective substances can be organic material, and the organic material is including polyimides etc..
In further embodiment, surface of the encapsulated layer 400 far from the light emitting functional layer 300 is equipped with the first sense
Electrode 610 is answered, surface of first induction electrode 610 far from the encapsulated layer 400 is equipped with insulating layer 620, the insulation
620 separate surface of layer are equipped with the second induction electrode 630.First induction electrode 610, insulating layer 620 and described second
Induction electrode 630 forms induction electrode 600.The induction electrode 600 is used to sense the position of touch.The light shield layer covers
Cover the induction electrode 600.
In further embodiment, the display panel 10 further includes flatness layer 700, and the flatness layer 700 is set on described
Side of the tft layer 200 far from the substrate 100.The light emitting functional layer 300 is set on the flatness layer 700 far from institute
On the surface for stating substrate 100.The flatness layer 700 makes to be set on flatness layer 700 for planarizing the tft layer 200
On film layer be more bonded.
In further embodiment, the display panel 10 further includes pixel defining layer 800, the pixel defining layer 800
On surface of the light emitting functional layer 300 far from the flatness layer 700, and the pixel defining layer 800 is covered and described is had
Source region 11.The pixel defining layer 800 is used to define pixel.
In further embodiment, the display panel 10 further includes insulated column 900, and the insulated column 900 is set on described
On surface of the pixel defining layer 800 far from the flatness layer 700, the insulated column 900 is set in active area 11.The insulated column
900 effect is that support color membrane substrates or other bases are played when display panel 10 is bonded color membrane substrates either other substrates
The effect of plate, to protect the component in the display panel 10 not by direct weight.
In further embodiment, the light emitting functional layer 300 further includes anode layer 310 and cathode layer 330, the anode
Layer 310 is set on side of the flatness layer 700 far from the tft layer 200, and the anode layer 310 and film crystal
Tube layer 200 is electrically connected.The luminescent layer 320 is set on surface of the anode layer 310 far from the substrate 100, described the moon
Pole layer 330 is set on surface of the luminescent layer 320 far from the anode layer 310, and the cathode layer 330 covers the pixel
Definition layer 800 and the insulated column 900.The anode layer 310 is used to load positive voltage, and generate hole；The cathode layer 330
For loading negative voltage, and generate electronics；The hole that the hole and the cathode layer 330 that the anode layer 310 generates generate exists
It is compound in the luminescent layer 320, to shine.
In further embodiment, the tft layer 200 includes source electrode 210 and drain electrode 220, the anode layer
310 are electrically connected by the drain electrode 220 with tft layer 200.
In further embodiment, the display panel 10 further includes passivation layer 1000, and the passivation layer 1000 is set on institute
It states on surface of the tft layer 200 far from the substrate 100.The passivation layer 1000 is used to protect the thin film transistor (TFT)
Layer 200.
In further embodiment, 200 layers of the thin film transistor (TFT) includes back of the body channel-etch type configuration thin film transistor layer
200a, conventional etch barrier structure tft layer 200b or coplanar etching structure tft layer 200c.
Referring to Fig. 1, the back of the body channel-etch type configuration thin film transistor layer 200a includes：
Grid 230, the grid 230 are set on the surface of the substrate 100.
Gate insulating layer 240, the gate insulating layer 240 cover the grid 230.
Active layer 250, the active layer 250 are set on surface of the gate insulating layer 240 far from the grid 230.
Preferably, the active layer 250 can be any one of oxide semiconductor layer, low-temperature polycrystalline silicon layer, amorphous silicon type layer etc..
The gate insulating layer 240 separates for the grid 230 to be electrically insulated with active layer 250.
It is exhausted far from the grid that source electrode 210 and drain electrode 220, the source electrode 210 and drain electrode 220 are set on the active layer 250
The surface of edge layer 240, and the source electrode 210 and drain electrode 220 are arranged at intervals.
Referring to Fig. 2, the conventional etch barrier structure tft layer 200b includes：
Grid 230, the grid 230 are set on the surface of the substrate 100.
Gate insulating layer 240, the gate insulating layer 240 are set on the substrate 100 and the grid 230 far from the base
On the surface at bottom 100.
Active layer 250, the active layer 250 are set on surface of the gate insulating layer 240 far from the grid 230.
Etch stop layer 260, the etch stop layer 260 are set on the active layer 250 far from the gate insulating layer 240
Surface on.The etch stop layer 260 is for protecting the active layer, in order to avoid liquid corruption is etched when preparing source electrode and drain electrode
Lose and influence the electrical property of the active layer 250.261 and second through-hole of first through hole is opened up on the etch stop layer 260
262, the first through hole 261 and second through-hole 262 are used to reveal part active layer 250.
Source electrode 210 and drain electrode 220, the source electrode 210 and drain electrode 220 are set on etch stop layer 260 far from the active layer
250 surface, and the source electrode 210 is connected by the first through hole 261 with the active layer 250, the drain electrode 220 passes through
Second through-hole 262 is connected with the active layer 250.It is understood that the first through hole 261 and second through-hole
262 when forming source electrode 210 and drain electrode 220, is filled by the material substance identical with the source electrode 210 and drain electrode 220, Ke Yili
Solution forms the first contact electrode (not shown), the shape in second through-hole 262 in the first through hole 261
Into the second contact electrode (not shown).The source electrode 210 is connected by the first through hole 261 with the active layer 250,
I.e. described source electrode 210 is connected by the first contact electrode of the first through hole 261 with the active layer 250.The drain electrode 220
It is connected by second through-hole 262 with the active layer 250, i.e., described drain electrode 220 passes through the second of second through-hole 262
Contact electrode is connected with the active layer 250.The source electrode 210 and drain electrode 220 are set by the etch stop layer 260 interval
It puts.
Referring to Fig. 3, the coplanar etching structure tft layer 200c includes：
Active layer 250, the active layer 250 are set on the surface of the substrate 100.
Gate insulating layer 240, the gate insulating layer 240 are set on surface of the active layer 250 far from the substrate 100,
And the 240 covering part active layer 250 of gate insulating layer.
Grid 230, the grid 230 are set on surface of the gate insulating layer 240 far from the active layer 250.
Etch stop layer 260, the etch stop layer 260 are set on the grid 230 far from the gate insulating layer 240
On surface and not by surface of the active layer 250 that the gate insulating layer 240 covers far from the substrate 100.260 open
If the first perforation 263 and the second perforation 264,250 part of active layer is revealed.
Source electrode 210 and drain electrode 220, the source electrode 210 and drain electrode 220 are set on the etch stop layer 260 to be had far from described
The surface of active layer 250, and the source electrode 210 is connected by first perforation 263 with the active layer 250, the drain electrode 220
It is connected by second perforation 264 with the active layer 250.It is understood that first perforation 263 and described second
Perforation 264 is filled when forming source electrode 210 and drain electrode 220 by the material substance identical with the source electrode 210 and drain electrode 220, can
With understanding, third contact electrode (not shown) is formed in first perforation 263, in second perforation 264
It is interior to form the 4th contact electrode (not shown).The source electrode 210 passes through first perforation 263 and the active layer 250
It is connected, i.e., described source electrode 210 contacts electrode by the third of first perforation 263 and is connected with the active layer 250.The leakage
Pole 220 is connected by second perforation 264 with the active layer 250, i.e., described drain electrode 220 passes through second perforation 264
The 4th contact electrode be connected with the active layer 250.The source electrode 210 and drain electrode 220 are arranged at intervals.Preferably, the source
Pole 210 and drain electrode 220 are arranged at intervals by the etch stop layer 260, grid 230, gate insulating layer 240.
The gate insulating layer 240 includes the first end face 241 being oppositely arranged and second end face 242, the first end face
241 intersect with the active layer 250, and the second end face 242 intersects with the active layer 250.
The grid 230 includes 231 and the 4th end face 232 of third end face being oppositely arranged, the third end face 231 and institute
It is intersecting to state active layer 250, the 4th end face 232 is intersected with the active layer 250.
The first end face 241 of the gate insulating layer 240 and the third end face 231 of the grid 230 are coplanar, the grid
The second end face 242 of insulating layer 240 and the 4th end face 232 of the grid 230 are coplanar.The gate insulating layer 240 and described
The coplanar structure of grid 230 is etched barrier layer 260 when forming etch stop layer 260 and covers simultaneously, to protect each film layer.
Referring to Fig. 4, the display panel 10 that the utility model second embodiment provides, the encapsulated layer 400 is far from described
The surface of light emitting functional layer 300 is equipped with the first induction electrode 610, and the light shield layer 500 is set on the encapsulated layer 400 and described
On the surface of first induction electrode 610, surface of the light shield layer 500 far from the encapsulated layer 400 is equipped with the second induced electricity
Pole 630, the light shield layer 500 are used to that the first induction electrode 610 and the second induction electrode 630 to be electrically insulated and be separated.Preferably,
The light shield layer 500 includes megohmite insulant, and the megohmite insulant is uniformly mixed with the dark shade matter, the insulant
Matter separates for 610 and second induction electrode 630 of the first induction electrode to be electrically insulated.It is understood that in the reality
Apply light shield layer 500 described in example be light shield layer be also by 610 and second induction electrode 630 of the first induction electrode insulate every
The insulating layer 620 opened, wherein 500 (insulating layer of first induction electrode 610, the second induction electrode 630 and the light shield layer
620) induction electrode 600 is formed.The light shield layer 500 can be blocked or be absorbed thin from extraneous ambient light protection at this time
Film encapsulated layer 200 can be realized and the first induction electrode 610 and the second induction electrode 630 are electrically insulated and are separated again.
In further embodiment, the display panel 10 further includes protective layer 1100, and the protective layer 1100 is set on institute
It states on the surface of surface and the induction electrode 600 far from the encapsulated layer 400 of the encapsulated layer 400 far from the cathode layer 330.
The protective layer 1100 is used to protect the display panel 10.
The preparation method of display panel 10 in the first embodiment includes the following steps.
Step S100 provides a substrate 100.
Step S200 forms tft layer 200 in the substrate 100.The tft layer 200 passes through Huang
Light processing procedure, inkjet printing, mode of printing make to be formed.
Step S300 forms passivation layer 1000 on surface of the tft layer 200 far from the substrate 100.
The passivation layer 1000 makes to be formed by inkjet printing, mode of printing.
Step S400 forms flatness layer on surface of the passivation layer 1000 far from the tft layer 200
700.The flatness layer 700 makes to be formed by inkjet printing, mode of printing.
Step S500 forms anode layer 310 on surface of the flatness layer 700 far from the passivation layer 1000, described
Anode layer 310 is electrically connected with the tft layer 200.The anode layer 310 makes to be formed by yellow light processing procedure.
Step S600 forms luminescent layer 320, the hair on surface of the anode layer 310 far from the flatness layer 700
Photosphere 320 is formed in the luminous zone 12 of the display panel 10.The luminescent layer 320 passes through yellow light processing procedure, inkjet printing, printing
Mode makes to be formed.
Step S700, on surface of the flatness layer 700 far from the passivation layer 1000 and the anode layer 310 is separate
Pixel defining layer 800 is formed on the surface of the flatness layer 700.The pixel defining layer 800 passes through inkjet printing, mode of printing
It makes and is formed.
Step S800 forms insulated column 900 on surface of the pixel defining layer 800 far from the flatness layer 700.Institute
Insulated column 900 is stated to make to be formed by yellow light processing procedure.
Step S900, on surface of the pixel defining layer 800 far from the flatness layer 700, the insulated column 900 it is remote
Cathode layer 330 is formed on surface from pixel defining layer 800 and surface of the luminescent layer 320 far from the anode layer 310.
The cathode layer 330 makes to be formed by yellow light processing procedure, inkjet printing, mode of printing.
Step S1000 forms encapsulated layer 400 on surface of the cathode layer 330 far from the pixel defining layer 800.
The encapsulated layer 400 makes to be formed by inkjet printing, mode of printing.
Step S1100 forms light shield layer 500 on surface of the encapsulated layer 400 far from the cathode layer 330, described
Light shield layer 500 includes dark shade matter, and the dark shade matter is for absorption or reflection light.The light shield layer 500
It makes to be formed by yellow light processing procedure, inkjet printing, mode of printing.
Referring to Fig. 5, the utility model additionally provides a kind of display device 20, it is arbitrary that the display device 20 includes front
A kind of display panel 10 described in embodiment.The display device can be but be not limited only to as e-book, smart mobile phone (such as
Android phone, iOS mobile phones, Windows Phone mobile phones etc.), tablet computer, flexible palm PC, flexible notebook electricity
Brain, mobile internet device (MID, Mobile Internet Devices) or Wearable etc. can be Organic Electricity
Photoluminescence diode (Organic light-emitting diodes, OLED) display device, two pole of active matrix organic light-emitting
Manage (Active Matrix Organic Light Emitting Diode, AMOLED) display device.
Embodiment described above only expresses the several embodiments of the utility model, and description is more specific and detailed,
But it should not be interpreted as limiting the scope of the present invention.It should be pointed out that for the common of this field
For technical staff, without departing from the concept of the premise utility, various modifications and improvements can be made, these all belong to
In the scope of protection of the utility model.Therefore, the protection domain of the utility model patent should be determined by the appended claims.
Claims (10)
1. a kind of display panel, which is characterized in that the display panel includes：
Substrate, the substrate include active area and luminous zone；
Tft layer in the substrate, and the tft layer is set in the active area；
Set on light emitting functional layer of the tft layer far from the substrate side, the light emitting functional layer and the film
Transistor layer is electrically connected, and the light emitting functional layer includes luminescent layer, and the luminescent layer is set in the luminous zone；
Set on encapsulated layer of the light emitting functional layer far from the tft layer side, and have described in encapsulated layer covering
Source region and luminous zone；
Set on light shield layer of the encapsulated layer far from the light emitting functional layer side, the light shield layer is set in the active area,
And the light shield layer includes dark shade matter, the dark shade matter is for absorption or reflection light.
2. display panel according to claim 1, which is characterized in that the light shield layer further includes organic Protective substances, institute
It states dark shade matter to be distributed in organic Protective substances, organic Protective substances are used to protect the display panel.
3. display panel according to claim 1, which is characterized in that table of the encapsulated layer far from the light emitting functional layer
Face is equipped with the first induction electrode, and the light shield layer is set on the surface of the encapsulated layer and first induction electrode, described
Surface of the light shield layer far from the encapsulated layer is equipped with the second induction electrode, and the light shield layer is used for the first induction electrode and the
Two induction electrodes, which are electrically insulated, to be separated.
4. display panel according to claim 1, which is characterized in that the display panel further includes flatness layer, described flat
Smooth layer is set on side of the tft layer far from the substrate；The light emitting functional layer is set on the flatness layer far from institute
It states on the surface of substrate.
5. display panel according to claim 4, which is characterized in that the display panel further includes pixel defining layer, institute
Pixel defining layer is stated on surface of the light emitting functional layer far from the flatness layer, and described in pixel defining layer covering
Active area.
6. display panel according to claim 5, which is characterized in that the display panel further includes insulated column, it is described every
It is set on surface of the pixel defining layer far from the flatness layer from column, the insulated column is set in active area.
7. display panel according to claim 6, which is characterized in that the light emitting functional layer further includes anode layer and cathode
Layer, the anode layer are set on side of the flatness layer far from the tft layer, and the anode layer and film crystal
Tube layer is electrically connected；The luminescent layer is set on surface of the anode layer far from the substrate, and the cathode layer is set on described
On surface of the luminescent layer far from the anode layer, and the cathode layer covers the pixel defining layer and the insulated column.
8. display panel according to claim 7, which is characterized in that the tft layer includes source electrode and drain electrode,
The anode layer is electrically connected by the drain electrode with the tft layer.
9. display panel according to claim 1, which is characterized in that the display panel further includes passivation layer, described blunt
Change layer to be set on surface of the tft layer far from the substrate.
10. a kind of display device, which is characterized in that the display device includes aobvious as claimed in any one of claims 1 to 9 wherein
Show panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721708510.XU CN207602574U (en) | 2017-12-08 | 2017-12-08 | Display panel and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721708510.XU CN207602574U (en) | 2017-12-08 | 2017-12-08 | Display panel and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207602574U true CN207602574U (en) | 2018-07-10 |
Family
ID=62763885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721708510.XU Active CN207602574U (en) | 2017-12-08 | 2017-12-08 | Display panel and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207602574U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109300957A (en) * | 2018-09-30 | 2019-02-01 | 京东方科技集团股份有限公司 | A kind of oled substrate and transparent display |
| CN114361225A (en) * | 2021-12-31 | 2022-04-15 | 长沙惠科光电有限公司 | Display panel |
-
2017
- 2017-12-08 CN CN201721708510.XU patent/CN207602574U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109300957A (en) * | 2018-09-30 | 2019-02-01 | 京东方科技集团股份有限公司 | A kind of oled substrate and transparent display |
| US11812640B2 (en) | 2018-09-30 | 2023-11-07 | Boe Technology Group Co., Ltd. | Display substrate having a projection of the display layer located within a projection of a light shielding layer, display device and transparent display including the same |
| CN114361225A (en) * | 2021-12-31 | 2022-04-15 | 长沙惠科光电有限公司 | Display panel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106654047B (en) | OLED display panel and preparation method thereof | |
| CN105390523B (en) | Flexible organic LED display panel | |
| CN110071225A (en) | Display panel and production method | |
| KR102162912B1 (en) | Organic electroluminescent device having touch panel and method for fabricating the same | |
| CN107293593B (en) | A kind of display panel and display device | |
| CN104953044B (en) | flexible OLED and preparation method thereof | |
| US20160343963A1 (en) | Flexible oled display device and manufacturing method thereof | |
| CN109216376A (en) | Display device | |
| CN104241298B (en) | TFT backplate structure and preparation method thereof | |
| CN104157678B (en) | Dot structure and circuit with high aperture | |
| CN106783881A (en) | A kind of flexible display panels and its manufacture method | |
| CN104112767B (en) | Array base palte, organic LED display panel and display device | |
| CN107644891A (en) | The preparation method of flexible OLED panel | |
| CN104576685A (en) | Organic light emitting display apparatuses and methods of manufacturing the organic light emitting display apparatuses | |
| CN208596710U (en) | Display panel and display device | |
| CN104103673A (en) | Organic light emitting diode (OLED) displayer and preparation method thereof | |
| CN104733456B (en) | A kind of array base palte and preparation method thereof, display device | |
| CN109378326A (en) | Display panel and preparation method thereof | |
| CN107895728A (en) | Array base palte, its preparation method and the display device including array base palte | |
| CN102522421A (en) | Flexible active element array substrate and organic electroluminescent element | |
| CN104218063A (en) | Organic light emitting display device and method of manufacturing the same | |
| CN109166880A (en) | Flexible OLED display panel and preparation method thereof | |
| CN106654063A (en) | Manufacturing method of flexible OLED display panel | |
| CN207602574U (en) | Display panel and display device | |
| CN109638020A (en) | Display panel and preparation method thereof, display module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200401 Address after: 518000 Rouyu international flexible display base, No.18 dingshanhe Road, Pingdi street, Longgang District, Shenzhen City, Guangdong Province Patentee after: SHENZHEN ROYOLE DISPLAY TECHNOLOGY Co.,Ltd. Address before: 518115 43 Universiade Software Town, 8288 Longgang Avenue, Henggang Street, Longgang District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Display panel and display device Effective date of registration: 20201020 Granted publication date: 20180710 Pledgee: CITIC Bank Limited by Share Ltd. Shenzhen branch Pledgor: SHENZHEN ROYOLE DISPLAY TECHNOLOGY Co.,Ltd. Registration number: Y2020980006952 |
|
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20240123 Granted publication date: 20180710 |
|
| PP01 | Preservation of patent right |