CN207435543U - A kind of small-sized plasma activated chemical vapour deposition coating apparatus - Google Patents
A kind of small-sized plasma activated chemical vapour deposition coating apparatus Download PDFInfo
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- CN207435543U CN207435543U CN201721538193.1U CN201721538193U CN207435543U CN 207435543 U CN207435543 U CN 207435543U CN 201721538193 U CN201721538193 U CN 201721538193U CN 207435543 U CN207435543 U CN 207435543U
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Abstract
A kind of small-sized plasma activated chemical vapour deposition coating apparatus is related to a kind of coating apparatus, and described device host is located above board, and door is equipped with before host, and door is equipped with observation window and circulating cooling water channel with baffle；Host upper end is equipped with radio-frequency power supply access port and reaction gas access port, the two interfaces access conduit jointly, and passes through uniform gas board and contacted with aura generation plate；Plate connection elevating mechanism occurs for aura, and isolating seal uses bellows；Vacuum chamber uses square structure, and outside is equipped with several standard vacuum flange-interfaces, and sample stage is located at the underface that plate occurs for vacuum chamber bottom aura.The device is very compact for lab design, and button fly front is equally big with vacuum chamber, is convenient to clean, safeguards；Aura generator is equipped with even mechanism of qi structure, makes the reaction gas being passed through evenly；Vacuum chamber reserves multiple vacuum flange interfaces, and Other Instruments of conveniently plugging into equipment, shell have water cooling plant, effectively protects equipment operational safety.
Description
Technical field
The present invention relates to a kind of vacuum coaters, are specially a kind of coating apparatus of plasma activated chemical vapour deposition.
Background technology
Plasma activated chemical vapour deposition（Plasma Enhanced Chemical Vapor Deposition, PECVD）
Technology is to generate the substances such as charged particle, free radical, active group using plasma discharge chemistry occurs instead in substrate surface
Answer the technology of deposition film.But existing PECVD plating Mo devices are not ideal enough into film uniformity.And without being suitble to experiment
The small-sized PECVD devices that room scientific research uses.
The content of the invention
The purpose of this utility model is to provide a kind of small-sized plasma activated chemical vapour deposition coating apparatus, the device pins
To the very compact of lab design, button fly front is equally big with vacuum chamber, is convenient to clean, safeguards；Aura generator is equipped with even
Mechanism of qi structure makes the reaction gas being passed through evenly；Vacuum chamber reserves multiple vacuum flange interfaces, and Other Instruments of conveniently plugging into is set
Standby, shell has water cooling plant, effectively protects equipment operational safety.
The purpose of this utility model is achieved through the following technical solutions：
A kind of small-sized plasma activated chemical vapour deposition coating apparatus, described device host are located above board, before host
Face is equipped with door, and door is equipped with observation window and circulating cooling water channel with baffle；Host upper end is equipped with radio-frequency power supply access port and instead
Gas access port is answered, the two interfaces access conduit jointly, and pass through uniform gas board and contacted with aura generation plate；Aura occurs plate and connects
Elevating mechanism is connect, isolating seal uses bellows；Vacuum chamber uses square structure, and outside connects equipped with several standard vacuum flanges
Mouthful, sample stage is located at the underface that plate occurs for vacuum chamber bottom aura；Sample stage is equipped with heating or two kinds of forms of magnetic absorption.
A kind of small-sized plasma activated chemical vapour deposition coating apparatus is equipped with door before the square vacuum chamber,
With cooling water channel, the also observation window with baffle on door.
A kind of small-sized plasma activated chemical vapour deposition coating apparatus, aura occur have triple layer hole above plate
Uniform gas board.
A kind of small-sized plasma activated chemical vapour deposition coating apparatus, aura occur plate and are equipped with sylphon seal.
Advantages of the present invention is with effect：
The utility model is directed to laboratory condition research and development manufacture, and complete machine is very compact.Vacuum chamber structure is reasonable, button fly front
It is equally big with vacuum chamber, it is convenient to clean, safeguards.Aura generator is equipped with even mechanism of qi structure, makes the reaction gas being passed through evenly.
Vacuum chamber reserves multiple vacuum flange interfaces, and Other Instruments of conveniently plugging into equipment, shell have water cooling plant, effectively protects equipment fortune
Row safety.
Description of the drawings
Fig. 1 is the utility model complete machine front view；
Fig. 2 is the half sectional view of the utility model host 1.
Component in figure：1 host, 2 circulating cooling water channels, 3 glass windows with baffle, 4 button fly fronts, 5 boards, 6 Roots
Pump, 7 mechanical pumps, 8 radio-frequency power supply access ports, 9 reaction gas access ports, 10 elevating mechanisms, 11 bellowss, 12 conduits, 13 squares
Plate, 17 baking headlamps, 18 sample stages, 19 insulated columns occur for vacuum chamber, 14 gases distribution case, 15 uniform gas boards, 16 aura.
Specific embodiment
The utility model is described in detail in illustrated embodiment below in conjunction with the accompanying drawings.
The utility model host is the square vacuum chamber of a 300X300X300, and outside weldings have cooling water channel, with drop
The temperature of low vacuum chamber.There is door before square vacuum chamber, door is equipped with the glass window with baffle.Vacuum chamber rear portion is equipped with
One CF100 vacuum flanges interface and two CF35 vacuum flanges interfaces, CF35 vacuum flange interfaces connect machine by flapper valve
Tool pumps, another CF35 vacuum flange interface is spare.There are one CF35 and two CF16 vacuum flanges for the left surface peace of vacuum chamber
Interface.Various instruments can be connected as needed.The right flank peace of vacuum chamber to connect there are one CF50, two CF16 vacuum flanges
Mouthful.Center is set there are one KF40 vacuum flange interfaces below vacuum chamber, and lobe pump is connected to by a flapper valve.Under vacuum chamber
Square corner is equipped with insulated column, is connected with the mode of screw thread with underlying holder.The top of vacuum chamber is equipped with gas and is distributed case, there is conduit
It is connected with external mass flowmeter, welding bellows is protected and isolates air outside conduit；Below its gas distribution case gas just
Against sample stage, gas is distributed case and the height of sample stage is adjusted by being located at the elevating mechanism outside square vacuum chamber.It can be square
Just regulation experiment parameter.Gas distribution case center is equipped with aura and plate occurs, and radio frequency is connected to by a ceramic seal connector
Power supply.
Embodiment
Host 1 is located at 5 top of board, is connected by insulated column 19.Host 1 is equipped with button fly front 4, button fly front 4 passes through two
Group hinge is connected with square vacuum chamber 13.Button fly front 4 is equipped with circulating cooling water channel 2 and the glass window 3 with baffle.Board
Place lobe pump 6 and mechanical pump 7 in 5 rears.The two pump groups are responsible for being evacuated host 1.1 upper end of host have radio-frequency power supply interface 8,
Reaction gas access port 9 accesses gas distribution case 14 by hollow conduit 12, and reaction gas passes through the even gas of triple layer aperture
After 15 even gas of plate, it is evenly distributed in aura and occurs on plate 16, under the action of radio-frequency power supply, aura occurs anti-around plate 16
Gas is answered to be ionized, film is gradually deposited on the substrate being placed on sample stage 18；It will in order to meet different experimental techniques
It asks, the height of gas distribution case 14 can adjust.Rotate clockwise or counterclockwise the handle above elevating mechanism 10, it is possible to rise
Height that is high or reducing gas distribution case 14；Its air-tightness is ensured by the bellows 11 being welded on above.Sample stage 18 can root
Magnetic absorption or specimen heating holder are replaced with according to technological requirement.In order to 13 bakeout degassing of square vacuum chamber and convenient for observation, side
Type vacuum chamber 13 is internally provided with two groups of baking headlamps 17,13 outside of square vacuum chamber has been reserved multiple standard vacuum flanges and connect
Mouthful, above-mentioned each vacuum flange interface can flexibly be used according to process requirements, both can connect vacuum at different levels as suction interface
Pump group, can also be as the interface for introducing electrode.
Claims (4)
1. a kind of small-sized plasma activated chemical vapour deposition coating apparatus, which is characterized in that described device host is located on board
It is square, door is equipped with before host, door is equipped with observation window and circulating cooling water channel with baffle；Host upper end connects equipped with radio-frequency power supply
Entrance and reaction gas access port, the two interfaces access conduit jointly, and pass through uniform gas board and contacted with aura generation plate；Aura
Generation plate connects elevating mechanism, and isolating seal uses bellows；Vacuum chamber uses square structure, and outside is equipped with several standard vacuums
Flange-interface, sample stage are located at the underface that plate occurs for vacuum chamber bottom aura.
2. a kind of small-sized plasma activated chemical vapour deposition coating apparatus according to claim 1, which is characterized in that described
Door is equipped with before square vacuum chamber, cooling water channel, the also observation window with baffle are carried on door.
A kind of 3. small-sized plasma activated chemical vapour deposition coating apparatus according to claim 1, which is characterized in that aura
The uniform gas board for having triple layer hole above plate occurs.
A kind of 4. small-sized plasma activated chemical vapour deposition coating apparatus according to claim 3, which is characterized in that aura
Generation plate is equipped with sylphon seal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721538193.1U CN207435543U (en) | 2017-11-17 | 2017-11-17 | A kind of small-sized plasma activated chemical vapour deposition coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721538193.1U CN207435543U (en) | 2017-11-17 | 2017-11-17 | A kind of small-sized plasma activated chemical vapour deposition coating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207435543U true CN207435543U (en) | 2018-06-01 |
Family
ID=62290135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721538193.1U Active CN207435543U (en) | 2017-11-17 | 2017-11-17 | A kind of small-sized plasma activated chemical vapour deposition coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207435543U (en) |
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2017
- 2017-11-17 CN CN201721538193.1U patent/CN207435543U/en active Active
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