CN203284461U - Gas distribution vertical type PECVD furnace - Google Patents
Gas distribution vertical type PECVD furnace Download PDFInfo
- Publication number
- CN203284461U CN203284461U CN2013202420624U CN201320242062U CN203284461U CN 203284461 U CN203284461 U CN 203284461U CN 2013202420624 U CN2013202420624 U CN 2013202420624U CN 201320242062 U CN201320242062 U CN 201320242062U CN 203284461 U CN203284461 U CN 203284461U
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- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000011148 porous material Substances 0.000 claims description 14
- 238000000151 deposition Methods 0.000 claims description 9
- 230000008021 deposition Effects 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 5
- 239000005357 flat glass Substances 0.000 claims description 4
- 229920000742 Cotton Polymers 0.000 claims description 3
- 239000003085 diluting agent Substances 0.000 claims description 3
- 238000009434 installation Methods 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 238000003825 pressing Methods 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000009413 insulation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
A gas distribution vertical type PECVD (plasma enhanced chemical vapor deposition) furnace which comprises a reactor, a cavity, an air passage system, a vacuum pipeline, an RF power supply and an electric control part, wherein the reactor comprises a gas distribution box and a gas screen plate, the gas screen plate is arranged on the surface of the gas distribution box, and an air hole space, a positive plate and a negative plate are arranged between each two air holes of the gas screen plate; the cavity comprises an air intake flange, an air out flange, an RF connecting flange and a heating pipe, process gas is loaded on the air intake flange, the heating pipe is uniformly distributed on the outer side of the cavity through a pressing block, and the RF power supply is connected with the reactor through the RF connecting flange; the air passage system comprises a combiner box arranged on a side of a furnace chamber, and the combiner box comprises six process gas pipes and an N2 pipe; the vacuum pipeline comprises a dry pump, a molecular pump, a roots pump and a control valve; the RF power supply adopts a power supply generator with the frequency of 13.56 MHz, and a matcher is mounted at the lower part of the cavity; the electric control part comprises a temperature controller, a pressure controller and an RF power supply controller, and the pressure controller comprises a pressure sensor and a voltage regulating butterfly valve.
Description
Technical field
The utility model relates to the rectilinear PECVD stove of a kind of gas distribution, the rectilinear PECVD stove of especially a kind of gas distribution.
Background technology
PECVD, full name are Plasma EnhancedChemical Vapor Deposition, that is: plasma enhanced chemical vapor deposition method.PECVD makes the ionization of gas that contains the film composed atom by microwave or radio frequency etc., form plasma body in part, and the plasma chemistry activity is very strong, is easy to react, and deposits desired film on substrate., for chemical reaction can be carried out at lower temperature, utilized the activity of plasma body to promote reaction, thereby this CVD is called plasma enhanced chemical vapor deposition.
Existing PECVD depositional mode is to enter in reactor after adopting the top air inlet by the gas sieve plate, and glass adopts vertical mode to insert, and this scheme can cause the difference between deposition up and down difference and each sheet, has affected the uniformity coefficient of rete.
The utility model content
The purpose of this utility model is to provide a kind of gas distribution rectilinear PECVD stove, it is characterized in that, the corresponding gas distribution case of every sheet glass, enter glass surface after disperseing by the gas sieve plate again after gas enters in the gas distribution case by top, to improve the homogeneity of gas distribution, thereby improve the evenness of membranous layer of big area deposition.
For reaching above purpose, the utility model provides a kind of gas distribution rectilinear PECVD stove, comprising:
one reactor, comprise a gas distribution case, one gas sieve plate, be arranged at this gas distribution case surface, this gas sieve plate has a plurality of pores, be uniformly distributed on this gas sieve plate, each this pore has a hole diameter, has a pore spacing between this pore, one positive plate, an and negative plate, has a battery lead plate spacing between this positive plate and this negative plate, the corresponding gas distribution case of every sheet glass, enter glass surface after disperseing by the gas sieve plate again after gas enters in the gas distribution case by top, to improve the homogeneity of gas distribution, thereby improve the homogeneity of product,
One chamber, be used for deposition, comprise: an inlet flange, one flange of giving vent to anger, one RF joint flange and a heating tube, process gas are contained on this inlet flange, and reacted gas is discharged by this flange of giving vent to anger, this heating tube is evenly distributed on the cavity outside and uses the insulating cotton filling by briquetting, and the RF power supply is connected with reactor by this RF joint flange;
One air-channel system, comprise a header box, is arranged at oven cavity side, and this header box comprises six process gas Guan Heyi road, road N2 pipes;
One vacuum-lines, be used for the final vacuum of assurance equipment and the continuous closed-loop of deposition pressure and control, and comprises a dried pump, a part pump, a lobe pump, and a by-pass valve control;
One RF power supply, adopted the power source generator of 13.56MHz, and matching box is arranged on the cavity bottom,, to reduce the wiring distance, reduces the decay of radio frequency; And
One electric control system, comprise a temperature regulator, a pressure controller, and the RF power-supply controller of electric, this pressure controller comprises a pressure transmitter, the pressure regulation butterfly valve.
The utility model has improved the homogeneity of gas distribution, thereby improves the evenness of membranous layer of big area deposition.
These purposes of the present utility model, characteristics, and the embodiment that advantage will be below, accompanying drawing, and detailed exposure in claim.
Description of drawings
Fig. 1 is the structural representation according to the reaction box of a preferred embodiment of the present utility model.
Embodiment
The rectilinear PECVD stove of a kind of gas distribution comprises:
one reaction box, comprise a gas distribution case 1, one gas sieve plate, be arranged at this gas distribution case surface, this gas sieve plate has a plurality of pores, be uniformly distributed on this gas sieve plate, each this pore has a hole diameter, has a pore spacing between this pore, one positive plate 2, an and negative plate 3, has a battery lead plate spacing between this positive plate 2 and this negative plate 3, the corresponding gas distribution case 1 of every sheet glass 4, gas is entered after gas distribution case 1 disperses by the gas sieve plate after interior again and is entered glass 4 surfaces by top, to improve the homogeneity of gas distribution, thereby improve the homogeneity of product,
Preferably, this pore is tapered hole, and this hole diameter is 2.7-2.9mm;
Preferably, this battery lead plate spacing is 28-32mm;
Preferably, this reaction box adopts 12 groups of electrodes, and every electrode fills 4 flake products, can disposablely add 48, and in order to prevent the phase mutual interference between electrode, the phase alternation setting between electrode, carry out shielding and the insulation of electrode simultaneously;
One chamber, be used for deposition, comprise: an inlet flange, one flange of giving vent to anger, one RF joint flange and a heating tube, process gas are contained on this inlet flange, and reacted gas is discharged by this flange of giving vent to anger, this heating tube is evenly distributed on the cavity outside and uses the insulating cotton filling by briquetting, and the RF power supply is connected with reactor by this RF joint flange;
One air-channel system, comprise a header box, is arranged at oven cavity side, and this header box comprises six process gas Guan Heyi road, road N2 pipes;
Preferably, this air-channel system further comprises a mass flow controller, be used for controlling flow, and two valves, the front and rear of installation and this mass flow controller, be used for guaranteeing the safe operation of described air-channel system;
Preferably, whole pipe fittings and the valve of this air-channel system are made by stainless steel;
One vacuum-lines, be used for the final vacuum of assurance equipment and the continuous closed-loop of deposition pressure and control, and comprises a dried pump, a part pump, a lobe pump, and a by-pass valve control;
Preferably, in order to prevent the generation that fires of special gas, this dried pump comprises a N2 gas ducting, is used for diluent gas, and this gas exhaust duct comprises a N2 gas ducting, is used for diluent gas;
One RF power supply, adopted the power source generator of 13-14MHz, and matching box is arranged on the cavity bottom,, to reduce the wiring distance, reduces the decay of radio frequency;
One electric control unit, comprise a temperature regulator, a pressure controller, and the RF power-supply controller of electric, this pressure controller comprises a pressure transmitter, the pressure regulation butterfly valve;
Preferably, temperature adopts four sections controls, and each section temperature can independently be set, also be furnished with open circuit, short circuit and overtemperature alarm function.
By above-described embodiment, the purpose of this utility model is by fully effective having reached.The personage who is familiar with this skill should be understood that the utility model includes but not limited to the content of describing in accompanying drawing and top embodiment.Any modification that does not depart from function and structure principle of the present utility model all will be included in the scope of claims.
Claims (6)
1. rectilinear PECVD stove of gas distribution comprises:
one reactor, comprise a gas distribution case, one gas sieve plate, be arranged at this gas distribution case surface, this gas sieve plate has a plurality of pores, be uniformly distributed on this gas sieve plate, each this pore has a hole diameter, has a pore spacing between this pore, one positive plate, an and negative plate, has a battery lead plate spacing between this positive plate and this negative plate, the corresponding gas distribution case of every sheet glass, enter glass surface after disperseing by the gas sieve plate again after gas enters in the gas distribution case by top, to improve the homogeneity of gas distribution, thereby improve the homogeneity of product,
One chamber, be used for deposition, comprise: an inlet flange, one flange of giving vent to anger, one RF joint flange and a heating tube, process gas are contained on this inlet flange, and reacted gas is discharged by this flange of giving vent to anger, this heating tube is evenly distributed on the cavity outside and uses the insulating cotton filling by briquetting, and the RF power supply is connected with reactor by this RF joint flange;
One air-channel system, comprise a header box, is arranged at oven cavity side, and this header box comprises six process gas Guan Heyi road, road N2 pipes;
One vacuum-lines, be used for the final vacuum of assurance equipment and the continuous closed-loop of deposition pressure and control, and comprises a dried pump, a part pump, a lobe pump, and a by-pass valve control;
One RF power supply, adopted the power source generator of 13-14MHz, and matching box is arranged on the cavity bottom,, to reduce the wiring distance, reduces the decay of radio frequency; And
One electric control system, comprise a temperature regulator, a pressure controller, and the RF power-supply controller of electric, this pressure controller comprises a pressure transmitter, the pressure regulation butterfly valve.
2. the rectilinear PECVD stove of a kind of gas distribution according to claim 1, wherein, this pore is tapered hole, this hole diameter is 2.7-2.9mm.
3. the rectilinear PECVD stove of a kind of gas distribution according to claim 1, wherein, this battery lead plate spacing is 28-32mm.
4. the rectilinear PECVD stove of a kind of gas distribution according to claim 1, wherein, this air-channel system further comprises: a mass flow controller, be used for controlling flow, and two valves, the front and rear of installation and this mass flow controller, be used for guaranteeing the safe operation of described air-channel system.
5. the rectilinear PECVD stove of a kind of gas distribution according to claim 1, wherein, whole pipe fittings and the valve of this air-channel system are made by stainless steel.
6. the rectilinear PECVD stove of a kind of gas distribution according to claim 1, wherein, this dried pump comprises a N2 gas ducting, is used for diluent gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013202420624U CN203284461U (en) | 2013-05-06 | 2013-05-06 | Gas distribution vertical type PECVD furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013202420624U CN203284461U (en) | 2013-05-06 | 2013-05-06 | Gas distribution vertical type PECVD furnace |
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| Publication Number | Publication Date |
|---|---|
| CN203284461U true CN203284461U (en) | 2013-11-13 |
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ID=49540834
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013202420624U Expired - Lifetime CN203284461U (en) | 2013-05-06 | 2013-05-06 | Gas distribution vertical type PECVD furnace |
Country Status (1)
| Country | Link |
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| CN (1) | CN203284461U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938187A (en) * | 2014-04-29 | 2014-07-23 | 东莞职业技术学院 | Large-area thin-film deposition PECVD (Plasma Enhanced Chemical Vapor Deposition) electrode structure and equipment |
| CN104141115A (en) * | 2013-05-06 | 2014-11-12 | 沙嫣 | Vertical gas distribution type PECVD furnace and manufacturing method thereof |
| CN108301682A (en) * | 2018-03-01 | 2018-07-20 | 江苏纽拓体育装备有限公司 | A kind of air dome that inflation is fast |
-
2013
- 2013-05-06 CN CN2013202420624U patent/CN203284461U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104141115A (en) * | 2013-05-06 | 2014-11-12 | 沙嫣 | Vertical gas distribution type PECVD furnace and manufacturing method thereof |
| CN104141115B (en) * | 2013-05-06 | 2017-04-12 | 南通强生光电科技有限公司 | Vertical gas distribution type PECVD furnace and manufacturing method thereof |
| CN103938187A (en) * | 2014-04-29 | 2014-07-23 | 东莞职业技术学院 | Large-area thin-film deposition PECVD (Plasma Enhanced Chemical Vapor Deposition) electrode structure and equipment |
| CN103938187B (en) * | 2014-04-29 | 2016-07-06 | 东莞职业技术学院 | Large area film deposition PECVD electrode structure and equipment |
| CN108301682A (en) * | 2018-03-01 | 2018-07-20 | 江苏纽拓体育装备有限公司 | A kind of air dome that inflation is fast |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Nantong Johnson Photoelectric Technology Co., Ltd. Assignor: Sha Xiaolin|Sha Yan Contract record no.: 2014320000315 Denomination of utility model: Vertical gas distribution type PECVD furnace and manufacturing method thereof Granted publication date: 20131113 License type: Exclusive License Record date: 20140417 |
|
| LICC | Enforcement, change and cancellation of record of contracts on the licence for exploitation of a patent or utility model | ||
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170103 Address after: 226400 Rudong Jiangsu Economic Development Zone, Rudong, Jialing River Road on the north side Patentee after: Nantong Johnson Photoelectric Technology Co., Ltd. Address before: 200336 Shanghai International Trade Center, room 2201, No. 1801, West Yan'an Road Patentee before: Sha Yan Patentee before: Sha Xiaolin |
|
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20131113 Effective date of abandoning: 20170412 |