CN207248834U - Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability - Google Patents
Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability Download PDFInfo
- Publication number
- CN207248834U CN207248834U CN201721057287.7U CN201721057287U CN207248834U CN 207248834 U CN207248834 U CN 207248834U CN 201721057287 U CN201721057287 U CN 201721057287U CN 207248834 U CN207248834 U CN 207248834U
- Authority
- CN
- China
- Prior art keywords
- titer
- automatic
- quantitative dosing
- chemical plating
- dosing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The utility model provides a kind of automatic dripping device for the automatic Titration potentiometer for being used to measure chemical plating fluid stability, which includes titer storage bottle (1), quantitative dosing device (4), the inlet tube (3) for being in fluid communication between titer storage bottle (1) and quantitative dosing device (4), titer reflux and exhaust pipe (6) and the quantitative dosing pipe (5) for being in fluid communication between quantitative dosing device (4) and test reaction container (7).The automatic dripping device of automatic Titration potentiometer for measuring chemical plating fluid stability eliminates the unstability that titer is manually added dropwise, and reduces manual operation accurately to control rate of titration and titer.
Description
Technical field
A kind of automatic dripping device is the utility model is related to, specifically, is related to a kind of for measuring chemical plating fluid stabilization
The automatic dripping device of the automatic Titration potentiometer of property.
Background technology
It is well known that to be nothing like electroplate liquid stably and controllable for chemical plating fluid.Electroplate liquid can be used 1 year or so, and chemical plating
Liquid, which is easy to the characteristics of degradation and decomposition, makes its service life very short, as chemical nickel ordinary life only has 6MTOs, is about used continuously 2 weeks, chemical
Copper can only also be used continuously one month, frequently arrange trade-in and aggravated wastewater treatment and the cost and pressure of discharge, and chemical
The unstability of plating solution and the nonstandard management for only relying on personal experience, cause exception to take place frequently, adjoint is the report of a large amount of workpiece
It is useless, even more make the matter worse to environmental improvement and cost control.
The way of chemical plating is by observing the color change of plating solution and measurement plating solution pH, main salt, complexing agent, stabilization at present
Agent, reducing agent, plating speed, by-product concentration etc., then the stability of plating solution is subjectively judged by rule of thumb, empirically consume and mend
Fill.The activity of chemical plating fluid is one coefficient by any of the above bath parameters and temperature, stirring etc. as a result, wherein high
Plating solution pH, main salt, reducing agent, plating speed, by-product concentration and temperature can improve plating solution activity, and complexing agent, stabilizer, reducing agent
It can suppress the activity of plating solution with stirring.In the actual production process, with the fluctuation of these parameters and the accumulation of side reaction product,
Bath stability is more next uncontrollable.
Utility model content
In order to overcome the defects of the prior art, the utility model provides a kind of for measuring chemical plating fluid stability
The automatic dripping device of automatic Titration potentiometer.In order to realize the purpose of this utility model, the technical solution of the utility model is such as
Under：
The utility model provides a kind of automatic dripping for the automatic Titration potentiometer for being used to measure chemical plating fluid stability
Device, the automatic dripping device include titer storage bottle (1), quantitative dosing device (4), for titer storage bottle (1) and calmly
Measure the inlet tube (3) being in fluid communication between doser (4), titer reflux and exhaust pipe (6) and for quantitative dosing device (4)
The quantitative dosing pipe (5) being in fluid communication between test reaction container (7).
In a preferred embodiment of the utility model, liquid level gauge (22) is set, for real-time in quantitative dosing device (4)
Detect the liquid level information in quantitative dosing device (4).
In a preferred embodiment of the utility model, liquid feeding pump (18) is connected with inlet tube (3).
The automatic dripping device of the automatic Titration potentiometer for measuring chemical plating fluid stability of the utility model has
Advantages below：Eliminate manually be added dropwise titer unstability, reduce manual operation with precision control rate of titration, temperature,
Time and the error for judging reaction end, make that stability test is easier, quick, specification.
The automatic dripping device for being used to measure the automatic Titration potentiometer of chemical plating fluid stability of the utility model is not only
It is easy to operate, it is quick feasible, and broken the puzzlement that chemical plating fluid stability can not quantify all the time, it is chemical plating liquid measure
Production is safeguarded, the research and development application of the stability influence factor of chemical plating fluid, high-end electronic element (such as chip, mold interconnecting Precision wire
Road) precise circuit etc., there is provided it is reliable to measure and monitoring.
The automatic dripping device for being used to measure the automatic Titration potentiometer of chemical plating fluid stability of the utility model can be with
Applied to the working solution stability management of the electroless copper on plastics, metal, semiconductor (silicon), nickel etc., so that it is non-to reduce plating solution
Normal abandonment, extends plating solution service life, reduces high-accuracy expensive electronic product defect ware (such as semiconductor), energy-saving and emission-reduction, steady
Determine quality, improve production efficiency.
The automatic dripping device of the automatic Titration potentiometer for measuring chemical plating fluid stability of the utility model exists
Used on laboratory and client's production line, effect is fairly obvious.
Brief description of the drawings
Fig. 1 is the structure diagram of the utility model；
Fig. 2 is the cooperation schematic diagram of the host with liquid level gauge, liquid feeding pump and control valve of the utility model.
Embodiment
For measuring the automatic Titration potentiometer of chemical plating fluid stability, including test reaction device, automatic dripping device
And host.
Test reaction device includes test reaction container (7) and magnetic agitation thermostat (14), wherein temperature sense rod
(8), reference electrode (calomel electrode) (9), working electrode (platinum electrode) (10) and pH electrodes (11) are placed on test reaction
In container (7) (wherein equipped with chemical plating solution to be measured (12)), and reference electrode (calomel electrode) (9), working electrode (platinum electricity
Pole) (10) and pH electrodes (11) be connected on host (15) by conducting wire respectively, and temperature sense rod (8) is connected by conducting wire
Onto magnetic agitation thermostat (14), and magnetic agitation thermostat (14) is connected by conducting wire with host (15).Temperature sense rod
(8) it is adjacent to and is placed with reference electrode (9), working electrode (10) and pH electrodes (11), which are adjacent to, is placed, reference electrode (9)
Relatively it is arranged on the inside of temperature sense rod (8) and pH electrodes (11) with working electrode (10).In test reaction container (7)
Stirring magnetic pole (13) is also placed with, test reaction container (7) is placed on magnetic agitation thermostat (14) above.
Automatic dripping device includes titer storage bottle (1), quantitative dosing device (4), inlet tube (3) and titer reflux
And exhaust pipe (6), wherein inlet tube (3) is the fluid communication being used between titer storage bottle (1) and quantitative dosing device (4),
The first control valve (19) is connected with titer reflux and exhaust pipe (6), for that will be remained in quantitative dosing device (4) (if residual
Stay) titer be back in titer storage bottle (1) and during toward input titer (2) in quantitative dosing device (4)
Exhaust.Liquid feeding pump (18) is connected with inlet tube (3), for the titer in titer storage bottle (1) is input to quantitative dosing
In device (4).
Automatic dripping device further includes quantitative dosing pipe (5), is connected with the second control valve (20) thereon, for by quantitative dosing
Titer (2) in device (4) is added drop-wise in test reaction container (7).
First control valve (19), the second control valve (20) and liquid feeding pump (18) can be controlled by other control units.
Host (15) includes input operation and output shows touch screen (16), can set or show：Prepare liquid temperature, pH, when
Between, potential change curve and stability test result；Mixing speed, the rate of addition of titer and dripping quantity and titer are dense
Degree；Different chemical plating fluids can be directed to and compile distinct program, and can edit and call according to need；It can set and call two kinds of test moulds
Formula：Titer titration and high temperature ageing method.When selecting high temperature ageing method, quantitative dosing device (4) is automatically closed.
Automatic Titration potentiometer further includes the cleaning solution or reaction terminating liquid being placed on directly over test reaction container (7)
Storage bottle (17), it is connected to host (15) by conducting wire and is connected by woven hose (23) and test reaction container (7) fluid
It is logical, third control valve (21) is connected with woven hose (23).
The operating procedure of automatic Titration potentiometer for measuring chemical plating fluid stability is as follows：
(1) host (15) is opened, sets test pattern as titer titration or high temperature ageing method, editor or selected test
Program, set temperature, pH value, mixing speed, rate of titration, concentration of standard solution etc. (if selected high temperature ageing method, not necessarily with
Below with quantitative dosing device (4) relevant operation)；
(2) toward the chemical plating solution to be measured (12) of addition specified amount in test reaction container (7), pH is adjusted, opens stirring
And heating；
(3) toward the corresponding titer (2) of addition in titer storage bottle (1)；
(4) liquid feeding pump (18) is opened, the input titer (2) into quantitative dosing device (4), and flow back and arrange by titer
Tracheae (6) is vented；
(5) treat that temperature is raised to design temperature, open quantitative dosing device (4), open operation, start automatic Titration；
(6) when current potential is undergone mutation, titer titration is automatically stopped titration, and high temperature ageing method is automatically stopped heating,
The reaction terminating liquid or cleaning solution being automatically imported at the same time in cleaning solution or reaction terminating liquid storage bottle (17), to safeguard reaction vessel
And electrode etc.；
(7) read test potential change curve and test result, calculating prepare liquid, which will be adjusted to target stability, to be needed to mend
The amount for the chemical constituent filled；
(8) chemical plating solution to be measured (12) is separately taken, after step (7) supplement adjustment, repeat step (2)-(6), confirm nothing
After by mistake, live vat operation is instructed.
The operating procedure of wherein automatic dripping device is as follows：When test pattern is titer titration, it is necessary to test
When titer being added dropwise in reaction vessel (7), start liquid feeding pump (18), the titer (2) in titer storage bottle (1) is input to
It is vented in quantitative dosing device (4) and by titer reflux and exhaust pipe (6), then will be quantitatively added by quantitative dosing pipe (5)
Titer (2) in medicine device (4) is added drop-wise in test reaction container (7).After being added dropwise, pass through titer reflux and exhaust pipe
(6) titer (2) of residual in quantitative dosing device (4) (if there is residual) is back in titer storage bottle (1).
Referring to Fig. 1 and Fig. 2, based on such scheme, present invention also provides a kind of preferred solution, concrete scheme are as follows：
The application also sets a liquid level gauge (22) in quantitative dosing device (4), it is communicated to connect with host (15), it is used for
Liquid level information in detection quantitative dosing device (4) in real time, and the liquid level information signal detected is sent to host (15), and
Host (15) is logical with the liquid feeding pump (18) in automatic dripping device, the first control valve (19) and the second control valve (20) respectively
Letter connection.
Such scheme specifically coordinates as follows：
When addition titer (2) in needing to quantitative dosing device (4), staff controls liquid feeding pump by host (15)
(18) work, liquid feeding pump (18) by titer storage bottle (1) titer (2) extract be input in quantitative dosing device (4) and
By controlling the first control valve (19) to be vented, liquid level gauge (22) detects the liquid level information in quantitative dosing device (4) in real time, and will
The liquid level information signal detected is sent to host (15).When the liquid level that host (15) detects is higher than in quantitative dosing device (4)
Liquid level 2/3rds when, host (15) then controls liquid feeding pump (18) to be stopped.
When needing to when titer (2) are added dropwise in test reaction container (7), staff passes through host (15) controllable the
Two control valves (20) are opened, until being added dropwise, then staff controls the second control valve (20) by host (15) again
Close.
When that titer (2) need not be added dropwise into test reaction container (7), staff can be real-time by host (15)
Understand the liquid level information in quantitative dosing device (4).When remaining titer (2) are not present in quantitative dosing device (4), then it is not required to
The first control valve (19) is opened, and when there are when remaining titer (2), staff passes through in quantitative dosing device (4)
Host (15) can control the first control valve (19) to open, the titer (2) in quantitative dosing device (4) flowed back by titer and
Exhaust pipe (6) is back in titer storage bottle (1), cost-effective so easy to recycling.
In this way, by the implementation of above-mentioned preferred solution, the application greatly improves work efficiency and has saved cost.
It is the main embodiment of the utility model above, is not intended to limit the right of utility model.
Change can still be given by not departing from the category of the substantive content of the utility model is applied, and this kind of change should still belong to this practicality
New category, because the utility model confining spectrum in claim and utility model content.
Claims (3)
1. for measure chemical plating fluid stability automatic Titration potentiometer automatic dripping device, it is characterised in that it is described from
Dynamic Dropping feeder includes titer storage bottle (1), quantitative dosing device (4), for titer storage bottle (1) and quantitative dosing device
(4) inlet tube (3) that is in fluid communication between, titer reflux and exhaust pipe (6) and for quantitative dosing device (4) and test instead
Answer the quantitative dosing pipe (5) being in fluid communication between container (7).
2. the automatic drip of the automatic Titration potentiometer according to claim 1 for being used to measure chemical plating fluid stability installs additional
Put, it is characterised in that liquid level gauge (22) is set in quantitative dosing device (4), for detecting the liquid level in quantitative dosing device (4) in real time
Information.
3. the automatic drip of the automatic Titration potentiometer according to claim 1 for being used to measure chemical plating fluid stability installs additional
Put, it is characterised in that liquid feeding pump (18) is connected with inlet tube (3).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721057287.7U CN207248834U (en) | 2017-08-23 | 2017-08-23 | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721057287.7U CN207248834U (en) | 2017-08-23 | 2017-08-23 | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207248834U true CN207248834U (en) | 2018-04-17 |
Family
ID=61881779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721057287.7U Active CN207248834U (en) | 2017-08-23 | 2017-08-23 | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207248834U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108693178A (en) * | 2018-05-15 | 2018-10-23 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
-
2017
- 2017-08-23 CN CN201721057287.7U patent/CN207248834U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108693178A (en) * | 2018-05-15 | 2018-10-23 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN206431040U (en) | A kind of Automatic On-line ammonia Nitrogen Analyzer | |
| CN111157681A (en) | Automatic liquid ph value adjusting system and method | |
| CN207248808U (en) | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability | |
| CN207248834U (en) | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability | |
| CN207248817U (en) | For measuring the automatic Titration potentiometer of chemical plating fluid stability | |
| EP0214846B1 (en) | Sample monitoring instrument for on-line application | |
| CN105948315A (en) | Online water quality monitoring and treating system for circulating water of fully-automatic cooling tower | |
| CN111060561A (en) | Device, method and system for monitoring ph value of liquid | |
| CN203299161U (en) | Multifunctional tin plate surface property testing device | |
| CN207248815U (en) | Test reaction device for the automatic Titration potentiometer for measuring chemical plating fluid stability | |
| CN109580755B (en) | System and method for online measurement and control of hydrogen peroxide concentration in fabric bleaching process | |
| CN206109562U (en) | A automatic regulating apparatus for in -pulp electrolysis pH value | |
| CN107064223B (en) | Online measurement and calibration system and method adopting intelligent trace dissolved oxygen analyzer | |
| CN207248813U (en) | Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability | |
| CN207248816U (en) | Potentiometric analyzer for on-line monitoring chemical plating fluid stability | |
| CN102539505A (en) | Online electrochemical measuring device | |
| CN205295529U (en) | Automatic supplementary device of potassium aurous cyanide | |
| CN104034760A (en) | Multifunctional tin plate surface characteristic testing device and use method thereof | |
| CN106970017A (en) | Many reference amounts regulate and control liquid corrosion experimental rig | |
| CN106622011A (en) | A blending and controlling system for a paint curtaining segment of a silvering line and a control method thereof | |
| CN209602181U (en) | A kind of pH Neutralization of Industrial Wastewater automatic control device | |
| CN219861635U (en) | Automatic control system for electrophoresis and automatic control complete machine | |
| CN207672148U (en) | Measurement device for the lasting monitoring of silver concentration in electroplating solution | |
| TWI715368B (en) | Electroplating additive concentration monitoring device | |
| KR100394194B1 (en) | automatic supply apparatus for chemical solution and control method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |