CN207248808U - Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability - Google Patents
Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability Download PDFInfo
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- CN207248808U CN207248808U CN201721060650.0U CN201721060650U CN207248808U CN 207248808 U CN207248808 U CN 207248808U CN 201721060650 U CN201721060650 U CN 201721060650U CN 207248808 U CN207248808 U CN 207248808U
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- chemical plating
- replenisher
- quantitative dosing
- adding device
- automatic adding
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Abstract
The utility model provides a kind of automatic adding device of the potentiometric analyzer for on-line monitoring chemical plating fluid stability, the automatic adding device includes chemical plating replenisher storage barrel (1), quantitative dosing device (4), for the inlet tube (3) being in fluid communication between chemical plating replenisher storage barrel (1) and quantitative dosing device (4), replenisher flows back and exhaust pipe (6) and the quantitative dosing pipe (5) for being in fluid communication between quantitative dosing device (4) and the auxiliary groove plating solution (7) of work on the spot liquid, the automatic adding device is arranged in a straight line.The automatic adding device of the utility model can supplement a variety of chemical plating replenishers at the same time, the unstability of manually addition chemical plating replenisher be eliminated, so as to improve the stability of coating to a certain extent, it is ensured that the uniformity of plating piece quality；The amount of labour of worker is reduced, is improved work efficiency, has saved cost；The control of chemical plating replenisher additive amount can be made more accurate.
Description
Technical field
A kind of automatic adding device is the utility model is related to, specifically, is related to one kind and is used for on-line monitoring chemical plating fluid
The automatic adding device of the potentiometric analyzer of stability.
Background technology
It is well known that chemical plating fluid is nothing like, electroplate liquid is stably and controllable, and electroplate liquid can be used 1 year or so, and chemical plating
Liquid, which is easy to the characteristics of degradation and decomposition, makes its service life very short, as chemical nickel ordinary life only has 6MTOs, is about used continuously 2 weeks, chemical
Copper can only also be used continuously one month.Frequently row's trade-in has aggravated wastewater treatment and the cost and pressure of discharge.Electroplate liquid
Manual sampling test be that once a day, and the manual sampling of chemical plating fluid analysis test is per hour once.Even if in this way, still
Have management not in time with it is not in place (can only such as analyze pH, main salt, reducing agent, other such as complexing agents, stabilizer, accessory substance,
When short 1 is small it is interior analyze at all it is endless), cause it is abnormal take place frequently, adjoint is scrapping for a large amount of workpiece, even more to environmental improvement
Make the matter worse with cost control.
The stability of plating solution is that plating solution pH, main salt, complexing agent, stabilizer, reducing agent, plating speed, by-product concentration etc. are comprehensive
Effect as a result, it is online 24 it is small when continual stability test filled up the blank of the accurate management of chemical plating.
Utility model content
In order to overcome drawbacks described above of the prior art, the utility model provides one kind and is used for on-line monitoring chemical plating fluid
The automatic adding device of the potentiometric analyzer of stability.In order to realize the purpose of this utility model, the technical side of the utility model
Case is as follows：
The utility model provides a kind of automatic addition of potentiometric analyzer for on-line monitoring chemical plating fluid stability
Device, the automatic adding device include chemical plating replenisher storage barrel (1), quantitative dosing device (4), are stored up for chemical plating replenisher
Deposit the inlet tube (3) being in fluid communication between bucket (1) and quantitative dosing device (4), replenisher reflux and exhaust pipe (6) and for fixed
The quantitative dosing pipe (5) that is in fluid communication between amount doser (4) and the auxiliary groove of work on the spot liquid (7), the automatic adding device into
One is arranged in a straight line.
In a preferred embodiment of the utility model, the number of automatic adding device is depending on to be supplemented in plating solution
The species of chemical plating replenisher.
In a preferred embodiment of the utility model, liquid feeding pump (17) is connected with inlet tube (3).
In a preferred embodiment of the utility model, liquid level gauge (22) is provided with quantitative dosing device (4), for reality
When detect liquid level information in quantitative dosing device (4).
The automatic adding device of the utility model has the following advantages：A variety of chemical plating replenishers can be supplemented at the same time, disappeared
Unstability except manually adding chemical plating replenisher, so as to improve the stability of coating to a certain extent, it is ensured that plating piece
The uniformity of quality；Trade-in need not frequently be arranged, the amount of labour of worker is reduced, improve work efficiency, saved into
This；The control of chemical plating replenisher additive amount can be made more accurate.
The automatic adding device of the utility model be included in 24 it is small when uninterruptedly monitor work vat stability on-line
In the potentiometric analyzer of changing condition, the timeliness that monitoring is safeguarded with adding replenisher is further improved, reduces laboratory sampling
Analyze operation and manually the plating solution ageing loss brought not in time of addition replenisher, its major advantage are：
(1) nondestructive testing, can be directly mounted at work on the spot liquid, without artificially sampling carry out stability test,
It can make addition supplement in time at any time, not add replenisher manually, mitigate operator's live load, reduce the hazardous of worker
Learn time of contact, safety and sanitation；
(2) 24 uninterruptedly monitor stability of the plating solution in different aging periods on-line when small, can add in time at any time
Supplement, reduces the frequency for stopping line addition replenisher maintenance, ensures the stability of production, makes chemical plating production is smooth can
Control, extends the quality and service life of plating solution, reduces the unexpected abnormality and waste liquid discharging amount of plating solution, energy-saving and emission-reduction, lifting production
Efficiency and quality；
(3) chemical plating fluid stability is made to be fluctuated in the range of a smaller, it is ensured that the uniformity of plating piece quality.For one
A little special accurate electronic components, as semiconductor core on piece microcosmic circuit or mold interconnecting antenna on precise circuit.Plating solution
Too stabilization is breaking then because of plating leakage；Plating solution activity is too high, then short-circuit because overflowing plating adhesion.The utility model can be chemical plating fluid
Stability continuous precision supervision provide strong support.
The characteristics of using chemical plating fluid redox chemistry reaction occurs for the utility model, utilizes reference electrode and work electricity
The change of pole timing monitoring plating solution potential difference during working or treating work, stability change is converted into by this potential difference, setting
Management and control target, then starts automatic adding device less than target.
The utility model utilizes potentiometric analyzer on-line monitoring chemical plating fluid stability change, such as electroless copper, silver, nickel
Deng.
The automatic adding device of the utility model, can adjust dosing according to target tube control value.
The potentiometric analyzer of automatic adding device including the utility model does not have to manual operation, safe and feasible, timeliness
Height, controls the change of chemical plating fluid stability whenever and wherever possible all the time, is the maintenance of chemical plating volume production, energy-saving and emission-reduction, high-end electricity
The precise circuit of subcomponent (such as chip, mold interconnecting precise circuit), there is provided reliable measurement and monitoring method.
The potentiometric analyzer of automatic adding device including the utility model can be applied to plastics, metal, semiconductor
The working solution stability management of electroless copper, nickel on (silicon) etc., so as to reduce plating solution abnormal scrap, extends plating solution and uses the longevity
Life, reduces high-accuracy expensive electronic product defect ware (such as semiconductor), saves artificial and man-hour, stabilizing quality, improve production effect
Rate.
Brief description of the drawings
Fig. 1 is the structure diagram of the utility model；
Fig. 2 is the cooperation schematic diagram of host and liquid level gauge, liquid feeding pump and control valve in the utility model.
Embodiment
For the potentiometric analyzer (such as Fig. 1) of on-line monitoring chemical plating fluid stability, including test reaction device, add automatically
Feeder apparatus and remote monitoring host.
Test reaction device includes temperature-compensating inductive rod (8), reference electrode (calomel electrode) (9), working electrode (platinum electricity
Pole) (10) and pH compensating electrodes (11), wherein temperature-compensating inductive rod (8) and reference electrode (9) pass through fixed structure (cork
Part) (15) be adjacent to be arranged on and monitor automatically on automatically controlled head (12), and working electrode (10) and pH compensating electrodes (11) pass through solid
Determine structure (15) and be adjacent to be arranged on to monitor automatically on automatically controlled head (12), and reference electrode (9) and working electrode (10) are opposite
Ground is arranged on the inside of temperature-compensating inductive rod (8) and pH compensating electrodes (11).Automatically monitor automatically controlled head (12) and pass through conducting wire quilt
It is connected to the relevant position of remote monitoring host (13).
Test reaction device, which further includes, to be oppositely disposed on the outside of temperature-compensating inductive rod (8) and pH compensating electrodes (11)
Foot (16), for test reaction device is firmly secured in the auxiliary groove of work on the spot liquid (7), in the auxiliary groove of work on the spot liquid (7)
Equipped with plating solution, foot (16) is made of corrosion resistant material.
(3 groups) of automatic adding device includes chemical plating replenisher storage barrel (1), quantitative dosing device (4), in chemical plating
Inlet tube (3) and the replenisher reflux being in fluid communication between replenisher storage barrel (1) and quantitative dosing device (4) and exhaust pipe
(6), wherein quantitative dosing device (4) is connected on the relevant position and inlet tube (3) of host (13) by conducting wire and is connected with use
Chemical plating replenisher (2) is chemically plated to the liquid feeding pump (17) that replenisher storage barrel (1) is input in quantitative dosing device (4),
Replenisher flows back and exhaust pipe (6) is for the replenisher being not added with quantitative dosing device (4) is back to chemical plating supplement
In liquid storage barrel (1) and the chemical plating replenisher (2) in chemical plating replenisher storage barrel (1) is being input to quantitative dosing device
(4) it is vented during, is connected with the first control valve (18) thereon.
Automatic adding device is further included for being in fluid communication between quantitative dosing device (4) and the auxiliary groove of work on the spot liquid (7)
Quantitative dosing pipe (5), and be connected with the second control valve (19) thereon.
First control valve (18), the second control valve (19) and liquid feeding pump (17) can be controlled by other control units.
Remote monitoring host (13) includes input operation and output shows touch screen (14), can set or show：Liquid temperature to be measured
Degree, pH, potential change curve and stability test curve；Adding speed, additive amount and the frequency of chemical plating replenisher；It can be directed to
Different chemical plating fluids compiles distinct program and addition supplement calculation formula, and can edit and call according to need；It can set and record
Electrode maintains replacement frequency.
Potentiometric analyzer for on-line monitoring chemical plating fluid stability, which further includes, is placed on the auxiliary groove of work on the spot liquid (7)
The cleaning solution storage bottle (23) of surface, is equipped with cleaning solution in cleaning solution storage bottle (23), will be clear after treating chemical plating
Washing lotion is input in the auxiliary groove of work on the spot liquid (7) by woven hose (20) to clean the auxiliary groove of work on the spot liquid (7).Cleaning solution stores
Bottle (23) to conducting wire by being connected to remote monitoring host (13) and by woven hose (20) and the auxiliary groove of work on the spot liquid (7)
It is in fluid communication, third control valve (21) is connected with woven hose (20).
Operating procedure for the potentiometric analyzer of on-line monitoring chemical plating fluid stability is as follows：
(1) pH compensating electrodes (11) and working electrode (10), maintenance reference electrode (9) and temperature-compensating inductive rod are corrected
(8), potential test dress is surveyed just continuous；
(2) confirm that chemical plating replenisher storage barrel (1) liquid level is normal, automatic adding device just continues；
(3) host, editor or selected monitoring programme are opened, temperature, pH stabiloity compensations value, set each replenisher
Additive amount and adding proportion；
(4) automatic monitoring and automatic adding device are started；
(5) after treating chemical plating, the cleaning solution in cleaning solution storage bottle (23) is input to now by woven hose (20)
To clean the auxiliary groove of work on the spot liquid (7) in the auxiliary groove of working solution (7).
The operating procedure of wherein automatic adding device is as follows：The addition replenisher in needing to the auxiliary groove of work on the spot liquid (7)
When, start liquid feeding pump (17), the chemical plating replenisher (2) in chemical plating replenisher storage barrel (1) is input to quantitative dosing device
(4) it is vented in and by replenisher reflux and exhaust pipe (6), then by quantitative dosing pipe (5) by quantitative dosing device (4)
Chemical plating replenisher (2) is added in the auxiliary groove of work on the spot liquid (7).After supplement, pass through replenisher reflux and exhaust pipe (6)
The chemical plating replenisher (2) being not added with quantitative dosing device (4) is back in chemical plating replenisher storage barrel (1).
Referring to Fig. 1 and Fig. 2, based on such scheme, present invention also provides a kind of preferred solution, concrete scheme are as follows：
The application also sets a liquid level gauge (22) inside every group of quantitative dosing device (4), it is communicated to connect with host (13),
It is used for the liquid level information in detection quantitative dosing device (4) in real time, and the liquid level information signal detected is sent to host
(13), and host (13) respectively with the liquid feeding pump (17) in every group of automatic adding device, the first control valve (18) and second
Control valve (19) communicates to connect.
Such scheme specifically coordinates as follows：
When supplement chemical plating replenisher (2) in needing to quantitative dosing device (4), staff passes through remote monitoring host
(13) liquid feeding pump (17) work is controlled, liquid feeding pump (17) takes out the chemical plating replenisher (2) in chemical plating replenisher storage barrel (1)
Take and be input in quantitative dosing device (4) and by controlling the first control valve (18) to be vented, detection is quantitative in real time for liquid level gauge (22)
Liquid level information in doser (4), and the liquid level information signal detected is sent to host (13).When host (13) detects
Liquid level be higher than quantitative dosing device (4) interior liquid level 2/3rds when, host (13) then controls liquid feeding pump (17) to be stopped.
When supplement chemical plating replenisher (2) in needing to the auxiliary groove of work on the spot liquid (7), staff can pass through host
(13) the second control valve (19) is controlled to open, until supplement finishes, then staff passes through the second control of host (13) control again
Valve (19) processed is closed.
After a period of time, when chemical plating replenisher (2) need not be supplemented into the auxiliary groove of work on the spot liquid (7), work
Liquid level information in quantitative dosing device (4) can be understood in real time by host (13) by making personnel.It is not present when in quantitative dosing device (4)
During remaining chemical plating replenisher (2), then the first control valve (18) need not be opened, and when presence in quantitative dosing device (4)
During remaining chemical plating replenisher (2), staff can control the first control valve (18) to open by host (13), quantitative to add
Chemical plating replenisher (2) in medicine device (4) is flowed back by replenisher and exhaust pipe (6) is back to chemical plating replenisher storage barrel
(1) it is cost-effective so easy to recycling in.
In this way, by the implementation of above-mentioned preferred solution, the application greatly improves work efficiency and has saved cost.
It is the main embodiment of the utility model above, is not intended to limit the right of the utility model.
Change can still be given in the category of substantive content for not departing from the utility model to be applied, this kind of change should still belong to this reality
With new category, because the utility model confining spectrum in claim and utility model content.
Claims (4)
1. for on-line monitoring chemical plating fluid stability potentiometric analyzer automatic adding device, it is characterised in that it is described from
Dynamic adding set includes chemical plating replenisher storage barrel (1), quantitative dosing device (4), for chemical plating replenisher storage barrel (1) and
The inlet tube (3) that is in fluid communication between quantitative dosing device (4), replenisher reflux and exhaust pipe (6) and for quantitative dosing device
(4) the quantitative dosing pipe (5) being in fluid communication between the auxiliary groove plating solution (7) of work on the spot liquid,
The automatic adding device is arranged in a straight line.
2. the automatic addition dress of the potentiometric analyzer according to claim 1 for on-line monitoring chemical plating fluid stability
Put, it is characterised in that the number of the automatic adding device depends on the species of chemical plating replenisher to be supplemented in plating solution.
3. the automatic addition dress of the potentiometric analyzer according to claim 1 for on-line monitoring chemical plating fluid stability
Put, it is characterised in that liquid feeding pump (17) is connected with inlet tube (3).
4. the automatic addition dress of the potentiometric analyzer according to claim 1 for on-line monitoring chemical plating fluid stability
Put, it is characterised in that liquid level gauge (22) is provided with quantitative dosing device (4), for detecting the liquid in quantitative dosing device (4) in real time
Position information.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721060650.0U CN207248808U (en) | 2017-08-23 | 2017-08-23 | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721060650.0U CN207248808U (en) | 2017-08-23 | 2017-08-23 | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207248808U true CN207248808U (en) | 2018-04-17 |
Family
ID=61881313
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721060650.0U Active CN207248808U (en) | 2017-08-23 | 2017-08-23 | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
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| CN (1) | CN207248808U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108693178A (en) * | 2018-05-15 | 2018-10-23 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
| CN110129869A (en) * | 2019-05-24 | 2019-08-16 | 江西景旺精密电路有限公司 | A kind of method and system automatically analyzing addition gold salt based on real-time online |
| CN110218992A (en) * | 2019-05-08 | 2019-09-10 | 金驰 | A kind of steel chemical deposit system and its working method based on remote control |
| CN110646337A (en) * | 2018-06-26 | 2020-01-03 | 上海梅山钢铁股份有限公司 | Solution circulating aging device and using method |
-
2017
- 2017-08-23 CN CN201721060650.0U patent/CN207248808U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108693178A (en) * | 2018-05-15 | 2018-10-23 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
| CN110646337A (en) * | 2018-06-26 | 2020-01-03 | 上海梅山钢铁股份有限公司 | Solution circulating aging device and using method |
| CN110218992A (en) * | 2019-05-08 | 2019-09-10 | 金驰 | A kind of steel chemical deposit system and its working method based on remote control |
| CN110129869A (en) * | 2019-05-24 | 2019-08-16 | 江西景旺精密电路有限公司 | A kind of method and system automatically analyzing addition gold salt based on real-time online |
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