CN108693178A - A kind of chemical copper Analysis Control Unit - Google Patents
A kind of chemical copper Analysis Control Unit Download PDFInfo
- Publication number
- CN108693178A CN108693178A CN201810459771.5A CN201810459771A CN108693178A CN 108693178 A CN108693178 A CN 108693178A CN 201810459771 A CN201810459771 A CN 201810459771A CN 108693178 A CN108693178 A CN 108693178A
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- CN
- China
- Prior art keywords
- copper
- cylinder
- copper ion
- control host
- host
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810459771.5A CN108693178A (en) | 2018-05-15 | 2018-05-15 | A kind of chemical copper Analysis Control Unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810459771.5A CN108693178A (en) | 2018-05-15 | 2018-05-15 | A kind of chemical copper Analysis Control Unit |
Publications (1)
Publication Number | Publication Date |
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CN108693178A true CN108693178A (en) | 2018-10-23 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201810459771.5A Pending CN108693178A (en) | 2018-05-15 | 2018-05-15 | A kind of chemical copper Analysis Control Unit |
Country Status (1)
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CN (1) | CN108693178A (en) |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4499852A (en) * | 1980-07-15 | 1985-02-19 | Shipley Company Inc. | Apparatus for regulating plating solution in a plating bath |
US4565575A (en) * | 1984-11-02 | 1986-01-21 | Shiplay Company Inc. | Apparatus and method for automatically maintaining an electroless plating bath |
JP2004162078A (en) * | 2002-11-08 | 2004-06-10 | Tsurumi Soda Co Ltd | Copper plating device |
CN102140661A (en) * | 2010-01-29 | 2011-08-03 | 富葵精密组件(深圳)有限公司 | Electroplating device |
WO2016062534A1 (en) * | 2014-10-22 | 2016-04-28 | Pooltronix Sarl | A method for monitoring and treating the water of a swimming pool |
JP2016089259A (en) * | 2014-11-11 | 2016-05-23 | 住友金属鉱山株式会社 | Liquid supplying device in copper removable electrolysis step |
CN107287650A (en) * | 2017-08-14 | 2017-10-24 | 江东电子材料有限公司 | A kind of electrolyte automatic regulating system and adjusting method |
CN206611657U (en) * | 2016-11-28 | 2017-11-03 | 金悦通电子(翁源)有限公司 | A kind of chemical liquid adding apparatus |
CN207248808U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
CN207248834U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability |
CN207248813U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
CN208350648U (en) * | 2018-05-15 | 2019-01-08 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
-
2018
- 2018-05-15 CN CN201810459771.5A patent/CN108693178A/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4499852A (en) * | 1980-07-15 | 1985-02-19 | Shipley Company Inc. | Apparatus for regulating plating solution in a plating bath |
US4565575A (en) * | 1984-11-02 | 1986-01-21 | Shiplay Company Inc. | Apparatus and method for automatically maintaining an electroless plating bath |
JP2004162078A (en) * | 2002-11-08 | 2004-06-10 | Tsurumi Soda Co Ltd | Copper plating device |
CN102140661A (en) * | 2010-01-29 | 2011-08-03 | 富葵精密组件(深圳)有限公司 | Electroplating device |
WO2016062534A1 (en) * | 2014-10-22 | 2016-04-28 | Pooltronix Sarl | A method for monitoring and treating the water of a swimming pool |
JP2016089259A (en) * | 2014-11-11 | 2016-05-23 | 住友金属鉱山株式会社 | Liquid supplying device in copper removable electrolysis step |
CN206611657U (en) * | 2016-11-28 | 2017-11-03 | 金悦通电子(翁源)有限公司 | A kind of chemical liquid adding apparatus |
CN107287650A (en) * | 2017-08-14 | 2017-10-24 | 江东电子材料有限公司 | A kind of electrolyte automatic regulating system and adjusting method |
CN207248808U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
CN207248834U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability |
CN207248813U (en) * | 2017-08-23 | 2018-04-17 | 确信乐思化学(上海)有限公司 | Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability |
CN208350648U (en) * | 2018-05-15 | 2019-01-08 | 珠海倍力高科科技有限公司 | A kind of chemical copper Analysis Control Unit |
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Legal Events
Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20200714 Address after: Room 105-63474, No. 6, Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province Applicant after: ZHUHAI HENGGE ELECTRONIC TECHNOLOGY Co.,Ltd. Address before: 519000 Guangdong Province, Zhuhai city Xiangzhou District Nanping Technology Industrial Park West Road No. 1 screen five office building 1 floor A-1 District Applicant before: ZHUHAI BEILI HIGH-TECH Co.,Ltd. |
|
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 519000 room 105-63474, No.6 Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province (centralized office area) Applicant after: Zhuhai Hengge microelectronics equipment Co.,Ltd. Address before: 519000 room 105-63474, No.6 Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province (centralized office area) Applicant before: ZHUHAI HENGGE ELECTRONIC TECHNOLOGY Co.,Ltd. |