CN108693178A - A kind of chemical copper Analysis Control Unit - Google Patents

A kind of chemical copper Analysis Control Unit Download PDF

Info

Publication number
CN108693178A
CN108693178A CN201810459771.5A CN201810459771A CN108693178A CN 108693178 A CN108693178 A CN 108693178A CN 201810459771 A CN201810459771 A CN 201810459771A CN 108693178 A CN108693178 A CN 108693178A
Authority
CN
China
Prior art keywords
copper
cylinder
copper ion
control host
host
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810459771.5A
Other languages
Chinese (zh)
Inventor
郑志伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHUHAI HENGGE ELECTRONIC TECHNOLOGY Co.,Ltd.
Original Assignee
Zhuhai Double Power Hi Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhuhai Double Power Hi Tech Co Ltd filed Critical Zhuhai Double Power Hi Tech Co Ltd
Priority to CN201810459771.5A priority Critical patent/CN108693178A/en
Publication of CN108693178A publication Critical patent/CN108693178A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/78Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)

Abstract

A kind of chemical copper Analysis Control Unit, including control host and copper ion sensor, copper ion sensor is vertically hung on copper cylinder edge, copper ion sensor includes superposed electronic box and the optical catheter positioned at lower part, optical catheter is immersed in the working solution in copper cylinder, electronic box exposes the liquid level of copper cylinder or more, the front for controlling host is equipped with for the touch screen for operation, the back side is equipped with multiple pumps and exports string holes, it is connected to multiple addition pumps by cable, each addition pump is connected to an addition cylinder, it adds and copper ion solution is housed in cylinder, it is additionally provided with liquid level sensor in addition cylinder, liquid level sensor is connected to control host.The addition of solution is automatically controlled by controlling host, copper ion concentration in copper cylinder is measured using copper ion sensor, and the variation tendency of measured value, desired value, upper limit value, lower limiting value and undulating value in time in the past of copper ion is shown on the touchscreen, to measure analysis to copper ion in chemical copper working solution in copper cylinder.

Description

A kind of chemical copper Analysis Control Unit
Technical field
The present invention relates to metal ion analysis technical fields, more particularly to a kind of chemical copper Analysis Control Unit.
Background technology
The copper ion of chemical copper liquid needs to accurately control its concentration, traditional manual titration analysis in production and application It has been difficult to meet present process control needs with the concentration of copper ion in manual control liquid.Therefore, it is necessary to design one The better chemical copper analytical equipment of kind, to solve the above problems.
Invention content
In view of the problems of the existing technology, the present invention provides one kind and automatically controlling and add chemical copper solution, facilitates survey Measure and show the chemical copper Analysis Control Unit of copper ion concentration.
To achieve the goals above, the present invention adopts the following technical scheme that:
A kind of chemical copper Analysis Control Unit, including control host and copper ion sensor, the control host are located at institute The side for stating copper ion sensor is connected to the copper ion sensor by connecting line, and the copper ion sensor is vertically hung At copper cylinder edge, the copper ion sensor includes superposed electronic box and the optical catheter positioned at lower part, the light It learns conduit to be immersed in the working solution in the copper cylinder, the electronic box exposes the liquid level of the copper cylinder or more, the control host Front be equipped with for the touch screen for operation, the back side is equipped with multiple pumps output string holes, is connected to by cable multiple Addition pump, each the addition, which pumps, is connected to an addition cylinder, and copper ion solution is housed in the addition cylinder, is gone back in the addition cylinder Equipped with liquid level sensor, the liquid level sensor is connected to the control host, is automatically controlled by the control host described Solution in the addition cylinder is pumped into the copper cylinder by addition pump, and is measured in the copper cylinder by the copper ion sensor Copper ion concentration, analyzed by the control host.
Further, it is described control host front be equipped with can open or close it is described control host supplying power power switch by Button, the back side are equipped with power input string holes, and the power input string holes is connected to attaching plug, the attaching plug by power cord It is plugged on extraneous power supply.
Further, the front side of the control host is equipped with USB jack, for exporting data.
Further, the back side of the control host is equipped with alarm and exports string holes, and alarm is connected to by cable.
Further, the back side of the control host is additionally provided with the first socket and the second socket, is passed respectively for the copper ion Sensor and liquid level sensor access.
Further, first socket is five core aviation sockets, and second socket is nine core aviation sockets.
Further, the liquid level sensor is connected to the control host, the eight cores signal wire by eight core signal wires One end be connected to aviation plug for dock with second socket, the other end passes through junction box and liquid level sensor company It connects, wherein the color per core signal wire corresponds to different liquid level sensors.
Further, control host front outside is equipped with watertight transparent lid, and watertight transparent lid one end is articulated with institute Control host is stated, the other end is by latching lock on the control host.
Further, the connection line length between the copper ion sensor and the control host is less than or equal to 10m.
Further, four corners of the control host are equipped with mounting hole, for the control host to be installed on fixation On plate.
Beneficial effects of the present invention:
Addition pump is automatically controlled by control host the solution added in cylinder is pumped into copper cylinder, and sensed by copper ion Device measures the copper ion concentration in copper cylinder, is analyzed by control host, and copper ion sensor includes electronic box and optical catheter, Measure the copper ion concentration in copper cylinder with colorimetric method, and show on the touchscreen the measured value of copper ion, desired value, upper limit value, Lower limiting value and undulating value time in the past variation tendency, to be measured to copper ion in chemical copper working solution in copper cylinder Analysis.
Description of the drawings
Fig. 1 is the structural schematic diagram of chemical copper Analysis Control Unit of the present invention;
Fig. 2 is the structural schematic diagram of copper ion sensor in Fig. 1;
Fig. 3 is the main interface schematic diagram of touch screen in Fig. 1;
In figure, 1-copper ion sensor, 2-electronic boxes, 3-optical catheters, 4-copper cylinders, 5-connecting lines, 6-controls Host, 7-touch screens, 8-cables, 9-addition pump, 10-addition cylinders, 11-liquid level sensors, 12-eight core signal wires, 13-power switch buttons, 14-power cords, 15-attaching plugs, 16-USB jacks, 17-mounting holes, 18-alarms.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation describes, it is clear that described embodiment is only a part of the embodiment of the present invention, instead of all the embodiments.Base Embodiment in the present invention, those of ordinary skill in the art obtained without creative efforts it is all its His embodiment, shall fall within the protection scope of the present invention.
It is to be appreciated that the directional instruction (such as up, down, left, right, before and after ...) of institute is only used in the embodiment of the present invention In explaining relative position relation, motion conditions etc. under a certain particular pose (as shown in the picture) between each component, if should When particular pose changes, then directionality instruction also correspondingly changes correspondingly.
Such as Fig. 1, the present invention provides a kind of chemical copper Analysis Control Unit, is electronic optical instrument, is measured using colorimetric method Copper ion concentration in chemical copper cylinder, the liquid medicine for being mainly used for PTH production line chemical copper cylinders add control, can be used for automatically The liquid medicine of microetch production line microetch copper cylinder adds control automatically.
Such as Fig. 1 and Fig. 2, chemical copper Analysis Control Unit includes control host 6 and copper ion sensor 1, controls 6, host In the side of copper ion sensor 1, copper ion sensor 1, copper ion sensor 1 and control host 6 are connected to by connecting line 5 Between 1 length of connecting line be less than or equal to 10m, therefore, what control host 6 was positioned over apart from copper ion sensor 1 less than 10m At position.Copper ion sensor 1 it is vertical hang over 4 edge of copper cylinder, it is usually vertical and firm hang over 4 cylinder side of chemical copper cylinder or The secondary groove cylinder side of person's chemical copper cylinder 4.Copper ion sensor 1 includes that superposed electronic box 2 and the optics positioned at lower part are led Pipe 3, optical catheter 3 are immersed in the working solution in copper cylinder 4, and electronic box 2 exposes the liquid level of copper cylinder 4 or more.Copper ion sensor 1 Electronic box 2 never can be opened at will, in order to avoid influence the electronic device of the inside, the optical catheter 3 in 1 end of copper ion sensor Absolutely not can automatic moving or adjustment, otherwise just need to send back to supplier again and carry out electronic calibration.Copper ion sensor 1 should be put It sets in the place of working solution good mixing, but should not be placed directly on air-inflating tube, to enter copper cylinder 4 far from heat source and replenisher Position, more it is noted that avoiding being collided by basket support.
Such as Fig. 1, what control host 6 should be vertical is placed on ventilation, drying, is operated higher than 4 liquid level of copper cylinder and the person of being conveniently operated Position, control host 6 four corners be equipped with mounting hole 17, be installed on fixed plate for host 6 will to be controlled.Control host 6 front is equipped with for the touch screen 7 for operation, and the back side is equipped with multiple pumps and exports string holes, and pump output string holes is divided by cable 8 It is not connected to multiple addition pumps 9, each addition pump 9 is connected to an addition cylinder 10, copper ion solution is housed in addition cylinder 10.At this In embodiment, the back side of control host 6 is equipped with 7 pumps and exports string holes, is connected respectively 7 addition pumps 9 and addition cylinder 10.Add Add and be additionally provided with liquid level sensor 11 in cylinder 10, liquid level sensor 11 is connected to control host 6 by eight core signal wires 12, passes through control Host 6 processed automatically controls addition pump 9 and the solution added in cylinder 10 is pumped into copper cylinder 4, and measures copper by copper ion sensor 1 Copper ion concentration in cylinder 4 is analyzed by control host 6, and liquid level sensor 11 can then measure addition cylinder 10 in it is molten Liquid measure when finding amount of solution less than setting minimum then prompts that chemical copper solution is added into addition cylinder 10.The present invention can be with Measure the copper ion concentration in copper cylinder with colorimetric method, and show on touch screen 7 measured value of copper ion, desired value, upper limit value, Lower limiting value and undulating value time in the past variation tendency, to be surveyed to copper ion in chemical copper working solution in copper cylinder 4 Amount analysis.
Such as Fig. 1, the frontal left of control host 6, which is equipped with, can open or close the power switch button that control host 6 is powered 13, the back side is equipped with power input string holes, and power input string holes is connected to attaching plug 15 by power cord 14, and attaching plug 15 is inserted It is connected on extraneous power supply, in the present embodiment, power cord 14 is using triple core cable, the overall diameter of suitable power cord 14 The copper conductor sectional area of 6-8mm, power cord 14 are 1.5mm2×3.The positive right side of face for controlling host 6 is equipped with USB jack 16, is used for Export data.The back side for controlling host 6 is equipped with alarm output string holes, and alarm 18 is connected to by cable 8.In this implementation In example, the cable 8 of addition pump 10 and alarm 18 is connected to using triple core cable, is suitble to the overall diameter of cable 8 Copper conductor sectional area for 6-8mm, cable 8 is 0.75-1.5mm2×3.Control host 6 the back side be additionally provided with the first socket and Second socket is accessed for copper ion sensor 1 and liquid level sensor 11 respectively, and the first socket is five core aviation sockets, and described the Two sockets are nine core aviation sockets, and liquid level sensor 11 is connected to control host 6, eight core signal wires 12 by eight core signal wires 12 One end be connected to aviation plug for being docked with the second socket, the other end is connect by junction box with liquid level sensor 11, In color per core signal wire correspond to different liquid level sensors 11.
It controls host 6 and passes through dedicated waterproof aviation plug or socket and external attaching plug 15, addition pump 9, alarm Device 18, copper ion sensor 1 and liquid level sensor 11 are connected.There are locking cap locking, plug to insert between aviation plug and socket The docking at seat both ends is simple, reliable.Control host 6 itself has installed one end therein (number of channels connected as needed Install in advance), it is only needed when wiring is installed to the attaching plug 15 of the other end, addition pump 9, alarm 18, copper ion sensor 1 And 11 wiring of liquid level sensor.The both ends of the connecting line 5 of copper ion sensor 1 install in advance, therefore need not connect Line.Control host 6 use power supply, pumping output, alarm 18 output be single-phase AC 220V 50HZ
It controls 6 front outside of host and is equipped with watertight transparent lid, watertight transparent lid one end is articulated with control host 6, the other end By latching lock on control host 6, when control host 6 in use, opening watertight transparent lid, when control host 6 is stopped using When packing up, watertight transparent lid is closed, and lock by latching.
When safeguarding, 6 surface of control host only need to gently be wiped with cloth, 3 surface of optical catheter of copper ion sensor 1 It need to keep bright and clean, not energy product copper.Maintenance work can safeguard with copper cylinder 4 and be carried out at the same time that chemically (such as sodium peroxydisulfate microetch is molten Liquid) cleaning, but no more than 45 DEG C of solution temperature, and 3 surface of optical catheter cannot be cleaned using any mechanicalness, in order to avoid scratch 3 surface of optical catheter and influence measure accuracy.
Such as Fig. 3, jump that 7 operation interface of touch screen of chemical copper Analysis Control Unit of the present invention can be unordered between picture Turn switching, corresponding guided push button is clicked on arbitrary picture can jump directly to target picture, without image switching in order. Multiple buttons and display area are correspondingly arranged in key frame, the corresponding button of motor then enters corresponding setting screen, intermediate Display area in then show the measured value of current copper ion, and show the copper ion desired value currently set, fluctuation in side Value, upper limit value, lower limiting value.And operating mode can be selected as chemical copper pattern or microetch copper pattern, be respectively used to PTH productions The measurement of the copper ion of line chemical copper cylinder or microetch production line microetch copper cylinder.The 1 addition time of 1 addition time restriction display pump of pump The setting value and current value of limitation, when added between reach setting value and copper ion concentration when being still not up to setting value+undulating value, Pump 1 is closed and sends out alarm.(second) setting/current, addition time setting value and current value of display pump 1 to pump 7 is added, it is left It is setting value in black surround, is current value in right black surround;When timing is added in pause, the interior blue font of left black surround can become pump 1 At red font, the setting value of timing is added for 1 pause of pump, the white font in right black surround becomes red font, for 1 pause of pump Add the current value of timing.When pumping for 1 cycle time and being accumulated to setting value, pump 2 to its primary correspondence setting value of 7 addition of pump when Between, under automatic mode, pump 2 is added to pump 7 according to the value.Under manual mode, the corresponding button is pressed, corresponding pumping adds Add the time of primary corresponding setting value, button is in green;Button takes on a red color when stopping.
The above examples are only used to illustrate the technical scheme of the present invention and are not limiting, although with reference to preferred embodiment to this hair It is bright to be described in detail, it will be appreciated by those skilled in the art that can technical scheme of the present invention be modified or be waited With replacing, without departing from the objective and range of the technical program, should all cover in scope of the presently claimed invention.

Claims (10)

1. a kind of chemical copper Analysis Control Unit, which is characterized in that including:Control host and copper ion sensor, the control Host is located at the side of the copper ion sensor, is connected to the copper ion sensor by connecting line, the copper ion passes Sensor is vertically hung on copper cylinder edge, and the copper ion sensor includes that superposed electronic box and the optics positioned at lower part are led Pipe, the optical catheter are immersed in the working solution in the copper cylinder, and the electronic box exposes the liquid level of the copper cylinder or more, described The front for controlling host is equipped with for the touch screen for operation, and the back side is equipped with multiple pumps and exports string holes, connected respectively by cable Multiple addition pumps are connected to, each addition pump is connected to an addition cylinder, copper ion solution is housed in the addition cylinder, described to add Add and be additionally provided with liquid level sensor in cylinder, the liquid level sensor is connected to the control host, automatic by the control host It controls the addition pump solution in the addition cylinder is pumped into the copper cylinder, and institute is measured by the copper ion sensor The copper ion concentration in copper cylinder is stated, is analyzed by the control host.
2. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:The front of the control host is equipped with The power switch button of the control host supplying power can be opened or closed, the back side is equipped with power input string holes, the power input String holes is connected to attaching plug by power cord, and the attaching plug is plugged on extraneous power supply.
3. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:The front side of the control host Equipped with USB jack, for exporting data.
4. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:The back side of the control host is equipped with Alarm exports string holes, and alarm is connected to by cable.
5. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:The back side of the control host is also set There are the first socket and the second socket, is accessed respectively for the copper ion sensor and the liquid level sensor.
6. chemical copper Analysis Control Unit according to claim 5, it is characterised in that:First socket is five core aviations Socket, second socket are nine core aviation sockets.
7. chemical copper Analysis Control Unit according to claim 6, it is characterised in that:The liquid level sensor passes through eight cores Signal wire is connected to the control host, and one end of the eight cores signal wire is connected to aviation plug and is used for and second socket Docking, the other end are connect by junction box with the liquid level sensor, wherein the color per core signal wire corresponds to different liquid Level sensor.
8. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:Control host front outside is set There are watertight transparent lid, watertight transparent lid one end to be articulated with the control host, the other end is by latching lock in the control On host.
9. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:The copper ion sensor with it is described The connection line length controlled between host is less than or equal to 10m.
10. chemical copper Analysis Control Unit according to claim 1, it is characterised in that:Four angles of the control host It falls and is equipped with mounting hole, for the control host to be installed on fixed plate.
CN201810459771.5A 2018-05-15 2018-05-15 A kind of chemical copper Analysis Control Unit Pending CN108693178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810459771.5A CN108693178A (en) 2018-05-15 2018-05-15 A kind of chemical copper Analysis Control Unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810459771.5A CN108693178A (en) 2018-05-15 2018-05-15 A kind of chemical copper Analysis Control Unit

Publications (1)

Publication Number Publication Date
CN108693178A true CN108693178A (en) 2018-10-23

Family

ID=63846456

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810459771.5A Pending CN108693178A (en) 2018-05-15 2018-05-15 A kind of chemical copper Analysis Control Unit

Country Status (1)

Country Link
CN (1) CN108693178A (en)

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4499852A (en) * 1980-07-15 1985-02-19 Shipley Company Inc. Apparatus for regulating plating solution in a plating bath
US4565575A (en) * 1984-11-02 1986-01-21 Shiplay Company Inc. Apparatus and method for automatically maintaining an electroless plating bath
JP2004162078A (en) * 2002-11-08 2004-06-10 Tsurumi Soda Co Ltd Copper plating device
CN102140661A (en) * 2010-01-29 2011-08-03 富葵精密组件(深圳)有限公司 Electroplating device
WO2016062534A1 (en) * 2014-10-22 2016-04-28 Pooltronix Sarl A method for monitoring and treating the water of a swimming pool
JP2016089259A (en) * 2014-11-11 2016-05-23 住友金属鉱山株式会社 Liquid supplying device in copper removable electrolysis step
CN107287650A (en) * 2017-08-14 2017-10-24 江东电子材料有限公司 A kind of electrolyte automatic regulating system and adjusting method
CN206611657U (en) * 2016-11-28 2017-11-03 金悦通电子(翁源)有限公司 A kind of chemical liquid adding apparatus
CN207248808U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability
CN207248834U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability
CN207248813U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability
CN208350648U (en) * 2018-05-15 2019-01-08 珠海倍力高科科技有限公司 A kind of chemical copper Analysis Control Unit

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4499852A (en) * 1980-07-15 1985-02-19 Shipley Company Inc. Apparatus for regulating plating solution in a plating bath
US4565575A (en) * 1984-11-02 1986-01-21 Shiplay Company Inc. Apparatus and method for automatically maintaining an electroless plating bath
JP2004162078A (en) * 2002-11-08 2004-06-10 Tsurumi Soda Co Ltd Copper plating device
CN102140661A (en) * 2010-01-29 2011-08-03 富葵精密组件(深圳)有限公司 Electroplating device
WO2016062534A1 (en) * 2014-10-22 2016-04-28 Pooltronix Sarl A method for monitoring and treating the water of a swimming pool
JP2016089259A (en) * 2014-11-11 2016-05-23 住友金属鉱山株式会社 Liquid supplying device in copper removable electrolysis step
CN206611657U (en) * 2016-11-28 2017-11-03 金悦通电子(翁源)有限公司 A kind of chemical liquid adding apparatus
CN107287650A (en) * 2017-08-14 2017-10-24 江东电子材料有限公司 A kind of electrolyte automatic regulating system and adjusting method
CN207248808U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability
CN207248834U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability
CN207248813U (en) * 2017-08-23 2018-04-17 确信乐思化学(上海)有限公司 Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability
CN208350648U (en) * 2018-05-15 2019-01-08 珠海倍力高科科技有限公司 A kind of chemical copper Analysis Control Unit

Similar Documents

Publication Publication Date Title
CN208350648U (en) A kind of chemical copper Analysis Control Unit
CN208350622U (en) A kind of chemical copper analysis and Control system
CN113465667A (en) Insulated telescopic bending underground searchlighting instrument
CN108344700A (en) A kind of chemical copper analysis and Control system
CN108693178A (en) A kind of chemical copper Analysis Control Unit
CN201368982Y (en) Full-automatic control device of dyeing machine
CN207199917U (en) A kind of power supervisor PDU boxes
CN217932011U (en) Plug detection equipment
CN207264226U (en) Multichannel temperature controller intelligence calibrating installation
CN115842569A (en) Three-dimensional detection downhole probe
CN209745974U (en) Dry chemical analyzer for vaginal secretion
CN106027169B (en) A kind of debugging apparatus for electronics
CN209131095U (en) A kind of air-conditioner controller
CN207491384U (en) A kind of display screen carrying equipment being easily installed
CN205792606U (en) A kind of debugging apparatus for electronics
CN206002226U (en) A kind of temperature detecting unit of high-performance combination instrument
CN210269625U (en) Full-automatic titrator for volumetric titration
CN206002567U (en) A kind of measurement control module of high-performance combination instrument
CN216283668U (en) Remote automatic temperature and humidity detection control device
CN205388611U (en) Power instrument box introduces termination from other localities convenient to maintain
CN212965279U (en) Automatically controlled board intelligent test equipment
CN207473022U (en) A kind of electric blanket wire test jig
CN217561921U (en) Zone controller for highway station equipment
CN220709658U (en) Wireless data tool
CN211528309U (en) Column incubator for ion chromatography

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20200714

Address after: Room 105-63474, No. 6, Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province

Applicant after: ZHUHAI HENGGE ELECTRONIC TECHNOLOGY Co.,Ltd.

Address before: 519000 Guangdong Province, Zhuhai city Xiangzhou District Nanping Technology Industrial Park West Road No. 1 screen five office building 1 floor A-1 District

Applicant before: ZHUHAI BEILI HIGH-TECH Co.,Ltd.

CB02 Change of applicant information
CB02 Change of applicant information

Address after: 519000 room 105-63474, No.6 Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province (centralized office area)

Applicant after: Zhuhai Hengge microelectronics equipment Co.,Ltd.

Address before: 519000 room 105-63474, No.6 Baohua Road, Hengqin New District, Zhuhai City, Guangdong Province (centralized office area)

Applicant before: ZHUHAI HENGGE ELECTRONIC TECHNOLOGY Co.,Ltd.