CN207204697U - Automatic ration changes liquid water feed apparatus - Google Patents
Automatic ration changes liquid water feed apparatus Download PDFInfo
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- CN207204697U CN207204697U CN201720861964.4U CN201720861964U CN207204697U CN 207204697 U CN207204697 U CN 207204697U CN 201720861964 U CN201720861964 U CN 201720861964U CN 207204697 U CN207204697 U CN 207204697U
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Abstract
It the utility model is related to automatic ration and change liquid water feed apparatus, including main body, feeding device, water feed apparatus, tank, drainpipe, overflow pipe, first sensor and second sensor, the tank is arranged in main body, feeding device includes the first feed pipe, second feed pipe and fluid supplier, first feed pipe and the second feed pipe are arranged on tank both sides, first, second feed pipe is and fluid supplier, tank connects, the water feed apparatus includes the first water pipe and the second water pipe, first, second water pipe connects with tank, the main body is provided with delivery port, the drainpipe and overflow pipe connect with delivery port, drainpipe connects with bottom of gullet, overflow pipe above tank with connecting, first, second sensor is arranged on tank, first sensor is arranged on above second sensor.Automatic ration of the present utility model, which changes liquid water feed apparatus, can provide cleaning fluid and water from different directions, so that the flushing to silicon chip is more comprehensively, lift cleaning efficiency.
Description
Technical field
Making herbs into wool cleaning equipment technical field is the utility model is related to, more particularly to automatic ration changes liquid water feed apparatus.
Background technology
, it is necessary to be cleaned to silicon chip in solar silicon wafers production process, mainly carried out at present using etching cleaning machine
Cleaning.Etching cleaning machine has multiple stations, and operation principle is to utilize the strong mechanical oscillation impact silicon chip table of ultrasonic permeability power
Face simultaneously combines the chemical decontamination effect of cleaning agent and reaches the carborundum to silicon chip surface attachment, silica flour, metal dust, greasy dirt, outstanding
The removing of the impurity such as supernatant liquid, so as to obtain the silicon chip of clean surface.Its technological process is：Feeding (immersion), cleaning, alkali cleaning, drift
Wash, wide slow moving water-removal groove, drying, blanking.When being cleaned, it is necessary to carry out the replacing of decoction and water, set typically by program
Determine quantity delivered.But existing automatic ration changes the water inlet of liquid water feed apparatus and feed liquor generally enters, it is necessary to one from a direction
The section time just can make the decoction in tank be evenly distributed；In addition, can not be rinsed to silicon chip, the cleaning speed of silicon chip is slower.
Utility model content
The utility model is in order to solve problem of the prior art, there is provided a kind of cleaning efficiency is higher, and cleanliness factor is preferable, just
Liquid water feed apparatus is changed in the automatic ration for being replaced and cleaned liquid and water.
Concrete technical scheme is as follows：Automatic ration changes liquid water feed apparatus, including main body, feeding device, water feed apparatus, water
Groove, drainpipe, overflow pipe, first sensor and second sensor, the tank are arranged in main body, and feeding device includes first
Feed pipe, the second feed pipe and fluid supplier, first feed pipe and the second feed pipe are arranged on tank both sides, and first, second
Feed pipe connects with fluid supplier, tank, and the water feed apparatus includes the first water pipe and the second water pipe, first, second water pipe with
Tank connects, and the main body is provided with delivery port, and the drainpipe and overflow pipe connect with delivery port, drainpipe and bottom of gullet
Connection, overflow pipe above tank with being connected, and first, second sensor is arranged on tank, and first sensor is arranged on the second biography
Above sensor.
It is attached technical scheme of the present utility model below.
Preferably, the water feed apparatus includes three-way pipe, and first, second water pipe connects with three-way pipe respectively.
Preferably, the three-way pipe both sides are provided with the first magnetic valve and second solenoid valve, the first magnetic valve and
One water pipe is connected, and second solenoid valve is connected with the second water pipe.
Preferably, the drainpipe is provided with the 3rd magnetic valve.
Preferably, the water feed apparatus includes the first shower nozzle and the second shower nozzle, and first, second shower nozzle is arranged on water
On groove, the first shower nozzle is connected with the first water pipe, and the second shower nozzle is connected with the second water pipe.
Preferably, the first shower nozzle and the second shower nozzle include water inlet pipe, base and cover plate, and the pedestal is provided with out
Water cavity, water inlet pipe connect with water chamber, and the cover plate is arranged on pedestal side, and cover plate is provided with apopore.
Preferably, first, second shower nozzle includes pad, and pad is arranged between pedestal and tank.
Preferably, the water inlet pipe of the first shower nozzle is connected with the first water pipe, the water inlet pipe of the second shower nozzle and the second water
Pipe is connected, and water inlet pipe is connected by nut with tank.
Technique effect of the present utility model：Automatic ration of the present utility model changes liquid water feed apparatus and can carried from different directions
For cleaning fluid and water, so that the flushing to silicon chip is more comprehensively, cleaning efficiency is lifted；Meanwhile cleaning action power is uniform, cleaning
Cleanliness factor is high, and cleaning performance is good, can effectively remove the impurity of silicon chip surface；Furthermore it is possible to automatically control cleaning fluid and water more
Change, efficiency is changed in lifting, easy to operation.
Brief description of the drawings
Fig. 1 is that the automatic ration of the utility model embodiment changes the schematic diagram of liquid water feed apparatus.
Fig. 2 is that the automatic ration of the utility model embodiment changes the top view of liquid water feed apparatus.
Fig. 3 is first shower nozzle of the utility model embodiment and the schematic diagram of the second shower nozzle.
Embodiment
Below, substantive distinguishing features of the present utility model and advantage are further described with reference to example, but this practicality is new
Type is not limited to listed embodiment.
As shown in Figure 1 to Figure 3, the automatic ration of the present embodiment, which changes liquid water feed apparatus, includes main body 1, feeding device 2, water inlet
Device 3, tank 4, drainpipe 5, overflow pipe 6, first sensor 7 and second sensor 8, the tank 4 are set on the body 1.
Feeding device 2 includes the first feed pipe 21, the second feed pipe 22 and fluid supplier 23, the feed pipe of the first feed pipe 21 and second
22 are arranged on the both sides of tank 4, and first, second feed pipe connects with fluid supplier, tank.The water feed apparatus 3 includes the first water
The water pipe 32 of pipe 31 and second, first, second water pipe connect with tank 4, and the main body 1 is provided with delivery port 11, the drainpipe 5
Being connected with overflow pipe 6 with delivery port 11, drainpipe 5 connects with bottom of gullet, and the top of overflow pipe 6 and tank 4 connects, and first, the
Two sensors are arranged on tank, and first sensor 7 is arranged on above second sensor 8, in above-mentioned technical proposal, pass through feed liquor
Device and water feed apparatus can provide cleaning fluid and water into tank respectively, so as to be cleaned to the silicon chip in tank.Pass through
Two water pipes and feed pipe are set so that cleaning fluid and water can enter tank from both direction, so as to the flushing effect to silicon chip
Rate is higher, and cleaning fluid is more evenly distributed.By first, second sensor, the liquid level in tank can be sensed, when liquid level is too high
When, draining is carried out, when liquid level is too low, program setting can be passed through by carrying out moisturizing and fluid infusion, the cleaning fluid of supplement and the amount of water.This reality
Apply in example, control device 9 is provided with main body, control device can use the PLC of Mitsubishi FX series.
As shown in Figure 1 to Figure 3, further, the water feed apparatus 3 includes three-way pipe 33, first, second water pipe respectively with
Three-way pipe 33 connects, and is connected by three-way pipe with watering so that water can separately flow into first, second water by three-way pipe
Pipe.The both sides of three-way pipe 33 are provided with the first magnetic valve 34 and second solenoid valve 35, and the first magnetic valve 34 connects with the first water pipe 31
Connect, second solenoid valve 35 is connected with the second water pipe 32.The drainpipe 5 is provided with the 3rd magnetic valve 51.First to the 3rd electromagnetism
Valve is connected with control device, so as to be controlled by control device to the break-make of magnetic valve.The water feed apparatus 3 includes
First shower nozzle 36 and the second shower nozzle 37, first, second shower nozzle are arranged on tank 4, and the first shower nozzle is connected with the first water pipe, and second
Shower nozzle is connected with the second water pipe.By first, second shower nozzle, it can rinse silicon chip cleaner, skilled person will appreciate that,
First, second feed pipe can also set shower nozzle, so as to lift developing result.First shower nozzle 36 and the second shower nozzle 37 include into
Water pipe 101, pedestal 102 and cover plate 103, the pedestal 102 are provided with water chamber 104, and water inlet pipe 101 connects with water chamber 104, institute
To state cover plate 103 and be arranged on the side of pedestal 102, cover plate 103 is provided with apopore 105, in the present embodiment, the first shower nozzle and the second spray
The structure of head is identical, and current enter water chamber by water inlet pipe, are then sprayed by apopore.First, second shower nozzle includes pad
Piece 106, pad 106 is arranged between pedestal and tank, by setting pad, can prevent leak.The water inlet pipe of first shower nozzle with
First water pipe is connected, and the water inlet pipe of the second shower nozzle is connected with the second water pipe, and water inlet pipe is connected by nut 107 with tank.
The automatic ration of the present embodiment, which changes liquid water feed apparatus, can provide cleaning fluid and water from different directions, so that right
The flushing of silicon chip more comprehensively, lifts cleaning efficiency；Meanwhile cleaning action power is uniform, cleaning degree is high, and cleaning performance is good, can
Effectively remove the impurity of silicon chip surface；Furthermore it is possible to automatically control the replacing of cleaning fluid and water, efficiency is changed in lifting, is easy to grasp
Make.
It is pointed out that above-mentioned preferred embodiment is only to illustrate technical concepts and features of the present utility model, its purpose
It is to allow person skilled in the art to understand content of the present utility model and implements according to this, this reality can not be limited with this
With new protection domain.All equivalent change or modifications made according to the utility model Spirit Essence, should all cover in this reality
Within new protection domain.
Claims (8)
1. automatic ration changes liquid water feed apparatus, it is characterised in that including main body, feeding device, and water feed apparatus, tank, drainpipe,
Overflow pipe, first sensor and second sensor, the tank are arranged in main body, and feeding device includes the first feed pipe, the
Two feed pipes and fluid supplier, first feed pipe and the second feed pipe are arranged on tank both sides, first, second feed pipe with
Fluid supplier, tank connection, the water feed apparatus include the first water pipe and the second water pipe, and first, second water pipe connects with tank, institute
State main body and be provided with delivery port, the drainpipe and overflow pipe connect with delivery port, and drainpipe connects with bottom of gullet, overflow pipe
With being connected above tank, first, second sensor is arranged on tank, and first sensor is arranged on above second sensor.
2. automatic ration as claimed in claim 1 changes liquid water feed apparatus, it is characterised in that the water feed apparatus includes threeway
Pipe, first, second water pipe connect with three-way pipe respectively.
3. automatic ration as claimed in claim 2 changes liquid water feed apparatus, it is characterised in that the three-way pipe both sides are provided with first
Magnetic valve and second solenoid valve, the first magnetic valve are connected with the first water pipe, and second solenoid valve is connected with the second water pipe.
4. automatic ration as claimed in claim 3 changes liquid water feed apparatus, it is characterised in that the drainpipe is provided with the 3rd electricity
Magnet valve.
5. automatic ration as claimed in claim 1 changes liquid water feed apparatus, it is characterised in that the water feed apparatus includes the first spray
Head and the second shower nozzle, first, second shower nozzle are arranged on tank, and the first shower nozzle is connected with the first water pipe, the second shower nozzle and second
Water pipe connects.
6. automatic ration as claimed in claim 5 changes liquid water feed apparatus, it is characterised in that the first shower nozzle and the second shower nozzle wrap
Water inlet pipe, base and cover plate are included, the pedestal is provided with water chamber, and water inlet pipe connects with water chamber, and the cover plate is arranged on pedestal
Side, cover plate are provided with apopore.
7. automatic ration as claimed in claim 6 changes liquid water feed apparatus, it is characterised in that first, second shower nozzle includes pad,
Pad is arranged between pedestal and tank.
8. automatic ration as claimed in claim 7 changes liquid water feed apparatus, it is characterised in that the water inlet pipe of the first shower nozzle and first
Water pipe is connected, and the water inlet pipe of the second shower nozzle is connected with the second water pipe, and water inlet pipe is connected by nut with tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720861964.4U CN207204697U (en) | 2017-07-17 | 2017-07-17 | Automatic ration changes liquid water feed apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720861964.4U CN207204697U (en) | 2017-07-17 | 2017-07-17 | Automatic ration changes liquid water feed apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207204697U true CN207204697U (en) | 2018-04-10 |
Family
ID=61813237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720861964.4U Active CN207204697U (en) | 2017-07-17 | 2017-07-17 | Automatic ration changes liquid water feed apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207204697U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114850123A (en) * | 2022-03-25 | 2022-08-05 | 中国人民解放军总医院第六医学中心 | Ultrasonic tracheal cannula cleaning machine |
-
2017
- 2017-07-17 CN CN201720861964.4U patent/CN207204697U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114850123A (en) * | 2022-03-25 | 2022-08-05 | 中国人民解放军总医院第六医学中心 | Ultrasonic tracheal cannula cleaning machine |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: No.106, Xixian Road, Xinwu District, Wuxi City, Jiangsu Province Patentee after: Wuxi kunsheng Intelligent Equipment Co., Ltd Address before: 214000 No. 30 Wanquan Road, Xishan District, Jiangsu, Wuxi Patentee before: WUXI KUNSHENG TECHNOLOGY Co.,Ltd. |