CN206706197U - Magnetic control sputtering device - Google Patents
Magnetic control sputtering device Download PDFInfo
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- CN206706197U CN206706197U CN201720514275.6U CN201720514275U CN206706197U CN 206706197 U CN206706197 U CN 206706197U CN 201720514275 U CN201720514275 U CN 201720514275U CN 206706197 U CN206706197 U CN 206706197U
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- magnetic
- target
- crawler belt
- magnetic field
- magnet
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Abstract
Technical field of physical vapor deposition is the utility model is related to, discloses a kind of magnetic control sputtering device, solves the problem of target rim consumption is too fast, and the target in other regions can not make full use of, and target utilization is low.Described device includes：Magnetic field generating arrangement, including magnetic crawler belt and at least two rotating wheels, wherein described magnetic crawler belt includes crawler belt and multiple magnets being equidistantly fixed on side by side on the crawler belt, and the magnetic crawler belt is wound at least two rotating wheel, forms crawler haulage structure parallel up and down；Target, it is arranged in the uniform magnetic field that the magnetic field generating arrangement is formed, and it is parallel with the magnetic crawler belt；Two pieces of magnetic shield panels, the both ends of the target being separately positioned on, shielding exceeds the magnetic field of the target, wherein, the length of the uniform magnetic field is more than or equal to the length of the target, and the length of the magnet is more than the width of the target.The utility model embodiment is suitable for magnetron sputtering process.
Description
Technical field
Technical field of physical vapor deposition is the utility model is related to, more particularly to a kind of magnetic control sputtering device.
Background technology
Magnetron sputtering is physical vapour deposition (PVD) (Physical Vapor Deposition, PVD) one kind.In general is splashed
The method of penetrating can be used for preparing more materials such as metal, semiconductor, insulator, and magnetron sputtering is widely used in integrated circuit, liquid crystal
The field such as display and thin film solar.Magnetron sputtering is fettered by introducing magnetic field at target backboard rear using magnetic field
Charged particle, increase the density of the plasma of target material surface, improve the speed of target as sputter.Electrically charged particle (Ar+) exists
Accelerate bombardment target in the presence of electric field, sputter substantial amounts of neutral target atom (or molecule) and be deposited on film forming on substrate；Production
Raw secondary electron is strapped in the heating region of target surface by magnetic field force, is taken exercises around target surface.Electronics is moving
During constantly collided with ar atmo, substantial amounts of argon ion bombardment target is ionized out, so as to realize high rate deposition.But
Also the problem of being exactly magnetic field strength distribution, cause target partial spent relatively too fast, reduce the utilization rate of target.
Uniform magnetic field can be moved back and forth by the high speed of magnet and be produced.When the marginal position of magnet movement to track,
Need to return again to after stagnating.When magnet is stagnated, because central magnetic field is weak, edge magnetic field strength, " W " shape can be left at target both ends
Indenture, as shown in Figure 1.With the consumption of target, target is easily breakdown in the lowest part of " W " shape indenture, whole so as to cause
The end of individual target service life, can get to backboard when serious, cause product rejection, and not obtained fully in other positions target
Utilize, the utilization rate of target is relatively low.
Utility model content
The purpose of this utility model is to overcome target rim existing for prior art to consume too fast, the target in other regions
The problem of material can not make full use of, and target utilization is low, there is provided a kind of magnetic control sputtering device, the device for prolonging use of target
Life-span.
To achieve these goals, on the one hand the utility model provides a kind of magnetic control sputtering device, including：
Magnetic field generating arrangement, including magnetic crawler belt and at least two rotating wheels, wherein the magnetic crawler belt includes crawler belt and multiple
The magnet being equidistantly fixed on side by side on the crawler belt, the magnetic crawler belt is wound at least two rotating wheel, in formation
Under parallel crawler haulage structure；
Target, it is arranged in the uniform magnetic field that the magnetic field generating arrangement is formed, and it is parallel with the magnetic crawler belt；
Two pieces of magnetic shield panels, the both ends of the target being separately positioned on, shielding exceeds the magnetic field of the target,
Wherein, the length of the uniform magnetic field is more than or equal to the length of the target, and the length of the magnet is more than described
The width of target.
Further, the target is arranged on the magnetic crawler belt in the uniform magnetic field that the magnetic field generating arrangement is formed
Above or below.
Further, described device also includes track guide, is arranged on below the magnetic crawler belt closed on the target, is used for
Support the magnetic crawler belt.
Further, the material of the track guide is copper or copper alloy.
Further, at least one rotating wheel at least two rotating wheel is arranged to driving wheel.
Further, the magnet is fixed on the crawler belt by non magnetic frame.
Further, at least one magnet is arranged to multistage small magnet and continuously spliced.
Further, all magnets are arranged to the isometric small magnet of multistage and spliced at equal intervals, the interval and the small magnetic
The length of body is identical.
Further, the magnetic shield panel has high magnetic permeability.
Further, the magnet is shaped as justifying prism, cylinder or square column.
By setting magnetic field generating arrangement, including magnetic crawler belt and at least two rotating wheels on the magnetic control sputtering device,
Wherein described magnetic crawler belt includes crawler belt and multiple magnets being equidistantly fixed on side by side on the crawler belt, and the magnetic crawler belt is wound in
On at least two rotating wheel, crawler belt at the uniform velocity drive mechanism parallel up and down is formed；Target, it is arranged on the magnetic field generation dress
Put in the uniform magnetic field to be formed, and it is parallel with the magnetic crawler belt；And two pieces of magnetic shield panels, it is separately positioned on the two of the target
End, shielding exceed the magnetic field of the target, wherein, the length of the uniform magnetic field is more than or equal to the length of the target, described
The length of magnet is more than the width of the target, so as to improve the uniformity to target bombardment, solves target rim and consumed
It hurry up, the problem of target in other regions can not make full use of, and target utilization is low, improve life-span of target.
Brief description of the drawings
Accompanying drawing is to be further understood for providing to of the present utility model, and a part for constitution instruction, and following
Embodiment be used to explain the utility model together, but do not form to limitation of the present utility model.In the accompanying drawings：
Fig. 1 is the schematic diagram of the W shape indentures of the uneven formation of target rim consumption in the prior art；
Fig. 2 is a kind of structural representation for magnetic control sputtering device that the embodiment of the utility model one provides；
Fig. 3 is the structural representation of magnetic crawler belt in a kind of magnetic control sputtering device that the embodiment of the utility model one provides；
Fig. 4 is the structural representation for another magnetic control sputtering device that the embodiment of the utility model one provides；
Fig. 5 is the structural representation for another magnetic control sputtering device that the embodiment of the utility model one provides；
Fig. 6 is the structural representation for another magnetic control sputtering device that the embodiment of the utility model one provides；
Fig. 7 is the schematic diagram of the magnet in a kind of magnetic control sputtering device that the embodiment of the utility model one provides.
Description of reference numerals
The magnetic crawler belt of 100 magnetic field generating arrangement 101
The crawler belt of 102 rotating wheel 103
The target of 104 magnet 200
The track guide of 300 magnetic shield panel 400
Embodiment
Specific embodiment of the present utility model is described in detail below in conjunction with accompanying drawing.It should be appreciated that herein
Described embodiment is merely to illustrate and explained the utility model, is not limited to the utility model.
The present embodiment provides a kind of magnetic control sputtering device, is illustrated in figure 2 one kind of the embodiment of the utility model one offer
The structural representation of magnetic control sputtering device, the magnetic control sputtering device include：
Magnetic field generating arrangement 100, including the rotating wheel 102 of magnetic crawler belt 101 and at least two, wherein as shown in figure 3, the magnetic
Crawler belt 101 includes crawler belt 103 and multiple magnets 104 being equidistantly fixed on side by side on the crawler belt, and the magnetic crawler belt 101 is wound
In at least two rotating wheel 102, crawler haulage structure parallel up and down is formed；
Target 200, it is arranged in the uniform magnetic field that the magnetic field generating arrangement 100 is formed, and it is flat with the magnetic crawler belt 101
OK, uniform magnetic field is marked with scribe area in figure；
Two pieces of magnetic shield panels 300, the both ends of the target 200 being separately positioned on, shielding exceeds the magnetic field of the target,
Wherein, the length of the uniform magnetic field is more than or equal to the length of the target 200, and the length of the magnet 104 is big
In the width of the target 200.
Wherein, the quantity of magnet 104 in the magnetic crawler belt 101 can be according to the length of target 200 and the spacing of adjacent magnets 104
It is adjusted, so that the length of the uniform magnetic field of formation is more than the length of the target 200.
By being assembled into magnetic crawler belt using magnet in above-mentioned magnetic control sputtering device and being at the uniform velocity driven the method for operation, in target area
Domain forms uniform and stable magnetic field, so as to form film in uniform thickness, and avoids forming indenture in target material surface, adds target
The utilization rate of material, extend the service life of target.
Wherein, due to the presence of the rotating wheel 102 in magnetic field generating arrangement 100, when the magnet 104 on magnetic crawler belt 101 passes
When moving on rotating wheel 102, the distance of magnet 104 and target 200 changes, for example, when the magnet 104 on magnetic crawler belt 101 from
When top is transferred to 102 outside of rotating wheel, the magnet 104 changes relative to the distance of target 200, in target region not
Uniform magnetic field can be formed, it is therefore desirable to will be shielded beyond the magnetic field of the target 200 with two pieces of magnetic shield panels 300, thus
The length for the uniform magnetic field that magnetic field generating arrangement 100 formed is needed to be greater than the length equal to the target 200, and the magnet
104 length is greater than the width of the target 200.In addition, the magnetic shield panel 300 has high magnetic permeability, such as ferronickel closes
Gold, or ultra-low-carbon steel etc..
Wherein, multiple rotating wheels 102 can be set in the magnetic field generating arrangement 100, to support the magnetic crawler belt 101,
Avoid due to the Action of Gravity Field of magnetic crawler belt 101, the middle part of magnetic crawler belt 101 can influence Distribution of Magnetic Field to recessed.
In addition, the target 200 can be arranged on the uniform magnetic that the magnetic field generating arrangement 100 as shown in Figure 2 is formed
The lower section of the magnetic crawler belt 101 in, the magnetic field generation that is arranged on the target 200 that can also be as shown in Figure 4 fill
The top of the magnetic crawler belt 101 in the uniform magnetic field of 100 formation is put, while magnetic shield panel 300 is also arranged on the magnetic and carried out
With 101 top, it is located at the same side with the target.As long as in the uniform magnetic field that the magnetic field generating arrangement 100 is formed,
The target 200 can be set, and using the shielding of magnetic shield panel 300 beyond the magnetic field of the target 200.
In addition, as it can be seen in figures 5 and 6, described device also includes track guide 400, it is arranged on what is closed on the target 200
The lower section of magnetic crawler belt 101, for supporting the magnetic crawler belt 101, to avoid due to the Action of Gravity Field of magnetic crawler belt 101, the magnetic crawler belt 101
Middle part can influence Distribution of Magnetic Field to recessed.As shown in figure 5, when target 200 is located at magnetic 101 lower section of crawler belt, the crawler belt
Guide rail 400 is arranged on the lower section of magnetic crawler belt 101 closed on the target 200, as shown in fig. 6, when target 200 is located at magnetic crawler belt
During 101 top, the track guide 400 is arranged on and the lower section of the magnetic crawler belt of the homonymy of target 200 101.Wherein, the crawler belt
The material of guide rail 400 can be copper or copper alloy, but be not limited to this.
In addition, the rotating wheel 102 can turn clockwise, can also rotate counterclockwise drive the crawler belt 103, its
In, at least one rotating wheel at least two rotating wheel 102 is arranged to driving wheel.
In addition, the magnet 104 is fixed on the crawler belt 103 by non magnetic frame (not shown), it is described non magnetic
The material of frame can be plastics, or copper, aluminium, magnesium, zinc metal non-magnetic material.
Wherein, the shape of the magnet 104 can use but be not limited to circle prism as shown in Figure 7, can also be cylinder,
The other shapes such as square column.
Continuously splice in addition, at least one magnet could be arranged to multistage small magnet.Wherein, the N poles of small magnet with it is another
Form magnet after the S poles splicing of small magnet, can also multistage small magnet opposite pole mutually splice after form magnet, continuous splicing
The magnet of formation can regard an entirety as, be the same actually with a monoblock magnet, other magnets on the crawler belt can
With the magnet for being a monoblock magnet or continuously being spliced by multistage small magnet.
Splice at equal intervals in addition, all magnets on the crawler belt could be arranged to the isometric small magnet of multistage.Wherein, institute
It is that the isometric small magnet of multistage splices at equal intervals to state all magnets on crawler belt, and is spaced the length with the multistage small magnet
It is identical.
The above-mentioned magnet either continuously spliced, or the magnet discontinuously spliced, it is fixed on non magnetic frame described
On crawler belt.
By above-mentioned magnetic control sputtering device, by the magnetic field that target region is evenly distributed is covered, in this region
Plasma (e-And Ar+) state that is also evenly distributed, so as to form film in uniform thickness, the uniformity of target as sputter carries
Height, add the utilization rate and service life of target.
Preferred embodiment of the present utility model, still, the utility model and unlimited is described in detail above in association with accompanying drawing
In this.In range of the technology design of the present utility model, a variety of simple variants can be carried out to the technical solution of the utility model,
It is combined in any suitable manner including each particular technique feature.In order to avoid unnecessary repetition, the utility model
Various combinations of possible ways are no longer separately illustrated.But these simple variants and combination should equally be considered as the utility model institute
Disclosure, belong to the scope of protection of the utility model.
Claims (10)
- A kind of 1. magnetic control sputtering device, it is characterised in that including：Magnetic field generating arrangement, including magnetic crawler belt and at least two rotating wheels, wherein the magnetic crawler belt is included between crawler belt and multiple grades Away from the magnet being fixed on side by side on the crawler belt, the magnetic crawler belt is wound at least two rotating wheel, is formed flat up and down Capable crawler haulage structure；Target, it is arranged in the uniform magnetic field that the magnetic field generating arrangement is formed, and it is parallel with the magnetic crawler belt；Two pieces of magnetic shield panels, the both ends of the target being separately positioned on, shielding exceeds the magnetic field of the target,Wherein, the length of the uniform magnetic field is more than or equal to the length of the target, and the length of the magnet is more than the target Width.
- 2. magnetic control sputtering device according to claim 1, it is characterised in that the target is arranged on the magnetic field generation dress Put above or below the magnetic crawler belt in the uniform magnetic field to be formed.
- 3. magnetic control sputtering device according to claim 2, it is characterised in that described device also includes track guide, sets Below the magnetic crawler belt closed on the target, for supporting the magnetic crawler belt.
- 4. magnetic control sputtering device according to claim 3, it is characterised in that the material of the track guide is that copper or copper close Gold.
- 5. magnetic control sputtering device according to claim 1, it is characterised in that at least one at least two rotating wheel Individual rotating wheel is arranged to driving wheel.
- 6. magnetic control sputtering device according to claim 1, it is characterised in that the magnet is fixed on institute by non magnetic frame State on crawler belt.
- 7. magnetic control sputtering device according to claim 1, it is characterised in that at least one magnet is arranged to multistage small magnet Continuous splicing.
- 8. magnetic control sputtering device according to claim 1, it is characterised in that all magnets are arranged to the isometric small magnetic of multistage Body splices at equal intervals, and the interval is identical with the length of the small magnet.
- 9. magnetic control sputtering device according to claim 1, it is characterised in that the magnetic shield panel has high magnetic permeability.
- 10. magnetic control sputtering device according to claim 1, it is characterised in that the magnet is shaped as justifying prism, cylinder Or square column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720514275.6U CN206706197U (en) | 2017-05-10 | 2017-05-10 | Magnetic control sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720514275.6U CN206706197U (en) | 2017-05-10 | 2017-05-10 | Magnetic control sputtering device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206706197U true CN206706197U (en) | 2017-12-05 |
Family
ID=60465801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720514275.6U Active CN206706197U (en) | 2017-05-10 | 2017-05-10 | Magnetic control sputtering device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206706197U (en) |
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2017
- 2017-05-10 CN CN201720514275.6U patent/CN206706197U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20230605 Address after: 241000 No.36 weier'er Road, Wanchun street, Wuhu Economic and Technological Development Zone, Anhui Province Patentee after: WUHU TUNGHSU PHOTOELECTRIC SCIENCE AND TECHNOLOGY Co.,Ltd. Patentee after: TUNGHSU GROUP Co.,Ltd. Patentee after: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. Address before: Room 1517, Building 1 (International Building), No. 167 Qianjin Middle Road, Development Zone, Kunshan City, Suzhou City, Jiangsu Province, 215300 Patentee before: DONGXU (KUNSHAN) DISPLAY MATERIAL Co.,Ltd. Patentee before: TUNGHSU GROUP Co.,Ltd. Patentee before: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. |
|
| EE01 | Entry into force of recordation of patent licensing contract | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Hunan Lanxin Microelectronics Technology Co.,Ltd. Assignor: TUNGHSU TECHNOLOGY GROUP Co.,Ltd. Contract record no.: X2023110000108 Denomination of utility model: magnetron sputter apparatus Granted publication date: 20171205 License type: Common License Record date: 20230905 |