CN206553404U - A kind of low radiation coated glass of green keynote - Google Patents
A kind of low radiation coated glass of green keynote Download PDFInfo
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- CN206553404U CN206553404U CN201720154263.7U CN201720154263U CN206553404U CN 206553404 U CN206553404 U CN 206553404U CN 201720154263 U CN201720154263 U CN 201720154263U CN 206553404 U CN206553404 U CN 206553404U
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Abstract
The utility model discloses a kind of low radiation coated glass of green keynote, including the first glass substrate, its drip irrigation device is：ITO layer, Nb are sequentially provided with first glass substrate2O5Layer, the first AZO layers, Ag layers, the 2nd AZO layers, TIOxLayer and Si3N4Layer.A kind of low radiation coated glass of green keynote of the present utility model, heat transfer coefficient is low, and shaded effects are good, effectively prevents heat energy from being got in through glass, reduces production cost.
Description
【Technical field】
The utility model is related to a kind of coated glass, and in particular to a kind of low radiation coated glass of green keynote.
【Background technology】
Coated glass has the double effects of energy-saving and emission-reduction and decorative curtain wall, releases behind market, is loved by people, at present
The low radiation coated glass of the green keynote of in the market, uses green glass substrate coating, uses green sheet plated film, one side cost
Height, another aspect green glass can absorb heat in itself, be unfavorable for energy-saving cool-down.
【The content of the invention】
A kind of low radiation coated glass of green keynote of the present utility model, heat transfer coefficient is low, and shaded effects are good, effectively resistance
Only heat energy is got in through glass, reduces production cost.
The utility model is achieved through the following technical solutions：
On a kind of low radiation coated glass of green keynote, including the first glass substrate, first glass substrate successively
Provided with ITO layer, Nb2O5Layer, the first AZO layers, Ag layers, the 2nd AZO layers, TIOxLayer and Si3N4Layer.
It is preferred that, the ITO layer is magnetron sputtering tin indium oxide target (In2O3：SnO2=90：10 (wt%)), alternating current
Source is sputtered, and sputter gas, gas flow 800SCCM, 120~135nm of thickness, sheet resistance are used as with Ar gas<15 Europe.
It is preferred that, the Nb2O5Layer is magnetron sputtering niobium target, AC power reactive sputtering, with Ar gas, O2It is used as sputtering gas
Body, gas flow 400SCCM:800SCCM, 20~50nm of thickness.
It is preferred that, the described first AZO layers and the 2nd AZO layers, be magnetron sputtering Al-Doped ZnO target (ZnO:Al=92:8
(wt%)), AC power reactive sputtering, with Ar gas, O2It is used as sputter gas, gas flow 1000SCCM:40SCCM, thickness
300~500nm.
It is preferred that, described Ag layers, Ag layers of magnetron sputtering, dc source sputtering is used as sputter gas, gas flow with Ar gas
500~550SCCM, 3~5nm of thickness.
It is preferred that, the TIOxLayer, magnetron sputtering titanium oxide target, AC power sputtering, with Ar gas, O2As sputter gas,
Gas flow 1000SCCM:40SCCM, thickness 20-35nm.
It is preferred that, the Si3N4Layer, magnetron sputtering sial target (Si:Al=92:8 (wt%)), Ar is used in AC power sputtering
Gas, O2It is used as sputter gas, gas flow 400SCCM:600SCCM, 50~85nm of thickness.
It is preferred that, first glass substrate is the float glass that thickness is 4-8mm.
A kind of method for the low radiation coated glass for preparing green keynote, comprises the following steps：
A:4~8mm glass substrates are selected, is cut, with cleaning machine glass substrate entered with cutting machine by preliminary dimension
Row cleaning；
B：Glass substrate is sent into coating chamber magnetron sputtering ITO layer, protective gas, magnetic control are used as with AC power, Ar gas
Sputter tin indium oxide target (In2O3：SnO2=90：10 (wt%)), with Ar throughput 800SCCM, 120 are sputtered on a glass substrate
~135nm ITO layer；
C：Continue magnetron sputtering Nb2O5Layer, with AC power, Ar gas, O2As protective gas, magnetron sputtering niobium target uses Ar
And O2Gas flow 400SCCM:800SCCM, sputters 20~50nm Nb2O5Layer；
D：Continue AZO layers of magnetron sputtering the first, with AC power, Ar gas, O2It is used as protective gas, Magnetron Sputtered Al oxidation
Zinc target (ZnO:Al=92:8 (wt%)), with Ar and O2Gas flow 1000SCCM:40SCCM, the first of 300~500nm of sputtering
AZO layers；
E：Continue Ag layers of magnetron sputtering, with dc source, Ar gas uses Ar gas flows as protective gas, magnetron sputtering
500~550SCCM, sputters 3~5nm Ag layers；
F:Continue AZO layers of magnetron sputtering the 2nd, with AC power, Ar gas, O2It is used as protective gas, Magnetron Sputtered Al oxidation
Zinc target (ZnO:Al=92:8 (wt%)), with Ar and O2Gas flow 1000SCCM:40SCCM, the second of 300~500nm of sputtering
AZO layers；
G：Continue magnetron sputtering TIOxLayer, with AC power, Ar gas, O2As protective gas, magnetron sputtering titanium oxide target,
With Ar and O2Gas flow 1000SCCM:40SCCM, sputters 20~35nm TIOxLayer；
H：Continue magnetron sputtering Si3N4Layer, with AC power, Ar gas, O2It is used as protective gas, magnetron sputtering sial target
(Si:Al=92:8 (wt%)), with Ar and O2Gas flow 400SCCM:600SCCM, sputters 50~85nm Si3N4Layer.
Compared with prior art, the utility model has the following advantages that：
1st, the low radiation coated glass of a kind of green keynote of the present utility model, radiance can to 0.08, a*=-8~-9,
B*=+3~+1, is a kind of jadite coated glass, overcomes existing green low radiation coated glass generally using a large amount of green
Color body tinted float glass substrate, production cost is expensive, the defect of low production efficiency, low production cost, beneficial to Low emissivity
Glass is promoted the use of；
2nd, the low radiation coated glass preparation method of green keynote of the present utility model, functional film layer is sequentially deposited at glass
On substrate, film layer has that weatherability and decay resistance are outstanding, radiance is low, sheet resistance is small, uniformity is good, adhesion is strong
Advantage.
【Brief description of the drawings】
Fig. 1 is the utility model structural representation.
【Embodiment】
In a kind of high infrared reflection coated glass as shown in Figure 1, including glass substrate 1, the glass substrate 1 successively
Provided with ITO layer 2, Nb2O5The 3, the first AZO layers 4 of layer, Ag layers 5, the 2nd AZO layers 6, TIOx7 and Si of layer3N4Layer 8.It is of the present utility model
Glass is composited by one piece of glass substrate and multilayer coating, is presented a kind of jadite coated glass, radiance can to 0.08,
A*=-8~-9, b*=+3~+1, the glass substrate per side is constituted by multiple film layers, with low cost, and effectively isolation thermal source is saturating
Cross glass to get in, realize the effect of energy-conservation.
120~the 135nm of thickness of ITO layer 2, sheet resistance<15 Europe, are magnetron sputtering tin indium oxide target In2O3：SnO2=
90：10 (wt%), AC power sputtering, sputter gas, gas flow 800SCCM are used as with Ar gas.
The Nb2O53 20~50nm of thickness of layer, are magnetron sputtering niobium target, AC power reactive sputtering, with Ar gas, O2As
Sputter gas, gas flow 400SCCM:800SCCM.To improve thin-film refractive index, transmitance is improved.
The first AZO layers 4 and the 2nd AZO layers 6, are 300~500nm of thickness, magnetron sputtering Al-Doped ZnO target
ZnO:Al=92:8 (wt%), AC power reactive sputtering, with Ar gas, O2It is used as sputter gas, gas flow 1000SCCM:
40SCCM.The infrared transmitance to reduce.
3~the 5nm of thickness of Ag layers 5, Ag layers of magnetron sputtering, dc source sputtering is used as sputter gas, gas with Ar gas
500~550SCCM of flow.As functional layer, infrared ray is effectively reflected.
The TIOx7 20~35nm of thickness of layer, magnetron sputtering titanium oxide target, AC power sputtering, with Ar gas, O2As splashing
Emanate body, gas flow 1000SCCM:40SCCM.Make outer layer that there is high index of refraction, so as to realize high transmitance, and make film
Layer has wear-resisting, corrosion-resistant.
The Si3N4Layer 8, magnetron sputtering sial target Si:Al=92:8 (wt%), AC power sputtering is made with Ar gas, O2
For sputter gas, gas flow 400SCCM:600SCCM, 50~85nm of thickness.This layer makes film plating layer have higher mechanicalness
Energy.
The glass substrate 1 is the float glass that thickness is 4~8mm.
The method for illustrating a kind of low radiation coated glass for preparing green keynote of the present utility model in conjunction with the embodiments：
Embodiment 1-4
A kind of method for the low radiation coated glass for preparing green keynote, comprises the following steps：
A：Glass substrate is selected, is cut, with cleaning machine glass substrate is cleaned with cutting machine by preliminary dimension；
B：Glass substrate is sent into each coating of coating chamber magnetron sputtering, design parameter such as table 1：
Table 1：
The low radiation coated glass of green keynote obtained by above-described embodiment, according to GB/T18915.2-2002《Plated film glass
Glass part 2：Low radiation coated glass》Standard carries out the measure of optical property, test result to glass made from embodiment 1-4
As shown in table 2：
Table 2：
| Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | |
| Visible light transmissivity (%) | 65 | 68 | 70 | 70 |
| Glass surface reflecting brightness L* values | 73 | 70 | 69 | 72 |
| Glass surface reflection colour a* values | -8.02 | -7.8 | -8.5 | -9.0 |
| Glass surface reflection colour b* values | +3 | +2.5 | +2 | +1 |
| Radiance % | 0.07 | 0.08 | 0.09 | 0.1 |
Functional film layer is sequentially depositing on a glass substrate, and film layer has a wearability and decay resistance, high index and
Transmitance, low cost product.
Claims (8)
1. a kind of low radiation coated glass of green keynote, it is characterised in that：Including glass substrate (1), the glass substrate (1)
On be sequentially provided with ITO layer (2), Nb2O5Layer (3), the first AZO layers (4), Ag layers (5), the 2nd AZO layers of (6), TIOxLayer (7) and
Si3N4Layer (8).
2. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：The ITO layer (2)
120~135nm of thickness, sheet resistance<15 Europe.
3. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：The Nb2O5Layer
(3) 20~50nm of thickness.
4. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：First AZO
Layer (4) and the 2nd AZO layers of (6) thickness be 300~500nm.
5. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：Described Ag layers (5)
3~5nm of thickness.
6. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：The TIOxLayer (7)
20~35nm of thickness.
7. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：The Si3N4Layer
(8) 50~85nm of thickness.
8. a kind of low radiation coated glass of green keynote according to claim 1, it is characterised in that：The glass substrate
(1) it is float glass that thickness is 4~8mm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201720154263.7U CN206553404U (en) | 2017-02-20 | 2017-02-20 | A kind of low radiation coated glass of green keynote |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201720154263.7U CN206553404U (en) | 2017-02-20 | 2017-02-20 | A kind of low radiation coated glass of green keynote |
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| CN206553404U true CN206553404U (en) | 2017-10-13 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
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2017
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106746735A (en) * | 2017-02-20 | 2017-05-31 | 揭阳市宏光镀膜玻璃有限公司 | A kind of low radiation coated glass of green keynote and preparation method thereof |
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