CN206316074U - A kind of rinse bath for cleaning semiconductor devices - Google Patents
A kind of rinse bath for cleaning semiconductor devices Download PDFInfo
- Publication number
- CN206316074U CN206316074U CN201621365814.6U CN201621365814U CN206316074U CN 206316074 U CN206316074 U CN 206316074U CN 201621365814 U CN201621365814 U CN 201621365814U CN 206316074 U CN206316074 U CN 206316074U
- Authority
- CN
- China
- Prior art keywords
- cell body
- circulation
- drain pipe
- semiconductor devices
- feed tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
A kind of rinse bath for cleaning semiconductor devices, including cell body, support frame is consolidated with the top side inward flange of the cell body, drain pipe is consolidated with the one side bottom of the cell body, the one side middle part of the cell body is consolidated with circulation feed tube and circulation drain pipe, the circulation feed tube is placed in the oblique upper of circulation drain pipe, and the circulation feed tube and circulation drain pipe are linked into an integrated entity by hydraulic pump.The circulation feed tube and circulation drain pipe of the rinse bath of the utility model cleaning semiconductor devices move up the wash liquid stream in cell body by hydraulic pump, and comprehensive flushing is carried out to semiconductor devices, reach that deimpurity purpose is gone in cleaning before installation, cleaning opens drain pipe after finishing and rinses the inwall of cell body, the inwall of cell body is set to reach clean free from admixture, it is to avoid not wash clean and cause clearly secondary pollution to follow-up semiconductor devices.
Description
Technical field
The utility model is related to a kind of rinse bath for cleaning semiconductor devices.
Background technology
Semiconductor devices needs progress surface to go the removal of impurity to work in a pre-installation, so semiconductor devices cleaning is to install processing
The first step, in order to ensure that semiconductor devices totally needs to clean at least one times and once soaked, due to current cleaning process
It is divided into different small processes, needs people's station to hold stirring tool by rinse bath during cleaning and be stirred removing semiconductor devices
The impurity and dirt on surface, need manually to use instrument to pull out after taking out stains, make cleaning cumbersome, operating efficiency compares
Low, while the cleaning fluid in rinse bath is difficult to change, this occurs does not wash clean and causes clearly two to follow-up semiconductor devices
Secondary pollution.
The content of the invention
There is provided a kind of cleaning semiconductor devices solved the above problems in view of the shortcomings of the prior art for the utility model
Rinse bath.
In order to solve the above-mentioned technical problem, the utility model is addressed by following technical proposals：
It is consolidated with a kind of rinse bath for cleaning semiconductor devices, including cell body, the top side inward flange of the cell body
Drain pipe is consolidated with support frame, the one side bottom of the cell body, the one side middle part of the cell body is consolidated with circulation
Feed tube and circulation drain pipe, the circulation feed tube are placed in the oblique upper of circulation drain pipe, the circulation feed tube and circulation
Drain pipe is linked into an integrated entity by hydraulic pump.
Feed tube is provided with support frame as described above, the feed tube and suction pump link together.
The circulation drain pipe is formed with reclinate bend pipe on the inside of cell body.
Beneficial effect：Compared with prior art, it has the advantages that the utility model：
The circulation feed tube and circulation drain pipe of the rinse bath of the utility model cleaning semiconductor devices are made by hydraulic pump
Wash liquid stream in cell body is moved up, and carries out comprehensive flushing to semiconductor devices, reaches that the removal of impurity is gone in cleaning before installation
Purpose, cleaning opens drain pipe after finishing and rinses the inwall of cell body, the inwall of cell body is reached clean free from admixture, it is to avoid right
Follow-up semiconductor devices does not wash clean and caused clearly secondary pollution.
Brief description of the drawings
Fig. 1 is the structure chart of the rinse bath of cleaning semiconductor devices.
Embodiment
Refering to Fig. 1, a kind of rinse bath of cleaning semiconductor devices, including cell body 1, the material of cell body 1 is polyvinyl chloride, is gathered
Vinyl chloride has preferable mechanical performance, tensile strength 60MPa or so, and 5~10kJ/m2 of impact strength has excellent dielectricity
Can, so cell body 1 can be used without flexural deformation for a long time, support frame is consolidated with the top side inward flange of cell body 1
11, it is provided with feed tube 111, the one side bottom of cell body 1 on support frame 11 and is consolidated with drain pipe 12, the one side of cell body 1
Between position be consolidated with circulation feed tube 13 and circulation drain pipe 14, circulation feed tube 13 be placed in circulation drain pipe 14 oblique upper,
Circulation drain pipe 14 is formed with reclinate bend pipe in the inner side of cell body 1（It is not shown）, feed tube 111 and suction pump are connected to
Together, circulation feed tube 13 and circulation drain pipe 14 are linked into an integrated entity by hydraulic pump, and semiconductor devices needs to use in a pre-installation
Special cleaning is soaked and cleaned, and the organic impurities of semiconductor device surface are removed totally, could carry out follow-up
Installation procedure, so first semiconductor devices is placed in cell body 1, while opening suction pump by feed tube 111 toward the note of cell body 1
Enter cleaning fluid, after cleaning fluid is completely immersed in semiconductor devices, suction pump is stopped, and semiconductor devices soaks in cleaning fluid
5 minutes, hydraulic pump was started working afterwards, and is made by circulating feed tube 13 and the circulation collective effect of drain pipe 14 in cell body 1
Wash liquid stream is moved up, and comprehensive flushing is carried out to semiconductor devices for the cleaning fluid of flowing and scavenging period is 10~15 points
Clock, the cleaning fluid of flowing takes away semiconductor device surface and soaks soft organic impurities, and heavier organic impurities directly sink
Form sediment to the bottom of cell body 1, while the suction of organic impurities can be reduced by circulating the bend pipe of drain pipe 14, reach that cleaning is gone before installation
Deimpurity purpose, after a certain amount of semiconductor devices is cleaned, the accumulation of organic impurities causes the cleaning fluid meeting in cell body 1
There is muddiness, in order to avoid totally and not causing secondary pollution to semiconductor devices cleaning, the cleaning fluid in cell body 1 need to be changed,
At this moment need to open drain pipe 12, while hydraulic pump works asynchronously, allow cleaning fluid also to rinse the inwall of cell body 1 when flowing out simultaneously, make
The inwall of cell body 1 reaches clean free from admixture, beneficial to the cleaning of follow-up semiconductor devices.
Embodiment described above is only that preferred embodiment of the present utility model is described, not to this practicality
New spirit and scope are defined.On the premise of the utility model design concept is not departed from, this area ordinary person couple
The all variations and modifications that the technical solution of the utility model is made, all should drop into protection domain of the present utility model, this reality
With new claimed technology contents, all record in detail in the claims.
Claims (3)
1. a kind of rinse bath for cleaning semiconductor devices, including cell body（1）, it is characterised in that the cell body（1）Top side
Support frame is consolidated with inward flange（11）, the cell body（1）One side bottom on be consolidated with drain pipe（12）, the cell body
（1）One side middle part be consolidated with circulation feed tube（13）With circulation drain pipe（14）, the circulation feed tube（13）Put
In circulation drain pipe（14）Oblique upper, the circulation feed tube（13）With circulation drain pipe（14）One is connected into by hydraulic pump
Body.
2. the rinse bath of cleaning semiconductor devices according to claim 1, it is characterised in that support frame as described above（11）On open
There is feed tube（111）, the feed tube（111）Linked together with suction pump.
3. the rinse bath of cleaning semiconductor devices according to claim 1, it is characterised in that the circulation drain pipe（14）
In cell body（1）Inner side be formed with reclinate bend pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621365814.6U CN206316074U (en) | 2016-12-13 | 2016-12-13 | A kind of rinse bath for cleaning semiconductor devices |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621365814.6U CN206316074U (en) | 2016-12-13 | 2016-12-13 | A kind of rinse bath for cleaning semiconductor devices |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206316074U true CN206316074U (en) | 2017-07-11 |
Family
ID=59266569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621365814.6U Expired - Fee Related CN206316074U (en) | 2016-12-13 | 2016-12-13 | A kind of rinse bath for cleaning semiconductor devices |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206316074U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106623212A (en) * | 2016-12-13 | 2017-05-10 | 苏州羽美尚精密机械有限公司 | Cleaning tank for cleaning semiconductor device |
-
2016
- 2016-12-13 CN CN201621365814.6U patent/CN206316074U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106623212A (en) * | 2016-12-13 | 2017-05-10 | 苏州羽美尚精密机械有限公司 | Cleaning tank for cleaning semiconductor device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170711 Termination date: 20191213 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |