CN206289298U - A kind of radome for realizing ion gun uniform irradiation film plating substrate - Google Patents
A kind of radome for realizing ion gun uniform irradiation film plating substrate Download PDFInfo
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- CN206289298U CN206289298U CN201621441260.3U CN201621441260U CN206289298U CN 206289298 U CN206289298 U CN 206289298U CN 201621441260 U CN201621441260 U CN 201621441260U CN 206289298 U CN206289298 U CN 206289298U
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- film
- ion gun
- radome
- plating
- substrate
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Abstract
The utility model is related to technical field of vacuum plating, especially a kind of radome for realizing ion gun uniform irradiation film plating substrate, it is characterised in that：The radome is arranged on the periphery of the ion gun, and the covering on top of the radome offers fan-shaped or class sector open, and the fan-shaped or class sector open is located at the top of the ion gun.The utility model has the advantages that：Realize that the lotus energy particle-irradiation intensity that film-plating umbrella stand film plating substrate radially is received is roughly the same, so as to form the preferable film consistency of uniformity；It is simple and reasonable for structure, strong applicability.
Description
Technical field
The utility model is related to technical field of vacuum plating, especially a kind of ion gun uniform irradiation film plating substrate realized
Radome.
Background technology
In field of vacuum coating, the application of Ion Aided Film Coating is than wide.During using ion gun, if ion gun is launched
Lotus energy particle act on the film plating substrate of blank, then can play a part of to clean and activate substrate；If lotus energy particle is made
For the film plating substrate in plated film, then the effect of assistant depositing is also acted as.Due to the effect of lotus energy particle, ion gun assisted deposition
Optical thin film typically have preferable consistency and refractive index higher.Under normal circumstances, ion gun launches lotus energy particle
Emission port is circle, and correspondingly, in free space of the ion gun to external emission, the Isoenergetical line of lotus energy particle is also rounded
Distribution.
For vacuum evaporation apparatus, the top generally in vacuum coating chamber sets a rotatable circular coating umbrella
Frame, the evaporation source and ion gun of vacuum evaporation apparatus are generally arranged at the bottom of vacuum coating chamber.During plated film, evaporation source and from
Component is started working, and carries the film-plating umbrella stand of film plating substrate with center steering mechanism as axle is rotated.When ion gun transmitting
The emission port of lotus energy particle for circle, and film-plating umbrella stand and ion gun relative dip angle it is smaller when, ion gun transmitting lotus energy
Projection of the Isoenergetical line of particle in film-plating umbrella stand is also approximately circular.It is apparent from, the circular film-plating umbrella stand for now rotating is radially
On sweeping time of circle for being surrounded in Isoenergetical line of substrate be under normal circumstances different, it is thus impossible to ensure each base
Piece receives roughly equal particle-irradiation.Generally, want to realize coating film thickness homogeneity, can be set above evaporation source
Thickness amending plates are put, is designed by the shape of thickness amending plates, selectively change the launch angle of evaporation source coating materials to realize
Thickness homogeneity.However, wanting to realize film consistency homogeneity, it is contemplated that what ion gun was launched is high energy particle, class
Like thickness amending plates mode be likely to result in amending plates be sputtered and influence plate film quality.
The content of the invention
The purpose of this utility model is according to above-mentioned the deficiencies in the prior art, there is provided one kind realizes ion gun uniform irradiation
The radome of film plating substrate, the opening fan-shaped by setting fan-shaped or class realizes that film-plating umbrella stand film plating substrate radially receives
The exposure intensity of the lotus energy particle for arriving is equal, improves film consistency homogeneity.
The utility model purpose is realized being completed by following technical scheme：
A kind of radome for realizing ion gun uniform irradiation film plating substrate, is related to ion gun to being carried on rotatable coating umbrella
Film plating substrate on frame carries out plated film, it is characterised in that：The radome is arranged on the periphery of the ion gun, the radome
Covering on top offer fan-shaped or class sector open, the fan-shaped or class sector open is located at the top of the ion gun.
The size of the fan-shaped or class sector open is satisfied with enables the lotus particle of the ion gun transmitting in the plated film
The requirement of the projection covering film plating substrate on umbrella stand.
The center of circle of the fan-shaped or class sector open is located on the perpendicular bisector of the film-plating umbrella stand.
The utility model has the advantages that：Realize that the lotus energy particle-irradiation that film-plating umbrella stand film plating substrate radially is received is strong
Degree is roughly the same, so as to form the preferable film consistency of uniformity；It is simple and reasonable for structure, strong applicability.
Brief description of the drawings
Fig. 1 is the front view of vacuum film coating chamber of the present utility model；
Fig. 2 is the schematic diagram of the fan-shaped emission mouthful of the utility model intermediate ion source transmitting lotus energy particle；
Fig. 3 is that projection of the fan-shaped emission mouthful of the utility model intermediate ion source transmitting lotus energy particle in film-plating umbrella stand is illustrated
Figure.
Specific embodiment
The utility model feature and other correlated characteristics are described in further detail by embodiment below in conjunction with accompanying drawing,
In order to the understanding of technical staff of the same trade：
As Figure 1-3,1-10,31-33 is marked to be expressed as in figure：Vacuum film coating chamber 1, film-plating umbrella stand 2, plated film base
Piece 3, center steering mechanism 4, ion gun 5, evaporation source 6, ion gun radome 7, evaporation source radome 8, thickness amending plates 9, from
Component launches emission port 10, inner ring substrate 31, centre circle substrate 32, the outer ring substrate 33 of lotus energy particle.
Embodiment：Realized in the present embodiment ion gun uniform irradiation film plating substrate radome be arranged on it is as shown in Figure 1
Among coating apparatus.
As shown in figure 1, coating apparatus main body is vacuum film coating chamber 1, the internal chamber of vacuum film coating chamber 1 is plated film space.
The top of vacuum film coating chamber 1 is provided with centre revolving structure 4, film-plating umbrella stand 2 is fixedly mounted in center steering mechanism 4；
Under the driving of center steering mechanism 4, film-plating umbrella stand 2 can rotate in the inside of vacuum film coating chamber 1 around center steering mechanism 4.In plating
Some film plating substrates 3 have been evenly arranged on film umbrella stand 2, by the radial direction of film-plating umbrella stand 2 be divided into from the inside to the outside inner ring substrate 31,
Centre circle substrate 32 and outer ring substrate 33.The lower section of film-plating umbrella stand 2 is provided with the ion for carrying out plated film to film plating substrate 3
Source 5 and evaporation source 6, ion gun 5 and evaporation source 6 are respectively fixedly disposed at the bottom of vacuum film coating chamber 1.In evaporation source 6 and plated film
Film thickness correction plate 9 is provided between umbrella stand 2, one end of film thickness correction plate 9 is fixedly connected with the chamber inner wall of vacuum film coating chamber 1,
The outgoing particle of evaporation source 6 is adapted to up to the film plating substrate 3 in film-plating umbrella stand 2, to improve coating film thickness through film thickness correction plate 9
Homogeneity.
As shown in figure 1, ion gun radome 7 is fixedly installed on the periphery of ion gun 7, its covering on top offers sector
Opening.As shown in Fig. 2 the sector open on ion gun radome 7 enables ion gun to launch the section of the emission port 10 of lotus particle
It is shaped as sector（The sector region that ABCD is surrounded in Fig. 2）.Now, as shown in figure 3, launching lotus energy grain in fan-shaped ion gun
Projection of the emission port 10 of son in film-plating umbrella stand 2, i.e. Isoenergetical line of the fan-shaped emission region in film-plating umbrella stand 2 is surrounded
Sector region is A ' B ' C ' D ', and the sector region covers inner ring substrate 31, centre circle substrate 32 and outer ring substrate 33.Therefore,
The film-plating umbrella stand 2 of rotation film plating substrate radially on the sector region that Isoenergetical line is surrounded during sweeping, with identical
Angular speed, makes the sweeping time of inner ring substrate 31, centre circle substrate 32 and outer ring substrate 33 in the sector region equal, so
One to carry out the lotus energy particle-irradiation intensity that inner ring substrate 31, centre circle substrate 32 and outer ring substrate 33 received identical, so that shape
Into the good film consistency of homogeneity.The emission port 10 of ion gun transmitting lotus energy particle is the perpendicular bisector of film-plating umbrella stand 2 and is somebody's turn to do
The intersection point of plane where opening, to ensure that the lotus energy particle launched through the emission port 10 of ion gun transmitting lotus energy particle can be uniform
Reach on inner ring substrate 31, centre circle substrate 32 and outer ring substrate 33.
The present embodiment is in the specific implementation：As shown in figure 1, being provided with evaporation source radome 8 in the periphery of evaporation source 6, steam
The top of radome 8 of rising offers opening, using the outgoing scope of the design adjustment evaporation source 6 to opening shape, with raising
The homogeneity of plated film thickness.
Although above example is elaborated to the design of the utility model purpose and embodiment referring to the drawings,
But those skilled in the art will realize that under the precondition for limiting scope without departing from claim, still may be used
To make various modifications and variations, such as openings of sizes of the emission port 10 of ion gun transmitting lotus energy particle to the utility model, from
Height, concrete structure of component radome 7 etc., therefore do not repeat one by one herein.
Claims (3)
1. a kind of radome for realizing ion gun uniform irradiation film plating substrate, is related to ion gun to being carried on rotatable film-plating umbrella stand
On film plating substrate carry out plated film, it is characterised in that：The radome is arranged on the periphery of the ion gun, the radome
Covering on top offers fan-shaped or class sector open, and the fan-shaped or class sector open is located at the top of the ion gun.
2. a kind of radome for realizing ion gun uniform irradiation film plating substrate according to claim 1, it is characterised in that：Institute
The size for stating fan-shaped or class sector open is satisfied with the throwing for enabling the lotus particle of the ion gun transmitting in the film-plating umbrella stand
Shadow covers the requirement of the film plating substrate.
3. a kind of radome for realizing ion gun uniform irradiation film plating substrate according to claim 1, it is characterised in that：Institute
The center of circle for stating fan-shaped or class sector open is located on the perpendicular bisector of the film-plating umbrella stand.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621441260.3U CN206289298U (en) | 2016-12-27 | 2016-12-27 | A kind of radome for realizing ion gun uniform irradiation film plating substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621441260.3U CN206289298U (en) | 2016-12-27 | 2016-12-27 | A kind of radome for realizing ion gun uniform irradiation film plating substrate |
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| Publication Number | Publication Date |
|---|---|
| CN206289298U true CN206289298U (en) | 2017-06-30 |
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| CN201621441260.3U Active CN206289298U (en) | 2016-12-27 | 2016-12-27 | A kind of radome for realizing ion gun uniform irradiation film plating substrate |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113046700A (en) * | 2019-12-26 | 2021-06-29 | 山东华光光电子股份有限公司 | Semi-shielding device for end face coating of strip-shaped semiconductor laser and coating method |
| CN115852315A (en) * | 2022-12-20 | 2023-03-28 | 安徽纯源镀膜科技有限公司 | Equipment and process for improving film stripping efficiency |
| CN117488248A (en) * | 2024-01-02 | 2024-02-02 | 上海米蜂激光科技有限公司 | Correction plate design method, correction plate, coating device and coating method |
-
2016
- 2016-12-27 CN CN201621441260.3U patent/CN206289298U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113046700A (en) * | 2019-12-26 | 2021-06-29 | 山东华光光电子股份有限公司 | Semi-shielding device for end face coating of strip-shaped semiconductor laser and coating method |
| CN115852315A (en) * | 2022-12-20 | 2023-03-28 | 安徽纯源镀膜科技有限公司 | Equipment and process for improving film stripping efficiency |
| CN117488248A (en) * | 2024-01-02 | 2024-02-02 | 上海米蜂激光科技有限公司 | Correction plate design method, correction plate, coating device and coating method |
| CN117488248B (en) * | 2024-01-02 | 2024-03-12 | 上海米蜂激光科技有限公司 | Correction plate design method, correction plate, coating device and coating method |
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