CN206270529U - Depolarization light splitting piece - Google Patents
Depolarization light splitting piece Download PDFInfo
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- CN206270529U CN206270529U CN201621269148.6U CN201621269148U CN206270529U CN 206270529 U CN206270529 U CN 206270529U CN 201621269148 U CN201621269148 U CN 201621269148U CN 206270529 U CN206270529 U CN 206270529U
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Abstract
The utility model is related to depolarization light splitting piece, and the light splitting piece is made up of non-optical glass substrate and spectro-film, and spectro-film is made up of 14 tunics layer, and 14 tunic layer is followed successively by from the inside to the outside：1st layer, TiO2Film layer；2nd layer, SiO2Film layer；3rd layer, TiO2Film layer；4th layer, SiO2Film layer；5th layer, TiO2Film layer；6th layer, SiO2Film layer；7th layer, TiO2Film layer；8th layer, SiO2Film layer；9th layer, TiO2Film layer；10th layer, SiO2Film layer, 11th layer, TiO2Film layer；12nd layer, SiO2Film layer；13rd layer, TiO2Film layer；14th layer, SiO2Film layer.The light splitting piece not only reduces difficulty of processing, reduces processing cost, and film layer firmness is good, hardness is strong, and the number of plies is few, thickness is thin；Its service band is 530 570nm, and transflection ratio is 50:The difference of 50, S components and P components is less than 3%.
Description
Technical field
The utility model is related to a kind of light splitting piece, more particularly to a kind of depolarization light splitting piece.
Background technology
Light splitting piece is widely used in the fields such as photoelectric instrument, laser system, photoelectric display system and optical storage, normal conditions
Lower light splitting piece is usually inclined and used, and incident light is beamed into reflected light and transmitted light two parts.When light is oblique be mapped to it is optically thin
During film, because electric field and magnetic field tangential component on each interface are continuous, therefore S components and P components effective refractive index
By difference, this causes that film is inevitably generated polarization effect, and people often design and manufacture polarization point using this characteristic
The optical polarization device such as light device.But want to eliminate polarization effect again in other optical system applications.
Depolarization light-splitting device is typically designed to the structure of cemented prism, i.e. depolarization Amici prism.By to prism
The scheme of inclined-plane plated film and glued pairing prism realizes, its processing technology complexity, work flow long, high processing costs, finally
Yield rate is low.
Utility model content
The purpose of this utility model is to overcome disadvantage mentioned above, there is provided a kind of depolarization light splitting piece, the light splitting piece does not only have
Difficulty of processing is reduced to effect, processing cost is reduced, is easy to design to produce, and film layer firmness is good, hardness is strong, it is small to absorb,
The number of plies is few, thickness is thin；Its service band is 530-570nm, and transflection ratio is 50:The difference of 50, S components and P components is less than 3%.
What the utility model was realized in：A kind of depolarization light splitting piece, it is characterised in that：The light splitting piece is by optical glass
Substrate and the spectro-film composition being deposited on non-optical glass substrate, the spectro-film are made up of 14 tunics layer, 14 tunic layer
By high refractive index medium material TiO2Film layer and low refractive index dielectric material SiO2Film layer is repeatedly alternately stacked composition, 14 tunic
Layer is followed successively by from the inside to the outside：1st layer, TiO2Film layer, thickness is 49.3-50.3nm；2nd layer, SiO2Film layer, thickness is 84.2-
85.9nm；3rd layer, TiO2Film layer, thickness is 39.5-40.3nm；4th layer, SiO2Film layer, thickness is 67.0-68.3nm；5th
Layer, TiO2Film layer, thickness is 36.2-37.0nm；6th layer, SiO2Film layer, thickness is 77.3-78.9nm；7th layer, TiO2Film layer,
Thickness is 49.0-50.0nm；8th layer, SiO2Film layer, thickness is 101.1-103.2nm；9th layer, TiO2Film layer, thickness is
58.4-59.5nm；10th layer, SiO2Film layer, thickness is 114.4-116.7nm, 11th layer, TiO2Film layer, thickness is 85.8-
87.5nm；12nd layer, SiO2Film layer, thickness is 196.8-200.8nm；13rd layer, TiO2Film layer, thickness is 79.5-81.1nm；
14th layer, SiO2Film layer, thickness is 154.6-157.7nm.
Manufacturing process of the present utility model includes：In vacuum coating equipment, using vacuum coating technology in optical glass base
Accurate deposition specific thickness requires TiO2 film layers and SiO2 film layers successively on bottom, ultimately forms 14 layers of described light splitting
Film.
Preferably, the thickness of the 14 tunic layer is followed successively by：1st layer, TiO2Film layer, thickness is 49.8nm；2nd layer, SiO2
Film layer, thickness is 85.1nm；3rd layer, TiO2Film layer, thickness is 39.9nm；4th layer, SiO2Film layer, thickness is 67.7nm；5th
Layer, TiO2Film layer, thickness is 36.6nm；6th layer, SiO2Film layer, thickness is 78.1nm；7th layer, TiO2Film layer, thickness is
49.5nm；8th layer, SiO2Film layer, thickness is 102.1nm；9th layer, TiO2Film layer, thickness is 59.0nm；10th layer, SiO2Film
Layer, thickness is 115.6nm, 11th layer, TiO2Film layer, thickness is 86.6nm；12nd layer, SiO2Film layer, thickness is 198.8nm；The
13 layers, TiO2Film layer, thickness is 80.3nm；14th layer, SiO2Film layer, thickness is 156.1nm.
Preferably, the refractive index of the non-optical glass substrate is 1.49-1.56.
Preferably, the non-optical glass substrate uses K9 or D263T or B270 or BK7.
For than depolarization Amici prism, the utility model has advantages below：
Simple structure, it is to be capable of achieving depolarization spectrophotometric result only to plate conventional deielectric-coating with optics glass planar sheets, without entering
Row prism three surface processing, without gluing and solidifying, even without overleaf plating anti-reflection film；Be easy to design the number of plies be few, it is thickness of thin, depolarized
The obvious spectro-film of effect of shaking, while easily preparing low production cost, excellent in stability, service life spectro-film more long.
Brief description of the drawings
The utility model is described in further detail in conjunction with the embodiments with reference to the accompanying drawings：
Fig. 1 is the structural representation of the utility model depolarization light splitting piece；
Fig. 2 is the light transmission rate figure of the depolarization light splitting piece that the utility model embodiment 1 is provided；
Fig. 3 is the light transmission rate figure of the depolarization light splitting piece that the utility model embodiment 1 is provided；
Fig. 4 is the light transmission rate figure of the depolarization light splitting piece that the utility model embodiment 1 is provided.
Symbol description in figure：1st, non-optical glass substrate, 2, filter coating, 21, TiO2Film layer, 22, SiO2Film layer, 3, air.
Specific embodiment
The utility model content is described in detail with reference to Figure of description and specific embodiment：
As shown in figure 1, a kind of depolarization light splitting piece provided for the utility model, the light splitting piece by non-optical glass substrate with
And the spectro-film composition on non-optical glass substrate is deposited on, the spectro-film is made up of 14 tunics layer, and 14 tunic layer is rolled over by height
Penetrate rate dielectric material TiO2Film layer and low refractive index dielectric material SiO2Film layer is repeatedly alternately stacked composition, and 14 tunic layer is from interior
To being followed successively by outward：1st layer, TiO2Film layer, thickness is 49.3-50.3nm；2nd layer, SiO2Film layer, thickness is 84.2-85.9nm；
3rd layer, TiO2Film layer, thickness is 39.5-40.3nm；4th layer, SiO2Film layer, thickness is 67.0-68.3nm；5th layer, TiO2Film
Layer, thickness is 36.2-37.0nm；6th layer, SiO2Film layer, thickness is 77.3-78.9nm；7th layer, TiO2Film layer, thickness is
49.0-50.0nm；8th layer, SiO2Film layer, thickness is 101.1-103.2nm；9th layer, TiO2Film layer, thickness is 58.4-
59.5nm；10th layer, SiO2Film layer, thickness is 114.4-116.7nm, 11th layer, TiO2Film layer, thickness is 85.8-87.5nm；
12nd layer, SiO2Film layer, thickness is 196.8-200.8nm；13rd layer, TiO2Film layer, thickness is 79.5-81.1nm；14th layer,
SiO2Film layer, thickness is 154.6-157.7nm.
Manufacturing process of the present utility model includes：In vacuum coating equipment, using vacuum coating technology in optical glass base
Accurate deposition specific thickness requires TiO2 film layers and SiO2 film layers successively on bottom, ultimately forms 14 layers of described light splitting
Film.
Table 1：The Comprehensive Correlation table of depolarization light splitting piece prism and the depolarization light splitting piece of the utility model embodiment 1
As can be seen from Table 1：Depolarization light splitting piece manufacturing cost of the present utility model is significantly lower than depolarization light splitting rib
Mirror, coated surface number is less than the half of depolarization Amici prism, and difficulty of processing is small, and processing cost is low, film layer zero absorption, transflection ratio
Better than depolarization Amici prism, and film hardness and firmness are good.
Embodiment 1：
A kind of depolarization light splitting piece, the light splitting piece is by non-optical glass substrate and the light splitting being deposited on non-optical glass substrate
Film is constituted, and the spectro-film is made up of 14 tunics layer, and 14 tunic layer is by high refractive index medium material TiO2Film layer and low refraction
Rate dielectric material SiO2Film layer is repeatedly alternately stacked composition, and the thickness of the 14 tunic layer is followed successively by：1st layer, TiO2Film layer is thick
It is 49.8nm to spend；2nd layer, SiO2Film layer, thickness is 85.1nm；3rd layer, TiO2Film layer, thickness is 39.9nm；4th layer, SiO2
Film layer, thickness is 67.7nm；5th layer, TiO2Film layer, thickness is 36.6nm；6th layer, SiO2Film layer, thickness is 78.1nm；7th
Layer, TiO2Film layer, thickness is 49.5nm；8th layer, SiO2Film layer, thickness is 102.1nm；9th layer, TiO2Film layer, thickness is
59.0nm；10th layer, SiO2Film layer, thickness is 115.6nm, 11th layer, TiO2Film layer, thickness is 86.6nm；12nd layer, SiO2
Film layer, thickness is 198.8nm；13rd layer, TiO2Film layer, thickness is 80.3nm；14th layer, SiO2Film layer, thickness is 156.1nm.
Preferably, the refractive index of the non-optical glass substrate is 1.49-1.56, for example, can use K9 or D263T or B270
Or BK7.
As shown in Fig. 2 the light transmission rate figure of the depolarization light splitting piece for embodiment 1, it can be seen that embodiment
1 light splitting piece for providing is efficiently wave band for the natural light of 530-570nm is divided into two-beam, while ensureing S components and P components
Energy is impartial.
Embodiment 2：
A kind of depolarization light splitting piece, the light splitting piece is by non-optical glass substrate and the light splitting being deposited on non-optical glass substrate
Film is constituted, and the spectro-film is made up of 14 tunics layer, and 14 tunic layer is by high refractive index medium material TiO2Film layer and low refraction
Rate dielectric material SiO2Film layer is repeatedly alternately stacked composition, and the thickness of the 14 tunic layer is followed successively by：1st layer, TiO2Film layer is thick
It is 49.3nm to spend；2nd layer, SiO2Film layer, thickness is 84.2nm；3rd layer, TiO2Film layer, thickness is 39.5nm；4th layer, SiO2
Film layer, thickness is 67.0nm；5th layer, TiO2Film layer, thickness is 36.2nm；6th layer, SiO2Film layer, thickness is 77.3nm；7th
Layer, TiO2Film layer, thickness is 49.0nm；8th layer, SiO2Film layer, thickness is 101.1nm；9th layer, TiO2Film layer, thickness is
58.4nm；10th layer, SiO2Film layer, thickness is 114.4nm, 11th layer, TiO2Film layer, thickness is 85.8nm；12nd layer, SiO2
Film layer, thickness is 196.8nm；13rd layer, TiO2Film layer, thickness is 79.5nm；14th layer, SiO2Film layer, thickness is 154.6nm.
Preferably, the refractive index of the non-optical glass substrate is 1.49-1.56, for example, can use K9 or D263T or B270
Or BK7.
As shown in figure 3, the light transmission rate figure of the depolarization light splitting piece for embodiment 2, it can be seen that embodiment
1 light splitting piece for providing is efficiently wave band for the natural light of 530-570nm is divided into two-beam, while ensureing S components and P components
Energy is impartial.
Embodiment 3：
A kind of depolarization light splitting piece, the light splitting piece is by non-optical glass substrate and the light splitting being deposited on non-optical glass substrate
Film is constituted, and the spectro-film is made up of 14 tunics layer, and 14 tunic layer is by high refractive index medium material TiO2Film layer and low refraction
Rate dielectric material SiO2Film layer is repeatedly alternately stacked composition, and the thickness of the 14 tunic layer is followed successively by：1st layer, TiO2Film layer is thick
It is 50.3nm to spend；2nd layer, SiO2Film layer, thickness is 85.9nm；3rd layer, TiO2Film layer, thickness is 40.3nm；4th layer, SiO2
Film layer, thickness is 68.3nm；5th layer, TiO2Film layer, thickness is 37.0nm；6th layer, SiO2Film layer, thickness is 78.9nm；7th
Layer, TiO2Film layer, thickness is 50.0nm；8th layer, SiO2Film layer, thickness is 103.2nm；9th layer, TiO2Film layer, thickness is
59.5nm；10th layer, SiO2Film layer, thickness is 116.7nm, 11th layer, TiO2Film layer, thickness is 87.5nm；12nd layer, SiO2
Film layer, thickness is 200.08nm；13rd layer, TiO2Film layer, thickness is 81.1nm；14th layer, SiO2Film layer, thickness is
157.7nm。
Preferably, the refractive index of the non-optical glass substrate is 1.49-1.56, such as optical glass substrate K9 or D263T
Or B270 or BK7.
As shown in figure 4, the light transmission rate figure of the depolarization light splitting piece for embodiment 3, it can be seen that embodiment
1 light splitting piece for providing is efficiently wave band for the natural light of 530-570nm is divided into two-beam, while ensureing S components and P components
Energy is impartial.
Above-mentioned specific embodiment is that the technical solution of the utility model is explained in detail, and the utility model is not
Above-described embodiment is only limited only to, every any improvement or replacement according to the utility model principle all should be new in this practicality
Within the protection domain of type.
Claims (4)
1. a kind of depolarization light splitting piece, it is characterised in that：The light splitting piece is by non-optical glass substrate and is deposited on optical glass base
Spectro-film composition on bottom, the spectro-film is made up of 14 tunics layer, and 14 tunic layer is by high refractive index medium material TiO2Film
Layer and low refractive index dielectric material SiO2Film layer is repeatedly alternately stacked composition, and 14 tunic layer is followed successively by from the inside to the outside：1st layer,
TiO2Film layer, thickness is 49.3-50.3nm；2nd layer, SiO2Film layer, thickness is 84.2-85.9nm；3rd layer, TiO2Film layer is thick
It is 39.5-40.3nm to spend；4th layer, SiO2Film layer, thickness is 67.0-68.3nm；5th layer, TiO2Film layer, thickness is 36.2-
37.0nm；6th layer, SiO2Film layer, thickness is 77.3-78.9nm；7th layer, TiO2Film layer, thickness is 49.0-50.0nm；8th
Layer, SiO2Film layer, thickness is 101.1-103.2nm；9th layer, TiO2Film layer, thickness is 58.4-59.5nm；10th layer, SiO2Film
Layer, thickness is 114.4-116.7nm, 11th layer, TiO2Film layer, thickness is 85.8-87.5nm；12nd layer, SiO2Film layer, thickness
It is 196.8-200.8nm；13rd layer, TiO2Film layer, thickness is 79.5-81.1nm；14th layer, SiO2Film layer, thickness is 154.6-
157.7nm。
2. depolarization light splitting piece according to claim 1, it is characterised in that：The thickness of the 14 tunic layer is followed successively by：1st
Layer, TiO2Film layer, thickness is 49.8nm；2nd layer, SiO2Film layer, thickness is 85.1nm；3rd layer, TiO2Film layer, thickness is
39.9nm；4th layer, SiO2Film layer, thickness is 67.7nm；5th layer, TiO2Film layer, thickness is 36.6nm；6th layer, SiO2Film layer,
Thickness is 78.1nm；7th layer, TiO2Film layer, thickness is 49.5nm；8th layer, SiO2Film layer, thickness is 102.1nm；9th layer,
TiO2Film layer, thickness is 59.0nm；10th layer, SiO2Film layer, thickness is 115.6nm, 11th layer, TiO2Film layer, thickness is
86.6nm；12nd layer, SiO2Film layer, thickness is 198.8nm；13rd layer, TiO2Film layer, thickness is 80.3nm；14th layer, SiO2
Film layer, thickness is 156.1nm.
3. depolarization light splitting piece according to claim 1 and 2, it is characterised in that：The refractive index of the non-optical glass substrate
It is 1.49-1.56.
4. depolarization light splitting piece according to claim 1 and 2, it is characterised in that：The non-optical glass substrate using K9 or
D263T or B270 or BK7 etc..
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621269148.6U CN206270529U (en) | 2016-11-24 | 2016-11-24 | Depolarization light splitting piece |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621269148.6U CN206270529U (en) | 2016-11-24 | 2016-11-24 | Depolarization light splitting piece |
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| CN206270529U true CN206270529U (en) | 2017-06-20 |
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| CN201621269148.6U Withdrawn - After Issue CN206270529U (en) | 2016-11-24 | 2016-11-24 | Depolarization light splitting piece |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405716A (en) * | 2016-11-24 | 2017-02-15 | 福建福特科光电股份有限公司 | Depolarization beam splitter |
| CN109471211A (en) * | 2018-12-29 | 2019-03-15 | 润坤(上海)光学科技有限公司 | A kind of depolarization light combination mirror film and its design method |
-
2016
- 2016-11-24 CN CN201621269148.6U patent/CN206270529U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405716A (en) * | 2016-11-24 | 2017-02-15 | 福建福特科光电股份有限公司 | Depolarization beam splitter |
| CN109471211A (en) * | 2018-12-29 | 2019-03-15 | 润坤(上海)光学科技有限公司 | A kind of depolarization light combination mirror film and its design method |
| CN109471211B (en) * | 2018-12-29 | 2021-07-02 | 润坤(上海)光学科技有限公司 | Depolarization beam combiner film and design method thereof |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20170620 Effective date of abandoning: 20181106 |
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| AV01 | Patent right actively abandoned |