CN109471211B - Depolarization beam combiner film and design method thereof - Google Patents
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Abstract
The invention relates to a depolarizing beam combiner film, which comprises a substrate and a first film arranged on the substrate, wherein the film system structure of the first film is Subx1H x2L x3H x4L......xk‑ 3H xk‑2L xk‑1H xkL | Air, where Sub is a thin film element substrate, Air is an exit medium Air, H and L are a high refractive index material thin film layer and a low refractive index material thin film layer of 1/4 center wavelength optical thickness, respectively, x1～xkK is the total number of thin film layers, which is the optical thickness coefficient of each thin film layer. Compared with the prior art, the method has the advantages of simple optimization process, regular film system, convenient and accurate preparation, reduced preparation complexity, good depolarization effect, excellent spectral characteristics, convenient popularization and use and the like, has wide practical prospect in the optical path transmission of large-scale laser devices, and can be used for incoherent beam combination of lasers with different wavelengths.
Description
Technical Field
The invention belongs to the field of lasers, relates to an optical film, and particularly relates to a depolarization beam combiner film and a design method thereof
Background
The high-power laser plays a very important role in laser fusion, national defense and military, industrial production, medical instruments, space communication, aerospace technology and the like. Some application fields put high requirements on the power of lasers, such as laser cutting and welding, the field of automobile processing needs high-power lasers in kilowatt level, and the field of national defense and military needs high-power laser directional weapons. These requirements and applications present a new challenge to the improvement of performance indexes such as power, beam quality and output efficiency of the laser at present. The effective method for improving the output power of the laser is to utilize a laser beam combination technology to carry out incoherent beam combination on lasers in different wave bands to obtain the multi-band and high-power output effect, and the method has great significance in the aspects of high-energy laser application, long-distance laser transmission and the like. Under the principle of laser beam combination: the beam combining mirror is arranged at an angle of 45 degrees to the left, and the laser beam lambda isAVertically incident to the right surface of the beam combiner, and horizontally emergent through high reflection of the beam combiner film; laser beam lambdaBThe beam enters the left surface of the beam combiner horizontally, is reflected by the anti-reflection of the beam combiner film and exits horizontally, and two beams of light are combined in an incoherent manner, so that the output power of the laser is greatly improved. The left surface and the right surface of the beam combiner are plated with depolarizing beam combiner films, and the transmission efficiency and the reflection efficiency of the films under the corresponding wavelengths seriously affect the beam combining quality of the laser. But the combined beam wavelength is usually close (such as lambda)AIs 976nm, lambdaB1010nm combined beam), even if the polarization separation of the P polarized light and the S polarized light under the working angle of 45 degrees is eliminated, the high reflection of the P polarized light and the S polarized light at 976nm and the high transmission of the P polarized light and the S polarized light at 1010nm are ensured, which brings extremely high challenges to the design and preparation of the film.
One of the design ideas of the traditional depolarized beam combination film is to use a regular high-reflection film system with alternately appearing high-refractive index film layers as an initial film system and perform random optimization design. However, this initial film system cannot achieve both high-efficiency antireflection and high-reflection of P-polarized light and S-polarized light required for laser beam combination, and the polarization separation of P-polarized light and S-polarized light is extremely large. The optimization process is very complicated, and the finally obtained membrane system is also very irregular. Meanwhile, the relatively complex film system structure also brings a great deal of difficulty to the precise preparation of the thin film:
1. the film sensitivity is high, and a small deposition thickness error can bring about a large spectral deviation;
2. the membrane layers are distributed in a messy way, and larger random errors can be introduced;
3. introducing very thick and very thin layers may introduce larger systematic errors. Many factors cause the actual spectrum to deviate far from the designed spectrum, and higher reflectivity, transmittance and good depolarization effect cannot be obtained. In the other method, three or more materials are used for design, the depolarization effect is good, but the adopted materials are more, so that the practical preparation difficulty is higher for most coating equipment, and the method cannot be widely popularized.
At present, no design which can effectively solve polarization separation and has high preparation feasibility exists. In view of the above problems, a design method that combines spectral characteristics and manufacturing feasibility is urgently needed for the depolarizing beam combiner film, so as to improve laser beam combining efficiency.
Disclosure of Invention
The present invention is directed to a depolarizing beam combiner film and a design method thereof, which overcome the above-mentioned drawbacks of the prior art.
The purpose of the invention can be realized by the following technical scheme:
a depolarized beam combiner film comprises a substrate and a first film arranged on the substrate, wherein the film system of the first film is Sub | x1H x2L x3H x4L......xk-3H xk-2L xk-1H xkL | Air, where Sub is a thin film element substrate, Air is an exit medium Air, H and L are a high refractive index material thin film layer and a low refractive index material thin film layer of 1/4 center wavelength optical thickness, respectively, x1～xkK is the total number of thin film layers, which is the optical thickness coefficient of each thin film layer.
Preferably, the substrate material is fused silica or K9 glass.
Preferably, the high refractive index material is HfO2、TiO2，ZrO2、Ta2O5Sulfide or selenide, low refractive index material is MgF2、SiO2Or Al2O3。
A design method of a depolarizing beam combiner film comprises the following steps:
1) selected center wavelength λ0；
2) Adjusting the optical thickness ratio in the first thin film multilayer film, and taking a film system structure with the best depolarization effect under 45-degree incidence as an initial structure of the first thin film, namely Sub |1.34(1.15(HLHL)0.85(HLHL)) ^ n | Air, wherein Sub is a thin film element substrate, Air is emergent medium Air, H and L are a high-refractive-index material thin film layer and a low-refractive-index material thin film layer with the optical thickness of 1/4 central wavelength respectively, and n is the film stack number;
3) setting the film system of the initial structure of the first film at lambda1＜λA＜λ2The transmittance of P-polarized light and S-polarized light in the wavelength band is minimum, lambda3＜λB＜λ4The transmittance of P polarized light and S polarized light in the wave band is maximum, whereinAIs a reflection band having a central wavelength of λBIs a transmission band with a central wavelength, λ1Optimizing target starting wavelength, λ, for high inversion band2Optimizing a target termination wavelength, λ, for high inversion bands3Optimizing target starting wavelength, λ, for high transmission band4Optimizing a target termination wavelength for high transmission band, and λ1＜λA＜λ2＜λ0＜λ3＜λB＜λ4；
4) Optimizing an initial structure by adopting membrane system design software, which specifically comprises the following steps:
during optimization, the main part of the film system of the first film is ensured to be unchanged, the optimized part is a sensitive layer, and the film system is regular, the spectrum depolarization characteristic is excellent, and the lambda value isAHigh reflection, lambdaBReaching high transmission as an optimized termination condition;
5) the finally obtained optimized film system structure is as follows: sub | x1H x2L x3H x4L......xk-3H xk-2L xk-1H xkL | Air, where x1～xkIs the optical thickness coefficient of each thin film layer.
Preferably, the working angle of the depolarizing beam combiner film is 45 °.
Preferably, said central wavelength λ0According to the central wavelength lambda of the reflection bandAAnd a central wavelength λ of the transmission bandBSelecting the film system as follows:
λA＜λ0＜λB。
preferably, the high reverse band optimization target starting wavelength lambda1High reflection band optimized target termination wavelength lambda2High transmission band optimized target starting wavelength lambda3And a high transmission band optimized target termination wavelength lambda4Adjusting according to the actual laser beam combination wavelength, and taking lambda under the film system1＝0.98*λA,λ2＝1.01*λA,λ3＝0.99*λB，λ3＝1.02*λB。
The number n of the film stacks is more than or equal to 8.
Preferably, the membrane system design software is TFC, Essential Macload or Optilayer, and the functions applied are Hyper Newton, Modified DLS, Newton method, Sequential QP, Quasi-Newton DLS, concrete gradients, Steepest device, Gradient method, Simplex method and Variable method.
Compared with the prior art, the invention has the following advantages:
1. simplifying the optimization process: because a special initial film system is adopted, the depolarization effect is obvious, so that an ideal depolarization beam combiner film can be obtained only by slight optimization, and the optimization process can be realized by using common TFC, Macload and Optilayer software;
2. the film system is regular: given a special initial structure, polarization separation generated when a high reflection band is transited to a high anti-reflection band can be eliminated to the maximum extent, and excellent spectral characteristics can be obtained through simple film thickness optimization;
3. the preparation is convenient: because the designed film system is a regular film system, the film thickness error sensitivity is low, and even under the thickness error within 1 percent, the excellent spectral characteristics can be kept, so that the preparation feasibility is greatly improved;
4. the complexity of the preparation is reduced: compared with the method of combining a plurality of materials of the traditional depolarizing film, the method has the advantages that the preparation complexity is reduced, more uncontrollable factors are reduced, and the preparation feasibility is effectively improved;
5. good depolarization effect and excellent spectral characteristics: compared with the traditional design method, the method is easier to realize good depolarization effect and spectral characteristic.
Drawings
Fig. 1 is a schematic diagram of a 45-degree near-infrared depolarizing beam combiner film according to an embodiment of the present invention.
FIG. 2 shows the film transmittance spectrum at 45 degree incidence for a 1.34(1.15(HLHL)0.85(HLHL)) film system structure.
FIG. 3 is a transmittance spectrum of a structured high reflection film.
FIG. 4 shows the optical constants of JGS1 fused silica substrates in an example of the present invention.
FIG. 5 shows Ta as a high index material in an embodiment of the present invention2O5The optical constants of (a).
FIG. 6 shows a low refractive index material SiO in an embodiment of the present invention2The optical constants of (a).
FIG. 7 is a graph of initial film transmittance spectra given in examples of the present invention.
FIG. 8 is a simplified optimized film thickness distribution diagram according to an embodiment of the present invention.
FIG. 9 is a simplified optimized film transmission spectrum for an embodiment of the present invention.
FIG. 10 is a film thickness distribution diagram optimized by a structured high reflection film system.
FIG. 11 is a film transmittance spectrum optimized by a structured high reflection film system.
FIG. 12 is an S-polarized light error analysis transmittance spectrum at 45 degree incidence for a film that has been simply optimized according to an embodiment of the present invention.
FIG. 13 is a simplified optimized 45 degree incident P-polarization error analysis transmittance spectrum of a film in accordance with an embodiment of the present invention.
The notation in the figure is:
1. a substrate, 2, a first film.
Detailed Description
The invention is described in detail below with reference to the figures and specific embodiments.
The content of the invention is mainly to use the different optical thickness matching ratios of the multilayer film to controllably modulate the equivalent refractive index of the multilayer film, thereby reducing the polarization separation degree of the film. For a single layer film, the parameters of polarization index are: the parameters of polarization division are
Wherein n is the refractive index of the single-layer film material, theta is the refraction angle, and theta is0Is the angle of incidence, ηPIs the effective admittance, eta, of P polarized lightSIs effectively admittance of S-polarized light. It is clear that the degree of polarization separation is constantly greater than 1, and that there is polarization separation in a single film, where etaP＞ηs. In addition, the refractive index n of the single-layer film is also one of the important factors affecting the polarization separation degree. The polarization separation degree of the film can be effectively reduced by properly adjusting the refractive index n value of the single-layer film. In fact, by using the theory of the equivalent refractive index of the multilayer film, the multilayer film can be equivalent to a single-layer film, and the combined admittance of the multilayer film is equivalent to the refractive index of the single-layer film, so that the invention utilizes the different matching ratios of the optical thickness of the multilayer film to controllably modulate the equivalent refractive index, thereby effectively reducing the polarization separation degree of the film layer.
The invention provides a depolarization beam combiner film and a design method, wherein the film structure consists of a substrate 1 and a first film 2, as shown in fig. 1, the initial structure of the first film 2 is Sub |1.34(1.15(HLHL)0.85(HLHL)) ^ n | Air, wherein, Sub is a film element substrate, Air is an emergent medium Air, H and L are respectively a high refractive index material and a low refractive index material with the optical thickness of 1/4 central wavelength, n is the film stack number, and the design steps of the film system structure are as follows:
1) selecting the central wavelength lambda according to actual requirements0；
2) Adjusting the optical thickness ratio in the multilayer film to obtain a film system structure with the best depolarization effect under the incidence of 45 degrees, wherein the transmittance spectrum of the film system structure is shown in figure 2, so that the initial structure of the first film (2) is Sub |1.34(1.15(HLHL)0.85(HLHL)) ^ n | Air;
3) setting the initial structure of the first film (2) at λ1＜λA＜λ2The transmittance of P-polarized light and S-polarized light in the wavelength band is minimum, lambda3＜λB＜λ4The transmittance of P polarized light and S polarized light in the wave band is maximum, whereinAIs a reflection band having a central wavelength of λBIs a transmission band with a central wavelength, λ1＜λA＜λ2＜λ0＜λ3＜λB＜λ4，；
4) Optimizing the initial structure of the first film (2) set in the step 3) by using film system design software, ensuring that the main part of the film system is unchanged during optimization, and optimizing only part of sensitive layers to ensure that the film system is nearly regular, the spectrum depolarization characteristic is excellent, and the lambda isAHigh reflection, lambdaBReaching a termination condition where high transmission is optimal;
5) the final film system structure after optimization is obtained as follows: sub | x1H x2L x3H x4L......xk-3H xk-2L xk-1H xkL | Air where x1～xkThe optical thickness coefficient of each film layer is shown, k is the total number of the film layers, and the working angle of the depolarizing beam combiner film is 45 degrees.
The material of the substrate (1) is fused quartz or K9 glass;
center wavelength λ0Can be based on the combined beam wavelength lambda of the laserAAnd λBIs selected, usually by taking λA＜λ0＜λB；
The high refractive index material is HfO2、TiO2，ZrO2、Ta2O5Sulfide or selenide, low refractionThe rate material is MgF2、SiO2Or Al2O3；
The number n of film stacks of the film system can be selected at will according to the requirements and characteristics of the used laser beam combination, and the structure n of the film system is more than or equal to 8.
λ1、λ2、λ3、λ4Can be adjusted according to the actual laser beam combination wavelength, under the membrane system, lambda1＝0.98*λA,λ2＝1.01*λA,λ3＝0.99*λB，λ3＝1.02*λB；
The film system design software is TFC, Essential Macload or Optilayer;
the functions of the membrane design software applications are Hyper Newton, Modified DLS, Newton method, Sequential QP, Quasi-Newton DLS, Conjugate gradients, Steepest device, Gradient method, Simplex method and Variable method.
Example (b):
the embodiment provides a 45-degree near-infrared depolarizing beam combiner film and a design method thereof. The laser beam combination wavelength is as follows: lambda [ alpha ]AIs 976nm, lambdaB1010nm, namely, the requirement of high reflection of 976nm P polarized light and S polarized light, high transmission of 1010nm P polarized light and S polarized light and elimination of polarization separation of P polarized light and S polarized light are met. Fig. 3 shows a structured high reflection film: sub | (HL) ^20| Air transmittance spectrum, it can be seen that the initial film system has a large polarization separation, and even through optimization, it is difficult to completely eliminate polarization. A more efficient depolarization design method is therefore needed.
The specific design method comprises the following steps:
the film structure of the 45-degree near-infrared depolarizing beam combiner is shown in fig. 1 and comprises a substrate 1 and a first film 2 which are arranged from bottom to top in sequence.
Selected reference wavelength lambda0Is 1000 nm; selecting a substrate material Sub as JGS1, wherein the optical constants of the substrate material Sub are shown in FIG. 4; selecting high-refractive-index material H as Ta2O5The optical constants are shown in FIG. 5; the low refractive index material L is SiO2The optical constants are shown in FIG. 6.
A45-degree near-infrared depolarizing beam combiner film is designed on a first film (2), and the initial structure of the film system is as follows:
sub |1.34(1.15(HLHL)0.85(HLHL)) ^8| Air. As can be seen from the spectral calculation, the initial film system has a small polarization separation degree of 960-1050. Even if not optimized, the film is a depolarizing film system with excellent performance. The spectrum is shown in FIG. 7.
Setting the transmissivity of P polarized light and S polarized light of the film system structure of the first film (2) in a wave band of 956nm < lambda < 985nm to be minimum, the transmissivity of P polarized light and S polarized light of a wave band of 1000nm < lambda < 1030nm to be maximum, optimizing the initial structure of the first film (2) by using the conjunction gradients optimization function of an Optilayer, wherein the simply optimized film system structure is as follows:
the distribution diagram of the film layer of the 45-degree near-infrared depolarizing beam combiner film obtained by optimization is shown in fig. 8, and it can be seen that the film system obtained by simple optimization is almost regular, and convenience is brought to actual preparation. The transmittance spectra of the P-polarized light and the S-polarized light at 45-degree incidence of the optimized 45-degree near-infrared depolarizing beam combiner film are shown in fig. 9: the reflectivity of P polarized light and S polarized light at 976nm is as high as 99.95%, and the transmissivity of P light and S light at 1010nm are both higher than 99.8%. Fig. 7 is a film layer distribution diagram of the depolarizing beam combiner film obtained by conventional optimization, which is shown in fig. 10, and compared with the film system designed in this embodiment, the film system is very irregular, and has an extremely thick layer of 607nm and an extremely thin layer of 20nm, which brings great difficulty to practical preparation. The transmittance spectrum is shown in fig. 11, the polarization separation degree is still relatively high, the reflectivity of the 976nm high-reflection band is not high enough, and the transmittance of 1010nm is not high enough.
Meanwhile, the film is subjected to error analysis by utilizing Optilayer software, and Ta is set2O5And SiO2The film thickness error of (2) is 1%. As shown in fig. 12 and 13: when the light is incident at 45 degrees, the expected reflectivity of P polarized light and S polarized light at 976nm is still as high as 99.75%, and P light at 1010nm is transmittedThe light transmittance and the S light transmittance are both higher than 98.5 percent. Fully illustrates the advantages of low error sensitivity and convenient preparation of the film system.
The working angle of the large-angle depolarizing beam combination film of the present embodiment is 45 degrees. Design spectra preferred embodiments of the present invention are described in detail above. It should be understood that numerous modifications and variations could be devised by those skilled in the art in light of the present teachings without departing from the inventive concepts. Therefore, the technical solutions available to those skilled in the art through logic analysis, reasoning and limited experiments based on the prior art according to the concept of the present invention should be within the scope of protection defined by the claims.
Claims (7)
1. The design method of the depolarization beam combiner film is characterized by comprising a substrate (1) and a first film (2) arranged on the substrate (1), wherein the film system structure of the first film (2) is SubxX1H x2L x3H x4L......xk-3H xk- 2L xk-1H xkL | Air, where Sub is a thin film element substrate, Air is an exit medium Air, H and L are a high refractive index material thin film layer and a low refractive index material thin film layer of 1/4 center wavelength optical thickness, respectively, x1～xkThe optical thickness coefficient of each thin film layer is shown, and k is the total number of the thin film layers;
the method comprises the following steps:
1) selected center wavelength λ0；
2) Adjusting the optical thickness ratio in the first thin film multilayer film, and taking a film system structure with the best depolarization effect under 45-degree incidence as an initial structure of the first thin film, namely Sub |1.34(1.15(HLHL)0.85(HLHL)) ^ n | Air, wherein Sub is a thin film element substrate, Air is emergent medium Air, H and L are a high-refractive-index material thin film layer and a low-refractive-index material thin film layer with the optical thickness of 1/4 central wavelength respectively, and n is the film stack number;
3) setting the film system of the initial structure of the first film at lambda1＜λA＜λ2The transmittance of P-polarized light and S-polarized light in the wavelength band is minimum, lambda3＜λB＜λ4The transmittance of P polarized light and S polarized light in the wave band is maximum, whereinAIs a reflection band having a central wavelength of λBIs a transmission band with a central wavelength, λ1Optimizing target starting wavelength, λ, for high inversion band2Optimizing a target termination wavelength, λ, for high inversion bands3Optimizing target starting wavelength, λ, for high transmission band4Optimizing a target termination wavelength for high transmission band, and λ1＜λA＜λ2＜λ0＜λ3＜λB＜λ4；
4) Optimizing an initial structure by adopting membrane system design software, which specifically comprises the following steps:
during optimization, the main part of the film system of the first film is ensured to be unchanged, the optimized part is a sensitive layer, and the film system is regular, the spectrum depolarization characteristic is excellent, and the lambda value isAHigh reflection, lambdaBReaching high transmission as an optimized termination condition;
5) the finally obtained optimized film system structure is as follows: sub | x1H x2L x3H x4L......xk-3H xk-2L xk-1H xkL | Air, where x1～xkIs the optical thickness coefficient of each thin film layer.
2. The design method of a depolarizing beam combiner film according to claim 1, characterized in that the material of the substrate (1) is fused silica or K9 glass.
3. The method as claimed in claim 1, wherein the high refractive index material is HfO2、TiO2，ZrO2、Ta2O5Sulfide or selenide, low refractive index material is MgF2、SiO2Or Al2O3。
4. The method of claim 1, wherein the depolarizing combiner film is operated at an angle of 45 °.
5. The method of claim 1, wherein the central wavelength λ is a wavelength of light emitted from the light source0According to the central wavelength lambda of the reflection bandAAnd a central wavelength λ of the transmission bandBSelecting the film system as follows:
λA＜λ0＜λB。
6. the method of claim 1, wherein the target starting wavelength λ is optimized for high reflection band1High reflection band optimized target termination wavelength lambda2High transmission band optimized target starting wavelength lambda3And a high transmission band optimized target termination wavelength lambda4Adjusting according to the actual laser beam combination wavelength, and taking lambda under the film system1＝0.98*λA,λ2＝1.01*λA,λ3＝0.99*λB，λ3＝1.02*λB。
7. The design method of the depolarizing beam combiner film according to claim 1, wherein the number n of film stacks is not less than 8.
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| US20150219917A1 (en) * | 2012-08-20 | 2015-08-06 | Ii-Vi Incorporated | Beam Combiner and a Combiner Depolariser |
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