CN206157224U - 一种真空加热装置 - Google Patents
一种真空加热装置 Download PDFInfo
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Abstract
本实用新型公开一种真空加热装置,涉及显示技术领域中,解决了现有技术中的托盘由于在大气环境下保存吸附了大量杂质气体,当吸收有杂质气体的托盘再次被使用时造成了镀膜环境的气氛异常,从而导致产品良率降低的问题。真空加热装置包括:真空腔室,真空腔室内设有用于加热托盘的加热单元,真空腔室连通有氮气发生单元。本实用新型提供的真空加热装置用于显示技术领域中。
Description
技术领域
本实用新型涉及显示技术领域,尤其涉及一种真空加热装置。
背景技术
在TFT-LCD行业中使用磁控溅射立式设备对玻璃基板进行镀膜时,通常利用铝靶材对玻璃基板进行镀膜,虽然铝靶材的使用降低了生产成本,但是使用铝靶材对玻璃基板进行镀膜时,需要保证其所处的环境的气氛纯净,否则在玻璃基板表面所形成的铝膜容易产生凸起和麻点。在使用铝靶材对玻璃基板进行镀膜的过程中,由于托盘作为玻璃基板在各个腔室中完成镀膜的承载工具,因此,托盘的纯净尤为重要。
现有技术中,托盘在使用完毕后通常存储在室温大气环境下,由于托盘在室温大气环境下吸附有空气中的杂质气体,例如,水汽等。当吸附有杂质气体的托盘再次承载玻璃基板在各个腔室中进行镀膜时,这些吸附的杂质气体会造成镀膜环境的气氛异常,从而使铝靶材在对玻璃基板进行镀膜时,玻璃基板的成膜异常,导致产品良率降低。
实用新型内容
本实用新型的目的在于提供一种真空加热装置,解决了现有技术中的托盘在大气环境下保存吸附了大量杂质气体,当吸收有杂质气体的托盘再次被使用时造成了镀膜环境的气氛异常,从而导致产品良率降低的问题。
为了实现上述目的,本实用新型提供如下技术方案:
一种真空加热装置,包括真空腔室,所述真空腔室内设有用于加热托盘的加热单元,所述真空腔室连通有氮气发生单元。
与现有技术相比,本发明提供的真空加热装置具有以下有益效果:
本实用新型提供的真空加热装置中,设有真空腔室,真空腔室内设有加热单元,当把托盘置于真空腔室内时,通过加热单元对托盘加热,由于托盘处于真空高温的环境下,能够有效排出托盘吸附的杂质气体,这不仅能够延长托盘的使用寿命,还能够保证托盘承载玻璃基板在镀膜的过程中,不会因托盘吸附的杂质气体造成镀膜环境的气氛异常,从而在使用铝靶材对玻璃基板进行镀膜时,能够提升玻璃基板的成膜品质,提高产品的良率。此外,真空腔室连通有氮气发生单元,通过氮气发生单元产生的氮气保证了排出的杂质气体不会在短时间内再次被托盘吸附。
附图说明
此处所说明的附图用来提供对本实用新型的进一步理解,构成本实用新型的一部分,本实用新型的示意性实施例及其说明用于解释本实用新型,并不构成对本实用新型的不当限定。在附图中:
图1为本实用新型中真空加热装置截面图;
图2为本实用新型实施例中真空加热装置立体结构图。
附图标记:
1-真空腔室, 2-氮气发生单元;
3-真空泵, 4-加热控制单元;
5-排气单元, 11-真空子腔室;
111-托盘, 112-磁性卡件;
113-加热单元, 114-滑动导轨;
115-第一支柱, 116-支撑件。
具体实施方式
为了进一步说明本实用新型实施例提供的真空加热装置,下面结合说明书附图进行详细描述。
请参阅图1和图2,本实用新型实施例提供的真空加热装置包括真空腔室1,真空腔室1内设有用于加热托盘111的加热单元113,真空腔室1连通有氮气发生单元2。
在具体实施的过程中,将托盘111置于真空腔室内,氮气发生单元2在真空腔室1内产生氮气,氮气能够排出真空腔室1内的空气,当真空腔室1达到真空状态时,加热单元113对托盘111进行加热,使托盘111中的杂质气体在真空高温环境下能够有效排出。通过上述具体实施过程可知,本实施例中真空腔室1内设有加热单元113,当把托盘111置于真空腔室1内时,通过加热单元113对托盘加热,由于托盘113处于真空高温的环境下,能够有效排出托盘111吸附的杂质气体,这不仅能够延长托盘111的使用寿命,还能够保证托盘111承载玻璃基板在镀膜的过程中,不会因托盘111吸附的杂质气体造成镀膜环境的气氛异常,从而在使用铝靶材对玻璃基板进行镀膜时,能够提升玻璃基板的成膜品质,提高产品的良率。此外,真空腔室1连通有氮气发生单元2,通过氮气发生单元2产生的氮气保证了排出的杂质气体不会在短时间内再次被托盘111吸附。
需要说明的是,为了增加真空腔室1的空间利用率,减少真空腔室1的内部占用面积,本实用新型实施将氮气发生单元2置于真空腔室1外部,通过管道使氮气发生单元2与真空腔室1连通。
而为了增加托盘111进出真空腔室1内的便捷性,请继续参阅图1和图2,上述实施例提供的真空加热装置中,真空腔室1内的底部还设有用于导向托盘111进入真空腔室1的滑动导轨114,真空腔室1内的底部还设有用于支撑加热单元113的多个第一支柱115,各第一支柱115间隔排列,真空腔室1内的顶部设有用于固定托盘111的磁性卡件112。
在具体实施的过程中,将待加热的托盘111放置在滑动导轨114上,滑动导轨114不仅用于承载托盘111在真空腔室1内的进出,还能够将托盘111准确导入至真空腔室1内安放托盘111的指定位置,当托盘111处在安放托盘111的指定位置时,磁性卡件112通过吸附力的作用对托盘111进行吸附固定,达到自动固定的目的。
通过上述具体实施过程可知,通过滑动导轨114和磁性卡件112的配合作用,保证了托盘111能够被装入和固定在真空腔室1内,使加热单元113对托盘111进行加热的过程中,避免因托盘111的意外晃动造成托盘111损坏;另外,由于多个间隔排列的第一支柱115之间形成有间隙,因此,第一支柱115不仅起到了对加热单元113固定的作用,还能够使真空腔室1内的气体在第一支柱115之间形成的间隙流通,从而保证了气体在真空腔室1内的流通性。。
需要说明的是,在实际使用的过程中,滑动导轨114为导轨车,导轨车底部设有多个间隔设置的滚轮,滚轮的数量由托盘的大小和重量具体设置,使用导轨车承载托盘在真空腔室1内的进出,可使真空腔室1内的气体在导轨车的的滚轮间隙自由流通。另外,由于导轨车具有结构简单的特点,因此,增加了导轨车维护的便捷性。
考虑到真空腔室1对托盘111真空加热的效率,请参阅图1,上述施例提供的真空加热装置中,真空腔室1包括多个真空子腔室11,各真空子腔室11连通,氮气发生单元2与各个真空子腔室11连通,每个真空子腔室11内设置一个加热单元113,这样就能利用每个真空子腔室11内的加热单元113对其中的托盘111进行加热,即利用多个真空子腔室11实现对多个托盘111同时加热的目的,这极大的提高了真空腔室1对托盘111加热的效率,另外,由于各真空子腔室11连通设置,因此只设置一个氮气发生单元2即可实现氮气充满各真空子腔室11,从而减少氮气发生单元2的设置数量,进而减少了生产成本。
为了保证各真空子腔室11的真空状态,请参阅图1,上述实施例提供的真空加热装置中,真空加热装置还包括设有用于抽出真空腔室1内气体的真空泵3,真空泵3与各个真空子腔室11连通。
在具体实施的过程中,氮气发生单元2首先向各真空子腔室11注入氮气,排出各真空子腔室11中的空气和部分杂质气体,当氮气充满各真空子腔室11后,氮气发生单元2停止向各真空子腔室11注入氮气,此时,开启真空泵3对与之连通的真空子腔室11进行抽气,使各真空子腔室11处于真空状态。通过上述具体实施过程可知,由于真空泵3与各个真空子腔室11连通设置,因此只设置一个真空泵3即可抽出各真空子腔室11内的空气,使各真空子腔室11内均达到真空状态;另外,在真空泵3抽出各真空子腔室11内空气的同时,还能够抽出托盘111在真空高温环境中排出的部分杂质气体,从而增加杂质气体的排出效率。
需要说明的是,为了增加真空腔室1的空间利用率,减少真空腔室1的内部占用面积,本实用新型实施将真空泵3置于真空腔室1外部,通过管道使真空泵3与真空腔室1连通。
另外,考虑到托盘111在真空加热的过程中持续排出的杂质气体可能再次污染托盘111,请接着参阅图1和图2,上述实施例提供的真空加热装置中,还设有用于排出杂质气体的排气单元5,排气单元5与各个真空子腔室11连通。在对托盘111持续真空加热的过程中,排气单元5将各真空子腔室中11的托盘111排出的杂质气体及时的排出真空子腔室11,避免托盘111排出的杂质气体长期停留在真空子腔室11内,从而导致杂质气体被托盘111再次吸附。
需要说明的是,为了增加真空腔室1的空间利用率,减少真空腔室1的内部占用面积,本实用新型实施将排气单元5置于真空腔室1外部,通过管道使排气单元5与真空腔室1连通。
为了准确控制加热单元113的加热温度,请参阅图1和图2,上述实施例提供的真空加热装置中,真空加热装置还设有用于控制加热单元113的加热控制单元4,加热控制单元4与各个加热单元113连接。
在具体实施的过程中,加热控制单元4有两种设置模式可供用户选择,一种为手动设置模式,另一种为自动设置模式;当用户选择手动设置模式时,用户根据实际需要手动设置各加热单元113的加热温度,当用户选择自动设置模式时,加热控制单元4根据各真空子腔室11中待加热的托盘111吸附的杂质气体的含量,自动调整加热单元113的加热温度,以使各真空子腔室11中待加热的托盘111中的杂质气体全部排出为止。
通过上述具体实施过程可知,加热控制单元4可调节各真空子腔室11中加热单元113的加热温度,根据各真空子腔室11中的托盘111含有杂质气体的情况,可以具体设置各真空子腔室11中加热单元113的加热温度,从而保证托盘111中的杂质气体在合适的加热温度全部排出。另外,加热控制单元4提供了的两种控制模式供用户选择,在实际使用的过程中,可根据实际情况灵活选择加热单元113的控制模式,增加了操作的便捷性和灵活性。
需要说明的是,加热控制单元4默认为手动设置模式,各真空子腔室11中加热单元113的加热温度默认设置为200摄氏度。
另外,请参阅图2,上述实施例提供的真空加热装置中,真空腔室1的一侧设有取放口,取放口上设有密封门。密封门的设置不仅方便了托盘111在各真空子腔室11的存放与取出,而且在对托盘111加热的过程中,密封门还能够保证真空腔室1内的真空环境。
请参阅图1,本实用新型实施例提供的真空加热装置中,相邻两个真空子腔室11之间通过透气隔板隔离。
在具体实施的过程中,透气隔板中设有多个通气孔,保证了气体在各真空子腔室11内自由流动。
另外,请继续参阅图1,本实用新型实施例提供的真空加热装置中,相邻的两个真空子腔室11之间也可以由密闭隔板隔开,当使用密闭隔板隔开时,密闭隔板的底部需设有多个间隔排列的第二支柱,第二支柱与相邻两个真空子腔室11的底部接触。
通过上述具体实施过程可知,相邻两个真空子腔室11之间也可设置密闭隔板,当使用密闭隔板时,需在密闭隔板的底部设置多个间隔排列的第二支柱,通过各真空子腔室11底部设置的第二支柱之间的间隙,使各真空子腔室11内的气体流通,在工艺上简单可靠。
请参阅图1,本实用新型实施例提供的真空加热装置中,加热单元113为加热板,加热板的加热面设有用于防止托盘111与加热板接触的支撑件116。
优选的,加热单元113为加热板,在加热板中通过支撑件116的设置,能够避免加热板与托盘111直接接触,造成托盘111的损坏。同时,避免托盘111与加热板的直接接触还能够保证托盘111在加热过程中的受热均匀。
在上述实施方式的描述中,具体特征、结构、材料或者特点可以在任何的一个或多个实施例或示例中以合适的方式结合。
以上所述,仅为本实用新型的具体实施方式,但本实用新型的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本实用新型揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本实用新型的保护范围之内。因此,本实用新型的保护范围应以所述权利要求的保护范围为准。
Claims (10)
1.一种真空加热装置,其特征在于,包括真空腔室,所述真空腔室内设有用于加热托盘的加热单元,所述真空腔室连通有氮气发生单元。
2.根据权利要求1所述的真空加热装置,其特征在于,所述真空腔室内的底部设有用于导向托盘进入所述真空腔室的滑动导轨,所述真空腔室内的底部还设有用于支撑所述加热单元的多个第一支柱,各所述第一支柱间隔排列,所述真空腔室内的顶部设有用于固定托盘的磁性卡件。
3.根据权利要求1所述的真空加热装置,其特征在于,所述真空腔室包括多个真空子腔室,各所述真空子腔室连通,所述氮气发生单元与各个所述真空子腔室连通,每个所述真空子腔室内设置一个所述加热单元。
4.根据权利要求3所述的真空加热装置,其特征在于,所述真空加热装置还包括设有用于抽出真空腔室内气体的真空泵,所述真空泵与各个所述真空子腔室连通。
5.根据权利要求3所述的真空加热装置,其特征在于,所述真空加热装置还设有用于排出杂质气体的排气单元,所述排气单元与各个所述真空子腔室连通。
6.根据权利要求3所述的真空加热装置,其特征在于,所述真空加热装置还设有用于控制所述加热单元的加热控制单元,所加热控制单元与各个所述加热单元连接。
7.根据权利要求3所述的真空加热装置,其特征在于,所述真空腔室的一侧设有取放口,所述取放口上设有密封门。
8.根据权利要求7所述的真空加热装置,其特征在于,相邻两个所述真空子腔室之间通过透气隔板隔离。
9.根据权利要求7所述的真空加热装置,其特征在于,相邻两个所述真空子腔室之间通过密闭隔板隔开,所述密闭隔板的底部设有多个间隔排列的第二支柱,所述第二支柱与相邻两个所述真空子腔室的底部接触。
10.根据权利要求1所述的真空加热装置,其特征在于,所述加热单元为加热板,所述加热板的加热面设有用于防止托盘与加热板接触的支撑件。
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