CN206003752U - A kind of wet etching machine bench - Google Patents
A kind of wet etching machine bench Download PDFInfo
- Publication number
- CN206003752U CN206003752U CN201621081631.1U CN201621081631U CN206003752U CN 206003752 U CN206003752 U CN 206003752U CN 201621081631 U CN201621081631 U CN 201621081631U CN 206003752 U CN206003752 U CN 206003752U
- Authority
- CN
- China
- Prior art keywords
- slide rail
- handling machinery
- machinery arm
- wet etching
- arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001039 wet etching Methods 0.000 title claims abstract description 55
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 15
- 239000002253 acid Substances 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Weting (AREA)
Abstract
This utility model discloses a kind of wet etching machine bench, and described wet etching machine bench includes pedestal, the multiple treatment troughs being arranged on pedestal, multiple handling machinery arm, the first slide rail, stand-by machine arm, multiple second slide rail；Each handling machinery arm all corresponds to a treatment trough；The operating position of all of handling machinery arm crossed over by first slide rail；Stand-by machine arm is arranged on the first slide rail, and slides on the first slide rail；Each second slide rail all corresponds to a handling machinery arm；When there is fault in a certain handling machinery arm, a certain handling machinery arm withdraws the operating position of a certain handling machinery arm in the presence of corresponding second slide rail, stand-by machine arm reaches the operating position of a certain handling machinery arm in the presence of the first slide rail, and substitutes a certain handling machinery arm and be operated.Avoid because of handling machinery arm fault it is impossible to carry out the carrying of wafer, wafer invades the impact that bubble overlong time causes to processing procedure in treatment trough, improves yield rate and work efficiency.
Description
Technical field
This utility model is related to wet-method etching equipment technical field, more particularly, to a kind of wet etching machine bench.
Background technology
Etching technics is according to mask graph or design requirement, semiconductor substrate surface or surface cover film to be selected
The corrosion of selecting property or the technique peeled off.Etching technics is not only the basic manufacturing process of semiconductor device and integrated circuit, but also
It is applied to the processing of thin flm circuit, printed circuit and other Micropictures.Etching also can be divided into wet etching and dry etching.
Traditional wet-etching technology typically wafer is immersed in certain chemical reagent or reagent solution, makes not have
That a part of film surface sheltered by resist and reagent occur chemical reaction to be removed.For example, contain hydrogen fluorine with a kind of
The solution etches silica membrane of acid, with phosphoric acid etching aluminium film etc..This technique performing etching in liquid environment claims
For " wet method " technique, its advantage is easy and simple to handle, low for equipment requirements, is easily achieved production in enormous quantities, and the selection etching
Property.
Refer to Fig. 1, existing wet etching machine bench mainly includes：Treatment trough, and it is arranged at use above described treatment trough
In the handling machinery arm 4 ' of carrying wafer, each treatment trough is provided with a handling machinery arm 4 ', each handling machinery arm 4 '
All include head 42 ' that a column 41 ' is fixedly connected with described column 41 ' and be arranged at the conveying clamp on described head 42 '
Son 43 ', clamps wafer by carrying clip 43 ', thus realizing handling machinery arm carrying wafer turnover treatment trough, is dried place
After reason, complete wet etching.Once but handling machinery arm breaks down, may lead to not normally carry wafer, it is right to need
Handling machinery arm repairs or replaces, but, before handling machinery arm is repaired, the wafer coming in treatment trough will no
Method proceeds transmission and follow-up drying process, and wafer invades bubble overlong time in treatment trough, then time-out, affects processing procedure,
Wafer loss can be led to when serious, reduce yield rate and work efficiency.
Utility model content
The purpose of this utility model is to provide a kind of wet etching machine bench, to solve wet etching machine bench in prior art
After breaking down, there is handling machinery arm and normally cannot transmit wafer so that wafer is invaded the bubble time in acid tank or tank
Long, affect processing procedure, lead to yield rate and ineffective problem.
In order to solve above-mentioned technical problem, this utility model provides a kind of wet etching machine bench, described wet etching machine bench,
Including：
Pedestal；
It is arranged on the multiple treatment troughs on described pedestal；
Multiple handling machinery arms, each described handling machinery arm all corresponds to a described treatment trough；
First slide rail, the operating position of all of handling machinery arm crossed over by described first slide rail；
Stand-by machine arm, is arranged on described first slide rail, and slides on described first slide rail；
Multiple second slide rails, each described second slide rail all corresponds to a described handling machinery arm；
When a certain described handling machinery arm has fault, a certain described handling machinery arm is in corresponding described second slide rail
In the presence of withdraw the operating position of a certain described handling machinery arm, described stand-by machine arm is in the presence of described first slide rail
Reach the operating position of a certain described handling machinery arm, and substitute a certain described handling machinery arm and be operated.
Optionally, in described wet etching machine bench, each described handling machinery arm all include head and with described
The carrying clip that head is connected, described head is fixedly connected with corresponding described second slide rail.
Optionally, in described wet etching machine bench, described wet etching machine bench also includes multiple columns, described in each
Handling machinery arm all corresponds to a column, and one end of described column is connected with described pedestal, the other end of described column and described the
Two slide rail slidingtypes connections, described column and head are located at the both sides of described second slide rail respectively, when a certain described handling machinery
When arm has fault, a certain described handling machinery arm withdraws the operating position of this handling machinery arm with described second slide rail.
Optionally, in described wet etching machine bench, described stand-by machine arm includes：It is arranged on described first slide rail
And enter the 3rd slide rail of line slip, be arranged on described 3rd slide rail for providing the first of driving force to drive along described first slide rail
Dynamic device, be arranged in described first driving means be used for pick-and-place wafer standby clip, described clip described first driving
3rd slide rail described in the driving force lower edge of device enters line slip.
Optionally, in described wet etching machine bench, described 3rd slide rail is included minor face slide rail and is slided with described minor face
The perpendicular long side slide rail of rail, described minor face slide rail is connected with described first slide rail slidingtype, and described minor face slide rail and institute
State the first slide rail perpendicular.
Optionally, in described wet etching machine bench, described minor face slide rail and the connection of long side slide rail are L-shaped.
Optionally, in described wet etching machine bench, described first driving means are arranged on the slide rail of described long side.
Optionally, in described wet etching machine bench, described stand-by machine arm also includes the second driving means, and setting
Drivewheel on described first slide rail and driven pulley, described 3rd slide rail passes through under the driving force of described second driving means
Described drivewheel and described driven pulley enter line slip along described first slide rail.
Optionally, in described wet etching machine bench, described second driving means are arranged on described minor face slide rail.
Optionally, in described wet etching machine bench, the operating position of each described handling machinery arm is corresponding
The position that described treatment trough is located.
Optionally, in described wet etching machine bench, described first slide rail is the track of inverted T-shaped for cross section.
Optionally, in described wet etching machine bench, also include the dry slot being arranged on described pedestal, for warp
Cross the wafer after all treatment troughs are processed and be dried process.
Optionally, in described wet etching machine bench, each described treatment trough all include an acid tank and with described acid tank
The tank being disposed adjacent.
In wet etching machine bench provided by the utility model, described wet etching machine bench includes pedestal, is arranged at base
Multiple treatment troughs on seat, multiple handling machinery arm, the first slide rail, stand-by machine arm, multiple second slide rail；Each handling machinery
Arm all corresponds to a treatment trough；The operating position of all of handling machinery arm crossed over by first slide rail；Stand-by machine arm is arranged at
On one slide rail, and slide on the first slide rail；Each second slide rail all corresponds to a handling machinery arm；When a certain handling machinery arm
When there is fault, a certain handling machinery arm withdraws the operative position of a certain handling machinery arm in the presence of corresponding second slide rail
Put, stand-by machine arm reaches the operating position of a certain handling machinery arm in the presence of the first slide rail, and substitutes a certain carrying implement
Tool arm is operated.Avoid because of handling machinery arm fault it is impossible to carry out the carrying of wafer, wafer invades bubble time mistake in treatment trough
The impact that length causes to processing procedure, improves yield rate and work efficiency.
Brief description
Fig. 1 is the structural representation of the handling machinery arm of wet etching machine bench in prior art；
Fig. 2 is the structural representation of handling machinery arm in this utility model one embodiment；
Fig. 3 is the top view of wet etching machine bench in this utility model one embodiment；
Fig. 4 is the structural representation of wet etching machine bench when stand-by machine arm leaves unused in this utility model one embodiment；
Fig. 5 is the structural representation of wet etching machine bench during stand-by machine arm work in this utility model one embodiment.
In Fig. 1：
Handling machinery arm -4 '；
Column -41 '；
Head -42 '；
Clip -43 '；
In Fig. 2-Fig. 5：
Pedestal -1；
Treatment trough -2；
First slide rail -3；
Handling machinery arm -4；
Second slide rail -40；
Column -41；
Head -42；
Stand-by machine arm -5；
3rd slide rail -50；
Minor face slide rail -500；
Long side slide rail -501；
First driving means -51；
Carrying clip -43；
Standby clip -52；
Second driving means -53；
Drivewheel -54；
Driven pulley -55.
Specific embodiment
Below in conjunction with the drawings and specific embodiments to the utility model proposes wet etching machine bench make further specifically
Bright.According to following explanation and claims, advantages and features of the present utility model will become apparent from.It should be noted that, accompanying drawing is equal
In the form of very simplification and all using non-accurately ratio, only real in order to conveniently, lucidly to aid in illustrating this utility model
Apply the purpose of example.
Refer to Fig. 2 and Fig. 3, Fig. 2 is the structural representation of handling machinery arm 4 in the present embodiment；Fig. 3 is in the present embodiment
The top view of wet etching machine bench.Described wet etching machine bench includes：Pedestal 1, multiple treatment trough 2, multiple handling machinery arm 4,
First slide rail 3, stand-by machine arm 5, multiple second slide rail 40；Multiple treatment troughs 2 are arranged on described pedestal 1, described in each
Handling machinery arm 4 all corresponds to a described treatment trough 2；The operative position of all of handling machinery arm 4 crossed over by described first slide rail 3
Put；Described stand-by machine arm 5 is arranged on described first slide rail 3, and slides on described first slide rail 3；Each described second
Slide rail 40 all corresponds to a described handling machinery arm 4；When there is fault in a certain described handling machinery arm 4, a certain described carrying
Mechanical arm 4 withdraws the operating position of a certain described handling machinery arm 4 in the presence of corresponding described second slide rail 40, described standby
Reach the operating position of a certain described handling machinery arm 4 with mechanical arm 5 in the presence of described first slide rail 3, and substitute a certain
Described handling machinery arm 4 is operated.
Wherein, each described handling machinery arm 4 all includes head 42 and the carrying clip 43 being connected with described head,
Described head 42 is fixedly connected with corresponding described second slide rail 40.
Further, described wet etching machine bench also includes multiple columns 41, and each described handling machinery arm 4 all corresponds to one
Column 41, one end of described column 41 is connected with described pedestal 1, and the other end of described column 41 is slided with described second slide rail 40
Formula connection, described column 41 and head are located at the both sides of described second slide rail 40 respectively, when a certain described handling machinery arm 4 exists
During fault, a certain described handling machinery arm 4 withdraws the operating position of this handling machinery arm 4 with described second slide rail 40.Wherein, often
The operating position of individual described handling machinery arm 4 is the position that corresponding described treatment trough 2 is located, described in each on pedestal 1
Treatment trough 2 all includes an acid tank and the tank being disposed adjacent with described acid tank.
Refer to Fig. 4, described stand-by machine arm 5 includes：It is arranged on described first slide rail 3 and along described first slide rail 3
Enter the 3rd slide rail 50 of line slip, be arranged on described 3rd slide rail 50 for providing the first driving means 51 of driving force, setting
It is placed in described first driving means 51 and be used for the standby clip 52 of pick-and-place wafer, the second driving means 53 and be arranged at described
Drivewheel 54 on first slide rail 3 and driven pulley 55, described 3rd slide rail 50 passes through under the driving force of the second driving means 53
Drivewheel 54 and driven pulley 55 enter line slip along described first slide rail 3, and described standby clip 52 is in described first driving means 51
The 3rd slide rail 50 described in driving force lower edge enter line slip.
In order to improve the stability of the first slide rail 3, the first slide rail 3 is fixed on the interior top of wet etching machine bench, and first is sliding
Rail 3 is preferably the track that cross section is inverted T-shaped.
Preferably, described 3rd slide rail 50 includes minor face slide rail 500 and the long side perpendicular with described minor face slide rail 500 is slided
Rail 501, described minor face slide rail 500 is connected with described first slide rail 3 slidingtype, and minor face slide rail 500 and described first slide rail 3
Perpendicular, minor face slide rail 500 and plane-parallel, long side slide rail 501 is perpendicular to horizontal plane.Preferably, described minor face slide rail 500
Connect L-shaped with long side slide rail 501, described first driving means 51 are arranged on described long side slide rail 501, described second driving
Device 53 is arranged on described minor face slide rail 500.Stand-by machine arm 5 enters line slip along the 3rd slide rail 50, realizes stand-by machine arm 5
The adjustment of position.
Wherein, in order to realize the adjustment in vertical and horizontal direction position for the stand-by machine arm 5 it is preferred that described first drives
Dynamic device 51 is zigzag tread patterns motor；Described second driving means 53 are laterally driven motor, thus providing the drive of different directions
Power, lays the foundation for subsequently enabling stand-by machine arm 5 work.
Wet etching machine bench also includes the dry slot being arranged on pedestal 1, realizes to after all treatment troughs 2 are processed
Wafer is dried process.Thus obtaining the wafer of dry cleansing
Specifically, as shown in figure 4, in wet etching machine bench normal work, stand-by machine arm 5 is vacantly arranged；As Fig. 5 institute
Show, when a handling machinery arm 4 has fault, first, using the second slide rail 40 of fault handling machinery arm 4, fault carrying implement
Column 41 position of tool arm 4 keeps constant, the head 42 of fault handling machinery arm 4 and the carrying clip 43 being connected with head 42
Withdraw its operating position, thus vacateing the working place shared by fault handling machinery arm 4；Then, enable stand-by machine arm 5,
Under the driving force of the second driving means 53, the minor face slide rail 500 in the 3rd slide rail 50 of stand-by machine arm 5 is along the first slide rail 3
Slide into the operating position of fault handling machinery arm 4, then, stand-by machine arm 5 standby clip 52 in first driving means
The long side slide rail 501 that 51 driving force acts in lower edge the 3rd slide rail 50 slides, so that standby clip 52 is elevated to suitable behaviour
Make position, replace fault mechanical arm to work on, thus avoiding because of board fault, handling machinery arm 4 cannot normal work, wafer
Invade the impact that bubble overlong time causes to processing procedure in treatment trough 2, improve yield rate and work efficiency.
To sum up, in wet etching machine bench provided by the utility model, described wet etching machine bench includes pedestal, setting
Multiple treatment troughs on pedestal, multiple handling machinery arm, the first slide rail, stand-by machine arm, multiple second slide rail；Each carrying
Mechanical arm all corresponds to a treatment trough；The operating position of all of handling machinery arm crossed over by first slide rail；Stand-by machine arm is arranged
On the first slide rail, and slide on the first slide rail；Each second slide rail all corresponds to a handling machinery arm；When a certain carrying implement
When tool arm has fault, a certain handling machinery arm withdraws the operation of a certain handling machinery arm in the presence of corresponding second slide rail
Position, stand-by machine arm reaches the operating position of a certain handling machinery arm in the presence of the first slide rail, and substitutes a certain carrying
Mechanical arm is operated.Avoid because of handling machinery arm fault it is impossible to carry out the carrying of wafer, wafer invades the bubble time in treatment trough
The long impact that processing procedure is caused, improves yield rate and work efficiency.
Obviously, those skilled in the art can carry out various changes to utility model and modification is new without deviating from this practicality
The spirit and scope of type.So, if of the present utility model these modification and modification belong to this utility model claim and its
Within the scope of equivalent technologies, then this utility model is also intended to including these changes and modification.
Claims (13)
1. a kind of wet etching machine bench is it is characterised in that include：
Pedestal；
It is arranged on the multiple treatment troughs on described pedestal；
Multiple handling machinery arms, each described handling machinery arm all corresponds to a described treatment trough；
First slide rail, the operating position of all of handling machinery arm crossed over by described first slide rail；
Stand-by machine arm, is arranged on described first slide rail, and slides on described first slide rail；
Multiple second slide rails, each described second slide rail all corresponds to a described handling machinery arm；
When a certain described handling machinery arm has fault, a certain described handling machinery arm is in the work of corresponding described second slide rail
With under withdraw the operating position of a certain described handling machinery arm, described stand-by machine arm reaches in the presence of described first slide rail
The operating position of a certain described handling machinery arm, and substitute a certain described handling machinery arm and be operated.
2. wet etching machine bench as claimed in claim 1 it is characterised in that each described handling machinery arm all include head with
And the carrying clip being connected with described head, described head is fixedly connected with corresponding described second slide rail.
3. wet etching machine bench as claimed in claim 2 is it is characterised in that described wet etching machine bench also includes multiple standing
Post, each described handling machinery arm all corresponds to a column, and one end of described column is connected with described pedestal, described column another
End is connected with described second slide rail slidingtype, described column and head respectively positioned at the both sides of described second slide rail, when a certain institute
When stating handling machinery arm and there is fault, a certain described handling machinery arm withdraws the operation of this handling machinery arm with described second slide rail
Position.
4. wet etching machine bench as claimed in claim 1 is it is characterised in that described stand-by machine arm includes：It is arranged at described
Enter the 3rd slide rail of line slip, be arranged on described 3rd slide rail for providing driving on first slide rail and along described first slide rail
The first driving means of power, be arranged in described first driving means be used for pick-and-place wafer standby clip, described clip is in institute
State the 3rd slide rail described in the driving force lower edge of first driving means and enter line slip.
5. wet etching machine bench as claimed in claim 4 it is characterised in that described 3rd slide rail include minor face slide rail and with institute
State the perpendicular long side slide rail of minor face slide rail, described minor face slide rail is connected with described first slide rail slidingtype, and described minor face
Slide rail is perpendicular with described first slide rail.
6. wet etching machine bench as claimed in claim 5 is it is characterised in that described minor face slide rail and long side slide rail connect into L
Shape.
7. wet etching machine bench as claimed in claim 5 is it is characterised in that described first driving means are arranged on described long side
On slide rail.
8. wet etching machine bench as claimed in claim 5 is it is characterised in that described stand-by machine arm also includes the second driving dress
Put, and be arranged at the drivewheel on described first slide rail and driven pulley, described 3rd slide rail is in the drive of described second driving means
Under power, line slip is entered along described first slide rail by described drivewheel and described driven pulley.
9. wet etching machine bench as claimed in claim 8 is it is characterised in that described second driving means are arranged on described minor face
On slide rail.
10. wet etching machine bench as claimed in claim 1 is it is characterised in that the operating position of each described handling machinery arm
It is the position that corresponding described treatment trough is located.
11. wet etching machine bench as any one of claim 1～10 are it is characterised in that described first slide rail is horizontal stroke
Section is the track of inverted T-shaped.
As described in 12. wet etching machine bench any one of claim 1～10 it is characterised in that also include are arranged at
Dry slot on pedestal, for being dried process to the wafer after all treatment troughs are processed.
13. wet etching machine bench any one of claim 1～10 are it is characterised in that treatment trough as described in each is equal
The tank be disposed adjacent including an acid tank and with described acid tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621081631.1U CN206003752U (en) | 2016-09-26 | 2016-09-26 | A kind of wet etching machine bench |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621081631.1U CN206003752U (en) | 2016-09-26 | 2016-09-26 | A kind of wet etching machine bench |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206003752U true CN206003752U (en) | 2017-03-08 |
Family
ID=58194420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621081631.1U Expired - Fee Related CN206003752U (en) | 2016-09-26 | 2016-09-26 | A kind of wet etching machine bench |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206003752U (en) |
-
2016
- 2016-09-26 CN CN201621081631.1U patent/CN206003752U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170308 Termination date: 20190926 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |