CN203760434U - Fixture seat for dry etching machine - Google Patents
Fixture seat for dry etching machine Download PDFInfo
- Publication number
- CN203760434U CN203760434U CN201320884238.6U CN201320884238U CN203760434U CN 203760434 U CN203760434 U CN 203760434U CN 201320884238 U CN201320884238 U CN 201320884238U CN 203760434 U CN203760434 U CN 203760434U
- Authority
- CN
- China
- Prior art keywords
- support
- polyvinylidene fluoride
- fixture seat
- etching
- lower support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model relates to a fixture seat for a dry etching machine. The technical scheme of the utility model comprises that the fixture seat comprises an acid tank, a left lower support, a first polyvinylidene fluoride tube, a right lower support, a left upper support, a second polyvinylidene fluoride tube, and a right upper support; the central part of the acid tank is provided with the left lower support, a right lower support, a left upper support, and a right upper support; the first polyvinylidene fluoride tube is fixed on the left lower support and the right lower support; the second polyvinylidene fluoride tube is fixed on the left upper support and the right upper support; and the first polyvinylidene fluoride tube and the second polyvinylidene fluoride tube form an etching plane. The beneficial effect comprises that the neatness of silicon wafers is guaranteed in a placing process through the improvement of the fixture seat, thereby guaranteeing the width of etching edges of the silicon wafers in an etching process, greatly reducing the silicon wafers being etched excessively, reducing the rework rate of silicon wafers, and reducing the failure and low-efficiency silicon wafers.
Description
Technical field
The utility model relates to a kind of silicon chip production equipment, particularly a kind of dry etching machine clamping fixture seat.
Background technology
Etching is an important procedure in semiconductor, microelectronics and LED manufacture process, and etching is to utilize chemistry or physical method selectively from the process of silicon chip or the unwanted material of Sapphire Substrate surface removal.Along with the integrated level of semiconductor device improves, the live width of semiconductor device is more and more less, and the control of critical size is also more and more important, also more and more higher to the requirement of etching technics.Distinguish from technique, etching can be divided into wet etching and dry etching.Dry etching is plasma etching, conventionally in plasma processing apparatus, passes into etching gas, and ionizes etching gas and become plasma, utilizes described plasma to carry out etching to wafer to be etched.Existing method for etching plasma forms photoetching offset plate figure on surface to be etched conventionally, treats etch layer carry out etching taking this photoetching offset plate figure as mask.Dry etching, because anisotropic is good, is selected than high, and controllability is good, and flexibility is high, repeats shape good, easily realizes automation, and the advantage that cleanliness factor is high becomes one of current the most frequently used etching technics.But the problem still existing is at present: in the time producing 156 silicon chip, clamp base in base, is placed unstable and silicon chip is too small with the area that clamping fixture seat contact plate contacts, and while causing load, silicon chip is smeared unevenly, occurs phenomenon at quarter.
Summary of the invention
The purpose of this utility model is exactly in view of the foregoing defects the prior art has, a kind of dry etching machine clamping fixture seat is provided, and has reduced the generation of crossing rework rate that the generation of carving sheet reduced silicon chip and inefficacy, poor efficiency sheet.
Its technical scheme is: comprise acid tank, lower-left support, the first Kynoar pipe, bottom right support, upper left support, the second Kynoar pipe, upper right support, the middle part of described acid tank is installed on lower-left support, bottom right support, upper left support, upper right support, on described lower-left support and bottom right support, fix the first Kynoar pipe, on described upper left support, upper right support, fix the second Kynoar pipe; The first described Kynoar pipe and the second Kynoar pipe composition etching plane.
Above-mentioned acid tank is rectangle structure.
The beneficial effects of the utility model are: by the transformation of clamping fixture seat, silicon chip neat degree in the process of placing has obtained guarantee, thereby ensured the width at silicon chip etching edge in dry quarter process, greatly degree reduced the generation of crossing rework rate that the generation of carving sheet reduced silicon chip and inefficacy, poor efficiency sheet.
Brief description of the drawings
Accompanying drawing 1 is structural representation of the present utility model;
In upper figure: acid tank 1, lower-left support 2, the first Kynoar pipe 3, bottom right support 4, upper left support 5, the first Kynoar pipe 6, upper right support 7.
Embodiment
By reference to the accompanying drawings 1, the utility model will be further described:
The utility model comprises acid tank 1, lower-left support 2, the first Kynoar pipe 3, bottom right support 4, upper left support 5, the second Kynoar pipe 6, upper right support 7, the middle part of described acid tank 1 is installed on lower-left support 2, bottom right support 4, upper left support 5, upper right support 7, on described lower-left support 2 and bottom right support 4, fix the first Kynoar pipe 3, on described upper left support 5, upper right support 7, fix the second Kynoar pipe 6; Described the first Kynoar pipe 3 and the second Kynoar pipe 6 form etching plane, and above-mentioned acid tank 1 is rectangle structure.
Kynoar tubing is cut into 215*75*12 size with milling machine, stamp screw hole in the above, thereby be fixed on support.
By the transformation of clamping fixture seat, form etching plane by the first Kynoar pipe 3 and the second Kynoar pipe 6, replace two original surface plates, make silicon chip neat degree in the process of placing obtain guarantee, thereby ensured the width at silicon chip etching edge in dry quarter process, greatly degree reduced the generation of crossing rework rate that the generation of carving sheet reduced silicon chip and inefficacy, poor efficiency sheet.
Claims (2)
1. a dry etching machine clamping fixture seat, it is characterized in that: comprise acid tank (1), lower-left support (2), the first Kynoar pipe (3), bottom right support (4), upper left support (5), the second Kynoar pipe (6), upper right support (7), the middle part of described acid tank (1) is installed on lower-left support (2), bottom right support (4), upper left support (5), upper right support (7), on described lower-left support (2) and bottom right support (4), fix the first Kynoar pipe (3), described upper left support (5), on upper right support (7), fix the second Kynoar pipe (6), the first described Kynoar pipe (3) and the second Kynoar pipe (6) composition etching plane.
2. dry etching machine clamping fixture seat according to claim 1, is characterized in that: described acid tank (1) is rectangle structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320884238.6U CN203760434U (en) | 2013-12-31 | 2013-12-31 | Fixture seat for dry etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320884238.6U CN203760434U (en) | 2013-12-31 | 2013-12-31 | Fixture seat for dry etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203760434U true CN203760434U (en) | 2014-08-06 |
Family
ID=51255678
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320884238.6U Expired - Fee Related CN203760434U (en) | 2013-12-31 | 2013-12-31 | Fixture seat for dry etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203760434U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108574024A (en) * | 2018-02-01 | 2018-09-25 | 横店集团东磁股份有限公司 | A kind of water squeezing idler wheel for wet etching |
-
2013
- 2013-12-31 CN CN201320884238.6U patent/CN203760434U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108574024A (en) * | 2018-02-01 | 2018-09-25 | 横店集团东磁股份有限公司 | A kind of water squeezing idler wheel for wet etching |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140806 Termination date: 20141231 |
|
| EXPY | Termination of patent right or utility model |