CN205501405U - Vapor deposition device - Google Patents
Vapor deposition device Download PDFInfo
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- CN205501405U CN205501405U CN201620307876.5U CN201620307876U CN205501405U CN 205501405 U CN205501405 U CN 205501405U CN 201620307876 U CN201620307876 U CN 201620307876U CN 205501405 U CN205501405 U CN 205501405U
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- baffle plate
- evaporation
- waste material
- coating device
- mouth
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Abstract
The utility model provides a vapor deposition device belongs to vacuum deposition technical field, its can be at least the part solve the problem that too much can't open smoothly because of the accumulation waste material among the present vapor deposition device on the baffle. The utility model discloses a vapor deposition device includes the coating by vaporization cavity, be equipped with material container and baffle in the coating by vaporization cavity, material container is used for splendid attire coating by vaporization material, the coating by vaporization mouth has been seted up to material container's upper surface, the baffle is arranged in blockking the coating by vaporization material of following the coating by vaporization mouth and coming out, the baffle can and stop in the coating by vaporization position and have enough to meet the need between, still include and leave the waste material thickness the detection unit who sets up mutually with material container, waste material thickness the detection unit includes sensing element, sensing element sets up and is in the position that stops the position below and set for the distance in the baffle, a whether thickness exceedes is predetermine the threshold values for surveying on the baffle accumulation the waste material. Whether the thickness that this vapor deposition device can in time detect waste material on the baffle exceedes is predetermine the threshold values to the staff in time clears up, avoids the shielding plate and can't open because the waste material accumulation is too much.
Description
Technical field
This utility model belongs to vacuum evaporation technology field, is specifically related to a kind of evaporation coating device.
Background technology
In recent years, (organic light emitting diode is called for short Organic Light Emitting Diode
OLED) display has become as domestic and international widely used display product, compared to existing
Some liquid crystal displays (liquid crystal display is called for short LCD), OLED has
Self-luminous, wide viewing angle, wide colour gamut, the response time is short, running voltage is low, operating temperature
The advantages such as scope is wide.
At present, in the manufacturing process of OLED, either on experiment line or in amount
Produce on line, for the coating moiety of metallic cathode, mostly use the steaming of some evaporation source type
Plating appts completes.Fig. 1 is the structural representation of existing evaporation coating device, such as Fig. 1 institute
Showing, evaporation coating device includes being deposited with chamber 01, containers 02, baffle plate 03 and heater
04, containers 02 is used for containing deposition material, and the upper surface of containers 02 is offered
Having evaporation mouth 05, baffle plate 03 is for stopping from the deposition material being deposited with mouth 05 out.
Inventor finds that in prior art, at least there are the following problems:
During evaporation, need persistently to complete the evaporation work to multiple substrates, adjacent
By baffle plate 03, evaporation between substrate stops that evaporation mouth 05 switches over.Switching
Cheng Zhong, baffle plate 03 is positioned at evaporation position and is deposited with mouth 05, now, due to heater to stop
The temperature of 04 is the highest, and deposition material still can be evaporated from evaporation mouth 05, accumulation
Lower surface to baffle plate 03.When on baffle plate 03, the thickness of the waste material of accumulation reaches certain value
After, during moving stop 03, the waste material of accumulation can interfere with evaporation mouth 05, causes
Evaporation mouth 05 cannot normally be opened, and evaporation mouth 05 can be caused and worn and torn significantly,
Reduce the service life of evaporation coating device.Now, whole device can only be closed, treat work people
After member cleans out on baffle plate 03 waste material of accumulation, device just can be made to recover to work normally shape
State, causes greatly increasing the process time.
Therefore, needing urgently to design a kind of evaporation coating device, this evaporation coating device can be at baffle plate
When the thickness of the waste material of upper accumulation exceedes predetermined threshold values, send alarm signal in time, or
Use the waste material of cleaning unit cleaning accumulation, it is to avoid baffle plate too much cannot be opened because of waste material accumulation
The problem opened occurs, shortens the process time.
Utility model content
This utility model is at least partly to solve existing the problems referred to above, it is provided that a kind of evaporation
Device.The thickness of the waste material that this evaporation coating device can be accumulated on baffle plate exceedes permission
When being worth greatly, sending alarm signal in time, it is the most clear that staff just controls cleaning unit
The waste material of accumulation on reason baffle plate.
Solve this utility model technical problem and offer one evaporation is provided
Device, including evaporation chamber, is provided with containers and baffle plate, institute in described evaporation chamber
Stating containers for containing deposition material, the upper surface of described containers offers steaming
Plating mouth, described baffle plate is used for stop deposition material from described evaporation mouth out, described
Baffle plate can evaporation position and stop place between have enough to meet the need, also include with described containers from
The waste material detecting thickness unit arranged, described waste material detecting thickness unit includes detecting element,
Described detecting element is arranged at described baffle plate and is in the position of setpoint distance below stop place,
For detecting whether the thickness of the waste material of accumulation on described baffle plate exceedes pre-set threshold value.
Preferably, described detecting element includes infrared transmitter and infrared remote receiver, institute
State infrared transmitter and be divided into stop place relative of described baffle plate with described infrared remote receiver
Both sides, the emission port of described infrared transmitter and the receiving port of described infrared remote receiver are mutual
Correspondence, the infrared ray that described infrared transmitter sends can be below the stop place of described baffle plate
Setpoint distance is incident upon described infrared remote receiver.
Preferably, the emission port of described infrared transmitter and connecing of described infrared remote receiver
The position that arranges closed up is positioned at below described baffle plate at 5～15mm.
Preferably, alarm, described alarm and described infrared remote receiver electricity are also included
Connecting, described alarm is used at described infrared remote receiver by receiving infrared ray to not connecing
Receiving the ultrared moment sends alarm signal.
Preferably, also include for clearing up the described deposition material of accumulation on described baffle plate
Cleaning unit, described cleaning unit is arranged at described baffle plate and is in the underface of stop place；
Described cleaning unit includes cleaning drill bit and electric rotating machine, and described cleaning drill bit is just to described
The stop place of baffle plate is also being provided with multiple spine structure towards the side of stop place；Institute
State electric rotating function and drive described cleaning bit.
Preferably, described cleaning unit also includes that lifting motor, described lifting motor set
Being placed in the lower section of described cleaning drill bit, described lifting motor can drive described cleaning drill bit to exist
Move on vertical direction.
Preferably, described cleaning unit also includes garbage collector, described garbage collection
Device is the barrel-like structure that upper end offers opening, and described cleaning drill bit is positioned at described waste material and receives
The inside of storage and relative with described opening；The size of described opening is not less than described gear
The size of plate, described baffle plate can enter inside described garbage collector through described opening.
Preferably, in described evaporation chamber, be additionally provided with cursor, described cursor with
Described baffle plate connects, and is used for driving described baffle plate to switch between evaporation position and stop place,
To block or to open described evaporation mouth.
Preferably, described evaporated device also includes heater, and described heater is with described
Containers electrically connects, for heating the deposition material that described containers is contained.
Preferably, described evaporation mouth generally circular in shape, described baffle plate be shaped as with
The circle that described evaporation mouth-shaped is fitted mutually.
Evaporation coating device of the present utility model, by waste material detecting thickness unit detection baffle plate
The thickness of the waste material of accumulation, when the thickness of waste material exceedes predetermined threshold values, alarm is sent out
Going out alarm signal, staff just controls cleaning unit and clears up accumulation on baffle plate rapidly
Waste material.So, firstly it may be ensured that the waste material accumulated on baffle plate will not be sent out with evaporation mouth
Raw interference, baffle plate can successfully have enough to meet the need between evaporation position and stop place, to evaporation mouth
Abrasion will not be produced, extend the service life of device；Secondly, cleaning unit can be fast
Speed clear away waste effectively, shortens the process time, improves working (machining) efficiency；Finally,
The evaporation waste material collected can also reuse again, reduces process costs.
Accompanying drawing explanation
Fig. 1 is the structural representation of evaporation coating device of the prior art；
Fig. 2 is the structural representation of evaporation coating device in this utility model embodiment；
Wherein, reference is:
01, evaporation chamber；02, containers；03, baffle plate；04, heater；
05, evaporation mouth；
1, evaporation chamber；2, containers；3, baffle plate；4, heater；5, evaporation
Mouthful；6, infrared transmitter；7, infrared remote receiver；8, alarm；9, cleaning drill bit；
10, spine structure；11, garbage collector.
Detailed description of the invention
For making those skilled in the art be more fully understood that the technical solution of the utility model, under
Face combines the drawings and specific embodiments and is described in further detail this utility model.
The evaporation coating device that the present embodiment provides, compared to existing evaporation coating device, is additionally arranged useless
Material detecting thickness unit, alarm and cleaning unit, when waste material detecting thickness unit is visited
Measuring the thickness of waste material when exceeding predetermined threshold values, alarm sends alarm signal, work
Personnel just control cleaning unit and clean out the waste material of accumulation on baffle plate quickly and efficiently, to protect
Card evaporation coating device duty is good.
Fig. 2 is the structural representation of the evaporation coating device of present embodiment, as in figure 2 it is shown,
Evaporation coating device includes being deposited with chamber 1, is provided with containers 2 and baffle plate 3 in evaporation chamber 1,
Containers 2 is used for containing deposition material, and the upper surface of containers 2 offers evaporation
Mouthfuls 5, baffle plate 3 is for stopping from evaporation mouth 5 deposition material out, and baffle plate 3 can be
Have enough to meet the need between evaporation position and stop place (in Fig. 2, the position at baffle plate 3 place is evaporation position,
It is positioned at the top of evaporation mouth 5, i.e. for the actual position blocking deposition material；Dotted line
Position represents stop place, and i.e. during evaporation, baffle plate is idle, do not block the position of deposition material
Put), also include with containers 2 from the waste material detecting thickness unit arranged, waste material
Detecting thickness unit includes that detecting element, detecting element are arranged at baffle plate 3 and are in stop place
Whether the position of lower section setpoint distance, for detecting on baffle plate 3 thickness of the waste material of accumulation
Exceed pre-set threshold value.
Evaporation coating device also includes that heater 4, heater 4 electrically connect with containers 2,
The deposition material contained for heating material container 2.When deposition material is heated to one
After fixed temperature, deposition material will evaporate from containers 2, and be deposited with through evaporation mouth 5
On substrate to be processed, now, baffle plate 3 corresponding position is in stop place.For improving evaporation
Uniformity during material evaporation, it is preferable that be deposited with the generally circular in shape of mouth 5, baffle plate 3
Shape is also for the circle fitted mutually with evaporation mouth 5 shape.
Being additionally provided with cursor in evaporation chamber 1, cursor is connected with baffle plate 3, is used for
Baffle plate 3 is driven to switch between evaporation position and stop place, to block or to open evaporation mouth 5.
During evaporation coating device carries out evaporation processing to substrate, baffle plate 3 is at cursor
Control under, be in stop place, the deposition material in containers 2 from evaporation mouth 5 steam
Issue, complete the processing of the evaporation to substrate；During evaporation coating device switching substrate,
Baffle plate 3, under the control of cursor, is in evaporation position, and now, deposition material still has
Higher temperature, can persistently be evaporated, and with certain speed impact baffle plate 3 and accumulate
The lower surface of baffle plate 3, after on baffle plate 3, the waste material of accumulation arrives certain thickness, baffle plate 3
It is moved to stop place by hindered from evaporation.
In the evaporation coating device of the present embodiment, detecting element includes infrared transmitter 6 and infrared
Receptor 7, infrared transmitter 6 and infrared remote receiver 7 are divided into the stop place of baffle plate 3
Opposite sides, the emission port of infrared transmitter 6 and the receiving port of infrared remote receiver 7 are mutual
Correspondence, infrared transmitter 6 send infrared can set below the stop place of baffle plate 3 away from
From being incident upon infrared remote receiver 7.By infrared transmitter 6 and infrared remote receiver 7, stopping
Position is measured the material of the waste material below baffle plate 3 and according to circumstances selects further cleaner
Make, may select and carry out, thus without the prolongation causing the process time during evaporation.
In order to fully ensure that baffle plate 3 will not be hindered in moving process, it is preferred that
Infrared ray is arranged on below baffle plate at 5～15mm, say, that infrared transmitter 6
Emission port and the position that arranges of receiving port of infrared remote receiver 7 be positioned at below baffle plate
At 5～15mm.
Evaporation coating device also includes that alarm 8, alarm 8 electrically connect with infrared remote receiver 7,
For sending out to not receiving the ultrared moment by receiving infrared ray at infrared remote receiver 7
Go out alarm signal.It is to say, the waste material on the lower surface of baffle plate 3, in work process
In be on the increase, when waste material increase to block infrared transmitter 6 and infrared remote receiver 7 it
Between infrared ray time, alarm 8 sends alarm signal, notifies that staff clears up in time
The waste material of accumulation on baffle plate 3.
Such as, be arranged on by infrared ray below baffle plate at 10mm, then the thickness of waste material is permitted
The threshold values permitted is 10mm, if the thickness of the waste material of accumulation is more than 10mm below baffle plate 3,
Waste material will block infrared ray, thus triggers alarm 8.
It is easily understood that alarm 8 can be arranged on evaporation chamber 1 inside, it is possible to
To be arranged on evaporation chamber 1 outside and to be electrically connected with infrared remote receiver 7 by connecting line.
In order to fast and effeciently clear up the waste material on baffle plate 3, evaporation coating device also includes
Cleaning unit, cleaning unit is arranged at baffle plate 3 and is in the underface of stop place；Cleaning is single
Unit includes cleaning drill bit 9 and electric rotating machine, cleaning drill bit 9 just to the stop place of baffle plate,
And multiple spine structure 10 it is being provided with towards the side of stop place；Electric rotating function drives
Cleaning drill bit 9 rotates, with the waste material below cleaning baffle-plate 3.
Cleaning unit also includes lifting motor, and lifting motor is arranged at cleaning drill bit 9 times
Side, lifting motor can drive cleaning drill bit 9 in the vertical direction to move.When beginning a clean up
During waste material below baffle plate 3, will pass through lifting motor and control cleaning drill bit 9 to baffle plate 3
It is close, until spine structure 10 touches the waste material below baffle plate 3.
So, cleaning drill bit 9 can under the Collaborative Control of electric rotating machine and lifting motor,
Realize rotary motion and up and down motion, thus clean out accurately, flexibly below baffle plate 3
Waste material.
That cleans drill bit 9 is preferably shaped to cylinder, and spine structure 10 is evenly distributed in
Cylindrical towards on the surface of baffle plate 3 stop place, in order to effectively to clean out baffle plate 3 times
The waste material of side.
For shortening the process time further, improving working (machining) efficiency, can cleaning unit be set straight
Connect and electrically connect with infrared remote receiver 7, when infrared remote receiver 7 is by receiving infrared ray to not
When receiving infrared ray, directly trigger cleaning unit work, automatically baffle plate 3 is started clearly
The waste material of reason accumulation, and after cleaning preset duration, be automatically stopped cleaning, and return former
Come position.So it is remarkably improved the automaticity of device, improves working (machining) efficiency.
Clean and tidy in order to keep being deposited with in chamber 1, prevent from cleaning drill bit 9 from baffle plate 3
The waste material splashes cleared up causes evaporation chamber environment pollution, and cleaning unit is also
Including garbage collector 11, garbage collector 11 offers the tubbiness knot of opening for upper end
Structure, cleaning drill bit 9 is positioned at the inside of garbage collector 11 and relative with opening；Opening
Size can enter garbage collector 11 through opening not less than the size of baffle plate 3, baffle plate 3
Internal.
So, during cleaning drill bit 9 moves up under the effect of lifting motor,
Garbage collector 11 moves up also with cleaning drill bit 9, gradually coated baffle-plate 3.?
During cleaning drill bit 9 clears up the waste material on baffle plate 3 rotatably, the waste material cleaned out
To be scattered in the inside of garbage collector 11, thus maintain in evaporation chamber 1 clean and tidy,
Further, being collected in the waste material within garbage collector 11 can also re-use, thus carries
The economic benefit of high processing, reduces process costs.
The evaporation coating device that present embodiment provides, by waste material detecting thickness unit detection gear
The thickness of the waste material of accumulation on plate, when the thickness of waste material exceedes predetermined threshold values, reports to the police
Device sends alarm signal, and staff just controls cleaning unit and clears up on baffle plate tired rapidly
Long-pending waste material；Or, when the thickness of waste material exceedes predetermined threshold values so that cleaning is single
Unit starts automatically, begins a clean up work, automatic returning origin-location after cleaning completes,
And utilize garbage collector to collect the waste material cleared.So, it is possible, firstly, to protect
On card baffle plate, the waste material of accumulation will not interfere with evaporation mouth, and baffle plate can successfully exist
Have enough to meet the need between evaporation position and stop place, it is to avoid evaporation mouth is produced abrasion, extends device
Service life；Secondly, cleaning unit can fast and effeciently clear away waste, it is ensured that gear
Plate can be opened smoothly, shortens the process time, improves working (machining) efficiency；Finally, protect
Hold the clean and tidy of evaporation chamber interior, and achieved waste material recycling, improve economic effect
Benefit.
It is understood that embodiment of above is merely to illustrate that of the present utility model
Principle and the illustrative embodiments that uses, but this utility model is not limited thereto.
For those skilled in the art, without departing from spirit of the present utility model
In the case of essence, can make various modification and improvement, these modification and improvement are also
It is considered as protection domain of the present utility model.
Claims (10)
1. an evaporation coating device, including evaporation chamber, is provided with material in described evaporation chamber
Container and baffle plate, described containers is used for containing deposition material, described containers
Upper surface offers evaporation mouth, and described baffle plate is for stopping from the described evaporation mouth out
Deposition material, described baffle plate can have enough to meet the need between evaporation position and stop place, it is characterised in that
Also include with described containers from the waste material detecting thickness unit arranged, described waste material
Detecting thickness unit includes that detecting element, described detecting element are arranged at described baffle plate and are in
The position of setpoint distance below stop place, for detecting the waste material of accumulation on described baffle plate
Whether thickness exceedes pre-set threshold value.
Evaporation coating device the most according to claim 1, it is characterised in that described detection
Element includes infrared transmitter and infrared remote receiver, described infrared transmitter and described infrared
Receptor is divided into the opposite sides of the stop place of described baffle plate, described infrared transmitter
The receiving port of emission port and described infrared remote receiver in correspondence with each other, send out by described infrared transmitter
The infrared ray gone out can be incident upon described infrared connect by setpoint distance below the stop place of described baffle plate
Receive device.
Evaporation coating device the most according to claim 2, it is characterised in that described infrared
The position that arranges of the emission port of emitter and the receiving port of described infrared remote receiver is positioned at described
Below baffle plate at 5～15mm.
Evaporation coating device the most according to claim 2, it is characterised in that also include report
Alert device, described alarm electrically connects with described infrared remote receiver, and described alarm is used for
Described infrared remote receiver sends report to not receiving the ultrared moment by receiving infrared ray
Alert signal.
Evaporation coating device the most according to claim 1, it is characterised in that also include using
In clearing up the cleaning unit of the described deposition material of accumulation, described cleaning list on described baffle plate
Unit is arranged at described baffle plate and is in the underface of stop place；Described cleaning unit includes cleaning
Drill bit and electric rotating machine, described cleaning drill bit is just to the stop place of described baffle plate and in court
Multiple spine structure it is provided with to the side of stop place；Described electric rotating function drives described
Cleaning bit.
Evaporation coating device the most according to claim 5, it is characterised in that described cleaning
Unit also includes that lifting motor, described lifting motor are arranged at the lower section of described cleaning drill bit,
Described lifting motor can drive described cleaning drill bit in the vertical direction to move.
Evaporation coating device the most according to claim 5, it is characterised in that described cleaning
Unit also includes that garbage collector, described garbage collector are the bucket that upper end offers opening
Shape structure, described cleaning drill bit is positioned at the inside of described garbage collector and opens with described
Mouth is relatively；The size of described opening is not less than the size of described baffle plate, and described baffle plate can be through
Described opening enters inside described garbage collector.
8. according to the arbitrary described evaporation coating device of claim 1-7, it is characterised in that institute
Being additionally provided with cursor in stating evaporation chamber, described cursor is connected with described baffle plate, uses
In driving described baffle plate to switch between evaporation position and stop place, described to block or to open
Evaporation mouth.
9. according to the arbitrary described evaporation coating device of claim 1-7, it is characterised in that institute
State evaporated device and also include that heater, described heater electrically connect with described containers,
For heating the deposition material that described containers is contained.
10. according to the arbitrary described evaporation coating device of claim 1-7, it is characterised in that institute
State the generally circular in shape of evaporation mouth, being shaped as and described evaporation mouth-shaped phase of described baffle plate
Suitable circle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620307876.5U CN205501405U (en) | 2016-04-13 | 2016-04-13 | Vapor deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620307876.5U CN205501405U (en) | 2016-04-13 | 2016-04-13 | Vapor deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205501405U true CN205501405U (en) | 2016-08-24 |
Family
ID=56715166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620307876.5U Active CN205501405U (en) | 2016-04-13 | 2016-04-13 | Vapor deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205501405U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106978589A (en) * | 2017-04-20 | 2017-07-25 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN107034436A (en) * | 2017-04-11 | 2017-08-11 | 京东方科技集团股份有限公司 | Mask board component, the device and method for detecting thickness |
| CN107142451A (en) * | 2017-07-03 | 2017-09-08 | 京东方科技集团股份有限公司 | A kind of mask plate and evaporated device |
| CN110257777A (en) * | 2019-07-30 | 2019-09-20 | 云谷（固安）科技有限公司 | Vapor deposition cover and evaporated device |
| CN112501573A (en) * | 2019-09-16 | 2021-03-16 | 股份有限会社太特思 | Substrate both sides evaporation plating device |
-
2016
- 2016-04-13 CN CN201620307876.5U patent/CN205501405U/en active Active
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107034436A (en) * | 2017-04-11 | 2017-08-11 | 京东方科技集团股份有限公司 | Mask board component, the device and method for detecting thickness |
| US10233529B2 (en) | 2017-04-11 | 2019-03-19 | Boe Technology Group Co., Ltd. | Mask assembly, and apparatus and method for detecting film thickness of evaporation material on the mask |
| CN107034436B (en) * | 2017-04-11 | 2019-10-15 | 京东方科技集团股份有限公司 | Mask plate component, the device and method for detecting film thickness |
| CN106978589A (en) * | 2017-04-20 | 2017-07-25 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN106978589B (en) * | 2017-04-20 | 2019-03-08 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN107142451A (en) * | 2017-07-03 | 2017-09-08 | 京东方科技集团股份有限公司 | A kind of mask plate and evaporated device |
| CN107142451B (en) * | 2017-07-03 | 2019-12-03 | 京东方科技集团股份有限公司 | A kind of mask plate and evaporated device |
| CN110257777A (en) * | 2019-07-30 | 2019-09-20 | 云谷（固安）科技有限公司 | Vapor deposition cover and evaporated device |
| CN110257777B (en) * | 2019-07-30 | 2021-11-02 | 云谷（固安）科技有限公司 | Evaporation cover and evaporation equipment |
| CN112501573A (en) * | 2019-09-16 | 2021-03-16 | 股份有限会社太特思 | Substrate both sides evaporation plating device |
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