CN107142451A - A kind of mask plate and evaporated device - Google Patents
A kind of mask plate and evaporated device Download PDFInfo
- Publication number
- CN107142451A CN107142451A CN201710533788.6A CN201710533788A CN107142451A CN 107142451 A CN107142451 A CN 107142451A CN 201710533788 A CN201710533788 A CN 201710533788A CN 107142451 A CN107142451 A CN 107142451A
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- China
- Prior art keywords
- thickness
- film
- mask plate
- fixed
- probe
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
Abstract
The present invention relates to film technique field, a kind of mask plate and evaporated device are disclosed.The mask plate includes graphics field, the graphics field is provided with hollow out figure, thickness is set to test piece in the region in addition to hollow out figure of mask plate, in evaporation processing procedure, deposition material can be deposited on thickness test piece, by detecting that the thickness tests the thickness of film on piece, the thickness of film on mask plate can be obtained, so as to which when the thickness of film reaches certain thickness, mask plate can be changed in time, it is to avoid the problem of film peels off contaminated equipment occur.
Description
Technical field
The present invention relates to film technique field, more particularly to a kind of mask plate and evaporated device.
Background technology
Organic Light Emitting Diode (Organic Light-Emitting Diode, referred to as " OLED "), with all solid state knot
The series of advantages such as structure, high brightness, full visual angle, fast response time, wide, the achievable Flexible Displays of operating temperature range.Especially exist
Field of flexible display, it can be curled, fold, therefore before portable product or wearing product scope have extremely broadness
Scape.
The preparation method of OLED has vacuum evaporation (Vacuum Evaporation), laser thermal transfer (Laser
Induced Thermal Imaging, LITI), inkjet printing (Ink Jet Print) etc., current vacuum evaporation technology compares
Maturation, is the mainstream technology that all big enterprises use.
The evaporation of OLED is divided into organic material evaporation and metal material evaporation, and metal material typically uses Mg, Ag, Al
Deng.The mask plate of metal evaporation includes graphics field and the neighboring area positioned at graphics field, and metal material is using mask plate as resistance
Gear, is deposited onto OLED by the hollow out figure of graphics field.It is deposited after the completion of process, mask plate conveyance can be back to and covered
Film version storage chamber.
During evaporation, on mask plate also can deposited metal material, when the metal film thickness on mask plate reaches necessarily
, will be peeling-off during thickness, cause to produce a large amount of particles, pollute vacuum evaporation equipment.
The content of the invention
The present invention provides a kind of mask plate and evaporated device, to solve the film deposited during evaporation on mask plate
When thickness reaches certain thickness, it may occur that peel off, the problem of polluting evaporated device.
In order to solve the above technical problems, the present invention provides a kind of mask plate, including plate body, the plate body includes graphics field
With the neighboring area positioned at graphics field periphery, the graphics field is provided with hollow out figure, it is characterised in that described to cover
Diaphragm plate also includes thickness and tests piece, and the region in addition to the hollow out figure of the thickness test piece correspondence plate body is set
Put.
Mask plate as described above, wherein, the thickness test piece is arranged on the neighboring area.
Mask plate as described above, wherein, the mask plate includes at least two thickness and tests piece, at least two film
Thickness test piece is evenly distributed on the periphery of the graphics field.
A kind of evaporated device is also provided in the embodiment of the present invention, including for placing the storage of mask plate as described above
Chamber, wherein, in addition to：
Thickness detection unit, the thickness for measuring the first film that the thickness of the mask plate is tested on piece.
Evaporated device as described above, wherein, the evaporated device also includes：
Alarm unit；
Control unit, is connected with the thickness detection unit and alarm unit, when the thickness of the first film reaches default thickness
When spending, described control unit controls the alarm unit to send alarm.
Evaporated device as described above, wherein, supporting part is provided with the storage chamber, the mask plate fixed placement exists
On the supporting part；
The thickness detection unit is fixed on the supporting part, and tests with the thickness of the mask plate position pair of piece
Should.
Evaporated device as described above, wherein, the material of the first film on the thickness test piece is metal, the film
The material of thickness test piece is insulating materials；
The thickness detection unit includes：
It is fixed on the first drive mechanism on the supporting part；
The FOUR-POINT PROBE METER of the output end of first drive mechanism is fixed on, the FOUR-POINT PROBE METER includes
Computing unit, at least one probe of body and setting on the body, first drive mechanism are used to drive the spy
Pin is inserted in the first film；The computing unit is connected with the probe, when the probe is inserted in the first film
When, the computing unit calculates the square resistance of the first film；
Pressure sensor, for obtaining the pressure that the drive mechanism is applied on the FOUR-POINT PROBE METER；
Described control unit is connected with first drive mechanism and pressure sensor, for controlling first driving machine
Structure drives the probe to insert in the first film, until the pressure being applied on the FOUR-POINT PROBE METER is default pressure
Power；Described control unit is also connected with the computing unit, for determining described according to the square resistance of the first film
The thickness of one film.
Evaporated device as described above, wherein, the material of the first film on the thickness test piece is metal, the film
The material of thickness test piece is insulating materials；
The thickness detection unit includes：
It is fixed on the electromagnet on the supporting part；
The lever construction on the supporting part is fixed on, the lever construction includes lever, and one end of the lever is fixed
There is the counterweight with preset weight, the other end is fixed with FOUR-POINT PROBE METER, and the FOUR-POINT PROBE METER includes calculating single
Member, at least one probe of body and setting on the body, the computing unit is connected with the probe, when the probe
When inserting in the first film, the computing unit calculates the square resistance of the first film；
Described control unit is connected with the electromagnet, for controlling counterweight described in the electromagnetic actuation, when the electricity
Described in magnet not adhesive during counterweight, under the Action of Gravity Field of the counterweight, the other end of the lever is lifted so that described
Probe is inserted in the first film；Described control unit is also connected with the computing unit, for according to the first film
Square resistance determine the thickness of the first film.
Evaporated device as described above, wherein, there are multiple support blocks, the mask plate fixed placement on the supporting part
In the multiple support block；
The thickness detection unit and support block are located at the same side of the supporting part.
Evaporated device as described above, wherein, sensing unit is provided with the support block, for detecting the support block
On whether be placed with mask plate；
Fixed part is additionally provided with the support block；
Described control unit is connected with the sensing unit and fixed part, when being placed with mask plate in the support block,
Described control unit controls the fixed part to fix the mask plate.
The above-mentioned technical proposal of the present invention has the beneficial effect that：
In above-mentioned technical proposal, set thickness to test piece by the region in addition to hollow out figure in mask plate, steaming
Plate in processing procedure, can deposit deposition material on thickness test piece, by detecting that the thickness tests the thickness of film on piece, can obtain
The thickness of film on mask plate is taken, so that when the thickness of film reaches certain thickness, mask plate can be changed in time, it is to avoid
There is the problem of film peels off contaminated equipment.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the accompanying drawing used required in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 represents the structural representation of mask plate in the embodiment of the present invention；
Fig. 2 represents the partial structural diagram of evaporated device in the embodiment of the present invention；
Fig. 3 represents the operation principle schematic diagram one of thickness detection unit in the embodiment of the present invention；
Fig. 4 represents the operation principle schematic diagram two of thickness detection unit in the embodiment of the present invention；
Fig. 5 represents the process schematic of thickness detection unit detection film thickness in Fig. 4；
Fig. 6 represents the corresponding relation schematic diagram of the thickness of metallic film and its square resistance in the embodiment of the present invention.
Embodiment
The mask plate used in evaporation film-forming technique, it includes graphics field and the week positioned at graphics field periphery
Border area domain, the graphics field is provided with hollow out figure.Using the mask plate as progress evaporation processing procedure is stopped, deposition material can
It is deposited on by the hollow out figure on substrate.In evaporation processing procedure, the region in addition to hollow out figure of mask plate can be deposited
Deposition material.
The present invention sets thickness to test piece in the region in addition to hollow out figure of mask plate, in evaporation processing procedure, thickness
Deposition material can be deposited on test piece, by detecting that the thickness tests the thickness of film on piece, can obtain thin on mask plate
The thickness of film, so that when the thickness of film reaches certain thickness, mask plate can be changed in time, it is to avoid film stripping occur
The problem of polluting evaporated device.
Wherein, the thickness of film is identical with the thickness of film on mask plate on thickness test piece.
Below in conjunction with drawings and examples, the embodiment to the present invention is described in further detail.Following reality
Applying example is used to illustrate the present invention, but is not limited to the scope of the present invention.
Embodiment one
As shown in figure 1, a kind of mask plate 1 is provided in the present embodiment, for evaporated device.Mask plate 1 includes plate body 10, plate
Body 10 includes graphics field and the neighboring area positioned at graphics field periphery, and the graphics field is provided with hollow out figure
101.Mask plate 1 also includes thickness and tests piece 2, and the region in addition to hollow out figure 101 of the thickness test correspondence plate body 10 of piece 2 is set
Put.
The non-void region of above-mentioned mask plate is provided with thickness test piece, by detecting the thickness is tested on piece first
The thickness of film, to obtain the film thickness on mask plate, so that when the film thickness on mask plate reaches the thickness that the moon is penetrated,
Mask plate can be changed in time, it is to avoid the problem of film peels off pollution evaporated device occur.
Wherein, thickness test piece 2 size and dimension be not especially limited, can rule or irregular shape, as long as not
Hollow out figure 101 is blocked, evaporation process is influenceed.
In actual use, mask plate 1 is typically secured on a framework 100, to facilitate the fixation of mask plate 1.
In order to improve the reliability of testing result, it is necessary to ensure the thickness homogeneity of the first film on thickness test piece 2
Well, therefore, setting the surfacing with the first film of thickness test piece 2.The material of piece 2 is tested as thickness, according to
The material of the first film thereon, and the thickness detection method of the first film are determined.It is thin with first on thickness test piece 2
Membrane material be metal exemplified by, the thickness of the first film can be determined by square resistance, in order to not influence the detection of thickness, film
The material selection insulating materials of thickness test piece 2.
Thickness test piece 2 can be specifically fixed on mask plate 1 by the screw nut of cooperation.It is of course also possible to pass through
Other manner is fixed on mask plate 1.
Exemplified by making display device by evaporation process, the graphics field of mask plate 1 specifically can be with viewing area
Position correspondence, hollow out figure 101 is consistent with the figure of the film pattern of viewing area.Certainly, when the viewing area of viewing area
When all including film pattern with non-display area, hollow out figure 101 is corresponding with the position of viewing area and non-display area, hollow out
Figure 101 is consistent with the figure of viewing area and the film pattern of non-display area.Wherein, the film pattern on display device by
Deposition material is made through the area deposition where the hollow out figure 101 of mask plate 1 on substrate.
It should be noted that the mask plate of the present invention is not limited to be applied to evaporated device, other needs are applied also for
It is peeling-off when reaching certain thickness with the film thickness prevented on mask plate using the film-forming apparatus of mask plate, pollution
The problem of equipment.
In the present embodiment, thickness can specifically be tested to the neighboring area that piece 2 is arranged on mask plate 1, due to neighboring area
Area it is larger, be easy to thickness to test the setting and the detection of follow-up thickness of piece 2.
In order to improve accuracy of detection, set mask plate 1 to include at least two thickness and test piece 2, at least two thickness
Test piece 2 is evenly distributed on the periphery of the graphics field, by detecting the first film that the thickness of diverse location is tested on piece 2
Thickness, take its average value, be conducive to improve accuracy of detection.For example：, can be in mask plate 1 when the mask plate 1 is rectangular slab
Plate body 10 four sides set respectively a thickness test piece 2.
Exemplified by applied to evaporated device, the use process of above-mentioned mask plate is：
The mask plate being placed in storage chamber is delivered in evaporation vacuum chamber；
The mask plate is aligned with the substrate in evaporation vacuum chamber；
Using the mask plate to stop, deposition material exists through the area deposition where the hollow out figure on the mask plate
On the substrate, the second film pattern is formed, second film pattern is consistent with the figure of the hollow out figure.Meanwhile, institute
The region in addition to hollow out figure that deposition material also is deposited upon the mask plate 1 is stated, the first film figure is formed；
The thickness of the first film on thickness test piece is detected, when the thickness of the first film reaches preset thickness,
One new mask plate is placed into the storage chamber, above-mentioned mask plate is replaced, when the thickness of the first film does not reach
During to preset thickness, above-mentioned mask plate is returned in storage chamber.
Wherein, the deposition material can be organic material, or metal material, be not limited thereto, according to tool
The demand of body is selected.
Embodiment two
It is shown in Figure 2, a kind of evaporated device is provided in the present embodiment, including for placing the mask plate in embodiment one
1 storage chamber, in addition to：
Thickness detection unit, the thickness for measuring the first film that the thickness of mask plate 1 is tested on piece 2.
Above-mentioned evaporated device includes thickness detection unit, for detecting the first film that the thickness of mask plate is tested on piece
Thickness, to obtain the film thickness on mask plate, so that when the film thickness on mask plate reaches certain thickness, Neng Gouji
Mask plate in Shi Genghuan storage chambers, it is to avoid the problem of film peels off pollution evaporated device occur.
Wherein, the concrete structure of mask plate 1 and use process will not be described in detail herein described in embodiment one.
With reference to shown in Fig. 3 and Fig. 4, in the present embodiment, the evaporated device is set also to include：
Alarm unit；
Control unit, is connected with the thickness detection unit and alarm unit, when the thickness of the first film reaches default thickness
When spending, described control unit controls the alarm unit to send alarm.
Above-mentioned technical proposal is by setting alarm unit, and film thickness on mask plate is when reaching preset thickness, control
Make the alarm unit and send alarm, realize automatic alarm, be easy to change mask plate in time, it is adaptable to vacuum lines.
The alarm unit can send alarm by modes such as sound, indicator lamp, visualized graph interfaces, herein not
It is construed as limiting.Described control unit includes processor, drive circuit etc..
In the present embodiment, thickness detection unit is arranged in storage chamber, is conducive to the film on detection mask plate 1 in real time
Thickness, is easy to replacing in time.
Specifically, supporting part can be provided with the storage chamber, the mask plate fixed placement is in the supporting part
On.The thickness detection unit is also secured on the supporting part, and corresponding with the position that the thickness of the mask plate tests piece,
It is easy to implement the thickness detection for the first film tested on piece the thickness.Piece is tested when the mask plate includes multiple thickness
When, multiple thickness detection units are set, and the position that thickness detection unit tests piece with thickness is corresponded, the thickness detection
The thickness for the first film that unit is used on the corresponding thickness test piece of test position.
Further, described control unit is connected with the multiple thickness detection unit, for obtaining each thickness detection
The film thickness of unit detection, and average, when the average value is more than default thickness, control the alarm unit hair
Go out alarm, realize automatic alarm, be easy to change mask plate in time, it is adaptable to vacuum lines, and improve the standard of testing result
True property.
It is shown in Figure 2, multiple support blocks 11 can be specifically set on the supporting part, and the fixed placement of mask plate 1 exists
In multiple support blocks 11.The thickness detection unit and support block 11 are located at the same side of the supporting part.
Optionally, multiple thickness test pieces 2 are evenly distributed on the periphery of the graphics field of mask plate 1, to facilitate thickness to survey
The setting of test piece and the detection of film thickness, and improve the degree of accuracy of testing result.
The material for the first film that the thickness detection unit of the present invention can be tested on piece according to thickness, it is specific to select
Structure is realized, to realize the detection to the first film thickness.
Shown in Figure 3 in a specific embodiment, the material of the first film 102 on thickness test piece 2 is
Metal, the concrete structure of the thickness detection unit is：
The thickness detection unit includes：
The first drive mechanism on the supporting part is fixed on, the supporting part is arranged on the storage for placing mask plate
Intracavitary；
The FOUR-POINT PROBE METER of the output end of first drive mechanism is fixed on, the FOUR-POINT PROBE METER includes
Computing unit, body 20 and at least one probe 21 being arranged on body 20, first drive mechanism are used to drive probe
In 21 insertion the first films 102；The computing unit is connected with probe 21, described when in the insertion the first film 102 of probe 21
Computing unit calculates the square resistance of the first film 102；
Pressure sensor (not shown), the FOUR-POINT PROBE METER is applied to for obtaining the drive mechanism
Pressure, the pressure sensor can use resistance strain gage pressure sensor, piezoresistive pressure sensor, inductance type pressure
Sensor etc.；
Described control unit is connected with first drive mechanism and pressure sensor, for controlling first driving machine
In the structure driving insertion the first film 102 of probe 21, until the pressure being applied on the FOUR-POINT PROBE METER is preset pressure；
Described control unit is also connected with the computing unit, for determining the first film according to the square resistance of the first film
102 thickness.
Above-mentioned thickness detection unit calculates the thickness of the first film by detecting the square resistance Rs of the first film
d.Wherein, Rs and d meet below equation：Rs=a*db(as shown in the figure), a, b are the constant related to the material of the first film.
When the material of the first film is Ag, the thickness d of square resistance Rs and the first film corresponding relation is signal in Fig. 6
Curve.
In order to improve the accuracy of testing result, set the mask plate to include multiple thickness and test piece 2, and set multiple
Thickness detection unit.The position that thickness detection unit tests piece 2 with thickness, which is corresponded, to be set, for obtaining the corresponding film in position
The thickness of the first film 102 on thickness test piece 2.
When the evaporated device includes alarm unit and control unit, described control unit is detected with the multiple thickness
Unit is connected, and for obtaining the film thickness of each thickness detection unit detection, and is averaged, when the average value is more than in advance
If thickness when, control the alarm unit to send alarm, realize automatic alarm, be easy to change mask plate in time, it is adaptable to very
Empty production line.
In above-mentioned embodiment, the surfacing with the first film 102 that thickness tests piece 2 is preferably provided with, is made
The uniform film thickness of the first film 102 is obtained, the reliability of testing result is improved.
Wherein, the material of thickness test piece 2 is insulating materials, not influence the inspection of the square resistance to the first film 102
Survey.The mode that first drive mechanism is fixed on supporting part has many kinds, will not enumerate herein.The pressure sensor
It can be arranged between the output end of first drive mechanism and body 20, this is applied to obtain first drive mechanism
Pressure on body 20.
In another particular embodiment of the invention, with reference to shown in Fig. 4 and Fig. 5, the first film 102 on thickness test piece 2
Material be metal, the concrete structure of the thickness detection unit is：
The thickness detection unit includes：
The electromagnet 3 on the supporting part is fixed on, the supporting part is arranged in the storage chamber for placing mask plate；
The lever construction on the supporting part is fixed on, the lever construction includes lever 30, and one end of lever 30 is fixed
There is the counterweight 31 with preset weight, the other end is fixed with FOUR-POINT PROBE METER, and the FOUR-POINT PROBE METER includes calculating
Unit, body 20 and at least one probe 21 being arranged on body 20, the computing unit is connected with probe 21, when probe 21
When inserting in the first film 102, the computing unit calculates the square resistance of the first film 102；
Described control unit is connected with electromagnet 3, for controlling the adhesive counterweight 31 of electromagnet 3, when the not adhesive weight of electromagnet 3
During code 31, under the Action of Gravity Field of counterweight 31, the other end for being fixed with FOUR-POINT PROBE METER of lever 30 is lifted so that
In the insertion the first film 102 of probe 21, as shown in Figure 5；Described control unit is also connected with the computing unit, for according to
The square resistance of one film 102 determines the thickness of the first film 102.
In order to improve the accuracy of testing result, set the mask plate to include multiple thickness and test piece 2, and set multiple
Thickness detection unit.The position that thickness detection unit tests piece 2 with thickness, which is corresponded, to be set, for obtaining the corresponding film in position
The thickness of the first film 102 on thickness test piece 2.
When the evaporated device includes alarm unit and control unit, described control unit is detected with the multiple thickness
Unit is connected, and for obtaining the film thickness of each thickness detection unit detection, and is averaged, when the average value is more than in advance
If thickness when, control the alarm unit to send alarm, realize automatic alarm, be easy to change mask plate in time, it is adaptable to very
Empty production line.
Wherein, electromagnet 3 can with but be not limited to be fixed on the supporting part by supporting structure.The lever knot
The mode that structure is fixed on the supporting part has many kinds, will not enumerate herein, need to only ensure on gravity direction, electromagnet
3 are located at the top of counterweight 31.
The embodiment and a upper embodiment are all to utilize to detect square resistance, calculate the first film
Thickness, still, the concrete structure of thickness detection unit is different, can realize the detection to square resistance.
It should be noted that above-mentioned two embodiment is so that the material of the first film is metal as an example, it is specific to introduce
How using the first film on thickness detection unit detection thickness test piece thickness.But, using detecting square resistance
The principle of the thickness of the first film is calculated, the concrete structure of thickness detection unit is not limited to above two and specifically tied
Structure, is no longer described in detail one by one herein.
Obviously, the material of the first film on the thickness test piece is different, the specific reality of corresponding thickness detection unit
Existing structure also can be otherwise varied.For example：, cannot when the material for the first film that the thickness is tested on piece is organic material
The thickness of the first film is detected by way of detecting square resistance.Specifically, the thickness test piece can be set
Material is metal, and thickness detection unit can detect the thickness of the first film using laser or ultrasonic wave, and specific structure exists
This is no longer described in detail.
It is shown in Figure 2 in the present embodiment, multiple support blocks 11, mask plate 1 can be specifically set on the supporting part
Fixed placement is in multiple support blocks 11.The thickness detection unit and support block 11 are located at the same side of the supporting part, and
The position for testing piece 2 with thickness, which is corresponded, to be set.The thickness detection unit is used for the corresponding thickness test piece 2 of test position
On the first film thickness.It is when mask plate 1, which includes multiple thickness, tests piece 2, first on multiple thickness test piece 2 is thin
The average value of film thickness is compared with default thickness, to determine whether to change mask plate 1, to improve the accurate of testing result
Property.
When mask plate 1 is fixed on a framework 100, specifically by the fixed placement of framework 100 in multiple support blocks 11.
It is possible to further set sensing unit in support block 11, covered for detecting whether to be placed with support block 11
Diaphragm plate 1.Fixed part is additionally provided with support block 11.Described control unit is connected with the sensing unit and fixed part, works as support
When being placed with mask plate 1 on block 11, described control unit controls the fixed part to fix mask plate 1.In above-mentioned technical proposal, cover
Diaphragm plate fixed placement in storage chamber, thickness test piece position fix, be conducive to thickness detection unit detection thereon first
The thickness of film.
Wherein, what is mask plate is fixed implements structure and can be：
So that mask plate 1 is rectangular slab as an example, setting has four support blocks 11, four support blocks on the supporting part
Four angles for corresponding the mask plate 1 are set.Two fixed parts are provided with each support block 11, the fixed part includes
Second drive mechanism and fixed body.For each support block 11, one of fixed part is set close to a side of mask plate 1
Put, another fixed part is set close to the adjacent another side of mask plate 1；After mask plate 1 is placed with support block 11, institute
State the corresponding side that control unit controls second drive mechanism to drive the fixed body to withstand mask plate 1, four angles
The fixation to mask plate 1 is realized in fixed part mutual cooperation.
It should be noted that said structure simply implements structure to one kind that mask plate is fixed, it can realize
It is automatic fixed, it is adaptable to vacuum lines.It is of course possible to which what mask plate was fixed realizes that structure is not limited to above-mentioned one
The mode of kind, for example：It can also be fixed using manipulator, tabletting, it belongs to protection scope of the present invention.
Described above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, some improvement and replacement can also be made, these improve and replaced
Also it should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of mask plate, including plate body, the plate body include graphics field and the peripheral region positioned at graphics field periphery
Domain, the graphics field is provided with hollow out figure, it is characterised in that the mask plate also includes thickness and tests piece, the thickness
The region in addition to the hollow out figure for testing the piece correspondence plate body is set.
2. mask plate according to claim 1, it is characterised in that the thickness test piece is arranged on the neighboring area.
3. mask plate according to claim 2, it is characterised in that the mask plate includes at least two thickness and tests piece,
At least two thickness test piece is evenly distributed on the periphery of the graphics field.
4. a kind of evaporated device, including for placing the storage chamber of the mask plate described in claim any one of 1-3, its feature exists
In, in addition to：
Thickness detection unit, the thickness for measuring the first film that the thickness of the mask plate is tested on piece.
5. evaporated device according to claim 4, it is characterised in that the evaporated device also includes：
Alarm unit；
Control unit, is connected with the thickness detection unit and alarm unit, when the thickness of the first film reaches preset thickness,
Described control unit controls the alarm unit to send alarm.
6. evaporated device according to claim 5, it is characterised in that supporting part is provided with the storage chamber, described to cover
Diaphragm plate fixed placement is on the supporting part；
The thickness detection unit is fixed on the supporting part, and corresponding with the position that the thickness of the mask plate tests piece.
7. evaporated device according to claim 6, it is characterised in that the material of the first film on the thickness test piece
For metal, the material of the thickness test piece is insulating materials；
The thickness detection unit includes：
It is fixed on the first drive mechanism on the supporting part；
The FOUR-POINT PROBE METER of the output end of first drive mechanism is fixed on, the FOUR-POINT PROBE METER includes calculating
Unit, at least one probe of body and setting on the body, first drive mechanism are used to drive the probe to insert
Enter in the first film；The computing unit is connected with the probe, when the probe is inserted in the first film, institute
State the square resistance that computing unit calculates the first film；
Pressure sensor, for obtaining the pressure that the drive mechanism is applied on the FOUR-POINT PROBE METER；
Described control unit is connected with first drive mechanism and pressure sensor, for controlling first drive mechanism to drive
The dynamic probe is inserted in the first film, until the pressure being applied on the FOUR-POINT PROBE METER is preset pressure；
Described control unit is also connected with the computing unit, for determining that described first is thin according to the square resistance of the first film
The thickness of film.
8. evaporated device according to claim 6, it is characterised in that the material of the first film on the thickness test piece
For metal, the material of the thickness test piece is insulating materials；
The thickness detection unit includes：
It is fixed on the electromagnet on the supporting part；
The lever construction on the supporting part is fixed on, the lever construction includes lever, and one end of the lever is fixed with tool
There is the counterweight of preset weight, the other end is fixed with FOUR-POINT PROBE METER, and the FOUR-POINT PROBE METER includes computing unit, sheet
At least one probe of body and setting on the body, the computing unit is connected with the probe, when probe insertion
When in the first film, the computing unit calculates the square resistance of the first film；
Described control unit is connected with the electromagnet, for controlling counterweight described in the electromagnetic actuation, when the electromagnet
Described in not adhesive during counterweight, under the Action of Gravity Field of the counterweight, the other end of the lever is lifted so that the probe
Insert in the first film；Described control unit is also connected with the computing unit, for the side according to the first film
Block resistance determines the thickness of the first film.
9. evaporated device according to claim 6, it is characterised in that have multiple support blocks on the supporting part, described
Mask plate fixed placement is in the multiple support block；
The thickness detection unit and support block are located at the same side of the supporting part.
10. evaporated device according to claim 9, it is characterised in that be provided with sensing unit in the support block, be used for
Detect and whether be placed with mask plate in the support block；
Fixed part is additionally provided with the support block；
Described control unit is connected with the sensing unit and fixed part, described when being placed with mask plate in the support block
Control unit controls the fixed part to fix the mask plate.
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| CN201710533788.6A CN107142451B (en) | 2017-07-03 | 2017-07-03 | A kind of mask plate and evaporated device |
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| CN201710533788.6A CN107142451B (en) | 2017-07-03 | 2017-07-03 | A kind of mask plate and evaporated device |
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| CN110865594A (en) * | 2019-11-18 | 2020-03-06 | 浙江长兴昊隆电子科技有限公司 | Production monitoring method and device for high-performance metallized film |
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| CN107142451B (en) | 2019-12-03 |
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