CN205291971U - Anti -fogery structure - Google Patents

Abstract

The utility model relates to an antifalsification technology especially relates to an anti counterfeiting material. This anti counterfeiting material has bilayer structure, and the top layer is the functional layer, and the bottom is the substrate layer, the functional layer is formed by ultraluminescence -Modular more than two kinds, the substrate layer is the monocrystalline silicon structure, has double anti -fake information, and the security is high.

Description

A kind of anti-counterfeit structure

Technical field

The utility model relates to anti-counterfeiting technology, relates in particular to a kind of anti-counterfeit structure.

Background technology

In existing skill counterfeit-proof tech, large body and random distribution etc. mainly with watermark, colored fibre, fluorescent ink printing, micro-point or small mark are as false proof means.

Such as, prior art 1, Chinese patent literature CN102108653A, disclosed a kind of sheet anti-fake material, described sheet anti-fake material adopts the polymorphic structure beyond square; And described sheet anti-fake material is made up of following layer structure: the false proof carrier layer of papery, the false proof carrier of the wherein said papery at least two kinds of paper that the composite manufacture of fiber obtains of serving as reasons; And false proof layer. The cheque paper that also discloses the preparation method of described sheet anti-fake material and contained this sheet anti-fake material. Sheet anti-fake material of the present invention can obtain possess naked eyes identification simultaneously, the multi-level anti-fraud functional cheque paper such as machine-readable, analysis expert fast.

For another example, prior art 2, Chinese patent literature CN104610812A, disclosed fluorescence silicon nano particles, as the application of anti-fake mark, are prepared fluorescence silicon nano particles by silicon source, the fluorescence silicon nano particles that obtain are used as to anti-counterfeiting ink and prepare security pattern. Because nano silicon particles has good photoluminescent property, quantum yield is high, and storage stability is good, has good excitation wavelength dependence, and the security pattern of preparation can show the light of different colours under the illumination of different excitation wavelengths, can play good antifalse effect.

For another example, prior art 3, Chinese patent literature CN101673341A, the disclosed anti-counterfeiting technology that the present invention relates to, relates in particular to a kind of anti-counterfeiting method of micro-points. The method comprises the following steps: (1) provides a kind of micro-point; (2) provide a kind of glue, micro-point is mixed among glue; (3) on carrier, put mixed atomarius glue; (4) solidified glue; (5) glue of taking pictures drips, and forms original contrast picture; (6) original contrast picture deposits background data base in; (7) the fake certification glue of taking pictures drips, and forms by than picture; (8) read the original contrast picture of background data base, and by than picture comparison, make true and false judgement; Wherein, the glue of taking pictures described in (5) step drips, and takes pictures for amplifying; Fake certification described in (7) the step glue of taking pictures drips, and is also to amplify to take pictures. The invention provides the not imitability anti-counterfeiting method of micro-points of one. Corresponding, Chinese patent literature CN102267287A discloses a kind of preparation method of similarly a kind of micro-some anti-counterfeiting stamp and has realized the device of the method. The preparation method of micro-some anti-counterfeiting stamp comprises the following steps: S1, a kind of micro-some label is provided, and a kind of ink is provided; S2, mixed China ink, mixes with ink by micro-some label; S3, provides at least two shower nozzles, and object is provided; S4, sprays, and by shower nozzle, the ink that is mixed with micro-some label is sprayed to subject matter; S5, the dry ink that is mixed with micro-some label; In course of injection, mixed black step is carried out continuously, mixes China ink, completes in totally enclosed liquid road to shower nozzle ink supply, injection. The invention provides and in a kind of process, be difficult for sneaking into impurity, keep the preparation method of micro-micro-some anti-counterfeiting stamp being evenly distributed and realize the device of the method in ink in real time.

For another example, prior art 4, Chinese patent literature CN1350274A, disclosed a kind of anti-fake mark that contains most small marks or pattern and forming method thereof, to contain the anti-fake mark of most micro pattern marks, reach qualification article genuine-fake and prevent the application of forging. Object qualification is according at least one unique tag forming in object by method, it contains most micro patterns or mark, and close in mark in the mode of random combine, with as a comparison, qualification method, and have prevent other people forge and can reach easily identification and qualification and contrast effect.

But, such as enumerating above, body and the random distribution etc. of composite fibre, fluorescence silicon nano particles, micro-point or the small mark of prior art are as false proof means, be not can prevent like that to open text narration the effect that other people forge, along with scientific and technical progress, these technological means all can be cheap imitated, that can not copy only has the background data base described in prior art 3, but back-end data is also dangerous, the database of enterprise is easy to suffer assault, and need communication security guarantee, still undesirable. Thereby the anti-fake material of prior art and false proof means all have potential safety hazard more or less, need to constantly weed out the old and bring forth the new, constantly progressive.

Utility model content

The purpose of this utility model is to overcome above-mentioned the deficiencies in the prior art part and a kind of anti-counterfeit structure with multiple anti-fake function is provided.

The purpose of this utility model is also to overcome above-mentioned the deficiencies in the prior art part and a kind of imitated anti-counterfeit structure that is difficult for is provided.

The purpose of this utility model can be achieved through the following technical solutions:

A kind of anti-counterfeit structure, is characterized in that: this anti-counterfeit structure has double-decker, top layer is functional layer, and bottom is substrate layer; Described functional layer is combined by more than two kinds Ultraluminescence module, and described substrate layer is monocrystal silicon structure.

Described anti-counterfeit structure, is characterized in that: described Ultraluminescence module, refers in this false proof material of unit the summation of each submodule being made up of same Ultraluminescence, discrete distribution between each submodule; Described Ultraluminescence module can be a figure or character, can be also one group and form a block graphics or character string by most submodules.

Described anti-counterfeit structure, is characterized in that: described more than two kinds Ultraluminescence module, according to the distributing position of the shape of the submodule quantity of every kind of Ultraluminescence module, each submodule, each submodule, forms the first anti-counterfeiting information of this false proof material.

Described anti-counterfeit structure, is characterized in that: described more than two kinds Ultraluminescence module, and every kind of Ultraluminescence module, under ultraviolet irradiating state, presents different colors; Under ultraviolet irradiating state, present different color combination according to every kind of Ultraluminescence module, form the second anti-counterfeiting information of this anti-counterfeit structure.

Described anti-counterfeit structure, is characterized in that: described Ultraluminescence module is the structure in the even curing light binding of ultraviolet fluorescence powder. Described ultraviolet fluorescence powder is to be coordinated with trace active agent by metal (zinc, cadmium) sulfide or rare earth oxide, forms through calcining.

Described anti-counterfeit structure, is characterized in that: described monocrystalline silicon is water white.

Described anti-counterfeit structure, is characterized in that: described functional layer thickness is between 2 to 10 microns, and described substrate layer thickness is between 1 to 2 micron.

The related anti-counterfeit structure of the utility model has double-decker, and top layer is functional layer, and bottom is substrate layer; Described functional layer is combined by more than two kinds Ultraluminescence module, and described substrate layer is monocrystalline silicon; Utilize morphosis first anti-counterfeiting information of Ultraluminescence module combination, utilize different Ultraluminescence modules to show different colours under ultraviolet light source irradiates, form the second anti-counterfeiting information, counterfeit cost is high, does not obtain original words of flooding template data and cannot copy at all.

Brief description of the drawings

Fig. 1 is the layer structure schematic diagram of first embodiment of the utility model.

Fig. 2 is the front schematic view of first embodiment of the utility model.

Fig. 3 is the contrast scheme schematic diagram of first embodiment of the utility model.

Fig. 4 is the schematic diagram of second embodiment S110 to S140 step of the utility model.

Fig. 5 is the schematic diagram of second embodiment S150 to S180 step of the utility model.

Fig. 6 is the 1st circulation schematic diagram of second embodiment S190 to S220 step of the utility model.

Fig. 7 is the 2nd circulation schematic diagram of second embodiment S190 to S220 step of the utility model.

Fig. 8 is the schematic diagram of second embodiment S240 step of the utility model.

Fig. 9 is the schematic diagram of second embodiment S250 step of the utility model.

Figure 10 is the flow chart of second embodiment of the utility model.

Detailed description of the invention

Below in conjunction with accompanying drawing, the utility model is described in further detail.

With reference to figure 1, Fig. 2, first embodiment of the utility model is a kind of anti-counterfeit structure 100, and this anti-counterfeit structure 100 has double-decker, and top layer is functional layer, and bottom is substrate layer 101, described functional layer is combined by three kinds of Ultraluminescence modules 102,103,104, and described substrate layer 101 is monocrystal silicon structures. for clear expression, Fig. 2 compares Fig. 1 and has dwindled one times, special explanation. described three kinds of Ultraluminescence modules 102, 103, 104, in the present embodiment, described three kinds of Ultraluminescence modules 102, 103, 104, it is all a figure, the 102nd, crescent, the 103rd, spindle, the 104th, annular, should be appreciated that, each Ultraluminescence module, it is all the summation of each submodule of being formed by same Ultraluminescence, one group be can be and a block graphics or character string formed by most submodules, with reference to figure 3, provide the scheme that is different from the present embodiment, this scheme is by two kinds of Ultraluminescence modules 801, 802 compositions, Ultraluminescence module 801 is made up of the submodule of four discrete distributions, it is the enclosure portion on character " R " top, the enclosure portion on character " e " top, character " d " bottom enclosure portion, also has character string " Red " part around, Ultraluminescence module 802 also has i.e. " R " " e " " d " of three submodules, form a character string " Red ". return the present embodiment, described three kinds of Ultraluminescence modules 102,103,104, according to the submodule quantity of every kind of Ultraluminescence module (every kind of Ultraluminescence module of the present embodiment only has a submodule certainly), the shape of each submodule, the distributing position of each submodule, form the first anti-counterfeiting information of this false proof material, described three kinds of Ultraluminescence modules 102,103,104, every kind of Ultraluminescence module 102 or 103 or 104, under ultraviolet irradiating state, presents different colors, under ultraviolet irradiating state, present different color combination according to every kind of Ultraluminescence module, form the second anti-counterfeiting information of this anti-counterfeit structure. described Ultraluminescence, is that rare earth metal is entered to redox processing, forms stable oxide. the mixture of the light binding composition that described Ultraluminescence module 102,103,104 is ultraviolet fluorescence powders and have cured. described monocrystalline silicon is transparent. described functional layer thickness is 6 microns, described substrate layer be 1 micron, should be appreciated that described functional layer is between 2 to 10 microns, described substrate layer thickness is between 1 to 2 micron, also can implement the present embodiment.

With reference to figure 4 to Figure 10, the preparation method that second embodiment of the utility model is a kind of anti-counterfeit structure, i.e. the preparation method of first embodiment of the utility model, comprises the following steps: S110, provides substrate of glass; S120 plates adhesion layer on substrate of glass; S130 plates sacrifice layer on adhesion layer; S140 plates substrate layer on sacrifice layer; S150 is coated with the mixture of ultraviolet fluorescence powder and light binding for the first time on substrate layer; S160, provides ultraviolet light source, provides and floods for the first time template, by the mixture coating exposure of S150 step coating; S170, provides developer solution, develops; S180, provides pure water, cleans; S190 is coated with the mixture of the N time ultraviolet fluorescence powder and light binding on substrate layer, and the thickness of coating layer is consistent with the coating layer of S150 step; S200, provides and floods template the N time, and S190 step is prepared to mixture coating exposure; S210, develops; S220, cleans; S230, has judged whether the setting of all Ultraluminescence modules, if not, N is set as to N and adds 1, turns S190 step, and certainly, the present embodiment amounts to Ultraluminescence module is set 3 times, and N has needed only 3 just can exit execution S240 step; S240, provides plasma etching equipment, etching substrate layer; S250, provides sacrificial layer etching liquid, etching sacrificial layer; S260, provides cleaning and filtering equipment and pure water, cleans, and filters.

In second embodiment, S120 step, described adhesion layer is Cr, described plating refers to Vacuum Deposition; S130 step, described sacrifice layer is Al, described plating refers to Vacuum Deposition; S140 step, described substrate layer is monocrystalline silicon, described plating refers to Vacuum Deposition; S170 step, described development, with developer solution cured portion mixture coating; S180 step, cleans, and washes S170 development step uncured portion mixture coating with pure water; S190 step and S200 step, S230 step, described N, initial value is 2.

In second embodiment, described S150 and S190 step, the light binding of mentioning, is the curing light binding of single ultraviolet spectrogram.

In second embodiment, described S150 step, also comprises providing being coated with equipment step, with being coated with method coating. Described light binding can be selected positive light binding and negative light binding one wherein, the cured portion mixture coating that described S170 step is mentioned refers to, exposure or unexposed part mixture coating, particularly, part mixture coating for positive light binding exposure does not solidify, and unexposed part mixture coating solidifies; Accordingly, solidify for the part mixture coating of negative light binding exposure, unexposed part mixture coating does not solidify. Described light binding can be selected positive light binding and negative light binding one wherein, the development that described S210 step is mentioned, refer to cured portion mixture coating, i.e. exposure or unexposed part mixture coating, particularly, part mixture coating for positive light binding exposure does not solidify, and unexposed part mixture coating solidifies; Accordingly, solidify for the part mixture coating of negative light binding exposure, unexposed part mixture coating does not solidify.

Described S110 provides substrate of glass, also comprise sheet glass is cut into square or rectangle, and chamfering, polishing, cleaning, drying steps, be 0.35 for the thickness of substrate of glass, the thickness that is appreciated that substrate of glass can both be implemented the present embodiment between 0.3 to 0.5 millimeter.

Described in described S170 step, provide developer solution, developer solution is that tetramethyl adds water; Described S240 step etching substrate layer, gases used is CF6, can certainly increase assist gas.

Described S250 step, provides sacrificial layer etching liquid, and the sacrifice layer plating for S130 step is Al, and it is hydrochloric acid that etching solution is provided, and is to be understood that making etching solution with NaOH also can realize; The sacrifice layer plating for S130 step is Cu, and it is hydrogen peroxide that etching solution is provided.

Described S150, S160 step and S190, S200 step, the present embodiment is selected the most frequently used positive light binding, select sun to flood template, it is exactly the pattern shading needing that described sun floods template, unwanted part printing opacity, described positive optical cement is exactly after developing and cleaning, and the part of irradiation is removed, and the part of irradiation does not stay; When concrete selection, according to the selection of positive light binding or negative light binding, determine that selection sun floods template and the moon floods template.

With reference to figure 4, be the schematic diagram of second embodiment S110 to S140 step of the utility model, provide in substrate of glass 211, first plate adhesion layer 212, plate Cr, further plate sacrifice layer 213, plate Al, plate substrate layer 214 again, plate Si, prepared partly becomes this product 210 for S150 step.

With reference to figure 5, it is the schematic diagram of second embodiment S150 to S180 step of the utility model, be coated with the mixture 301 of Ultraluminescence for the first time and light binding at the substrate layer 214 of semi-finished product 210, employing is coated with method, and THICKNESS CONTROL is at 6 microns, and what is called is coated with method, exactly the mixture of Ultraluminescence for the first time and light binding is dropped in to the centre of semi-finished product 210, utilization is coated with equipment High Rotation Speed semi-finished product 210, and mixture is paved, and rotating speed can be controlled the thickness of coating; Being coated with equipment can outsourcing, also can make by oneself with rotation motor, and a carrying jig platform is set, by semi-finished product 210 clampings, on platform, platform is horizontally disposed with, and corresponding bearing is set so that platform stable, utilize rotation motor band moving platform to rotate, rotation motor can be selected governor motor; Ultraviolet light source 999 is provided, provide and flood for the first time template 302, the mixture coating 301 of S150 step coating is exposed, by developing, cleaning, on semi-finished product 210, leave Ultraluminescence module 102, Ultraluminescence module 102 adds that semi-finished product 210 form the second semi-finished product 310, the second semi-finished product 310 for S190 step.

With reference to figure 6, the 1st circulation schematic diagram of second embodiment S190 to S220 step of the utility model, be coated with the mixture 401 of Ultraluminescence for the second time and light binding at the substrate layer 214 of the second semi-finished product 310, employing is coated with method, THICKNESS CONTROL is at 6 microns, ultraviolet light source 999 is provided, provide and flood for the second time template 402, the mixture coating 401 of S190 step coating is exposed, by developing, clean, on the second semi-finished product 310, leave Ultraluminescence module 103, Ultraluminescence module 103 adds that the second semi-finished product 310 form the 3rd semi-finished product 410, the 3rd semi-finished product 410 recycling for the 2nd time for S190 to S220 step.

With reference to figure 7, the 2nd circulation schematic diagram of second embodiment S190 to S220 step of the utility model, be coated with the mixture 501 of Ultraluminescence for the third time and light binding at the substrate layer 214 of the 3rd semi-finished product 410, employing is coated with method, THICKNESS CONTROL is at 6 microns, ultraviolet light source 999 is provided, provide and flood for the third time template 502, the mixture coating 501 of S190 step coating is exposed, by developing, clean, on the 3rd semi-finished product 410, leave Ultraluminescence module 104, Ultraluminescence module 104 adds that the 3rd semi-finished product 410 form the 4th semi-finished product 510, the 4th semi-finished product 510 are for S240 step.

With reference to figure 8, it is the schematic diagram of second embodiment S240 step of the utility model, plasma etching equipment is provided, etching substrate layer 214, the 4th semi-finished product 510 are placed in to plasma etching equipment, the exposure part substrate layer 214 that the 4th semi-finished product 510 is not covered to Ultraluminescence module 102,103,104 by CF6 gas etches away, and leaves substrate layer 101 and connects Ultraluminescence module 102,103,104 and sacrifice layer 213.

With reference to figure 8, it is the schematic diagram of second embodiment S250 step of the utility model, S240 step finished product is placed in to hydrochloric acid solution, etch sacrificial layer, make material described in first embodiment of the utility model, separate from substrate of glass, should be appreciated that making etching solution with NaOH also can realize the present embodiment.

With reference to Figure 10, be the flow chart of second embodiment of the utility model, in order to have more versatility, provide the more than two kinds generalized flowsheet of Ultraluminescence module, second embodiment of the utility model is three kinds of Ultraluminescence modules, so S190 to S220 step cycle 2 times.

Claims (3)

1. an anti-counterfeit structure, is characterized in that: this anti-counterfeit structure has double-decker, and top layer is functional layer, and bottom is substrate layer; Described functional layer is formed by connecting by more than two kinds Ultraluminescence module, and described substrate layer is monocrystal silicon structure.

2. anti-counterfeit structure according to claim 1, is characterized in that: described monocrystalline silicon is water white.

3. anti-counterfeit structure according to claim 1, is characterized in that: described functional layer thickness is between 2 to 10 microns, and described substrate layer thickness is between 1 to 2 micron.