CN206097718U

CN206097718U - Anti -fogery structure

Info

Publication number: CN206097718U
Application number: CN201620769069.5U
Authority: CN
Inventors: 翟兴
Original assignee: Individual
Current assignee: Individual
Priority date: 2016-07-20
Filing date: 2016-07-20
Publication date: 2017-04-12
Anticipated expiration: 2026-07-20

Abstract

The utility model relates to an antifalsification technology especially relates to an anti -fogery structure, and this anti -fogery structure includes the bottom, bottom surface connections top layer, and the top layer is formed by discrete setting the in two above sublayers, and this anti -fogery structure cost is lower.

Description

A kind of anti-counterfeit structure

Technical field

This utility model is related to anti-counterfeiting technology, more particularly to a kind of anti-counterfeit structure.

Background technology

In existing skill counterfeit-proof tech, mostly with the body of watermark, colored fibre, fluorescent ink printing, microdot or small mark And random distribution etc. is used as counterfeit protection measures.

Such as, prior art 1, Chinese patent literature CN102108653A, a kind of disclosed lamellar anti-fake material, described Shape anti-fake material is using the polymorphic structure beyond square；And the lamellar anti-fake material is made up of following layer structure：Paper The false proof carrier layer of matter, wherein the false proof carrier of the papery is to compound the paper that manufacture is obtained by least two fibers；And it is false proof Layer.Also disclose the preparation method and the cheque paper containing the lamellar anti-fake material of the lamellar anti-fake material.The present invention's Lamellar anti-fake material can be obtained and be provided simultaneously with multi-level anti-fraud functional anti-such as naked eyes identification, quick machine-readable, analysis expert Pseudo- paper.

For another example, prior art 2, Chinese patent literature CN104610812A, disclosed fluorescence silicon nano particles are used as anti- The application of pseudo- labelling, prepares fluorescence silicon nano particles by silicon source, and the fluorescence silicon nano particles for obtaining are used as anti-counterfeiting ink to make Standby security pattern.As nano silicon particles have good photoluminescent property, quantum yield is high, and storage stability is good, with good Excitation wavelength dependency, the security pattern of preparation can show the light of different colours under the illumination of different excitation wavelengths, can rise To good antifalse effect.

For another example, prior art 3, Chinese patent literature CN101673341A are disclosed the present invention relates to anti-counterfeiting technology, especially Which is related to a kind of anti-counterfeiting method of micro-points.The method is comprised the following steps：(1) provide a kind of microdot；(2) a kind of glue is provided, will Among microdot is mixed in glue；(3) put on carrier and mix atomarius glue；(4) solidified glue；(5) glue of taking pictures drips, and is formed Original Contrast's picture；(6) original Contrast's picture is stored in background data base；(7) fake certification take pictures glue drop, formed by than picture； (8) background data base original Contrast's picture is read, and is compared than picture, make true and false judgement；Wherein, described in (5th) step Glue of taking pictures drips, and is that amplification is taken pictures；Fake certification described in (7th) step take pictures glue drop, and amplify take pictures.The present invention provides a kind of Not imitability anti-counterfeiting method of micro-points.Corresponding, Chinese patent literature CN102267287A discloses a kind of similar one The preparation method of kind of microdot anti-counterfeiting stamp and and realize the device of the method.The preparation method of microdot anti-counterfeiting stamp includes following step Suddenly：A kind of a kind of S1, there is provided microdot label, there is provided ink；S2, mix ink, will microdot label mix homogeneously with ink； S3, there is provided at least two shower nozzles, there is provided object；The ink for being mixed with microdot label is sprayed to target by shower nozzle by S4, injection Thing；S5, drying are mixed with the ink of microdot label；In course of injection, mixed ink step is continuously carried out, and is mixed ink, is supplied to shower nozzle Ink, injection are completed in totally enclosed fluid path.The present invention is difficult to be mixed into impurity in providing a kind of course of processing, keeps in real time The preparation method of the microdot anti-counterfeiting stamp that microdot is evenly distributed in ink and realize the device of the method.

For another example, prior art 4, Chinese patent literature CN1350274A, it is disclosed it is a kind of contain most small marks or Anti-fake mark of pattern and forming method thereof, with the anti-fake mark containing most micro pattern marks, reaches identification article genuine-fake And prevent the application forged.Object identification method is that it contains many according at least unique tag formed in object Number micro patterns or mark, and together in labelling in the way of random combine, with as a comparison, the method for identification, and have anti- Stop other people and forge and can be easily achievable identification and the effect identified and contrast.

For another example, prior art 5, Chinese patent literature CN105489112A, the present invention relates to anti-counterfeiting technology, more particularly to A kind of anti-fake material and preparation method thereof, anti-fake material include the monocrystal silicon module of lamellar, and monocrystal silicon module has void region, Anti-fake material also includes metal module, and metal module is embedded in the void region；The preparation method of anti-fake material, by glass Adhesive layer, plating sacrifice layer, plating monocrystalline silicon layer are plated above glass substrate, coating light binding, exposure, development, cleaning etch monocrystal silicon Layer, second glue spreading, exposure, development, cleaning plate metal module, clean light binding, and etching sacrificial layer, cleaning are filtered；The present invention is carried There is many materials, relief anti-fake material and preparation method thereof for a kind of.

However, such as listed above 1 to 4, the composite fibre of prior art, fluorescence silicon nano particles, microdot or small note Number body and random distribution etc. as counterfeit protection measures, be not to prevent what other people from forging to as disclosure narration Effect, with the progress of science and technology, these technological means inexpensively can be copied, it is impossible to imitated only 3 institute of prior art The background data base stated, but back-end data is also dangerous, and the data base of enterprise is easily subject to assault, and needs communication peace All risk insurance hinders, still undesirable.Above-mentioned prior art 5, although overcome the defect of prior art, but metal and single crystal silicon material into This is all higher, and process costs are also high, especially etches monocrystalline silicon layer, needs expensive ICP equipment, for domestic consumer, implements Pressure is larger.Thus, anti-fake material and the counterfeit protection measures of prior art have more or less potential safety hazard, without potential safety hazard High cost, needs constantly to weed out the old and bring forth the new, constantly progressive.

Utility model content

The purpose of this utility model is also resided in place of overcoming above-mentioned the deficiencies in the prior art and provides a kind of the anti-of low cost Pesudo-structure.

The purpose of this utility model can be achieved through the following technical solutions.

A kind of anti-counterfeit structure, it is characterised in that：Including bottom, bottom upper surface connection top layer, top layer are sub by more than two Layer scattering is arranged and is formed.In same level, discrete setting collectively constitutes top layer to more than two sublayers.

Described anti-counterfeit structure, it is characterised in that：The upper limit of the sublayer quantity is not typically restricted, and sublayer quantity is general Less than 5, at most more than 7, under conditions of especially restriction bottom adds top layer thickness below 10 microns.

Described anti-counterfeit structure, it is characterised in that：The sublayer quantity is 2, and the mutual axial symmetry of 2 sublayers is arranged.

Described anti-counterfeit structure, it is characterised in that：The bottom is the light binding structure of solidification；The sublayer is that pigment is equal The even structure being solidificated in light binding.The pigment of each sublayer is same or different, or part same section is different.

Described anti-counterfeit structure, it is characterised in that：The bottom is the uniform curing knot in light binding of light yellow pigment Structure；The sublayer is the uniform curing structure in light binding of other pigment.The pigment of each sublayer be it is same or different, Or part same section is different.

Described anti-counterfeit structure, it is characterised in that：The shape of the sublayer is the shape of pattern or word.

Described anti-counterfeit structure, it is characterised in that：The top layer is entirely located in bottom surface area.

Described anti-counterfeit structure, it is characterised in that：The primary colors light binding is lightpink.

Described anti-counterfeit structure, it is characterised in that：Each molecular layers thick of more than two sublayers is consistent, is equal to top layer Thickness；

Described anti-counterfeit structure, it is characterised in that：The underlayer thickness is equal to the skin depth, and the underlayer thickness adds The upper skin depth is between 2 to 10 microns.

Anti-counterfeit structure of the present utility model, including bottom, bottom upper surface connection top layer, top layer by more than two sublayers from It is casually arranged with to put and forms；Only bottom and top layer, the shape composition anti-counterfeiting information on top layer, and multiple sublayers can be arranged in form Identical color or different colours, expression-form more enrich；Compared with prior art, cost bottom.

Description of the drawings

Fig. 1 is the front schematic view of this utility model one embodiment.

Fig. 2 is the generalized section of this utility model one embodiment, i.e. the A-A profiles of Fig. 1.

Fig. 3 is the front schematic view of the 3rd embodiment of this utility model.

Specific embodiment

Below in conjunction with accompanying drawing, the utility model is described in further detail.

With reference to Fig. 1, Fig. 2, this utility model one embodiment is a kind of anti-counterfeit structure, including bottom 005, bottom 005 Upper surface connects top layer, and top layer is formed by two discrete settings of sublayer 001.

State the light binding structure that bottom 005 is solidification, it will be appreciated that the bottom 005 can also be that light yellow pigment is equal The even structure being solidificated in light binding, without arranging to bit line, the product not high for position accuracy demand can be with for this structure The directly direct para-position of bottom；The sublayer 001 is the uniform curing structure in light binding of other pigment.Two sublayers 001 Pigment is identical.The shape of 2 sublayers 001 is axisymmetric head wolf pattern form.The top layer is entirely located on bottom 005 In surface region.

001 degree of two sub- thickness are consistent, are equal to skin depth；It is thick that 005 thickness of the bottom is equal to the top layer Degree, plus the skin depth between 2 microns, sublayer quantity is 2 to 005 thickness of the bottom.

With reference to Fig. 3, second embodiment of this utility model is a kind of anti-counterfeit structure, including bottom 705,705 upper table of bottom Face connects top layer, and top layer is formed by three sublayers, 701,702,703 discrete setting.Three sublayers 701,702,703 are in same water In plane, top layer is collectively constituted.

The bottom 705 is the light binding structure of solidification；The sublayer 701,702,703 be other pigment it is uniform curing Structure in light binding.The pigment of three sublayers 701,702,703 is differed.The shape of 3 sublayers 701,702,703 It is character " R ", " e ", " d ".In the present embodiment, the sublayer 701 for being shaped as " R " is red, is shaped as the sublayer 702 of " e " It is black, the sublayer 703 for being shaped as " d " is purple；The top layer is entirely located in 705 surface area of bottom, i.e., and three Individual sublayer 701,702,703 is arranged at bottom upper surface, does not surmount the border of 705 upper surface of bottom.

Three sublayers, 701,702,703 consistency of thickness, is equal to skin depth；705 thickness of the bottom is equal to institute Skin depth is stated, plus the skin depth between 4 microns, sublayer quantity is 3 to 705 thickness of the bottom.

Claims

1. a kind of anti-counterfeit structure, it is characterised in that：Including bottom, bottom upper surface connection top layer, top layer is by more than two sublayers Discrete setting is formed.

2. anti-counterfeit structure according to claim 1, it is characterised in that：The shape of the sublayer is the shape of pattern or word Shape.

3. anti-counterfeit structure according to claim 1, it is characterised in that：The shape on the top layer is the shape of pattern or word Shape.

4. anti-counterfeit structure according to claim 1, it is characterised in that：The top layer is entirely located in bottom surface area It is interior.

5. anti-counterfeit structure according to claim 1, it is characterised in that：Described each molecular layers thick one of more than two sublayers Cause, be equal to skin depth.

6. anti-counterfeit structure according to claim 1, it is characterised in that：The underlayer thickness is equal to the skin depth, institute Underlayer thickness is stated plus the skin depth between 2 to 10 microns.