CN105500955A - Anti-counterfeiting material and preparation method thereof - Google Patents
Anti-counterfeiting material and preparation method thereof Download PDFInfo
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- CN105500955A CN105500955A CN201510890347.2A CN201510890347A CN105500955A CN 105500955 A CN105500955 A CN 105500955A CN 201510890347 A CN201510890347 A CN 201510890347A CN 105500955 A CN105500955 A CN 105500955A
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- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
- G09F3/0291—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time
- G09F3/0294—Labels or tickets undergoing a change under particular conditions, e.g. heat, radiation, passage of time where the change is not permanent, e.g. labels only readable under a special light, temperature indicating labels and the like
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Abstract
The invention relates to an anti-counterfeiting technique and in particular relates to an anti-counterfeiting material and a preparation method thereof. The anti-counterfeiting material has a two-layer structure, wherein a top layer is a functional layer, while a bottom layer is a substrate layer; the functional layer is composed of more than two ultraviolet fluorescent modules; the substrate layer is made of monocrystalline silicon and has double anti-counterfeiting information; the preparation method of the anti-counterfeiting material comprises the following steps: plating an adhering layer on a glass substrate, plating a sacrificial layer, plating a substrate layer, carrying out coating of a first ultraviolet fluorescent powder-optical curing adhesive mixture, transmitting an ultraviolet light source through a first mask, carrying out multiple cycles of exposure, development and cleaning to the formed mixture coating until the arrangement of all the ultraviolet fluorescent modules is completed, and then etching the substrate layer and etching the sacrificial layer; the whole process flow is an interlocking entire process, which fundamentally cannot be copied without the formula of the ultraviolet fluorescent powder and the data of the mask.
Description
Technical field
The present invention relates to anti-counterfeiting technology, particularly relate to a kind of anti-fake material and preparation method thereof.
Background technology
In existing skill counterfeit-proof tech, greatly mainly with the body and random distribution etc. of watermark, colored fibre, fluorescent ink printing, micro-point or small mark as counterfeit protection measures.
Such as, prior art 1, Chinese patent literature CN102108653A, disclosed a kind of sheet anti-fake material, described sheet anti-fake material adopts the polymorphic structure beyond square; And described sheet anti-fake material is made up of following layer structure: the false proof carrier layer of papery, the false proof carrier of wherein said papery is the paper obtained by least two kinds of composite manufactures of fiber; And false proof layer.Also disclose the preparation method of described sheet anti-fake material and the cheque paper containing this sheet anti-fake material.Sheet anti-fake material of the present invention can obtain possesses the multi-level anti-fraud functional cheque paper such as naked eyes identification, fast machine-readable, analysis expert simultaneously.
For another example, prior art 2, Chinese patent literature CN104610812A, disclosed fluorescence silicon nano particles, as the application of anti-fake mark, prepare fluorescence silicon nano particles by silicon source, the fluorescence silicon nano particles obtained are used as anti-counterfeiting ink to prepare security pattern.Because nano silicon particles has good photoluminescent property, quantum yield is high, and storage stability is good, has good excitation wavelength dependence, and the security pattern of preparation can show the light of different colours under the illumination of different excitation wavelength, can play good antifalse effect.
For another example, prior art 3, Chinese patent literature CN101673341A, disclosed in the present invention relates to anti-counterfeiting technology, particularly relate to a kind of anti-counterfeiting method of micro-points.The method comprises the following steps: (1) provides a kind of micro-point; (2) provide a kind of glue, micro-point is mixed among glue; (3) the mixed atomarius glue of point on carrier; (4) solidified glue; (5) glue of taking pictures drips, and forms original Contrast's picture; (6) original Contrast's picture is stored in background data base; (7) fake certification glue of taking pictures drips, and is formed by than picture; (8) read background data base original Contrast picture, compare with by than picture, make the true and false and judge; Wherein, the glue of taking pictures described in (5) step drips, and takes pictures for amplifying; Fake certification described in (7) step glue of taking pictures drips, and is also to amplify to take pictures.The invention provides the not imitability anti-counterfeiting method of micro-points of one.Corresponding, Chinese patent literature CN102267287A discloses a kind of preparation method of similar a kind of micro-some anti-counterfeiting stamp and realizes the device of the method.The preparation method of micro-some anti-counterfeiting stamp comprises the following steps: S1, provides a kind of micro-some label, provides a kind of ink; S2, mixed ink, mixes with ink by micro-some label; S3, provides at least two shower nozzles, provides object; S4, sprays, by shower nozzle, the ink being mixed with micro-some label is sprayed to subject matter; S5, drying is mixed with the ink of micro-some label; In course of injection, mixed black step is carried out continuously, mixes ink, completes in totally enclosed fluid path to shower nozzle ink supply, injection.The invention provides in a kind of process the preparation method being not easily mixed into the micro-some anti-counterfeiting stamp that impurity, the in real time micro-point of maintenance are evenly distributed in ink and the device realizing the method.
For another example, prior art 4, Chinese patent literature CN1350274A, disclosed a kind of anti-fake mark containing most small mark or pattern and forming method thereof, with the anti-fake mark containing most micro pattern mark, reach the application identified article genuine-fake and prevent from forging.Object qualification method is at least one unique tag according to being formed in object, it contains most micro pattern or mark, and close in mark in the mode of random combine, with as a comparison, qualification method, and have prevent other people from forging and can reach easily identify and qualification and contrast effect.
But, enumerate such as, the body and random distribution etc. of the composite fibre of prior art, fluorescence silicon nano particles, micro-point or small mark are as counterfeit protection measures, it is not the effect that can prevent other people from forging like that to open text narration, along with the progress of science and technology, these technological means all can be cheap imitated, the background data base only had described in prior art 3 that can not copy, but back-end data is also dangerous, the database of enterprise is easy to suffer assault, and need communication security guarantee, still undesirable.Thus, the anti-fake material of prior art and counterfeit protection measures all have potential safety hazard more or less, need constantly to weed out the old and bring forth the new, constantly progress.
Summary of the invention
The object of the invention is to overcome above-mentioned the deficiencies in the prior art part and a kind of anti-fake material with multiple anti-fake function is provided.
The present invention also aims to overcome above-mentioned the deficiencies in the prior art part and a kind of not easily imitated anti-fake material is provided.
The present invention also aims to overcome above-mentioned the deficiencies in the prior art part and provide a kind of and there is multiple anti-fake function and the preparation method of not easily imitated anti-fake material.
Object of the present invention can be achieved through the following technical solutions:
A kind of anti-fake material, it is characterized in that: this anti-fake material has double-decker, top layer is functional layer, and bottom is substrate layer; Described functional layer is formed by more than two kinds Ultraluminescence block combiner, and described substrate layer is monocrystalline silicon.
Described anti-fake material, is characterized in that: described Ultraluminescence module, refers in this false proof material of unit, the summation of each submodule be made up of same Ultraluminescence, discrete distribution between each submodule; Described Ultraluminescence module can be a figure or character, also can be one group and form a block graphics or character string by most submodules.
Described anti-fake material, is characterized in that: described more than two kinds Ultraluminescence modules, according to the shape of the submodule quantity of often kind of Ultraluminescence module, each submodule, the distributing position of each submodule, forms the first anti-counterfeiting information of this false proof material.
Described anti-fake material, is characterized in that: described more than two kinds Ultraluminescence modules, and often kind of Ultraluminescence module, under Ultraviolet radiation state, presents different colors; Under Ultraviolet radiation state, present different color combination according to often kind of Ultraluminescence module, form the second anti-counterfeiting information of this anti-fake material.
Described anti-fake material, is characterized in that: described Ultraluminescence module, is the structure in the uniform curing light binding of ultraviolet fluorescence powder.Described ultraviolet fluorescence powder is coordinated with trace active agent by metal (zinc, cadmium) sulfide or rare earth oxide, forms through calcining.
Described anti-fake material, is characterized in that: described monocrystalline silicon is water white.
Described anti-fake material, is characterized in that: described functional layer thickness is between 2 to 10 microns, and described substrate layer thickness is between 1 to 2 micron.
Object of the present invention can be achieved through the following technical solutions:
A preparation method for anti-fake material, is characterized in that, comprises the following steps:
S110, provides substrate of glass;
S120, on the glass substrate face plating adhesion layer;
S130, plates sacrifice layer on adhesion layer;
S140, plates substrate layer on sacrifice layer;
S150, at substrate layer coated thereon first time ultraviolet fluorescence powder and the mixture of light binding;
S160, provides ultraviolet light source, provides first time to flood template, mixture coating exposure S150 step be coated with;
S170, provides developer solution, development;
S180, provides pure water, cleaning;
S190, at the mixture of substrate layer coated thereon the N time ultraviolet fluorescence powder and light binding, the thickness of coating layer is consistent with the coating layer of S150 step;
S200, provides and floods template the N time, mixture coating exposure prepared by S190 step;
S210, development;
S220, cleaning;
S230, has judged whether all Ultraluminescence module installation, if not, N is set as that N adds 1, turns S190 step;
S240, provides plasma etching to equip, etching substrate layer;
S250, provides sacrificial layer etching liquid, etching sacrificial layer;
S260, provides cleaning and filtering to equip and pure water, cleaning, filters;
Wherein, S140 step, described substrate layer is monocrystalline silicon, and described plating refers to Vacuum Deposition; S170 step, described development, with developer solution cured portion mixture coating; S180 step, cleaning, washes S170 development step uncured portion mixture coating with pure water; S190 step and S200 step, S230 step, described N, initial value is 2.
The preparation method of described a kind of anti-fake material, is characterized in that: S120 step, and described adhesion layer is Cr, and also can be Ni or stainless steel, described plating refers to Vacuum Deposition; S130 step, described sacrifice layer is Al, and also can be Cu, described plating refers to Vacuum Deposition.
The preparation method of described a kind of anti-fake material, is characterized in that: described S150 and S190 step, the light binding mentioned, and is the light binding of single ultraviolet spectrogram solidification.
The preparation method of described a kind of anti-fake material, is characterized in that: described S150 step, also comprises providing being coated with equipment step, with being coated with method coating.
The preparation method of described a kind of anti-fake material, it is characterized in that: described light binding can select positive light binding and negative light binding one wherein, the cured portion mixture coating that described S170 step is mentioned refers to, exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.
The preparation method of described a kind of anti-fake material, it is characterized in that: described light binding can select positive light binding and negative light binding one wherein, the development that described S210 step is mentioned, refer to cured portion mixture coating, i.e. exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.
The preparation method of described a kind of anti-fake material, it is characterized in that: described S110 provides substrate of glass, also comprise and sheet glass be cut into square or rectangle, and chamfering, polishing, cleaning, drying steps, for the thickness of substrate of glass between 0.3 to 0.5 millimeter.
A preparation method for anti-fake material, is characterized in that: provide developer solution described in described S170 step, and developer solution is that tetramethyl adds water; Described S210 step development, developer solution is also that tetramethyl adds water.
The preparation method of described a kind of anti-fake material, is characterized in that: described S240 step etching substrate layer, institute is gases used is CF6, can certainly increase assist gas.
The preparation method of described a kind of anti-fake material, is characterized in that: described S250 step, provides sacrificial layer etching liquid, and the sacrifice layer plated for S130 step is Al, provides etching solution to be one in hydrochloric acid, NaOH; The sacrifice layer plated for S130 step is Cu, provides etching solution to be hydrogen peroxide.
The preparation method of described a kind of anti-fake material, is characterized in that: described S160 step and S200 step, and institute mentions and floods template, according to the selection of positive light binding or negative light binding, determines to select the moon to flood template and sun floods template.
Anti-fake material involved in the present invention has double-decker, and top layer is functional layer, and bottom is substrate layer; Described functional layer is formed by more than two kinds Ultraluminescence block combiner, and described substrate layer is monocrystalline silicon; Utilize the basic anti-counterfeiting information of the morphosis of Ultraluminescence block combiner, different Ultraluminescence module is utilized to show different colours under ultraviolet light source shines, form the second anti-counterfeiting information, counterfeit cost is high, does not obtain original words of flooding template and cannot copy at all.
The preparation method of a kind of anti-fake material involved in the present invention, adhesion layer is plated by substrate of glass, plating sacrifice layer, plating substrate layer, the mixture of coating first time ultraviolet fluorescence powder and light binding, ultraviolet light source floods template by first time, by the exposure of the mixture coating of coating, development, cleaning, at the mixture of substrate layer coated thereon the N time ultraviolet fluorescence powder and light binding, template is flooded by the N time, the mixture coating exposure that this is coated with, development, cleaning, complete all Ultraluminescence module installation, by plasma etching equipment etching substrate layer, by sacrificial layer etching liquid etching sacrificial layer, cleaning, filter, whole technological process is all linked with one another, it is a Unified Global, N+1 kind ultraviolet fluorescence powder uses which kind of ultraviolet fluorescence powder concrete to be difficult to inverse detection, N+1 floods template and also from product, accurately cannot copy number, especially original N+1 is not had to flood template data, even if inventor oneself also cannot crack others and implement concrete technical scheme of the present invention, safety coefficient is high.
Accompanying drawing explanation
Fig. 1 is the layer structure schematic diagram of first embodiment of the invention.
Fig. 2 is the front schematic view of first embodiment of the invention.
Fig. 3 is the contrast scheme schematic diagram of first embodiment of the invention.
Fig. 4 is the schematic diagram of second embodiment of the invention S110 to S140 step.
Fig. 5 is the schematic diagram of second embodiment of the invention S150 to S180 step.
Fig. 6 is the 1st circulation schematic diagram of second embodiment of the invention S190 to S220 step.
Fig. 7 is the 2nd circulation schematic diagram of second embodiment of the invention S190 to S220 step.
Fig. 8 is the schematic diagram of second embodiment of the invention S240 step.
Fig. 9 is the schematic diagram of second embodiment of the invention S250 step.
Figure 10 is the flow chart of second embodiment of the invention.
Detailed description of the invention
Below in conjunction with accompanying drawing, the invention will be further described.
With reference to figure 1, Fig. 2, first embodiment of the invention is a kind of anti-fake material 100, and this anti-fake material 100 has double-decker, and top layer is functional layer, and bottom is substrate layer 101; Described functional layer is combined by three kinds of Ultraluminescence modules 102,103,104, and described substrate layer 101 is monocrystalline silicon.In order to clear expression, Fig. 2 compares Fig. 1 and reduces one times, special explanation.Described three kinds of Ultraluminescence modules 102, 103, 104, in the present embodiment, described three kinds of Ultraluminescence modules 102, 103, 104, it is all a figure, 102 is crescent, 103 is spindles, 104 is annulars, should be appreciated that, each Ultraluminescence module, it is all the summation of each submodule be made up of same Ultraluminescence, one group be can be and a block graphics or character string formed by most submodules, with reference to figure 3, give the scheme being different from the present embodiment, the program is by two kinds of Ultraluminescence modules 801, 802 compositions, Ultraluminescence module 801 is made up of the submodule of four discrete distributions, the i.e. enclosure portion on character " R " top, the enclosure portion on character " e " top, character " d " lower closed portion, also has character string " Red " part around, Ultraluminescence module 802 also has three submodules i.e. " R " " e " " d ", form a character string " Red ".Return the present embodiment, described three kinds of Ultraluminescence modules 102,103,104, according to submodule quantity (certain the present embodiment is often planted Ultraluminescence module and only had a submodule), the shape of each submodule, the distributing position of each submodule of often kind of Ultraluminescence module, form the first anti-counterfeiting information of this false proof material; Described three kinds of Ultraluminescence modules 102,103,104, often kind of Ultraluminescence module 102 or 103 or 104, under Ultraviolet radiation state, presents different colors; Under Ultraviolet radiation state, present different color combination according to often kind of Ultraluminescence module, form the second anti-counterfeiting information of this anti-fake material.Described Ultraluminescence, is that rare earth metal is entered redox process, forms stable oxide.Described Ultraluminescence module 102,103,104 is mixtures that ultraviolet fluorescence powder forms with the light binding had cured.Described monocrystalline silicon is transparent.Described functional layer thickness is 6 microns, described substrate layer be 1 micron; Should be appreciated that described functional layer is between 2 to 10 microns, described substrate layer thickness is between 1 to 2 micron; Also the present embodiment can be implemented.
With reference to figure 4 to Figure 10, second embodiment of the invention is a kind of preparation method of anti-fake material, i.e. the preparation method of first embodiment of the invention, comprises the following steps: S110, provides substrate of glass; S120, on the glass substrate face plating adhesion layer; S130, plates sacrifice layer on adhesion layer; S140, plates substrate layer on sacrifice layer; S150, at substrate layer coated thereon first time ultraviolet fluorescence powder and the mixture of light binding; S160, provides ultraviolet light source, provides first time to flood template, mixture coating exposure S150 step be coated with; S170, provides developer solution, development; S180, provides pure water, cleaning; S190, at the mixture of substrate layer coated thereon the N time ultraviolet fluorescence powder and light binding, the thickness of coating layer is consistent with the coating layer of S150 step; S200, provides and floods template the N time, mixture coating exposure prepared by S190 step; S210, development; S220, cleaning; S230, has judged whether all Ultraluminescence module installation, if not, N is set as that N adds 1, turns S190 step, and certainly, the present embodiment amounts to and arranges 3 Ultraluminescence modules, as long as complete just can the exiting to 3 of N performs S240 step; S240, provides plasma etching to equip, etching substrate layer; S250, provides sacrificial layer etching liquid, etching sacrificial layer; S260, provides cleaning and filtering to equip and pure water, cleaning, filters.
In the second embodiment, S120 step, described adhesion layer is Cr, and described plating refers to Vacuum Deposition; S130 step, described sacrifice layer is Al, and described plating refers to Vacuum Deposition; S140 step, described substrate layer is monocrystalline silicon, and described plating refers to Vacuum Deposition; S170 step, described development, with developer solution cured portion mixture coating; S180 step, cleaning, washes S170 development step uncured portion mixture coating with pure water; S190 step and S200 step, S230 step, described N, initial value is 2.
In the second embodiment, described S150 and S190 step, the light binding mentioned is the light binding of single ultraviolet spectrogram solidification.
In the second embodiment, described S150 step, also comprises providing and is coated with equipment step, with being coated with method coating.Described light binding can select positive light binding and negative light binding one wherein, the cured portion mixture coating that described S170 step is mentioned refers to, exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.Described light binding can select positive light binding and negative light binding one wherein, the development that described S210 step is mentioned, refer to cured portion mixture coating, i.e. exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.
Described S110 provides substrate of glass, also comprise and sheet glass be cut into square or rectangle, and chamfering, polishing, cleaning, drying steps, the thickness for substrate of glass is 0.35, be appreciated that the thickness of substrate of glass can both implement the present embodiment between 0.3 to 0.5 millimeter.
There is provided developer solution described in described S170 step, developer solution is that tetramethyl adds water; Described S240 step etching substrate layer, gases used is CF6, can certainly increase assist gas.
Described S250 step, provides sacrificial layer etching liquid, and the sacrifice layer plated for S130 step is Al, provides etching solution to be hydrochloric acid, is to be understood that making etching solution with NaOH also can realize; The sacrifice layer plated for S130 step is Cu, provides etching solution to be hydrogen peroxide.
Described S150, S160 step and S190, S200 step, the present embodiment selects the most frequently used positive light binding, sun is selected to flood template, it is exactly the pattern shading needed that described sun floods template, unwanted partial light permeability, described positive optical cement is exactly after development and cleaning, the partial removal of irradiation, and the part of irradiation does not stay; During concrete selection, according to the selection of positive light binding or negative light binding, determine to select sun to flood template and the moon floods template.
With reference to figure 4, be the schematic diagram of second embodiment of the invention S110 to S140 step, provide in substrate of glass 211, first plate adhesion layer 212, namely plate Cr, plating sacrifice layer 213, namely plates Al further, plate substrate layer 214 again, namely plate Si, prepared half becomes this product 210 for S150 step.
With reference to figure 5, it is the schematic diagram of second embodiment of the invention S150 to S180 step, the mixture 301 of first time Ultraluminescence and light binding is coated with at the substrate layer 214 of semi-finished product 210, employing is coated with method, and THICKNESS CONTROL is at 6 microns, and what is called is coated with method, exactly the mixture of first time Ultraluminescence and light binding is dropped in the centre of semi-finished product 210, utilization is coated with equipment High Rotation Speed semi-finished product 210, and mixture is paved, and rotating speed can control the thickness of coating; Being coated with equipment can outsourcing, also can make by oneself with rotation motor, arrange a carrying jig platform, by semi-finished product 210 clamping on platform, plateau levels is arranged, and arranges corresponding bearing to make platform stable, utilize rotation motor band moving platform to rotate, rotation motor can select governor motor; Ultraviolet light source 999 is provided, first time is provided to flood template 302, the mixture coating 301 that S150 step is coated with is exposed, by development, cleaning, semi-finished product 210 stay Ultraluminescence module 102, Ultraluminescence module 102 adds that semi-finished product 210 form the second semi-finished product 310, second semi-finished product 310 for S190 step.
With reference to figure 6, the 1st circulation schematic diagram of second embodiment of the invention S190 to S220 step, the mixture 401 of second time Ultraluminescence and light binding is coated with at the substrate layer 214 of the second semi-finished product 310, employing is coated with method, THICKNESS CONTROL is at 6 microns, ultraviolet light source 999 is provided, second time is provided to flood template 402, the mixture coating 401 that S190 step is coated with is exposed, by development, cleaning, second semi-finished product 310 leave Ultraluminescence module 103, Ultraluminescence module 103 adds that the second semi-finished product 310 form the 3rd semi-finished product 410, 3rd semi-finished product 410 recycle for the 2nd time for S190 to S220 step.
With reference to figure 7, the 2nd circulation schematic diagram of second embodiment of the invention S190 to S220 step, the mixture 501 of third time Ultraluminescence and light binding is coated with at the substrate layer 214 of the 3rd semi-finished product 410, employing is coated with method, THICKNESS CONTROL is at 6 microns, ultraviolet light source 999 is provided, third time is provided to flood template 502, the mixture coating 501 that S190 step is coated with is exposed, by development, cleaning, 3rd semi-finished product 410 leave Ultraluminescence module 104, Ultraluminescence module 104 adds that the 3rd semi-finished product 410 form the 4th semi-finished product 510, 4th semi-finished product 510 are for S240 step.
With reference to figure 8, it is the schematic diagram of second embodiment of the invention S240 step, plasma etching is provided to equip, etching substrate layer 214,4th semi-finished product 510 are placed in plasma etching equipment, the exposure part substrate layer 214 by CF6 gas the 4th semi-finished product 510 not being covered Ultraluminescence module 102,103,104 is etched away, and leaves substrate layer 101 and connects Ultraluminescence module 102,103,104 and sacrifice layer 213.
With reference to figure 8, it is the schematic diagram of second embodiment of the invention S250 step, S240 step finished product is placed in hydrochloric acid solution, etch sacrificial layer, make material described in first embodiment of the invention, separate from substrate of glass, should be appreciated that making etching solution with NaOH also can realize the present embodiment.
With reference to Figure 10, being the flow chart of second embodiment of the invention, in order to have more versatility, providing the generalized flowsheet of more than two kinds Ultraluminescence modules, second embodiment of the invention is three kinds of Ultraluminescence modules, so S190 to S220 step cycle 2 times.
Claims (14)
1. an anti-fake material, is characterized in that: this anti-fake material has double-decker, and top layer is functional layer, and bottom is substrate layer; Described functional layer is formed by more than two kinds Ultraluminescence model calling, and described substrate layer is monocrystalline silicon.
2. anti-fake material according to claim 1, it is characterized in that: described Ultraluminescence module, refer in this false proof material of unit, the summation be made up of each submodule of Ultraluminescence, discrete distribution between each submodule, described Ultraluminescence module can be a figure or character, also can be one group and form a block graphics or character string by most submodules.
3. anti-fake material according to claim 2, it is characterized in that: described more than two kinds Ultraluminescence modules, according to the shape of the submodule quantity of often kind of Ultraluminescence module, each submodule, the distributing position of each submodule, form the first anti-counterfeiting information of this false proof material.
4. anti-fake material according to claim 3, is characterized in that: described more than two kinds Ultraluminescence modules, and often kind of Ultraluminescence module, under Ultraviolet radiation state, presents different colors; Under Ultraviolet radiation state, present different color combination according to often kind of Ultraluminescence module, form the second anti-counterfeiting information of this anti-fake material.
5. anti-fake material according to claim 1, is characterized in that: described Ultraluminescence module, is the structure in the uniform curing light binding of ultraviolet fluorescence powder.
6. anti-fake material according to claim 1, is characterized in that: described monocrystalline silicon is water white.
7. anti-fake material according to claim 1, is characterized in that: described functional layer thickness is between 2 to 10 microns, and described substrate layer thickness is between 1 to 2 micron.
8. a preparation method for anti-fake material, is characterized in that, comprises the following steps:
S110, provides substrate of glass;
S120, on the glass substrate face plating adhesion layer;
S130, plates sacrifice layer on adhesion layer;
S140, plates substrate layer on sacrifice layer;
S150, at substrate layer coated thereon first time ultraviolet fluorescence powder and the mixture of light binding;
S160, provides ultraviolet light source, provides first time to flood template, mixture coating exposure S150 step be coated with;
S170, provides developer solution, development;
S180, provides pure water, cleaning;
S190, at the mixture of substrate layer coated thereon the N time ultraviolet fluorescence powder and light binding, the thickness of coating layer is consistent with the coating layer of S150 step;
S200, provides and floods template the N time, mixture coating exposure prepared by S190 step;
S210, development;
S220, cleaning;
S230, has judged whether all Ultraluminescence module installation, if not, N is set as that N adds 1, turns S190 step;
S240, provides plasma etching to equip, etching substrate layer;
S250, provides sacrificial layer etching liquid, etching sacrificial layer;
S260, provides cleaning and filtering to equip and pure water, cleaning, filters;
Wherein, S170 step, described development, with developer solution cured portion mixture coating; S180 step, cleaning, washes S170 development step uncured portion mixture coating with pure water purification; S190 step and S200 step, S230 step, described N, initial value is 2.
9. the preparation method of a kind of anti-fake material according to claim 8, is characterized in that: described S150 step, also comprises providing being coated with equipment step, with being coated with method coating.
10. the preparation method of a kind of anti-fake material according to claim 8, it is characterized in that: described light binding can select positive light binding and negative light binding one wherein, the cured portion mixture coating that described S170 step is mentioned refers to, exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.
The preparation method of 11. a kind of anti-fake materials according to claim 8, it is characterized in that: described light binding can select positive light binding and negative light binding one wherein, the development that described S210 step is mentioned, refer to cured portion mixture coating, i.e. exposure or unexposed part mixes coating, particularly, the part mixes coating exposed for positive light binding is not solidified, unexposed part mixes curing of coatings; Accordingly, for the part mixes curing of coatings that negative light binding exposes, unexposed part mixes coating is not solidified.
The preparation method of 12. a kind of anti-fake materials according to claim 8, it is characterized in that: described S110 provides substrate of glass, also comprise and sheet glass be cut into square or rectangle, and chamfering, polishing, cleaning, drying steps, for the thickness of substrate of glass between 0.3 to 0.5 millimeter.
The preparation method of 13. a kind of anti-fake materials according to claim 8, it is characterized in that: provide developer solution described in described S170 step, developer solution is that tetramethyl adds water; Described S210 step development, developer solution is also that tetramethyl adds water.
The preparation method of 14. a kind of anti-fake materials according to claim 8, is characterized in that: described S240 step etching substrate layer, gases used is CF6.
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Cited By (6)
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| CN106183529A (en) * | 2016-07-20 | 2016-12-07 | 翟兴 | A kind of anti-fake material and preparation method thereof |
| CN106218264A (en) * | 2016-07-20 | 2016-12-14 | 翟兴 | A kind of anti-fake material and preparation method thereof |
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