CN205115291U - But golden two silver -colored LOW -E glass of high wearing feature of tempering - Google Patents

But golden two silver -colored LOW -E glass of high wearing feature of tempering Download PDF

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Publication number
CN205115291U
CN205115291U CN201520838986.XU CN201520838986U CN205115291U CN 205115291 U CN205115291 U CN 205115291U CN 201520838986 U CN201520838986 U CN 201520838986U CN 205115291 U CN205115291 U CN 205115291U
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layer
tempering
glass
golden
silver
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CN201520838986.XU
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Inventor
林改
魏佳坤
王宏志
张青红
何波
侯成义
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JIEYANG HONGGUANG COATED GLASS CO Ltd
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JIEYANG HONGGUANG COATED GLASS CO Ltd
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Abstract

The utility model discloses a but golden two silver -colored LOW -E glass of high wearing feature of tempering, including glass substrate, its characterized in that: compoundly in proper order adjacently outside to there are 15 retes by interior on glass substrate's composite surface, wherein first rete promptly inlayer be the si3N4 layer, the second floor is the SSTZrOX layer, the third layer is the AZO layer, the fourth layer is the si layer, the 5th layer is the AZO layer, the 6th layer is the cu layer, the 7th layer is the crNxOy layer, the 8th layer is the snO2 layer, the 9th layer is the AZO layer, the tenth layer is the si layer, the tenth one deck is the AZO layer, the 12 layer is the ag layer, the tenth three -layer is the crNxOy layer, the tenth four layers is the si3N4 layer, the outmost C layer that is, the utility model discloses the purpose is overcome prior art not enough, but provides a tempering, the high wearing feature, and the lovely luster, the radiant ratio is low, and energy -conserving effect is showing to the high temperature more than 800 DEG C can be born, thereby but golden two silver -colored LOW -E glass tempering is realized.

Description

A kind of can the golden two silver-colored LOW-E glass of high-wearing feature of tempering
[technical field]
The utility model relate to a kind of can the golden two silver-colored LOW-E glass of high-wearing feature of tempering.
[background technology]
Coated glass has the double effects of energy-saving and emission-reduction and decorative curtain wall.And aurene is as a unconventional kind of coated glass, be loved by the people.Along with energy-saving index requires more and more higher, all cannot meet customer need at the two silver-colored LOW-E glass of the existing gold in a lot of city, add aurene product deeply to dote on by the heat of people, the market requirement getting final product the golden two silver-colored LOW-E glass of high-wearing feature of tempering is doted on greatly, but due to the material behavior of golden LOW-E glass own, cannot carry out tempering, do not occur can the golden two silver-colored LOW-E glass of high-wearing feature of tempering all the time.
[utility model content]
The utility model object overcomes the deficiencies in the prior art, provides one can tempering, high-wearing feature, and bright in colour, radiant ratio is low, and energy-saving effect is remarkable, and can bear the high temperature of more than 800 DEG C, thus realize golden pair silver-colored LOW-E glass can tempering.
The utility model is achieved through the following technical solutions:
Can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, include glass substrate 30, it is characterized in that: be adjacent to successively from inside to outside be compounded with 15 retes on the composite surface of glass substrate, wherein the first rete and innermost layer are Si 3n 4layer 1, the second layer is SSTZrO xlayer 2, third layer is the 3, four layer, AZO layer is Si layer 4, and layer 5 is AZO layer 5, and layer 6 is Cu layer 6, and layer 7 is CrN xo ythe 7, eight layer, layer is SnO 2the 8, nine layer, layer be the 9, ten layer, AZO layer is Si layer 10, the eleventh floor be AZO layer 11, the Floor 12 be the 12, the 13 layer, Ag layer is CrN xo ythe 13, the 14 layer, layer is Si 3n 4layer 14, outermost layer is C layer 15.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described first rete Si 3n 4the thickness of layer 1 is 20nm, the 14 layer of Si 3n 4the thickness of layer 14 is 50nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described second layer SSTZrO xthe thickness of layer 2 is 30 ~ 40nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described third layer AZO layer 3 is 10 ~ 15nm, the thickness of layer 5 AZO layer 5 is 10 ~ 20nm, and the thickness of the 9th layer of AZO layer 9 is the thickness of 10nm, eleventh floor AZO layer 11 is 10 ~ 20nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described 4th layer of Si layer 4 is 3 ~ 5nm, the thickness of the tenth layer of Si layer 10 is 5 ~ 8nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described layer 6 Cu layer 6 is 10 ~ 15nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described layer 7 CrN xo ylayer 7 and the 13 layers of CrN xo ythe thickness of layer 13 is 3nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described 8th layer of SnO 2the thickness of layer 8 is 60nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described Floor 12 Ag layer 12 is 10 ~ 15nm.
As above can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described outermost layer C layer 15 is 95 ~ 105nm, preferred 100nm.
Compared with prior art, the utility model has the following advantages:
1, the two silver-colored LOW-E glass of the gold of the utility model special film system, adopts new membrane system structure, improves film hardness and compactness.
2, bright in colour, and transmittance is high, reaches more than 70%.
3, the utility model adopts outermost layer C layer as transfer protective layer, prevents from being scratched in transhipment, thus realizes processing in strange land.
[accompanying drawing explanation]
Fig. 1 is the utility model structural representation.
[embodiment]
Can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, include glass substrate 30, the composite surface of glass substrate is adjacent to from inside to outside be successively compounded with 15 retes, wherein the first rete and innermost layer are Si 3n 4layer 1, the second layer is SSTZrO xlayer 2, third layer is the 3, four layer, AZO layer is Si layer 4, and layer 5 is AZO layer 5, and layer 6 is Cu layer 6, and layer 7 is CrN xo ythe 7, eight layer, layer is SnO 2the 8, nine layer, layer be the 9, ten layer, AZO layer is Si layer 10, the eleventh floor be AZO layer 11, the Floor 12 be the 12, the 13 layer, Ag layer is CrN xo ythe 13, the 14 layer, layer is Si 3n 4layer 14, outermost layer is C layer 15.
Described first rete is Si 3n 4layer 1, i.e. silicon nitride layer; Si 3n 4it is a kind of adamantine material, improve physicals and the antioxidant property of rete, it ensure whole coating and there is good mechanical endurance, reactant gases sputtering semiconductor material Si:Al=92:8 is made with interchange intermediate frequency power supply, nitrogen, density 96%, improves physicals and the antioxidant property of rete.Si 3n 4the thickness of layer is 20nm.1m＝10 9nm。
Described second layer SSTZrO xnamely layer mixes zirconium oxidation stainless steel layer, by mixing zirconium in stainless steel, improving the specific refractory power of rete, reach about 2.0 when reactive sputtering, thus promote the transmitance of compound film system.Make adjustments golden color layers, more yellow gold effect can be obtained.SSTZrO xthe thickness of layer 2 is 30 ~ 40nm, preferred 35nm.
Described third layer AZO layer 3, i.e. the zinc oxide film of aluminium doping, levelling blanket, level and smooth Si layer, for Si, Cu layer makes place mat, reduces radiant ratio.The thickness of AZO layer is 10 ~ 15nm.Preferred 12nm.
Described 4th layer of Si layer 4, i.e. silicon layer, be functional layer, be used as golden providing layer.The thickness of Si layer is 3 ~ 5nm, preferred 4nm.
Described layer 5 AZO layer 5, i.e. the zinc oxide film of aluminium doping, levelling blanket, owing to becoming tufted structure after Si sputtering, by with the level and smooth Si layer of AZO layer, for lower floor plating Cu plays bottoming effect, for Cu layer makes place mat, reduces radiant ratio.The thickness of AZO layer is 10 ~ 20nm.Preferred 15nm.
Described layer 6 Cu layer 6, i.e. metal copper layer, is functional layer, reduces costs, bright in colour.The thickness of Cu layer is 10 ~ 15nm, preferred 12nm.
Described layer 7 CrN xo ylayer 7, i.e. nitrogen chromium oxide layer, improves rete wear resistance, carrying can tempering, high temperature oxidation resistance when improving tempering.CrN xo ythe thickness of layer 7 is 3nm.
Described 8th layer of SnO 2layer 8, i.e. zinc oxide film is middle dielectric layer, protective layer.SnO 2the thickness of layer 8 is 60nm.
Described 9th layer is AZO layer 9, i.e. the zinc oxide film of aluminium doping, levelling blanket, and level and smooth Si layer, for Si, Ag layer makes place mat, reduces radiant ratio.The thickness of AZO layer 9 is 10nm.
Described ten layer is Si layer 10, i.e. silicon layer, is functional layer, is used as golden providing layer.The thickness of Si layer 10 is 5 ~ 8nm, preferred 7nm.
Described eleventh floor is AZO layer 11, i.e. the zinc oxide film of aluminium doping, levelling blanket, owing to becoming tufted structure after Si sputtering, by with the level and smooth Si layer of AZO layer, for lower floor plating Ag plays bottoming effect, for Ag layer makes place mat, reduces radiant ratio.The thickness of AZO layer 11 is 10 ~ 20nm, preferred 15nm.
Described Floor 12 is Ag layer 12, i.e. metallic silver layer, and be functional layer, metallic silver layer provides lower radiant ratio, plays environmental protection and energy saving.
Described 13 layer is CrN xo ylayer 13, i.e. nitrogen chromium oxide layer, improves rete wear resistance, carrying can tempering, high temperature oxidation resistance when improving tempering.CrN xo ythe thickness of layer 13 is 3nm.
Described 14 rete is Si 3n 4layer 14, i.e. silicon nitride layer; Si 3n 4be a kind of adamantine material, improve physicals and the antioxidant property of rete, it ensure whole coating and there is good mechanical endurance, be arranged on time outer second barrier as the whole rete of protection.Make reactant gases sputtering semiconductor material Si:Al=92:8 with interchange intermediate frequency power supply, nitrogen, density 96%, improves physicals and the antioxidant property of rete.Si 3n 4the thickness of layer is 50nm.
Described outermost layer C layer 15, i.e. graphite linings; Top layer medium layer; C a kind ofly has high thermal resistance, heat-shock resistance and have the material of oilness; being used as can protective layer in the transport process of the golden two silver-colored LOW-E glass of tempering, prevents from being scratched in transport process, is arranged on the first barrier of outermost layer as the whole rete of protection.This layer can burn volatilization in toughening process, does not contribute color and the performance of rete.The thickness of C layer is 95 ~ 105nm, preferred 100nm.
Low-E glass is also called low radiation coated glass.
Described in preparation can the method for the golden two silver-colored LOW-E glass of high-wearing feature of tempering, comprise the steps:
(1) magnetron sputtering Si 3n 4layer, make reactant gases sputtering sial target with interchange intermediate frequency power supply, nitrogen, sial mass percent 92:8, argon nitrogen is than being 400SCCM ~ 420SCCM:450SCCM ~ 500SCCM, and in this step, argon nitrogen is than the quality determining film forming.Magnetron sputtering Si 3n 4layer, makes reactant gases sputtering semiconductor material weight ratio Si:Al=92:8 with interchange intermediate frequency power supply, nitrogen; That obtain is Si herein 3n 4, and metal A l is for increasing the conductivity of starting material in magnetron sputtering process, metal A l does not participate in reaction, and due to the conductivity extreme difference of non-metal semiconductive Si, mixing increase conductivity if do not adopted metal A l cannot carry out magnetron sputtering Si smoothly 3n 4layer;
(2) magnetron sputtering SSTZrO xlayer, make with interchange intermediate frequency power supply, oxygen the stainless steel target Fe:Zr=80:20 that zirconium is mixed in reactant gases sputtering, argon oxygen is than being 400SCCM ~ 420SCCM:450SCCM ~ 500SCCM, and in this step, argon oxygen is than the quality determining film forming;
(3) magnetron sputtering oxygen AZO layer, sputters ceramic Zn target with midfrequent AC power supply, i.e. AZO target, with argon gas as sputter gas, mixes a small amount of oxygen, and argon oxygen ratio is: 400SCCM ~ 420SCCM:20 ~ 40SCCM, for Si, Cu layer makes place mat;
(4) magnetron sputtering Si layer, AC power sputters, with Ar gas as sputter gas, gas flow 500 ~ 550SCCM;
(5) magnetron sputtering AZO layer, sputters ceramic ZnAZO target with midfrequent AC power supply, with argon gas as sputter gas, mixes a small amount of oxygen, and argon oxygen ratio is 400SCCM ~ 420SCCM:20 ~ 40SCCM, for Cu layer makes place mat;
(6) magnetron sputtering C u layer, direct supply sputters, with argon gas as process gas, body flow 500 ~ 550SCCM;
(7) magnetron sputtering C rNxOy layer, with direct supply sputtering, does reactant gases with nitrogen, oozes a small amount of oxygen;
(8) magnetron sputtering SnO 2layer, makes reactant gases sputtering for Sn target with interchange intermediate frequency power supply, oxygen, and argon oxygen is than being 400SCCM ~ 420SCCM:450SCCM ~ 500SCCM, and in this step, argon oxygen is than the quality determining film forming;
(9) magnetron sputtering AZO layer, sputters ceramic Zn with midfrequent AC power supply, i.e. AZO target, with argon gas as sputter gas, mixes a small amount of oxygen, and argon oxygen ratio is 400SCCM ~ 420SCCM:20 ~ 40SCCM, for Si, Ag layer makes place mat;
(10) magnetron sputtering Si layer, AC power sputters, with Ar gas as sputter gas, gas flow 500 ~ 550SCCM;
(11) magnetron sputtering AZO layer, sputters ceramic Zn with midfrequent AC power supply, i.e. AZO target, with argon gas as sputter gas, mixes a small amount of oxygen, and argon oxygen ratio is 400SCCM ~ 420SCCM:20 ~ 40SCCM, for Ag layer makes place mat;
(12) magnetron sputtering Ag layer, direct supply sputters, gas flow 500 ~ 550SCCM;
(13) magnetron sputtering C rN xo ylayer, with direct supply sputtering, does reactant gases with nitrogen, oozes a small amount of oxygen;
(14) magnetron sputtering Si 3n 4layer, make reactant gases sputtering sial target with interchange intermediate frequency power supply, nitrogen, sial mass percent 92:8, argon nitrogen is than being 400SCCM ~ 420SCCM:450SCCM ~ 500SCCM, and in this step, argon nitrogen is than the quality determining film forming.Magnetron sputtering Si 3n 4layer, makes reactant gases sputtering semiconductor material weight ratio Si:Al=92:8 with interchange intermediate frequency power supply, nitrogen; That obtain is Si herein 3n 4, and metal A l is for increasing the conductivity of starting material in magnetron sputtering process, metal A l does not participate in reaction, and due to the conductivity extreme difference of non-metal semiconductive Si, mixing increase conductivity if do not adopted metal A l cannot carry out magnetron sputtering Si smoothly 3n 4layer;
(15) magnetron sputtering C layer, with direct supply, argon gas mixes aluminium graphite target as reactant gases sputtering, and aluminium graphite quality per-cent 95:5, does reactant gases with nitrogen, ooze a small amount of oxygen.

Claims (10)

1. can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, include glass substrate (30), it is characterized in that: be adjacent to successively from inside to outside be compounded with 15 retes on the composite surface of glass substrate, wherein the first rete and innermost layer are Si 3n 4layer (1), the second layer is SSTZrO xlayer (2), third layer is AZO layer (3), and the 4th layer is Si layer (4), and layer 5 is AZO layer (5), and layer 6 is Cu layer (6), and layer 7 is CrN xo ylayer (7), the 8th layer is SnO 2layer (8), the 9th layer is AZO layer (9), and the tenth layer is Si layer (10), and eleventh floor is AZO layer (11), and Floor 12 is Ag layer (12), and the 13 layer is CrN xo ylayer (13), the 14 layer is Si 3n 4layer (14), outermost layer is C layer (15).
2. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described first rete Si 3n 4the thickness of layer (1) is 20nm, the 14 layer of Si 3n 4the thickness of layer (14) is 50nm.
3. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described second rete SSTZrO xthe thickness of layer (2) is 30 ~ 40nm.
4. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, the thickness that it is characterized in that described third layer AZO layer (3) is 10 ~ 15nm, thickness 10 ~ the 20nm of layer 5 AZO layer (5), the thickness of the 9th layer of AZO layer (9) is 10nm, and eleventh floor is the thickness of AZO (11) is 10 ~ 20nm.
5. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described 4th layer of Si layer (4) is 3 ~ 5nm, the tenth layer of Si layer (10) 5 ~ 8nm.
6. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described layer 6 Cu layer (6) is 10 ~ 15nm.
7. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described layer 7 CrN xo ylayer (7) and the 13 layer of CrN xo ythe thickness of layer (13) is 3nm.
8. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that described 8th layer of SnO 2the thickness of layer (8) is 60nm.
9. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described Floor 12 Ag layer (12) is 10 ~ 15nm.
10. according to claim 1 can the golden two silver-colored LOW-E glass of high-wearing feature of tempering, it is characterized in that the thickness of described outermost layer C layer (15) is 95 ~ 105nm.
CN201520838986.XU 2015-10-24 2015-10-24 But golden two silver -colored LOW -E glass of high wearing feature of tempering Expired - Fee Related CN205115291U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105271823A (en) * 2015-10-24 2016-01-27 揭阳市宏光镀膜玻璃有限公司 Temperable high-abrasion-resistance golden double-silver LOW-E glass and preparation method thereof
CN107471785A (en) * 2016-06-08 2017-12-15 四川南玻节能玻璃有限公司 A kind of double silver low radiation energy-saving glass of high-performance

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105271823A (en) * 2015-10-24 2016-01-27 揭阳市宏光镀膜玻璃有限公司 Temperable high-abrasion-resistance golden double-silver LOW-E glass and preparation method thereof
CN107471785A (en) * 2016-06-08 2017-12-15 四川南玻节能玻璃有限公司 A kind of double silver low radiation energy-saving glass of high-performance

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Granted publication date: 20160330

Termination date: 20201024