CN205077128U - Prevent formula of batching ITO film former of film forming heat injury - Google Patents
Prevent formula of batching ITO film former of film forming heat injury Download PDFInfo
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- CN205077128U CN205077128U CN201520826715.2U CN201520826715U CN205077128U CN 205077128 U CN205077128 U CN 205077128U CN 201520826715 U CN201520826715 U CN 201520826715U CN 205077128 U CN205077128 U CN 205077128U
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- deflector roll
- roller
- roll
- sputtering
- blowing
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Abstract
The utility model discloses a prevent formula of batching ITO film former of film forming heat injury includes seal chamber to and set up blowing roller, batch roller, sputter home roll, the target in seal chamber, blowing roller and batch roller are located the seal chamber both sides respectively, it is in the below between blowing roller and the batch roller to sputter the home roll. The utility model discloses through to sputtering the inside water circulating system that establishes of home roll, making sputter home roll and first receipts material deflector roll be connected with the ground wire on prior art's basis, at the other static -removing device that establishes of batch roller, increasing technique improvement such as tension pendulum roller and nip roll, reduce the emergence of phenomenons such as heat injury, deformation, electric shock human body effectively, the production process of messenger ITO film is safer, high -efficient, and its product is more pleasing to the eye, improves the quality product rate.
Description
Technical field
The utility model relates to a kind of coiling type ITO film deposition system, especially a kind of coiling type ITO film deposition system that can prevent film forming thermal damage.
Background technology
Because ito thin film has the good transparency and electroconductibility, also there is good etching simultaneously, thus applied to flat liquid crystal display (LCD) in a large number, electroluminance display (ELD), electroluminescent color displays (ECD) etc.Along with in recent years, greatly developing of domestic liquid-crystal display industry, while increasing, had had new requirement to the quality of product to the demand of ITO product.In existing ito thin film production technique, particularly when spatter film forming, under film substrate surface is exposed to the environment of high energy particle and plasma body, charged particle is incident, and a large amount of current flowings, causes the heat of heating effect of current very large.Film substrate is when by heat, and film substrate can produce the thermal damage phenomenons such as distortion and fold, and cause the yield rate of ito thin film unstable, its production rate is restricted, the not high bad phenomenon of aesthetics.
Utility model content
The utility model is for the disappearance of prior art existence, and its main purpose is to provide a kind of coiling type ITO film deposition system that can prevent film forming thermal damage.
For achieving the above object, the utility model adopts following technical scheme:
A kind of coiling type ITO film deposition system preventing film forming thermal damage, comprise enclosed housing, and the emptying roller, winding roller, sputtering home roll, the target that are arranged in enclosed housing, described emptying roller and winding roller lay respectively at both sides in enclosed housing, described sputtering home roll is in the below between emptying roller and winding roller, described sputtering home roll inside is hollow structure, and inside is provided with cooling system.
The further scheme of the utility model, described cooling system is water circulation system.
The further scheme of the utility model, described coiling type ITO film deposition system is also provided with Destaticizing device, and described Destaticizing device is in by winding roller, and the ito thin film on the charged particle directive winding roller of this Destaticizing device generation.
The further scheme of the utility model, described coiling type ITO film deposition system is also provided with blowing deflector roll and rewinding deflector roll, described blowing deflector roll comprises the first blowing deflector roll and the second blowing deflector roll, first blowing deflector roll is between emptying roller and sputtering home roll, and be positioned at the lower right of emptying roller, the second blowing deflector roll is below the first blowing deflector roll; Described rewinding deflector roll comprises the first rewinding deflector roll and the second rewinding deflector roll, and the second rewinding deflector roll is in winding roller lower left, and the first rewinding deflector roll is between the second rewinding deflector roll and sputtering home roll.
The further scheme of the utility model, described coiling type ITO film deposition system is also provided with tension force pendulum roller, nip rolls, and described tension force pendulum roller is in the lower left of the second blowing deflector roll, and described nip rolls is in the lower left of tension force pendulum roller.
The further scheme of the utility model, the base material on described emptying roller is in order outside the first blowing deflector roll and the second blowing deflector roll, and tension force is put inside roller, nip rolls, sputtering home roll, inside first rewinding deflector roll, the outer rear flank of the second rewinding deflector roll, to winding roller rolling.
The further scheme of the utility model, described sputtering home roll is connected with ground wire with the first rewinding deflector roll.
The further scheme of the utility model, described nip rolls is provided with symmetrical screw thread toward both sides from axis, and this nip rolls adds electrostatic liquid primarily of nitrile rubber and generates.
The further scheme of the utility model, described target includes the first target, the second target and the 3rd target, first target and the 3rd target are located on the enclosed housing wall of sputtering home roll the right and left respectively, and the second target is located on the enclosed housing wall below sputtering home roll.
The utility model compared with prior art, there is following progress: (1), sputtering home roll inside increase water circulation system, take away the portion temperature that base material produces in sputter procedure, reduce the probability of thermal damage or distortion generation, improve the quality of production of ito thin film; (2), sputtering home roll, the first rewinding deflector roll do grounding wire process, removes Partial charge, reduce the situation producing thermal damage and occur, improve the quality product rate of ito thin film product; (3), increase Destaticizing device, through except after electric step, effectively can reduce the electric charge of film formation surface, because electrostatic is to the corona line formed between rete after the electric shock of people and rolling after avoiding unpacking, make the production of ito thin film safer, improve the quality of products; (4), increase the conbined usage that tension force puts roller and nip rolls, base material is better contacted with sputtering home roll, reduces the generation of distortion, thus accelerate the film forming speed of ITO.
For more clearly setting forth constitutional features of the present utility model, technique means and the specific purposes reached thereof and function, below in conjunction with accompanying drawing and specific embodiment, the utility model is described in further detail:
Accompanying drawing explanation
Fig. 1 is the structural representation of the embodiment of the utility model;
Accompanying drawing identifier declaration:
1-first blowing deflector roll, 2-second blowing deflector roll, 3-first rewinding deflector roll, 4-second rewinding deflector roll, 5-first target, 6-second target, 7-the 3rd target, 8-emptying roller, 9-tension force pendulum roller, 10-nip rolls, 11-sputters home roll, 12-enclosed housing, 13-Destaticizing device, 14-winding roller, 15-base material.
Embodiment
As shown in Figure 1, a kind of coiling type ITO film deposition system preventing film forming thermal damage, comprise enclosed housing 12, and the emptying roller 6 be arranged in enclosed housing 12, winding roller 14, sputtering home roll 11, target, described emptying roller 8 and winding roller 14 lay respectively at both sides in enclosed housing 12, described sputtering home roll 11 is in the below between emptying roller 8 and winding roller 14, described sputtering home roll 11 inside is hollow structure, and be provided with cooling system, can effectively prevent film substrate 15 from producing damage because sputtering the electric current heat that produces like this, described cooling system is water circulation system.
This sputtering home roll 11 is connected with ground wire, takes away Partial charge, reduces base material 15 breakdown or the generation of the phenomenons such as fold occurs.
Described coiling type ITO film deposition system is also provided with blowing deflector roll and rewinding deflector roll, described blowing deflector roll comprises the first blowing deflector roll 1 and the second blowing deflector roll 2, first blowing deflector roll 1 is between emptying roller 8 and sputtering home roll 11, and be positioned at the lower right of emptying roller 8, the second blowing deflector roll 2 is below the first blowing deflector roll 1; Described rewinding deflector roll comprises the first rewinding deflector roll 3 and the second rewinding deflector roll 4, second rewinding deflector roll 4 is in winding roller 14 lower left, and the first rewinding deflector roll 3 is between the second rewinding deflector roll 4 and sputtering home roll 11.
Described coiling type ITO film deposition system is also provided with tension force pendulum roller 9, nip rolls 10, and described tension force pendulum roller 9 is in the lower left of the second blowing deflector roll 2, and described nip rolls 10 is in the lower left of tension force pendulum roller 9.Tension force pendulum roller 9 and the conbined usage of nip rolls 10 make base material 15 better contact with sputtering home roll 11, subtract the generation of distortion.
Described nip rolls 10 is provided with symmetrical screw thread toward both sides from axis, and this roller adds electrostatic liquid primarily of nitrile rubber and generates.
Described target includes the first target 5, second target 6 and the 3rd target 7, first target 5 and the 3rd target 7 material and is located on enclosed housing 12 wall of sputtering home roll 11 the right and left respectively, and the second target 6 is located on enclosed housing 12 wall below sputtering home roll 11.
Described coiling type ITO film deposition system is also provided with Destaticizing device 13, it is other that described Destaticizing device 13 is positioned at winding roller 14, and the charged particle directive ito thin film that this Destaticizing device 13 generates, utilize the attracting principle of the charges of different polarity, eliminate the electric charge on ito thin film, reach the effect destaticed.
The installation of Destaticizing device 13 and the grounding of the first rewinding deflector roll 3, effectively can reduce the electric charge of film formation surface, avoids after unpacking because electrostatic is to the corona line formed between rete after the electric shock of people and rolling.
In sputter procedure, by the rotation of roller, base material 15 on emptying roller 8 is in order outside the first blowing deflector roll 1 and the second blowing deflector roll 2, inside tension force pendulum roller 9, nip rolls 10, inside sputtering home roll 11, first rewinding deflector roll 3, the second outer rear flank of rewinding deflector roll 4, after Destaticizing device destatics, to winding roller 14 rolling.Period, base material 15 successively sputters through the first target 5, second target 6 and the 3rd target 7.
The above, it is only preferred embodiment of the present utility model, not in order to limit the utility model, thus every according to technology of the present utility model actual above embodiment is done any amendment, equivalent replacement, improvement etc., all still belong in the scope of technical solutions of the utility model.
Claims (9)
1. one kind prevents the coiling type ITO film deposition system of film forming thermal damage, it is characterized in that: comprise enclosed housing, and the emptying roller, winding roller, sputtering home roll, the target that are arranged in enclosed housing, described emptying roller and winding roller lay respectively at both sides in enclosed housing, described sputtering home roll is in the below between emptying roller and winding roller, described sputtering home roll inside is hollow structure, and inside is provided with cooling system.
2. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 1, it is characterized in that: described cooling system is water circulation system.
3. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 1, it is characterized in that: also include Destaticizing device, described Destaticizing device is located at by winding roller, and the ito thin film on the charged particle directive winding roller of this Destaticizing device generation.
4. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 1, it is characterized in that: also include blowing deflector roll and rewinding deflector roll, described blowing deflector roll comprises the first blowing deflector roll and the second blowing deflector roll, first blowing deflector roll is between emptying roller and sputtering home roll, and be positioned at the lower right of emptying roller, the second blowing deflector roll is positioned at below the first blowing deflector roll; Described rewinding deflector roll comprises the first rewinding deflector roll and the second rewinding deflector roll, and the second rewinding deflector roll is in winding roller lower left, and the first rewinding deflector roll is between the second rewinding deflector roll and sputtering home roll.
5. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 4, it is characterized in that: also include tension force pendulum roller, nip rolls, described tension force pendulum roller is in the lower left of the second blowing deflector roll, and described nip rolls is in the lower left of tension force pendulum roller.
6. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 5, it is characterized in that: the base material on described emptying roller is in order outside the first blowing deflector roll and the second blowing deflector roll, inside tension force pendulum roller, nip rolls, sputtering home roll, inside first rewinding deflector roll, the outer rear flank of second rewinding deflector roll, to winding roller rolling.
7. according to claim 1 or 4, prevent the coiling type ITO film deposition system of film forming thermal damage, it is characterized in that: described sputtering home roll is connected with ground wire with the first rewinding deflector roll.
8. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 5, it is characterized in that: described nip rolls is provided with symmetrical screw thread toward both sides from axis, this nip rolls adds electrostatic liquid primarily of nitrile rubber and generates.
9. prevent the coiling type ITO film deposition system of film forming thermal damage according to claim 1, it is characterized in that: described target includes the first target, the second target and the 3rd target, first target and the 3rd target are located on the enclosed housing wall of the sputtering home roll left and right sides respectively, and the second target is located on the enclosed housing wall below sputtering home roll.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520826715.2U CN205077128U (en) | 2015-10-23 | 2015-10-23 | Prevent formula of batching ITO film former of film forming heat injury |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520826715.2U CN205077128U (en) | 2015-10-23 | 2015-10-23 | Prevent formula of batching ITO film former of film forming heat injury |
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| CN205077128U true CN205077128U (en) | 2016-03-09 |
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| CN201520826715.2U Active CN205077128U (en) | 2015-10-23 | 2015-10-23 | Prevent formula of batching ITO film former of film forming heat injury |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7465297B2 (en) | 2022-03-17 | 2024-04-10 | 日東電工株式会社 | Sputtering Equipment |
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2015
- 2015-10-23 CN CN201520826715.2U patent/CN205077128U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7465297B2 (en) | 2022-03-17 | 2024-04-10 | 日東電工株式会社 | Sputtering Equipment |
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