CN205011827U - Vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum - Google Patents
Vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum Download PDFInfo
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- CN205011827U CN205011827U CN201520532476.XU CN201520532476U CN205011827U CN 205011827 U CN205011827 U CN 205011827U CN 201520532476 U CN201520532476 U CN 201520532476U CN 205011827 U CN205011827 U CN 205011827U
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Abstract
The utility model discloses a vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum, vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum includes film vacuum deposition system and automatic control winding system, film vacuum deposition system includes two separated mutually independent rough vacuum cavitys and high vacuum degree cavity, be provided with the baffle between rough vacuum cavity and the high vacuum degree cavity, film vacuum deposition system with be provided with the winder baffle between the automatic control winding system, automatic control winding system includes winder base and automatic controls, be provided with multilayer detached drop feed mechanism, automatic control straining device, synchronous winding mechanism, vertical single drum mechanism and receiving agencies on the winder base, the utility model discloses simple structure, convenient to use, job stabilization nature is good, can prepare under normal atmospheric temperature, and production efficiency is high.
Description
Technical field
The utility model relates to information and Information application field, is specifically related to the vertical continuous vapor deposition apparatus system of a kind of normal temperature multilayer ITO flexible parent metal single-drum.
Background technology
ITO transparent conductive film is a class not only transparent but also specific functionality film conducted electricity, have that forbidden band is wide, common optics and the electrical property such as the high and resistivity of the transmissivity of light is low in visible range, be widely used in the various fields such as antifog defrosting and sun power on indicating meter, various Photon-Electron electrons device, touch-screen, radioprotective, the energy-saving heat preserving of building, the vehicles at present.The suitability for industrialized production of ITO transparent conductive film adopts physical vaporous deposition usually.
The suitability for industrialized production of ITO transparent conductive film adopts physical vaporous deposition or chemical Vapor deposition process preparation usually.ITO transparent conductive film is in order to meet the photoelectricity index of the high optical transmittance of film and low surface resistivity, just must make the requirement that deposited film microstructure reaches certain when thin film deposition, this deposition process just determining ITO transparent conductive film must be carried out at a higher temperature.
It is under vacuum many that current physical vaporous deposition prepares ITO transparent conductive film, is warmed to 200 DEG C about-350 DEG C.Make ITO transparent conductive film at present many glass etc. of can only being deposited on the matrix of resistance to certain temperature, and can not be deposited on the transparent plastic film of non-refractory.Too much heating not only consumes a large amount of energy, increases cost, production unit is also proposed to the requirement of many harshnesses.Simultaneously, due to be in high temperature all the time when film preparation situation under, also just significantly limit the Application Range that ITO transparent conductive film deposits matrix used material, the high transparency material of a lot of reasonable price can not be applied as the matrix of ITO transparent conductive film, also just improve the cost and price of ITO transparent conductive film product accordingly, and more limit the range of application of ITO transparent conductive film product.
And, all the time be in the situation of high temperature when film preparation under, also ITO transparent conductive film can be impelled to deposit the distortion of matrix used material, change some process based prediction model that ITO transparent conductive film deposits matrix used material, reduce the yield rate of ITO transparent conductive film product.The operation of high temperature service also brings problem to production safety, can leave the unpredictable hidden danger safeguarded production line human life protection and production unit.
At present, the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum that a kind of production efficiency is high is lacked.
Utility model content
In order to overcome above-mentioned weak point of the prior art, the purpose of this utility model is to provide a kind of vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum of good operating stability.
In order to realize above-mentioned technical purpose, the technical solution adopted in the utility model as follows: the utility model provides the vertical continuous vapor deposition apparatus system of a kind of normal temperature multilayer ITO flexible parent metal single-drum, and the vertical continuous vapor deposition apparatus system of described normal temperature multilayer ITO flexible parent metal single-drum comprises thin film vacuum deposition system and automatic control reel system;
Described thin film vacuum deposition system comprises two separated separate low vacuum cavitys and condition of high vacuum degree cavity, is provided with dividing plate between described low vacuum cavity and condition of high vacuum degree cavity;
Up-coiler dividing plate is provided with between described thin film vacuum deposition system and described automatic control reel system;
Described automatic control reel system comprises up-coiler base and automatic controls, described up-coiler base is provided with discharge mechanism that multilayer separates, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism and receiving mechanism;
Described discharge mechanism, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism, receiving mechanism are all connected with automatic controls;
Described discharge mechanism is emptying roller and blowing and separation system, and described receiving mechanism is rewinding composite structure and material receiving roller; Independently separated vacuum-pumping system is provided with separately in described low vacuum cavity and low vacuum cavity; Described blowing and separation system, vertical single-drum mechanism, synchronous winding mechanism, rewinding composite structure are provided with separately independently synchronous driving system;
Described low vacuum cavity is provided with can along the first moving door of horizontal rail folding, and described condition of high vacuum degree cavity is equiped with the second moving door, is provided with visual real-time monitoring system in described rough vacuum cavity.
Further, described vertical single-drum mechanism is provided with vertical single-drum, in described condition of high vacuum degree cavity around vertical single-drum the uniform non-equilibrium negative electrode of multipair vertical intermediate frequency plane, the often pair of non-equilibrium negative electrode is provided with from the all-in-one-piece lock shield cover of trapping and independently gas supply mechanism separately.
Further, described automatic control reel system inside is provided with surface disposal facility.
Further, described automatic control reel system inside is provided with the automatic deviation rectifying mechanism winding process of separating rear each layer ITO flexible parent metal being had to real-time synchronization.
Further, the temperature control device on drum surface when being also provided with thin film deposition in the vertical single-drum of described automatic control reel system.
Further, described second moving door is articulated and connected by hinge and condition of high vacuum degree cavity.
Beneficial effect: the utility model structure is simple, and easy to use, good operating stability, can prepare at normal temperatures, production efficiency is high.Thin film vacuum deposition system is not fixedly connected with automatic control reel system, is separated completely, considerably reduces perforate and the structural complexity of vacuum cavity, winding mechanism is retrained few; Each integral part is harmonious, synchronous operation, good operating stability, can accomplish independent clamping system and independent deviation-rectifying system synchronization control.Achieve the automatization of MULTILAYER COMPOSITE ITO flexible parent metal installation and removal, decrease the damage to rete, improve production efficiency.
Relative to prior art, the utility model tool has the following advantages:
(1) non-equilibrium negative electrode arrangement form and from the monoblock type lock shield cover of trapping and independently gas supply mechanism separately, mainly by the non-homogeneous electric discharge form of subatmospheric plasma body, the mechanism by many electronic heating such as ohmic heating, Stochastic Heating and secondary electron emission heating between electromagnetic field and plasma body, indirectly the transient temperature of matrix surface is temporarily improved in local in small scope, reach matrix is not acutely heated and ensure to be formed the material of conductive film can the surface being deposited on matrix on request of maximum possible.
(2) plasma physical efficiency is under the condition not to matrix heating, by improving the processing parameter of physical vapor deposition and adopting more rational device structure and through multiple technologies such as the magnetic field arrangement form optimized and theoretical comprehensive, impel the material forming conductive film can the surface being deposited on matrix on request of maximum possible.For film provides necessary and enough activation energy in the growth of matrix surface.Achieve the suitability for industrialized production of warm overlarge area multilayer ITO flexible parent metal.
(3) adopt physical gas phase deposition technology to be deposited on the flexible transparent plastic matrix of the MULTILAYER COMPOSITE such as PET, PEN, PC under the condition of room temperature by transparent conductive oxide conductive glass film, and be widely used in the fields such as flexible display, various flexible optoelectronic electron device, flexible conformal touch-screen as flexible optoelectronic base mateiral.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
1 emptying roller; 2 automatic control clamping systems; 3 surface disposal facility; 4 vertical single-drum mechanism and temperature control systems; 5 automatic deviation rectifying mechanisms; 6 rewinding composite structures; 7 material receiving rollers; 8 up-coiler bases; 9 up-coiler dividing plates; 10 low vacuum cavitys; 11 dividing plates; 12 condition of high vacuum degree cavitys; 13 non-equilibrium negative electrodes; 14 blowings and separation system; 15 second moving doors; 16 first moving doors.
Embodiment
Further illustrate the utility model by the following examples.It should be understood that these embodiments are explaination of the present utility model and citing, do not limit scope of the present utility model in any form.
Embodiment 1
The utility model provides the vertical continuous vapor deposition apparatus system of a kind of normal temperature multilayer ITO flexible parent metal single-drum, and the vertical continuous vapor deposition apparatus system of described normal temperature multilayer ITO flexible parent metal single-drum comprises thin film vacuum deposition system and automatic control reel system;
Described thin film vacuum deposition system comprises two separated separate low vacuum cavitys and condition of high vacuum degree cavity, is provided with dividing plate between described low vacuum cavity and condition of high vacuum degree cavity;
Up-coiler dividing plate is provided with between described thin film vacuum deposition system and described automatic control reel system;
Described automatic control reel system comprises up-coiler base and automatic controls, described up-coiler base is provided with discharge mechanism that multilayer separates, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism and receiving mechanism;
Described discharge mechanism, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism, receiving mechanism are all connected with automatic controls.
Described discharge mechanism is emptying roller and blowing and separation system, and described receiving mechanism is rewinding composite structure and material receiving roller; Independently separated vacuum-pumping system is provided with separately in described low vacuum cavity and low vacuum cavity; Described blowing and separation system, vertical single-drum mechanism, synchronous winding mechanism, rewinding composite structure are provided with separately independently synchronous driving system.
Described low vacuum cavity is provided with can along the first moving door of horizontal rail folding; Described condition of high vacuum degree cavity is equiped with the second moving door, is provided with visual real-time monitoring system in described rough vacuum cavity.So that the dynamic winding operation conditions of ITO flexible parent metal in the whole production process of track record.
Described vertical single-drum mechanism is provided with vertical single-drum, in described condition of high vacuum degree cavity around vertical single-drum the uniform non-equilibrium negative electrode of multipair vertical intermediate frequency plane, the often pair of non-equilibrium negative electrode is provided with from the all-in-one-piece lock shield cover of trapping and independently gas supply mechanism separately.
Described automatic control reel system inside is provided with the surface disposal facility of the ITO flexible parent metal front and rear surfaces that need deposit being carried out to plasma treatment.
Described automatic control reel system inside is provided with the automatic deviation rectifying mechanism winding process of separating rear each layer ITO flexible parent metal being had to real-time synchronization.
The temperature control device that drum when being also provided with thin film deposition in the vertical single-drum of described automatic control reel system is surperficial.
Described second moving door is articulated and connected by hinge and condition of high vacuum degree cavity.
The utility model structure is simple, and easy to use, can prepare at normal temperatures, production efficiency is high.Thin film vacuum deposition system is not fixedly connected with automatic control reel system, is separated completely, considerably reduces perforate and the structural complexity of vacuum cavity, winding mechanism is retrained few; Each integral part is harmonious, synchronous operation, good operating stability, can accomplish independent clamping system and independent deviation-rectifying system synchronization control.Achieve the automatization of MULTILAYER COMPOSITE ITO flexible parent metal installation and removal, decrease the damage to rete, improve production efficiency.
Relative to prior art, the utility model tool has the following advantages:
(1) non-equilibrium negative electrode arrangement form and from the monoblock type lock shield cover of trapping and independently gas supply mechanism separately, mainly by the non-homogeneous electric discharge form of subatmospheric plasma body, the mechanism by many electronic heating such as ohmic heating, Stochastic Heating and secondary electron emission heating between electromagnetic field and plasma body, indirectly the transient temperature of matrix surface is temporarily improved in local in small scope, reach matrix is not acutely heated and ensure to be formed the material of conductive film can the surface being deposited on matrix on request of maximum possible.
(2) plasma physical efficiency is under the condition not to matrix heating, by improving the processing parameter of physical vapor deposition and adopting more rational device structure and through multiple technologies such as the magnetic field arrangement form optimized and theoretical comprehensive, impel the material forming conductive film can the surface being deposited on matrix on request of maximum possible.For film provides necessary and enough activation energy in the growth of matrix surface.Achieve the suitability for industrialized production of warm overlarge area MULTILAYER COMPOSITE winding ITO flexible parent metal full resistance series ITO flexible parent metal.
(3) adopt physical gas phase deposition technology to be deposited on the flexible transparent plastic matrix of the MULTILAYER COMPOSITE such as PET, PEN, PC under the condition of room temperature by transparent conductive oxide conductive glass film, and be widely used in the fields such as flexible display, various flexible optoelectronic electron device, flexible conformal touch-screen as flexible optoelectronic base mateiral.
Test 1
Flexible winding base material is fixed on emptying roller, and is connected to material receiving roller by each axle.Regulate the tension synchronous of each tunic material harmonious, set the synchronous consistence of correction, select the design temperature of thin film deposition drum, the travelling speed of setting base material is 3 ms/min.By the MULTILAYER COMPOSITE ITO flexible parent metal automatic control reel system integral level shift-in that sets in the vacuum cavity of low vacuum, be evacuated down to rated value, pass into process gas, carry out vapour deposition, its result is: Combined roll is 100 Ω around ITO flexible parent metal full resistance series ito film surface resistivity, transmittance is 91%, and homogeneity is ± 5%.
Test 2
Flexible winding base material is fixed on emptying roller, and is connected to material receiving roller by each axle.Regulate the tension synchronous of each tunic material harmonious, set the synchronous consistence of correction, select the design temperature of thin film deposition drum, the travelling speed of setting base material is 1 m/min.By the MULTILAYER COMPOSITE ITO flexible parent metal automatic control reel system integral level shift-in that sets in the vacuum cavity of low vacuum, be evacuated down to rated value, pass into process gas, carry out vapour deposition, its result is: Combined roll is 40 Ω around ITO flexible parent metal full resistance series ito film surface resistivity, transmittance is 88%, and homogeneity is ± 3%.
As can be seen from test 1 and test 2, the utility model transmittance is high, and homogeneity is better, and Combined roll is uniform and stable around ITO flexible parent metal full resistance series ito film surface resistivity, and consistent performance is good; Transmittance is high, homogeneous, and aberration is little.
Although more employ emptying roller 1, clamping system 2, surface disposal facility 3, drum and temperature control system 4, deviation-rectifying system 5, rewinding composite structure 6, material receiving roller 7, up-coiler base 8, up-coiler dividing plate 9, low vacuum cavity 10, dividing plate 11, condition of high vacuum degree cavity 12, negative electrode and trapping system 13, blowing and separation system 14, second term such as moving door 15, first moving door 16 herein, do not get rid of the possibility using other term.These terms are used to be only used to describe and explain essence of the present utility model more easily; The restriction that they are construed to any one additional is all contrary with the utility model spirit.
More than show and describe ultimate principle of the present utility model, principal character and advantage of the present utility model.The technician of the industry should understand; the utility model is not restricted to the described embodiments; what describe in above-described embodiment and specification sheets just illustrates principle of the present utility model; under the prerequisite not departing from the utility model spirit and scope; the utility model also has various changes and modifications, and the claimed scope of the utility model is defined by appending claims, specification sheets and equivalent thereof.
Claims (6)
1. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum, is characterized in that: the vertical continuous vapor deposition apparatus system of described normal temperature multilayer ITO flexible parent metal single-drum comprises thin film vacuum deposition system and automatic control reel system;
Described thin film vacuum deposition system comprises two separated separate low vacuum cavitys and condition of high vacuum degree cavity, is provided with dividing plate between described low vacuum cavity and condition of high vacuum degree cavity;
Up-coiler dividing plate is provided with between described thin film vacuum deposition system and described automatic control reel system;
Described automatic control reel system comprises up-coiler base and automatic controls, described up-coiler base is provided with discharge mechanism that multilayer separates, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism and receiving mechanism;
Described discharge mechanism, automatic control strainer, synchronous winding mechanism, vertical single-drum mechanism, receiving mechanism are all connected with automatic controls;
Described discharge mechanism is emptying roller and blowing and separation system, and described receiving mechanism is rewinding composite structure and material receiving roller; Independently separated vacuum-pumping system is provided with separately in described low vacuum cavity and condition of high vacuum degree cavity; Described blowing and separation system, vertical single-drum mechanism, synchronous winding mechanism, rewinding composite structure are provided with separately independently synchronous driving system;
Described low vacuum cavity is provided with can along the first moving door of horizontal rail folding, and described condition of high vacuum degree cavity is equiped with the second moving door, is provided with visual real-time monitoring system in described rough vacuum cavity.
2. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum according to claim 1, it is characterized in that: described vertical single-drum mechanism is provided with vertical single-drum, in described condition of high vacuum degree cavity around vertical single-drum the uniform non-equilibrium negative electrode of multipair vertical intermediate frequency plane, the often pair of non-equilibrium negative electrode is provided with from the all-in-one-piece lock shield cover of trapping and independently gas supply mechanism separately.
3. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum according to claim 1, is characterized in that: described automatic control reel system inside is provided with surface disposal facility.
4. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum according to claim 1, is characterized in that: described automatic control reel system inside is provided with the automatic deviation rectifying mechanism winding process of separating rear each layer ITO flexible parent metal being had to real-time synchronization.
5. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum according to claim 1, is characterized in that: the temperature control device that drum when being also provided with thin film deposition in the vertical single-drum of described automatic control reel system is surperficial.
6. the vertical continuous vapor deposition apparatus system of normal temperature multilayer ITO flexible parent metal single-drum according to any one of claim 1 to 5, is characterized in that: described second moving door is articulated and connected by hinge and condition of high vacuum degree cavity.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520532476.XU CN205011827U (en) | 2015-07-21 | 2015-07-21 | Vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum |
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| CN201520532476.XU CN205011827U (en) | 2015-07-21 | 2015-07-21 | Vertical continuous vapour deposition equipment system of normal atmospheric temperature multilayer ITO flexible parent metal list drum |
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| CN205011827U true CN205011827U (en) | 2016-02-03 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887014A (en) * | 2015-07-21 | 2016-08-24 | 赛柏利安工业技术（苏州）有限公司 | Normal-temperature single-drum vertical continuous vapor deposition equipment system for multiple layers of ITO flexible substrates |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105887014A (en) * | 2015-07-21 | 2016-08-24 | 赛柏利安工业技术（苏州）有限公司 | Normal-temperature single-drum vertical continuous vapor deposition equipment system for multiple layers of ITO flexible substrates |
| CN105887014B (en) * | 2015-07-21 | 2019-02-19 | 赛柏利安工业技术（苏州）有限公司 | The vertical continuous vapor deposition apparatus system of room temperature multilayer ITO flexible parent metal single-drum |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190402 Address after: 215200 East of Fenyang Road, Fenhu Economic Development Zone, Wujiang District, Suzhou City, Jiangsu Province Patentee after: GEMCH MATERIAL TECHNOLOGY (SUZHOU) Co.,Ltd. Address before: 215024 First Floor of No. 18 Workshop, No. 99 Gangtian Lu, Suzhou Industrial Park, Suzhou City, Jiangsu Province Patentee before: SAIBOLIAN INDUSTRIAL TECHNOLOGY (SUZHOU) CO.,LTD. |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: Room temperature multilayer ITO flexible substrate single drum vertical continuous vapor deposition equipment system Effective date of registration: 20220627 Granted publication date: 20160203 Pledgee: China Construction Bank Corporation Suzhou Yangtze River Delta integration Demonstration Zone Branch Pledgor: GEMCH MATERIAL TECHNOLOGY (SUZHOU) Co.,Ltd. Registration number: Y2022320010289 |