CN204973312U - A device system that is used for liquid solid separation of polycrystalline silicon by -product sediment thick liquid - Google Patents

A device system that is used for liquid solid separation of polycrystalline silicon by -product sediment thick liquid Download PDF

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CN204973312U
CN204973312U CN201520610283.1U CN201520610283U CN204973312U CN 204973312 U CN204973312 U CN 204973312U CN 201520610283 U CN201520610283 U CN 201520610283U CN 204973312 U CN204973312 U CN 204973312U
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unit
filter
polysilicon
product
vacuum
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蒋文武
姚光明
佟峰
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Jiangsu Zhongneng Polysilicon Technology Development Co Ltd
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Jiangsu Zhongneng Polysilicon Technology Development Co Ltd
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Abstract

The utility model discloses a device system that is used for liquid solid separation of polycrystalline silicon by -product sediment thick liquid, including sediment thick liquid feeder unit, filter aid feeder unit, rotary drum vacuum filters system, filter residue collector unit, filtrating collector unit and vacuum system, rotary drum vacuum filters system front end respectively with sediment thick liquid feeder unit with filter aid feeder unit connects, rotary drum vacuum filters system rear end respectively with the filter residue collector unit with the filtrating collector unit links to each other, filtrating the collector unit with vacuum system links to each other. According to the utility model discloses a device system, the solid content can both carry out filtering separation at 0.5 -35wt% broad within range, and is applicable to the solid particle diameter at 0.3 -500 mu m's material, and application scope is wide, and filter fineness is high, and the further perfect closed circulation technology of improvement siemens process polycrystalline silicon production reduces the material loss, and reduction in production cost has accomplished environment friendly.

Description

For the apparatus system that polysilicon by-product dreg slurry is separated admittedly
Technical field
The utility model relates to the preparing technical field of high purity polycrystalline silicon, the apparatus system that the dreg slurry particularly generated in production of polysilicon is separated admittedly.
Background technology
Current global production of polysilicon prevailing technology adopts improved Siemens polysilicon production process, this technique inevitably produces chlorosilane slag slurry in process of production (mainly containing the solid metal such as silica flour, Cu, Fe, Al, Ca impurity, other component is the materials such as liquid silicon tetrachloride, trichlorosilane, high-boiling components and metal chloride, wherein solids mass content is 0.5 ~ 35%, solid particle size at 0.3 μm ~ 500 μm, chlorosilane liquid produced mass content 65 ~ 99.5%).For the process of slag slurry waste material, existing main processing method has burns dry process and hydrolysis wet-treating.Burning dry process adopts auxiliary fuel to burn, lot of energy, and simultaneity factor produces silica and results in blockage, and the chlorine subsequent treatment of generation is complicated, causes environmental pollution.Hydrolysis wet-treating then needs to consume a large amount of limewash, and in hydrolytic process, there is the quick-fried and emptying Ignition Phenomena of sudden strain of a muscle, and equipment fluctuation of service, life cycle is short, and fault rate is high.And no matter be burn or hydrolysis, finally all produce a large amount of waste residues and waste water, extremely unfriendly to environment while causing a large amount of material waste.
Isolated by filtration process slag slurry material effectively can avoid above-mentioned burning or dry hydrolysis wet processing process Problems existing, but conventional filtration aggregates is suitable for slag slurry limit, cannot meet the large and filtration of fine grain slag slurry of solid content, equipment cost is high, complicated operation, cannot run continuously.Such as adopt backwash filter, there is filter core blocking, high solids content material cannot be processed, and filter element replacing high in cost of production shortcoming; The shortcomings such as candle filter exists deslagging blockage problem, and solid-liquid separation efficiency is low; , there is the shortcomings such as filter core blocking equally in the filter plant such as sintered filter core or sintered plate.
Summary of the invention
The purpose of this utility model is to provide the apparatus system of the solid filtration treatment of a kind of brand-new dreg slurry, solid content can carry out isolated by filtration in 0.5-35wt% relative broad range, and be applicable to solid particle size at the material of 0.3-500 μm, applied widely, filtering accuracy is high, the perfect further close circulation technology of improved Siemens production of polysilicon, reduces loss of material, reduce production cost, accomplish environmental friendliness.
For achieving the above object and technique effect, the technical solution adopted in the utility model is as follows:
A kind of apparatus system be admittedly separated for polysilicon by-product dreg slurry, comprise slag slurry feed unit, filter aid feed unit, rotating drum vacuum filtration system, residue collection unit, filtrate collector unit and vacuum system, described rotating drum vacuum filtration system front end starches feed unit with described slag respectively and described filter aid feed unit is connected, described rotating drum vacuum filtration System Back-end is connected with described filtrate collector unit with described residue collection unit respectively, described vacuum system is connected with described filtrate collector unit or described vacuum system is directly connected with described rotating drum vacuum filtration system.
In one preferred embodiment, described apparatus system also comprises filter residue processing unit, and described filter residue processing unit is connected with described residue collection unit.
Wherein, described slag slurry feed unit is slag slurry head tank; described filter aid feed unit is filter aid tank; described rotating drum vacuum filtration system is rotary drum vacuum filter; described filter residue processing unit is filter residue tank; described filter residue processing unit is hydrolytic decomposition pot; described filtrate collector unit is filtrate tank; described vacuum system is vavuum pump; below be all not limited thereto; described those skilled in the art are understandable that, if material feeding function, memory function can be realized and realize vacuum function all should within protection domain.
According to the apparatus system be admittedly separated for polysilicon by-product dreg slurry of the present utility model, solid content can carry out isolated by filtration in 0.5-35wt% relative broad range, and be applicable to solid particle size at the material of 0.3-500 μm, applied widely, filtering accuracy is high, the perfect further close circulation technology of improved Siemens production of polysilicon, reduces loss of material, reduce production cost, accomplish environmental friendliness.
According to the apparatus system be admittedly separated for polysilicon by-product dreg slurry of the present utility model, the technique adopting dreg slurry admittedly to filter is under certain conditions by the slag slurry material in production of polysilicon or similar liquid-solid material, by effective filter analysis, realize the separation of solids, liquid chlorosilanes clear liquid is made to return system, again recycle, eliminate the hazards such as the sudden strain of a muscle of existing treatment technology existence is quick-fried and emptying is caught fire.
Accompanying drawing explanation
Fig. 1 is the apparatus system connection diagram be admittedly separated for polysilicon by-product dreg slurry of the present utility model.
Fig. 2 is this another embodiment connection diagram of apparatus system be admittedly separated for polysilicon by-product dreg slurry of the present utility model.
Wherein, 1 is slag slurry head tank, 2 vacuum-type drum filters, 3 filtrate tank, 4 vavuum pumps, 5 filter aid tanks, 6 filter residue tanks, 7 hydrolytic decomposition pots.
Detailed description of the invention
Below detailed description of the invention of the present utility model is described in detail; but; must it should be noted that; protection domain of the present utility model is not by the restriction of these detailed description of the invention; concrete proportioning involved in detailed description of the invention and response parameter and material are selected to be for illustrating that the utility model is enumerated in this embodiment, are not to any restriction of the present utility model.
As shown in Figure 1, the front end of vacuum-type drum filter (being also rotary drum vacuum filter) 2 is connected with slag slurry head tank 1 and filter aid tank 5, the rear end of vacuum-type drum filter 2 is connected with filtrate tank 3 and filter residue tank 6, and filtrate tank 3 is connected with vavuum pump 4, and filter residue tank 6 is connected with hydrolytic decomposition pot 7.
In another embodiment, as shown in Figure 2, the front end of vacuum-type drum filter (being also rotary drum vacuum filter) 2 is connected with slag slurry head tank 1 and filter aid tank 5, and the rear end of vacuum-type drum filter 2 is connected with filtrate tank 3, filter residue tank 6 and vavuum pump 4, and filter residue tank 6 is connected with hydrolytic decomposition pot 7.
Usually, vacuum-type drum filter 2 is opened and vavuum pump 4 vacuumizes in slag slurry processing procedure, first (filter aid can be diatomite in vacuum-type drum filter 2, to enter filter aid by filter aid tank 5, imvite, the porous structure materials such as kaolin are dispersed in the dispersion liquid formed in chlorosilane), after the rotary drum that not stall is dynamic applies the uniform filter aid rete of one deck, switch slagging slurry head tank 1 to charging in vacuum-type drum filter 2, slag slurry containing fine silica powder is separated into filtrate containing chlorosilane and filter residue under the effect of vacuum-type drum filter 2, filtrate enters filtrate tank 3, and deliver to subsequent handling outward, such as rectifying column purifying etc., be separated the filter residue that stays to rest on rotary drum and accumulation is transferred to filter residue tank 6, and filter residue sent into hydrolytic decomposition pot 7 and process further, the hydrolysate reaching set quota is sent into next step operation or sends outside.
The slag slurry of the utility model by adopting the apparatus system process being coated with the vacuum-type drum filter of drainage oxidant layer to contain fine silica powder, isolated by filtration can be carried out in 0.5-35wt% relative broad range for solid content, and be applicable to solid particle size at the material of 0.3-500 μm, applied widely, filtering accuracy is high, the perfect further close circulation technology of improved Siemens production of polysilicon, reduces loss of material, reduce production cost, accomplish environmental friendliness.
Although be described in detail detailed description of the invention of the present utility model above in conjunction with the embodiments, need it is noted that, protection domain of the present utility model by the restriction of these detailed description of the invention, but is determined by claims.Those skilled in the art can carry out various equivalence according to technical though of the present utility model to above-mentioned embodiment and change and suitably amendment; its function produced do not exceed that description contains yet spiritual time, all should within protection domain of the present utility model.

Claims (9)

1. the apparatus system be admittedly separated for polysilicon by-product dreg slurry, comprise slag slurry feed unit, filter aid feed unit, rotating drum vacuum filtration system, residue collection unit, filtrate collector unit and vacuum system, described rotating drum vacuum filtration system front end starches feed unit with described slag respectively and described filter aid feed unit is connected, described rotating drum vacuum filtration System Back-end is connected with described filtrate collector unit with described residue collection unit respectively, described vacuum system is connected with described filtrate collector unit or described vacuum system is directly connected with described rotating drum vacuum filtration system.
2. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1, characterized by further comprising filter residue processing unit, and described filter residue processing unit is connected with described residue collection unit.
3. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described slag slurry feed unit is slag slurry head tank.
4. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described filter aid feed unit is filter aid tank.
5. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described rotating drum vacuum filtration system is rotary drum vacuum filter.
6. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described residue collection unit is filter residue tank.
7. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 2, is characterized in that described filter residue processing unit is hydrolytic decomposition pot.
8. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described filtrate collector unit is filtrate tank.
9. the apparatus system be admittedly separated for polysilicon by-product dreg slurry according to claim 1 and 2, is characterized in that described vacuum system is vavuum pump.
CN201520610283.1U 2015-08-14 2015-08-14 A device system that is used for liquid solid separation of polycrystalline silicon by -product sediment thick liquid Active CN204973312U (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108862284A (en) * 2018-07-18 2018-11-23 兰州天大华瑞环境工程技术有限公司 A kind of production of polysilicon link slurry processing unit and method
CN110950342A (en) * 2019-11-29 2020-04-03 天华化工机械及自动化研究设计院有限公司 Polysilicon slag slurry non-hydration treatment process
CN111905438A (en) * 2020-09-01 2020-11-10 新疆协鑫新能源材料科技有限公司 Process and device for drying and mixing residue and filter residue of slurry

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108862284A (en) * 2018-07-18 2018-11-23 兰州天大华瑞环境工程技术有限公司 A kind of production of polysilicon link slurry processing unit and method
CN110950342A (en) * 2019-11-29 2020-04-03 天华化工机械及自动化研究设计院有限公司 Polysilicon slag slurry non-hydration treatment process
CN111905438A (en) * 2020-09-01 2020-11-10 新疆协鑫新能源材料科技有限公司 Process and device for drying and mixing residue and filter residue of slurry

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