CN204918746U - Device is implanted to cavitation based on focus of laser induction shock wave - Google Patents
Device is implanted to cavitation based on focus of laser induction shock wave Download PDFInfo
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- CN204918746U CN204918746U CN201520725101.5U CN201520725101U CN204918746U CN 204918746 U CN204918746 U CN 204918746U CN 201520725101 U CN201520725101 U CN 201520725101U CN 204918746 U CN204918746 U CN 204918746U
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- elliptical reflector
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Abstract
The utility model discloses a device is implanted to cavitation based on focus of laser induction shock wave, including work piece, working solution, elliptical reflector, incident laser and optic system, elliptical reflector and work piece are located in the working solution, incident laser is through optic system's reflection and through the focus of convex lens, and its focus acts on the near -end focus department of elliptical reflector, and laser assaults at the near -end focus induced plasma who produces of department and involves the cavitation bubble and crumble and fall the in -process and produce the shock wave, and the shock wave uses the near -end focus of elliptical reflector to locate to the center, and the sphere is outwards propagated, the shock wave is through the reflection of elliptical reflector, and the distal end focus department at the elliptical reflector assembles again, assemble the subparticle of shock wave direct action in the working solution of reinforcing again on, with its surface of implanting the work piece. The utility model discloses make laser induction shock wave energy more concentrated, improve the utilization efficiency of laser induction shock wave, improve the target and implant the precision.
Description
Technical field
The utility model relates to micro-nano Ultraprecision Machining field, particularly relates to a kind of cavitation implanted device based on induced with laser shock wave focusing.
Background technology
Microcircuit refers to have high-density equivalent-circuit component and (or) parts, and can be used as the microelectronic device of separate piece.MEMS (micro electro mechanical system) (MEMS) refers to that size is at several millimeters and even less high-tech device, and its internal structure, generally in micron even nanometer scale, is an independently intelligent system.Form primarily of sensor, actuator (performer) and micro-energy three parts.There is microminiaturization, intellectuality, multi-functional, high integration and be suitable for producing these features in enormous quantities.Have a wide range of applications in electronics, medical science, industry, automobile and aerospace system.
Electrochemical deposition, particularly precise electrotyping technology obtain extremely successful application in the preparation of surface fine structure.The people such as Zheng Xiaohu (Zheng Xiaohu; Zhu obtains. the electrotyping forming of metal micro structure array. and optical precision engineering; 2008; 16 (3): 473-477.) the cathodic deposition effect of metal ion is utilized; be combined conduction core or insulation mask etc.; reach the effect of selectivity deposition, the microtextures such as dimpling array can be prepared at matrix surface.Zhu of Nanjing Aero-Space University obtains (D.Zhu, Y.B.Zeng.Microelectroformingofhigh-aspect-ratiometallicm icrostructuresbyusingamovablemask.) etc. propose mobile plating technology, constantly move up mask, and carry out continuously can eletroforming, the microtexture with high aspect ratio can be prepared in metallic surface.In this way, successfully having prepared characteristic dimension is hundreds of micron, highly reaches several millimeter and the microtexture array of sidewall for their profit.Precise electrotyping prepares component by the mode of ion deposition, is very suitable for micro pipes from principle, and there is not tool loss and elaboration power etc.
Utility model content
For deficiency of the prior art, the technical problem that the utility model solves proposes a kind of cavitation implanted device based on induced with laser shock wave focusing, make induced with laser shock wave energy more concentrated, improve the utilising efficiency of induced with laser shockwave, and improve the precision of shockwave strengthening effect, target implantation.
In order to solve the problems of the technologies described above, cavitation implanted device based on induced with laser shock wave focusing of the present utility model comprises workpiece, working fluid, elliptical reflector, incident laser and light path system, described elliptical reflector and workpiece are positioned at described working fluid, incident laser through light path system reflection and through the focusing of convex lens, its focus acts on the near-end focus place of elliptical reflector, the plasma stock wave that laser produces in the induction of near-end focus place and cavitation bubble are crumbled and fall in process and are produced shockwave, shockwave is centered by the near-end focus place of elliptical reflector, sphere is outwards propagated, shockwave is through the reflection of elliptical reflector, and again converge at the far-end focus place of elliptical reflector, the shockwave again converging enhancing directly acts on the subparticle in working fluid, is implanted to the surface of workpiece.
Accordingly, the cavitation method for implantation based on induced with laser shock wave focusing that the utility model embodiment provides, comprises the following steps:
S1: elliptical reflector and workpiece to be processed are positioned in working fluid;
S2: incident laser through light path system reflection and through the focusing of convex lens, its focus acts on the near-end focus place of elliptical reflector;
S3: when laser energy is greater than the breakdown threshold of liquid, produces the plasma body of High Temperature High Pressure, the external radiation blast wave of plasma body; Also externally shockwave is given off when inducing the cavitation bubble of generation to crumble and fall after plasma disappearance;
S4: the plasma stock wave that laser produces in the induction of near-end focus place and cavitation bubble are crumbled and fall the shockwave produced in process, and centered by the near-end focus place of elliptical reflector, sphere is outwards propagated;
S5: shockwave is through the reflection of elliptical reflector, and again converge at the far-end focus place of elliptical reflector, the shockwave again converging enhancing directly acts on the subparticle in working fluid, is implanted to the surface of workpiece.
Of the present utility modelly be provided with setting device based on also comprising in the cavitation implanted device of induced with laser shock wave focusing, the position can moving convex lens by setting device in step s 2 adjusts and changes the position of laser focusing in elliptic reflector.
Preferably, in step s 5, the structural parameter of adjustment elliptical reflector, and then change focuses on the shock strength of far-end focus and the position of far-end focus.
Preferably, in described working fluid, increase anisotropic material particle (such as carbon nanotube), utilize shockwave promotion anisotropic material to be implanted to the surface of workpiece.
The cavitation implanted device based on induced with laser shock wave focusing that the utility model embodiment provides, has following beneficial effect:
The near-end focus place acting on elliptical reflector based on the laser spot in the cavitation implanted device of induced with laser shock wave focusing that the utility model embodiment provides, use elliptical reflector by shock reflection and again converge at the far-end focus place of elliptical reflector, on the subparticle of the shock wave utilizing far-end focus place to converge in working fluid, be implanted to the surface of workpiece.The utility model makes induced with laser shock wave energy more concentrated, improves the utilising efficiency of induced with laser shockwave, more effectively the particle in working fluid is implanted workpiece surface, improves target and implants precision.The utility model utilizes elliptical reflector shock wave energy to be converged at far-end focus place, and energy is more concentrated, and the target that more can be applicable to complex structure workpiece is implanted.Cavitation implanted device based on induced with laser shock wave focusing of the present utility model have employed elliptical reflector, utilize the convergence effect of elliptical reflector, the shockwave that induced with laser produces is carried out vernier focusing, so just can improve shockwave utilization ratio, target implants precision, whole processing unit (plant) is positioned among working fluid, the target particle implanted constantly is supplied by working fluid, workpiece surface is put on again by after shock wave focusing by elliptical reflector, shock wave focusing position and energy adjustable, can adapt to various complex structure workpiece target implant requirement.
Accompanying drawing explanation
Fig. 1 is the implantation schematic diagram of the cavitation implanted device based on induced with laser shock wave focusing that the utility model preferred embodiment provides.
Embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, be clearly and completely described the technical scheme in the utility model embodiment, obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
As shown in Figure 1, the implantation schematic diagram of the cavitation implanted device based on induced with laser shock wave focusing that the utility model preferred embodiment provides, laser focusing of the present utility model, in working fluid, when laser energy is greater than the breakdown threshold of liquid, will produce the plasma body of High Temperature High Pressure.The external radiation blast wave of plasma body, the cavitation bubble of plasma-induced generation also can external radiation blast wave when crumbling and fall.Use elliptical reflector shockwave to be converged again the far-end focus place strengthened in elliptical reflector, utilize again converge enhancing the subparticle of shock wave in working fluid on, be implanted to the surface of workpiece.
Particularly, the present embodiment based in the cavitation implanted device of induced with laser shock wave focusing, elliptical reflector 5 and workpiece to be processed 8 are positioned over containing in working fluid, incident laser 1 Parameter adjustable, and through light path system reflection and through the focusing of convex lens (not indicating in figure), its focus acts on near-end focus 3 place of elliptical reflector 5, the plasma stock wave that laser produces in the induction of near-end focus 3 place and cavitation bubble 4 are crumbled and fall the shockwave 2 produced in process, by centered by near-end focus 3 place of elliptical reflector 5, sphere is outwards propagated.Shockwave, through the reflection of elliptical reflector 5, converges at far-end focus 6 place of elliptical reflector 5 again, converges the shockwave strengthened and directly acts on the subparticle 7 in working fluid, be implanted to the surface of workpiece 8.
Preferably, the position that the utility model can pass through setting device (not indicating in figure) mobile convex lens adjusts and changes the position of laser focusing in elliptic reflector 5; And the structural parameter of elliptical reflector 5 are adjustable, and then the position of shock strength and the far-end focus 6 focusing on far-end focus 6 can be changed.
Cavitation implanted device based on induced with laser shock wave focusing of the present utility model also can increase anisotropic material particle 7 (such as carbon nanotube) in working fluid, utilizes shockwave promotion anisotropic material particle to be implanted to the surface of workpiece.
Near-end focus 3 place acting on elliptical reflector 5 based on the laser spot in the cavitation implanted device of induced with laser shock wave focusing that the utility model embodiment provides, elliptical reflector 5 is used to be reflected by shockwave 2 and again converge at far-end focus 6 place of elliptical reflector 5, on the subparticle 7 of the shock wave utilizing far-end focus 6 place to converge in working fluid, be implanted to the surface of workpiece 8.The utility model makes induced with laser shock wave energy more concentrated, improves the utilising efficiency of induced with laser shockwave, and the target adapting to various complex structure workpiece implants requirement, and improves shockwave strong target implantation precision.The utility model utilizes elliptical reflector 5 shock wave energy to be converged at far-end focus 6 place, and energy is more concentrated, and the target that more can be applicable to complex structure workpiece implants precision.
The utility model is implemented to comprise workpiece 8 based on the cavitation implanted device of induced with laser shock wave focusing, working fluid, elliptical reflector 5, incident laser 1 and light path system, described elliptical reflector 5 and workpiece 8 are positioned at described working fluid, incident laser 1 through light path system reflection and through the focusing of convex lens, its focus acts on near-end focus 3 place of elliptical reflector 5, the plasma stock wave that laser 1 produces in the induction of near-end focus 3 place and cavitation bubble 4 are crumbled and fall in process and are produced shockwave 2, shockwave 2 is centered by near-end focus 3 place of elliptical reflector 5, sphere is outwards propagated, shockwave 2, through the reflection of elliptical reflector 5, converges at far-end focus 6 place of elliptical reflector 5 again, and the shockwave again converging enhancing directly acts on the subparticle 7 in working fluid, is implanted to the surface of workpiece 8.
Cavitation implanted device based on induced with laser shock wave focusing of the present utility model have employed elliptical reflector 5, utilize the convergence effect of elliptical reflector 5, the shockwave 2 that induced with laser produces is carried out vernier focusing, so just can improve shockwave utilization ratio, target implants precision, whole processing unit (plant) is positioned among working fluid, the target particle implanted constantly is supplied by working fluid, workpiece surface is put on again by after shock wave focusing by elliptical reflector 5, shock wave focusing position and energy adjustable, the target that can adapt to various complex structure workpiece implants requirement.
The above is preferred implementation of the present utility model; it should be pointed out that for those skilled in the art, under the prerequisite not departing from the utility model principle; can also make some improvements and modifications, these improvements and modifications are also considered as protection domain of the present utility model.
Claims (1)
1. the cavitation implanted device based on induced with laser shock wave focusing, it is characterized in that, comprise workpiece (8), working fluid, elliptical reflector (5), incident laser (1) and light path system, described elliptical reflector (5) and workpiece (8) are positioned at described working fluid, incident laser (1) through light path system reflection and through the focusing of convex lens, its focus acts on near-end focus (3) place of elliptical reflector (5), the plasma stock wave that laser (1) produces in the induction of near-end focus (3) place and cavitation bubble (4) are crumbled and fall in process and are produced shockwave (2), shockwave (2) is centered by near-end focus (3) place of elliptical reflector (5), sphere is outwards propagated, shockwave (2) reflection through elliptical reflector (5), again converge at far-end focus (6) place of elliptical reflector (5), again the shockwave converging enhancing directly acts on the subparticle (7) in working fluid, is implanted to the surface of workpiece (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520725101.5U CN204918746U (en) | 2015-09-18 | 2015-09-18 | Device is implanted to cavitation based on focus of laser induction shock wave |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520725101.5U CN204918746U (en) | 2015-09-18 | 2015-09-18 | Device is implanted to cavitation based on focus of laser induction shock wave |
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| CN204918746U true CN204918746U (en) | 2015-12-30 |
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| CN201520725101.5U Withdrawn - After Issue CN204918746U (en) | 2015-09-18 | 2015-09-18 | Device is implanted to cavitation based on focus of laser induction shock wave |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112860A (en) * | 2015-09-18 | 2015-12-02 | 广东工业大学 | Cavitation implantation method and device based on laser induced shock wave focusing |
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2015
- 2015-09-18 CN CN201520725101.5U patent/CN204918746U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112860A (en) * | 2015-09-18 | 2015-12-02 | 广东工业大学 | Cavitation implantation method and device based on laser induced shock wave focusing |
| CN105112860B (en) * | 2015-09-18 | 2017-12-22 | 广东工业大学 | A kind of cavitation method for implantation and device based on induced with laser shock wave focusing |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20151230 Effective date of abandoning: 20171222 |